CN218812234U - Heat insulation device for HVPE growth furnace - Google Patents
Heat insulation device for HVPE growth furnace Download PDFInfo
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- CN218812234U CN218812234U CN202320120590.6U CN202320120590U CN218812234U CN 218812234 U CN218812234 U CN 218812234U CN 202320120590 U CN202320120590 U CN 202320120590U CN 218812234 U CN218812234 U CN 218812234U
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- heat insulation
- baffle
- growth furnace
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- fixing frame
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The application discloses a heat insulation device for an HVPE growth furnace, which comprises a fixing frame, a heat insulation baffle and a bottom layer heat insulation baffle; the fixing frame is matched with the growth furnace and is arranged in a cylindrical shape; the fixing frame is detachably arranged on the growth furnace and used for installing the heat insulation baffle and the bottom layer heat insulation baffle; the top end of the fixed frame is fixedly provided with an installation plate corresponding to the top surface of the growth furnace; the mounting plate is arranged in a ring shape and is used for detachably connecting the fixed frame with the top surface of the growth furnace; the inside detachable of mount is provided with thermal baffle, and inside bottom detachable is provided with bottom thermal baffle, all is used for thermal-insulated work. The heat insulation device for the HVPE growth furnace is simple, practical, stable and firm.
Description
Technical Field
The application relates to the technical field of gallium nitride growth, in particular to a heat insulation device for an HVPE growth furnace.
Background
Gallium nitride (GaN) has wide applications in the fields of charging markets, 5G base stations, power systems, semiconductor lighting, new energy automobiles and the like, and Hydride Vapor Phase Epitaxy (HVPE) is the leading mode for preparing high-quality GaN substrate materials at present. The quality, availability and price of GaN substrates are not sufficient to meet market demands, and thus the development of high-quality, low-cost HVPE devices is urgently needed. At present, the temperature difference between temperature areas of equipment on the market, particularly vertical resistance furnaces, is not obvious, the constant temperature areas are difficult to appear, even if the constant temperature areas exist at a certain moment, the constant temperature areas disappear after long-time stable operation, and the strong convection phenomenon of gas between the temperature areas is easy to occur. Therefore, a heat insulation device for an HVPE growth furnace needs to be designed to ensure that a certain temperature difference exists between adjacent temperature regions, further ensure the constant temperature of a constant temperature region, effectively improve the performance of a furnace body and improve the crystal growth efficiency.
Disclosure of Invention
In view of the above-described deficiencies or inadequacies of the prior art, it would be desirable to provide a simple, practical, stable, and robust thermal insulation apparatus for an HVPE growth furnace.
The application provides a heat insulation device for an HVPE growth furnace, which comprises a fixing frame, a heat insulation baffle and a bottom layer heat insulation baffle;
the fixing frame is matched with the growth furnace and is arranged in a cylindrical shape; the fixing frame is detachably arranged on the growth furnace and used for installing the heat insulation baffle and the bottom layer heat insulation baffle; the top end of the fixed frame is fixedly provided with an installation plate corresponding to the top surface of the growth furnace; the mounting plate is arranged in a ring shape and is used for detachably connecting the fixed frame with the top surface of the growth furnace; the inside detachable of mount is provided with thermal baffle, and inside bottom detachable is provided with bottom thermal baffle, all is used for thermal-insulated work.
Preferably, the heat insulation baffle comprises a heat insulation plate and a mounting block; the heat insulation plate is matched with the inside of the fixed frame and is arranged into a circular plate shape; the heat insulation plate is provided with a plurality of through holes in a penetrating manner along the axis direction; two heat insulation plates in the same heat insulation baffle are arranged up and down, the axes of the two heat insulation plates are overlapped and are spaced by 2.5-3.5 cm along the axis direction, and the through holes on the two heat insulation plates are staggered with each other.
Preferably, one end of each heat insulation plate in the same heat insulation baffle along the diameter direction is fixedly provided with an installation block; the mounting block is arranged along the diameter direction of the heat insulation plate; the number of the installation blocks in the same heat insulation baffle is three along the circumferential direction of the heat insulation plate.
