CN219315066U

CN219315066U - Diamond-like carbon film deposition equipment for improving ionization rate

Info

Publication number: CN219315066U
Application number: CN202223372759.1U
Authority: CN
Inventors: 裴绪杨; 彭建
Original assignee: Suzhou Puruishi Precision Optical Technology Co ltd
Current assignee: Suzhou Puruishi Precision Optical Technology Co ltd
Priority date: 2022-12-15
Filing date: 2022-12-15
Publication date: 2023-07-07
Anticipated expiration: 2032-12-15

Abstract

The utility model discloses a diamond-like carbon film deposition device for improving ionization rate, which comprises: the device comprises a base, wherein a mixed gas receiving pipe and an acetylene gas receiving pipe are arranged on the left side of the base, a discharge port and an acetylene gas pipe communicated with the acetylene gas receiving pipe are arranged on the base, and the discharge port is communicated with a vacuum pump by adopting an evacuation pipe; the bottom wall of the vacuum cover is arranged at the edge of the top surface of the base in a sealing mode, and a fixing block is fixedly arranged on the inner wall of the vacuum cover. The device adopts the screw principle mechanism to control the heater to move up and down, thereby increasing the soaking effect, increasing the control intensity of injected gas, improving the decomposition speed and the decomposition effect of acetylene, and greatly improving the film forming speed and the thickness of glass and the surface of a die.

Description

Diamond-like carbon film deposition equipment for improving ionization rate

Technical Field

The utility model particularly relates to the technical field of vacuum coating, in particular to diamond-like carbon film deposition equipment for improving ionization rate.

Background

The coating equipment is used for placing a glass raw material or a die into a vacuum bin, introducing acetylene gas, and under the action of a high temperature or RF power supply, causing the acetylene gas to be cracked and decomposed to form carbon atoms to generate a DLC film on the surface of the glass, wherein the DLC film has a structure similar to a regular hexahedral structure of a diamond structure and a mixed component of the DLC film and a graphite structure; because DLC films are coated on the surfaces of the glass and the mold in the molding process of the coating equipment, the lubricating and protecting effects are achieved, the mold release device has a relatively large beneficial effect, the chemical reaction between the glass and the mold is reduced, and the service life of the mold is prolonged; however, the existing coating equipment has low acetylene decomposition speed and low acetylene decomposition effect, and cannot guarantee the film forming speed and thickness of the surfaces of glass and the mold.

Disclosure of Invention

Therefore, the utility model provides a diamond-like carbon film deposition device for improving the ionization rate so as to solve the problems in the background art.

In order to achieve the above purpose, the present utility model provides the following technical solutions: a diamond-like carbon film deposition apparatus for increasing ionization rate, comprising:

the device comprises a base, wherein a mixed gas receiving pipe and an acetylene gas receiving pipe are arranged on the left side of the base, a discharge port and an acetylene gas pipe communicated with the acetylene gas receiving pipe are arranged on the base, and the discharge port is communicated with a vacuum pump by adopting an evacuation pipe;

the bottom wall of the vacuum cover is arranged at the edge of the top surface of the base in a sealing way, a fixed block is fixedly arranged on the inner wall of the vacuum cover, and a threaded middle hole is arranged on the fixed block, so that the fixed block can be in threaded connection with a first lead screw, and the bottom end of the first lead screw is in driving connection with the driving end of a second motor positioned in the base;

the heater is fixedly arranged on the screw rod mechanism positioned on the inner wall of the vacuum cover;

the film coating frame mechanism is fixedly arranged on the top surface of the base and is positioned in the vacuum cover;

and the two gas mixing pipes are fixedly arranged on the base, and each gas mixing pipe is communicated with the gas mixing pipe.

Further, preferably, a pneumatic valve is mounted on the evacuation pipe, and an exhaust pipe is communicated with a part of the evacuation pipe between the pneumatic valve and the vacuum pump.

Further, preferably, an exhaust valve is mounted on the exhaust pipe.

Further, preferably, the screw mechanism comprises a mounting block, a first motor, a moving seat and a directional column, wherein the two mounting blocks are symmetrically fixed on the inner wall of the vacuum cover, a second screw is rotatably mounted between the two mounting blocks, and the top end of the second screw is fixedly connected with the driving end of the first motor;

the rotary hole of the movable seat is internally provided with an internal thread ring in a matching manner, the internal thread ring is in threaded connection with the second screw rod, a rotary ring is fixedly sleeved on the outer wall of the internal thread ring, and the rotary ring is arranged in an annular groove on the hole wall of the rotary hole in a matching manner.

Further, preferably, an orientation column is fixedly installed between the two installation blocks, and the orientation column is slidably connected with the sliding hole on the movable seat.

