CN214572199U - High-efficient quick electron beam coating equipment - Google Patents
High-efficient quick electron beam coating equipment Download PDFInfo
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- CN214572199U CN214572199U CN202120689039.4U CN202120689039U CN214572199U CN 214572199 U CN214572199 U CN 214572199U CN 202120689039 U CN202120689039 U CN 202120689039U CN 214572199 U CN214572199 U CN 214572199U
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Abstract
The utility model discloses a high-efficient quick electron beam coating equipment, including the coating film room, the vacuum pipe space of the coiling room, below that are located the top, the vacuum pipe space is kept apart coating film room and coiling room to gap through coating film roller next door links to each other with the coating film room, be equipped with winding system, the thick tester of online membrane in the coiling room, it has the evacuation system even to coil the roof portion of the room, the indoor electron beam device, the supplementary coating film system of plasma, evaporation crucible, the gas intake system that is equipped with of coating film. The utility model discloses can overcome because of the low shortcoming of not enough and the film fold of the deposition film compactness that arouses of diffusion capacity and radial force maldistribution, it is fast to have an evaporation rate, and film forming quality is high, and high-efficient quick characteristics still have continuous coating film, and coiling tension control is stable, and advantages such as on-line measuring occupy smallly, are a high-efficient quick electron beam coating equipment, are fit for research and development mechanism and low yield coating film processing and use.
Description
Technical Field
The utility model relates to a vacuum coating equipment technical field specifically is a high-efficient quick electron beam coating equipment.
Background
With the development of vacuum winding coating technology, the updating of vacuum winding coating equipment is continuously meeting the requirements of industrial production, and different types of vacuum winding coating equipment are derived. At present, most of evaporation winding coating equipment adopts electron beams or resistance heating targets to evaporate surface components in the form of atomic groups or ions and deposit the components on the surface of a substrate, and a film material is formed through a film forming process. The traditional evaporation coating equipment has the defects of insufficient compactness of a deposited film, poor film quality, incapability of accurately controlling the coating thickness and low coating efficiency due to the defects of low diffusion capacity and the like.
If the publication No. CN 209144244U discloses an electron beam coating system capable of enhancing the binding force and the density of a coating layer, a strip to be coated is cleaned, heated and etched, the binding force of the coating layer is improved, and the equipment is provided with an ion auxiliary evaporation system, so that the density of the coating layer is improved. But the coating vacuum degree of the equipment is difficult to control, the requirement of low vacuum is difficult to achieve, and various coating requirements can not be met. For another example, the publication No. CN 205710897U discloses a multifunctional winding coating apparatus, which can perform pretreatment on the surface of a flexible substrate by ion etching, and then perform surface coating on the flexible substrate. The equipment has high integration of functionality, low cost and small occupied space, and is suitable for the development and research work of small-yield production or laboratories. But the equipment and the process have the defects of low shadow effect, low diffusion capability and the like, and easily cause the problems of poor film quality such as insufficient compactness of a deposited film and the like.
In order to solve the problems, the scheme is developed accordingly.
SUMMERY OF THE UTILITY MODEL
Technical problem to be solved
Aiming at the defects of the prior art, the utility model provides a high-efficiency and rapid electron beam coating equipment, which solves the problems in the prior art.
(II) technical scheme
In order to achieve the above purpose, the utility model discloses a following technical scheme realizes: the utility model provides a high-efficient quick electron beam coating equipment, equipment divide into winding chamber, coating film room, vacuum pipe space, and winding chamber is the cuboid shape, and the lower part is the coating film room, and upper portion is the winding chamber, and vacuum pipe space keeps apart coating film room and winding chamber to link to each other with the coating film room through the gap next to the coating film roller, and equipment includes the winding system of winding the substrate, electron beam device, the supplementary coating film system of plasma, gaseous air inlet system, full-automatic winding tension control system, online thick tester of membrane, evacuation system.
