CN218068568U

CN218068568U - Cover plate machine for mask plate of piezoelectric crystal component

Info

Publication number: CN218068568U
Application number: CN202222337398.0U
Authority: CN
Inventors: 田渕亚宁
Original assignee: Kaishitong Robot Intelligent Technology Suzhou Co ltd
Current assignee: Kaishitong Robot Intelligent Technology Suzhou Co ltd
Priority date: 2022-09-02
Filing date: 2022-09-02
Publication date: 2022-12-16
Anticipated expiration: 2032-09-02

Abstract

The utility model discloses a piezoelectric crystal components and parts Mask plate cover trigger, including the equipment rack, equipment rack UP end one side is equipped with feed mechanism, microscope carrier conveying mechanism, microscope carrier positioning mechanism, error correction mechanism, UP Mask plate cover mechanism and Mask plate cover mechanism in proper order, feed mechanism includes lift module and the fixed basket feed bin of locating the lift module bottom, microscope carrier conveying mechanism top slides and is equipped with the microscope carrier, microscope carrier positioning mechanism is connected with the microscope carrier and drives microscope carrier horizontal migration, error correction mechanism includes error correction vision mechanism and error correction actuating mechanism, the microscope carrier UP end is equipped with the fixed cylinder of Mask plate, the advantage that this invention compares with prior art lies in: the utility model discloses a rectilinear movement all adopts the drive of sharp module, and apron station owner moves and adopts the linear electric motor drive in order to guarantee the precision, and the location platform of carrier adopts the cylinder location, and it is accurate to make the apron process fix a position when carrying out.

Description

Mask plate covering machine for piezoelectric crystal component

Technical Field

The utility model relates to a mask plate apron technical field specifically indicates piezoelectric crystal components and parts mask plate apron machine.

Background

The mask is an important component of the photoetching machine, and the characteristics of the mask have obvious influence on the photoetching effect. The piezoelectric crystal component Mask plate covering machine is a necessary device for completing a UPMask plate and a Mask upper cover plate covering process in a wafer previous process, and the piezoelectric crystal component Mask plate covering machine in the current market has poor control precision and inaccurate positioning when a cover plate process is executed.

SUMMERY OF THE UTILITY MODEL

The utility model provides a to above-mentioned problem, provide a piezoelectric crystal components and parts mask plate apron machine, the location is more accurate when aim at improves control accuracy and makes the apron process carry out.

In order to solve the technical problem, the utility model provides a technical scheme does: a feeding mechanism, a carrying platform conveying mechanism, a carrying platform positioning mechanism, an error correction mechanism, a UP Mask plate covering mechanism and a Mask upper covering plate covering mechanism are sequentially arranged on one side of the upper end face of the equipment rack, the feeding mechanism comprises a lifting module and a lifting basket bin fixedly arranged at the bottom of the lifting module, a carrying platform is arranged above the carrying platform conveying mechanism in a sliding mode, the carrying platform positioning mechanism is connected with the carrying platform and drives the carrying platform to move horizontally, the error correction mechanism comprises an error correction visual mechanism and an error correction execution mechanism, and a Mask plate fixing cylinder is arranged on the upper end face of the carrying platform.

Furthermore, the carrier positioning mechanism comprises a positioning cylinder fixedly arranged on the upper end surface of the equipment rack, and the piston end of the positioning cylinder is in driving connection with the carrier.

Furthermore, the error correction vision mechanism adopts a CCD camera to take images of the wafer inserted into the mask plate and judge whether the wafer needs to be corrected or rejected.

Furthermore, the error correction actuating mechanism adopts a suction nozzle to process the wafer needing error correction or rejection.

Furthermore, the UP Mask plate covering mechanism adopts a matrix type sucking disc to suck the UP Mask plate and covers the UP Mask plate.

Furthermore, the Mask upper cover plate and cover plate mechanism adopts an electromagnet and a grapple to absorb the Mask upper cover plate and cover the Mask upper cover plate.

Compared with the prior art, the utility model the advantage lie in: the utility model discloses a rectilinear movement all adopts the drive of sharp module, and apron station owner moves and adopts the linear electric motor drive in order to guarantee the precision, and the location platform of carrier adopts the cylinder location, and it is accurate to make the apron process fix a position when carrying out.

Drawings

Fig. 1 is a schematic view of the overlooking structure of the mask plate covering machine for piezoelectric crystal components of the present invention.

As shown in the figure: 1. an equipment rack; 2. a feeding mechanism; 3. a stage conveying mechanism; 4. a stage positioning mechanism; 5. carrying platform; 6. a UP Mask plate cover plate mechanism; 7. a Mask upper cover plate mechanism; 201. a lifting module; 202. a basket storage bin; 501. an error correction vision mechanism; 502. an error correction actuator; 8. and (5) fixing the air cylinder.

Detailed Description

The present invention will be described in further detail with reference to the accompanying drawings.

