CN218675680U

CN218675680U - Photoresist baking device for spin coating developing machine

Info

Publication number: CN218675680U
Application number: CN202223114081.7U
Authority: CN
Inventors: 贺武峰; 陈雪冰
Original assignee: Jiangxi Weiyi Semiconductor Equipment Co ltd; Jiangxi Weiyike Semiconductor Technology Co ltd
Current assignee: Jiangxi Weiyi Semiconductor Equipment Co ltd; Jiangxi Weiyike Semiconductor Technology Co ltd
Priority date: 2022-11-22
Filing date: 2022-11-22
Publication date: 2023-03-21
Anticipated expiration: 2032-11-22

Abstract

The utility model relates to a baking equipment especially relates to a photoresist baking equipment for spin coater. The utility model provides a once only can toast a plurality of wafers, toast the even photoresist baking equipment for developing machine of efficient. The utility model provides a photoresist baking equipment for spin coating developing machine, includes chassis, frame, places frame and pull rod etc. and the frame bottom left and right sides all is connected with the chassis, and the frame slidable formula is equipped with two frames of placing that are used for placing the wafer in the frame, and frame top right side is opened has two at least vents, and the frame front side of placing all is connected with the pull rod. The utility model discloses an air heater can blow off hot-blastly, toasts the wafer, and once only can toast a plurality of wafers, toasts efficiently.

Description

Photoresist baking device for spin coating developing machine

Technical Field

The utility model relates to a baking equipment especially relates to a photoresist baking equipment for spin coater.

Background

The spin coater is a commonly used lithography apparatus and is widely applied, wherein a wafer is a necessary component in the spin coater, and when the wafer is manufactured, the wafer needs to be adhered to a substrate through photoresist, and then the wafer is baked to enable the photoresist to be rapidly solidified.

Patent with publication number CN208444816U, discloses a wafer baking apparatus, which comprises: a heating chamber for accommodating a wafer; the heating disc is arranged at the bottom of the heating chamber and used for heating the wafer; the sealing cover is arranged at the top of the heating chamber and used for sealing the heating chamber; an exhaust pipe connected to the cover and communicated with the heating chamber; ultrasonic oscillator, including set up in a plurality of supersonic generator and a plurality of transducer of closing cap inboard, supersonic generator drive the transducer produces the gas of shaking, and this patent once only can toast a wafer, toasts inefficiency.

Therefore, there is a need for a device capable of baking a plurality of wafers at a time with high baking efficiency, so as to solve the problems in the prior art.

SUMMERY OF THE UTILITY MODEL

In order to overcome above-mentioned prior art once only can toast a wafer, toast the shortcoming of inefficiency, the technical problem of the utility model is: the photoetching material baking device for the spin coater can bake a plurality of wafers at one time and has high baking efficiency.

The technical scheme is as follows: the utility model provides a photoresist baking equipment for even glue developing machine, includes chassis, frame, places frame, pull rod, connecting rod and air heater, and the frame bottom left and right sides all is connected with the chassis, and the frame inner sliding formula is equipped with two frames of placing that are used for placing the wafer, and open on frame top right side has two at least vents, places the frame front side and all is connected with the pull rod, and the lower part left and right sides all is connected with the connecting rod in the frame, is connected with the air heater that is used for drying to the wafer between the connecting rod.

Further explaining, the device also comprises a filter screen, and the middle of the bottom of the outer frame is connected with the filter screen.

Further explaining, the iron-attracting type storage box further comprises iron attracting stones and a stop block, the two iron attracting stones are connected to the inner rear side of the outer frame and mutually attracted with the placement frame, and the stop block capable of blocking the placement frame is arranged on the left portion of the front side of the outer frame in a sliding mode.

Further explaining, the device also comprises a limiting ring, and the limiting ring is connected to the bottom in the placing frame at uniform intervals.

The utility model has the advantages that: 1. the utility model discloses an air heater can blow off hot-blastly, toasts the wafer, and once only can toast a plurality of wafers, toasts efficiently.

2. Under the action of the magnet and the stop block, the placing frame can be stopped, and the placing frame is prevented from sliding out of the outer frame.

Drawings

Fig. 1 is a perspective view of the present invention.

Fig. 2 is a schematic view of a first cross-sectional three-dimensional structure of the present invention.

Fig. 3 is a schematic view of a second sectional three-dimensional structure of the present invention.

