CN208378981U - A kind of rotary magnetic control sputtering device - Google Patents
A kind of rotary magnetic control sputtering device Download PDFInfo
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- CN208378981U CN208378981U CN201820408710.1U CN201820408710U CN208378981U CN 208378981 U CN208378981 U CN 208378981U CN 201820408710 U CN201820408710 U CN 201820408710U CN 208378981 U CN208378981 U CN 208378981U
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- telescopic rod
- glide path
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Abstract
The utility model relates to sputter coating fields, in particular to a kind of rotary magnetic control sputtering device, including vacuum chamber, horizontally disposed seal cover board, he Moving Leader Mechanism and magnet rotating mechanism, the magnet rotating mechanism includes horizontally disposed support plate, rotating electric machine, horizontally disposed rotating vane, connecting column, magnet and magnetic receiver, a kind of rotary magnetic control sputtering device of the utility model, when equipment work, rotating electric machine drives rotating vane rotation, the cylindrical type cam slide cooperation that rotating vane passes through strip through slot and connection top end, drive connecting column, magnetic receiver and magnet are slided along annular groove on seal cover board surface, so that the line of magnetic induction of target lower part is evenly distributed on the sputter face range of entire target, fixed magnetic field is effectively reduced to the overetch of target fixed area, make each portion of target material surface Position uniformly etches, and substantially increases the utilization rate and service life of planar targets.
Description
Technical field
The utility model relates to sputter coating field, in particular to a kind of rotary magnetic control sputtering device.
Background technique
Sputtering is to prepare one of major technique of thin-film material, and the ion that it utilizes ion source to generate passes through in a vacuum
Accelerate aggregation, and form the ion beam current of energy at high speed, bombard the surface of solids, ion and surface of solids atom occur kinetic energy and hand over
It changes, the atom of the surface of solids is made to leave solid and is deposited on substrate surface, the solid bombarded sputtering method deposition film
Raw material, referred to as sputtering target material.No matter various types of sputtered film materials are in semiconductor integrated circuit, recording medium, plane
Display and surface coating etc. are all widely used.
Magnetron sputtering plating is a kind of novel physical vapor plated film mode, and there are many evaporation coating mode in 2013
The advantage of aspect is quite obvious.The more mature technology developed as one, magnetron sputtering are applied to many
Field.
The utilization rate for the planar targets being widely used at present probably 25%, conventional equipment when in use, the magnetic strength in magnetic field
Line is answered to compare concentration and uneven in the distribution of the surface of target, the position for causing these line of magnetic inductions of target material surface densely distributed is carved
Erosion is very fast, and the position of line of magnetic induction breadth coefficient etching is slowly, results under planar targets utilization rate, service life contracting
It is short, therefore the effective utilization rate for improving planar targets and service life are at the urgent need of current industry.
Utility model content
The purpose of this utility model is that in view of the deficiencies of the prior art, providing a kind of rotary magnetic control sputtering device.
Preferably, including vacuum chamber, horizontally disposed seal cover board, he Moving Leader Mechanism and magnet rotating mechanism, institute
It states seal cover board to be fixedly mounted at the top of vacuum chamber, four corners at the top of the seal cover board, which are respectively equipped with, to be vertically arranged
The first support column, the second support column, third support column and the 4th support column, the he Moving Leader Mechanism includes horizontally disposed
The both ends of first slideway and the second slideway, first slideway are fixedly connected with the first support column and the second support column respectively, institute
The both ends for stating the second slideway are fixedly connected with third support column and the 4th support column respectively, and first slideway is equipped with and first
The first telescopic rod that slideway is slidably matched, the first telescopic rod is horizontally disposed, the length of the axis of the first telescopic rod and the first slideway
Direction is vertical, and second slideway is equipped with the second telescopic rod being slidably matched with the second slideway, and the second telescopic rod is horizontally disposed,
The axis of second telescopic rod is vertical with the length direction of the second slideway, and the magnet rotating mechanism includes horizontally disposed support
Four corners of plate, rotating electric machine, horizontally disposed rotating vane, connecting column, magnet and magnetic receiver, the support plate are equipped with
The mounting groove of grafting is corresponded for support top end, the support plate bottom is equipped with the annular groove slided for connecting column, rotation
It is fixedly connected at the top of rotating motor and support plate, the output end of rotating electric machine runs through support plate, the rotating vane downwards
For elongated plates, one end of rotating vane is fixedly connected with the output end of rotating electric machine, and the rotating vane is equipped with and connecting column
The strip through slot that top is slidably matched, magnetic receiver are fixedly connected with the bottom end of connecting column, the bottom of the magnet and magnetic receiver
It is fixedly connected.
