CN219136901U - High-power efficient planar cathode sputtering coating equipment - Google Patents
High-power efficient planar cathode sputtering coating equipment Download PDFInfo
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- CN219136901U CN219136901U CN202221883037.XU CN202221883037U CN219136901U CN 219136901 U CN219136901 U CN 219136901U CN 202221883037 U CN202221883037 U CN 202221883037U CN 219136901 U CN219136901 U CN 219136901U
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Abstract
The utility model discloses high-power efficient planar cathode sputtering coating equipment, which relates to the field of coating equipment and comprises a coating upper machine body, wherein an elastic metal plate is fixedly arranged at the upper part of the coating upper machine body, a substrate is fixedly attached to the lower surface of the elastic metal plate, a coating lower machine body is correspondingly arranged below the elastic metal plate, a target material corresponding to the lower part of the substrate is arranged on the surface of the coating lower machine body, the shape of the surface of the target material is considered to be concave-convex changeable, therefore, the elastic metal plate capable of elastically deforming is arranged, a corresponding pushing unit is arranged in a cavity, the pushing unit can push the elastic metal plate to be close to or far away from the target material, the distance between the substrate and the surface of the target material is consistent, new electrons and Ar positive ions can uniformly act on the surfaces of the substrate and the target material respectively during coating, the uniformity of coating on the surface of the target material is ensured, and the phenomenon that the coating film is too thin or too thick is avoided.
Description
Technical Field
The utility model relates to the field of coating equipment, in particular to high-power efficient planar cathode sputtering coating equipment.
Background
According to the principle of magnetron sputtering, incident particles emitted by an ion emission unit collide with argon atoms in the process of flying to a substrate, so that Ar positive ions and new electrons are generated by ionization of the incident particles, the new electrons fly to the substrate, ar ions are accelerated to fly to a target under the action of an electric field, the surface of the target is bombarded with high energy, the target is sputtered, and neutral target atoms or molecules are deposited on the target in the sputtered particles to form a film.
The surface shape of the target is concave-convex, and the phenomenon that the coating film is too thin or too thick easily occurs when the substrate is too far or too close to the target. Therefore, it is necessary to invent a high-power efficient planar cathode sputtering coating device to solve the above problems.
Disclosure of Invention
The utility model aims to provide high-power efficient planar cathode sputtering coating equipment so as to solve the problems in the background technology.
In order to achieve the above purpose, the present utility model provides the following technical solutions: the utility model provides a high-power high-efficient planar cathode sputtering coating equipment, includes the coating film upper body, the below of coating film upper body is provided with the elastic metal plate, the fixed laminating of lower surface of elastic metal plate has the base plate, and the below of elastic metal plate corresponds and is provided with the coating film lower body, and the surface of coating film lower body is provided with the target that corresponds in the base plate below, the base plate is rectangular strip structure and is provided with the multiunit along the width direction of coating film upper body, equidistance distributes between the multiunit base plate, form the cavity between organism and the elastic metal plate on the coating film, be provided with the pushing unit that promotes elastic metal plate and warp in the cavity, the both ends upper surface of elastic metal plate is all fixed and is provided with the connecting plate, the both sides face of organism is fixed to be provided with the side base plate on the coating film, the side base plate is L font structure, and the top inner wall of side base plate is provided with the spout, the upper end of connecting plate is fixed with the slider that sliding connection in the spout, fixed mounting has the expansion unit that promotes the connecting plate and remove on the side inner wall of side base plate of keeping away from the coating film upper body.
Preferably, the pushing unit comprises a cylinder fixed at the top of the cavity, and the lower end of the cylinder corresponds to one surface of the elastic metal plate, which is close to the cavity.
Considering that the surface shape of the target is concave-convex, the elastic metal plate capable of elastic deformation is arranged, the corresponding pushing unit is arranged in the cavity, the pushing unit can push the elastic metal plate to be close to or far away from the target, the distance between the substrate and the surface of the target is ensured to be consistent, and when coating, new electrons and Ar positive ions can uniformly act on the surfaces of the substrate and the target respectively, the uniformity of coating on the surface of the target is ensured, and the phenomenon that the coating is too thin or too thick when the substrate is too far or too far from the target is avoided.
Preferably, a magnetic suction plate which is fixedly adsorbed and fixed on the surface of the elastic metal plate is fixedly arranged at the lower end of the air cylinder.
In order to better push the elastic metal plate to deform, the lower end of the air cylinder is provided with a magnetic suction plate which is adsorbed and fixed on the surface of the elastic metal plate, so that the end part of the air cylinder is ensured to be movably fixed on the surface of the elastic metal plate, and the elastic metal plate is adapted to the elastic deformation of the elastic metal plate;
when the elastic metal plate is deformed, the telescopic unit can drive the connecting plate to move to adapt to the length of the elastic metal plate, so that accumulation phenomenon at two ends of the elastic metal plate can be avoided.