Reference numbers in the drawings: 1: chassis, 2: outer frame, 3: placing frame, 4: vent, 5: pull rod, 6: connecting rod, 7: air heater, 8: filter screen, 9: magnet, 901: stopper, 10: a limit ring.

Detailed Description

The present invention now will be described more fully hereinafter with reference to the accompanying drawings, in which currently preferred embodiments of the invention are shown. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided for completeness and fully convey the scope of the invention to the skilled person.

Example 1

The utility model provides a photoresist baking equipment for even glue developing machine, as shown in fig. 1-2, including chassis 1, frame 2, place frame 3, pull rod 5, connecting rod 6 and air heater 7, the 2 bottom left and right sides of frame all has chassis 1 through bolted connection, 2 internal sliding type of frame is equipped with two and places frame 3, two are placed frame 3 and are set up from top to bottom, it is used for placing the wafer to place

frame

3, 2 top right sides of frame are opened there are two vents 4, it all has pull rod 5 through bolted connection to place 3 front sides of frame, the lower part left and right sides all has connecting rod 6 through bolted connection in the frame 2, there is air heater 7 through bolted connection between the connecting rod 6, air heater 7 is used for drying the wafer.

As shown in fig. 3, the device also comprises a filter screen 8, and the filter screen 8 is connected in the middle of the bottom of the outer frame 2 in an embedded manner.

As shown in fig. 2, the device further comprises a limiting ring 10, and the limiting ring 10 is connected to the bottom of the placing frame 3 at regular intervals.

People stimulate the pull rod 5 forward, will place frame 3 and pull out, then put into spacing ring 10 with the wafer in, spacing ring 10 can separate the wafer, avoid bumping between the wafer, after putting, promote pull rod 5 backward, will place in 3 removals frames 2 of frame, people restart air heater 7, air heater 7 blows off hot-blastly, toast the wafer, and once only can toast a plurality of wafers, it is efficient to toast, filter screen 8 can filter external air, avoid in the dust inhales frame 2, hot-blastly discharge through vent 4, after the wafer is dried, close air heater 7.

Example 2

On the basis of embodiment 1, as shown in fig. 3, the iron-attracting type frame further comprises two iron-attracting stones 9 and a stopper 901, the two iron-attracting stones 9 are connected to the rear side in the outer frame 2, the two iron-attracting stones 9 are symmetrically arranged up and down, the rear side of the placement frame 3 is made of iron, the iron-attracting stones 9 and the placement frame 3 are mutually adsorbed, the stopper 901 is arranged on the left portion of the front side of the outer frame 2 in a sliding manner, and the placement frame 3 can be stopped by the stopper 901.

After the placing frame 3 moves back into the outer frame 2, the magnet 9 can suck the placing frame 3, and people push the stopper 901 rightwards again, so that the stopper 901 stops the placing frame 3, and the placing frame 3 is prevented from sliding out of the outer frame 2.

The above description is only for the preferred embodiment of the present invention, and is not intended to limit the present invention, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention should be included within the protection scope of the present invention.

Claims

1. The utility model provides a photoresist material baking equipment for spin coating developing machine, including chassis (1) and frame (2), the frame (2) bottom left and right sides all is connected with chassis (1), characterized by, still including placing frame (3), pull rod (5), connecting rod (6) and air heater (7), frame (2) internal sliding formula is equipped with two and is used for placing frame (3) of placing of wafer, open on frame (2) top right side has two at least vents (4), it all is connected with pull rod (5) to place frame (3) front side, the lower part left and right sides all is connected with connecting rod (6) in frame (2), be connected with air heater (7) that are used for drying the wafer between connecting rod (6).

2. The baking apparatus for a lithography material for a track lithography according to claim 1, further comprising a filter (8), wherein the filter (8) is connected to the bottom of the outer frame (2) at a middle portion thereof.

3. The baking apparatus for lithography material used in track lithography according to claim 2, further comprising two magnets (9) connected to the rear side of the outer frame (2), wherein the magnets (9) and the placing frame (3) are attracted to each other, and the stopper (901) capable of stopping the placing frame (3) is slidably provided at the left part of the front side of the outer frame (2).

4. The baking apparatus for a lithography material for a track developer according to claim 3, further comprising a limit ring (10), wherein the limit ring (10) is connected to the bottom of the frame (3) at regular intervals.