CN201873745U - Vacuum coating device - Google Patents

Vacuum coating device Download PDF

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Publication number
CN201873745U
CN201873745U CN2010206348203U CN201020634820U CN201873745U CN 201873745 U CN201873745 U CN 201873745U CN 2010206348203 U CN2010206348203 U CN 2010206348203U CN 201020634820 U CN201020634820 U CN 201020634820U CN 201873745 U CN201873745 U CN 201873745U
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China
Prior art keywords
heating
vacuum
evaporating
substrate
vacuum chamber
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Expired - Lifetime
Application number
CN2010206348203U
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Chinese (zh)
Inventor
赵芳
任海
魏锋
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Sichuan CCO Display Technology Co Ltd
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Sichuan CCO Display Technology Co Ltd
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Priority to CN2010206348203U priority Critical patent/CN201873745U/en
Application granted granted Critical
Publication of CN201873745U publication Critical patent/CN201873745U/en
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Expired - Lifetime legal-status Critical Current

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Abstract

The utility model relates to the evaporating technique, and provides a vacuum coating device, which solves the problem that an organic evaporation boat of an existing vacuum coating device is farther away from a glass substrate so that film performance is poor. According to the technical scheme, the vacuum coating device comprises a vacuum chamber, a support, a mask, a movable baffle, a heating evaporating device and a substrate, wherein the heating evaporating device includes a heating source and an organic evaporating boat. The vacuum coating device is characterized in that the heating evaporating device is disposed in the vacuum chamber and fixed to the inner lower surface of the vacuum chamber, and an upper opening of the organic evaporating boat in the heating evaporating device corresponds to the substrate. The vacuum coating device has the advantages of better film performance and applicability to vacuum coating.

