CN201024210Y

CN201024210Y - Totally-enclosed crossing type vacuum filming machine

Info

Publication number: CN201024210Y
Application number: CNU2007200366846U
Authority: CN
Inventors: 黄维; 邓先宇; 魏昂; 密保秀; 王秋来
Original assignee: Nanjing Post and Telecommunication University
Current assignee: Wuxi Fountain Tech Co., Ltd.
Priority date: 2007-04-10
Filing date: 2007-04-10
Publication date: 2008-02-20
Anticipated expiration: 2017-04-10

Abstract

A hermetic cross-modal vacuum deposition machine relates to equipment which is used in the film of organic molecule, metal, inorganic compounds formed in vacuum. The equipment is mainly used for preparing organic/inorganic composite semiconductor film electronic devices and optoelectronic devices. The film making machine comprises a first evaporation plating chamber (1), a second evaporation plating chamber (2), a pretreatment and transitional chamber (3), a glove box (4), a first masking chamber (5) and a second masking chamber (6); the first evaporation plating chamber (1) is provided with the first masking chamber (5), the second evaporation plating chamber (2) is provided with the second masking chamber(2), the first evaporation plating chamber (1) and the glove box (4) are vertically and crossly connected through the pretreatment and transitional chamber (3); the second evaporation plating chamber (2), the pretreatment and transitional chamber (3) and the glove box (4) are connected linearly. The first evaporation plating chamber (1) and the second evaporation plating chamber (2) adopt the cylindrical vacuum chamber and is connected with the outside through sealing flange.

Description

Totally-enclosed staggered form vacuum film formation machine

Technical field

The utility model relates to organic molecule, metal and mineral compound film forming equipment under vacuum condition, is mainly used in the equipment for preparing organic and organic/inorganic composite semiconductor films electronics and opto-electronic device.

Background technology

Be that the research of the electronics of main body active coating and opto-electronic device and product development have become at present in the world research and development field very popular in the semiconductor film devices field with the organic semiconductor thin film.Have advantages such as easy processing, in light weight, flexible and large-area preparation owing to compare organic materials with inorganic materials, device based on organic materials more and more gets more and more people's extensive concerning, and it should have scope to include organic electro luminescent and a plurality of directions such as demonstration, organic solar batteries, organic photoelectric detector, OTFT and organic memory.Usually consist predominantly of machine molecular material layer or polymkeric substance polymer material layer and metal electrode layer in the device architecture, also auxiliary sometimes inorganic compound layer, the main body active coating in its structure is organic molecule material layer or polymkeric substance polymer material layer.The formation of each layer film all is that the method deposition by thermal evaporation or sputter forms under ultra-high vacuum environment.The core of film-forming apparatus is the pump of evaporation cavity and the acquisition ultrahigh vacuum(HHV) that is connected, and each evaporation source and specimen holder.

Because organic materials and device architecture thereof have water funk oxygen and environmental pollution, obtain to have the device of superperformance, in the device preparation process, must guarantee following condition: 1. certain vacuum tightness; 2. clean base plate; 3. prevent the crossed contamination of differing materials in the material filming process; 4. avoid before the device package contacting with air ambient.Guarantee above condition, the device systems of production must possess following characteristics: 1. the ultrahigh vacuum pump of certain power and good tightness system; 2. in device systems, carry out suitable cleaning substrate (avoiding substrate to expose atmospheric pollution); 3. can effectively isolate between the material evaporation source of each easy crossed contamination; 4. sample can convenient and reasonable transmission between different cavitys under the situation of the equal secluding air of each cavity in total system.For the equipment that is used to prepare organic assembly at present, mainly guarantee the above-mentioned functions condition in the following way.1. by existing sophisticated mechanical means packing technique, cooperate high rotating speed molecular pump or ionic pump, can both reach the needed vacuum tightness of device film forming substantially; 2. on the big cavity of evaporation, is furnished with little substrate cleaning process chambers; 3. all evapn material source all places in the same evaporation cavity by baffles and/or shields with each material source separately, perhaps discrete a plurality of evaporation cavitys and the discrete film forming of finishing the inhomogeneity material of each cavity prevents the crossed contamination of storeroom with this on same straight line; 4. in device systems, adopt the magnetic force bar to finish the transmission of sample between each cavity.

Mainly there is following problem in these device systems at present: 1. for single evaporation cavity equipment, can not fundamentally effectively prevent the crossed contamination, particularly metallic substance of storeroom and the crossed contamination between organic materials, organic materials and the mineral compound material; 2. the device systems that has different discrete evaporation cavitys, each cavity is owing to be on the same straight line, and bang path of sample is long, so that operation inconvenience and equipment occupation space are big.3. do not have and in same cavity, to carry out multiple processing or pretreated transition chamber substrate and film; 4. can not be fine satisfy the condition that the different device of film-forming process such as organic small molecules device and polymer device are prepared simultaneously, be inconvenient to operate.

