CN218321594U - Magnetron sputtering continuous coating line for hardware - Google Patents
Magnetron sputtering continuous coating line for hardware Download PDFInfo
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- CN218321594U CN218321594U CN202222061360.5U CN202222061360U CN218321594U CN 218321594 U CN218321594 U CN 218321594U CN 202222061360 U CN202222061360 U CN 202222061360U CN 218321594 U CN218321594 U CN 218321594U
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Abstract
The utility model relates to a hardware processing technology field, and a continuous coating line of magnetron sputtering for hardware is disclosed, including the coating case, two lateral walls of coating case heteropleural side are all fixed to be pegged graft and are had the box cover, the inside of one of them box cover and the inside of coating case all are equipped with the anode plate, the terminal surface of two anode plates all is equipped with the base plate, the equal fixedly connected with of lateral wall and box cover assorted seal clamp plate of one side in opposite directions of two anode plates, and be fixed with two connecting rods jointly between two seal clamp plates, the fixed grafting of lateral wall of one of them box cover has the switching hydro-cylinder, and the output of switching hydro-cylinder and the lateral wall fixed connection of anode plate of homonymy, the upper end fixedly connected with negative plate of coating case, and the lower terminal surface of negative plate is connected with the target. This application can be in the coating incasement material loading in turn, forms continuous coating film processing line, has saved coating film whole time greatly, improves production efficiency, can adjust the use in a flexible way simultaneously.
Description
Technical Field
The application relates to the technical field of hardware processing, in particular to a magnetron sputtering continuous coating line for hardware.
Background
The hardware is a tool obtained by processing and casting metals such as gold, silver, copper, iron, tin and the like, in order to achieve the performance of the hardware, the surface of part of the hardware needs to be coated during production, and magnetron sputtering coating is a coating technology that a coating material is used as a target cathode, argon ions are used for bombarding a target material to generate cathode sputtering, and target material atoms are sputtered onto a workpiece to form a deposition layer, and the coating technology can be used for coating the hardware.
In the process of implementing the application, the inventor finds that at least the following problems exist in the technology, when the hardware is coated by the magnetron sputtering coating equipment, the inside of a coating cavity needs to be vacuumized and filled with argon, after a batch of hardware is coated, the argon needs to be extracted, then the hardware is taken out, then the next batch of hardware to be coated is put in, the vacuum state is restored again, and the argon is filled, so that the overall efficiency of the coating mode is low, and much time is wasted in loading and unloading, therefore, the magnetron sputtering continuous coating line for the hardware is provided.
SUMMERY OF THE UTILITY MODEL
The purpose of this application is in order to solve among the prior art behind every coating film a batch of hardware, all need take argon gas out, then take out the hardware, put into next batch of hardware that treats the coating film again, and resume vacuum state again and fill into argon gas, the overall efficiency of this kind of coating film mode is lower, the problem of the more time of unloading waste of going up, and the continuous coating film line of magnetron sputtering who is used for the hardware that proposes.
In order to achieve the purpose, the following technical scheme is adopted in the application:
the utility model provides a continuous coating line of magnetron sputtering for hardware, includes the coating case, two lateral walls of coating case opposite side all are fixed to peg graft and have a box cover, one of them the inside of box cover and the inside of coating case all are equipped with the anode plate, two the terminal surface of anode plate all is equipped with the base plate, two the equal fixedly connected with of lateral wall and box cover assorted seal pressing plate of one side in the opposite direction of anode plate, and be fixed with two connecting rods jointly between two seal pressing plates, one of them the fixed grafting of lateral wall of box cover has the switching hydro-cylinder, and the lateral wall fixed connection of the output of switching hydro-cylinder and anode plate, the upper end fixedly connected with negative plate of coating case, and the lower terminal surface of negative plate is connected with the target, the fixed grafting of lateral wall of coating case has vacuum tube and argon gas pipe, and vacuum tube and argon gas pipe's inside all is equipped with the control valve, two the opening has all been seted up to the lateral wall of box cover, and two open-ended lateral wall borders all are connected with the cover door through hinge rotation.
