CN112239856A - Roll-to-roll vacuum coating equipment for plating anti-fingerprint film - Google Patents
Roll-to-roll vacuum coating equipment for plating anti-fingerprint film Download PDFInfo
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- CN112239856A CN112239856A CN202011171391.5A CN202011171391A CN112239856A CN 112239856 A CN112239856 A CN 112239856A CN 202011171391 A CN202011171391 A CN 202011171391A CN 112239856 A CN112239856 A CN 112239856A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to the technical field of vacuum coating equipment, in particular to roll-to-roll vacuum coating equipment for coating an anti-fingerprint film, which comprises a vacuum chamber, wherein a coating roller, a winding and unwinding chamber, a magnetron sputtering coating chamber, a first air isolating chamber, a gaseous evaporation coating chamber and a second air isolating chamber are arranged in the vacuum chamber in sequence along the circumferential direction of the coating roller; the winding and unwinding chamber for winding the substrate is internally provided with an unwinding roller, a first guide roller, a second guide roller and a winding roller, the substrate coming out of the unwinding roller sequentially passes through the first guide roller, the coating roller, the second guide roller and the winding roller, the magnetron sputtering coating chamber is internally provided with a magnetron sputtering coating system, and the vacuum coating equipment further comprises a gaseous evaporation coating system for coating a fingerprint-resistant film. The invention can realize continuous plating of the anti-fingerprint film and other film layers, and can plate the anti-fingerprint film and other film layers on the same vacuum coating equipment, thereby greatly improving the production efficiency, reducing the equipment investment, saving energy and reducing consumption.
Description
Technical Field
The invention relates to the technical field of vacuum coating equipment, in particular to roll-to-roll vacuum coating equipment for coating an anti-fingerprint film.
Background
The traditional method for plating the anti-fingerprint film mainly comprises a spraying method and a vacuum evaporation coating method, wherein the spraying method is generally finished under the atmosphere, but the spraying precision is generally low, the uniformity of the film layer is poor, and the process is unstable; the vacuum evaporation coating method has good effect, but is only suitable for being used on single-machine equipment, and continuous deposition cannot be realized. For continuous coating equipment, such as assembly line coating equipment or winding coating equipment, on-line continuous coating of the anti-fingerprint film is difficult to realize.
Disclosure of Invention
Aiming at the technical problems in the prior art, the invention aims to: the utility model provides a roll-to-roll vacuum coating equipment for plating prevent fingerprint membrane can realize continuous plating prevent fingerprint membrane, also can plate other retes simultaneously.
In order to achieve the purpose, the invention adopts the following technical scheme:
a roll-to-roll vacuum coating device for coating an anti-fingerprint film comprises a vacuum chamber, wherein a coating roller, a winding and unwinding chamber, a magnetron sputtering coating chamber, a first air separation chamber, a gaseous evaporation coating chamber and a second air separation chamber are arranged in the vacuum chamber in sequence along the circumferential direction of the coating roller; the winding and unwinding chamber for winding the substrate is internally provided with an unwinding roller, a first guide roller, a second guide roller and a winding roller, the substrate coming out of the unwinding roller sequentially passes through the first guide roller, the coating roller, the second guide roller and the winding roller, the magnetron sputtering coating chamber is internally provided with a magnetron sputtering coating system, and the vacuum coating equipment further comprises a gaseous evaporation coating system for coating a fingerprint-resistant film.
Furthermore, air isolating devices are arranged between the winding and unwinding chamber and the magnetron sputtering coating chamber, between the magnetron sputtering coating chamber and the first air isolating chamber, between the first air isolating chamber and the gaseous evaporation coating chamber, between the gaseous evaporation coating chamber and the second air isolating chamber, and between the second air isolating chamber and the winding and unwinding chamber, and gaps for the base materials to pass through are reserved between the air isolating devices and the coating rollers.
Further, the magnetron sputtering coating system comprises a magnetron target, and the sputtering direction of the magnetron target faces to the substrate.
