CN219657513U - Wafer surface defect detection equipment - Google Patents
Wafer surface defect detection equipment Download PDFInfo
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- CN219657513U CN219657513U CN202320121098.0U CN202320121098U CN219657513U CN 219657513 U CN219657513 U CN 219657513U CN 202320121098 U CN202320121098 U CN 202320121098U CN 219657513 U CN219657513 U CN 219657513U
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- dust
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- fixedly connected
- surface defect
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- 238000001514 detection method Methods 0.000 title claims abstract description 74
- 230000007547 defect Effects 0.000 title claims abstract description 22
- 230000007246 mechanism Effects 0.000 claims description 50
- 239000004744 fabric Substances 0.000 claims description 44
- 230000001681 protective effect Effects 0.000 claims description 31
- 238000004140 cleaning Methods 0.000 claims description 23
- 238000007689 inspection Methods 0.000 claims description 7
- 239000000428 dust Substances 0.000 abstract description 21
- 235000012431 wafers Nutrition 0.000 description 39
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
The utility model belongs to the field of wafer detection equipment, in particular to wafer surface defect detection equipment, aiming at the problem that the existing detection lens is exposed to the outside, dust is adsorbed on the lens and accumulated for a long time, so that the detection lens can be influenced to detect a wafer.
Description
Technical Field
The utility model relates to the technical field of wafer detection equipment, in particular to wafer surface defect detection equipment.
Background
Wafer refers to a silicon wafer used for manufacturing silicon semiconductor circuits, the original material of which is silicon. The high-purity polycrystalline silicon is dissolved and then doped with silicon crystal seed, and then slowly pulled out to form cylindrical monocrystalline silicon. The silicon ingot is ground, polished, and sliced to form a silicon wafer, i.e., a wafer. The wafer needs to be inspected during the wafer production process.
Through retrieving, bulletin number CN217059905U discloses a wafer appearance defect rapid detection device, which comprises a base, a frame and a wafer seat, wherein the base is provided with a lamp groove and a control panel, an LED lamp group is arranged in the lamp groove, the frame and the wafer seat are respectively arranged on the base, a detection lens and an XY movable shaft are arranged on the frame, the detection lens is arranged on the XY movable shaft, the wafer seat is arranged above the LED lamp group and below the detection lens, the wafer seat is provided with two slide rails, a connecting seat and a clamping seat, the slide rails are arranged on the base on two sides of the lamp groove, the connecting seat is provided with two slide rails and is connected with the two slide rails, the clamping seat is respectively arranged on the two connecting seats and is used for fixing a wafer plate, the wafer plate is provided with wafers to be detected, and the control panel is respectively connected with the LED lamp group, the detection lens and the XY movable shaft. The wafer seat for fixing the wafer is arranged, the appearance of the wafer can be rapidly detected by replacing human eyes with the detection lens, the detection efficiency is improved, and the wafer is protected from being damaged easily. The following problems exist in the technical scheme:
the detection lens is exposed to the outside, and dust is adsorbed on the lens due to the fact that the dust is contained in the air, and the dust can be accumulated after the time, so that the detection lens can be influenced to detect the wafer;
in view of the above problems, the present disclosure provides a wafer surface defect detecting apparatus.
Disclosure of Invention
The utility model provides wafer surface defect detection equipment, which solves the defect that in the prior art, a detection lens is exposed to the outside, dust is adsorbed on the lens due to the fact that the dust is contained in air, and the dust is accumulated for a long time, so that the detection lens can be influenced to detect a wafer.
The utility model provides the following technical scheme:
the wafer surface defect detection equipment comprises an equipment main body, wherein the equipment main body comprises an organic table, a support frame, a fixing plate, a detection lens, a control panel, an LED lamp group, a sliding rail and a connecting seat, the four corners of the bottom of the support frame are respectively and fixedly connected with the four corners of the top of the table, the bottom of the fixing plate is fixedly connected with the top of the support frame, the detection lens is arranged at the bottom of the fixing plate, the control panel, the LED lamp group and the sliding rail are arranged at the top of the table, and the connecting seat is arranged on the sliding rail;
the dustproof mechanism is arranged at the bottom of the fixed plate and used for dustproof the detection lens;
the cleaning mechanism is arranged on the dustproof mechanism and used for cleaning the detection lens;
the fixing mechanism is arranged on the dustproof mechanism and used for fixing the cleaning mechanism.
