CN204874721U - Can control electric field strength's sputter coating device - Google Patents
Can control electric field strength's sputter coating device Download PDFInfo
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- CN204874721U CN204874721U CN201520494541.4U CN201520494541U CN204874721U CN 204874721 U CN204874721 U CN 204874721U CN 201520494541 U CN201520494541 U CN 201520494541U CN 204874721 U CN204874721 U CN 204874721U
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Abstract
The utility model discloses a can control electric field strength's sputter coating device, the coating chamber room sets up the inside at the cavity, the negative plate sets up the bottom in the coating chamber room, the anode plate sets up at the top of cavity, and the setting is indoor at coating chamber, the target sets up the downside at the anode plate, the import sets up on cavity left middle part, the export sets up the right side at the cavity, vacuum air inlet unit sets up on the top of cavity, the upper portion on the cavity right side is installed to the controller. This can control electric field strength's sputter coating device, the controller can be to the electric current size control in the sputter coating device of vacuum to velocity of movement, orbit and the density of control particle, consequently the size of can according to actual need adjusting electric field strength can satisfy the needs of actual industry development, this can control electric field strength's sputter coating device has easy operation, and it is convenient to safeguard, advantages such as work efficiency height have market spreading value.
Description
Technical field
The utility model belongs to sputtering technology field, is specifically related to a kind of Sputting film-plating apparatus that can control strength of electric field.
Background technology
Sputter coating is widely used in the fields such as glass, pottery, semi-conductor.A kind of existing vacuum sputtering coating device is provided with sputtering cavity, is arranged on the delivery roll in cavity, is arranged on the baffle plate be connected between delivery roll and with cavity bottom, and is arranged on the cathode targets in cavity.Cavity bottom is as anode, and under the effect of impact of discharge gas, the atom in cathode targets splashes out towards anode and is deposited on the glass on delivery roll, to complete the plated film processing of glass.The baffle plate be arranged between delivery roll is metal material, can tackle atom or molecule that cathode targets spills, the atom preventing cathode targets from spilling or molecule deposit to from the space between delivery roll or the space between two glass and transmit roll surface or on other devices.The cross section of this baffle plate takes the shape of the letter U, and needs to arrange in insulating with cavity bottom, otherwise easily causes cathode targets generation electric discharge to beat the phenomenons such as arc, thus badly influences glass coating quality and production efficiency.At present, existing way adopts L shaped plate that baffle plate is fixed on cavity bottom, but this mode still easily causes the conducting of baffle plate and cavity.
Simultaneously, the magnetic field of existing Sputting film-plating apparatus and electric field are all fixing, and strength of electric field can not regulate according to actual needs, thus working efficiency and the quality of production can be affected, the needs of present rapid industrial development can not be met, therefore needing to design one can be easy to maintenance, can control again the Sputting film-plating apparatus of strength of electric field.
Utility model content
The purpose of this utility model is to provide a kind of Sputting film-plating apparatus that can control strength of electric field, to solve the problem proposed in above-mentioned background technology.
For achieving the above object, the utility model provides following technical scheme: a kind of Sputting film-plating apparatus that can control strength of electric field, comprises cavity, plated film chamber, target, delivery roll, baffle plate assembly, negative plate, positive plate, A magnet piece, B magnet piece, electric wire, import, outlet, vacuum diffuser, controller, described plated film chamber is arranged on the inside of cavity, described negative plate is arranged on the bottom of plated film chamber, and described delivery roll and baffle plate assembly are all arranged on the upside of negative plate, and baffle plate assembly is disposed between delivery roll, described positive plate is arranged on the top of cavity, and being arranged in plated film chamber, described target is arranged on the downside of positive plate, and described A magnet piece is arranged on the left side of plated film chamber, described B magnet piece is arranged on the right side of plated film chamber, described electric wire respectively with controller, negative plate and positive plate are electrically connected, and described import is arranged on the middle part on the left of cavity, and described outlet is arranged on the right side of cavity, and described vacuum diffuser is arranged on the top of cavity, and described controller is arranged on the top on the right side of cavity.
Preferably, the connection section between described electric wire and cavity is provided with sealing member.
Preferably, described vacuum diffuser is made up of cylinder valve, under meter and intake valve, described cylinder valve, under meter and intake valve be arranged on successively from top to bottom lead to plated film chamber intake ducting on.