Preferably, the inner wall of one end of the fixing frame along the diameter direction is fixedly provided with a mounting hole corresponding to the mounting block; the mounting hole is arranged in a convex shape; the mounting hole evenly is provided with threely along the circumference of mount, and three is a set of axis direction along the mount and is provided with the multiunit.
Preferably, the bottom layer heat insulation baffle plate has the same specification with the heat insulation baffle plate; the center of the bottom heat insulation baffle penetrates through the bottom heat insulation baffle along the axis direction and is provided with a central through hole.
Compared with the prior art, the beneficial effects of this application are:
this application divides into 5 ~ 7 warm areas in the growth furnace through thermal baffle and bottom thermal baffle, two warm areas at both ends are the heat preservation district about the furnace body, middle warm area is the source region in proper order, the temperature transition district, the crystal growth district, the temperature difference that sets up of a plurality of warm areas, form a plurality of temperature gradient areas in the growth furnace, reduce the heat loss, ensure the even of source region and crystal growth district temperature field, it is stable, it has the certain temperature difference to have guaranteed between the adjacent warm area, the constancy of temperature in constant temperature district has further been guaranteed, effectively improve the furnace body performance, improve long brilliant efficiency, and mount installation dismantlement is convenient, thermal baffle and bottom thermal baffle installation dismantlement are convenient, it is firm practical to stabilize.
It should be understood that the statements described in this summary are not intended to limit the scope of the disclosure, or the various features described in this summary. Other features of the present application will become apparent from the following description.
Drawings
Other features, objects and advantages of the present application will become more apparent upon reading of the following detailed description of non-limiting embodiments thereof, made with reference to the accompanying drawings in which:
FIG. 1 is a schematic structural diagram of an insulation apparatus for an HVPE growth furnace according to an embodiment of the present disclosure;
FIG. 2 is a schematic structural view of an insulation baffle of an insulation apparatus for an HVPE growth furnace according to an embodiment of the present disclosure;
fig. 3 is a schematic structural view of a mounting hole of a heat insulation apparatus for an HVPE growth furnace according to an embodiment of the present disclosure.
Reference numbers in the figures: 1. a fixed mount; 2. a heat insulation baffle; 3. a bottom layer heat insulation baffle; 4. a growth furnace;
11. mounting a plate; 12. mounting holes;
21. a heat insulation plate; 22. mounting blocks; 23. a through hole;
31. a central through hole;
41. the base is rotated.
Detailed Description
The present application will be described in further detail with reference to the following drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the relevant application and are not limiting of the application. It should be noted that, for the convenience of description, only the portions relevant to the application are shown in the drawings.
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present application will be described in detail below with reference to the embodiments with reference to the attached drawings.
Referring to fig. 1 to 3, an embodiment of the present application provides an insulation apparatus for an HVPE growth furnace, including a fixing frame 1, an insulation baffle 2, and a bottom insulation baffle 3;
the fixing frame 1 is matched with the growth furnace 4 and is arranged in a cylindrical shape; the fixing frame 1 is detachably arranged on the growth furnace 4 and is used for installing the heat insulation baffle 2 and the bottom layer heat insulation baffle 3; the top end of the fixed frame 1 is fixedly provided with a mounting plate 11 corresponding to the top surface of the growth furnace 4; the mounting plate 11 is annular and is used for detachably connecting the fixed frame 1 with the top surface of the growth furnace 4; the inside detachable of mount 1 is provided with thermal baffle 2, and inside bottom detachable is provided with bottom thermal baffle 3, all is used for thermal-insulated work.
In this embodiment, thermal baffle 2 and bottom thermal baffle 3 divide into 5 ~ 7 warm areas in growing furnace 4, two warm areas at both ends are the heat preservation district about the furnace body, middle warm area is the source region in proper order, the temperature transition district, the crystal growth district, the temperature that sets up of a plurality of warm areas is different, form a plurality of temperature gradient areas in growing furnace 4, reduce the heat loss, ensure the even of source region and crystal growth district temperature field, it is stable, it has certain temperature difference to have guaranteed that adjacent warm area has, the constancy of temperature in constant temperature district has further been guaranteed, effectively improve furnace body performance, improve long brilliant efficiency, and mount 1 installation dismantlement is convenient, thermal baffle 2 and bottom thermal baffle 3 installation dismantlement are convenient, it is stable firm practical.
