CN217600825U

CN217600825U - Vacuum coating system

Info

Publication number: CN217600825U
Application number: CN202221494922.9U
Authority: CN
Inventors: 王君
Original assignee: Iks Pvd Technology Shenyang Co ltd
Current assignee: Iks Pvd Technology Shenyang Co ltd
Priority date: 2022-06-15
Filing date: 2022-06-15
Publication date: 2022-10-18
Anticipated expiration: 2032-06-15

Abstract

The utility model provides a vacuum coating system, which belongs to the technical field of coating equipment. The vacuum coating system comprises a vacuum coating chamber and an etching device; the etching device comprises a first etching mechanism and a second etching mechanism which are oppositely arranged in the vacuum coating chamber, the first etching mechanism comprises a first etching component and a first anode, and the second etching mechanism comprises a second etching component and a second anode; the first etching component is connected with the side wall of the vacuum coating chamber, and the first anode is arranged in the vacuum coating chamber and positioned at the front end of the first etching component; the second etching component is connected with the top wall of the vacuum coating chamber, and the second anode is connected with the bottom wall of the vacuum coating chamber and is arranged opposite to the second etching component. The first etching mechanism and the second etching mechanism which are oppositely arranged in the vacuum coating chamber can form an etching area with larger coverage rate, so that the coating effect and the coating efficiency are improved to a certain extent.

Description

Vacuum coating system

Technical Field

The utility model relates to a coating equipment technical field especially relates to a vacuum coating system.

Background

DLC (Diamond-like carbon) Diamond film is a metastable long-range disordered amorphous carbon film, the bonding mode among carbon atoms is covalent bond, mainly comprises two hybrid bonds of sp2 and sp3, and a certain amount of C-H bonds also exist in the DLC film containing hydrogen, and because the special configuration enables the DLC film to have the excellent characteristics of Diamond and graphite, the DLC film is widely applied to metal coating operation.

When DLC operation is carried out by the existing coating equipment, the DLC operation is mostly carried out through the steps of vacuumizing a coating chamber, heating in the coating chamber, etching, priming, transition, an intermediate layer, DLC and the like. In the etching stage, most of the existing equipment carries out etching, cleaning, roughening and other treatments on the workpiece in an IET etching mode, so that impurities in the workpiece are stripped, the coated surface of the workpiece has a certain roughness, and the film is easier to adhere.

However, although the film plating equipment at the present stage can perform operations such as etching and film plating, due to the limited coverage of the IET etching and the poor etching degree and effect caused by the single etching mode, other impurities still remain in the etched workpiece, thereby greatly affecting the subsequent operations and the film plating effect.

Therefore, it is highly desirable to provide a vacuum coating system to solve the problems of the prior art to some extent.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a vacuum coating system to improve the regional coverage of sculpture in the vacuum coating system to a certain extent, improve sculpture degree and sculpture ability, optimize the coating film effect.

The utility model provides a vacuum coating system, which comprises a vacuum coating chamber and an etching device; the etching device comprises a first etching mechanism and a second etching mechanism which are oppositely arranged in the vacuum coating chamber, the first etching mechanism comprises a first etching component and a first anode, and the second etching mechanism comprises a second etching component and a second anode; the first etching component is connected with the side wall of the vacuum coating chamber, and the first anode is arranged in the vacuum coating chamber and positioned at the front end of the first etching component to form a horizontal etching area; the second etching component is connected with the top wall of the vacuum coating chamber, and the second anode is connected with the bottom wall of the vacuum coating chamber and arranged opposite to the second etching component to form a vertical etching area.

The first etching assembly comprises a fixed magnetic field component, a movable magnetic field component, an adjusting component, a first target seat and a first target material; the first target seat is connected with the side wall of the vacuum coating chamber, the fixed magnetic field component is connected with one side of the first target seat outside the vacuum coating chamber, the first target is connected with one side of the first target seat inside the vacuum coating chamber, and the movable magnetic field component is arranged in the first target seat and is movably connected with the fixed magnetic field component; the adjustment member is connected with the movable magnetic field member to adjust a position of the movable magnetic field member.

Specifically, the second etching assembly comprises a positioning component, a water cooling seat, an air inlet seat, an installation shaft, a molybdenum pipe and a heating wire; the positioning component is connected with the top wall of the vacuum coating chamber, the positioning component and the water-cooling seat form a heating cavity, and an electron outlet is formed in one side of the water-cooling seat, which is far away from the positioning component; one end of the mounting shaft penetrates through the positioning component along the vertical direction to enter the heating cavity and is connected with one end of the molybdenum pipe, and the other end of the molybdenum pipe is connected with a heating wire; the air inlet seat is connected with the positioning component and can be used for filling air into the heating cavity.

Further, the utility model provides a vacuum coating system still includes the striking mechanism, striking mechanism set up in the roof of vacuum coating room, and extend and get into in the vacuum coating room, and with second sculpture subassembly is relative.