Preferably, the lower surface of the magnetic suction plate is fixedly provided with a rubber block, and the rubber block is movably attached to the surface of the elastic metal plate.
The rubber block can elastically deform, and is suitable for expansion and contraction when the elastic metal plate elastically deforms, so that direct contact between the magnetic suction plate and the elastic metal plate is replaced, and friction is reduced.
Preferably, a detection unit for monitoring the vertical distance between the magnetic suction plate and the surface of the target material is arranged on one side of the magnetic suction plate.
Further, the detection unit can use devices such as a distance sensor, and the detection unit is used for detecting the distance between the target surface and the magnetic suction plate, so that the distance between the target surface and the magnetic suction plate is always consistent, the thickness uniformity of a coating film is ensured, the phenomenon that the distance between the target surface and the magnetic suction plate is too far, few new electrons fly to a substrate and few sputtering coating films are generated on the target surface is avoided.
Preferably, the upper film plating machine body is fixedly connected with the lower film plating machine body through a connecting frame, and the connecting frame is arranged at one end of the upper film plating machine body.
Preferably, an ion emission unit is arranged at one end, far away from the connecting frame, between the upper film plating machine body and the lower film plating machine body, and the ion emission unit is correspondingly arranged between the substrate and the target.
According to the principle of magnetron sputtering, incident particles emitted by an ion emission unit collide with argon atoms in the process of flying to a substrate, so that Ar positive ions and new electrons are generated by ionization of the incident particles, the new electrons fly to the substrate, ar ions are accelerated to fly to a target under the action of an electric field, the surface of the target is bombarded with high energy, the target is sputtered, neutral target atoms or molecules are deposited on the target to form a film in the sputtered particles, and the ion emission unit can use devices such as a particle generator and the like.
The utility model has the technical effects and advantages that:
1. the utility model relates to high-power efficient planar cathode sputtering coating equipment, which comprises a coating upper machine body, wherein an elastic metal plate is fixedly arranged at the upper part of the coating upper machine body, a substrate is fixedly attached to the lower surface of the elastic metal plate, a coating lower machine body is correspondingly arranged below the elastic metal plate, a plurality of groups of targets which are correspondingly arranged below the substrate are arranged on the surface of the coating lower machine body, the substrate is in a rectangular strip structure along the width direction of the coating upper machine body, the shape of the target is concave-convex changeable, so that the elastic metal plate which can elastically deform is arranged, a corresponding pushing unit is arranged in a cavity, the pushing unit can push the elastic metal plate to be close to or far away from the target, the distance between the substrate and the target is consistent, new electrons and Ar positive ions can uniformly act on the surfaces of the substrate and the target respectively, the uniformity of the coating on the surface of the target is ensured, and the phenomenon that the substrate is too thin or too thick from the target is avoided;
2. according to the high-power efficient planar cathode sputtering coating equipment, in order to better push the elastic metal plate to deform by the air cylinder, the magnetic suction plate which is adsorbed and fixed on the surface of the elastic metal plate is arranged at the lower end of the air cylinder, so that the end part of the air cylinder is ensured to be movably fixed on the surface of the elastic metal plate, and the elastic metal plate is adapted to elastic deformation;
3. according to the high-power efficient planar cathode sputtering coating equipment, the detection unit is used for detecting the distance between the target surface and the magnetic suction plate, so that the distance between the target surface and the magnetic suction plate is always consistent, the thickness uniformity of the coating is ensured, and the phenomena that the distance between the target surface and the magnetic suction plate is too far, few new electrons fly to a substrate and few sputtering coating are generated on the target surface are avoided.
Drawings
FIG. 1 is a schematic diagram of the structure of the present utility model.
FIG. 2 is a schematic diagram of a side substrate structure according to the present utility model.