The winding chamber is internally provided with a winding and unwinding roller, a guide roller, a coating roller and a material belt, all the rollers are monitored and controlled by a full-automatic control winding tension system, the winding tension can be stably controlled, and the online film thickness tester can detect the coating thickness in real time. In addition, the coating roller also has the conductive capability.
The film coating chamber is provided with an electron beam device, an evaporation crucible, a crucible cooling device, an electrode metal mesh and a gas inlet. The coating chamber and the winding chamber are isolated by a vacuum pipeline space, the vacuum pipeline space can be connected with the coating chamber through a gap beside the coating roller, and the vacuum pipeline space is connected with a mechanical pump in an air exhaust system at the top of the equipment. The electron beam device is positioned in the vacuum pipeline extending upwards from the outside of the coating chamber and the coating chamber, and the electron beam generated by the electron beam device is converged on the evaporation crucible to heat the evaporation target material. The evaporation crucible is provided with a water cooling system, the metal of the water cooling system is tightly attached to the crucible, the outer wall of the evaporation crucible is coated with a heat-conducting coating, and the crucible is cooled through external water circulation during film coating. The plasma auxiliary coating system is used for carrying out plasma treatment on evaporation steam, partial steam is subjected to plasma treatment in the evaporation process, and ionized steam is beneficial to the film forming process, so that the whole coating process not only carries out electron beam evaporation heating coating, but also generates ion coating. The positive pole of the plasma auxiliary coating system is connected with an electrode metal mesh in the coating chamber, the negative pole is connected with the coating roller, and the evaporation steam can be rapidly deposited on the coating roller to form a film under the action of an electric field. The gas inlet in the film coating chamber is close to the water cooling system. The vacuum-pumping system can pump out the gas in the film coating chamber through the vacuum pipeline space.
Preferably, one side of the lower part of the main body of the apparatus is open and extends upwards to form a section of vacuum side tube, and the electron beam device is installed in the vacuum side tube extending upwards from the side.
Preferably, the winding chamber is internally provided with a winding and unwinding roller, a guide roller, a coating roller and a material belt, the material belt sequentially passes through the winding and unwinding roller, the guide roller, the coating roller, the guide roller and the winding roller, and the winding chamber can be used for feeding and taking materials from the side. The unwinding roller and the winding roller can be arranged on the same roller or two different rollers.
Preferably, the vacuum pipeline space isolates the coating chamber from the winding chamber, and the vacuum pipeline space can pump out gas in the coating chamber through a gap beside the coating roller, namely, the gas flow path enters from a gas inlet, then enters the vacuum pipeline space from a fine peak beside the coating roller, and then is discharged through a vacuum-pumping system.
Preferably, the electron beam device is an electron gun, and is specifically a straight electron gun, and the straight electron gun is composed of a cathode for emitting electrons, a focusing electrode for focusing electron beams, and an anode for accelerating electrons. The generated electron beams can be accurately converged on an evaporation crucible in the coating chamber to heat the evaporation target.
Preferably, the evaporation crucible is cylindrical, the outer wall of the crucible is provided with a heat conduction coating, the evaporation crucible is provided with a water cooling system, metal of the water cooling system is tightly attached to the crucible, and the crucible is cooled through external water circulation during film coating.
Preferably, the gas inlet system controls the inlet of gas through the gas inlet valve, and is used for supplying various special gases required by production, and meanwhile, the gas can drive the evaporation steam to be transmitted to the coating roller. The special gas enters from the gas inlet, enters into the vacuum pipeline space from the gap beside the coating roller and is exhausted through the vacuum-pumping system.
Preferably, the gas inlet system controls the inlet of gas through the gas inlet valve, and is used for supplying various special gases required by production, and meanwhile, the gas can drive the evaporation steam to be transmitted to the coating roller. The special gas enters from the gas inlet, enters into the vacuum pipeline space from the gap beside the coating roller and is exhausted through the vacuum-pumping system.