Further, the gaseous evaporation coating system comprises a gaseous evaporation source for generating the raw material gas, and a gas injection device for injecting the raw material gas to the substrate, wherein the gaseous evaporation source is positioned outside the vacuum chamber, the gas injection device is positioned in the gaseous evaporation coating chamber, and the gaseous evaporation source transmits the raw material gas to the gas injection device through the flow control device.
Further, the gaseous evaporation source comprises a liquid tank, a liquid tank heating subsystem is arranged at the bottom of the liquid tank, and a liquid tank heat-preservation subsystem is arranged outside the liquid tank; the gas injection device comprises an injection gas pipe, a plurality of injection holes are arranged on the injection gas pipe, and the injection direction of the injection holes faces the base material; the flow control device comprises a flow meter, the flow meter is connected to the liquid tank through a connecting air pipe, and the flow meter is connected to the injection air pipe through an introducing air pipe.
Furthermore, the injection air pipe is also provided with an injection air pipe heating subsystem, and the outside of the injection air pipe is provided with an injection air pipe heat preservation and insulation subsystem.
Further, the working vacuum degree of the magnetron sputtering coating chamber is 1 x 10-1Pa-9*10-1Pa。
Further, the working vacuum degree of the gaseous evaporation coating chamber is 8 x 10-2Pa-1*10-3Pa。
Furthermore, the winding and unwinding chamber, the magnetron sputtering coating chamber, the first air separation chamber, the gaseous evaporation coating chamber and the second air separation chamber are respectively provided with a vacuum pumping system and an inflation system.
Furthermore, the magnetic control target is a plane magnetic control target or a cylinder magnetic control target.
In summary, the present invention has the following advantages:
1. the invention realizes the winding and coating of the base material by the matching of the unwinding roller, the first guide roller, the coating roller, the second guide roller and the winding roller, and can ensure the stable operation of the base material.
2. The magnetron sputtering coating chamber and the gaseous evaporation coating chamber are positioned in the same vacuum chamber, and fingerprint-resistant films and other film layers can be coated on the same vacuum coating equipment, so that the production efficiency is greatly improved.
3. The invention can realize continuous plating of the anti-fingerprint film and other film layers, can improve the production efficiency, reduce the equipment investment, save energy and reduce consumption.
Drawings
Fig. 1 is a schematic structural view of the present invention.
Fig. 2 is a schematic view of the structure of the ejector air tube of the present invention.
Wherein: the device comprises a vacuum chamber 1, a coating roller 2, a winding and unwinding chamber 3, a magnetron sputtering coating chamber 4, a first air separation chamber 5, a gaseous evaporation coating chamber 6, a second air separation chamber 7, an unwinding roller 8, a first guide roller 9, a second guide roller 10, a winding roller 11, an air separation device 12, a magnetron target 13, a liquid tank 14, a liquid tank heating subsystem 15, a liquid tank heat preservation subsystem 16, an injection air pipe 17, an injection hole 18, a flow meter 19, a connecting air pipe 20, an introduction air pipe 21, an injection air pipe heat preservation and heat insulation subsystem 22, a vacuumizing system 23 and a base material 24.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and detailed description.
As shown in fig. 1, a roll-to-roll vacuum coating apparatus for coating an anti-fingerprint film comprises a vacuum chamber, wherein a coating roller, a winding and unwinding chamber, a magnetron sputtering coating chamber, a first air separation chamber, a gaseous evaporation coating chamber and a second air separation chamber are arranged in the vacuum chamber in sequence along the circumferential direction of the coating roller; the winding and unwinding chamber for winding the substrate is internally provided with an unwinding roller, a first guide roller, a second guide roller and a winding roller, the substrate coming out of the unwinding roller sequentially passes through the first guide roller, the coating roller, the second guide roller and the winding roller, the magnetron sputtering coating chamber is internally provided with a magnetron sputtering coating system, and the vacuum coating equipment further comprises a gaseous evaporation coating system for coating a fingerprint-resistant film.