Examples

As shown in the figure, the Mask plate covering machine for piezoelectric crystal components comprises an equipment rack 1, wherein a feeding mechanism 2, a platform conveying mechanism 3, a platform positioning mechanism 4, an error correction mechanism, a UP Mask plate covering mechanism 6 and a Mask upper covering plate covering mechanism 7 are sequentially arranged on one side of the upper end surface of the equipment rack 1, the feeding mechanism 2 comprises a lifting module 201 and a lifting basket bin 202 fixedly arranged at the bottom of the lifting module, a platform 5 is arranged above the platform conveying mechanism 3 in a sliding mode, the platform positioning mechanism 4 is connected with the platform 5 and drives the platform 5 to horizontally move, the error correction mechanism comprises an error correction visual mechanism 501 and an error correction execution mechanism 502, and a Mask plate fixing cylinder 8 is arranged on the upper end surface of the platform 5.

The stage positioning mechanism 4 comprises a positioning cylinder fixedly arranged on the upper end surface of the equipment rack 1, the piston end of the positioning cylinder is in driving connection with the stage 5, the error correction vision mechanism 501 adopts a CCD camera to image the wafer inserted into the mask plate and judge whether the wafer needs to be corrected or rejected, and the error correction execution mechanism 502 adopts a suction nozzle to process the wafer needing to be corrected or rejected.

The UP Mask plate cover plate mechanism 6 adopts a matrix type sucking disc to suck the UP Mask plate and cover the UP Mask plate, the Mask upper cover plate mechanism 7 adopts an electromagnet and a grapple to suck the Mask upper cover plate and cover the Mask plate, and the grapple is driven by a hydraulic device.

The utility model discloses a concrete implementation step as follows:

1. the lifting module 201 feeds the mask plate into the carrying platform 5 from the lifting basket bin 202;

2. the platform deck is positioned, the positioning cylinder works, and the position of the platform deck 5 is relatively fixed;

CCD image taking, wherein a CCD camera takes images of the wafer inserted on the mask plate to determine whether the wafer needs to be corrected or eliminated;

4. correcting errors by a suction nozzle, wherein the suction nozzle processes the wafer needing to be corrected or rejected;

5. the mask plate is fixed, and the fixing cylinder 8 tightly presses the mask plate to prevent the wafer from vibrating and shifting during the cover plate process;

6. covering the UP Mask plate, sucking the UP Mask plate by using a matrix type sucking disc, and covering and assembling;

7. covering the Mask upper cover plate, sucking the Mask upper cover plate in a mode of an electromagnet and a grapple and covering;

8. and (3) discharging the product, and conveying the mask plate of the completed cover plate back to the lifting basket bin 202 by the carrying platform conveying mechanism 3.

The present invention has been described in connection with the embodiments thereof, and the description is not intended to be limiting, and the embodiments of the present invention are shown in the drawings, and the actual structure is not limited thereto. In summary, those skilled in the art should understand that they should not be limited to the embodiments described above, and that they can design the similar structure and embodiments without departing from the spirit of the invention.

Claims

1. Piezoelectric crystal components and parts mask plate apron machine, including equipment rack (1), its characterized in that: the device comprises an equipment rack (1), and is characterized in that a feeding mechanism (2), a carrier conveying mechanism (3), a carrier positioning mechanism (4), an error correction mechanism, a UP Mask plate cover plate mechanism (6) and a Mask upper cover plate mechanism (7) are sequentially arranged on one side of the upper end face of the equipment rack (1), the feeding mechanism (2) comprises a lifting module (201) and a basket bin (202) fixedly arranged at the bottom of the lifting module, a carrier (5) is slidably arranged above the carrier conveying mechanism (3), the carrier positioning mechanism (4) is connected with the carrier (5) and drives the carrier (5) to horizontally move, the error correction mechanism comprises an error correction visual mechanism (501) and an error correction execution mechanism (502), and a Mask plate fixing cylinder (8) is arranged on the upper end face of the carrier (5).

2. The piezoelectric crystal component mask plate covering machine as claimed in claim 1, characterized in that: the carrier positioning mechanism (4) comprises a positioning cylinder fixedly arranged on the upper end surface of the equipment rack (1), and the piston end of the positioning cylinder is in driving connection with the carrier (5).

3. The piezoelectric crystal component mask plate covering machine as claimed in claim 1, characterized in that: the error correction visual mechanism (501) adopts a CCD camera.

4. The piezoelectric crystal component mask plate covering machine as claimed in claim 3, wherein: the error correction actuator (502) adopts a suction nozzle.

5. The piezoelectric crystal component mask plate covering machine as claimed in claim 1, characterized in that: the UP Mask plate cover plate mechanism (6) adopts a matrix type sucking disc.

6. The piezoelectric crystal component mask plate covering machine as claimed in claim 1, characterized in that: the Mask upper cover plate and cover plate mechanism (7) adopts an electromagnet and a grapple.