CN217973014U - Functional temperable low-radiation coated glass - Google Patents
Functional temperable low-radiation coated glass Download PDFInfo
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- CN217973014U CN217973014U CN202220613805.3U CN202220613805U CN217973014U CN 217973014 U CN217973014 U CN 217973014U CN 202220613805 U CN202220613805 U CN 202220613805U CN 217973014 U CN217973014 U CN 217973014U
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Abstract
The utility model relates to a functional type temperable low-radiation coated glass, in particular to the technical field of glass manufacturing. The utility model comprises a glass substrate and a first silicon-aluminum alloy film which are closely overlapped in sequence; a second zinc-aluminum alloy film; a third nichrome film; a fourth silver film; a fifth nichrome film; a sixth zinc oxide aluminum alloy film; a seventh silicon aluminum alloy film; an eighth nichrome film; a ninth silicon aluminum alloy film; a tenth zinc aluminum oxide alloy film, an eleventh nichrome film; a twelfth silver film; a thirteenth nichrome film; a fourteenth zinc aluminum oxide alloy film; a fifteenth silicon aluminum alloy film; the preparation method comprises the following steps: sintering target material, glass pretreatment and film coating treatment. The temperable low-radiation coated glass prepared by the utility model can achieve good decoration and energy-saving effects; the product can be processed and heat-treated in different places, so that the manufacturing cost of processing enterprises is reduced; the glass can also be made into hollow glass, thereby achieving better light control and energy saving effects.
Description
Technical Field
The utility model relates to a glassware haulage equipment technical field, in particular to but in a functional type tempering low radiation coated glass.
Background
Coated glass (refictiveglass) is also known as reflective glass. The coated glass is prepared by coating one or more layers of metal, alloy or metal compound films on the surface of glass to change the optical properties of the glass and meet certain specific requirements. The coated glass can be divided into the following types according to different characteristics of products: heat reflective glass, low emissivity glass (Low-E), conductive film glass, and the like.
The coated glass is produced by various methods, such as a vacuum magnetron sputtering method, a vacuum evaporation method, a chemical vapor deposition method, a sol-gel method and the like. The magnetron sputtering coated glass can be designed and manufactured into a multilayer complex film system by utilizing a magnetron sputtering technology, can be coated with various colors on a white glass substrate, has better corrosion resistance and wear resistance of a film layer, and is the most technique for production and use at present. The variety and quality of vacuum evaporation coated glass have certain differences compared with magnetron sputtering coated glass, and the vacuum evaporation coated glass is gradually replaced by a vacuum sputtering method. The chemical vapor deposition method is a technique of introducing reaction gas on a float glass production line to decompose on the surface of glowing glass and uniformly deposit on the surface of the glass to form coated glass. The method has the advantages of less equipment investment, easy regulation and control, low product cost, good chemical stability and hot processing, and is one of the most promising production methods at present. The sol-gel method for producing the coated glass has simple process and good stability, and has the defects of high light transmittance and poor decoration of the product.
The magnetron sputtering method is a production process of coated glass which is most applied, most stable in process, best in performance (the E value of radiance is less than or equal to 0.12), most abundant in variety and relatively low in energy requirement in the world at present. The production process can separate the float glass production and the glass coating process without binding with a float glass production line for use, thereby effectively reducing the repeated construction of the float glass production line of a glass deep processing enterprise, and reducing the carbon dioxide emission and the related energy consumption.
The principle of magnetron sputtering coating is that an orthogonal magnetic field and an electric field are added between a target pole (cathode) and an anode to be sputtered, required inert gas (usually Ar gas) is filled in a high vacuum chamber, a permanent magnet forms a 250-350 gauss magnetic field on the surface of the target material, and the orthogonal electromagnetic field is formed by the permanent magnet and the high voltage electric field. Under the action of electric field, argon gas is ionized into positive ions and electrons, a certain negative high voltage is added on the target, the ionization probability of the electrons emitted from the target electrode under the action of magnetic field and working gas is increased, high-density plasma is formed near the cathode, ar ions accelerate to fly to the target surface under the action of Lorentz force, bombard the target surface at high speed, and atoms sputtered from the target separate from the target surface at high kinetic energy, fly to a glass substrate and deposit to form a film.