Preferably, first slideway both ends are provided with buckle, and the first slideway both ends pass through buckle and first respectively
Dagger and the second support column are fixedly connected, and first slideway includes under horizontal and spaced first sliding way and first
Slideway, the first sliding way and the first glide path are provided with the sliding slot of strip along its length.
Preferably, bearing is equipped between first sliding way and the first glide path, the sliding slot setting of the first sliding way exists
The top of the first glide path, the sliding slot of the first sliding way and is arranged in the bottom of first sliding way, the sliding slot of the first glide path
The sliding slot of one glide path is slidably matched with bearing, and one end of first telescopic rod passes through bearing inner race and the first slideway slides
Cooperation, first telescopic rod are equipped with anti-dropout ring in the two sides of bearing.
Preferably, second slideway both ends are provided with buckle, and the second slideway both ends pass through buckle and third branch respectively
Dagger and the 4th support column are fixedly connected, and second slideway includes under horizontal and spaced second sliding way and second
Slideway, the second sliding way and the second glide path are provided with the sliding slot of strip along its length.
Preferably, bearing is equipped between second sliding way and the second glide path, the sliding slot setting of the second sliding way exists
The top of the second glide path, the sliding slot of the second sliding way and is arranged in the bottom of second sliding way, the sliding slot of the second glide path
The sliding slot of two glide paths is slidably matched with bearing, and one end of second telescopic rod passes through bearing inner race and the second slideway slides
Cooperation, second telescopic rod are equipped with anti-dropout ring in the two sides of bearing.
Preferably, the seal cover board is forge piece of step type structure, and the seal cover board is equipped with viscous far from the small end bottom of magnet
Paste layer.
Preferably, the seal cover board is made of insulating materials.
Preferably, the connecting column is cuboid, and the top of connecting column is provided with the cylinder being slidably matched with rotating vane
Shape cam, connecting column are arranged with limit sleeve, one end far from the first slideway of the first telescopic rod and the second telescopic rod far from the
One end of two slideways is fixedly connected with limit sleeve.
Preferably, there are three the magnet settings, three magnet spaced sets, the magnetic receiver is by permeability magnetic material system
At.
Preferably, a mounting hole for seal cover board installation is equipped at the top of the vacuum chamber.
The utility model has the advantages that a kind of rotary magnetic control sputtering device of the utility model, when equipment work, rotating electric machine band
Dynamic rotating vane rotation, cylindrical type cam slide cooperation of the rotating vane by strip through slot and connection top end, the company of drive
It connects column, magnetic receiver and magnet and is slided along annular groove on seal cover board surface, so that the line of magnetic induction of target lower part is uniformly distributed
In the sputter face range of entire target, fixed magnetic field is effectively reduced to the overetch of target fixed area, makes target material surface
Each position uniformly etches, and substantially increases the utilization rate and service life of planar targets.