In one possible design, dustproof mechanism is including being used for carrying out dirt-proof L type safety cover, pull board and the bolt to detecting the camera lens, L type safety cover passes through the bottom of bolt fastening at the fixed plate, it is located L type safety cover to detect the camera lens, the opening has been seted up to the bottom of L type safety cover, rectangular mouth has been seted up to one side of L type safety cover, the both sides of pull board respectively with the both sides inner wall sliding connection of L type safety cover, one side fixedly connected with of pull board is convenient for the handle of pull board pull.
In one possible design, the cleaning mechanism comprises a base plate and dust-free cloth for cleaning the detection lens, wherein the bottom of the base plate is fixedly connected with one side of the top of the drawing plate, the dust-free cloth is placed at the top of the base plate, and the dust-free cloth is attached to the lens of the detection lens.
In one possible design, the fixing mechanism comprises a screw, a short plate and a clamping plate, wherein the bottom of the short plate is fixedly connected with the top of the drawing plate, the screw is in threaded connection with the short plate, the bottom of the clamping plate is in sliding connection with the top of the drawing plate, one end of the screw is rotationally connected with one side of the clamping plate, and the fixing mechanism is in two groups.
In one possible design, two support bars are arranged in the L-shaped protective cover, and two sides of the support bars are fixedly connected with two side inner walls of the L-shaped protective cover respectively.
In one possible design, the top of the L-shaped protection cover is fixedly connected with a concave circular plate, and a collecting barrel for collecting dust-free cloth is arranged in the concave circular plate.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the utility model as claimed.
In the utility model, because the L-shaped protective cover and the drawing plate are arranged, the drawing plate can be pushed into the L-shaped protective cover when the wafer is not required to be detected, so that dust can be prevented from drifting on the lens of the detection lens, and the dustproof effect is achieved;
in the utility model, as the dust-free cloth is arranged, the dust-free cloth can clean the lens of the detection lens, so that dust on the detection lens is erased, and the detection lens is cleaned;
in the utility model, the two screws are twisted inwards, the rotation of the screws drives the clamping plates to move, and the two ends of the dust-free cloth are clamped and fixed through the two clamping plates, so that the dust-free cloth can be fixed;
the utility model has reasonable structure, can prevent dust from drifting onto the lens of the detection lens through the dustproof mechanism, can clean the detection lens through the cleaning mechanism, can fix the dust-free cloth through the fixing mechanism, and is convenient to replace.
Drawings
FIG. 1 is a schematic diagram of a front view of a wafer surface defect inspection apparatus according to an embodiment of the present utility model;
FIG. 2 is a schematic diagram of a dust-proof mechanism of a wafer surface defect detecting apparatus according to an embodiment of the present utility model;
FIG. 3 is a schematic diagram illustrating an inner structure of an L-shaped protection cover of a wafer surface defect detecting apparatus according to an embodiment of the present utility model;
FIG. 4 is a schematic diagram illustrating a pulling-out state of a pulling plate of a wafer surface defect inspection apparatus according to an embodiment of the present utility model;
fig. 5 is an enlarged schematic view of a portion a of a wafer surface defect detecting apparatus according to an embodiment of the present utility model.
Reference numerals:
1. a machine table; 2. a support frame; 3. a fixing plate; 4. an L-shaped protective cover; 5. a collecting barrel; 6. a bolt; 7. a drawing plate; 8. a concave circular plate; 9. a support bar; 10. a backing plate; 11. dust-free cloth; 12. detecting a lens; 13. a screw; 14. a short plate; 15. and (3) clamping plates.
Detailed Description
Embodiments of the present utility model will be described below with reference to the accompanying drawings in the embodiments of the present utility model.
In describing embodiments of the present utility model, it should be noted that, unless explicitly stated and limited otherwise, the terms "coupled" and "mounted" should be interpreted broadly, and for example, "coupled" may or may not be detachably coupled; may be directly connected or indirectly connected through an intermediate medium. In addition, "communication" may be direct communication or may be indirect communication through an intermediary. Wherein, "fixed" means that the relative positional relationship is not changed after being connected to each other. References to orientation terms, such as "inner", "outer", "top", "bottom", etc., in the embodiments of the present utility model are merely to refer to the orientation of the drawings and, therefore, the use of orientation terms is intended to better and more clearly illustrate and understand the embodiments of the present utility model, rather than to indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be construed as limiting the embodiments of the present utility model.
In embodiments of the present utility model, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature.
In the embodiment of the present utility model, "and/or" is merely an association relationship describing an association object, and indicates that three relationships may exist, for example, a and/or B may indicate: a exists alone, A and B exist together, and B exists alone. In addition, the character "/" herein generally indicates that the front and rear associated objects are an "or" relationship.
