CN217378026U - Tubular PECVD equipment - Google Patents
Tubular PECVD equipment Download PDFInfo
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- CN217378026U CN217378026U CN202220243447.1U CN202220243447U CN217378026U CN 217378026 U CN217378026 U CN 217378026U CN 202220243447 U CN202220243447 U CN 202220243447U CN 217378026 U CN217378026 U CN 217378026U
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Abstract
The application relates to the technical field of solar cells, in particular to tubular PECVD equipment. The tubular PECVD equipment comprises a furnace tube and a gas collection pipeline; the gas collecting pipeline comprises a first gas collecting chamber, a second gas collecting chamber and a mixing chamber; the first air collection chamber is provided with a first air inlet, the second air collection chamber is provided with a second air inlet, and the first air inlet and the second air inlet are both used for being communicated with an external air source; the first air collecting chamber is provided with a plurality of first air outlet holes which are communicated with the mixing chamber, and the second air collecting chamber is provided with a plurality of second air outlet holes which are communicated with the mixing chamber; the mixing chamber is provided with a third air outlet communicated with the furnace tube. The tubular PECVD equipment of this application can mix different air supplies in the hybrid chamber with the multiple spot mode of admitting air, is favorable to improving the mixed degree of different air supplies in the mist, and the mist after the intensive mixing gets into the boiler tube through the third venthole again, is favorable to improving the coating film homogeneity, improves the product yield.
Description
Technical Field
The application relates to the technical field of solar cells, in particular to a tubular PECVD device.
Background
The film plating process is an important process in the production process of the solar cell industry, and when the surface of a silicon wafer is plated by adopting a tubular PECVD (plasma enhanced chemical vapor deposition) device, two kinds of special reaction gases, namely ammonia gas and silane, need to be introduced into a furnace tube so that the ammonia gas and the silane react in the furnace tube and are deposited on the surface of the silicon wafer to form a silicon nitride film. However, ammonia and silane in the furnace tube of the conventional tubular PECVD apparatus are not uniformly distributed, so that ammonia and silane cannot be sufficiently mixed, the uniformity of the coating film is poor (for example, the color of the film of the battery sheet is not uniform), and the yield of the product is low.
SUMMERY OF THE UTILITY MODEL
The present application aims to provide a tubular PECVD apparatus, which aims to improve the technical problem of poor coating uniformity of the existing tubular PECVD apparatus.
The application provides a tubular PECVD equipment, including boiler tube and gas collecting pipe.
The gas collecting pipeline comprises a first gas collecting chamber, a second gas collecting chamber and a mixing chamber.
The first air collection chamber is provided with a first air inlet, the second air collection chamber is provided with a second air inlet, and the first air inlet and the second air inlet are both used for being communicated with an external air source; the first air collecting chamber is provided with a plurality of first air outlet holes which are communicated with the mixing chamber, and the second air collecting chamber is provided with a plurality of second air outlet holes which are communicated with the mixing chamber.
The mixing chamber is provided with a third air outlet communicated with the furnace tube.
The first gas collecting chamber in the tubular PECVD equipment has a first gas inlet communicated with an external gas source and a plurality of first gas outlets communicated with the mixing chamber, and the second gas collecting chamber has a second gas inlet communicated with the external gas source and a plurality of second gas outlets communicated with the mixing chamber. When the mixing chamber is used, a first external gas source (such as ammonia) enters the first gas collecting chamber through the first gas inlet and then enters the mixing chamber through the plurality of first gas outlets, and a second external gas source (such as silane) enters the second gas collecting chamber through the second gas inlet and then enters the mixing chamber through the plurality of second gas outlets; the first external air source and the second external air source are converged and mixed in the mixing chamber in a multipoint air inlet mode, and the mixing degree of the first external air source and the second external air source is improved. The mixing chamber is provided with a third air outlet communicated with the furnace tube, and the mixed gas after full mixing enters the furnace tube through the third air outlet, so that two external air sources can react more fully in the furnace tube, the coating uniformity can be improved, and the product yield can be improved.
In some embodiments of the present application, the third air outlet holes are multiple in number, and the multiple third air outlet holes are all communicated with the furnace tube.
By the arrangement mode, the mixed gas can be communicated with the furnace tube in a multi-point gas inlet mode, so that the mixed gas is more uniformly distributed in the furnace tube, and the coating uniformity is favorably improved.