The most widely used heat reflective glass and low emissivity glass are produced by vacuum magnetron sputtering and chemical vapor deposition. The more well-known manufacturers of vacuum magnetron sputtering equipment in the world include BOC (USA) and Laibao (Germany); chemical vapor deposition equipment manufacturers include the pierce corporation (uk), and the like. At present, hundreds of coated glass manufacturers appear in China, vacuum magnetron sputtering method manufacturers with great influence in the industry comprise south glass group companies and Shanghai sunlight coated glass companies in China, and chemical vapor deposition method manufacturers comprise Shandong Lanxing glass companies and Changjiang float glass companies.
The high-permeability Low-E glass has high visible light transmittance, high solar energy transmittance and far infrared ray emissivity, so that the high-permeability Low-E glass has excellent daylighting performance, more solar heat radiation and excellent heat insulation performance, is suitable for high-permeability buildings in northern cold regions and non-local areas, and has a prominent natural daylighting effect. The double-silver Low-E glass highlights the sun-shading effect of the glass on solar thermal radiation, skillfully combines the high light transmission of the glass with the Low transmittance of the solar thermal radiation, has high visible light transmittance, and can effectively limit outdoor background thermal radiation in summer from entering indoors.
At present, the production research of the high-permeability double-silver coated glass is not much, and the common production of the high-permeability double-silver coated glass is to carry out coating treatment on a common colorless glass sheet. The utility model discloses select for use specific nickel-chromium, aluminous silicon, zinc-aluminium, silver, zinc-tin for the two silver Low-emissivity coated glass of sputter target preparation, bright-colored and easy regulation, stable in quality, preparation are efficient, but what this method was made is Low-emissivity coated glass (Low-E glass), only have higher reflectance to the far infrared of wavelength in 4.5-25 micron within range, suitable long-term use.
SUMMERY OF THE UTILITY MODEL
(1) Technical problem to be solved
The utility model provides a functional type temperable low-emissivity coated glass aiming at the problems existing in the prior coated glass preparation technology.
(2) Technical scheme
In order to solve the technical problem, the utility model provides functional temperable low-emissivity coated glass, which comprises a glass substrate, a metal film layer and a glass substrate, wherein the glass substrate and the metal film layer are sequentially overlapped;
the first film layer is positioned on the surface of the glass substrate and is a silicon-aluminum alloy film;
the second film layer is positioned on the surface of the first film layer, and the second film layer is a zinc-aluminum oxide alloy film;
the third film layer is positioned on the surface of the second film layer and is a nichrome film;
the fourth film layer is positioned on the surface of the third film layer and is a silver film;
the fifth film layer is positioned on the surface of the fourth film layer and is a nickel-chromium alloy film;
the sixth film layer is positioned on the surface of the fifth film layer, and the sixth film layer is a zinc-aluminum oxide alloy film;
the seventh film layer is positioned on the surface of the sixth film layer, and the seventh film layer is a silicon-aluminum alloy film;
the eighth film layer is positioned on the surface of the seventh film layer and is a nichrome film;
the ninth film layer is positioned on the surface of the eighth film layer and is a silicon-aluminum alloy film;
the tenth film layer is positioned on the surface of the ninth film layer, and the tenth film layer is a zinc-aluminum oxide alloy film;
the eleventh film layer is positioned on the surface of the tenth film layer and is a nichrome film;
the twelfth film layer is positioned on the surface of the eleventh film layer and is a silver film;
the thirteenth film layer is positioned on the surface of the twelfth film layer and is a nichrome film;
a fourteenth film layer located on the surface of the thirteenth film layer, wherein the fourteenth film layer is a zinc-aluminum oxide alloy film;
and the fifteenth film layer is positioned on the surface of the fourteenth film layer and is a silicon-aluminum alloy film.
Preferably, the thickness of the first film layer is 98.0-122.0nm; the thickness of the second film layer is 16.0-24.0nm; the thickness of the third film layer is 3.0-7.0nm; the thickness of the fourth film layer is 5.5-11.0nm; the thickness of the fifth film layer is 4.0-8.0nm; the thickness of the sixth film layer is 16.0-25.0nm; the thickness of the seventh film layer is 195.0-230.0nm; the thickness of the eighth film layer is 3-7.0nm; the thickness of the ninth film layer is 120-160nm; the thickness of the tenth film layer is 16.0-25.0nm; the thickness of the eleventh film layer is 2.0-5.0nm; the thickness of the twelfth film layer is 8.0-13.0nm; the thickness of the thirteenth film layer is 2.5-6.0nm; the thickness of the fourteenth film layer is 12.0-18.0nm; the thickness of the fifteenth film layer is 160.0-200.0nm.
