CN219946110U - Semiconductor wafer detects rotary platform - Google Patents
Semiconductor wafer detects rotary platform Download PDFInfo
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- CN219946110U CN219946110U CN202320521869.5U CN202320521869U CN219946110U CN 219946110 U CN219946110 U CN 219946110U CN 202320521869 U CN202320521869 U CN 202320521869U CN 219946110 U CN219946110 U CN 219946110U
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- platform
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- worm wheel
- bottom plate
- connecting rod
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 27
- 238000007689 inspection Methods 0.000 claims description 5
- 238000009423 ventilation Methods 0.000 claims description 5
- 230000008878 coupling Effects 0.000 claims description 2
- 238000010168 coupling process Methods 0.000 claims description 2
- 238000005859 coupling reaction Methods 0.000 claims description 2
- 238000005096 rolling process Methods 0.000 claims 2
- 235000012431 wafers Nutrition 0.000 abstract description 85
- 238000001514 detection method Methods 0.000 abstract description 28
- 230000000149 penetrating effect Effects 0.000 abstract description 2
- 230000006872 improvement Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
The utility model relates to the technical field of semiconductor wafers and discloses a semiconductor wafer detection rotating platform, wherein a platform is arranged at the top of a bottom plate, a frame body is embedded in the top of the platform, a vacuum chuck penetrating into the frame body is arranged at the top of the frame body, an air pump is fixedly arranged in the platform, one end of the platform is provided with a vent hole matched with the air pump, when the semiconductor wafer detection rotating platform is used, a wafer is placed at the top of the frame body and matched with the wafer through a centering scale for centering, after the wafer is adjusted to a proper position, the air pump starts to operate, is matched with the vacuum chuck for adsorbing the bottom of the wafer, the vent hole is matched with the air pump for use, so that the wafer is fixed, the centering scale is used for assisting centering, the wafer is conveniently fixed through the matching of the vacuum chuck and the air pump, and the convenience of using the wafer with different diameters is improved.
Description
Technical Field
The utility model belongs to the technical field of semiconductor wafers, and particularly relates to a semiconductor wafer detection rotary platform.
Background
The wafer is a basic material for manufacturing semiconductor chips, the most main raw material of the semiconductor integrated circuit is silicon, therefore, the silicon wafer corresponds to the semiconductor integrated circuit, various circuit element structures can be manufactured on the silicon wafer, and integrated circuit products with specific electrical functions are formed, the technology of the existing ultra-micro display and near-to-eye large screen equipment with the wafer as a core is newer, so that defects possibly exist in the manufacturing process of the wafer, the wafer needs to be subjected to defect detection in order to adjust the manufacturing process in the wafer in time, the wafer needs to be positioned on a rotating platform for detection, the wafer needs to be rotated during detection, the detection of a plurality of sampling points on the surface of the wafer is realized through rotating the wafer, the sampling points are more comprehensive, the detection result is more accurate, the rotation of the platform is performed through a motor in the prior process of rotation, the rotation precision is smaller, the repeated adjustment to an appropriate angle is needed, the detection efficiency is low, and the wafer is difficult to accurately center the wafer because the diameters of the wafer are different, so that the detection result is not accurate.
Disclosure of Invention
The utility model aims at providing a semiconductor wafer detection rotating platform aiming at the existing device, and has the advantages of increasing the rotating precision and facilitating centering and fixing.
The technical aim of the utility model is realized by the following technical scheme: the utility model provides a semiconductor wafer detects rotary platform, includes the bottom plate, the top of bottom plate is equipped with the platform, the embedded framework that installs in top of platform, the top of framework is equipped with the vacuum chuck who runs through to inside, the inside fixed mounting of platform has the air pump, the ventilation hole that the cooperation air pump used has been seted up to the one end of platform, the inside of bottom plate is connected with the connecting rod one that runs through to the top through the bearing rotation, the fixed surface of connecting rod one has cup jointed worm wheel one, the surface engagement of worm wheel one has worm wheel two, the surface engagement of worm wheel two has worm wheel three, the surface engagement of worm wheel three has the worm, the inside of worm wheel two and worm wheel three has fixedly cup jointed connecting rod two and connecting rod three through bearing and the inside rotation of bottom plate respectively, the output of rotating motor has been cup jointed through the shaft coupling to the one end of worm, the equal rotation in both ends at bottom plate top is connected with ball two.
