CN219449859U - Pump cover assembly and PVD vacuum equipment thereof - Google Patents
Pump cover assembly and PVD vacuum equipment thereof Download PDFInfo
- Publication number
- CN219449859U CN219449859U CN202320436174.7U CN202320436174U CN219449859U CN 219449859 U CN219449859 U CN 219449859U CN 202320436174 U CN202320436174 U CN 202320436174U CN 219449859 U CN219449859 U CN 219449859U
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- China
- Prior art keywords
- heating
- bottom plate
- heating unit
- reaction chamber
- pump
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- 238000010438 heat treatment Methods 0.000 claims abstract description 101
- 238000006243 chemical reaction Methods 0.000 claims abstract description 50
- 238000001816 cooling Methods 0.000 claims abstract description 21
- 238000007789 sealing Methods 0.000 claims abstract description 11
- 238000005057 refrigeration Methods 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000004973 liquid crystal related substance Substances 0.000 claims description 4
- 238000005240 physical vapour deposition Methods 0.000 abstract description 22
- 238000004140 cleaning Methods 0.000 abstract description 6
- 230000010354 integration Effects 0.000 abstract description 6
- 238000012423 maintenance Methods 0.000 abstract description 6
- 230000000694 effects Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The utility model relates to the technical field of PVD (physical vapor deposition), and provides a pump cover assembly and PVD vacuum equipment thereof. The pump cap assembly includes: pump cover body, pump cover body includes: a first bottom plate adapted for sealing engagement with the reaction chamber; the refrigerating device is fixed on the first bottom plate and used for cooling the inside of the reaction chamber; and the heating device is fixed on the first bottom plate and is used for heating the workpiece in the reaction chamber. According to the utility model, the refrigerating device and the heating device are integrally fixed below the first bottom plate of the pump cover body, so that the refrigerating device and the heating device can be taken down together with the pump cover body, the integration level of equipment is improved, the occupied space is small, the space utilization rate is improved, and a large amount of space can be reserved for installing other structures in the reaction chamber; when cleaning or maintenance of the heating and/or cooling device is required, the pump cap assembly may be directly removed from the reaction chamber for cleaning or maintenance of the heating and/or cooling device.
Description
Technical Field
The utility model relates to the technical field of PVD (physical vapor deposition), in particular to a pump cover assembly and PVD vacuum equipment thereof.
Background
PVD (Chinese definition: physical vapor deposition; english full name: physical Vapor Deposition; english short name: PVD) technology refers to that under vacuum condition, arc discharge technology with low voltage and large current is adopted, gas discharge is utilized to evaporate target material and ionize evaporated material and gas, and acceleration effect of electric field is utilized to deposit evaporated material and reaction product thereof on workpiece. Currently, in PVD production equipment, a reaction chamber is generally sealed by a cover plate, so that the interior of the reaction chamber is in a vacuum environment, and a molecular pump is installed on the cover plate (abbreviated as a pump cover) to make the reaction chamber reach high vacuum. The pump cover is generally a square cover plate structure capable of being lifted, wherein the bottom plate is provided with a sealing structure; the pump cover and the reaction chamber are sealed and isolated from the external environment through a sealing structure to form a closed cavity; simultaneously, the interior of the reaction chamber reaches the required vacuum degree through the air suction of the backing pump and the molecular pump.
In PVD apparatuses in the prior art, a heater is generally required to raise the temperature in the reaction chamber to remove excessive moisture therein, and the heater is often disposed in the reaction chamber, which brings great inconvenience to cleaning and maintenance of the heater in a later period; the water cooling device is welded in the reaction chamber or on the pump cover, so that the cooling effect is poor; and the PVD equipment has the defects of low equipment integration level, large occupied space and low space utilization rate.
Disclosure of Invention
The utility model provides a pump cover assembly and PVD vacuum equipment thereof, which are used for solving the defects that the PVD equipment in the prior art is inconvenient to clean or maintain, and the equipment integration level and the space utilization rate are low.