Preferably, the preparation method of the functional temperable low-radiation coated glass comprises the following steps of:
1) Sintered target material
Respectively sintering a silicon-aluminum alloy, a zinc-aluminum oxide alloy, a nickel-chromium alloy and a silver target material on a target position of a vacuum sputtering chamber of a glass coating machine for later use;
2) Pretreatment of glass
Placing the glass to be subjected to film coating treatment in a vacuum state, and performing moisture removal and degassing treatment on the glass to be subjected to film coating treatment to reduce water and gas deposited on the surface of the glass to prepare moisture removal and degassing glass;
3) Film coating treatment
Feeding the moisture-removed and degassed glass into a vacuum magnetron sputtering chamber of a glass coating machine, and sequentially coating a first silicon-aluminum alloy film on the surface of the moisture-removed and degassed glass from bottom to top; a second zinc-aluminum alloy film; a third nichrome film; a fourth silver film; a fifth nichrome film; a sixth zinc-aluminum oxide alloy film; a seventh silicon aluminum alloy film; an eighth nichrome film; a ninth silicon aluminum alloy film; a tenth zinc aluminum oxide alloy film; an eleventh nichrome film; a twelfth silver film; a thirteenth nichrome film; a fourteenth zinc aluminum oxide alloy film; a fifteenth silicon aluminum alloy film.
Preferably, the first silicon aluminum alloy film layer in step 3) is formed by four times of plating treatment.
Preferably, the seventh silicon aluminum alloy film layer in step 3) is formed by five times of plating treatment.
Preferably, the ninth silicon alloy film layer in step 3) is formed by four plating treatments.
Preferably, the fifteenth silicon aluminum alloy film in step 3) is formed by four times of plating treatment.
Preferably, the moisture removing and degassing treatment in the step 2) is to reduce the moisture and gas deposited on the surface of the glass to be coated in 2 treatment stages to prepare the moisture removing and degassing glass.
Preferably, the absolute pressure in the 1 st treatment stage during the dehumidifying, degassing treatment is higher than the absolute pressure in the 2 nd treatment stage.
Preferably, the absolute pressure during the 1 st treatment stage is 5.0-6.0X 10-2mbar or less; the absolute pressure during the treatment stage 2 is 3.0 to 6.0X 10-5mbar or less.
Preferably, the method further comprises the step 4) of buffering treatment, wherein the glass subjected to the film coating treatment is conveyed into a pressure buffer chamber from a vacuum magnetron sputtering chamber, and the pressure in the buffer chamber is gradually increased until the normal pressure is reached; the temperature in the buffer chamber is reduced to make the indoor temperature reach 20-35 ℃.
(3) Advantageous effects
The utility model provides a but functional tempering low-emissivity coated glass compares with prior art, the utility model discloses following beneficial effect has:
1. the functional temperable low-radiation coated glass prepared by the utility model adopts the magnetron sputtering to coat the first silicon-aluminum alloy film on the surface of the glass in sequence under the vacuum state; a second zinc-aluminum alloy film; a third nichrome film; a fourth silver film; a fifth nichrome film; a sixth zinc oxide aluminum alloy film; a seventh silicon aluminum alloy film; an eighth nichrome film; a ninth silicon aluminum alloy film; a tenth zinc aluminum oxide alloy film; an eleventh nichrome film; a twelfth silver film; a thirteenth nichrome film; a fourteenth zinc aluminum oxide alloy film; fifteenth silicon-aluminum alloy membrane, the complex film on glass surface shows for light blue under outdoor sunshine, adopts low price silicon-aluminum alloy, zinc aluminum oxide alloy, nichrome, silver as target and ordinary colorless transparent float glass substrate, has overcome current two silver low-emissivity coated glass can not heat-treat, allopatric processing, manufacturing cost are expensive, the defect that production efficiency is low, the utility model discloses a two silver low-emissivity coated glass's low in production cost is cheap, does benefit to low-emissivity glass's popularization and use.
