CN213507171U

CN213507171U - Film coating device

Info

Publication number: CN213507171U
Application number: CN202021832022.1U
Authority: CN
Inventors: 郭大威; 庞文猛; 王鑫; 刘雪莲; 焦新宇; 金作林
Original assignee: Beijing Trx Solar Technology Co ltd
Current assignee: Beijing Trx Solar Technology Co ltd
Priority date: 2020-08-27
Filing date: 2020-08-27
Publication date: 2021-06-22
Anticipated expiration: 2030-08-27

Abstract

The utility model relates to a vacuum coating technical field, concretely relates to coating device, include: the sealing shell is provided with a feeding structure and a discharging structure, and the feeding structure and the discharging structure are respectively arranged corresponding to a feeding hole and a discharging hole of a bearing structure arranged in the sealing shell; the film coating structure is arranged towards the bearing structure so as to coat the materials on the bearing structure with a film; the feeding structure and the discharging structure are respectively connected with the inner part of the sealing shell in an on-off mode through the opening and closing structure. The utility model provides a coating device with continuous coating and high production efficiency.

Description

Film coating device

Technical Field

The utility model relates to a vacuum coating technical field, concretely relates to coating device.

Background

Physical Vapor Deposition (PVD) has been widely used in many fields, such as display panels, solar photovoltaic, photo-thermal, LED, magnetic memory material preparation, etc. At present, the application of modified coating films of various small particle materials is more and more extensive, for example, a layer of metal film is coated on the outer surface of a ceramic particle to ensure that the ceramic particle has certain conductivity; or the metal particles are coated with a ceramic film to ensure that the metal particles have certain insulativity, and the coating mode is more and more widely demanded in the emerging material market. The majority of small-particle coating equipment adopts a combination form of a plane target and a vibrating plate, namely, a raw material to be coated is placed on the vibrating plate, the vibrating plate vibrates to move the raw material, and coating is carried out in the moving process. The film coating method stops the film coating process every time when feeding and discharging, so that the number of film coatings every time is limited, continuous production cannot be realized, and the film coating efficiency is low.

SUMMERY OF THE UTILITY MODEL

Therefore, the utility model aims to solve the technical problem of overcoming the defects of discontinuous coating and influence on coating efficiency in the prior art, thereby providing a coating device with continuous coating and high production efficiency.

In order to solve the above technical problem, the utility model provides a coating device, include:

the sealing shell is provided with a feeding structure and a discharging structure, and the feeding structure and the discharging structure are respectively arranged corresponding to a feeding hole and a discharging hole of a bearing structure arranged in the sealing shell;

the film coating structure is arranged towards the bearing structure so as to coat the materials on the bearing structure with a film;

the feeding structure and the discharging structure are respectively connected with the inner part of the sealing shell in an on-off mode through the opening and closing structure.

In the coating device, the opening and closing structure is a vacuum valve.

The coating device, the feeding structure and the discharging structure respectively comprise at least two chambers communicated through the vacuum valve.

In the film coating device, the bearing structure is a roller.

The feeding hole of the roller is higher than the discharging hole of the coating device.

The coating structure of the coating device is a magnetron sputtering cylindrical target.

In the coating device, the magnetron sputtering cylindrical target penetrates through the sealing shell and then extends into the roller.

The magnetron sputtering cylindrical target extends to the feed inlet of the roller.

The coating device is characterized in that the magnetron sputtering cylindrical target is connected with a rotary driving structure.

The coating device also comprises a vacuum pumping structure communicated with the sealing shell.

The utility model discloses technical scheme has following advantage:

1. the utility model provides a film coating device, the feed structure and the discharge structure are respectively connected with the inner part of the sealing shell through the on-off structure, thus the connection between the feed structure and the discharge structure and the inner part of the sealing shell can be blocked through the on-off structure before feeding and discharging, and the normal operation of the film coating process in the sealing shell is not influenced; after the vacuum degree in the feeding structure or the discharging structure meets the requirement, the feeding structure and the sealing shell are communicated through the opening and closing structure, or the discharging structure and the sealing shell complete feeding or discharging, so that the continuity of film coating is ensured, and the production efficiency is improved.

2. The utility model provides a coating device, feed structure and ejection of compact structure all include two at least cavities through the vacuum valve intercommunication, can realize evacuation step by step, guarantee that vacuum reaches required requirement.