Preferably, two the equal fixedly connected with regulating block of lateral wall of anode plate, two the equal fixedly connected with of lateral wall and the corresponding regulating plate in regulating block position of seal clamp plate, and the lateral wall of regulating plate set up with regulating block assorted bar hole, the inside in bar hole is rotated and is equipped with driving screw, and driving screw's the pole wall and the lateral wall threaded connection of regulating block, the inside in bar hole is fixed and is equipped with two guide bars, and the pole wall of two guide bars all with the lateral wall sliding connection of regulating block.
Preferably, two pump bodies of lateral wall fixedly connected with of coating case, two the suction end of the pump body all is linked together the setting with homonymy box cover, two the equal fixedly connected with back flow of output of the pump body, and the end of giving vent to anger of two back flows all is linked together the setting with the argon pipe, two the inside of back flow all is equipped with the seal valve.
Preferably, the pipe wall of the two return pipes is fixedly connected with an exhaust pipe, and exhaust valves are arranged in the two exhaust pipes.
Preferably, two the viewing aperture has all been seted up to the lateral wall upper end of box cover, and the inside of two viewing apertures all is fixed and is equipped with the transparent plate.
Preferably, the rod walls of the two guide rods are marked with scale line groups.
Compared with the prior art, the application provides a magnetron sputtering continuous coating line for hardware, possesses following beneficial effect:
1. this a continuous coating line of magnetron sputtering for hardware, through the coating case that is equipped with, the box cover, the anode plate, the base plate, the sealing pressure plate, the connecting rod, switch hydro-cylinder, the negative plate, the target, the vacuum tank, mutually support of argon gas pipe and cover door, through two anode plates, the setting of base plate, collocation box cover, can carry out material loading in turn in the coating case, form continuous coating film processing line, neither need to the inside argon gas of coating case, arrange many times vacuum environment etc. moreover at the in-process of coating film, can go up unloading, the coating film whole time has been saved greatly, and the production efficiency is improved.
2. This a continuous coating line of magnetron sputtering for hardware, through mutually supporting of regulating block, regulating plate, drive screw and the guide bar that is equipped with, can rationally adjust the position of anode plate according to the specification of hardware to can improve application scope, be convenient for adjust in a flexible way and use.
The part that does not relate to among the device all is the same with prior art or can adopt prior art to realize, and this application can carry out material loading in turn at the coating incasement, forms continuous coating film processing line, has saved the coating film whole time greatly, improves production efficiency, can adjust the use in a flexible way simultaneously.
Drawings
FIG. 1 is a schematic structural diagram of a magnetron sputtering continuous coating line for hardware proposed in the present application;
FIG. 2 is a schematic top view of the structure of FIG. 1;
FIG. 3 is an enlarged view of the portion A in FIG. 1;
fig. 4 is a schematic structural view of the guide bar of fig. 1.
In the figure: 1. coating a film box; 2. a box cover; 3. an anode plate; 4. a substrate; 5. sealing the pressure plate; 6. switching the oil cylinders; 7. a cathode plate; 8. a target material; 9. a vacuum tube; 10. an argon pipe; 11. a cover door; 12. an adjusting block; 13. an adjusting plate; 14. a drive screw; 15. a guide bar; 16. a pump body; 17. a return pipe; 18. an exhaust pipe; 19. a transparent plate; 20. a set of scale lines; 21. a connecting rod.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments.