In a preferred embodiment, the thermal shield 2 comprises a thermal shield 21 and a mounting block 22; the heat insulation plate 21 is matched with the inside of the fixed frame 1 and is arranged into a circular plate shape; the heat insulation plate 21 is provided with a plurality of through holes 23 along the axis direction in a penetrating manner, and the through holes 23 on the same heat insulation plate 21 are arranged in a plurality; two heat insulation plates 21 in the same heat insulation baffle plate 2 are arranged up and down, the axes of the two heat insulation plates 21 are overlapped and are spaced by 2.5-3.5 cm along the axis direction, and the through holes 23 on the two heat insulation plates 21 are staggered with each other.
Referring to fig. 1 to 3, in this embodiment, the heat insulation baffle 2 includes a double-layer heat insulation board 21, the heat insulation board 21 is made of metal molybdenum, etc., a plurality of strip through holes are arranged on the heat insulation board 21, two layers of heat insulation boards 21 are used in cooperation, there is a distance of about 1 inch between the upper layer heat insulation board 21 and the lower layer heat insulation board 21 in the axial direction, and the hole positions on the two layers of heat insulation boards 21 are staggered, so that the heat transfer efficiency can be greatly reduced while gas can pass through, strong convection of gas at high temperature can be prevented, thereby reducing the mutual influence of adjacent temperature zones, and ensuring the temperature stability in the temperature zones.
In a preferred embodiment, two heat insulation boards 21 in the same heat insulation baffle 2 are fixedly provided with a mounting block 22 along one end in the diameter direction; the mounting block is arranged along the diameter direction of the heat insulation plate 21 of 22; three mounting blocks 22 in the same thermal baffle 2 are uniformly arranged along the circumferential direction of the thermal baffle 21.
In a preferred embodiment, the inner wall of one end of the fixing frame 1 along the diameter direction is fixedly provided with a mounting hole 12 corresponding to the mounting block 22; the mounting hole 12 is arranged in a convex shape; the number of the mounting holes 12 is three along the circumferential direction of the fixing frame 1, and the three mounting holes are a group of mounting holes and are provided with a plurality of groups along the axial direction of the fixing frame 1.
Referring to fig. 1 to 3, in the embodiment, a plurality of sets of three mounting holes 12 are arranged along the axial direction of the fixing frame 1 for matching with the heat insulation baffle 2 to perform temperature zone stratification on the growth furnace 4, and a set of mounting holes 12 are arranged at the bottom end of the fixing frame 1 for mounting the bottom heat insulation baffle 3.
When the heat insulation baffle 2 or the bottom layer heat insulation baffle 3 is installed: put into mount 1 with the slope of thermal baffle 2, make three installation piece 22 on the thermal baffle 2 put into three mounting hole 12 in the same group respectively, make installation piece 22 get into the top of type (the top of type possesses certain height and degree of depth, make things convenient for the installation of thermal baffle 2), later all move down the three installation piece 22 of thermal baffle 2 to the bottom of the mounting hole 12 that corresponds, thermal baffle 2 level this moment, it makes installation piece 22 card in the bottom recess of type mounting hole 12 to rotate thermal baffle 2, can accomplish the installation of thermal baffle 2. The installation of the bottom layer heat insulation baffle 3 is the same.
In a preferred embodiment, the bottom thermal barrier 3 is of the same gauge as the thermal barrier 2; the center of the bottom layer heat insulation baffle 3 is provided with a central through hole 31 along the axis direction.
Referring to fig. 1 to 3, in this embodiment, the bottom thermal baffle 3 is the same as the thermal baffle 2, but a central through hole 31 is formed at the center of the bottom thermal baffle 3 along the axial direction for installing the rotating base 41 inside the growth furnace 4.