As shown in fig. 1, air-blocking devices are respectively arranged between the winding and unwinding chamber and the magnetron sputtering coating chamber, between the magnetron sputtering coating chamber and the first air-blocking chamber, between the first air-blocking chamber and the gaseous evaporation coating chamber, between the gaseous evaporation coating chamber and the second air-blocking chamber, and between the second air-blocking chamber and the winding and unwinding chamber, and gaps for the base material to pass through are reserved between the air-blocking devices and the coating rollers. An air isolation device is arranged between the adjacent chambers, so that each chamber forms a relatively closed environment and is not influenced by other chambers; a gap is reserved between the air isolation device and the coating roller, so that the substrate can conveniently pass through each chamber to finish the coating process.
As shown in figure 1, a vacuum pumping system and an inflation system are arranged on the winding and unwinding chamber, the magnetron sputtering coating chamber, the first air separation chamber, the gaseous evaporation coating chamber and the second air separation chamber. Each chamber is provided with a vacuum-pumping system and an inflation system, so that each chamber can be vacuumized and filled with gas, and different chambers can have different working pressures and working atmospheres. The first air isolating chamber is positioned between the magnetron sputtering coating chamber and the gaseous evaporation coating chamber and is mainly used for isolating the magnetron sputtering coating chamber from the gaseous evaporation coating chamber, so that the magnetron sputtering coating chamber and the gaseous evaporation coating chamber can be ensured to be under different working pressures and cannot interfere with each other.
As shown in fig. 1, the magnetron sputtering coating system includes a magnetron target, the sputtering direction of the magnetron target faces the substrate, the magnetron target is a planar magnetron target or a cylindrical magnetron target, the magnetron target is a general magnetron target, the number of the magnetron targets is 1 or more than 1, and the power supply of the magnetron target is a dc power supply, a medium-high frequency ac power supply or a pulse dc power supply.
The working vacuum degree of the magnetron sputtering coating chamber is 1 x 10-1Pa-9*10-1Pa, the magnetron sputtering coating chamber can be coated with a functional film, a dielectric film or a metal film.
As shown in fig. 1 and 2, the vapor deposition system includes a vapor evaporation source for generating a source gas, a gas injection device for injecting the source gas toward a substrate, the vapor evaporation source being located outside a vacuum chamber, the gas injection device being located inside a vapor deposition chamber, the vapor evaporation source delivering the source gas to the gas injection device through a flow rate control device. The gaseous evaporation source comprises a liquid tank, the bottom of the liquid tank is provided with a liquid tank heating subsystem, and the outside of the liquid tank is provided with a liquid tank heat-preservation subsystem; the bottom of the liquid tank is provided with a liquid tank heating subsystem which can gasify liquid in the liquid tank, and the outside of the liquid tank is provided with a liquid tank heat-preservation subsystem which can achieve the heat-preservation effect on the liquid tank; the gas injection device comprises an injection gas pipe, a plurality of injection holes are arranged on the injection gas pipe, and the injection direction of the injection holes faces the base material; the flow control device comprises a flow meter, the flow meter is connected to the liquid tank through a connecting air pipe, the flow meter is connected to the injection air pipe through an introducing air pipe, and the flow meter can detect and control the amount of gas introduced into the injection air pipe. The injection air pipe is also provided with an injection air pipe heating subsystem, and the outside of the injection air pipe is provided with an injection air pipe heat preservation and insulation subsystem. Be equipped with the controllable injection trachea heating subsystem of temperature on the injection trachea, can ensure that gasified raw materials can not deposit in the injection trachea, the injection trachea outside is equipped with the thermal-insulated subsystem of injection trachea heat preservation, can reduce the influence of heat radiation to the substrate.
The working vacuum degree of the gaseous evaporation coating chamber is 8 x 10-2Pa-1*10-3Pa, the vapor evaporation coating chamber is used for coating the fingerprint-proof film.
The invention is mainly suitable for depositing the anti-fingerprint film on the surface of the organic film such as a biaxially oriented polypropylene film (BOPP), PET and the like or the flexible material such as metal foil, flexible glass and the like.