Detailed description of the invention
Fig. 1 show the schematic perspective view of the utility model;
Fig. 2 show sectional perspective structural schematic diagram one;
Fig. 3 show sectional perspective structural schematic diagram two;
Fig. 4 show sectional perspective structural schematic diagram three;
Description of symbols: vacuum chamber 1, seal cover board 2, the first support column 2a, the second support column 2b, third support column
2c, the 4th support column 2d, adhered layer 2e, the first slideway 3, the first sliding way 3a, the first glide path 3b, the first telescopic rod 3c, the
Two slideways 4, the second sliding way 4a, the second glide path 4b, the second telescopic rod 4c, support plate 5, rotating electric machine 5a, rotating vane 5b,
Mounting groove 5c, annular groove 5d, strip through slot 5b1, connecting column 6, cylindrical type cam 6a, limit sleeve 6b, magnetic receiver 7, magnet
8, buckle 9, sliding slot 10, bearing 11, anti-dropout ring 12, target 13.
Specific embodiment
With reference to the accompanying drawings of the specification and embodiment, specific embodiment of the utility model is described in further detail:
A kind of rotary magnetic control sputtering device referring to figs. 1 to 4, including vacuum chamber 1, horizontally disposed sealing
8 rotating mechanism of cover board 2, he Moving Leader Mechanism and magnet, the seal cover board 2 is fixedly mounted on 1 top of vacuum chamber, described close
Four corners at 2 top of capping plate are respectively equipped with the first support column 2a being vertically arranged, the second support column 2b, third support column
2c and the 4th support column 2d, the he Moving Leader Mechanism include horizontally disposed first slideway 3 and the second slideway 4, and described first
The both ends of slideway 3 are fixedly connected with the first support column 2a and the second support column 2b respectively, the both ends of second slideway 4 respectively with
Third support column 2c and the 4th support column 2d are fixedly connected, and first slideway 3 is equipped with the to be slidably matched with the first slideway 3
One telescopic rod 3c, the first telescopic rod 3c is horizontally disposed, and the axis of the first telescopic rod 3c is vertical with the length direction of the first slideway 3,
Second slideway 4 is horizontally disposed equipped with the second telescopic rod 4c, the second telescopic rod 4c being slidably matched with the second slideway 4, the
The axis of two telescopic rod 4c is vertical with the length direction of the second slideway 4, and 8 rotating mechanism of magnet includes horizontally disposed support
Plate 5, rotating electric machine 5a, horizontally disposed rotating vane 5b, connecting column 6, magnet 8 and magnet 87, four of the support plate 5
Corner is equipped with the mounting groove 5c that grafting is corresponded for support top end, and 5 bottom of support plate is equipped with to be slided for connecting column 6
Annular groove 105d, rotating electric machine 5a is fixedly connected with the top of support plate 5, and the output end of rotating electric machine 5a passes through downwards
Perforating branches fagging 5, the rotating vane 5b are elongated plates, one end of rotating vane 5b and the fixed company of the output end of rotating electric machine 5a
It connects, the rotating vane 5b is equipped with and the strip through slot 5b1 that is slidably matched of 6 top of connecting column, magnet 87 and connecting column 6
Bottom end is fixedly connected, and the magnet 8 is fixedly connected with magnet 87 bottoms.
First slideway, 3 both ends are provided with buckle 9, and 3 both ends of the first slideway pass through buckle 9 and the first support column respectively
2a and the second support column 2b are fixedly connected, and first slideway 3 includes horizontal and spaced first sliding way 3a and the
One glide path 3b, the first sliding way 3a and the first glide path 3b is provided with the sliding slot 10 of strip along its length, passes through cunning
The setting in road allows the first telescopic rod 3c to slidably reciprocate along the length direction of the first slideway 3.