Reference in the specification to "one embodiment" or "some embodiments" or the like means that a particular feature, structure, or characteristic described in connection with the embodiment is included in one or more embodiments of the utility model. Thus, appearances of the phrases "in one embodiment," "in some embodiments," "in other embodiments," and the like in the specification are not necessarily all referring to the same embodiment, but mean "one or more but not all embodiments" unless expressly specified otherwise. The terms "comprising," "including," "having," and variations thereof mean "including but not limited to," unless expressly specified otherwise.
Example 1
Referring to fig. 1-5, a wafer surface defect detection device comprises a device main body, wherein the device main body comprises an organic table 1, a support frame 2, a fixing plate 3, a detection lens 12, a control panel, an LED lamp group, a sliding rail and a connecting seat, the four corners of the bottom of the support frame 2 are respectively and fixedly connected with the four corners of the top of the table 1, the bottom of the fixing plate 3 is fixedly connected with the top of the support frame 2, the detection lens 12 is arranged at the bottom of the fixing plate 3, the control panel, the LED lamp group and the sliding rail are all arranged at the top of the table 1, and the connecting seat is arranged on the sliding rail;
a dust-proof mechanism provided at the bottom of the fixed plate 3 for dust-proof of the detection lens 12;
a cleaning mechanism provided on the dust-proof mechanism for cleaning the detection lens 12;
the fixing mechanism is arranged on the dustproof mechanism and used for fixing the cleaning mechanism.
According to the technical scheme, dust can be prevented from drifting onto the lens of the detection lens 12 through the dust prevention mechanism, the detection lens 12 can be cleaned through the cleaning mechanism, the dust-free cloth 11 can be fixed through the fixing mechanism, and the dust-free cloth is convenient to replace.
Referring to fig. 1-4, the dustproof mechanism comprises an L-shaped protective cover 4 for dustproof the detection lens 12, a drawing plate 7 and a bolt 6, wherein the L-shaped protective cover 4 is fixed at the bottom of the fixed plate 3 through the bolt 6, the detection lens 12 is positioned in the L-shaped protective cover 4, an opening is formed in the bottom of the L-shaped protective cover 4, a long opening is formed in one side of the L-shaped protective cover 4, two sides of the drawing plate 7 are respectively in sliding connection with two side inner walls of the L-shaped protective cover 4, and a handle which is convenient for drawing the drawing plate 7 is fixedly connected to one side of the drawing plate 7.
According to the technical scheme, the L-shaped protective cover 4 and the drawing plate 7 can push the drawing plate 7 into the L-shaped protective cover 4 when the wafer does not need to be detected, so that dust can be prevented from drifting on the lens of the detection lens 12, and a dustproof effect is achieved.
Referring to fig. 3 and 5, the cleaning mechanism includes a pad 10 and a dust-free cloth 11 for cleaning the inspection lens 12, the bottom of the pad 10 is fixedly connected with one side of the top of the drawing plate 7, the dust-free cloth 11 is placed on the top of the pad 10, and the dust-free cloth 11 is attached to the lens of the inspection lens 12.
According to the technical scheme, the dust-free cloth 11 can clean the lens of the detection lens 12, so that dust on the detection lens 12 is erased, and the detection lens 12 is cleaned.
Referring to fig. 5, the fixing mechanism includes a screw 13, a short plate 14 and a clamping plate 15, the bottom of the short plate 14 is fixedly connected with the top of the drawing plate 7, the screw 13 is in threaded connection with the short plate 14, the bottom of the clamping plate 15 is slidably connected with the top of the drawing plate 7, one end of the screw 13 is rotatably connected with one side of the clamping plate 15, and the fixing mechanisms are two groups.
According to the technical scheme, the two screws 13 are twisted inwards, the clamping plates 15 are driven to move by the rotation of the screws 13, and the two ends of the dust-free cloth 11 are clamped and fixed through the two clamping plates 15, so that the dust-free cloth 11 can be fixed.
Example 2
Referring to fig. 1-5, a wafer surface defect detection device comprises a device main body, wherein the device main body comprises an organic table 1, a support frame 2, a fixing plate 3, a detection lens 12, a control panel, an LED lamp group, a sliding rail and a connecting seat, the four corners of the bottom of the support frame 2 are respectively and fixedly connected with the four corners of the top of the table 1, the bottom of the fixing plate 3 is fixedly connected with the top of the support frame 2, the detection lens 12 is arranged at the bottom of the fixing plate 3, the control panel, the LED lamp group and the sliding rail are all arranged at the top of the table 1, and the connecting seat is arranged on the sliding rail;
a dust-proof mechanism provided at the bottom of the fixed plate 3 for dust-proof of the detection lens 12;
a cleaning mechanism provided on the dust-proof mechanism for cleaning the detection lens 12;
the fixing mechanism is arranged on the dustproof mechanism and used for fixing the cleaning mechanism.