The technical scheme is adopted: when the semiconductor wafer detection rotating platform is used, the wafer is placed on the top of the frame body, the ball is convenient for the wafer to move and adjust on the top of the frame body, the wafer is matched with the centering scale for centering and use, the air pump starts to operate after the wafer is adjusted to a proper position, the vacuum chuck is matched for adsorbing the bottom of the wafer, the vent hole is matched with the air pump for use, thereby fixing the wafer, the centering scale is used for assisting in centering and positioning the wafer, the vacuum chuck and the air pump are matched for facilitating the fixing of the wafer with different diameters, the convenience of use is improved, when the semiconductor wafer detection rotating platform is used, the rotating motor is operated for rotating, make the worm rotate to drive worm wheel three, worm wheel two and worm wheel one in proper order and rotate, connecting rod three and connecting rod two play respectively to worm wheel three, worm wheel two and support and assist its pivoted effect, at last rotate through worm wheel one and will drive the platform and rotate, ball two cooperation platform rotates at the bottom plate top, thereby carry out the detection to the wafer, through the setting of worm wheel three, worm wheel two and worm wheel one, will reduce the rotational speed of rotating the motor in proper order, make the rotation detection to the wafer will have more accuracy, distinguish current needs to adjust to suitable angle repeatedly, bring the promotion for the detection efficiency of wafer through the promotion of rotation accuracy, the louvre cooperation rotates the motor and dispels the heat and use.
The utility model is further arranged that the top of the frame body is rotatably connected with a first ball.
The technical scheme is adopted: the first ball is convenient for the wafer to move and adjust at the top of the frame body.
The utility model is further arranged that the top of the first connecting rod penetrates through the top of the bottom plate and is fixedly connected with the bottom of the platform.
The technical scheme is adopted: the first connecting rod is synchronously connected with the platform through a fixed connection.
The utility model is further arranged that the top of the platform is provided with a centering scale.
The technical scheme is adopted: the centering scale is matched with the wafer for centering and use.
The utility model is further arranged that one side of the bottom plate is provided with a radiating hole matched with the rotary motor for radiating.
The technical scheme is adopted: the heat dissipation hole is matched with the rotary motor to dissipate heat.
In summary, the utility model has the following beneficial effects:
1. when the semiconductor wafer detection rotating platform is used, the wafer is placed at the top of the frame body, the wafer is matched with the centering scale for centering and used, the air pump starts to operate after the wafer is adjusted to a proper position, the air pump is matched with the vacuum chuck to adsorb the bottom of the wafer, the vent hole is matched with the air pump for use, so that the wafer is fixed, the wafer is assisted to be centered through the centering scale, the wafer is conveniently fixed through the matching of the vacuum chuck and the air pump, the wafers with different diameters are conveniently fixed, and the convenience of use is improved;
2. when the rotary platform is used for detecting the semiconductor wafer, the rotary motor is operated to rotate, so that the worm is rotated, the worm wheel III, the worm wheel II and the worm wheel I are sequentially driven to rotate, the connecting rod III and the connecting rod II respectively support the worm wheel III and the worm wheel II and assist the worm wheel III and the worm wheel II to rotate, the platform is driven to rotate through the rotation of the worm wheel I finally, the wafer is detected, the rotation speed of the rotary motor is sequentially reduced through the arrangement of the worm wheel III, the worm wheel II and the worm wheel I, the rotary detection of the wafer is more accurate, the conventional rotary detection device is different from the conventional rotary detection device which needs to be repeatedly adjusted to a proper angle, and the detection efficiency of the wafer is improved through the improvement of the rotary accuracy.
Drawings
FIG. 1 is a schematic elevational view of the structure of the present utility model;
FIG. 2 is a schematic elevational cross-sectional view of the structure of the present utility model;
FIG. 3 is a schematic top view of the structure of the present utility model;
fig. 4 is a schematic top view of the worm of the present utility model in use with a rotary motor.