Bearing 11 is equipped between the first sliding way 3a and the first glide path 3b, the sliding slot 10 of the first sliding way 3a is arranged
In the bottom of the first sliding way 3a, the top of the first glide path 3b, the first sliding way is arranged in the sliding slot 10 of the first glide path 3b
The sliding slot 10 of the sliding slot 10 of 3a and the first glide path 3b are slidably matched with bearing 11, and one end of the first telescopic rod 3c passes through
11 inner ring of bearing is slidably matched with the first slideway 3, and the first telescopic rod 3c is equipped with anti-dropout ring 12 in the two sides of bearing 11, leads to
It crosses and bearing 11 and the interspersed cooperation of the first telescopic rod 3c is set in slideway, ensure that the axis and the first slideway of the first telescopic rod 3c
3 length direction is vertical, and the setting of anti-dropout ring 12 ensure that the first telescopic rod 3c will not fall off in the process of moving.
Second slideway, 4 both ends are provided with buckle 9, and 4 both ends of the second slideway pass through buckle 9 and third support column respectively
2c and the 4th support column 2d are fixedly connected, and second slideway 4 includes horizontal and spaced second sliding way 4a and the
Two glide path 4b, the second sliding way 4a and the second glide path 4b are provided with the sliding slot 10 of strip along its length, pass through cunning
The setting in road allows the second telescopic rod 4c to slidably reciprocate along the length direction of the second slideway 4.
Bearing 11 is equipped between the second sliding way 4a and the second glide path 4b, the sliding slot 10 of the second sliding way 4a is arranged
In the bottom of the second sliding way 4a, the top of the second glide path 4b, the second sliding way is arranged in the sliding slot 10 of the second glide path 4b
The sliding slot 10 of the sliding slot 10 of 4a and the second glide path 4b are slidably matched with bearing 11, and one end of the second telescopic rod 4c passes through
11 inner ring of bearing is slidably matched with the second slideway 4, and the second telescopic rod 4c is equipped with anti-dropout ring 12 in the two sides of bearing 11, leads to
It crosses and bearing 11 and the interspersed cooperation of the second telescopic rod 4c is set in slideway, ensure that the axis and the second slideway of the second telescopic rod 4c
4 length direction is vertical, and the setting of anti-dropout ring 12 ensure that the second telescopic rod 4c will not fall off in the process of moving.
The seal cover board 2 is forge piece of step type structure, and the seal cover board 2 is equipped with adhered layer far from the small end bottom of magnet 8
2e can make seal cover board 2 have preferable leakproofness by the design, and matching sealant item is used together, and sealing effect is splendid,
Adhered layer 2e ensure that target 13 can be firmly pasted on seal cover board 2 and not fall off.
The seal cover board 2 is made of insulation diamagnetic material, ensure that magnet 8 will not be adsorbed on sealing using diamagnetic material
2 surface of cover board, enables magnet 8 smoothly to drive rotation by rotating electric machine 5a.
The connecting column 6 is cuboid, and the top of connecting column 6 is provided with the circular cylindrical projection being slidably matched with rotating vane 5b
Wheel, connecting column 6 are arranged with limit sleeve 6b, and one end far from the first slideway 3 of the first telescopic rod 3c and the second telescopic rod 4c's is remote
One end from the second slideway 4 is fixedly connected with limit sleeve 6b, by limit sleeve 6b make magnet 8 in entire moving process not
Understand itself to rotate, to ensure that being uniformly distributed for magnetic field be not chaotic.
There are three the settings of magnet 8, and three 8 spaced sets of magnet, the magnet is made for 87 of permeability magnetic material, leads
Magnet 87 of magnetic material are magnetized after being fixedly connected with magnet 8, so that two blocks of magnet 8 of jingle bell form U-shaped combination, to make
The domed distribution of the line of magnetic induction at the on-fixed end of two blocks of magnet 8 of jingle bell, the magnetic field strength which generates are better than monolithic magnetic
Iron 8 generates magnetic field strength, and the line of magnetic induction more crypto set, improves the utilization rate of target 13.
It is equipped with the mounting hole installed for seal cover board 2 at the top of the vacuum chamber 1, passes through the mounting hole, sealing
Cover board 2 can matching sealant item be fixedly connected with the mounting hole.