Preferably, the full-automatic control winding tension system is used for monitoring and controlling the tension of the material belt, the winding roller is wound and unwound, the guide roller and the coating roller are connected with the full-automatic control winding tension system, the full-automatic control winding tension system directly measures the actual tension value of the material belt through the tension sensor, then the tension data is converted into a tension signal and fed back to the tension controller, the tension signal is compared with the preset tension value of the controller through the tension signal, a control signal is calculated, and the automatic control execution unit enables the actual tension value to be equal to the preset tension value so as to achieve the purpose of controlling the tension to be stable.
Preferably, the vacuum-pumping system is composed of a mechanical pump and a roots pump, the mechanical pump is connected with the top of the equipment, and the gas in the coating chamber can be pumped out through the vacuum pipeline space, namely, the gas flow path enters from the gas inlet, then enters the vacuum pipeline space from a fine peak beside the coating roller, and then is discharged through the vacuum-pumping system. The vacuum-pumping system also comprises a butterfly valve, an angle valve, a control system, a tail gas treatment device and other components.
(III) advantageous effects
After the technical scheme is adopted, compared with the prior art, the utility model, possess following advantage:
1. the utility model relates to a high-efficient quick electron beam coating equipment can overcome because of the low shortcoming of not enough and the film fold of the deposit film compactness that arouses of diffusion capacity and radial force maldistribution, has that evaporation rate is fast, and film forming quality is high, high-efficient quick characteristics, still has continuous coating film, and coiling tension control is stable, advantages such as on-line measuring occupy smallly, is a high-efficient quick electron beam coating equipment, is fit for research and development mechanism and low yield coating film processing and uses.
2. The utility model relates to a high-efficient quick electron beam coating equipment, its unique structural design can be with the fine isolation of coiling room and coating film room, has guaranteed coating film in-process vacuum pressure stability and low vacuum state. The electron beam equipment is also provided with a plasma auxiliary coating system, and electron beam evaporation coating and ion plating are adopted in the coating process, so that the plasma vapor is facilitated to form a film on the coating roller. The gas inlet system of the device can produce different types of metal oxide films, metal nitride films and metal films, and meanwhile, the gas inlet system is also beneficial to improving the diffusion capacity of vapor.
3. The utility model relates to a high-efficient quick electron beam coating equipment, the full-automatic tension control system that convolutes that sets up can unmanned real time monitoring and the tension in control material area, and the film fold problem that can effectually avoid the radial force to distribute uneven and cause guarantees the coating film quality.
Drawings
FIG. 1 is a schematic view of a high-efficiency and rapid electron beam coating machine according to the present invention.
In the figure: the device comprises a guide roller 1, a take-up and pay-off roller 2, a take-up chamber 3, a coating roller 4, an electron beam device 5, a coating chamber 6, a gas inlet 7, crucible water cooling system metal 8, an evaporation crucible 9, a mechanical pump 10, a roots pump 11, a vacuum pipeline 12, an online film thickness tester 13 and an electrode metal mesh 14.
Detailed Description
The invention is explained in more detail below with reference to the figures and examples.
As shown in fig. 1: a high-efficiency and rapid electron beam coating equipment comprises a winding and unwinding roller 2, a guide roller 1, a coating roller 4 and a material belt in a winding chamber 3. The coating chamber is provided with an electron beam device 5, an evaporation crucible 9, a crucible cooling device 8, an electrode metal mesh 14 and a gas inlet 7.
The coating chamber 6 and the winding chamber 3 are isolated by a vacuum pipe space 12, the vacuum pipe space 12 can be connected with the coating chamber through a gap beside the coating roller 4, and the vacuum pipe space is connected with a mechanical pump 10 and a roots pump 11 in an air exhaust system at the top of the equipment.
The electron beam equipment is positioned in the vacuum pipelines which extend upwards outside the coating chamber and the coating chamber, and the electron beams generated by the electron beam equipment are converged on the evaporation crucible 9 in the coating chamber to heat the evaporation target material. The evaporation crucible is provided with a water cooling system, the metal 8 of the crucible water cooling system is tightly attached to the crucible 9, and the crucible is cooled by external circulating water. A gas inlet 7 in the gas inlet system is close to the water cooling system, the gas inlet system controls the gas to enter through a gas inlet valve, the gas inlet system is used for supplying various special gases required by production, and meanwhile, the gas can drive the evaporation steam to be transmitted to the coating roller.