Summary of the invention

Technical problem: the purpose of this utility model provides a kind of totally-enclosed staggered form vacuum film formation machine for preparing organic and organic/inorganic composite semiconductor films electronics and opto-electronic device under the totally-enclosed condition of high vacuum, use this device systems fabricate devices, can fundamentally effectively prevent in film process inhomogeneity material particularly organic small molecule material and metal, the cross-contamination issue of mineral compound storeroom, and make that simultaneously bang path of sample is short, can carry out the processing and preparing of dissimilar devices such as organic polymer and small molecules device simultaneously, it is very convenient to operate.

Technical scheme: totally-enclosed staggered form vacuum film formation machine of the present utility model comprises first deposited chamber, second deposited chamber, pre-treatment hold concurrently transition chamber, glove box, the first mask chamber, the second mask chamber; First deposited chamber attaches the first mask chamber, and second deposited chamber attaches the second mask chamber, and first deposited chamber becomes square crossing to be connected with glove box via the excessive chamber of pre-treatment; The connection that is in line of second deposited chamber, the excessive chamber of pre-treatment and glove box.First deposited chamber, second deposited chamber adopt round tube type vacuum chamber body, are connected by tongued and grooved flanges with the outside.

First deposited chamber, second deposited chamber adopt at the bottom of round tube type vacuum chamber body, the chamber and last tongued and grooved flanges is formed, and must produce top component, rectangle valve, deposition turntable, total joining many sockets flanges of parts such as baffle plate, each minute baffle plate, electron gun flange, illumination, thickness measuring flange, each valve, pumping hole on the body of chamber.

The pre-treatment transition chamber of holding concurrently adopts the circular vacuum cavity of Ф 150-five-way type, and comprises the transport sector of being made up of-sample rail plate, pallet and a joint group spare and sample hitcher etc.

Glove box adopts the not Unilab 2000 type glove boxes of the standard of Lay benefactor department production of Germany

Circular vacuum chamber body is adopted in the first mask chamber, the second mask chamber, the chamber body be one with coating chamber weldering, and comprise many covers flange-interface and the spare interface that items such as movable Mi Men, template extraction mechanism, mechanical manipulator, viewing window, porcelain envelope electrode flange link and possess the UHV-Z that forms to item parts such as specimen holder, precision mechanical transmission, guide sleeve, multi pack assemblies to mask plate storehouse hand self acting ascending, descending functional conditions and by bellows component and Z to lifting support.Also comprise mask plate storehouse of making and the handing-over vacuum intraoral illumination lamp of forming by low pressure quartz lamp and multi pack assembly and electronic ceramics insulator etc. in addition by the hard aluminium.

Beneficial effect: the existing evaporated device of finishing identical function of the utility model device systems is compared, at first, because two of the film process offices of the bigger organic materials of vaporization temperature difference and metal or mineral compound material are the evaporation cavity independently, can effectively prevent the crossed contamination of material in film process.Secondly, because the drive path of sample between each cavity is square crossing, its point of crossing is a pretreatment chamber, make that like this bang path of sample is short as far as possible, and guarantee convenient transmission, needed transmission rod length is shortened, favourable and saving device systems placement space.The 3rd, because pretreatment chamber is positioned at the infall of two cavitys and glove box, pretreatment chamber can carry out multiple processing to substrate or film sample according to the needs that the different cavity system is equipped with, and can well finish the transmission of sample between glove box and each cavity.The 4th, because each evaporation cavity carries the mask plate chamber, both saved the space of evaporation cavity, make that simultaneously the displacement mask plate is very convenient.The 5th, because each evaporation cavity is in the different bang paths of square crossing direction, and each have vacuum gate valve and separate, like this when evaporation film forming organic molecule, do not influence other devices and evaporate film forming metal electrode or other inorganic thin films simultaneously, can be so that the device of broad variety structure such as organic small molecules device and polymer device prepare simultaneously.The 6th, because the reasonableness of the vacuum transmission of total system design can guarantee sample and device finished product all in transmission between glove box and each evaporation cavity under the secluding air condition, and allow device under not exposing air conditions, pass to carry out package test in the glove box.

By using this device systems, can use lower cost, the preparation of maximum efficiency is based on the semiconducter device of organic molecule and polymeric film, and can guarantee device performance to greatest extent.

Description of drawings

Fig. 1 is a structural representation of the present utility model, wherein has: first deposited chamber 1, second deposited chamber 2, pre-treatment hold concurrently transition chamber 3, glove box 4, the first mask chamber 5, the second mask chamber 6.