In some embodiments of the present application, the first plenum chamber, the second plenum chamber, and the mixing chamber all extend in a circumferential direction of the furnace tube; a plurality of third ventholes are all radially seted up towards the boiler tube and are arranged along the circumference interval of boiler tube.
The first gas collection chamber, the second gas collection chamber and the mixing chamber extend along the circumferential direction of the furnace tube, so that the paths of gas diffusion and mixing can be prolonged, and the first external gas source and the second external gas source can be fully mixed; a plurality of third ventholes are all radially seted up towards the boiler tube and are arranged along the circumference interval of boiler tube, can further improve the distribution uniformity of gas mixture in boiler tube circumference.
In some embodiments of the present application, the first plenum, the second plenum, and the mixing chamber are all annular.
By the arrangement mode, the gas diffusion and mixing path can be further prolonged, and the first external gas source and the second external gas source are fully mixed.
In some embodiments of the present application, the mixing chamber has a first region not communicating with the furnace tube, the central angle of the first region corresponding to both ends of the first region along the circumferential direction of the furnace tube is 30-60 °, and the first region is located at the lower end of the mixing chamber.
Because in the coating film process, the phenomenon of falling of fragments is easy to generate, the arrangement mode can effectively prevent foreign matters such as the fragments from falling into the mixing chamber after falling into the first area, the phenomenon of unsmooth airflow in the mixing chamber caused by the blockage of the mixing chamber is avoided, the normal operation of a coating film process is favorably ensured, and the film color uniformity of the battery piece is improved.
In some embodiments of the present application, the first gas collection chamber and the second gas collection chamber are both connected to an inner wall of the furnace tube, and the mixing chamber is disposed on a side of the first gas collection chamber and the second gas collection chamber away from the inner wall of the furnace tube; and a plurality of third air outlet holes are formed in the furnace tube in a way of deviating from the inner wall of the furnace tube.
In some embodiments of the present application, the plurality of first air outlet holes are all arranged along the circumferential direction of the furnace tube at intervals; the plurality of second air outlets are arranged along the circumferential direction of the furnace tube at intervals.
Above-mentioned arrangement for first outer source gas and second outer source gas are effective the mixing along the circumference homoenergetic of boiler tube in the mixing chamber, are favorable to improving the mixing efficiency of first outer source gas and second outer source gas.
In some embodiments of the present application, the plurality of first outlet holes are distributed in a manner that the aperture of the first outlet hole is smaller as the first outlet hole is closer to the first inlet hole; the second air outlets are distributed in a mode that the aperture of the second air outlet is smaller and closer to the second air inlet.
According to the arrangement mode, the flow of the gas entering the mixing chamber from each first gas outlet hole is kept consistent, and the flow of the gas entering the mixing chamber from each second gas outlet hole is also kept consistent, so that the distribution uniformity of the first external source gas and the second external source gas in the mixing chamber is improved, and the first external source gas and the second external source gas are fully mixed.
In some embodiments of the present application, the first outlet hole and the second outlet hole each have a larger aperture than the third outlet hole.
According to the arrangement mode, the flow rate of the gas entering the mixing chamber through the first gas outlet or the second gas outlet is reduced, the mixing time of the first external source gas and the second external source gas is increased, the mixing degree of the first external source gas and the second external source gas is improved, and the possibility that the first external source gas and the second external source gas enter the furnace tube without being fully mixed is reduced.
In some embodiments of the present application, the plurality of third outlet holes of the mixing chamber are distributed along the entire circumference of the furnace tube in the length direction.
The arrangement mode is favorable for improving the distribution uniformity of the mixed gas along the length direction of the furnace tube and improving the coating uniformity.
Drawings
To more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered as limiting the scope, and those skilled in the art can also obtain other related drawings based on the drawings without inventive efforts.
Fig. 1 shows a cross-sectional view of a first example of a tubular PECVD apparatus provided by an embodiment of the present application.
Fig. 2 shows a cross-sectional view along a-a of fig. 1.
Fig. 3 shows a cross-sectional view of a second example of a tubular PECVD apparatus provided by embodiments of the present application.