3. The utility model provides a coating device, the feed inlet of cylinder is higher than the discharge gate setting. Therefore, the material automatically flows from the feeding hole to the discharging hole under the action of gravity, and uniform coating is realized along with the rotation of the roller, and the continuity of coating is further ensured.

4. The utility model provides a coating device, magnetron sputtering cylinder target rotate under the drive of rotary drive structure, and extend to the feed inlet department of cylinder, can improve the utilization ratio of target greatly, realize directional coating film.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the technical solutions in the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.

FIG. 1 is a schematic view of a coating apparatus provided in the present invention;

fig. 2 is an enlarged schematic view of the feed structure of fig. 1.

Description of reference numerals:

1. sealing the housing; 2. a load bearing structure; 3. coating a film structure; 4. a support; 5. a vacuum pumping structure; 6. a feed structure; 7. a discharging structure; 8. a support frame; 9. a delivery conduit; 10. an opening and closing structure; 11. a chamber; 12. and a rotation driving structure.

Detailed Description

The technical solution of the present invention will be described clearly and completely with reference to the accompanying drawings, and obviously, the described embodiments are some, but not all embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Furthermore, the technical features mentioned in the different embodiments of the invention described below can be combined with each other as long as they do not conflict with each other.

In a specific embodiment of the coating apparatus shown in fig. 1, a directional magnetron sputtering process is used to coat a small particle material, and the coating apparatus includes a sealed housing 1, and a bearing structure 2 and a coating structure 3 disposed in the sealed housing 1.

The inside of the sealed shell 1 is in a vacuum environment so as to ensure the smooth proceeding of magnetron sputtering coating. The sealing shell 1 is arranged on a support 4, the support 4 is provided with a vacuumizing structure 5 communicated with the inside of the sealing shell 1, such as a direct connection pump and a molecular pump unit, the direct connection pump and the molecular pump unit are arranged below the sealing shell 1, and before magnetron sputtering coating, vacuumizing operation is performed on the inside of the sealing shell 1 through the direct connection pump and the molecular pump unit.

The sealing shell 1 is a cylinder body which is horizontally placed, and two ends of the cylinder body are sealed through a cover body. The feeding structure 6 and the discharging structure 7 are respectively arranged on the upper side wall and the lower side wall of the sealed shell 1, the sealing covers are respectively arranged on the feeding structure 6 and the discharging structure 7, and the feeding structure 6 and the discharging structure 7 are respectively arranged corresponding to the feeding hole and the discharging hole of the bearing structure 2 in the sealed shell 1.

The bearing structure 2 is a roller which is obliquely arranged, namely, a feed inlet of the roller is higher than a discharge outlet. A supporting frame 8 is installed in the sealing shell 1, one end of the supporting frame 8 is higher than the other end of the supporting frame, and the roller is placed on the supporting frame 8. The roller rotates in a gear transmission or friction transmission mode to drive the small particle materials inside to rotate along with the roller, and the uniformity of the coating film is guaranteed.

The feeding structure 6 extends to the feeding hole of the roller through a conveying pipeline 9, and the inlet of the discharging structure 7 is arranged corresponding to the discharging hole of the roller, so that the small particle materials directly enter the discharging structure 7 after flowing out of the discharging hole. As shown in fig. 2, the feeding structure 6 and the discharging structure 7 are respectively connected to the inside of the sealed housing 1 through a vacuum valve as an opening/closing structure 10. The feeding structure 6 and the discharging structure 7 each comprise two chambers 11 communicating through the vacuum valve.

The coating structure 3 is arranged towards the bearing structure 2 so as to coat the materials on the bearing structure 2. Specifically, the coating structure 3 is a magnetron sputtering cylindrical target, and the target material is installed on the magnetron sputtering cylindrical target. The magnetron sputtering cylindrical target horizontally penetrates through the cover body on one side of the sealing shell 1 and then extends to the feed inlet of the roller. The magnetron sputtering cylindrical target is connected with a direct current motor serving as a rotary driving structure 12, and is driven by the direct current motor to rotate so as to carry out magnetron sputtering coating on small particle materials in the roller. The dc motor is mounted outside the hermetic case 1.