Reference numerals: 1. a bottom plate; 2. a frame; 3. a vacuum chuck; 4. an air pump; 5. a first ball; 6. a second ball; 7. a vent hole; 8. a platform; 9. a first connecting rod; 10. a second connecting rod; 11. a third connecting rod; 12. a first worm wheel; 13. a second worm wheel; 14. a third worm wheel; 15. a worm; 16. a rotary motor; 17. centering the scale.
Detailed Description
The present utility model will be described in further detail with reference to the accompanying drawings.
Example 1:
referring to fig. 1, fig. 2 and fig. 3, a semiconductor wafer detects rotatory platform, including bottom plate 1, the top of bottom plate 1 is equipped with platform 8, frame 2 is installed to the top of platform 8 is embedded, the top of frame 2 is equipped with and runs through to inside vacuum chuck 3, the inside fixed mounting of platform 8 has air pump 4, ventilation hole 7 that cooperation air pump 4 used has been seted up to the one end of platform 8, the top rotation of frame 2 is connected with ball one 5, ball one 5 is convenient for the wafer remove the adjustment at frame 2 top, centering scale 17 has been seted up at the top of platform 8, centering scale 17 cooperates the wafer to place the use in the middle, when detecting rotatory platform 8 and use in the semiconductor wafer, through placing the wafer in the frame 2 top to cooperate the wafer to place in the middle through centering scale 17, after waiting to adjust to suitable position, cooperation vacuum chuck 3 adsorbs the wafer round bottom, ventilation hole 7 cooperates air pump 4 to use, thereby fix the wafer, place in the middle scale 17 is supplementary to be placed in the middle, use the wafer through centering scale 17 and the cooperation 3 with the vacuum chuck 4 is convenient for use the wafer, the convenience is not increased to the wafer.
The use process is briefly described: when using at semiconductor wafer detects rotary platform, through placing the wafer at framework 2 top, ball 5 is convenient for the wafer and removes the adjustment at framework 2 top, and use is placed in the middle through centering scale 17 cooperation wafer, treat to adjust to the suitable position back, air pump 4 begins the operation, cooperation vacuum chuck 3 adsorbs the wafer bottom, ventilation hole 7 cooperates air pump 4 to use, thereby fix the wafer, place it in the middle through centering scale 17 assistance, be convenient for fix the wafer through the cooperation of vacuum chuck 3 and air pump 4, and be convenient for fix the wafer of different diameters, the convenience of increase use.
Example 2:
referring to fig. 1, 2 and 4, a semiconductor wafer inspection rotary platform comprises a bottom plate 1, wherein a first connecting rod 9 penetrating to the top is rotatably connected in the bottom plate 1 through a bearing, a first worm wheel 12 is fixedly sleeved on the surface of the first connecting rod 9, a second worm wheel 13 is meshed on the surface of the first worm wheel 12, a third worm wheel 14 is meshed on the surface of the second worm wheel 13, a worm 15 is meshed on the surface of the third worm wheel 14, a second connecting rod 10 and a third connecting rod 11 which are rotatably connected in the bottom plate 1 through bearings are fixedly sleeved in the two worm wheels 13 and the third worm wheel 14 respectively, one end of the worm 15 is fixedly sleeved with an output end of a rotary motor 16 through a coupler, two ends of the top of the bottom plate 1 are rotatably connected with a second ball bearing 6, the top of the first connecting rod 9 penetrates to the top of the bottom plate 1 and is fixedly connected with the bottom of a platform 8, the first connecting rod 9 is synchronously connected with the platform 8 through a fixed connection, one side of the bottom plate 1 is provided with a radiating hole matched with the rotary motor 16 for radiating, when the semiconductor wafer detection rotary platform is used, the rotary motor 16 is operated to rotate, so that the worm 15 rotates, the worm wheel three 14, the worm wheel two 13 and the worm wheel one 12 are sequentially driven to rotate, the connecting rod three 11 and the connecting rod two 10 respectively support the worm wheel three 14 and the worm wheel two 13 and assist the worm wheel three 14 and the worm wheel two 13 to rotate, finally the platform 8 is driven to rotate through the rotation of the worm wheel one 12, thereby detecting the wafer, the rotating speed of the rotary motor 16 is sequentially reduced through the arrangement of the worm wheel three 14, the worm wheel two 13 and the worm wheel one 12, the rotation detection of the wafer is more accurate, the existing requirement of repeated adjustment to a proper angle is distinguished, the improvement of the rotation accuracy brings improvement to the detection efficiency of the wafer.