The present utility model provides a pump cap assembly comprising:
pump cover body, the pump cover body includes: a first bottom plate adapted for sealing engagement with the reaction chamber;
the refrigerating device is fixed on the first bottom plate and used for cooling the inside of the reaction chamber;
and the heating device is fixed on the first bottom plate and used for heating the workpiece in the reaction chamber.
According to the present utility model, there is provided a pump cap assembly, the heating device comprising:
the first heating unit is fixed below the first bottom plate;
the second heating unit is fixed below the first bottom plate and is arranged opposite to the first heating unit, and a channel is arranged between the first heating unit and the second heating unit, so that a workpiece passes through the channel and the upper surface and the lower surface of the workpiece are heated by the first heating unit and the second heating unit.
According to the present utility model, there is provided a pump cap assembly, the refrigeration apparatus comprising:
and the first refrigerating unit is fixed on one side of the first heating unit, which is far away from the channel.
According to the present utility model, there is provided a pump cover assembly, the refrigeration apparatus further comprising:
and the second refrigerating unit is fixed on one side of the second heating unit, which is far away from the channel.
According to the present utility model, there is provided a pump cap assembly, further comprising:
the first heating unit is fixed with the first bottom plate through the first connecting piece.
According to the present utility model, there is provided a pump cap assembly, further comprising:
a second base plate;
the second bottom plate is fixed with the first bottom plate through the second connecting piece, and the second heating unit is fixed on the second bottom plate.
According to the pump cover assembly provided by the utility model, the first base plate is provided with the first interface, the second interface and the third interface; wherein, the liquid crystal display device comprises a liquid crystal display device,
the first interface is suitable for being connected with the refrigerating device through a pipeline;
the second interface is suitable for being connected with the heating device through a circuit;
the third interface is adapted to mount a vacuum.
According to the pump cover assembly provided by the utility model, the pump cover body further comprises:
the pump cover box body is internally used for placing the vacuumizing device;
and the lifting lug is arranged at the top of the pump cover box body.
According to the pump cover assembly provided by the utility model, the refrigerating device comprises a water cooling plate structure;
the heating device comprises a heating plate structure.
The present utility model also provides a PVD vacuum apparatus comprising:
the top of the reaction chamber is provided with an opening;
in the pump cover assembly according to the above embodiment of the present utility model, the first bottom plate of the pump cover assembly can be sealingly engaged with the opening.
According to the pump cover assembly, the refrigerating device and the heating device are fixed below the first bottom plate of the pump cover body, and can be taken down together with the pump cover body; when the reaction is completed, the heating device and/or the refrigerating device need to be cleaned or maintained, and the like, the pump cover assembly can be directly removed from the reaction chamber so as to clean or maintain the heating device and/or the refrigerating device; in addition, because refrigerating plant and heating device integrate on the pump cover body, improved equipment integration level, occupation space is little, has improved space utilization, can reserve a large amount of spaces for reaction chamber installation other structures.
Further, the present utility model also provides a PVD vacuum apparatus having the same advantages as above due to the inclusion of the pump cap assembly in the above-described embodiments of the present utility model.
Drawings
In order to more clearly illustrate the utility model or the technical solutions of the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described, and it is obvious that the drawings in the description below are some embodiments of the utility model, and other drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic view of a pump cap assembly provided by the present utility model;
fig. 2 is a schematic structural diagram of a first base plate according to the present utility model.
Reference numerals:
100: a pump cover body; 101: a first base plate; 102: a pump cover case; 103: lifting lugs; 104: a first interface; 105: a second interface; 106: a third interface; 200: a refrigerating device; 201: a first refrigeration unit; 202: a second refrigeration unit; 300: a heating device; 301: a first heating unit; 302: a second heating unit; 303: a channel; 401: a first connector; 402: a second base plate; 403: and a second connecting piece.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present utility model more apparent, the technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings, and it is apparent that the described embodiments are some embodiments of the present utility model, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
A pump cap assembly of the present utility model is described below in conjunction with fig. 1-2. The pump cap assembly includes: pump cover body 100, refrigeration device 200, and heating device 300; wherein the refrigerating apparatus 200 and the heating apparatus 300 are integrally installed on the pump cover body 100 to form a pump cover assembly of an integrated structure.