The plasma auxiliary coating system carries out plasma treatment on evaporation steam, the positive electrode of the plasma auxiliary coating system is connected with the electrode metal mesh 14, the negative electrode of the plasma auxiliary coating system is connected with the coating roller 4, and the evaporation steam can be accelerated to be rapidly deposited and formed on the coating roller under the action of an electric field.
The full-automatic winding tension control system of the equipment is used for monitoring and controlling the tension of the material belt, and the winding and unwinding roller 2, the guide roller 1 and the coating roller 4 are connected with the full-automatic winding tension control system so as to achieve the purpose of controlling and stabilizing the tension.
The online film thickness detection system 13 can detect the thickness of the coating film in real time.
The vacuum-pumping system mainly comprises a mechanical pump 10 and a roots pump 11, the mechanical pump 10 is connected with the top of the equipment, and the gas in the film coating chamber can be pumped out through the vacuum pipeline space, namely, the special gas enters from a gas inlet through a flow path, enters the vacuum pipeline space from a gap beside the film coating roller and is discharged through the vacuum-pumping system.
The working mode of the high-efficiency rapid electron beam coating comprises the following steps:
and opening a helium gas inlet system of the equipment, opening a side cover of the winding chamber, winding and conveying the base material in the winding chamber through the winding system, and enabling the base material to pass through the winding roller, the guide roller, the coating roller, the guide roller and the winding roller in the winding chamber in sequence. Then the coated metal is placed in a crucible of an electron beam device. All hatches are closed and locked. The mechanical pump and the roots pump in the vacuum-pumping system are turned on, and the vacuum is pumped to and maintained at a low vacuum value through the mutual cooperation of the two groups of pumps.
Adjusting the rotating shaft of the electron gun to adjust the incident angle of the electron beam and automatically calibrating and aligning the crucible. And selecting the power of the electron gun according to the actual coating requirement, wherein the power range of the electron gun is 100-1000 KW, and waiting for starting. And opening a crucible water cooling system, setting the temperature and the water flow speed, and waiting for the water temperature to be constant.
And opening the plasma auxiliary coating system, setting the coating power including coating voltage and current, performing idle discharge treatment, and checking whether the reflected power is normal. And after the detection is correct, closing the empty discharge and waiting for starting.
And opening the film thickness detection system and the full-automatic winding tension control system, setting a winding tension value and a winding speed, and waiting for starting.
And starting all the waiting starting devices, heating the coating metal in the evaporation crucible by an electron beam emitted by an electron gun, carrying out plasmatization on the steam generated by melting and evaporating under the action of an electric field of a plasma auxiliary coating system, rapidly depositing the steam generated by the plasmatization on a coating roller under the driving action of the electric field and gas to form a high-quality coating layer, and winding the coated product onto a winding roller through a winding system to finish coating.
And closing all systems of the equipment, performing vacuum discharge treatment, closing the helium gas inlet system, and taking materials on the winding roller.
In light of the foregoing, it will be apparent to those skilled in the art from this disclosure that various changes and modifications can be made without departing from the spirit and scope of the invention. The technical scope of the present invention is not limited to the content of the specification, and the protection scope must be determined by the scope of the claims.
Claims (8)
1. The utility model provides a high-efficient quick electron beam coating equipment which characterized in that: the device comprises a winding chamber positioned above, a film coating chamber positioned below and a vacuum pipeline space, wherein the vacuum pipeline space isolates the film coating chamber from the winding chamber and is connected with the film coating chamber through a gap beside a film coating roller, a winding system and an online film thickness tester are arranged in the winding chamber and are arranged on the side part of a material belt and detect the thickness of a coated film in real time, the winding system controls the tension stability of the winding system in real time through a full-automatic winding tension control system, a vacuumizing system is connected outside the winding chamber, an electron beam device, a plasma auxiliary film coating system, an evaporation crucible and a gas inlet system are arranged in the film coating chamber, one side of the film coating chamber is opened and extends upwards to form a section of vacuum side pipe body, the electron beam device is arranged in the vacuum side pipe body, and the plasma auxiliary film coating system, the gas inlet system and the evaporation crucible are all arranged below the winding system, the electron beam generated by the electron beam device is converged at the evaporation crucible.