In the figure: 1. a film plating upper body; 2. a film plating lower body; 3. an elastic metal plate; 4. a substrate; 5. an ion emission unit; 6. a target material; 7. a cavity; 8. a cylinder; 9. a magnetic suction plate; 10. a rubber block; 11. a detection unit; 12. a connecting frame; 13. a side substrate; 14. a telescoping unit; 15. a chute; 16. a slide block; 17. and (5) connecting a plate.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
The utility model provides high-power efficient planar cathode sputtering coating equipment as shown in fig. 1-2, which comprises a coating upper machine body 1, wherein an elastic metal plate 3 is arranged below the coating upper machine body 1, a substrate 4 is fixedly attached to the lower surface of the elastic metal plate 3, a coating lower machine body 2 is correspondingly arranged below the elastic metal plate 3, a plurality of groups of targets 6 are arranged on the surface of the coating lower machine body 2 correspondingly below the substrate 4, the substrate 4 is in a rectangular strip structure, a plurality of groups of substrates 4 are equidistantly distributed along the width direction of the coating upper machine body 1, a cavity 7 is formed between the coating upper machine body 1 and the elastic metal plate 3, pushing units for pushing the elastic metal plate 3 to deform are arranged in the cavity 7, connecting plates 17 are fixedly arranged on the upper surfaces of two ends of the elastic metal plate 3, side substrates 13 are fixedly arranged on the two sides of the coating upper machine body 1, the side substrates 13 are in an L-shaped structure, sliding grooves 15 are formed in the upper inner walls of the side substrates 13, sliding blocks 16 which are correspondingly connected in the sliding grooves 15 are arranged at the upper ends of the side substrates 13, and telescopic connecting plates 14 are fixedly arranged on the inner walls of one side of the side substrates which are far away from the coating upper side of the coating upper machine body 1, which pushes the upper side of the elastic metal plate body 17 to move.
The pushing unit comprises an air cylinder 8 fixed at the top of the cavity 7, and the lower end of the air cylinder 8 corresponds to one surface of the elastic metal plate 3 close to the cavity 7.
Considering that the surface shape of the target material 6 is concave-convex, the elastic metal plate 3 capable of elastically deforming is arranged, the corresponding pushing unit is arranged in the cavity 7, the pushing unit can push the elastic metal plate 3 to be close to or far away from the target material 6, the distance between the substrate 4 and the surface of the target material 6 is ensured to be consistent, new electrons and Ar positive ions can uniformly act on the surfaces of the substrate 4 and the target material 6 respectively during film coating, the uniformity of film coating on the surface of the target material 6 is ensured, and the phenomenon that the film coating is too thin or too thick when the substrate 4 is too far or too far from the target material 6 is avoided.
The lower end of the cylinder 8 is fixedly provided with a magnetic suction plate 9 which is fixedly adsorbed on the surface of the elastic metal plate 3.
In order to better promote the elastic metal plate 3 to deform by the air cylinder 8, the magnetic suction plate 9 which is adsorbed and fixed on the surface of the elastic metal plate 3 is arranged at the lower end of the air cylinder 8, so that the end part of the air cylinder 8 is movably fixed on the surface of the elastic metal plate 3, and the elastic metal plate is adapted to the elastic deformation of the elastic metal plate 3.
When the elastic metal plate 3 is deformed, the telescopic unit 14 can drive the connecting plate 17 to move to adapt to the length of the elastic metal plate 3, so that the phenomenon of accumulation at two ends of the elastic metal plate 3 can not occur;
the rubber block 10 is fixedly arranged on the lower surface of the magnetic suction plate 9, and the rubber block 10 is movably attached to the surface of the elastic metal plate 3.
The rubber block 10 can elastically deform, and stretches and contracts when being adapted to the elastic deformation of the elastic metal plate 3, so that the magnetic suction plate 9 is replaced to be in direct contact with the elastic metal plate 3, and friction is reduced.
One side of the magnetic attraction plate 9 is provided with a detection unit 11 for monitoring the vertical distance between the magnetic attraction plate 9 and the surface of the target 6.
Furthermore, the detection unit 11 can use devices such as a distance sensor, and the detection unit 11 is used for detecting the distance between the surface of the target material 6 and the magnetic suction plate 9, so that the distance between the surface of the target material 6 and the magnetic suction plate 9 is always consistent, the thickness uniformity of the coating film is ensured, and the phenomena that the distance between the surface of the target material 6 and the magnetic suction plate 9 is too far, few new electrons fly to the substrate 4 and few sputtering coating films are generated on the surface of the target material 6 are avoided.
The upper film plating machine body 1 is fixedly connected with the lower film plating machine body 2 through a connecting frame 12, and the connecting frame 12 is arranged at one end of the upper film plating machine body 1.
An ion emission unit 5 is arranged at one end, far away from the connecting frame 12, between the coating upper machine body 1 and the coating lower machine body 2, and the ion emission unit 5 is correspondingly arranged between the substrate 4 and the target 6.
According to the principle of magnetron sputtering, incident particles emitted by the ion emitting unit 5 collide with argon atoms in the process of flying to the substrate 4, so that Ar positive ions and new electrons are generated by ionization, the new electrons fly to the substrate 4, ar ions are accelerated to fly to the target 6 under the action of an electric field, the surface of the target 6 is bombarded by high energy, the target 6 is sputtered, neutral target atoms or molecules are deposited on the target 6 to form a film in sputtered particles, and the ion emitting unit 5 can use devices such as a particle generator.