Icon: 100-tubular PECVD equipment; 110-furnace tube; 120-a gas collection conduit; 121-a first gas collection chamber; 1211 — a first intake port; 1212-first outlet hole; 122-a second plenum; 1221-a second air intake; 1222-a second air outlet; 123-a mixing chamber; 1231-a third outlet aperture; 1232-first region.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some embodiments of the present application, but not all embodiments. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present application, presented in the accompanying drawings, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments in the present application without making any creative effort belong to the protection scope of the present application.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the embodiments of the present application, it should be understood that the terms "upper", "lower", "left", "right", "front", "back", and the like indicate orientations or positional relationships based on orientations or positional relationships shown in the drawings, or orientations or positional relationships that are conventionally placed when products of the application are used, or orientations or positional relationships that are conventionally understood by those skilled in the art, and are used for convenience of description and simplification of description, but do not indicate or imply that the referred devices or elements must have a specific orientation, be constructed in a specific orientation, and be operated, and therefore, should not be construed as limiting the application.
In the description of the embodiments of the present application, it should also be noted that, unless otherwise explicitly stated or limited, the terms "disposed," "mounted," and "connected" are to be construed broadly, and may for example be fixedly connected, detachably connected, or integrally connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in this application will be understood to be a specific case for those of ordinary skill in the art.
Examples
Fig. 1 shows a cross-sectional view of a first example of a tubular PECVD apparatus 100 provided in an embodiment of the present application, fig. 2 shows a cross-sectional view along a-a of fig. 1, and fig. 3 shows a cross-sectional view of a second example of a tubular PECVD apparatus 100 provided in an embodiment of the present application, and referring to fig. 1, 2 and 3, the present application provides a tubular PECVD apparatus 100 for coating a surface of a silicon wafer.
The tubular PECVD apparatus 100 includes a furnace tube 110 and a gas collection conduit 120, and the gas collection conduit 120 includes a first gas collection chamber 121, a second gas collection chamber 122, and a mixing chamber 123. The first plenum 121 is adapted to communicate with a first external source of gas (e.g., ammonia), the second plenum 122 is adapted to communicate with a second external source of gas (e.g., silane), the first and second plenums 121, 122 communicate within a mixing chamber 123, and the mixing chamber 123 communicates with the furnace tube 110.
In this embodiment, the first plenum 121 has a first air inlet 1211 and a first air outlet 1212, the first air inlet 1211 is used to communicate with a first external air source, and the first air outlet 1212 communicates with the mixing chamber 123; the second plenum 122 has second inlet holes 1221 and second outlet holes 1222; the second air inlet 1221 is used for being communicated with a second external air source, and the second air outlet 1222 is communicated with the mixing chamber 123; the mixing chamber 123 has a third outlet 1231 in communication with the furnace tube 110.
When in use, a first external air source enters the first air collection chamber 121 through the first air inlet 1211 and then enters the mixing chamber 123 through the first air outlet 1212; a second external air source enters the second air collection chamber 122 through the second air inlet hole 1221 and then enters the mixing chamber 123 through the second air outlet hole 1222; after the first external source gas and the second external source gas are merged and mixed in the mixing chamber 123, the mixture gas enters the furnace tube 110 through the third gas outlet 1231, so that the first external source gas and the second external source gas are mixed and transmitted into the furnace tube 110.
In this embodiment, the first air inlet 1211 and the second air inlet 1221 are disposed at the bottom of the furnace tube 110. It should be noted that, in other embodiments of the present application, the first air inlet 1211 and the second air inlet 1221 may also be disposed at other positions, such as the top of the furnace tube 110, as long as the first air inlet 1211 and the second air inlet 1221 can be communicated with the external air source.
In this embodiment, the gas collecting pipe 120 can be made of stainless steel that can withstand a high temperature of more than 500 ℃. It should be noted that the specific material of the gas collecting duct 120 is not limited in this application.
Referring to fig. 1, in the first example shown in fig. 1, the gas collecting pipeline 120 is disposed on the inner wall of the furnace tube 110, and at this time, the first gas inlet 1211 and the second gas inlet 1221 penetrate through the wall of the furnace tube 110, so that the first gas inlet 1211 and the second gas inlet 1221 can be communicated with an external gas source, thereby mixing the first external source gas and the second external source gas and transferring the mixed gas into the furnace tube 110.
Referring to fig. 3, the gas collecting pipeline 120 may also be disposed on the outer wall of the furnace tube 110, as shown in the second example shown in fig. 3, at this time, the third gas outlet 1231 of the mixing chamber 123 penetrates through the tube wall of the furnace tube 110 to communicate the mixing chamber 123 with the furnace tube 110, so that the gas mixture can enter the furnace tube 110 through the third gas outlet 1231.