Description

Vacuum coater
Technical field
The utility model relates to evaporation coating technique, particularly vacuum coater.
Background technology
Organic light emitting display (Organic Light Emitting Diode Displays, be called for short OLED), it is a kind of novel technique of display that grows up from mid-term in 20th century, its principle is that compound generation is luminous after being injected with the machine semiconductor film by positive negative carrier, its structure generally includes: electron injecting layer, electron transfer layer, luminescent layer, hole transmission layer, multilayer film such as hole injection layer, and the thickness of each tunic, homogeneity and film adhesion etc. have great influence to the quality of organic light emitting display, difference according to material, the OLED indicating meter can be divided into two big classes: polymer device (Polymer OLED, be called for short PLED) and small molecules device (Small molecular OLED), compare with polymer materials, the structure of small molecule material is determined, be easy to synthetic and purifying, therefore the product on the market adopts the method for vacuum evaporation to prepare the small molecules device mostly, vacuum evaporation comprises following 3 primary processes: 1. heating evaporation process comprises the phase transition process that is changed into gas phase (solid phase or liquid phase-gas phase) by condensed phase; 2. flight course, gasification atom or the transportation of molecule between evaporation source and substrate, be the flight courses of these particles in ambiance, in the flight course with vacuum chamber in the number of times that bumps of residual gas molecule, the mean free path that depends on evaporation atom, and evaporation source often claims source-cardinal distance to the distance of substrate; 3. evaporation atom or the molecule deposition process on substrate surface promptly is evaporation, cohesion, nucleation, nucleus growth, formation continuous film.Said process all must carry out in the very thin vacuum environment of air, otherwise evaporant atom or molecule will collide with a large amount of air molecules, can make rete be subjected to serious pollution, even formation oxide compound, perhaps the collision owing to air molecule stops, is difficult to form even continuous thin film, in the vacuum evaporation process, in order to reduce the collision that residual gas molecule takes place in organic atom or the molecule vacuum chamber, evaporation cavity pressure must be lower than 3 * 10 -3Pa, the structural representation of vacuum deposition apparatus such as Fig. 1 in the prior art, this device 1 comprises a vacuum chamber 11, a support 12, a mask plate 13, a shifting board 14, heating and evaporating unit and a substrate 17, described heating and evaporating unit comprises a heating source 15 and an organism evaporation boat 16, described heating source 15 is arranged on around the organism evaporation boat 16, vacuum chamber 11 is arranged on the horizontal plane, organism evaporates boat 16 top openings and is connected with vacuum chamber 11 belows, and form an enclosed space with vacuum chamber 11, described support 12 is arranged in the vacuum chamber 11, the below that substrate 17 is arranged on support 12 is corresponding with the top opening of organism evaporation boat 16, mask plate 13 is arranged on substrate 17 and organism evaporation boat 16 corresponding surfaces, shifting board 14 is arranged between the top opening of mask plate 13 and organism evaporation boat 16, wherein, vacuum chamber 11 is the cavitys that vacuum condition can be provided, the vacuum extractor that himself has, can continuous firing, and the vacuum tightness that can keep this chamber is 1.0 * 10 -5Pa.These support 12 stationkeeping, be used to carry mask plate 13 and substrate 17, and have bit function, the pattern that this mask plate 13 is used for designing is transferred to substrate 17 by evaporation, when shifting board 14 does not reach requirement in the organic materials Heating temperature, be in closing condition, when organic material Heating temperature reaches requirement, shifting board 14 is opened automatically, organic materials passes through mask plate 13 evaporations on substrate 17, the evaporate process of this device is: 1. glass substrate 17 is placed on the mask plate 13, and chamber is once bled; 2. heating source 15 begins heating, preheating organism evaporation boat 16, and when reaching vaporization temperature, shifting board 14 is opened, and to glass substrate 17, vacuum tightness is 1.0 * 10 to organism in the chamber by mask plate 13 evaporations -5Pa, yet, organic film uneven thickness, the homogeneity that its evaporation comes out is poor, the process time is long, the organism waste is very serious, in order to obtain well behaved organic thin film, must reduce the number of times that evaporation atom and residual gas bump, at first to reduce the mean free path of evaporation atom, secondly be exactly shortening source-cardinal distance from, the vacuum tightness of prior art vacuum deposition apparatus has reached 1.0 * 10 -5Pa, but under so high vacuum tightness, because organism evaporation boat 16 is far away apart from glass substrate 17, promptly source-cardinal distance is bigger, so film performance is not fine.
The utility model content
The purpose of this utility model is that the organic evaporating boat that overcomes present vacuum coater is far away and to cause film performance be not good shortcoming apart from glass substrate, and a kind of vacuum coater is provided.
The utility model solves its technical problem, the technical scheme that adopts is, vacuum coater, comprise vacuum chamber, support, mask plate, shifting board, heating and evaporating unit and substrate, described heating and evaporating unit comprises heating source and organism evaporation boat, it is characterized in that described heating and evaporating unit is arranged in the vacuum chamber, and being fixed on the vacuum chamber bottom inner surface, the top opening of the organism evaporation boat in the described heating and evaporating unit is corresponding with substrate.
Concrete, described heating and evaporating unit is two.
The beneficial effects of the utility model are, by above-mentioned vacuum coater, because heating and evaporating unit is arranged in the vacuum chamber, shortened source-cardinal distance, therefore in the chamber of identical vacuum tightness, the probability of collision of organic molecule and air molecule has reduced, just reduced the pollution of organic molecule, clean organic molecule can fly on the substrate fast, forms the continuous homogeneous film, and increasing a heating and evaporating unit can enhance productivity.
Description of drawings
Fig. 1 is the structural representation of vacuum coater in the prior art;
Fig. 2 is the structural representation of the vacuum coater of embodiment;
Wherein, 11 is vacuum chamber, and 12 is support, and 13 is mask plate, and 14 is shifting board, and 15 is heating source, and 16 are organism evaporation boat.
Embodiment
Below in conjunction with drawings and Examples, describe the technical solution of the utility model in detail.
The heating and evaporating unit of vacuum coater described in the utility model is arranged in the vacuum chamber 11, and be fixed on vacuum chamber 11 bottom inner surfaces, the top opening of the organism evaporation boat 16 in the heating and evaporating unit is corresponding with substrate 17, because heating and evaporating unit is arranged in the vacuum chamber, shortened source-cardinal distance, therefore in the chamber of identical vacuum tightness, the probability of collision of organic molecule and air molecule has reduced, just reduced the pollution of organic molecule, clean organic molecule can fly on the substrate fast, forms the continuous homogeneous film.
Embodiment
This routine heating and evaporating unit is two, its structural representation such as Fig. 2.
Two heating and evaporating units of vacuum coater are arranged in the vacuum chamber 11, and be fixed on vacuum chamber 11 bottom inner surfaces, the top opening of the organism evaporation boat 16 in two heating and evaporating units is all corresponding with substrate 17, because heating and evaporating unit is arranged in the vacuum chamber, shortened heating and evaporating unit to the distance between the substrate, promptly shortened source-cardinal distance, therefore in the chamber of identical vacuum tightness, the probability of collision of organic molecule and air molecule has reduced, just reduced the pollution of organic molecule, clean organic molecule can fly on the substrate fast, form the continuous homogeneous film, and because the gas of thin organic materials is to fly away uniformly in whole vacuum chamber in high vacuum environment, therefore increasing a heating and evaporating unit is exactly the speed that increases the organic molecule evaporation, enhance productivity, because gas molecule is homodisperse in the environment of high vacuum, so increase the phenomenon that a heating and evaporating unit can't produce the thickness inequality.