Working principle: considering that the surface shape of the target material 6 is concave-convex, the elastic metal plate 3 capable of elastically deforming is arranged, the corresponding pushing unit is arranged in the cavity 7, the pushing unit can push the elastic metal plate 3 to be close to or far away from the target material 6, the distance between the substrate 4 and the surface of the target material 6 is ensured to be consistent, new electrons and Ar positive ions can uniformly act on the surfaces of the substrate 4 and the target material 6 respectively during film coating, the uniformity of film coating on the surface of the target material 6 is ensured, and the phenomenon that the film coating is too thin or too thick when the substrate 4 is too far or too far from the target material 6 is avoided.
Finally, it should be noted that: the foregoing description is only illustrative of the preferred embodiments of the present utility model, and although the present utility model has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described, or equivalents may be substituted for elements thereof, and any modifications, equivalents, improvements or changes may be made without departing from the spirit and principles of the present utility model.
Claims (7)
1. The utility model provides a high-power high-efficient planar cathode sputtering coating equipment, includes organism (1) on the coating film, its characterized in that: the lower surface mounting of organism (1) is provided with elastic metal plate (3), the lower fixed surface laminating of elastic metal plate (3) has base plate (4), and the below of elastic metal plate (3) corresponds and is provided with organism (2) under the coating film, and the surface of organism (2) is provided with target (6) corresponding in base plate (4) below under the coating film, base plate (4) are rectangle strip structure and are provided with the multiunit along the width direction of organism (1) on the coating film, equidistance distributes between multiunit base plate (4), form cavity (7) on the coating film between organism (1) and elastic metal plate (3), be provided with in cavity (7) and promote the promotion unit that elastic metal plate (3) warp, the both ends upper surface of elastic metal plate (3) is all fixed and is provided with connecting plate (17), the both sides face of organism (1) is all fixed and is provided with side base plate (13), side base plate (13) are L font structure, and the top inner wall of side base plate (13) is provided with spout (15), the upper end of connecting plate (17) is fixed and is provided with in the upper end sliding connection of connecting plate (17) and is kept away from on flexible spout (16) of organism (14) in moving the fixed connection of connecting plate (1).
2. The high-power efficient planar cathode sputtering coating device according to claim 1, wherein: the pushing unit comprises an air cylinder (8) fixed at the top of the cavity (7), and the lower end of the air cylinder (8) corresponds to one surface, close to the cavity (7), of the elastic metal plate (3).
3. The high-power efficient planar cathode sputtering coating device according to claim 2, wherein: the lower end of the air cylinder (8) is fixedly provided with a magnetic suction plate (9) which is fixedly adsorbed on the surface of the elastic metal plate (3).
4. A high power, high efficiency planar cathode sputter coating apparatus as recited in claim 3, wherein: the lower surface of the magnetic suction plate (9) is fixedly provided with a rubber block (10), and the rubber block (10) is movably attached to the surface of the elastic metal plate (3).
5. The high-power efficient planar cathode sputtering coating device according to claim 4, wherein: one side of the magnetic suction plate (9) is provided with a detection unit (11) for monitoring the vertical distance between the magnetic suction plate (9) and the surface of the target material (6).
6. The high-power efficient planar cathode sputtering coating device according to claim 1, wherein: the upper film plating machine body (1) is fixedly connected with the lower film plating machine body (2) through a connecting frame (12), and the connecting frame (12) is arranged at one end of the upper film plating machine body (1).
7. The high-power efficient planar cathode sputtering coating device according to claim 1, wherein: one end, far away from the connecting frame (12), between the coating upper machine body (1) and the coating lower machine body (2) is provided with an ion emission unit (5), and the ion emission unit (5) is correspondingly arranged between the substrate (4) and the target (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221883037.XU CN219136901U (en) | 2022-07-21 | 2022-07-21 | High-power efficient planar cathode sputtering coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221883037.XU CN219136901U (en) | 2022-07-21 | 2022-07-21 | High-power efficient planar cathode sputtering coating equipment |
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| Publication Number | Publication Date |
|---|---|
| CN219136901U true CN219136901U (en) | 2023-06-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221883037.XU Active CN219136901U (en) | 2022-07-21 | 2022-07-21 | High-power efficient planar cathode sputtering coating equipment |
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| CN (1) | CN219136901U (en) |
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- 2022-07-21 CN CN202221883037.XU patent/CN219136901U/en active Active
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