The working principle of the invention is as follows:
the substrate comes out of the unwinding roller and sequentially passes through the first guide roller, the coating roller, the second guide roller and the winding roller, when the substrate enters the magnetron sputtering coating chamber, the magnetron sputtering coating chamber can coat a functional film, a dielectric film or a metal film on the substrate, when the functional film is required to be coated, such as an antireflection film or a color film, the magnetron sputtering coating chamber is vacuumized, then process gas is filled into the magnetron sputtering coating chamber until the working vacuum degree is reached, then the magnetron target is opened, the magnetron target can sputter a large number of atoms and deposit on the substrate to form a film layer; when the dielectric film is required to be plated, reaction gas is filled in the process of plating the film to realize the deposition of the dielectric film. The substrate coming out of the magnetron sputtering coating chamber passes through the first air separation chamber and enters the gaseous evaporation coating chamber, the gaseous evaporation coating chamber is used for coating an anti-fingerprint film (AF film) on the substrate, the gaseous evaporation coating chamber is vacuumized, then process gas is filled into the gaseous evaporation coating chamber until the working vacuum degree is reached, then gas in the liquid tank is introduced into the jet gas pipe, the jet gas pipe is provided with a plurality of jet holes, the jet direction of the jet holes faces the substrate, and raw material gas is jetted out of the jet holes and deposited on the surface of the substrate to form the anti-fingerprint film. After the film coating is finished, the substrate passes through the second air separation chamber again, enters the winding chamber and is wound through the second guide roller and the winding roller.
In general, the winding and coating of the base material are realized through the matching of the unwinding roller, the first guide roller, the coating roller, the second guide roller and the winding roller, and the stable operation of the base material can be ensured. The magnetron sputtering coating chamber and the gaseous evaporation coating chamber are positioned in the same vacuum chamber, and the fingerprint-proof film and other film layers can be coated on the same vacuum coating equipment, so that the production efficiency is greatly improved. The invention can realize continuous plating of the anti-fingerprint film and other film layers, can improve the production efficiency, reduce the equipment investment, save energy and reduce consumption.
The above embodiments are preferred embodiments of the present invention, but the present invention is not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications which do not depart from the spirit and principle of the present invention should be construed as equivalents thereof, and all such changes, modifications, substitutions, combinations, and simplifications are intended to be included in the scope of the present invention.
Claims (10)
1. The utility model provides a roll-to-roll vacuum coating equipment for plating prevent fingerprint membrane which characterized in that: the device comprises a vacuum chamber, wherein a coating roller, a winding and unwinding chamber, a magnetron sputtering coating chamber, a first air separation chamber, a gaseous evaporation coating chamber and a second air separation chamber are arranged in the vacuum chamber in sequence along the circumferential direction of the coating roller; the winding and unwinding chamber for winding the substrate is internally provided with an unwinding roller, a first guide roller, a second guide roller and a winding roller, the substrate coming out of the unwinding roller sequentially passes through the first guide roller, the coating roller, the second guide roller and the winding roller, the magnetron sputtering coating chamber is internally provided with a magnetron sputtering coating system, and the vacuum coating equipment further comprises a gaseous evaporation coating system for coating a fingerprint-resistant film.
2. The roll-to-roll vacuum coating apparatus for coating an anti-fingerprint film according to claim 1, wherein: air isolating devices are arranged between the winding and unwinding chamber and the magnetron sputtering coating chamber, between the magnetron sputtering coating chamber and the first air isolating chamber, between the first air isolating chamber and the gaseous evaporation coating chamber, between the gaseous evaporation coating chamber and the second air isolating chamber and between the second air isolating chamber and the winding and unwinding chamber, and gaps for base materials to pass through are reserved between the air isolating devices and the coating rollers.
3. The roll-to-roll vacuum coating apparatus for coating an anti-fingerprint film according to claim 1, wherein: the magnetron sputtering coating system comprises a magnetron target, and the sputtering direction of the magnetron target faces to the substrate.
4. The roll-to-roll vacuum coating apparatus for coating an anti-fingerprint film according to claim 1, wherein: the gaseous evaporation coating system comprises a gaseous evaporation source for generating raw material gas and a gas injection device for injecting the raw material gas to a substrate, wherein the gaseous evaporation source is positioned outside a vacuum chamber, the gas injection device is positioned in a gaseous evaporation coating chamber, and the gaseous evaporation source transmits the raw material gas to the gas injection device through a flow control device.