Referring to fig. 1 to 3 again, in order to improve the mixing degree of the first external air source and the second external air source, in the present embodiment, the number of the first air outlet 1212 and the second air outlet 1222 is multiple, and each of the first air outlet 1212 and the second air outlet 1222 is communicated with the mixing chamber 123, so that the first external air source and the second external air source enter the mixing chamber 123 through a multi-point air inlet manner and are mixed in the mixing chamber 123, which is beneficial to improving the mixing degree of the first external air source and the second external air source, so that the first external air source and the second external air source in the mixed gas entering the furnace tube 110 through the third air outlet 1231 are fully and uniformly mixed, which is beneficial to more fully reacting the two external air sources in the furnace tube 110, thereby improving the uniformity of film coating, and improving the yield of the product.
Further, in this embodiment, the number of the third air outlet holes 1231 is also multiple, and each of the third air outlet holes 1231 is communicated with the mixing chamber 123, so that the mixed gas is communicated with the furnace tube 110 in a multi-point air inlet manner, and the mixed gas is distributed more uniformly in the furnace tube 110, thereby facilitating improvement of the uniformity of the coating film.
In order to more effectively improve the distribution uniformity of the gas mixture in the furnace tube 110, in this embodiment, the first gas collection chamber 121, the second gas collection chamber 122, and the mixing chamber 123 all extend along the circumferential direction of the furnace tube 110, and the plurality of third gas outlet holes 1231 are all opened in the radial direction of the furnace tube 110 and are arranged at intervals along the circumferential direction of the furnace tube 110. By the arrangement mode, the gas diffusion and mixing path can be prolonged, the first external gas source and the second external gas source are fully mixed, the third gas outlet holes 1231 arranged along the circumferential direction of the furnace tube 110 can transmit the mixed gas to the furnace tube 110 along the radial direction of the furnace tube 110, and the distribution uniformity of the mixed gas along the circumferential direction of the furnace tube is improved.
Further, in the present embodiment, the first plenum chamber 121, the second plenum chamber 122, and the mixing chamber 123 are all annular, which may further extend the path of gas diffusion and mixing, and is beneficial to fully mixing the first external gas source and the second external gas source. At this time, in the first example, referring to fig. 1, the first plenum 121 and the second plenum 122 are both disposed in the furnace tube 110 and connected to the inner wall of the furnace tube 110, the mixing chamber 123 is disposed on one side of the first plenum 121 and the second plenum 122 away from the inner wall of the furnace tube 110, and the plurality of third air outlets 1231 are both opened away from the inner wall of the furnace tube 110. Alternatively, in a second example, referring to fig. 3, the mixing chamber 123 is disposed around the furnace tube 110 and connected to the outer wall of the furnace tube 110, and the first plenum 121 and the second plenum 122 are disposed on a side of the mixing chamber 123 away from the furnace tube 110.
In addition, in order to improve the distribution uniformity of the gas mixture in the furnace tube 110 along the length direction of the furnace tube 110, please refer to fig. 1 or fig. 3, the length direction of the furnace tube 110 is the direction from left to right. In the embodiment, the mixing chamber 123 extends along the length direction of the furnace tube 110, and the plurality of third air outlets 1231 of the mixing chamber 123 are distributed on the entire periphery along the length direction of the furnace tube 110.
Since the mixing chamber 123 extends along the length direction of the furnace tube 110, in order to achieve effective mixing of the first external source gas and the second external source gas along the length direction of the furnace tube 110, in the present embodiment, the first plenum 121 and the second plenum 122 both extend along the length direction of the furnace tube 110 and are alternately arranged. In this embodiment, the number of the first plenum 121 and the second plenum 122 arranged along the length direction of the furnace tube 110 is two, and the first plenum 121 and the second plenum 122 are alternately arranged along the length direction of the furnace tube 110. It should be noted that, the number of the first plenum 121 and the second plenum 122 arranged along the length direction of the furnace tube 110 is not limited in the present application, and the number of the first plenum 121 and the second plenum 122 arranged along the length direction of the furnace tube 110 may be adjusted according to specific situations.