Preferably, described baffle plate assembly is made up of retaining plate, insulating part and baffle plate, and described retaining plate is fixedly connected with the bottom of cavity, and described insulating part is arranged between retaining plate and baffle plate.
Technique effect of the present utility model and advantage: this can control the Sputting film-plating apparatus of strength of electric field, its target can be arranged to the form of rotating cathode, to improve coating performance; In coating process, baffle plate need ensure with the bottom of cavity also namely anode be electrically insulated and arrange, otherwise cathodic discharge will be caused to beat arc phenomenon, have a strong impact on plated film yield; Controller can control the size of current in vacuum sputtering coating device, thus the movement velocity of control particle, track and density, the size of strength of electric field can be regulated according to actual needs, therefore, it is possible to meet the needs of actual industrial development; By doing modularized design to baffle plate assembly, and by the setting of insulating part, not only can ensure the insulating property of baffle plate and cavity, the packaging efficiency of baffle plate assembly can also be optimized, make baffle plate assembly dismounting more convenient; Be a vacuum state completely in cavity, its vacuum tightness will reach 10 X 10
-3above, realistic requirement; This Sputting film-plating apparatus that can control strength of electric field has simple to operate, easy to maintenance, and working efficiency advantages of higher, has market popularization value.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
In figure: 1 cavity, 2 plated film chambers, 3 targets, 4 delivery rolls, 5 baffle plate assemblies, 6 negative plates, 7 positive plates, 8A magnet piece, 9B magnet piece, 10 electric wires, 11 imports, 12 outlets, 13 vacuum diffusers, 14 controllers.
Embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, be clearly and completely described the technical scheme in the utility model embodiment, obviously, described embodiment is only the utility model part embodiment, instead of whole embodiments.Based on the embodiment in the utility model, those of ordinary skill in the art are not making the every other embodiment obtained under creative work prerequisite, all belong to the scope of the utility model protection.
The utility model provides a kind of Sputting film-plating apparatus that can control strength of electric field as shown in Figure 1, comprises cavity 1, plated film chamber 2, target 3, delivery roll 4, baffle plate assembly 5, negative plate 6, positive plate 7, A magnet piece 8, B magnet piece 9, electric wire 10, import 11, outlet 12, vacuum diffuser 13, controller 14, described plated film chamber 2 is arranged on the inside of cavity 1, and described negative plate 6 is arranged on the bottom of plated film chamber 2, and described delivery roll 4 and baffle plate assembly 5 are all arranged on the upside of negative plate 6, and baffle plate assembly 5 is disposed between delivery roll 4, described baffle plate assembly 5 is by retaining plate, insulating part and baffle plate composition, described retaining plate is fixedly connected with the bottom of cavity, described insulating part is arranged between retaining plate and baffle plate, described positive plate 7 is arranged on the top of cavity 1, and being arranged in plated film chamber 2, described target 3 is arranged on the downside of positive plate 7, and described A magnet piece 8 is arranged on the left side of plated film chamber 2, described B magnet piece 9 is arranged on the right side of plated film chamber 2, described electric wire 10 respectively with controller 14, negative plate 6 and positive plate 7 are electrically connected, connection section between described electric wire 10 and cavity 1 is provided with sealing member, described import 11 is arranged on the middle part on the left of cavity 1, described outlet 12 is arranged on the right side of cavity 1, described vacuum diffuser 13 is arranged on the top of cavity 1, and described vacuum diffuser 13 is by cylinder valve, under meter and intake valve composition, described cylinder valve, under meter and intake valve be arranged on successively from top to bottom lead to plated film chamber intake ducting on, described controller 14 is arranged on the top on the right side of cavity 1.
Principle of work: sputter coating carries out in vacuum sputtering groove, vacuum tightness will reach 10 X 10
-3above, be filled with a certain amount of rare gas element, using target as negative electrode, workpiece, as anode, adds that high pressure makes ionized inert gas, Ar between two electrodes
+ion is accelerated by the negative high voltage (-500v) of negative electrode, with high velocity bombardment target, the particle splashing out from target surface fly to anode workpiece with enough speed and deposition in its surface, form coating; At this vacuum sputtering coating device, during work, open controller, need according to work piece operations the strength of current regulating current control device, thus control the intensity of electric field, then workpiece is entered in cavity 1 from the import 11 of cavity 1, and run on delivery roll 4, in the process passing through cavity 1, workpiece surface, by plated film, then arrives cavity 1 outside to enter subsequent processing from the outlet 12 of cavity 1.
