CN218262741U

CN218262741U - A dispersion exhaust structure for chemical vapor deposition stove

Info

Publication number: CN218262741U
Application number: CN202222854973.4U
Authority: CN
Inventors: 耿广仁; 王吉祥; 赵俊杰; 刘岩
Original assignee: Shandong Weiji Carbon Tech Co ltd
Current assignee: Shandong Weiji Carbon Tech Co ltd
Priority date: 2022-10-28
Filing date: 2022-10-28
Publication date: 2023-01-10
Anticipated expiration: 2032-10-28

Abstract

The utility model discloses a disperse exhaust structure for chemical vapor deposition furnace relates to chemical vapor deposition technical field, be equipped with the muffle in the chemical vapor deposition furnace, the upper end middle part of muffle is equipped with the gas vent, be equipped with the apron of flow equalizing in the muffle, the apron of flow equalizing is located the below of gas vent, and the edge of the apron of flow equalizing is pasted in the inner wall of muffle, and the apron of flow equalizing is connected with the upper end of muffle through the carbon bolt, evenly is equipped with the exhaust hole on the apron of flow equalizing, the diameter in outside exhaust hole is greater than the diameter in inboard exhaust hole; set up the apron that flow equalizes in the muffle tube, through the exhaust hole of different diameters, utilize the carminative mode of dispersion multiple spot, improve the carminative homogeneity of muffle tube, optimize the atmosphere homogeneity in the muffle tube greatly for gas from bottom to top evenly rises, has avoided the phenomenon that gas is concentrated, has improved thickness homogeneity, the surperficial aesthetic property of product surface CVD coating, has ensured product quality.

Description

A dispersion exhaust structure for chemical vapor deposition stove

Technical Field

The utility model relates to a chemical vapor deposition technical field specifically is a dispersion exhaust structure for chemical vapor deposition stove.

Background

Chemical Vapor Deposition (CVD) is a material surface modification technique. It can utilize the reaction between gas phases to endow the surface of the material with some special properties without changing the components of the matrix material and weakening the strength of the matrix material. At present, materials prepared by chemical vapor deposition technology, such as pyrolytic carbon coating (PyC), silicon carbide coating (SiC), tantalum carbide coating (TaC), boron nitride coating (BN), etc., are not only applied to the fields of cutter materials, wear-resistant, heat-resistant, corrosion-resistant materials, special composite materials in aerospace industry, atomic reactor materials, biomedical materials, etc., but also widely applied to the preparation and synthesis of various powder materials, block materials, new crystal materials, ceramic fibers, diamond films, etc.

The chemical vapor deposition furnace is one of important equipment for realizing a chemical vapor deposition process, and mainly comprises a gas inlet system, an exhaust system heater, a muffle and the like, wherein the muffle is an important part for bearing a product deposition CVD coating and plays an important role in providing a closed environment, averaging temperature, conducting gas flow and stabilizing atmosphere.

At present, most of vertical chemical vapor deposition furnaces in the prior art adopt the technical scheme of bottom multipoint air inlet and top single point air outlet, for example, the chemical vapor deposition furnace disclosed by the patent CN107779843B, CN207294881U and the air inlet distribution device of the chemical vapor deposition furnace disclosed by the patent CN212770949U, and the like. The existing exhaust structure can cause the gas at the periphery of the top of the muffle tube to be thin, the atmosphere in the muffle tube is not uniform, the phenomena of nonuniform thickness of a CVD coating on the surface of a product, coating flowering and the like are caused, and the service life and the surface attractiveness of the product are seriously influenced.

SUMMERY OF THE UTILITY MODEL

The utility model discloses be exactly the above-mentioned not enough to prior art exists, provide a dispersion exhaust structure for chemical vapor deposition stove, set up the apron that flow equalizes in the muffle tube, through the exhaust hole of different diameters, utilize the carminative mode of dispersion multiple spot, improve the carminative homogeneity of muffle tube, optimize the atmosphere homogeneity in the muffle tube greatly, make gas from bottom to top evenly rise, avoided gas concentration's phenomenon, the thickness homogeneity of having improved product surface CVD coating, surface aesthetic property, ensured product quality.

In order to achieve the above object, the utility model provides a following technical scheme:

the utility model provides a dispersion exhaust structure for chemical vapor deposition furnace, be equipped with the muffle in the chemical vapor deposition furnace, the upper end middle part of muffle is equipped with the gas vent, be equipped with the apron that flow equalizes in the muffle, the apron that flow equalizes is located the below of gas vent, and the edge of the apron that flow equalizes pastes in the inner wall of muffle, and the apron that flow equalizes is connected with the upper end of muffle through carbon-carbon bolt, evenly is equipped with the exhaust hole on the apron that flow equalizes, the diameter in outside exhaust hole is greater than the diameter in inboard exhaust hole.