Furthermore, the arc striking mechanism comprises a fixed seat and an arc striking rod; the fixed seat is connected with the top wall of the vacuum coating chamber, one end of the arc striking rod penetrates through the fixed seat to enter the vacuum coating chamber, an extending part is formed, and the extending part extends towards the direction close to the electron outlet.

The vacuum coating system provided by the utility model also comprises a magnetron sputtering device, wherein the magnetron sputtering device comprises a first magnetron sputtering mechanism and a second magnetron sputtering mechanism, the first magnetron sputtering mechanism comprises two first magnetron sputtering components which are oppositely arranged, and the second magnetron sputtering mechanism comprises two second magnetron sputtering components which are oppositely arranged; the target materials of the two first magnetron sputtering assemblies are the same, the target materials of the two second magnetron sputtering assemblies are the same, and the target materials of the first magnetron sputtering assemblies are different from the target materials of the second magnetron sputtering assemblies; the first magnetron sputtering component and the second magnetron sputtering component are connected with the side wall of the vacuum coating chamber, and the first magnetron sputtering component and the second magnetron sputtering component are arranged at intervals.

Specifically, the first magnetron sputtering assembly and the second magnetron sputtering assembly both comprise a second target holder and a shielding case, the first magnetron sputtering assembly further comprises a second target, and the second magnetron sputtering assembly further comprises a third target; the second target holder is connected with the side wall of the vacuum coating chamber, a rectangular mounting space is formed by the second target holder and the shielding case, an open part is formed on the shielding case, and the second target and the third target are arranged in the corresponding mounting space; the second target is made of tungsten carbide, and the third target is made of chromium.

Further, the first magnetron sputtering assembly and the second magnetron sputtering assembly both comprise magnetic field members, a first bearing groove and a second bearing groove are formed on the second target holder, the first bearing groove and the second bearing groove are independently arranged at intervals, and the magnetic field members are arranged in the first bearing groove and the second bearing groove; the magnetic field component comprises a first magnet, a second magnet and a bearing seat, wherein the first magnet, the second magnet and the bearing seat are different in magnetic pole, the first magnet and the second magnet are arranged at two ends of the bearing seat, the second magnet in the first bearing groove is close to the second magnet in the second bearing groove, and the first magnet in the first bearing groove is far away from the first magnet in the second bearing groove.

The magnetron sputtering device also comprises baffle plate components which are arranged in one-to-one correspondence with the first magnetron sputtering component and the second magnetron sputtering component; the baffle plate assembly comprises a baffle plate component and a connecting component, wherein the baffle plate is connected with the connecting component, and the connecting component is rotatably connected with the second target holder, so that the baffle plate component can open or close the opening part.

Specifically, the baffle plate member comprises a first baffle plate and a second baffle plate, the connecting member comprises a first connecting shaft and a second connecting shaft, the first connecting shaft is correspondingly connected with the first baffle plate, the first connecting shaft is rotatably connected with one side of the second target holder, the second connecting shaft is correspondingly connected with the second baffle plate, and the second connecting shaft is rotatably connected with the other side of the second target holder; when the first baffle and the second baffle close the open part, one side of the first baffle, which is far away from the first connecting shaft, is abutted against one side of the second baffle, which is far away from the second connecting shaft, and an extension part extending towards the direction close to the second baffle is formed on one side of the first baffle, which is far away from the first connecting shaft, and covers part of the second baffle.

Furthermore, the baffle assembly further comprises a control piece and a driving piece, the control piece is in communication connection with the driving piece, the driving piece is in one-to-one correspondence with the first connecting shaft and the second connecting shaft, and the control piece can control the driving piece to drive the first connecting shaft and the second connecting shaft to rotate so that the first baffle and the second baffle are opened or closed at the opening part.

Wherein, the utility model provides a vacuum coating system still includes heating device, heating device includes first heating mechanism and second heating mechanism, first heating mechanism with second heating mechanism sets up relatively, and all with vacuum coating room's lateral wall is connected.

Specifically, the utility model provides a vacuum coating system still includes evacuating device, evacuating device includes pump bleed pump package, connecting tube and aperture control assembly, be formed with the extraction opening on the lateral wall of vacuum coating chamber, pump bleed pump package passes through connecting tube with the extraction opening is connected, the aperture control assembly along vertical direction set up in the vacuum coating chamber, and be located the front end of extraction opening is used for adjusting the aperture of extraction opening.

Furthermore, a rough pumping port is formed in the bottom wall of the vacuum coating chamber, the rough pumping port is connected with a dustproof pipe extending towards the top wall of the vacuum coating chamber, and the connecting pipeline is respectively connected with the pumping port and the rough pumping port.

Furthermore, the vacuum coating chamber is of an octagonal structure and comprises a coating chamber main body, a first door body and a second door body; the first door body and the second door body are rotatably connected with the coating chamber main body.