A kind of rotary magnetic control sputtering device of the utility model, when equipment work, rotating electric machine 5a drives pivoting leaf
Piece 5b rotation, rotating vane 5b are slidably matched by the cylindrical type cam 6a on 6 top strip through slot 5b1 and connecting column, are driven
Connecting column 6, magnet 87 and magnet 8 are slided along annular groove 105d on 2 surface of seal cover board, so that the magnetic strength of 13 lower part of target
It answers line to be evenly distributed on the sputter face range of entire target 13, effectively reduces fixed magnetic field to the excessive of 13 fixed area of target
Etching, etches each position in 13 surface of target uniformly, substantially increases the utilization rate and service life of planar targets 13.
The above descriptions are merely preferred embodiments of the present invention, not makees to the technical scope of the utility model
Any restrictions out, thus it is any trickle amendment made by the above technical examples according to the technical essence of the present invention, equivalent
Variation and modification, in the range of still falling within the technical solution of the utility model.
Claims (10)
1. a kind of rotary magnetic control sputtering device, it is characterised in that: including vacuum chamber (1), horizontally disposed seal cover board
(2), he Moving Leader Mechanism and magnet (8) rotating mechanism, the seal cover board (2) are fixedly mounted at the top of vacuum chamber (1), institute
State four corners at the top of seal cover board (2) be respectively equipped with the first support column (2a) being vertically arranged, the second support column (2b),
Third support column (2c) and the 4th support column (2d), the he Moving Leader Mechanism include horizontally disposed first slideway (3) and
The both ends of two slideways (4), first slideway (3) are fixedly connected with the first support column (2a) and the second support column (2b) respectively,
The both ends of second slideway (4) are fixedly connected with third support column (2c) and the 4th support column (2d) respectively, and described first is sliding
Road (3) is equipped with the first telescopic rod (3c) being slidably matched with the first slideway (3), and the first telescopic rod (3c) is horizontally disposed, and first
The axis of telescopic rod (3c) is vertical with the length direction of the first slideway (3), and second slideway (4) is equipped with and the second slideway
(4) the second telescopic rod (4c) being slidably matched, the second telescopic rod (4c) is horizontally disposed, the axis and second of the second telescopic rod (4c)
The length direction of slideway (4) is vertical, and magnet (8) rotating mechanism includes horizontally disposed support plate (5), rotating electric machine
(5a), horizontally disposed rotating vane (5b), connecting column (6), magnet (8) and magnet (8) seat (7), the four of the support plate (5)
A corner is equipped with the mounting groove (5c) that grafting is corresponded for support top end, and support plate (5) bottom is equipped with for connection
The annular groove (10) (5d) of column (6) sliding, is fixedly connected at the top of rotating electric machine (5a) and support plate (5), rotating electric machine
The output end of (5a) runs through support plate (5) downwards, the rotating vane (5b) be elongated plates, the one of rotating vane (5b)
End is fixedly connected with the output end of rotating electric machine (5a), and the rotating vane (5b) is equipped with and connecting column (6) top is slidably matched
Strip through slot (5b1), magnet (8) seat (7) is fixedly connected with the bottom end of connecting column (6), the magnet (8) and magnet (8)
The bottom of seat (7) is fixedly connected.
2. a kind of rotary magnetic control sputtering device according to claim 1, it is characterised in that: first slideway (3) two
End is provided with buckle (9), and the first slideway (3) both ends pass through buckle (9) and the first support column (2a) and the second support column respectively
(2b) is fixedly connected, and first slideway (3) includes horizontal and spaced first sliding way (3a) and the first glide path
(3b), the first sliding way (3a) and the first glide path (3b) are provided with the sliding slot (10) of strip along its length.