Preferably, the head of the carbon bolt is positioned at the upper end of the muffle cylinder, and flexible graphite paper is padded between the head of the carbon bolt and the muffle cylinder.

Preferably, one end of the carbon-carbon bolt, which is far away from the head, is provided with an external thread, the flow equalizing cover plate is provided with a pull hole matched with the carbon-carbon bolt, and two sides of the flow equalizing cover plate are clamped and fixed by a carbon-carbon nut matched with the carbon-carbon bolt.

Preferably, the flexible graphite paper is annular, the inner diameter of the flexible graphite paper is smaller than the diameter of the carbon-carbon bolt, and the outer diameter of the flexible graphite paper is larger than the diameter of the head of the carbon-carbon bolt.

Preferably, the flow equalizing cover plate is formed by butting a plurality of guide plates, and exhaust holes are formed in the guide plates.

Preferably, the flow equalizing cover plate comprises a first guide plate, a second guide plate and a third guide plate which are butted along a forward pointer and have a fan-shaped structure, wherein a first upper matching groove is formed in the butt joint end of the first guide plate, a first lower matching groove is formed in the butt joint end of the second guide plate, a second lower matching groove is formed in one end, butted with the first guide plate, of the third guide plate, and a second upper matching groove is formed in one end, butted with the second guide plate, of the third guide plate.

Preferably, the exhaust hole includes the first exhaust hole that is close to the apron middle part that flow equalizes and the second exhaust hole that is located the first exhaust hole outside, and the diameter in second exhaust hole is greater than the diameter of first exhaust hole, is equipped with two first exhaust holes and two second exhaust holes on every guide plate at least.

Compared with the prior art, the beneficial effects of the utility model are that:

1. the utility model discloses set up the apron that flow equalizes in a muffle tube, through the exhaust hole of different diameters, utilize the carminative mode of dispersion multiple spot, improve the carminative homogeneity of muffle tube, optimize the atmosphere homogeneity in the muffle tube greatly for gas from bottom to top evenly rises, has avoided the phenomenon of gas concentration, has improved thickness homogeneity, the surperficial aesthetic property of product surface CVD coating, has ensured product quality.

2. The utility model adopts the step lap joint mode between the guide plates, and the guide plates are mutually limited through the steps, so that the guide plates can be positioned on the same horizontal plane, the butt joint between the guide plates is more compact, and the air tightness of the abutted seam is ensured; the flow equalizing cover plate is composed of a plurality of guide plates, so that the flow equalizing cover plate is convenient to disassemble, assemble and maintain.

3. The utility model discloses a rotate the altitude mixture control of carbon nut just can realize the guide plate, it is convenient to adjust, convenient to use.

Drawings

Fig. 1 is a cross-sectional view of the present invention;

FIG. 2 is a schematic view of a flow equalizing cover plate;

FIG. 3 is a schematic view of a first baffle

Fig. 4 is a schematic view of a second baffle;

fig. 5 is a schematic view of a third baffle.

In the figure: 1-a flow equalizing cover plate; 101-broaching; 102-a first venting aperture; 103-a second vent; 104-a first baffle; 105-a first upper mating groove; 106-first lower mating groove; 107-a second baffle; 108-a third baffle; 109-a second upper mating groove; 110-a second lower mating groove; 2-carbon bolts; 3-carbon nuts; 4-muffle tube.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

As shown in figure 1, a dispersion exhaust structure for chemical vapor deposition furnace, be equipped with muffle 4 in the chemical vapor deposition furnace, the upper end middle part of muffle 4 is equipped with the gas vent, be equipped with flow equalizing cover plate 1 in the muffle 4, flow equalizing cover plate 1 is located the below of gas vent, the edge of flow equalizing cover plate 1 pastes the inner wall in muffle 4, flow equalizing cover plate 1 passes through carbon-carbon bolt 2 and is connected with the upper end of muffle 4, evenly be equipped with the exhaust hole on the flow equalizing cover plate 1, in this application, evenly be equipped with two rings of exhaust holes, as shown in figure 2, the inner circle is first exhaust hole 102, the outer lane is second exhaust hole 103, because the gas vent is located the upper end middle part of muffle 4, therefore, middle part suction is bigger, in order to ensure the homogeneity of atmosphere, the diameter of second exhaust hole 103 is greater than the diameter of first exhaust hole 102.

2 sizes of carbon-carbon bolt can be selected between M6-M12, and the 2 specifications of the carbon-carbon bolt that this embodiment used are M12, and the head of carbon-carbon bolt 2 is located circularly and hangs in the upper end of muffle 4, has filled up flexible graphite paper between the head of carbon-carbon bolt 2 and muffle 4, improves its gas tightness.