Referring to fig. 1-4, a continuous coating line of magnetron sputtering for hardware, including coating case 1, two lateral walls of coating case 1 opposite side all are fixed to peg graft and have box cover 2, the inside of one of them box cover 2 and the inside of coating case 1 all are equipped with anode plate 3, the terminal surface of two anode plates 3 all is equipped with base plate 4, the equal fixedly connected with of lateral wall of one side and box cover 2 assorted seal clamp plate 5 are in opposite directions to two anode plates 3, and be fixed with two connecting rods 21 jointly between two seal clamp plate 5, the lateral wall of one of them box cover 2 is fixed to peg graft and has switching cylinder 6, and the output of switching cylinder 6 and the lateral wall fixed connection of anode plate homonymy 3, the upper end fixedly connected with 7 of coating case 1, and the lower terminal surface of cathode plate 7 is connected with target 8, the lateral wall of coating case 1 is fixed to peg graft and has vacuum tube 9 and argon gas pipe 10, and the inside of vacuum tank and argon gas pipe 10 all is equipped with the control valve, the opening has all been seted up to the lateral wall of two box covers 2, and the border all is connected with 11 through the hinge rotation, wherein one side of coating case is equipped with the vacuum tank for passing through the vacuum pumping, and the argon gas pipe 10, the existing technology of the input device for recycling.
The equal fixedly connected with regulating block 12 of lateral wall of two anode plate 3, the equal fixedly connected with of lateral wall of two seal pressing plate 5 and the corresponding regulating plate 13 in regulating block 12 position, and regulating plate 13's lateral wall seted up with regulating block 12 assorted bar hole, the inside in bar hole is rotated and is equipped with drive screw 14, and drive screw 14's pole wall and regulating block 12's lateral wall threaded connection, the inside in bar hole is fixed and is equipped with two guide bars 15, and the pole wall of two guide bars 15 all with regulating block 12's lateral wall sliding connection, rotate drive screw 14, under the cooperation of two guide bars 15, can make regulating block 12 drive anode plate 3 at vertical direction adjusting position, thereby can be applicable to the hardware of different specifications, be convenient for adjust the use in a flexible way.
Two pump bodies 16 of lateral wall fixedly connected with of coating case 1, the suction end of two pump bodies 16 all is linked together the setting with homonymy box cover 2, the equal fixedly connected with back flow 17 of the output of two pump bodies 16, and the end of giving vent to anger of two back flow 17 all is linked together the setting with argon gas pipe 10, the inside of two back flow 17 all is equipped with the seal valve, work through pump body 16, can get before the material, will get into the inside argon gas of homonymy box cover 2 and take out, and pass through back flow 17 and feedback inside coating case 1, avoid argon gas to reveal.
The equal fixedly connected with blast pipe 18 of pipe wall of two back flows 17, and the inside of two blast pipes 18 all is equipped with discharge valve, through blast pipe 18, can take the air that gets into box cover 2 inside when going up unloading out, avoids the interior influence vacuum environment of air entering coating box 1 when follow-up switching in turn.
The viewing aperture has all been seted up to the lateral wall upper end of two box covers 2, and the inside of two viewing apertures all is fixed and is equipped with transparent plate 19, through this kind of setting, can be convenient for observe the inside condition of box cover 2.
The rod walls of the two guide rods 15 are marked with the scale line groups 20, and through the arrangement, people can conveniently and accurately adjust the position of the anode plate 3 without an external measuring tool.
In the application, during the use, the hardware that will treat the coating film is put into one of them base plate 4 on, then close box cover 2, take out the inside air of coating film case 1 through vacuum tank 9, and carry appropriate amount argon gas to coating film case 1 inside through argon gas pipe 10, at this moment through negative plate 7 cooperation anode plate 3 and base plate 4, can form the sedimentary deposit to 8 atom spatters of target on the hardware, in the in-process of coating film, put into another base plate 4 with the hardware that will treat the coating film next, after the hardware coating of coating film case 1 inside is accomplished, start switching hydro-cylinder 6, switching hydro-cylinder 6 can drive anode plate 3 and remove, when making seal pressing plate 5 and homonymy box cover 2 closely laminate, another hardware that treats the processing has also got into coating film case 1 inside, can continue coating film processing this moment, and at the in-process of coating film, can take off the hardware that the coating film has just been accomplished, and the material loading once more, the circulation is reciprocal, can realize continuous coating film processing.
The above description is only for the preferred embodiments of the present application, but the scope of the present application is not limited thereto, and any person skilled in the art should be considered to be within the scope of the present application, and all equivalent substitutions and changes according to the technical solutions and the inventive concepts of the present application should be covered by the scope of the present application.
