CN219575601U - 基板吸盘以及基板清洗装置 - Google Patents

基板吸盘以及基板清洗装置 Download PDF

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CN219575601U
CN219575601U CN202320187078.3U CN202320187078U CN219575601U CN 219575601 U CN219575601 U CN 219575601U CN 202320187078 U CN202320187078 U CN 202320187078U CN 219575601 U CN219575601 U CN 219575601U
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孙准晧
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Abstract

本实用新型涉及基板吸盘以及基板清洗装置，所述基板吸盘用于以放置于其上表面的状态固定基板，其包括：定盘；吸附膜，其由可弹性变形的柔性材料构成，且以覆盖用于放置基板的区域即所述定盘的上表面的形态设置；压力调节部，其用于向所述吸附膜的下部施加吸入压力。通过利用可弹性变形的柔性材料的吸附膜覆盖用于放置基板的放置区域即定盘的上表面，并向所述吸附膜下部施加吸入压力，使吸附膜与基板之间形成真空空间，以把持基板，从而能够防止液态物质流入基板吸盘内部。

Description

基板吸盘以及基板清洗装置
技术领域
本实用新型涉及基板吸盘，更具体地，涉及一种基板清洗工艺中用于防止液体流入基板吸盘内部的基板吸盘。
背景技术
基板处理工艺可包括在基板固定于基板吸盘的状态下，利用旋转的垫状物对基板表面进行擦拭或者细微研磨的工艺。
所述基板处理工艺通过在如图1和图2所示的基板吸盘10上吸附并固定基板W的状态下，利用清洗单元20的垫状物21与基板W摩擦来进行。
其中，现有的基板吸盘10中基板放置表面10s上形成有用于施加吸入压力的多个吸入孔11，吸入孔11通过气压通道12与负压施加部V连接，基于负压施加部V施加的吸入压力55将基板W定位于基板吸盘10的放置表面。
然而，如图2所示，基板处理工艺是通过处理液供给部30向基板W提供清洗液或者浆液等液态物质的同时进行的，在基板W从放置表面10s分离的状态下，可能会出现液态物质渗入到吸入孔11的情况。
如果液体物质渗入吸入孔11，则会引起设置于负压施加部V的真空空间泵发生故障。为了防止该问题发生，需要在基板吸盘10上额外设置气液分离器，但是，设置气液分离器会导致基板吸盘10的制造成本增加，因此不够理想。
因此，亟需一种牢固地把持基板W的同时还能够本质上防止基板处理工艺中使用的液体物质渗入的方案。
实用新型内容
技术问题
本实用新型是在上述技术背景下提出的，其目的在于，提供一种基板吸盘，其能够防止基板处理工艺中基板上使用的液体渗入到内部。
此外，本实用新型的目的在于，不仅能够提高基板的把持可靠性，而且能够将基板从基板吸盘的放置表面安全地分离。
技术方案
为了实现上述目的，本实用新型提供一种基板吸盘及具有其的基板清洗装置，对定盘上表面的用于放置基板的放置区域，利用可弹性变形的柔性材料的吸附膜覆盖定盘的上表面，向所述吸附膜的下部施加吸入压力，使吸附膜与基板之间形成真空空间，以把持基板。
本实用新型的基板吸盘，用于以放置于其上表面的状态固定基板，其特征在于，包括：定盘；吸附膜，其由可弹性变形的柔性材料构成，且以覆盖用于放置基板的区域即所述定盘的上表面的形态设置；压力调节部，其用于向所述吸附膜的下部施加吸入压力。