2. The high-efficiency rapid electron beam coating apparatus according to claim 1, wherein: the winding system comprises a winding and unwinding roller, a guide roller, a coating roller and a material belt, wherein the material belt sequentially passes through the winding and unwinding roller, the guide roller, the coating roller, the guide roller and the winding roller, and the winding system carries out feeding and taking operations from the side surface of a winding chamber.
3. The high-efficiency rapid electron beam coating apparatus according to claim 2, wherein: the full-automatic winding tension control system is composed of a tension sensor and a tension controller, wherein the tension sensor is used for measuring the actual tension value of the material belt, and the tension controller is connected with the unwinding roller, the guide roller and the coating roller.
4. The high-efficiency rapid electron beam coating apparatus according to claim 1, wherein: the electron beam device is a straight electron gun which consists of a cathode for emitting electrons, a focusing electrode for focusing electron beams and an anode for accelerating the electrons, and the generated electron beams can be accurately converged on an evaporation crucible in a coating chamber to heat an evaporation target material.
5. The high-efficiency rapid electron beam coating apparatus according to claim 1, wherein: the evaporation crucible is cylindrical, the outer wall of the crucible is provided with a heat conduction coating, the periphery of the evaporation crucible is annularly provided with a water cooling system, the water cooling system is tightly attached to the crucible, and the crucible is cooled through external water circulation during film coating.
6. The high-efficiency rapid electron beam coating apparatus according to claim 5, wherein: the gas inlet system comprises a gas inlet which is controlled by an air inlet valve to supply gas required by production, the gas enters a vacuum pipeline space from a gap beside the coating roller and is discharged through a vacuum-pumping system, and the gas inlet is close to the water cooling system.
7. The high-efficiency rapid electron beam coating apparatus according to claim 2, wherein: the plasma auxiliary coating system is used for carrying out plasma treatment on evaporation steam and comprises an electrode metal net connected with a power supply, the positive electrode of the power supply is connected with the electrode metal net, the negative electrode of the power supply is connected with a coating roller, and the coating roller has corresponding conductive capacity.
8. The high-efficiency rapid electron beam coating apparatus according to claim 1, wherein: the vacuum-pumping system consists of a mechanical pump and a roots pump, the top of the equipment is connected with the mechanical pump, and the gas flow path is that the gas enters from a gas inlet, then enters a vacuum pipeline space from a fine peak beside the coating roller and is discharged through the vacuum-pumping system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120689039.4U CN214572199U (en) | 2021-04-06 | 2021-04-06 | High-efficient quick electron beam coating equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120689039.4U CN214572199U (en) | 2021-04-06 | 2021-04-06 | High-efficient quick electron beam coating equipment |
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| CN214572199U true CN214572199U (en) | 2021-11-02 |
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| CN202120689039.4U Active CN214572199U (en) | 2021-04-06 | 2021-04-06 | High-efficient quick electron beam coating equipment |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114934252A (en) * | 2022-03-02 | 2022-08-23 | 九江德福科技股份有限公司 | Pretreatment method for vacuum coating on surface of polymer film |
| CN114990495A (en) * | 2022-08-04 | 2022-09-02 | 怡通科技有限公司 | Electron beam high-precision coating equipment |
-
2021
- 2021-04-06 CN CN202120689039.4U patent/CN214572199U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114934252A (en) * | 2022-03-02 | 2022-08-23 | 九江德福科技股份有限公司 | Pretreatment method for vacuum coating on surface of polymer film |
| CN114990495A (en) * | 2022-08-04 | 2022-09-02 | 怡通科技有限公司 | Electron beam high-precision coating equipment |
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