CN217789917U - Thick film heating element - Google Patents
Thick film heating element Download PDFInfo
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- CN217789917U CN217789917U CN202221743456.3U CN202221743456U CN217789917U CN 217789917 U CN217789917 U CN 217789917U CN 202221743456 U CN202221743456 U CN 202221743456U CN 217789917 U CN217789917 U CN 217789917U
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- heating element
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- 238000010438 heat treatment Methods 0.000 title claims abstract description 33
- 239000000835 fiber Substances 0.000 claims abstract description 30
- 239000000919 ceramic Substances 0.000 claims abstract description 25
- 239000011521 glass Substances 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 239000011159 matrix material Substances 0.000 claims description 10
- 229910010293 ceramic material Inorganic materials 0.000 claims description 7
- 239000011153 ceramic matrix composite Substances 0.000 claims description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims 2
- 239000010410 layer Substances 0.000 description 33
- 239000000463 material Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 12
- 238000010304 firing Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000002131 composite material Substances 0.000 description 4
- 210000003298 dental enamel Anatomy 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000004534 enameling Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000002470 thermal conductor Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
- H05B3/688—Fabrication of the plates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/148—Silicon, e.g. silicon carbide, magnesium silicide, heating transistors or diodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
- H05B3/262—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an insulated metal plate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
- H05B3/72—Plates of sheet metal
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
- H05B2203/003—Heaters using a particular layout for the resistive material or resistive elements using serpentine layout
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/013—Heaters using resistive films or coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/017—Manufacturing methods or apparatus for heaters
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/033—Heater including particular mechanical reinforcing means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/034—Heater using resistive elements made of short fibbers of conductive material
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Surface Heating Bodies (AREA)
- Resistance Heating (AREA)
Abstract
A thick film heating element comprising a substrate, an insulating layer formed on the substrate, one or more heater traces formed on the insulating layer, and one or more connection pads connected to the one or more heater traces, wherein at least one of the insulating layer, the one or more heater traces, and the one or more connection pads comprise glass or ceramic fibers.
Description
Technical Field
The utility model relates to a thick film heating element and manufacturing method.
Background
Thick film heating elements typically include one or more heating traces that are screen printed (screen printed) as an ink or paste onto a dielectric substrate and fired to form high resistivity traces. The connection traces or pads may be printed in separate layers with different types of inks or pastes and fired to form low resistivity connection traces and pads.
The insulating substrate may be an electrically insulating material such as a ceramic, or may be a metal with an insulating surface layer. Thick film heating elements with metal substrates are typically manufactured by applying an electrically insulating layer to a metal substrate and then forming heater traces onto the surface of the insulating layer. The insulating layer may be a glass or ceramic material applied using screen printing techniques or a more conventional glass enamel (vitreou enameling) process. The metal substrate is most commonly stainless steel. The firing temperature and other characteristics of the insulating material, heater traces and pads must be compatible with the characteristics of the metal. In addition, protective ceramic or glass coatings may be added. This can also be applied by spraying or screen printing and subsequently fired.
More details of Thick film technology are described, for example, in White n. (2017) Thick Films, in Kasap s., capper p. (eds) Springer Handbook of Electronics and Photonic Materials, pages 707 to 709 and 712. The thick film paste may include an active material, a glass frit, and an organic carrier or vehicle. The glass frit remains after firing and forms part of the structure of the thick film resistor. Thus, "thick film" refers to a particular type of resistor having a characteristic structure and properties, not merely a comparative term or designation for the product when manufactured by a particular process.
The heater traces and connection pads comprise metal particles, typically silver, platinum or palladium, or a mixture of two or more of these metals, and glass. They are applied to the insulating layer in the form of a paste by screen printing and then dried and fired as described above.
Since the thick film material comprises glass or ceramic, the thick film material has low tensile strength and care must be taken during design and processing and use to ensure that the material is subjected to compressive forces rather than tension. This is typically accomplished by selecting a material for the substrate that has a coefficient of thermal expansion that is greater than the coefficients of thermal expansion of the thick film material and the insulating layer. As a result, the thick film material and insulating layer are subjected to compressive stress when the thick film heater cools down after the firing process. Sometimes the substrate is bent before or after the firing process to place the thick film material under compressive stress. Even so, a common failure mode is cracking of the insulation layer due to thermal shock.
Another problem is the connection of the heater trace to the power supply. It is common practice to provide connection pads of low resistance material at the ends of the heater traces. The connection pads comprise a material similar to the heater trace but with a very low resistance and therefore no significant heating in the connection area. The connection pads overlap the ends of the heater traces to provide a good electrical connection. A resilient (spring) contact may be used to connect the pad to the power supply. Typically these are copper alloys and provide a low resistance silver face by electroplating or by attaching silver contacts of the type typically seen in switches.