2. The functional toughened low-emissivity coated glass prepared by the method has light blue reflection color, is an appearance color which is appreciated by designers or owners in the industries such as current buildings and the like, and has main visual physical parameters that the reflection color value of the glass surface is not less than 20 x L x is not less than 50, a is not less than 5 x is not less than 10, b is not less than 10 x; the reflection color value of the toughened glass surface is more than or equal to 20 and less than or equal to 50, more than or equal to-5 and less than or equal to 10, and more than or equal to-10 and less than or equal to 10; the reflection color value of the film surface before tempering is not less than 15 and not more than 35, a is not less than 0 and not more than 15, b is not less than 10 and not more than 30; the reflection color value of the toughened film surface is not less than 15 and not more than 35, a is not less than 0 and not more than 15, and b is not less than 10 and not more than 30. The outdoor decorative plate is light blue, colorful, bright and beautiful, can be widely applied to various buildings, and has good decorative effect.
3. The utility model discloses a functional tempering low-emissivity coated glass of preparation, its optical property technical parameter value accords with GB/T18915.1-2013 coated glass 2 nd part: according to the standard of low-emissivity coated glass, the maximum value of the allowable deviation of the visible light transmittance before and after tempering is small and far lower than 3.0% of the national standard, and the maximum value of the allowable deviation of the visible light transmittance is lower than 0.5%; the color uniformity is high and is less than 2.0CIELAB.
4. The utility model provides a functional type tempering low-radiation coated glass, visible light transmittance is not more than 40% before tempering and is more than 45% after tempering, outdoor visible light reflectance is less than 10% before tempering and after tempering, solar transmittance is less than 25% before tempering and after tempering, solar outdoor reflectance is more than 20% before tempering and after tempering, is suitable for building bright comfortable indoor and outdoor light environment; meanwhile, the heat transfer coefficient of the toughened glass is lower than 1.70W/m < 2 >. K before and after toughening in winter, lower than 1.66W/m < 2 >. K before and after toughening in summer, and the shading coefficient (Sc) of the toughened glass is lower than 0.33 before and after toughening. The total transmittance of solar energy is lower than 30% before and after tempering, the relative heat gain tempering is lower than 200w/m < 2 >, the thermal performance is good, the solar heat can be effectively prevented from radiating indoors, the energy-saving performance is good, the refrigeration energy consumption is reduced, and the light control and energy saving effects are better.
5. The utility model discloses a but functional tempering low emissivity coated glass can obtain the two silver-colored low emissivity coated glass of different optics and calorifics performance through the thickness that changes each coating film rete in the preparation process, also can make the cavity glass of different grade type to adapt to the different demands of market.
6. The utility model discloses the functional type tempering low-emissivity coated glass's of preparation heat stability is high, can realize strange land heat treatment processing.
7. The utility model discloses the method of preparing functional tempering low radiation coated glass realizes the change of colour on colorless transparent white glass, and the cost is lower, convenient and reliable.
Drawings
Fig. 1 is a schematic structural diagram of the present invention.
The reference signs are: 1. a glass substrate; 2. a first film layer; 3. a second film layer; 4. a third membrane layer; 5. a fourth film layer; 6. a fifth film layer; 7. a sixth film layer; 8. a seventh film layer; 9. an eighth membrane layer; 10. a ninth film layer; 11. a tenth film layer; 12. an eleventh film layer; 13. a twelfth film layer; 14. a thirteenth film layer; 15. A fourteenth film layer; 16. a fifteenth film layer.
Detailed Description
The invention is further described with reference to the accompanying drawings and examples.
As shown in fig. 1, the functional temperable low-emissivity coated glass of the present invention comprises a glass substrate, a metal film layer and a glass substrate 1, which are sequentially overlapped;
the first film layer 2 is positioned on the surface of the glass substrate, and the first film layer 2 is a silicon-aluminum alloy film;
the second film layer 3 is positioned on the surface of the first film layer 2, and the second film layer 3 is a zinc-aluminum oxide alloy film;
the third film layer 4 is positioned on the surface of the second film layer 3, and the third film layer 4 is a nichrome film;
the fourth film layer 5 is positioned on the surface of the third film layer 4, and the fourth film layer 5 is a silver film;
a fifth film layer 6, which is positioned on the surface of the fourth film layer 5, wherein the fifth film layer 6 is a nichrome film;
a sixth film layer 7 positioned on the surface of the fifth film layer 6, wherein the sixth film layer 7 is a zinc-aluminum oxide alloy film;
a seventh film layer 8 positioned on the surface of the sixth film layer 7, wherein the seventh film layer 8 is a silicon-aluminum alloy film;
an eighth film layer 9 positioned on the surface of the seventh film layer 8, wherein the eighth film layer 9 is a nichrome film;
a ninth film layer 10 located on the surface of the eighth film layer 9, wherein the ninth film layer 10 is a silicon-aluminum alloy film;
a tenth film layer 11 located on the surface of the ninth film layer 10, wherein the tenth film layer 11 is a zinc aluminum oxide alloy film;
an eleventh film layer 12 located on the surface of the tenth film layer 11, wherein the eleventh film layer 12 is a nichrome film;
a twelfth film layer 13 located on the surface of the eleventh film layer 12, wherein the twelfth film layer 13 is a silver film;
a thirteenth film layer 14 located on the surface of the twelfth film layer 13, wherein the thirteenth film layer 14 is a nichrome film;
a fourteenth film layer 15 located on the surface of the thirteenth film layer 14, wherein the fourteenth film layer 15 is a zinc-aluminum oxide alloy film;
and a fifteenth film layer 16 located on the surface of the fourteenth film layer 15, wherein the fifteenth film layer 16 is a silicon-aluminum alloy film.