其特征在于，所述压力调节部使所述吸附膜的部分区域朝下方弹性变形以在所述基板与所述吸附膜之间形成真空，从而固定所述基板。
其特征在于，所述定盘的上表面设置有用于在所述吸附膜的底面形成空余空间的空间部，所述压力调节部通过向所述空间部施加吸入压力，使所述吸附膜在所述空间部朝下方弹性变形。
其特征在于，形成有多个所述空间部。
其特征在于，所述空间部形成为多个同心圆形态。
其特征在于，在所述定盘形成有与多个所述空间部连通的空气腔室。
其特征在于，进一步包括用于使所述定盘旋转的驱动马达。
其特征在于，所述定盘形成有气压通道，所述气压通道从所述压力调节部以贯通所述定盘的旋转中心的至少一部分的方式延伸。
其特征在于，在所述定盘的所述气压通道的末端与所述驱动马达之间具有旋转密封件，以使所述气压通道与外部之间保持密封状态。
其特征在于，所述空间部以所述吸附膜的中心为基准对称配置。
其特征在于，所述压力调节部通过施加正压使所述吸附膜朝上方凸起，以从所述吸附膜分离所述基板。
其特征在于，在所述定盘的边缘设置有多个用于将所述吸附膜向上顶起的顶针。
其特征在于，在所述空间部设置有用于感测所述吸附膜朝下方凸起的位移的传感器。
其特征在于，所述传感器被弹簧弹性支持，并与所述吸附膜的底面接触，用于感测是否达到预设的位移。
本实用新型的基板清洗装置包括：上述基板吸盘；清洗单元，其用于清洗基板的上表面，所述基板放置并定位于所述基板吸盘的吸附膜的上表面。
本说明书和权利要求书中记载的“横方向”及其类似术语的定义是指垂直于重力方向的水平方向。
本说明书和权利要求书中记载的“上下方向”及其类似术语的定义是指重力方向。
有益效果
根据本实用新型，通过利用可弹性变形的柔性材料的吸附膜完全覆盖用于放置基板的基板吸盘的表面，并向吸附膜下侧的施加吸入压力，使吸附膜与基板之间形成真空空间，以把持基板，从而能够获得彻底防止液态物质流入基板吸盘内部的效果。
附图说明
图1是一般基板吸盘的结构立体图。
图2是采用图1的基板吸盘的基板清洗装置的结构纵截面图。
图3是根据本实用新型一实施例的基板吸盘的结构纵截面图。
图4是图3的基板吸盘的放置表面中放置有基板的状态图。
图5是把持图3的基板吸盘的放置表面上放置的基板的状态图。
图6是具有图3的基板吸盘的基板清洗装置的结构图。
图7是基板处理工艺结束后将基板从基板吸盘分离的结构图。
图8是图5的A音部分的放大图。
图9a是沿着图3的X-X切线的横截面图。
图9b是沿图3的X-X切线的横截面所对应的本实用新型另一实施例的结构图。
图10是沿图3的X-X切线的横截面所对应的本实用新型又一实施例的结构图。
【附图标记】
W：基板 1：基板清洗装置
100：基板吸盘 110：定盘
111：气压通道 112：空间部
116：空气腔室 118：顶针
120：吸附膜 130：驱动马达
139：旋转密封部件 140：传感器
150：支撑台 160：压力调节部
具体实施方式
下面，参照附图对本实用新型的优选实施例进行详细说明，但是本实用新型并不受该实施例限制。作为参考，本说明书中相同的附图标记实质上是指相同的构成要素，基于这种规则，可引用其它附图中记载的内容进行说明，对于本技术领域的技术人员而言，如果认为是显而易见的内容或者重复的内容则可以省略。
根据本实用新型一实施例的基板吸盘100包括：定盘110，其具有空间部112且上表面为平坦状，空间部112为部分区域朝上方开放的空余空间；吸附膜120，其使用可弹性变形的柔性材料以覆盖所述定盘的上表面的形态设置在用于放置基板W的放置区域上；驱动马达130，其用于使定盘110旋转；传感器140，其用于感测所述吸附膜的弹性变形状态；支撑台150，其用于支撑基于驱动马达130旋转的定盘110；压力调节部160，其向空间部112提供负压V1或者正压P1。