However, cheaper and more compact connections can be made by soldering the wires directly to the connection pads. The soldering process may cause failure of the heating element, for example due to volumetric shrinkage of the solder as it solidifies. This is particularly prevalent in the case of lead-free Sn/Ag/Cu and Sn/Cu/Ni alloys. As the solder solidifies and contracts, the solder exerts a stress on the connection pad that exceeds the strength of the bond between the pad and the heater trace, or the strength of the pad, heater trace, or insulating layer in the region of the connection pad.
Thick film elements having a steel substrate require an electrically insulating layer between the substrate and the heater trace. Glass or ceramic materials, like most materials that are electrical insulators, are poor thermal conductors. Although the insulating layer is relatively thin, on the order of 100 μm, there can still be a significant temperature gradient across the layer, increasing the temperature of the heater trace. The operating temperature of the traces limits the power that can be dissipated by the heater. If the thermal conductivity of the insulating layer is increased, the power density or heat flux can be increased. As a result, a heating element of a given power can be made smaller, or more power can be delivered through a given size element.
It is also desirable to be able to measure the temperature on the surface of the thick film heater. This can be done by printing the sensor with a material that has a relatively large change in resistance with temperature. Most of these materials have a negative temperature coefficient of resistance. The resistance of the heater trace may also be used as a sensor. The choice of materials with suitable resistivity is limited.
SUMMERY OF THE UTILITY MODEL
The aspects of the invention are defined by the appended claims.
At least some embodiments of the present invention relate to solutions to the above-mentioned problems of increasing the strength of thick film materials and insulating layers. Mechanical failure of glass and ceramics is typically caused by brittle fracture initiated by cracks that propagate at defects in the material such as scratches. In at least some embodiments, certain properties of the insulation layer are improved by using a Ceramic Matrix Composite (CMC). These composites have ceramic fibers embedded in a ceramic matrix. The ceramic fibers increase the stress required for crack propagation through the matrix, thereby increasing the energy consumed during crack propagation. When through-thickness cracks begin to form through the matrix, the fibers bridge these cracks without breaking, thereby increasing the tensile strength of the material. Ceramic fiber reinforcement increases the initial resistance of the composite to crack propagation and avoids sudden brittle failure as compared to monolithic ceramics.
Drawings
Specific embodiments of the present invention will now be described with reference to the accompanying drawings, in which:
fig. 1 is a perspective view of a thick film heating element in an embodiment of the invention;
FIG. 2 is an exploded perspective view of a thick film heating element in an embodiment; and
figure 3 is a cross-sectional view of a thick film heating element in an embodiment.
Detailed Description
Fig. 1 to 3 show a thick film heating element 1, the thick film heating element 1 comprising a substrate 2 with an insulating layer 3 of enamel. The substrate 2 may be made of steel such as ferritic stainless steel. In the method of manufacturing the thick film heating element 1, an insulating layer 3 is formed on the substrate 2 and connection pads 4 and one or more heating tracks 5 are formed on the insulating layer 3 using, for example, the thick film printing and firing process described above. One or more glaze layers (not shown) may be formed over the heating traces 5 leaving the connection pads 4 exposed.
In this embodiment, one or more of the insulating layer 3, connection pads 4, heater trace 5, and glaze layer(s) comprise glass or ceramic fibers, for example as a composite in a matrix of glass or ceramic material. There are many conventional methods of introducing ceramic matrices into the spaces between the fibers, including sintering, deposition of the matrix by a gas mixture, chemical reactions, and pyrolysis. None of these methods is compatible with two typical methods of applying the insulating layer 3 or heater trace 5 to the substrate 2: these methods are spray coating such as, but not limited to, electrophoretic spray coating, as well as flame spray coating and screen printing.
In one method according to an embodiment, ceramic fibers are introduced into a sprayed enamel or screen-printed paste to form the insulating layer 3 after firing. In an alternative method according to this embodiment, the enamel and ceramic fibers are sprayed separately onto the substrate 2 and then fired to form the insulating layer.
The size of the fibers, and the amount of fibers in the matrix, as well as the materials of the matrix and fibers, determine the properties of the composite. The matrix may be or have the same glass or ceramic material as the glass or ceramic material of the fibers.
The length of the fibres used in the CMC material may be up to 4mm or 5mm, and in practice the fibres are at least 0.5mm long. The diameter may vary from 1 μm to 50 μm. However, the size of the fibers is limited by the applied construction method and thickness of the insulating layer 3 and heater trace 5. The size of the fibers in the heater traces or connector pads is limited by the size of the holes in the printing screen.