In the present embodiment, referring to fig. 2, the first gas-collecting chamber 121 and the second gas-collecting chamber 122 both extend along the circumferential direction of the furnace tube 110, and the second gas-outlet holes 1222 are both spaced along the circumferential direction of the furnace tube 110 (not shown in the figure), so that the first external source gas and the second external source gas can be effectively mixed in the mixing chamber 123 along the circumferential direction of the furnace tube 110, which is beneficial to improving the mixing efficiency of the first external source gas and the second external source gas.
In order to effectively increase the degree of mixing of the first external source gas and the second external source gas in the mixing chamber 123, the applicant has set the aperture of the first outlet hole 1212, the second outlet hole 1222, and the third outlet hole 1231.
In this embodiment, the plurality of first outlet holes 1212 are distributed in such a manner that the aperture of the first outlet holes 1212 becomes smaller as it gets closer to the first inlet hole 1211 (not shown in the drawing), and the plurality of second outlet holes 1222 are distributed in such a manner that the aperture of the second outlet holes 1222 becomes smaller as it gets closer to the second inlet hole 1221 (not shown in the drawing); in other words, the second outlet holes 1222 are the same in that the apertures of the first outlet holes 1212, which are closer to the first inlet holes 1211, are smaller, and the apertures of the first outlet holes 1212, which are farther from the first inlet holes 1211, are larger. The above arrangement can make the flow rate of the gas entering the mixing chamber 123 through each first gas outlet 1212 uniform, and the flow rate of the gas entering the mixing chamber 123 through each second gas outlet 1222 uniform, so as to improve the distribution uniformity of the first and second external source gases in the mixing chamber 123, thereby facilitating the sufficient mixing of the first and second external source gases.
In this embodiment, the apertures of the first outlet holes 1212 and the second outlet holes 1222 are larger than the aperture of the third outlet holes 1231, so that the flow rate of the gas entering the mixing chamber 123 through the first outlet holes 1212 or the second outlet holes 1222 is reduced, which is beneficial to increasing the mixing time of the first external source gas and the second external source gas, thereby increasing the mixing degree of the first external source gas and the second external source gas, and reducing the possibility that the first external source gas and the second external source gas enter the furnace tube 110 without being sufficiently mixed.
In the process of the coating process, the falling-off phenomenon of the fragments is easily generated, for example, the silicon wafer falls off under the heated condition in the furnace tube 110, or the silicon nitride deposited on the inner wall of the furnace tube 110 is easily dropped off, and the third air outlet 1231 at the bottom of the furnace tube 110 is easily blocked by the fallen fragments. To solve the above problem, please refer to fig. 2, the mixing chamber 123 is provided with a first region 1232 not communicating with the furnace tube 110; along the height direction of the furnace tube 110, the first region 1232 is located at the lower end of the mixing chamber 123, and the central angle corresponding to the two ends of the first region 1232 along the circumferential direction of the furnace tube 110 is α. In this embodiment, α is 30 to 60 °, further, α is 45 °; above-mentioned mode of setting up can effectively avoid foreign matter such as piece to drop and get into mixing chamber 123 behind first region 1232 in, avoid the jam of mixing chamber 123 and the unsmooth phenomenon of airflow in the mixing chamber 123 that causes, be favorable to guaranteeing the normal clear of coating process to effectively improve the membrane colour homogeneity of battery piece.
The tubular PECVD apparatus 100 provided by the present application has at least the following advantages:
the first gas collection chamber 121 in the tubular PECVD apparatus 100 of the present application has a first gas inlet 1211 communicated with an external gas source and a plurality of first gas outlet 1212 communicated with the mixing chamber 123, and the second gas collection chamber 122 has a second gas inlet 1221 communicated with the external gas source and a plurality of second gas outlet 1222 communicated with the mixing chamber 123, so that two external gas sources can be mixed in the mixing chamber 123 through a multi-point gas inlet manner, which is beneficial to improving the mixing degree of the two external gas sources. The mixing chamber is provided with a third air outlet communicated with the furnace tube, and the mixed gas after full mixing enters the furnace tube through the third air outlet, so that two external air sources can react more fully in the furnace tube, the coating uniformity can be improved, and the product yield can be improved.
For the embodiment in which the number of the third air outlets 1231 is multiple, the multiple third air outlets 1231 are all communicated with the furnace tube, so that the mixed gas can be communicated with the furnace tube 110 in a multi-point air inlet manner, and the mixed gas is distributed more uniformly in the furnace tube 110, thereby facilitating the improvement of the uniformity of the coating film.