5. The roll-to-roll vacuum coating apparatus for coating an anti-fingerprint film according to claim 4, wherein: the gaseous evaporation source comprises a liquid tank, the bottom of the liquid tank is provided with a liquid tank heating subsystem, and the outside of the liquid tank is provided with a liquid tank heat-preservation subsystem; the gas injection device comprises an injection gas pipe, a plurality of injection holes are arranged on the injection gas pipe, and the injection direction of the injection holes faces the base material; the flow control device comprises a flow meter, the flow meter is connected to the liquid tank through a connecting air pipe, and the flow meter is connected to the injection air pipe through an introducing air pipe.
6. The roll-to-roll vacuum coating apparatus for coating an anti-fingerprint film according to claim 5, wherein: the injection air pipe is also provided with an injection air pipe heating subsystem, and the outside of the injection air pipe is provided with an injection air pipe heat preservation and insulation subsystem.
7. The method of claim 1 for plating anti-fingerprintRoll-to-roll vacuum coating equipment of membrane, its characterized in that: the working vacuum degree of the magnetron sputtering coating chamber is 1 x 10-1Pa-9*10-1Pa。
8. The roll-to-roll vacuum coating apparatus for coating an anti-fingerprint film according to claim 1, wherein: the working vacuum degree of the gaseous evaporation coating chamber is 8 x 10-2Pa-1*10-3Pa。
9. The roll-to-roll vacuum coating apparatus for coating an anti-fingerprint film according to claim 1, wherein: the winding and unwinding chamber, the magnetron sputtering coating chamber, the first air separating chamber, the gaseous evaporation coating chamber and the second air separating chamber are respectively provided with a vacuum pumping system and an inflation system.
10. The roll-to-roll vacuum coating apparatus for coating an anti-fingerprint film according to claim 3, wherein: the magnetic control target is a plane magnetic control target or a cylinder magnetic control target.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011171391.5A CN112239856A (en) | 2020-10-28 | 2020-10-28 | Roll-to-roll vacuum coating equipment for plating anti-fingerprint film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011171391.5A CN112239856A (en) | 2020-10-28 | 2020-10-28 | Roll-to-roll vacuum coating equipment for plating anti-fingerprint film |
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| Publication Number | Publication Date |
|---|---|
| CN112239856A true CN112239856A (en) | 2021-01-19 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011171391.5A Withdrawn CN112239856A (en) | 2020-10-28 | 2020-10-28 | Roll-to-roll vacuum coating equipment for plating anti-fingerprint film |
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| CN (1) | CN112239856A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113097393A (en) * | 2021-04-12 | 2021-07-09 | 辽宁分子流科技有限公司 | Production equipment for preparing flexible organic new energy battery assembly |
| CN114892131A (en) * | 2022-05-17 | 2022-08-12 | 吴梦伟 | Double-sided multi-station winding type vacuum coating machine |
| CN115505879A (en) * | 2022-09-30 | 2022-12-23 | 广州市博泰光学科技有限公司 | Optical lens coating method |
-
2020
- 2020-10-28 CN CN202011171391.5A patent/CN112239856A/en not_active Withdrawn
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113097393A (en) * | 2021-04-12 | 2021-07-09 | 辽宁分子流科技有限公司 | Production equipment for preparing flexible organic new energy battery assembly |
| CN113097393B (en) * | 2021-04-12 | 2024-02-13 | 辽宁分子流科技有限公司 | Production equipment for preparing flexible organic new energy battery assembly |
| CN114892131A (en) * | 2022-05-17 | 2022-08-12 | 吴梦伟 | Double-sided multi-station winding type vacuum coating machine |
| CN114892131B (en) * | 2022-05-17 | 2024-03-22 | 浦江县晶阳博工贸有限公司 | Double-sided multi-station winding type vacuum coating machine |
| CN115505879A (en) * | 2022-09-30 | 2022-12-23 | 广州市博泰光学科技有限公司 | Optical lens coating method |
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Application publication date: 20210119 |
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