The use process is briefly described: when the semiconductor wafer detection rotary platform is used, the rotation motor 16 is operated to rotate, the worm 15 is enabled to rotate, the worm wheel three 14, the worm wheel two 13 and the worm wheel one 12 are sequentially driven to rotate, the connecting rod three 11 and the connecting rod two 10 respectively support the worm wheel three 14 and the worm wheel two 13 and assist the worm wheel three and the worm wheel two 13 to rotate, finally the platform 8 is driven to rotate through the rotation of the worm wheel one 12, the ball two 2 is matched with the platform 8 to rotate at the top of the bottom plate 1, so that the wafer is detected, the rotation speed of the rotation motor 16 is sequentially reduced through the arrangement of the worm wheel three 14, the worm wheel two 13 and the worm wheel one 12, the wafer rotation detection is enabled to be more accurate, the existing detection device is different from the existing device which needs to be repeatedly adjusted to a proper angle, the detection efficiency of the wafer is improved through the improvement of the rotation accuracy, and the heat dissipation hole is matched with the rotation motor 16 to dissipate heat.
The present embodiment is only for explanation of the present utility model and is not to be construed as limiting the present utility model, and modifications to the present embodiment, which may not creatively contribute to the present utility model as required by those skilled in the art after reading the present specification, are all protected by patent laws within the scope of claims of the present utility model.
Claims (5)
1. The utility model provides a semiconductor wafer detects rotary platform, includes bottom plate (1), its characterized in that: the top of bottom plate (1) is equipped with platform (8), embedded framework (2) of installing in top of platform (8), the top of framework (2) is equipped with and runs through vacuum chuck (3) to inside, the inside fixed mounting of platform (8) has air pump (4), ventilation hole (7) that cooperation air pump (4) used have been seted up to the one end of platform (8), the inside of bottom plate (1) is connected with connecting rod one (9) that runs through to the top through the bearing rotation, the fixed surface of connecting rod one (9) cup joints worm wheel one (12), the surface engagement of worm wheel one (12) has worm wheel two (13), the surface engagement of worm wheel two (13) has worm wheel three (14), the surface engagement of worm wheel three (14) has worm (15), the inside of worm wheel two (13) and worm wheel three (14) has fixedly cup jointed respectively and has connecting rod two (10) and connecting rod three (11) that are connected through bearing and bottom plate (1) inside rotation, the one end of worm (15) has cup jointed output end (16) through the shaft coupling, the both ends of rolling ball (1) have two (6) of rolling.
2. The semiconductor wafer inspection rotating platform of claim 1, wherein: the top of the frame body (2) is rotatably connected with a first ball (5).
3. The semiconductor wafer inspection rotating platform of claim 1, wherein: the top of the first connecting rod (9) penetrates through the top of the bottom plate (1) and is fixedly connected with the bottom of the platform (8).
4. The semiconductor wafer inspection rotating platform of claim 1, wherein: the top of the platform (8) is provided with a centering scale (17).
5. The semiconductor wafer inspection rotating platform of claim 1, wherein: one side of the bottom plate (1) is provided with a radiating hole matched with the rotary motor (16) for radiating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202320521869.5U CN219946110U (en) | 2023-03-17 | 2023-03-17 | Semiconductor wafer detects rotary platform |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202320521869.5U CN219946110U (en) | 2023-03-17 | 2023-03-17 | Semiconductor wafer detects rotary platform |
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Publication Number | Publication Date |
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CN219946110U true CN219946110U (en) | 2023-11-03 |
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CN202320521869.5U Active CN219946110U (en) | 2023-03-17 | 2023-03-17 | Semiconductor wafer detects rotary platform |
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CN (1) | CN219946110U (en) |
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2023
- 2023-03-17 CN CN202320521869.5U patent/CN219946110U/en active Active
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