According to the technical scheme, dust can be prevented from drifting onto the lens of the detection lens 12 through the dust prevention mechanism, the detection lens 12 can be cleaned through the cleaning mechanism, the dust-free cloth 11 can be fixed through the fixing mechanism, and the dust-free cloth is convenient to replace.
Referring to fig. 1-4, the dustproof mechanism comprises an L-shaped protective cover 4 for dustproof the detection lens 12, a drawing plate 7 and a bolt 6, wherein the L-shaped protective cover 4 is fixed at the bottom of the fixed plate 3 through the bolt 6, the detection lens 12 is positioned in the L-shaped protective cover 4, an opening is formed in the bottom of the L-shaped protective cover 4, a long opening is formed in one side of the L-shaped protective cover 4, two sides of the drawing plate 7 are respectively in sliding connection with two side inner walls of the L-shaped protective cover 4, and a handle which is convenient for drawing the drawing plate 7 is fixedly connected to one side of the drawing plate 7.
According to the technical scheme, the L-shaped protective cover 4 and the drawing plate 7 can push the drawing plate 7 into the L-shaped protective cover 4 when the wafer does not need to be detected, so that dust can be prevented from drifting on the lens of the detection lens 12, and a dustproof effect is achieved.
Referring to fig. 3 and 5, the cleaning mechanism includes a pad 10 and a dust-free cloth 11 for cleaning the inspection lens 12, the bottom of the pad 10 is fixedly connected with one side of the top of the drawing plate 7, the dust-free cloth 11 is placed on the top of the pad 10, and the dust-free cloth 11 is attached to the lens of the inspection lens 12.
According to the technical scheme, the dust-free cloth 11 can clean the lens of the detection lens 12, so that dust on the detection lens 12 is erased, and the detection lens 12 is cleaned.
Referring to fig. 5, the fixing mechanism includes a screw 13, a short plate 14 and a clamping plate 15, the bottom of the short plate 14 is fixedly connected with the top of the drawing plate 7, the screw 13 is in threaded connection with the short plate 14, the bottom of the clamping plate 15 is slidably connected with the top of the drawing plate 7, one end of the screw 13 is rotatably connected with one side of the clamping plate 15, and the fixing mechanisms are two groups.
According to the technical scheme, the two screws 13 are twisted inwards, the clamping plates 15 are driven to move by the rotation of the screws 13, and the two ends of the dust-free cloth 11 are clamped and fixed through the two clamping plates 15, so that the dust-free cloth 11 can be fixed.
Referring to fig. 3 and 4, two support bars 9 are arranged in the L-shaped protective cover 4, and two sides of the two support bars 9 are fixedly connected with two side inner walls of the L-shaped protective cover 4 respectively.
The support bar 9 can support the drawing plate 7.
Referring to fig. 1 and 2, a concave circular plate 8 is fixedly connected to the top of the l-shaped protection cover 4, and a collecting tub 5 for collecting dust-free cloth 11 is placed in the concave circular plate 8.
The collecting barrel 5 can collect the dust-free cloth 11 after use.
The working principle and the using flow of the technical scheme are as follows: because the L-shaped protective cover 4 and the pull plate 7 are arranged, the pull plate 7 can be pushed into the L-shaped protective cover 4 when the wafer is not required to be detected, dust can be prevented from floating on the lens of the detection lens 12, the dust prevention effect is achieved, when the wafer is detected, the handle is pulled, the pull plate 7 is pulled outwards to leak the detection lens 12, when the dust-free cloth 11 is pulled, the dust-free cloth 11 can clean the lens of the detection lens 12, dust on the detection lens 12 is erased, the detection lens 12 is cleaned, when the wafer is not required to be detected, the pull plate 7 is pushed into the L-shaped protective cover 4, the lens of the detection lens 12 is cleaned again, when the dust-free cloth 11 is required to be replaced, the pull plate 7 is pulled outwards, the pull plate 7 is completely pulled out of the L-shaped protective cover 4, the two screws 13 are twisted outwards respectively, the rotation of the screws 13 drives the clamping plates 15 to move, the two clamping plates 15 are separated from fixing the dust-free cloth 11, the dust-free cloth 11 is taken down, the used dust-free cloth 11 is placed in the collecting barrel 5 to be collected, the new dust-free cloth 11 is taken out and is flatly paved on the base plate 10, the width of the dust-free cloth 11 is the same as that of the base plate 10, the length of the dust-free cloth is larger than that of the base plate 10, two ends of the dust-free cloth 11 leak out of two sides of the base plate 10, the two screws 13 are twisted inwards respectively, the rotation of the screws 13 drives the clamping plates 15 to move, the two ends of the dust-free cloth 11 are clamped and fixed through the two clamping plates 15, the dust-free cloth 11 can be fixed, the drawing plate 7 is pushed into the L-shaped protective cover 4, and the support bar 9 can support the drawing plate 7 due to the arrangement of the support bar 9.