Further, as the preference, coating film frame mechanism includes array frame, sill pillar and vapor chamber, the sill pillar is provided with a plurality ofly, a plurality of the sill pillar is all fixed mounting in the locating hole on the base, a plurality of install a plurality of vapor chamber jointly on the sill pillar, a plurality of the sill pillar the top all with the array frame is connected, be provided with 30 frame trays on the array frame.

Further, preferably, the gas mixing tube is formed by fixing a lower connecting tube and a quartz tube, and a plurality of air holes are equidistantly arranged on the side wall of the quartz tube.

Compared with the prior art, the utility model has the following beneficial effects: the device adopts the screw principle mechanism to control the heater to move up and down, thereby increasing the soaking effect, increasing the control intensity of injected gas, improving the decomposition speed and the decomposition effect of acetylene, and greatly improving the film forming speed and the thickness of glass and the surface of a die.

Drawings

FIG. 1 is a schematic diagram of an internal structure of a diamond-like carbon film deposition apparatus for increasing ionization rate;

FIG. 2 is a schematic diagram of a gas mixing tube in a diamond-like carbon film deposition apparatus for increasing ionization rate;

fig. 3 is a structural cross-sectional view of a screw mechanism in a diamond-like carbon film deposition apparatus for improving an ionization rate.

In the figure: 1. a film coating frame mechanism; 2. a fixed block; 3. a first lead screw; 4. a vacuum cover; 5. a gas mixing tube; 6. a base; 7. a pneumatic valve; 8. an evacuation tube; 9. a mixed gas-receiving pipe; 10. acetylene gas connection pipe; 11. a heater; 12. a mounting block; 13. a first motor; 14. a second lead screw; 15. an internally threaded ring; 16. a movable seat; 17. a swivel; 18. a directional column; 19. an exhaust valve; 20. an exhaust pipe; 101. an array frame; 102. a bottom post; 103. a soaking plate; 501. a quartz tube; 502. a lower connecting pipe; 504. and (5) air holes.

Description of the embodiments

In conjunction with the drawings in the embodiments of the present utility model, the technical solutions of the embodiments of the present utility model will be clearly and completely described below.

Examples: referring to fig. 1-3, the present utility model provides a technical solution: a diamond-like carbon film deposition apparatus for increasing ionization rate, comprising:

the device comprises a base 6, wherein a mixed gas-receiving pipe 9 and an acetylene gas-receiving pipe 10 are arranged on the left side of the base 6, a discharge port and an acetylene gas pipe communicated with the acetylene gas-receiving pipe 10 are arranged on the base 6, and the discharge port is communicated with a vacuum pump by adopting an evacuation pipe 8;

the vacuum cover 4 is arranged at the edge of the top surface of the base 6 in a sealing way, a fixed block 2 is fixedly arranged on the inner wall of the vacuum cover 4, and a threaded middle hole is arranged on the fixed block 2, so that the fixed block 2 can be in threaded connection with the first lead screw 3, and the bottom end of the first lead screw 3 is in driving connection with the driving end of the second motor in the base 6;

the heater 11, the heater 11 is fixedly installed on a screw mechanism positioned on the inner wall of the vacuum cover 4;

the coating frame mechanism 1 is fixedly arranged on the top surface of the base 6, and the coating frame mechanism 1 is positioned in the vacuum cover 4;

the two air mixing pipes 5 are fixedly arranged on the base 6, and each air mixing pipe 5 is communicated with the air mixing and connecting pipe 9;

specifically, the number of the mixed gas pipes 5 can be more than two, wherein the mixed gas pipes 5 are special air injection pipelines, so that the decomposition speed and the decomposition effect of acetylene are improved, and the film forming speed and the film forming thickness of the surfaces of glass and a mold are improved.

In this embodiment, the air-operated valve 7 is installed on the air-operated pipe 8, and the air-operated pipe 8 located between the air-operated valve 7 and the vacuum pump is connected with the air-exhausted pipe 20.

In this embodiment, the exhaust valve 19 is attached to the exhaust pipe 20.

In this embodiment, the screw mechanism includes a mounting block 12, a first motor 13, a moving seat 16 and a directional column 18, the two mounting blocks 12 are symmetrically fixed on the inner wall of the vacuum cover 4, a second screw 14 is rotatably mounted between the two mounting blocks 12, and the top end of the second screw 14 is fixedly connected to the driving end of the first motor 13;

an inner threaded ring 15 is arranged in the rotating hole of the movable seat 16 in a matching way, the inner threaded ring 15 is in threaded connection with the second screw rod 14, a rotating ring 17 is fixedly sleeved on the outer wall of the inner threaded ring 15, and the rotating ring 17 is arranged in an annular groove on the wall of the rotating hole in a matching and rotating way.

In this embodiment, an orientation post 18 is also fixedly mounted between the two mounting blocks 12, and the orientation post 18 is slidably connected to a sliding hole on the movable seat 16.