其中，基板W包括各种形态的基板，而且包括由用于制造半导体封装件等的晶圆、玻璃等材料形成的基板。
所述定盘110通过与支撑台150之间由轴承等构成的旋转支撑部155，能够以重力方向的旋转轴91为中心旋转，如图9a所示，其具有圆形横截面。
定盘110的上表面为平坦面，也可以以与吸附膜120的底面紧贴的状态设置在用于放置基板W的放置区域。定盘110优选由高硬度的材料形成，例如，可由钢材等金属材料形成。
定盘110的上表面具有空间部112，以允许吸附膜120能够进行朝下方凸出的弹性变形，空间部112为形成于吸附膜120下侧的空余空间。优选地，空间部112以截面相当于基板W的部分面积的方式形成多个，并以位于吸附膜120中心的旋转轴为中心对称地配置多个，从而能够在基板W的多个位置上把持基板W。如图9a所示，空间部112还可以形成在相隔的多个位置上，如图9b所示，空间部112还可以以多个环形形状形成。
图中示出的实施例中，虽然旋转轴91的位置上未形成空间部112，但是根据本实用新型的另一实施形态，旋转轴91的位置上也可以形成另一空间部112。
在空间部112的重力方向的下侧，以与旋转轴垂直的横方向上具有较宽的开放截面的形态，形成有与多个空间部112连通的空气腔室116。因此，通过调节空气腔室116的压力，能够均匀地控制多个空间部112的压力。
此外，气压通道111从压力调节部160至空气腔室116沿着定盘110的旋转轴91延伸形成。由于气压通道111沿着定盘110的旋转轴91形成，即使定盘110旋转，也能够容易且准确地将计划的气压传递至空间部112。附图中虽未图示，根据本实用新型的另一实施形态，气压通道111还可以配置于与定盘110的旋转轴91径向相隔的位置上，气压通道111的一部分还可以以贯通定盘110旋转轴91的形态配置。
所述吸附膜120以完全覆盖用于放置基板W的放置区域即定盘110的平坦上表面的形态形成。吸附膜120上未形成有贯通孔，由可弹性变形的柔性材料形成，且由容易紧贴的材料形成。例如，可由橡胶材料或者聚氨酯等材料形成。
吸附膜120可通过各种方式固定在定盘110上，如图所示，吸附膜120可以以其半径的末端部包裹定盘110的外周侧面并插入的形态固定。还可以利用固定螺栓将吸附膜120牢固地固定在定盘110上。
所述驱动马达130设置为驱动定盘110旋转。驱动马达130的设置方式可以有多种方式，如图所示，在定盘110的重力方向的下侧，驱动马达130的转子132可与定盘110的底面连接。附图虽未图示，根据本实用新型的另一实施形态，驱动马达130的转子也可以与定盘110的外周面连接，还可以以皮带、链条、齿轮等动力传递手段作为媒介驱动定盘110旋转。
由于驱动马达130的包括定子133在内的盒体134以非旋转状态设置，因此可利用支架138固定于非旋转状态的支撑台150。此外，驱动马达130的转子中心设置为与定盘110的旋转轴91保持一致，由于气压通道111沿着定盘110的旋转轴91设置，因此驱动马达130的转子132上形成有与气压通道111连通的中空部132a。
在转子132的重力方向下端部与盒体134之间设置有旋转密封部件(rotary seal)139，与气压通道111连通的盒体134的下端部设置有用于将气压通道111与外气隔离且与压力调节部160的气压管道结合的盖子134a。
所述压力调节部160可通过驱动马达130的转子中空部132a、气压通道111及空气腔室116来调节空间部112的压力。