The thickness of the first film layer 2 is 98.0-122.0nm; the thickness of the second film layer 3 is 16.0-24.0nm; the thickness of the third film layer 4 is 3.0-7.0nm; the thickness of the fourth film layer 5 is 5.5-11.0nm; the thickness of the fifth film layer 6 is 4.0-8.0nm; the thickness of the sixth film layer 7 is 16.0-25.0nm; the thickness of the seventh film layer 8 is 195.0-230.0nm; the thickness of the eighth film layer 9 is 3-7.0nm; the thickness of the ninth film layer 10 is 120-160nm; the thickness of the tenth film layer 11 is 16.0-25.0nm; the thickness of the eleventh film layer 12 is 2.0-5.0nm; the thickness of the twelfth film layer 13 is 8.0-13.0nm; the thickness of the thirteenth film layer 14 is 2.5-6.0nm; the thickness of the fourteenth film layer 15 is 12.0-18.0nm; the thickness of the fifteenth membrane layer 16 is 160.0-200.0nm;
a preparation method of functional temperable low-radiation coated glass comprises the following steps of:
1) Sintered target material
Respectively sintering silicon-aluminum alloy, zinc-aluminum alloy, nickel-chromium alloy, silver and zinc-aluminum oxide alloy on target positions of a vacuum sputtering chamber of a glass coating machine for later use;
1) Sintered target material
Respectively sintering a silicon-aluminum alloy, a zinc-aluminum oxide alloy, a nickel-chromium alloy and a silver target material on a target position of a vacuum sputtering chamber of a glass coating machine for later use;
2 pretreatment of the glass
Placing the glass to be subjected to film coating treatment in a vacuum state, and performing moisture removal and degassing treatment on the glass to be subjected to film coating treatment to reduce water and gas deposited on the surface of the glass to prepare moisture removal and degassing glass;
3 coating treatment
Feeding the moisture-removing and degassing glass into a vacuum magnetron sputtering chamber of a glass coating machine, and sequentially coating a first silicon-aluminum alloy film on the surface of the moisture-removing and degassing glass from bottom to top; a second zinc-aluminum alloy film; a third nichrome film; a fourth silver film; a fifth nichrome film; a sixth zinc oxide aluminum alloy film; a seventh silicon aluminum alloy film; an eighth nichrome film; a ninth silicon aluminum alloy film; a tenth zinc aluminum oxide alloy film; an eleventh nichrome film; a twelfth silver film; a thirteenth nichrome film; a fourteenth zinc aluminum oxide alloy film; a fifteenth silicon aluminum alloy film;
the first silicon-aluminum alloy film layer is formed by four times of plating treatment in the step 3);
the seventh silicon-aluminum alloy film layer is formed by five times of plating treatment in the step 3);
the ninth silicon alloy film layer in the step 3) is formed by four times of plating treatment;
the fifteenth silicon aluminum alloy film is formed by four times of plating treatment in the step 3);
in the step 2), the moisture removal and degassing treatment is to reduce the water and gas deposited on the surface of the glass to be coated in 2 treatment stages to prepare the moisture removal and degassing glass;
the absolute pressure in the 1 st treatment stage is higher than that in the 2 nd treatment stage in the dehumidification and degassing treatment process
The absolute pressure in the process of the treatment stage 1 is 5.0-6.0 multiplied by 10-2 mbar; the absolute pressure in the process of the 2 nd treatment stage is less than 3.0-6.0 multiplied by 10-5 mbar;
the method also comprises a step 4) of buffering treatment, wherein the glass subjected to the film coating treatment is conveyed into a pressure buffer chamber from a vacuum magnetron sputtering chamber, and the pressure in the buffer chamber is gradually increased until the normal pressure is reached; the temperature in the buffer chamber is reduced to make the indoor temperature reach 20-35 ℃.