In this embodiment, the film plating rack mechanism 1 includes an array rack 101, bottom columns 102 and soaking plates 103, the bottom columns 102 are provided with a plurality of bottom columns 102, the bottom columns 102 are all fixedly installed in positioning holes on the base 6, the bottom columns 102 are commonly installed with the soaking plates 103, the top ends of the bottom columns 102 are all connected with the array rack 101, and 30 rack trays are arranged on the array rack 101.

In this embodiment, the gas mixing tube 5 is formed by fixing a lower connecting tube 503 and a quartz tube 501, and a plurality of gas holes 504 are equidistantly arranged on the side wall of the quartz tube 501.

In specific implementation, the method comprises the following three steps:

1. heating and vacuumizing: after the glass and the die are arranged, the vacuum cover 4 is lowered, then the vacuum cover is vacuumized to the appointed pressure, the heater 11 is lowered and started, and N2 is slowly injected (vacuumized at the same time);

2. coating: slowly injecting acetylene, then automatically injecting air, stopping the heater and rising;

3. and (3) cooling: after cooling for about 1.5 hours, exhausting waste gas, slowly injecting N2, vacuumizing, slowly injecting N2 again, opening an air pipeline, and lifting the vacuum cover 4 to finish coating.

The above embodiments are only for illustrating the technical solution of the present utility model, and not for limiting the same; although the utility model has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present utility model.

Claims

1. A diamond-like carbon film deposition apparatus for increasing an ionization rate, comprising:

the device comprises a base (6), wherein a mixed gas receiving pipe (9) and an acetylene gas receiving pipe (10) are arranged on the left side of the base (6), a discharge port and an acetylene gas pipe communicated with the acetylene gas receiving pipe (10) are arranged on the base (6), and the discharge port is communicated with a vacuum pump by adopting an evacuation pipe (8);

the vacuum cover (4), the diapire seal of vacuum cover (4) sets up in the edge of base (6) top surface, fixedly be provided with fixed block (2) on the inner wall of vacuum cover (4), be provided with the screw thread mesopore on fixed block (2) for fixed block (2) can with first lead screw (3) threaded connection, just the bottom of first lead screw (3) is with being located the drive end drive connection of base (6) interior second motor;

the heater (11) is fixedly arranged on a screw rod mechanism positioned on the inner wall of the vacuum cover (4);

the film coating frame mechanism (1), the film coating frame mechanism (1) is fixedly arranged on the top surface of the base (6), and the film coating frame mechanism (1) is positioned in the vacuum cover (4);

and the two gas mixing pipes (5) are fixedly arranged on the base (6), and each gas mixing pipe (5) is communicated with the gas mixing connecting pipe (9).

2. A diamond-like carbon film deposition apparatus for increasing ionization rate according to claim 1, wherein: the air evacuation pipe (8) is provided with a pneumatic valve (7), and an exhaust pipe (20) is communicated with the partial air evacuation pipe (8) between the pneumatic valve (7) and the vacuum pump.

3. A diamond-like carbon film deposition apparatus for increasing ionization rate according to claim 2, wherein: an exhaust valve (19) is arranged on the exhaust pipe (20).

4. A diamond-like carbon film deposition apparatus for increasing ionization rate according to claim 3, wherein: the screw rod mechanism comprises mounting blocks (12), a first motor (13), a movable seat (16) and a directional column (18), wherein the two mounting blocks (12) are symmetrically fixed on the inner wall of the vacuum cover (4), a second screw rod (14) is rotatably mounted between the two mounting blocks (12), and the top end of the second screw rod (14) is fixedly connected with the driving end of the first motor (13);

the rotary hole of the movable seat (16) is internally provided with an internal thread ring (15) in a matching manner, the internal thread ring (15) is in threaded connection with a second screw rod (14), a rotary ring (17) is fixedly sleeved on the outer wall of the internal thread ring (15), and the rotary ring (17) is arranged in an annular groove on the hole wall of the rotary hole in a matching manner.

5. A diamond-like carbon film deposition apparatus for increasing ionization rate according to claim 4, wherein: an orientation column (18) is fixedly arranged between the two mounting blocks (12), and the orientation column (18) is in sliding connection with a sliding hole on the movable seat (16).

6. A diamond-like carbon film deposition apparatus for increasing ionization rate according to claim 1, wherein: the coating frame mechanism (1) comprises an array frame (101), bottom columns (102) and soaking plates (103), wherein the bottom columns (102) are arranged in a plurality of positioning holes, the bottom columns (102) are fixedly arranged on a base (6), the bottom columns (102) are jointly provided with the soaking plates (103), the top ends of the bottom columns (102) are connected with the array frame (101), and 30 frame trays are arranged on the array frame (101).

7. A diamond-like carbon film deposition apparatus for increasing ionization rate according to claim 1, wherein: the mixed gas pipe (5) is formed by fixing a lower connecting pipe (503) and a quartz tube (501), and a plurality of air holes (504) are equidistantly arranged on the side wall of the quartz tube (501).