3. a kind of rotary magnetic control sputtering device according to claim 2, it is characterised in that: first sliding way (3a)
And first be equipped with bearing (11) between glide path (3b), the sliding slot (10) of the first sliding way (3a) is arranged at the first sliding way (3a)
Bottom, the sliding slot (10) of the first glide path (3b) is arranged in the top of the first glide path (3b), the cunning of the first sliding way (3a)
The sliding slot (10) of slot (10) and the first glide path (3b) is slidably matched with bearing (11), one end of first telescopic rod (3c)
It is slidably matched across bearing (11) inner ring and the first slideway (3), first telescopic rod (3c) is equipped in the two sides of bearing (11)
Anti-dropout ring (12).
4. a kind of rotary magnetic control sputtering device according to claim 3, it is characterised in that: second slideway (4) two
End is provided with buckle (9), and the second slideway (4) both ends pass through buckle (9) and third support column (2c) and the 4th support column respectively
(2d) is fixedly connected, and second slideway (4) includes horizontal and spaced second sliding way (4a) and the second glide path
(4b), the second sliding way (4a) and the second glide path (4b) are provided with the sliding slot (10) of strip along its length.
5. a kind of rotary magnetic control sputtering device according to claim 4, it is characterised in that: second sliding way (4a)
And second be equipped with bearing (11) between glide path (4b), the sliding slot (10) of the second sliding way (4a) is arranged at the second sliding way (4a)
Bottom, the sliding slot (10) of the second glide path (4b) is arranged in the top of the second glide path (4b), the cunning of the second sliding way (4a)
The sliding slot (10) of slot (10) and the second glide path (4b) is slidably matched with bearing (11), one end of second telescopic rod (4c)
It is slidably matched across bearing (11) inner ring and the second slideway (4), second telescopic rod (4c) is equipped in the two sides of bearing (11)
Anti-dropout ring (12).
6. a kind of rotary magnetic control sputtering device according to claim 1, it is characterised in that: the seal cover board (2) is
Forge piece of step type structure, the seal cover board (2) are equipped with adhered layer (2e) far from the small end bottom of magnet (8).
7. a kind of rotary magnetic control sputtering device according to claim 6, it is characterised in that: the seal cover board (2) is
Insulation diamagnetic material is made.
8. a kind of rotary magnetic control sputtering device according to claim 1, it is characterised in that: the connecting column (6) is length
Cube, the top of connecting column (6) are provided with the cylindrical type cam (6a) being slidably matched with rotating vane (5b), connecting column (6) set
Equipped with limit sleeve (6b), one end far from the first slideway (3) of the first telescopic rod (3c) and the second telescopic rod (4c) far from the
One end of two slideways (4) is fixedly connected with limit sleeve (6b).
9. a kind of rotary magnetic control sputtering device according to claim 1, it is characterised in that: the magnet (8) is provided with
Three, three magnet (8) spaced sets, magnet (8) seat (7) is made of permeability magnetic material.
10. a kind of rotary magnetic control sputtering device according to claim 1, it is characterised in that: vacuum chamber (1) top
Portion is equipped with a mounting hole for seal cover board (2) installation.
Priority Applications (1)
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CN201820408710.1U CN208378981U (en) | 2018-03-23 | 2018-03-23 | A kind of rotary magnetic control sputtering device |
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CN201820408710.1U CN208378981U (en) | 2018-03-23 | 2018-03-23 | A kind of rotary magnetic control sputtering device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2022010661A1 (en) * | 2020-07-09 | 2022-01-13 | Lam Research Corporation | Adjustable geometry trim coil |
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2018
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022010661A1 (en) * | 2020-07-09 | 2022-01-13 | Lam Research Corporation | Adjustable geometry trim coil |
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Effective date of registration: 20190730 Address after: 110 000 No. 16-69 Puwen Road, Shenbei New District, Shenyang City, Liaoning Province (101) Patentee after: Shenyang Qihui Vacuum Technology Co., Ltd. Address before: 323020 No. 23 Qingwan Village, Liandu Town, Lishui City, Zhejiang Province Patentee before: Liandu Lishui Jun Zheng die factory |