The flexible graphite paper is ring shape, and the internal diameter of flexible graphite paper slightly is less than the diameter of carbon-carbon bolt 2, makes things convenient for the bolt to insert closely reality, and the external diameter of flexible graphite paper is greater than the head diameter of carbon-carbon bolt 2.

The one end that head was kept away from to carbon bolt 2 is equipped with the external screw thread, flow equalizes and is equipped with on the apron 1 with carbon bolt 2 complex trompil 101, and the both sides of the apron 1 that flow equalizes are through pressing from both sides tightly fixed with carbon bolt 2 complex carbon nut 3, just can realize the altitude mixture control to the apron 1 that flow equalizes through rotating carbon nut 3.

In order to change the disassembly and assembly of the flow equalizing cover plate 1, the flow equalizing cover plate 1 is formed by butting a plurality of guide plates, and a first exhaust hole 102 and a second exhaust hole 103 are arranged on each guide plate.

As shown in fig. 2-5, three fan-shaped guide plates are provided in the present application, which are a first guide plate 104, a second guide plate 107 and a third guide plate 108 that are butted along a forward pointer, a first upper mating groove 105 is provided at two butted ends of the first guide plate 104, a first lower mating groove 106 is provided at two butted ends of the second guide plate 107, a second lower mating groove 110 is provided at one butted end of the third guide plate 108 and the first guide plate 104, a second upper mating groove 109 is provided at one butted end of the third guide plate 108 and the second guide plate 107, and the butted ends of the three guide plates are in a step lap joint manner and are mutually limited by steps, so that the guide plates can be located on the same horizontal plane, the butt joint between the guide plates is tighter, and the air tightness at the butt joint is ensured.

In addition, at least two first exhaust holes 102 and two second exhaust holes 103 are arranged on each guide plate, so that the phenomenon that the atmosphere is not uniformly mixed due to too far distance of exhaust holes is avoided, and the atmosphere uniformity in the muffle tube 4 is greatly improved in a scattered multi-point exhaust mode.

It will be apparent to those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.

Claims

1. The utility model provides a dispersion exhaust structure for chemical vapor deposition stove, be equipped with the muffle in the chemical vapor deposition stove, the upper end middle part of muffle is equipped with gas vent, its characterized in that: be equipped with the apron that flow equalizes in the muffle tube, the apron that flow equalizes is located the below of gas vent, and the edge of the apron that flow equalizes pastes the inner wall in the muffle tube, and the apron that flow equalizes passes through the carbon bolt to be connected with the upper end of muffle tube, evenly is equipped with the exhaust hole on the apron that flow equalizes, the diameter in outside exhaust hole is greater than the diameter in inboard exhaust hole.

2. A dispersed exhaust structure for a chemical vapor deposition furnace as set forth in claim 1, wherein: the head of the carbon-carbon bolt is positioned at the upper end of the muffle tube, and flexible graphite paper is padded between the head of the carbon-carbon bolt and the muffle tube.

3. A dispersion exhaust structure for a chemical vapor deposition furnace according to claim 2, wherein: the one end that the head was kept away from to the carbon bolt is equipped with the external screw thread, be equipped with on the apron that flow equalizes with carbon bolt complex trompil, the both sides of the apron that flow equalizes are through pressing from both sides tightly fixedly with carbon bolt complex carbon nut.

4. A dispersed exhaust structure for a chemical vapor deposition furnace as set forth in claim 2, wherein: the flexible graphite paper is in a ring shape, the inner diameter of the flexible graphite paper is smaller than the diameter of the carbon bolt, and the outer diameter of the flexible graphite paper is larger than the diameter of the head of the carbon bolt.

5. A dispersed exhaust structure for a chemical vapor deposition furnace as set forth in claim 1, wherein: the flow equalizing cover plate is formed by butting a plurality of guide plates, and exhaust holes are formed in the guide plates.

6. A dispersion exhaust structure for a chemical vapor deposition furnace according to claim 5, wherein: the flow equalizing cover plate comprises a first guide plate, a second guide plate and a third guide plate which are in a fan-shaped structure and are butted along a forward pointer, wherein the two butt joint ends of the first guide plate are provided with a first upper matching groove, the two butt joint ends of the second guide plate are provided with a first lower matching groove, one end, butted with the first guide plate, of the third guide plate is provided with a second lower matching groove, and one end, butted with the second guide plate, of the third guide plate is provided with a second upper matching groove.

7. A dispersed exhaust structure for a chemical vapor deposition furnace as set forth in claim 6, wherein: the exhaust hole comprises a first exhaust hole close to the middle part of the flow equalizing cover plate and a second exhaust hole positioned outside the first exhaust hole, the diameter of the second exhaust hole is larger than that of the first exhaust hole, and at least two first exhaust holes and two second exhaust holes are arranged on each guide plate.