The present utility model is not limited to the above embodiments, and any person skilled in the art can easily think about the changes or substitutions within the technical scope of the present utility model, and the changes or substitutions are intended to be covered by the scope of the present utility model; embodiments of the utility model and features of the embodiments may be combined with each other without conflict. Therefore, the protection scope of the utility model is subject to the protection scope of the claims.
Claims (6)
1. A wafer surface defect inspection apparatus, comprising:
the device comprises a device body, wherein the device body comprises an organic table (1), a supporting frame (2), a fixing plate (3), a detection lens (12), a control panel, an LED lamp set, a sliding rail and a connecting seat, four corners of the bottom of the supporting frame (2) are fixedly connected with four corners of the top of the machine table (1) respectively, the bottom of the fixing plate (3) is fixedly connected with the top of the supporting frame (2), the detection lens (12) is arranged at the bottom of the fixing plate (3), the control panel, the LED lamp set and the sliding rail are arranged at the top of the machine table (1), and the connecting seat is arranged on the sliding rail;
the dustproof mechanism is arranged at the bottom of the fixed plate (3) and used for dustproof the detection lens (12);
the cleaning mechanism is arranged on the dustproof mechanism and used for cleaning the detection lens (12);
the fixing mechanism is arranged on the dustproof mechanism and used for fixing the cleaning mechanism.
2. The wafer surface defect detection device according to claim 1, wherein the dustproof mechanism comprises an L-shaped protection cover (4), a drawing plate (7) and bolts (6) for dustproof detection lenses (12), the L-shaped protection cover (4) is fixed at the bottom of the fixing plate (3) through the bolts (6), the detection lenses (12) are positioned in the L-shaped protection cover (4), an opening is formed in the bottom of the L-shaped protection cover (4), a long opening is formed in one side of the L-shaped protection cover (4), two sides of the drawing plate (7) are respectively connected with two side inner walls of the L-shaped protection cover (4) in a sliding mode, and a handle which is convenient for drawing the drawing plate (7) is fixedly connected to one side of the drawing plate (7).
3. The wafer surface defect detecting device according to claim 1, wherein the cleaning mechanism comprises a base plate (10) and dust-free cloth (11) for cleaning the detecting lens (12), the bottom of the base plate (10) is fixedly connected with one side of the top of the drawing plate (7), the dust-free cloth (11) is placed at the top of the base plate (10), and the dust-free cloth (11) is attached to the lens of the detecting lens (12).
4. The wafer surface defect detecting device according to claim 1, wherein the fixing mechanism comprises a screw rod (13), a short plate (14) and clamping plates (15), the bottom of the short plate (14) is fixedly connected with the top of the drawing plate (7), the screw rod (13) is in threaded connection with the short plate (14), the bottom of the clamping plates (15) is in sliding connection with the top of the drawing plate (7), one end of the screw rod (13) is rotatably connected with one side of the clamping plates (15), and the fixing mechanism is divided into two groups.
5. The wafer surface defect detection device according to claim 2, wherein two supporting bars (9) are arranged in the L-shaped protective cover (4), and two sides of the two supporting bars (9) are fixedly connected with two side inner walls of the L-shaped protective cover (4) respectively.
6. The wafer surface defect detection device according to claim 2, wherein a concave circular plate (8) is fixedly connected to the top of the L-shaped protective cover (4), and a collecting barrel (5) for collecting dust-free cloth (11) is placed in the concave circular plate (8).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320121098.0U CN219657513U (en) | 2023-01-16 | 2023-01-16 | Wafer surface defect detection equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320121098.0U CN219657513U (en) | 2023-01-16 | 2023-01-16 | Wafer surface defect detection equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219657513U true CN219657513U (en) | 2023-09-08 |
Family
ID=87876088
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320121098.0U Active CN219657513U (en) | 2023-01-16 | 2023-01-16 | Wafer surface defect detection equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219657513U (en) |
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2023
- 2023-01-16 CN CN202320121098.0U patent/CN219657513U/en active Active
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