Claims (2)

1. vacuum coater, comprise vacuum chamber, support, mask plate, shifting board, heating and evaporating unit and substrate, described heating and evaporating unit comprises heating source and organism evaporation boat, it is characterized in that, described heating and evaporating unit is arranged in the vacuum chamber, and being fixed on the vacuum chamber bottom inner surface, the top opening of the organism evaporation boat in the described heating and evaporating unit is corresponding with substrate.
2. according to the described vacuum coater of claim 1, it is characterized in that described heating and evaporating unit is two.
CN2010206348203U 2010-11-30 2010-11-30 Vacuum coating device Expired - Lifetime CN201873745U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010206348203U CN201873745U (en) 2010-11-30 2010-11-30 Vacuum coating device

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Application Number Priority Date Filing Date Title
CN2010206348203U CN201873745U (en) 2010-11-30 2010-11-30 Vacuum coating device

Publications (1)

Publication Number Publication Date
CN201873745U true CN201873745U (en) 2011-06-22

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102965624A (en) * 2011-08-31 2013-03-13 深圳光启高等理工研究院 Metamaterial and preparation method thereof
CN103866237A (en) * 2012-12-13 2014-06-18 三星显示有限公司 Thin film depositing apparatus and thin film deposition method using the same
CN107029949A (en) * 2015-12-16 2017-08-11 通用电气公司 Coating method
CN108977772A (en) * 2018-07-24 2018-12-11 深圳市华星光电技术有限公司 A kind of evaporation coating device and its vapor deposition cavity

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102965624A (en) * 2011-08-31 2013-03-13 深圳光启高等理工研究院 Metamaterial and preparation method thereof
CN103866237A (en) * 2012-12-13 2014-06-18 三星显示有限公司 Thin film depositing apparatus and thin film deposition method using the same
CN103866237B (en) * 2012-12-13 2018-04-06 三星显示有限公司 Film deposition apparatus and the membrane deposition method using the film deposition apparatus
CN107029949A (en) * 2015-12-16 2017-08-11 通用电气公司 Coating method
CN107029949B (en) * 2015-12-16 2021-03-02 通用电气公司 Coating method
CN108977772A (en) * 2018-07-24 2018-12-11 深圳市华星光电技术有限公司 A kind of evaporation coating device and its vapor deposition cavity

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Granted publication date: 20110622