The working principle of the application is as follows:
the growth furnace 4 is vertically split, 5-7 temperature zones are arranged from top to bottom, two temperature zones at the upper end and the lower end of the furnace body are heat preservation zones, a middle temperature zone is a source zone, a temperature transition zone and a crystal growth zone in sequence, the temperature of the temperature zones is different, a plurality of temperature gradient zones are formed in the growth furnace 4, heat flow loss is reduced, and the temperature fields of the source zone and the crystal growth zone are uniform and stable. The fixing frame 1 is placed in a growth furnace 4, a rotating base 41 is placed at the bottom end of the growth furnace 4, then a bottom layer heat insulation baffle 3 is installed, and then a plurality of heat insulation baffles 2 are installed above the rotating base 41 according to temperature zone division.
In the description of the present specification, the terms "connect", "mount", "fix", and the like are to be understood in a broad sense, for example, "connect" may be a fixed connection, a detachable connection, or an integral connection; may be directly connected or indirectly connected through an intermediate. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
In the description of the present application, the description of the terms "one embodiment," "some embodiments," etc. means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the application. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made to the present application by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (5)
1. A heat insulation device for an HVPE growth furnace is characterized by comprising a fixing frame, a heat insulation baffle plate and a bottom layer heat insulation baffle plate;
the fixing frame is matched with the growth furnace and is arranged in a cylindrical shape; the fixing frame is detachably arranged on the growth furnace and used for installing the heat insulation baffle and the bottom layer heat insulation baffle; the top end of the fixed frame is fixedly provided with an installation plate corresponding to the top surface of the growth furnace; the mounting plate is arranged in a ring shape and is used for detachably connecting the fixed frame with the top surface of the growth furnace; the inside detachable of mount is provided with thermal-insulated baffle, inside bottom detachable is provided with bottom thermal-insulated baffle all is used for thermal-insulated work.
2. The adiabatic apparatus for an HVPE growth furnace according to claim 1, wherein the adiabatic baffle includes an adiabatic plate and a mounting block; the heat insulation plate is matched with the inside of the fixing frame and is arranged into a circular plate shape; the heat insulation plate is provided with a plurality of through holes in a penetrating manner along the axis direction; and two heat insulation plates in the same heat insulation baffle are arranged up and down, the axes of the two heat insulation plates are superposed and spaced by 2.5-3.5 cm along the axis direction, and the through holes on the two heat insulation plates are staggered mutually.
3. The heat insulation apparatus for an HVPE growth furnace according to claim 2, wherein the mounting block is fixedly provided to both of the heat insulation plates of the same heat insulation baffle in a diametrical direction; the mounting block is arranged along the diameter direction of the heat insulation plate; and three mounting blocks in the same heat insulation baffle are uniformly arranged along the circumferential direction of the heat insulation plate.
4. The heat insulation device for the HVPE growth furnace according to claim 3, wherein an inner wall of one end of the fixing frame in the diameter direction is fixedly provided with a mounting hole corresponding to the mounting block; the mounting hole is arranged in a convex shape; the mounting hole is followed the circumference of mount evenly is provided with threely, and three is a set of edge the axis direction of mount is provided with the multiunit.
5. The insulation apparatus for an HVPE growth furnace according to claim 4, wherein the bottom insulation baffle is the same size as the insulation baffle; the center of the bottom layer heat insulation baffle penetrates through the center through hole along the axis direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320120590.6U CN218812234U (en) | 2023-02-06 | 2023-02-06 | Heat insulation device for HVPE growth furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320120590.6U CN218812234U (en) | 2023-02-06 | 2023-02-06 | Heat insulation device for HVPE growth furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218812234U true CN218812234U (en) | 2023-04-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320120590.6U Active CN218812234U (en) | 2023-02-06 | 2023-02-06 | Heat insulation device for HVPE growth furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218812234U (en) |
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2023
- 2023-02-06 CN CN202320120590.6U patent/CN218812234U/en active Active
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