具体地，如果基板W放置到基板吸盘100的吸附膜120上表面77(图3和图4)，则压力调节部160吸入气压通道111和空气腔室116内的空气55，以使空气腔室116内的压力达到预设的负压V1。由于多个空间部112与空气腔室116连通，因此多个空间部112的压力也变为与空气腔室116的负压V1相同的状态。
由此，如图5和图8所示，以紧贴状态覆盖定盘110的平坦的上表面110s的吸附膜120中，覆盖空间部112的部分发生朝下方凸出的弹性变形120d1。相反地，弯曲强度远大于吸附膜120的基板W不会发生朝下方的弯曲变形，因此在空间部112所处位置，基板W与吸附膜120之间形成真空空间99。
因此，吸附膜120在定盘110的相当于空间部112上侧的一部分区域朝下方弹性变形，同时基板W与吸附膜120之间形成真空空间99，基板W通过与吸附膜120之间形成的真空空间99，牢固地固定在吸附膜120上。与此同时，吸附膜120为无缝且完全覆盖平坦的定盘上表面110s的状态，从而能够获得彻底排除液体流入基板吸盘100内部的可能性的效果。
另外，所述传感器140设置于定盘110的空间部112，用于感测吸附膜120为了把持基板W而朝下方凸出的位移是否达到预设值。
具体为，为了牢固地把持基板W，各空间部112中需要形成足够大的真空空间99。为此，如果基于来自压力调节部160的负压V1，吸附膜120在空间部112中发生朝下方凸出的弹性变形120d1，则如图8所示，设置于空间部112的传感器140感测吸附膜120朝下方凸出的位移量是否达到预设值。
其中，传感器140可包括探针142，其被设置于传感器箱144内部的弹簧140k的弹性支撑，并与吸附膜120的底面接触，以实现上下移动。因此，如果空间部112中施加吸入压力，使吸附膜120朝下方形成凸出的位移120d1，则吸附膜120与探针142的上端接触使探针142朝下方移动140d。控制部145通过探针142的下方移动量判断吸附膜120的朝下方凸出的位移量是否达到预设的位移量，并控制压力调节部160施加的负压V1的大小。另外，传感器140除了可采用基于弹簧支撑的传感器以外，还可以采用激光等的非接触传感器，根据本实用新型的另一实施形态，还可以采用众所周知的可测量位移的其它结构的传感器。
由此，根据本实用新型一实施例的基板吸盘100，通过压力调节部160对作用于各空间部112的负压V1的大小进行调节，并通过监视传感器140感测空间部112中吸附膜120朝下方弯曲的变形量，如果通过传感器140感测到的空间部112中吸附膜120朝下方弯曲的变形量未达到预设值，则控制部145控制以增大压力调节部160施加的负压的绝对值，从而可获得使基板W的吸附固定达到可靠状态的效果。
如图6所示，本实用新型一实施例的基板清洗装置1进一步包括：清洗单元20，通过真空空间99将基板W吸附固定到如上述构成的基板吸盘100上表面的状态下，通过垫状物21清洗基板W的上表面；流体供给部30，其用于喷射浆液或者清洗液，以辅助清洗工艺。
由此，流体供给部30供给的液体不会渗入基板吸盘100内部，同时能够将基板可靠地固定在基板吸盘100上，从而即使不具有现有的气液分离器，也能够可靠地运行，具有缩减基板清洗装置1的维护人力和费用的优点。
另外，当基板清洗工艺等处理工艺结束时，如图7所示，压力调节部160通过气压通道111供给气压以使空间部112的压力成为正压P1。
由此，空间部112内气体发生膨胀，同时使位于其上侧的吸附膜120产生弹性变形120d2以使其呈朝上方凸出的状态。因此，从原本的吸附膜120的上表面与基板W的底面紧贴的状态变成吸附膜120完全朝上方凸出的状态，从而基板W与吸附膜120的紧贴状态被解除，成为基板W从吸附膜120分离的状态。