Specifically, the pump cap body 100 includes: a first bottom plate 101, the first bottom plate 101 being adapted for sealing engagement with the reaction chamber; the refrigeration device 200 is fixed on the first bottom plate 101 and is used for cooling the interior of the reaction chamber; the heating device 300 is fixed to the first base plate 101 for heating the workpiece inside the reaction chamber.
In this embodiment, by fixing the refrigerating apparatus 200 and the heating apparatus 300 under the first bottom plate 101 of the pump cover body 100, after the first bottom plate 101 is sealingly engaged with the reaction chamber, the reaction chamber forms a sealed cavity, so as to provide a vacuum environment required for the reaction for the PVD vacuum apparatus; the heating device 300 can heat the surface of the workpiece, and the refrigerating device 200 can cool the internal environment of the reaction chamber to avoid overheating of the reaction chamber. When the reaction is completed, cleaning or maintenance of the heating device 300 and/or the cooling device 200 is required, the interior of the reaction chamber may be firstly broken with vacuum, and then the pump cover assembly is lifted from the reaction chamber, so as to clean or maintain the interior of the heating device 300 and/or the cooling device 200 or the reaction chamber; in addition, since the refrigerating device 200 and the heating device 300 are integrated on the pump cover body 100, the pump cover has the advantages of high equipment integration level, small occupied space and larger space reserved for other structures of the reaction chamber.
The pump cover assembly provided by the utility model can be taken down together with the pump cover body 100 by fixing the refrigerating device 200 and the heating device 300 below the first bottom plate 101 of the pump cover body 100; when the reaction is completed, cleaning or maintenance of the heating device 300 and/or the cooling device 200 is required, the pump cover assembly may be directly removed from the reaction chamber so as to clean or maintain the heating device 300 and/or the cooling device 200; in addition, since the refrigerating device 200 and the heating device 300 are integrated on the pump cover body 100, the integration level of equipment is improved, the occupied space is small, the space utilization rate is improved, and a large amount of space can be reserved for installing other structures of the reaction chamber.
In one embodiment of the present utility model, the heating device 300 includes: a first heating unit 301 and a second heating unit 302. Wherein the first heating unit 301 is fixed below the first base plate 101; the second heating unit 302 is fixed below the first base plate 101 and is disposed opposite to the first heating unit 301, and a passage 303 is provided between the first heating unit 301 and the second heating unit 302 so that the workpiece passes through the passage 303 and heats the upper and lower surfaces of the workpiece by the first heating unit 301 and the second heating unit 302. Specifically, in the present embodiment, the heating apparatus 300 includes two heating modules, i.e., a first heating unit 301 and a second heating unit 302, the first heating unit 301 is located above the second heating unit 302, and a passage 303 is formed therebetween so that a workpiece passes therethrough, and when the workpiece is located between the first heating unit 301 and the second heating unit 302, the upper and lower surfaces (or the front and rear surfaces) of the workpiece can be heated, respectively. For example, when the carrier plate is processed, the carrier plate can provide a required temperature for the plating environment when passing through the channel 303, and the first heating unit 301 and the second heating unit 302 uniformly heat the front and back surfaces of the carrier plate and the silicon wafer, so as to improve the adhesion and purity of the thin film.