Further, in some embodiments, the first plenum 121, the second plenum 122, and the mixing chamber 123 all extend along the circumferential direction of the furnace tube, which may prolong the path of gas diffusion and mixing, and facilitate sufficient mixing of the two external gas sources. The third air outlets 1231 are all radially opened toward the furnace tube 110 and are circumferentially spaced along the furnace tube 110, so that the distribution uniformity of the air mixture in the circumferential direction of the furnace tube 110 can be further improved. The first air outlet holes 1212 and the second air outlet holes 1222 are all disposed along the circumferential direction of the furnace tube 110 at intervals, so that two kinds of external air sources can be effectively mixed along the circumferential direction of the furnace tube 110 in the mixing chamber 123, and the mixing efficiency of the air can be improved.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made to the present application by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (10)
1. A tubular PECVD device is characterized by comprising a furnace tube and a gas collection pipeline;
the gas collecting pipeline comprises a first gas collecting chamber, a second gas collecting chamber and a mixing chamber;
the first air collection chamber is provided with a first air inlet, the second air collection chamber is provided with a second air inlet, and the first air inlet and the second air inlet are both used for being communicated with an external air source; the first gas collecting chamber is provided with a plurality of first gas outlet holes which are communicated with the mixing chamber, and the second gas collecting chamber is provided with a plurality of second gas outlet holes which are communicated with the mixing chamber;
the mixing chamber is provided with a third air outlet communicated with the furnace tube.
2. The tubular PECVD apparatus of claim 1, wherein the third gas outlets are provided in a plurality, and the plurality of third gas outlets are all communicated with the furnace tube.
3. The tubular PECVD apparatus of claim 2, wherein the first plenum, the second plenum, and the mixing chamber all extend in a circumferential direction of the furnace tube; and the third air outlet holes are arranged in the radial direction of the furnace tube and are arranged at intervals along the circumferential direction of the furnace tube.
4. The tubular PECVD apparatus of claim 3, wherein the first plenum, the second plenum, and the mixing chamber are all annular.
5. The tubular PECVD apparatus of claim 4, wherein the mixing chamber has a first region not communicating with the furnace tube, the first region having a central angle of 30-60 ° at both ends in the circumferential direction of the furnace tube, and the first region is located at the lower end of the mixing chamber.
6. The tubular PECVD apparatus of claim 3, wherein the first and second plenums are both connected to the inner wall of the furnace tube, and the mixing chamber is disposed on a side of the first and second plenums away from the inner wall of the furnace tube; and the third air outlet holes are formed in the furnace tube in a way of deviating from the inner wall of the furnace tube.
7. The tubular PECVD apparatus of claim 3, wherein the first gas outlet holes are all arranged at intervals along the circumferential direction of the furnace tube;
and the plurality of second air outlets are arranged along the circumferential direction of the furnace tube at intervals.
8. The tubular PECVD apparatus of claim 3, wherein a plurality of the first outlet holes are distributed in such a way that the apertures of the first outlet holes become smaller as they get closer to the first inlet holes;
the second air outlets are distributed in a mode that the aperture of the second air outlet is smaller when the second air outlets are closer to the second air inlet.
9. The tubular PECVD apparatus of any of claims 1-8, wherein the first gas outlet and the second gas outlet each have a larger pore size than the third gas outlet.
10. The tubular PECVD apparatus of any of claims 1-8, wherein the plurality of third gas outlets of the mixing chamber are distributed along the entire circumference of the length of the furnace tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220243447.1U CN217378026U (en) | 2022-01-28 | 2022-01-28 | Tubular PECVD equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220243447.1U CN217378026U (en) | 2022-01-28 | 2022-01-28 | Tubular PECVD equipment |
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| CN217378026U true CN217378026U (en) | 2022-09-06 |
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| CN202220243447.1U Active CN217378026U (en) | 2022-01-28 | 2022-01-28 | Tubular PECVD equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117089825A (en) * | 2023-06-01 | 2023-11-21 | 无锡松煜科技有限公司 | Plating chamber with uniform fluid distribution and plating method |
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2022
- 2022-01-28 CN CN202220243447.1U patent/CN217378026U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117089825A (en) * | 2023-06-01 | 2023-11-21 | 无锡松煜科技有限公司 | Plating chamber with uniform fluid distribution and plating method |
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