Embodiment

This film former comprises first deposited chamber 1, second deposited chamber 2, pre-treatment hold concurrently transition chamber 3, glove box 4, the first mask chamber 5, the second mask chamber 6; 5, the second deposited chambers subsidiary second mask chambers 2, the first deposited chamber subsidiary

first mask chamber

1,6, the first deposited chambers 1 are connected via the 3 one-tenth square crossings in the excessive chamber of pre-treatment with glove box 4; The connection that is in line of second deposited chamber 2, the excessive chamber 3 of pre-treatment and glove box 4.First deposited chamber 1, second deposited chamber 2 adopt round tube type vacuum chamber body, are connected by tongued and grooved flanges with the outside.

Glove box 4 is the anhydrous and oxygen-free glove box, as Germany's Unilab 2000 types of Lay grace not, mainly finishes the packaging and testing of device;

The pre-treatment transition chamber 3 of holding concurrently, Ф 250 * 300 type pretreatment chamber that ultrahigh vacuum(HHV) institute in Shenyang produces can finish the heat pre-treatment of film under clean (as plasma cleaning), vacuum or the non-vacuum condition of substrate and the multiple functions such as transfer transition of sample;

First deposited chamber 1 be organic molecule film forming deposited chamber (subsidiary the first mask chamber 5) as Ф 500 * 720 types that ultrahigh vacuum(HHV) institute in Shenyang produces, mainly finish the evaporation film forming of organic molecule, subsidiary mask plate chamber is finished and is placed and displacement mask plate function.

Second deposited chamber 2 is mineral compound and metal electrode film forming deposited chamber (the subsidiary second mask chamber 6), the Ф of Shenyang ultrahigh vacuum(HHV) institute 450 * 720 mainly finishes inorganicization and thing and evaporation of metals film forming, and subsidiary mask plate chamber is finished and placed and displacement mask plate function.

The vacuum insulation gate valve all is installed between the above-mentioned chamber.

Hold concurrently transition chamber 3, glove box 4 chambers of pre-treatment has independently molecular pump and mechanical pump respectively.

With preparation organic electroluminescence device (OLED) and polymer electroluminescent device (PLED) preparation process explanation the utility model.

1.OLED preparation process:

In atmosphere, the ITO substrate sent into sample preadmission chamber → close the movable sealing door and obtain the high vacuum background and (realize leveling in regular turn to the ITO surface, activation, oxygenating) → transfer to OEL film preparation chamber (finishing the membrane prepare of multilayer organic light emission) → sample is handed off to magnetic force transmission pole → transfer to give processing transfer → transmission and cause metal evaporation chamber (finishing the electrode film preparation) → and return pretreatment chamber's transfer and finish sample handing-over → sample is sent into glove box → finish OLED device terminal to encapsulate with sample.

2.PLED preparation process:

With ITO substrate → send into pretreatment chamber's (oxygenating is leveled, activated to vacuum stripping, the plasma body finished the surface) → to pretreatment chamber's inflation → sample is sent into glove box (spin coating macromolecule membrane) → sample is directly sent into the terminal that pretreatment chamber (the vacuum transfer can be heated as required and wait pre-treatment simultaneously) → be transferred to metal evaporation chamber (finishing the doping of metal electrode film preparation and active metal) → return pretreatment chamber's (vacuum transfer) → glove box finishes the POLED device in the glove box encapsulate.

3.OLED with PLED preparation process simultaneously:

Because organic molecule thin film evaporation process time is long usually, when in organic vapor deposition chamber evaporation film forming, can prepare PLED simultaneously by the preparation process of PLED in 2 during this, wherein metal electrode carries out carrying out simultaneously but nonintervention mutually with the organic molecule film forming in the metal evaporation chamber.

Claims

1. totally-enclosed staggered form vacuum film formation machine is characterized in that this film former comprises first deposited chamber (1), second deposited chamber (2), pre-treatment hold concurrently transition chamber (3), glove box (4), the first mask chamber (5), the second mask chamber (6); First deposited chamber (1) attaches the first mask chamber (5), and second deposited chamber (2) attaches the second mask chamber (6), and first deposited chamber (1) becomes square crossing to be connected with glove box (4) via the excessive chamber of pre-treatment (3); The connection that is in line of second deposited chamber (2), the excessive chamber of pre-treatment (3) and glove box (4).

2. totally-enclosed staggered form vacuum film formation machine according to claim 1 is characterized in that first deposited chamber (1), second deposited chamber (2) adopt round tube type vacuum chamber body, are connected by tongued and grooved flanges with the outside.