In one embodiment of the present utility model, the refrigeration unit 200 includes: the first refrigerating unit 201, the first refrigerating unit 201 is fixed at a side of the first heating unit 301 remote from the passage 303. Further, the refrigeration apparatus 200 further includes: and a second cooling unit 202, the second cooling unit 202 being fixed to a side of the second heating unit 302 remote from the passage 303. Specifically, in this embodiment, the refrigerating apparatus 200 includes an upper cooling module and a lower cooling module, that is, the first refrigerating unit 201 and the second refrigerating unit 202, where the first refrigerating unit 201 and the second refrigerating unit 202 are respectively attached to the non-heating surfaces of the first heating unit 301 and the second heating unit 302, that is, the first refrigerating unit 201 is attached to the upper side of the first heating unit 301, and the second refrigerating unit 202 is attached to the lower side of the second heating unit 302, and the interior of the reaction chamber is cooled by the first refrigerating unit 201 and the second refrigerating unit 202, so that the optimal cooling effect is achieved on the non-coating side, and the temperature of the reaction chamber is ensured not to be too high.
In one embodiment of the utility model, the pump cap assembly further comprises: the first connection member 401, and the first heating unit 301 is fixed to the first base plate 101 through the first connection member 401. Further, the pump cap assembly further includes: a second base plate 402 and a second connection member 403, the second base plate 402 being fixed to the first base plate 101 by the second connection member 403, and the second heating unit 302 being fixed to the second base plate 402. In this embodiment, the first connector 401 and the second connector 403 may be any one of a support column, a support rib and a support beam, and mainly play a role in connection and fixation; taking the first connecting piece 401 and the second connecting piece 403 as examples, the second bottom plate 402 is fixedly connected below the first bottom plate 101 through a plurality of supporting columns, the second heating unit 302 is installed on the second bottom plate 402, the first heating unit 301 is fixedly connected between the first bottom plate 101 and the second bottom plate 402 through a plurality of supporting columns, and the connection and fixation modes of the supporting columns can be in a threaded connection mode; while the first refrigerating unit 201 may be fixed above the first heating unit 301 by bolting, and the second refrigerating unit 202 may be fixed below the second heating unit 302 by bolting.
In one embodiment of the present utility model, the first base plate 101 is provided with a first interface 104, a second interface 105 and a third interface 106; wherein the first port 104 is adapted to be connected to the refrigeration unit 200 by a pipeline; the second interface 105 is adapted to be connected to the heating device 300 by a wire; the third interface 106 is adapted to mount an evacuation device. Specifically, the third interfaces 106 are symmetrically arranged along the center line of the first bottom plate 101; the second interface 105 is disposed on the left side of the first base plate 101, and six interfaces are disposed in total; the first interface 104 is disposed on the right side of the first chassis 101. The first interface 104, the second interface 105, and the third interface 106 may each be a flange interface or other type of interface.
In one embodiment of the present utility model, the pump cap body 100 further includes: the pump cover box 102 and the lifting lug 103, wherein the pump cover box 102 is internally used for placing a vacuumizing device; lifting lugs 103 are provided on top of the pump cover housing 102. Further, the refrigeration device 200 includes a water-cooled plate structure; the heating device 300 includes a heating plate structure. Specifically, the vacuum pumping device adopts a backing pump and a molecular pump, the molecular pump is arranged in the pump cover box body 102 through the third interface 106, and the interior of the reaction chamber is vacuumized through the molecular pump; the refrigeration device 200 adopting the water cooling structure can be provided with a water source and a water pump inside the pump cover box 102, and the refrigerant is conveyed into the water cooling plate structure through the first interface 104 and the pipeline; the heating device 300 with the heating plate structure can be provided with a power supply inside the pump cover box 102, the power supply is electrically connected with a wire, the wire passes through the first interface 104 to be electrically connected with the heating plate structure, and the heating plate structure converts electric energy into heat energy.
The utility model also provides PVD vacuum equipment. The PVD apparatus includes: a reaction chamber and a pump cap assembly according to the embodiments described above. Wherein, the reaction chamber top has seted up uncovered, and the first bottom plate 101 of pump cover subassembly covers in uncovered department to can with uncovered sealing fit.
Specifically, after the first bottom plate 101 is in sealing fit with the reaction chamber, the reaction chamber can be isolated from the external environment, and the interior of the reaction chamber is vacuumized through the backing pump and the molecular pump; when the pump cap assembly is removed from the opening of the reaction chamber, the refrigerating apparatus 200 and the heating apparatus 300 are removed together with the pump cap body 100, facilitating cleaning and maintenance thereof.