另外，如图7、图9a及图9b所示，在定盘110的边缘沿着圆周方向相隔的位置上具有多个顶针118，当基板处理工艺结束时，通过顶针118将吸附膜120向上方顶起。这可以与通过压力调节部160供给正压P1使吸附膜120朝上方凸起的弹性变形以将基板W从吸附膜120分离的过程分开或者同时进行。通过操作部U使顶针118朝上方移动或者延伸并朝上方推吸附膜120的边缘，使得基板W便于从吸附膜120分离。
图7、图9a及图9b中，虽然图示了顶针118向上方顶起吸附膜120的结构，但是如图10所示，顶针118也可配置于吸附膜120的外侧，使顶针118的上端朝上方直接抬起基板W，能够可靠地执行将基板W从吸附膜120分离的功能。
如上述构成的本实用新型，使用可弹性变形的柔性材料的吸附膜120完全覆盖用于放置基板W的基板吸盘100的上表面110s，向吸附膜120下侧的多个空间部112施加吸入压力，使吸附膜120与基板W之间形成真空空间99，以把持基板W，从而能够获得彻底防止处理工艺中使用的液体流入基板吸盘100内部的效果。
以上，通过优选实施例对本实用新型进行了示例性的说明，但是本实用新型不局限于如上所述的特定的实施例，在本实用新型提出的技术思想，具体为权利要求书记载的范围内可以各种形态进行修改，变更或者改善。

Claims (15)

1.一种基板吸盘，用于以放置于其上表面的状态固定基板，其特征在于，包括：
定盘；
吸附膜，其由可弹性变形的柔性材料构成，且以覆盖用于放置基板的区域即所述定盘的上表面的形态设置；
压力调节部，其用于向所述吸附膜的下部施加吸入压力。
2.如权利要求1所述的基板吸盘，其特征在于，所述压力调节部使所述吸附膜的部分区域朝下方弹性变形以在所述基板与所述吸附膜之间形成真空，从而固定所述基板。
3.如权利要求2所述的基板吸盘，其特征在于，所述定盘的上表面设置有用于在所述吸附膜的底面形成空余空间的空间部，所述压力调节部通过向所述空间部施加吸入压力，使所述吸附膜在所述空间部朝下方弹性变形。
4.如权利要求3所述的基板吸盘，其特征在于，形成有多个所述空间部。
5.如权利要求3所述的基板吸盘，其特征在于，所述空间部形成为多个同心圆形态。
6.如权利要求4所述的基板吸盘，其特征在于，在所述定盘形成有与多个所述空间部连通的空气腔室。
7.如权利要求1所述的基板吸盘，其特征在于，进一步包括用于使所述定盘旋转的驱动马达。
8.如权利要求7所述的基板吸盘，其特征在于，所述定盘形成有气压通道，所述气压通道从所述压力调节部以贯通所述定盘的旋转中心的至少一部分的方式延伸。
9.如权利要求8所述的基板吸盘，其特征在于，在所述定盘的所述气压通道的末端与所述驱动马达之间具有旋转密封件，以使所述气压通道与外部之间保持密封状态。
10.如权利要求4所述的基板吸盘，其特征在于，所述空间部以所述吸附膜的中心为基准对称配置。
11.如权利要求1所述的基板吸盘，其特征在于，所述压力调节部通过施加正压使所述吸附膜朝上方凸起，以从所述吸附膜分离所述基板。
12.如权利要求1所述的基板吸盘，其特征在于，在所述定盘的边缘设置有多个用于将所述吸附膜向上顶起的顶针。
13.如权利要求3所述的基板吸盘，其特征在于，在所述空间部设置有用于感测所述吸附膜朝下方凸起的位移的传感器。
14.如权利要求13所述的基板吸盘，其特征在于，所述传感器被弹簧弹性支持，并与所述吸附膜的底面接触，用于感测是否达到预设的位移。
15.一种基板清洗装置，其特征在于，包括：
如权利要求1至14中的任一项所述的基板吸盘；
清洗单元，其用于清洗基板的上表面，所述基板放置并定位于所述基板吸盘的吸附膜的上表面。
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