Although illustrate and described embodiment of the present utility model, for the ordinary skill in the art, be appreciated that and can carry out multiple change, amendment, replacement and modification to these embodiments when not departing from principle of the present utility model and spirit, scope of the present utility model is by claims and equivalents thereof.
Claims (4)
1. one kind can control the Sputting film-plating apparatus of strength of electric field, comprise cavity (1), plated film chamber (2), target (3), delivery roll (4), baffle plate assembly (5), negative plate (6), positive plate (7), A magnet piece (8), B magnet piece (9), electric wire (10), import (11), outlet (12), vacuum diffuser (13), controller (14), it is characterized in that: described plated film chamber (2) is arranged on the inside of cavity (1), described negative plate (6) is arranged on the bottom of plated film chamber (2), described delivery roll (4) and baffle plate assembly (5) are all arranged on the upside of negative plate (6), and baffle plate assembly (5) is disposed between delivery roll (4), described positive plate (7) is arranged on the top of cavity (1), and be arranged in plated film chamber (2), described target (3) is arranged on the downside of positive plate (7), described A magnet piece (8) is arranged on the left side of plated film chamber (2), described B magnet piece (9) is arranged on the right side of plated film chamber (2), described electric wire (10) respectively with controller (14), negative plate (6) and positive plate (7) are electrically connected, described import (11) is arranged on the middle part in cavity (1) left side, described outlet (12) is arranged on the right side of cavity (1), described vacuum diffuser (13) is arranged on the top of cavity (1), described controller (14) is arranged on the top on cavity (1) right side.
2. a kind of Sputting film-plating apparatus that can control strength of electric field according to claim 1, is characterized in that: the connection section between described electric wire (10) and cavity (1) is provided with sealing member.
3. a kind of Sputting film-plating apparatus that can control strength of electric field according to claim 1, it is characterized in that: described vacuum diffuser (13) is made up of cylinder valve, under meter and intake valve, described cylinder valve, under meter and intake valve be arranged on successively from top to bottom lead to plated film chamber intake ducting on.
4. a kind of Sputting film-plating apparatus that can control strength of electric field according to claim 1, it is characterized in that: described baffle plate assembly (5) is made up of retaining plate, insulating part and baffle plate, described retaining plate is fixedly connected with the bottom of cavity, and described insulating part is arranged between retaining plate and baffle plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520494541.4U CN204874721U (en) | 2015-07-08 | 2015-07-08 | Can control electric field strength's sputter coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520494541.4U CN204874721U (en) | 2015-07-08 | 2015-07-08 | Can control electric field strength's sputter coating device |
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| Publication Number | Publication Date |
|---|---|
| CN204874721U true CN204874721U (en) | 2015-12-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201520494541.4U Active CN204874721U (en) | 2015-07-08 | 2015-07-08 | Can control electric field strength's sputter coating device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110676353A (en) * | 2019-10-28 | 2020-01-10 | 成都晔凡科技有限公司 | Film coating device and method for manufacturing heterojunction solar cell and laminated assembly |
-
2015
- 2015-07-08 CN CN201520494541.4U patent/CN204874721U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110676353A (en) * | 2019-10-28 | 2020-01-10 | 成都晔凡科技有限公司 | Film coating device and method for manufacturing heterojunction solar cell and laminated assembly |
| CN110676353B (en) * | 2019-10-28 | 2024-04-26 | 通威太阳能(金堂)有限公司 | Coating device and method for manufacturing heterojunction solar cell and laminated tile assembly |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20161031 Address after: 515000 South Road, Shantou City, Guangdong bonded E1 road H1 Patentee after: GUANGDONG XINJIAXING PACKAGING MATERIAL CO.,LTD. Address before: Tianhe District Tong East Road Guangzhou city Guangdong province 510665 B-101 No. 5, room B-118 Patentee before: GUANGDONG GAOHANG INTELLECTUAL PROPERTY OPERATION Co.,Ltd. Effective date of registration: 20161031 Address after: Tianhe District Tong East Road Guangzhou city Guangdong province 510665 B-101 No. 5, room B-118 Patentee after: GUANGDONG GAOHANG INTELLECTUAL PROPERTY OPERATION Co.,Ltd. Address before: 311804 Zhejiang city of Shaoxing province Zhuji City mountain village town No. 208 bamboo shed oil Patentee before: Chen Bin |