In the insulating layer 3, the fibers may be long enough to break through the surface of the insulating layer 3. This may cause problems when the heater trace 5 is subsequently screen printed, but the fibres may also provide a good bond between the heater trace 5 and the insulating layer 3.
The fibers may comprise one or more of a range of materials. The insulating layer 3 mainly comprises glass and/or ceramic fibres may be used to reinforce the insulating layer 3. A ceramic such as boron nitride or alumina may be used as the fiber to add strength to the insulating layer 3, the heater trace(s) 5, or the connection pad 4. The thermal conductivity of the insulating layer 3, the heater trace(s) 5 or the connection pad 4 may be increased by adding fibers of a ceramic having a high thermal conductivity, such as silicon carbide or silicon nitride. The fibers may comprise ceramic oxides, nitrides or carbides of aluminum, boron or silicon.
In a variation of this embodiment, the temperature sensor trace may be deposited on the insulating layer, alongside the heater trace(s) 5 and separate from the heater trace(s) 5, using thick film technology, in order to sense the temperature of the heater trace(s) 5. The addition of ceramic fibers with low electrical resistance provides the material with a temperature coefficient of resistance that makes it suitable for use in such temperature sensor traces. The addition of fibers allows the temperature coefficient of resistance to be adjusted so that the properties of the sensor are matched to the intended application. Fibers of silicon carbide are among those suitable for this application.
Alternative embodiments
Alternative embodiments that may be apparent to those of ordinary skill in the art upon reading the foregoing description still fall within the scope of the appended claims.
Claims (15)
1. A thick film heating element comprising a substrate, an insulating layer formed on said substrate, one or more heater traces formed on said insulating layer, and one or more connection pads connected to said one or more heater traces, wherein at least one of said insulating layer, said one or more heater traces and said one or more connection pads comprise glass or ceramic fibers.
2. The thick film heating element of claim 1 further comprising a cover layer formed over the one or more heater traces, the cover layer comprising glass or ceramic fibers.
3. The thick film heating element of claim 1 further comprising one or more temperature sensor traces comprising glass or ceramic fibers.
4. The thick film heating element of claim 3 wherein said one or more temperature sensor traces comprise fibers of silicon carbide.
5. A thick film heating element as claimed in claim 1 wherein the fibres are in a matrix of glass or ceramic material different to that of the fibres.
6. A thick film heating element as claimed in claim 1 wherein the fibres are in a matrix of the same glass or ceramic material as that of the fibres.
7. A thick film heating element as claimed in claim 1 wherein the length of the fibres is between 0.5mm and 5 mm.
8. The thick film heating element of claim 1 wherein the diameter of the fibers is between 1 and 50 μ ι η.
9. The thick film heating element of claim 1 wherein said fibers comprise glass.
10. A thick film heating element as claimed in claim 1 wherein the fibres comprise a ceramic oxide, nitride or carbide of aluminium, boron or silicon.
11. A thick film heating element comprising in part a ceramic matrix composite, the ceramic matrix composite comprising glass or ceramic fibres.
12. A thick film heating element as claimed in claim 11 wherein the length of the fibres is between 0.5mm and 5 mm.
13. A thick film heating element as claimed in claim 11 wherein the diameter of the fibres is between 1 and 50 μm.
14. The thick film heating element of claim 11 wherein said fibers comprise glass.
15. A thick film heating element as claimed in claim 11 wherein the fibres comprise a ceramic oxide, nitride or carbide of aluminium, boron or silicon.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2109730.8A GB2608618A (en) | 2021-07-06 | 2021-07-06 | Thick film heating element |
GB2109730.8 | 2021-07-06 |
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CN217789917U true CN217789917U (en) | 2022-11-11 |
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CN202221743456.3U Active CN217789917U (en) | 2021-07-06 | 2022-07-06 | Thick film heating element |
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CN105139916B (en) * | 2015-06-30 | 2017-01-04 | 苏州洋杰电子有限公司 | Carbon dust doping molybdenio thick-film resistor paste and preparation method thereof |
CN106328251A (en) * | 2016-08-18 | 2017-01-11 | 陆川县华鑫电子厂 | Thick film resistor paste and preparation method thereof |
CN112992405B (en) * | 2021-04-27 | 2021-10-08 | 西安宏星电子浆料科技股份有限公司 | High-pressure-resistant and bending-resistant stainless steel substrate insulating medium slurry |
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2021
- 2021-07-06 GB GB2109730.8A patent/GB2608618A/en active Pending
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GB202109730D0 (en) | 2021-08-18 |
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