Further, in order to ensure the sealing fit effect of the first bottom plate 101 and the reaction chamber, a sealing ring may be installed between the first bottom plate 101 and the opening.
The PVD vacuum apparatus provided by the utility model has the same advantages as above due to the inclusion of the pump cap assembly in the above-described embodiments of the utility model.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present utility model, and are not limiting; although the utility model has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present utility model.
Claims (10)
1. A pump cap assembly, comprising:
pump cover body, the pump cover body includes: a first bottom plate adapted for sealing engagement with the reaction chamber;
the refrigerating device is fixed on the first bottom plate and used for cooling the inside of the reaction chamber;
and the heating device is fixed on the first bottom plate and used for heating the workpiece in the reaction chamber.
2. The pump cap assembly of claim 1, wherein the heating means comprises:
the first heating unit is fixed below the first bottom plate;
the second heating unit is fixed below the first bottom plate and is arranged opposite to the first heating unit, and a channel is arranged between the first heating unit and the second heating unit, so that a workpiece passes through the channel and the upper surface and the lower surface of the workpiece are heated by the first heating unit and the second heating unit.
3. The pump cap assembly of claim 2, wherein the refrigeration device comprises:
and the first refrigerating unit is fixed on one side of the first heating unit, which is far away from the channel.
4. The pump cap assembly of claim 2, wherein the refrigeration device further comprises:
and the second refrigerating unit is fixed on one side of the second heating unit, which is far away from the channel.
5. The pump cap assembly of claim 2, further comprising:
the first heating unit is fixed with the first bottom plate through the first connecting piece.
6. The pump cap assembly of claim 2, further comprising:
a second base plate;
the second bottom plate is fixed with the first bottom plate through the second connecting piece, and the second heating unit is fixed on the second bottom plate.
7. The pump cap assembly of claim 1, wherein the first base plate has a first port, a second port, and a third port; wherein, the liquid crystal display device comprises a liquid crystal display device,
the first interface is suitable for being connected with the refrigerating device through a pipeline;
the second interface is suitable for being connected with the heating device through a circuit;
the third interface is adapted to mount a vacuum.
8. The pump cap assembly of claim 1, wherein the pump cap body further comprises:
the pump cover box body is internally used for placing the vacuumizing device;
and the lifting lug is arranged at the top of the pump cover box body.
9. The pump cap assembly of any one of claims 1 to 8, wherein,
the refrigerating device comprises a water cooling plate structure;
the heating device comprises a heating plate structure.
10. A PVD vacuum apparatus, comprising:
the top of the reaction chamber is provided with an opening;
the pump cap assembly according to any one of claims 1 to 9, wherein the first base plate of the pump cap assembly is capable of sealing engagement with the opening.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320436174.7U CN219449859U (en) | 2023-03-09 | 2023-03-09 | Pump cover assembly and PVD vacuum equipment thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320436174.7U CN219449859U (en) | 2023-03-09 | 2023-03-09 | Pump cover assembly and PVD vacuum equipment thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219449859U true CN219449859U (en) | 2023-08-01 |
Family
ID=87416626
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320436174.7U Active CN219449859U (en) | 2023-03-09 | 2023-03-09 | Pump cover assembly and PVD vacuum equipment thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219449859U (en) |
-
2023
- 2023-03-09 CN CN202320436174.7U patent/CN219449859U/en active Active
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20231211 Address after: 412000 South 1st span factory building on the southwest side of the intersection of Qingxia Road and Old Industrial Road, Tongtangwan Street, Shifeng District, Zhuzhou City, Hunan Province Patentee after: Zhuzhou Sany Silicon Energy Technology Co.,Ltd. Address before: 412000 Room 518-50, Building 1, Longxin International, No. 255, Tongxia Road, Tongtangwan Street, Shifeng District, Zhuzhou City, Hunan Province Patentee before: Sany Silicon Energy (Zhuzhou) Co.,Ltd. |