The above-mentioned embodiments only express the preferred embodiments of the present invention, and the description thereof is more specific and detailed, but the present invention is not limited to these embodiments, and it should be noted that it is obvious to those skilled in the art. Without departing from the spirit of the present invention, any improvement is within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.
Claims (2)
1. A functional toughened low-emissivity coated glass comprises a glass substrate and a metal film layer which are sequentially overlapped, and is characterized in that the glass substrate (1);
the first film layer (2) is positioned on the surface of the glass substrate, and the first film layer (2) is a silicon-aluminum alloy film;
the second film layer (3) is positioned on the surface of the first film layer (2), and the second film layer (3) is a zinc-aluminum oxide alloy film;
the third film layer (4) is positioned on the surface of the second film layer (3), and the third film layer (4) is a nichrome film;
the fourth film layer (5) is positioned on the surface of the third film layer (4), and the fourth film layer (5) is a silver film;
the fifth film layer (6) is positioned on the surface of the fourth film layer (5), and the fifth film layer (6) is a nichrome film;
the sixth film layer (7) is positioned on the surface of the fifth film layer (6), and the sixth film layer (7) is a zinc-aluminum oxide alloy film;
the seventh film layer (8) is positioned on the surface of the sixth film layer (7), and the seventh film layer (8) is a silicon-aluminum alloy film;
the eighth film layer (9) is positioned on the surface of the seventh film layer (8), and the eighth film layer (9) is a nichrome film;
the ninth film layer (10) is positioned on the surface of the eighth film layer (9), and the ninth film layer (10) is a silicon-aluminum alloy film;
the tenth film layer (11) is positioned on the surface of the ninth film layer (10), and the tenth film layer (11) is a zinc-aluminum oxide alloy film;
the eleventh film layer (12) is positioned on the surface of the tenth film layer (11), and the eleventh film layer (12) is a nichrome film;
a twelfth film layer (13) located on the surface of the eleventh film layer (12), wherein the twelfth film layer (13) is a silver film;
a thirteenth film layer (14) located on the surface of the twelfth film layer (13), wherein the thirteenth film layer (14) is a nichrome film;
a fourteenth membrane layer (15) located on the surface of the thirteenth membrane layer (14), wherein the fourteenth membrane layer (15) is a zinc-aluminum oxide alloy membrane;
and the fifteenth film layer (16) is positioned on the surface of the fourteenth film layer (15), and the fifteenth film layer (16) is a silicon-aluminum alloy film.
2. The functional temperable low-emissivity coated glass according to claim 1, wherein the first film layer (2) has a thickness of 98.0-122.0nm; the thickness of the second film layer (3) is 16.0-24.0nm; the thickness of the third film layer (4) is 3.0-7.0nm; the thickness of the fourth film layer (5) is 5.5-11.0nm; the thickness of the fifth film layer (6) is 4.0-8.0nm; the thickness of the sixth film layer (7) is 16.0-25.0nm; the thickness of the seventh film layer (8) is 195.0-230.0nm; the thickness of the eighth film layer (9) is 3-7.0nm; the thickness of the ninth film layer (10) is 120-160nm; the thickness of the tenth film layer (11) is 16.0-25.0nm; the thickness of the eleventh film layer (12) is 2.0-5.0nm; the thickness of the twelfth film layer (13) is 8.0-13.0nm; the thickness of the thirteenth film layer (14) is 2.5-6.0nm; the thickness of the fourteenth film layer (15) is 12.0-18.0nm; the thickness of the fifteenth film layer (16) is 160.0-200.0nm.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114634314A (en) * | 2022-03-21 | 2022-06-17 | 新福兴玻璃工业集团有限公司 | Functional temperable low-emissivity coated glass and preparation method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114634314A (en) * | 2022-03-21 | 2022-06-17 | 新福兴玻璃工业集团有限公司 | Functional temperable low-emissivity coated glass and preparation method thereof |
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