Before film coating, firstly, the interior of the sealing shell 1 is vacuumized through a direct connection pump and a molecular pump unit, at the moment, a first-stage cavity and a second-stage cavity of the feeding structure 6, and a vacuum valve between the second-stage cavity of the feeding structure 6 and the sealing shell are closed, and the vacuum valve between the sealing shell 1 and a second-stage cavity of the discharging structure 7, and a vacuum valve between the second-stage cavity of the discharging structure 7 and the first-stage cavity are also in a closed state. When feeding is needed, placing the small particle materials to be coated in the primary chamber, closing the opening of the primary chamber, vacuumizing the primary chamber, opening a first vacuum valve between the primary chamber and the secondary chamber of the feeding structure 6 when the vacuum degree reaches a first preset value, enabling the small particle materials to enter the secondary chamber, and closing the first vacuum valve; vacuumizing the secondary chamber, after the vacuum degree in the secondary chamber reaches a second preset value, namely, when the vacuum degree in the sealing shell 1 is consistent, opening a second vacuum valve between the secondary chamber of the feeding structure 6 and the sealing shell, enabling small-particle materials to smoothly enter the roller under the action of the conveying pipeline 9, completing feeding, enabling the small-particle materials to rotate under the driving of the roller, continuously sputtering the target material on the magnetron sputtering cylindrical target to the surface of the small-particle materials under the driving of the direct current motor, coating, and repeating the steps when the materials are required to be fed again, so as to ensure continuous coating. When discharging is needed, firstly, the secondary chamber of the discharging structure 7 is vacuumized, and when the vacuum degree reaches a second preset value, a second vacuum valve between the sealing shell 1 and the secondary chamber of the discharging structure 7 is opened, so that the coated small-particle materials enter the secondary chamber; then, the primary cavity of the discharging structure 7 is vacuumized, after the vacuum degree reaches a first preset value, a first vacuum valve between the secondary cavity and the primary cavity of the discharging structure 7 is opened, the coated small particle materials enter the primary cavity, the first vacuum valve is closed, an outlet of the primary cavity is opened, discharging is completed, and when discharging is needed again, the steps are repeated to ensure continuous coating. The whole process does not affect the vacuum degree in the sealed shell 1, the normal operation of the coating process is ensured, the utilization rate of the target material is improved to about 90 percent, the time for opening the door and replacing the target is reduced, the production efficiency is greatly improved, and the production cost is reduced.

As an alternative embodiment, the carrying structure 2 may also be an obliquely arranged vibrating plate, under the action of which small-particle material is moved from the inlet opening to the outlet opening.

As an alternative embodiment, the magnetron sputtering cylinder target can also be located completely inside the drum, or only the outlet is arranged aligned with the inside of the drum, the whole structure being located outside the sealed enclosure 1.

It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications can be made without departing from the scope of the invention.

Claims

1. A plating device, characterized by comprising:

the sealing shell (1) is provided with a feeding structure (6) and a discharging structure (7), wherein the feeding structure (6) and the discharging structure (7) are respectively arranged corresponding to a feeding hole and a discharging hole of a bearing structure (2) arranged in the sealing shell (1);

the coating structure (3) is arranged towards the bearing structure (2) so as to coat the materials on the bearing structure (2);

the feeding structure (6) and the discharging structure (7) are respectively connected with the inner part of the sealed shell (1) in an on-off mode through an opening and closing structure (10).

2. The plating device according to claim 1, wherein the opening/closing structure (10) is a vacuum valve.

3. The coating device according to claim 2, characterized in that the inlet structure (6) and the outlet structure (7) each comprise at least two chambers (11) communicating through the vacuum valve.

4. A coating device according to any one of claims 1-3, characterized in that the carrying structure (2) is a roller.

5. The plating device according to claim 4, wherein the feed port of the drum is disposed higher than the discharge port.

6. The coating device according to claim 4, characterized in that the coating structure (3) is a magnetron sputtering cylindrical target.

7. The coating device according to claim 6, wherein the magnetron sputtering cylindrical target extends through the sealed housing (1) to the inside of the drum.

8. The coating device according to claim 7, wherein the magnetron sputtering cylindrical target extends to a feed port of the drum.

9. The coating device according to any one of claims 6 to 8, characterized in that the magnetron sputtering cylindrical target is connected to a rotary drive structure (12).

10. The plating device according to any one of claims 1 to 3, further comprising a vacuum-pumping structure (5) provided in communication with the sealed housing (1).