Claims (6)
1. The utility model provides a continuous coating line of magnetron sputtering for hardware, includes coating case (1), its characterized in that, two lateral walls of coating case (1) heteropleural are all fixed pegs graft and are had box cover (2), one of them the inside of box cover (2) and the inside of coating case (1) all are equipped with anode plate (3), two the terminal surface of anode plate (3) all is equipped with base plate (4), two the equal fixedly connected with of lateral wall and box cover (2) assorted seal clamp plate (5) of one side in opposite directions of anode plate (3), and be fixed with two connecting rods (21) jointly between two seal clamp plate (5), one of them the lateral wall of box cover (2) is fixed pegs graft and is had switching hydro-cylinder (6), and switches the output of hydro-cylinder (6) and the lateral wall fixed connection of anode plate (3), the upper end fixedly connected with negative plate (7) of coating case (1), and the lower terminal surface of negative plate (7) is connected with target (8), the lateral wall of coating case (1) is fixed with vacuum tube (9) and trachea (10), and the inside of argon gas tube jar and argon gas jar (10) all is equipped with two equal control box door openings through hinge door (11) the lateral wall, two equal the lateral wall of the equal connections of the homonymy side of opening (11).
2. The continuous coating line for the magnetron sputtering of hardware according to claim 1, characterized in that, two equal fixedly connected with regulating block (12) of lateral wall of anode plate (3), two equal fixedly connected with regulating plate (13) corresponding with regulating block (12) position of lateral wall of sealed clamp plate (5), and the lateral wall of regulating plate (13) set up with regulating block (12) assorted bar hole, the inside in bar hole is rotated and is equipped with driving screw (14), and the pole wall of driving screw (14) and the lateral wall threaded connection of regulating block (12), the inside in bar hole is fixed and is equipped with two guide bars (15), and the pole wall of two guide bars (15) all with the lateral wall sliding connection of regulating block (12).
3. The magnetron sputtering continuous coating line for hardware according to claim 1, characterized in that two pump bodies (16) are fixedly connected to the side wall of the coating box (1), two the suction end of each pump body (16) is communicated with the box cover (2) on the same side, two the return pipes (17) are fixedly connected to the output ends of the pump bodies (16), the air outlet ends of the two return pipes (17) are communicated with the argon pipe (10), and a sealing valve is arranged inside each return pipe (17).
4. The magnetron sputtering continuous coating line for hardware as claimed in claim 3, characterized in that the pipe walls of the two return pipes (17) are fixedly connected with exhaust pipes (18), and exhaust valves are arranged inside the two exhaust pipes (18).
5. The magnetron sputtering continuous coating line for the hardware as claimed in claim 1, wherein the upper ends of the side walls of the two box covers (2) are provided with observation ports, and transparent plates (19) are fixedly arranged inside the two observation ports.
6. The magnetron sputtering continuous coating line for hardware according to claim 2, characterized in that the rod walls of both guide rods (15) are marked with a set of graduations (20).
Priority Applications (1)
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CN202222061360.5U CN218321594U (en) | 2022-08-07 | 2022-08-07 | Magnetron sputtering continuous coating line for hardware |
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CN202222061360.5U CN218321594U (en) | 2022-08-07 | 2022-08-07 | Magnetron sputtering continuous coating line for hardware |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117737675A (en) * | 2024-01-26 | 2024-03-22 | 东莞市德派精密机械有限公司 | Multi-chamber magnetron sputtering continuous film plating machine |
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- 2022-08-07 CN CN202222061360.5U patent/CN218321594U/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117737675A (en) * | 2024-01-26 | 2024-03-22 | 东莞市德派精密机械有限公司 | Multi-chamber magnetron sputtering continuous film plating machine |
CN117737675B (en) * | 2024-01-26 | 2024-05-28 | 东莞市德派精密机械有限公司 | Multi-chamber magnetron sputtering continuous film plating machine |
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