Furthermore, the coating chamber main body comprises two first side walls which are oppositely arranged, the first door body comprises three second side walls which are connected in sequence, and the second door body comprises three third side walls which are connected in sequence; one of the first magnetron sputtering assemblies and one of the second magnetron sputtering assemblies are connected with two second side walls of the first door body which are arranged at intervals, and the other of the first magnetron sputtering assemblies and the other of the second magnetron sputtering assemblies are connected with two third side walls of the second door body which are arranged at intervals; the first heating mechanism is connected with a second side wall of the first door body, which is positioned between the first magnetron sputtering component and the second magnetron sputtering component, and the second heating mechanism is connected with a third side wall of the second door body, which is positioned between the first magnetron sputtering component and the second magnetron sputtering component; the first etching component is connected with one first side wall of the coating chamber main body, the air exhaust opening is formed in the other first side wall of the coating chamber main body, and the second etching component is located at the front end of the air exhaust opening.

The vacuum coating system provided by the utility model also comprises a cooling device, wherein the cooling device comprises a water supply mechanism, a water return mechanism and a plurality of cooling pipelines; the water inlet ends of the cooling pipelines are connected with the water supply mechanism, and the water outlet ends of the cooling pipelines are connected with the water return mechanism; the plurality of cooling pipelines are distributed in the coating chamber main body, the first door body, the second door body, the etching device, the magnetron sputtering device and the heating device.

The rotating frame driving device comprises a driving mechanism and a transmission mechanism; the driving mechanism is arranged outside the vacuum coating chamber, the output end of the driving mechanism is connected with the transmission mechanism, and the output end of the transmission mechanism penetrates through the bottom wall of the vacuum coating chamber to enter the vacuum coating chamber.

Furthermore, the transmission mechanism comprises a connecting block, a butt joint groove is formed in the connecting block, the butt joint groove is sword-shaped, and one end, far away from the pointed end, of the butt joint groove penetrates through the edge of the connecting block.

Compared with the prior art, the utility model provides a vacuum coating chamber has following advantage:

the utility model provides a vacuum coating chamber, which comprises a vacuum coating chamber and an etching device; the etching device comprises a first etching mechanism and a second etching mechanism which are oppositely arranged in the vacuum coating chamber, the first etching mechanism comprises a first etching component and a first anode, and the second etching mechanism comprises a second etching component and a second anode; the first etching component is connected with the side wall of the vacuum coating chamber, and the first anode is arranged in the vacuum coating chamber and positioned at the front end of the first etching component to form a horizontal etching area; the second etching component is connected with the top wall of the vacuum coating chamber, and the second anode is connected with the bottom wall of the vacuum coating chamber and arranged opposite to the second etching component to form a vertical etching area.

From this analysis, it is found that a stable and uniform etching region can be formed by the first etching mechanism and the second etching mechanism which are disposed in the vacuum deposition chamber in opposition to each other. Because the first etching mechanism in this application includes first sculpture subassembly and first positive pole, and the first sculpture subassembly is connected with the lateral wall of vacuum coating room in this application, and first positive pole sets up in the front end of first sculpture subassembly, consequently, when carrying out the sculpture operation, the ion that first sculpture subassembly sent moves to first positive pole under the effect of first positive pole to can form horizontal sculpture region. When the workpiece passes through the horizontal etching area, ions bombard the surface of the workpiece to realize the etching of the workpiece. Because the first etching mechanism only forms the horizontal etching area, the etching operation of the middle end area of the large workpiece except two ends can be only covered and finished through the first etching mechanism.

And this application further sets up second sculpture mechanism in the opposite of first sculpture mechanism, and second sculpture mechanism includes second sculpture subassembly and second positive pole, second sculpture subassembly is connected with the roof of vacuum coating room, the second positive pole is connected with the diapire of vacuum coating room, when carrying out the start-up of second sculpture mechanism and carry out the sculpture operation, the ion of second sculpture subassembly moves to the second positive pole under the influence of second positive pole, thereby can form vertical sculpture region, when the work piece is through vertical sculpture region, can carry out the sculpture to the work piece, especially can realize carrying out the sculpture operation to the region at the both ends of great work piece.

Therefore, through the simultaneous operation of the first etching mechanism and the second etching mechanism, and the mutual cooperation, the etching effect on the workpiece can be improved to a certain extent, the etching operation on the large workpiece can be realized, and the etching capability and the film coating effect of the vacuum film coating system are improved.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the technical solutions in the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.

Fig. 1 is a schematic structural diagram of a first view angle of a vacuum coating system according to an embodiment of the present invention;

fig. 2 is a schematic structural view of a second viewing angle of the vacuum coating system according to the embodiment of the present invention;

fig. 3 is a schematic diagram of an internal structure of a vacuum coating system at a second viewing angle according to an embodiment of the present invention;

fig. 4 is a schematic view of the internal structure at a third viewing angle of the vacuum coating system according to the embodiment of the present invention;

fig. 5 is a schematic structural diagram of a third viewing angle of a second etching component in the vacuum coating system according to the embodiment of the present invention;

fig. 6 is a cross-sectional view of a second etching component in the vacuum coating system according to an embodiment of the present invention;

fig. 7 is a schematic structural diagram of a magnetron sputtering device in a vacuum coating system provided by an embodiment of the present invention;

FIG. 8 is an enlarged view of a portion of FIG. 3 at A;

fig. 9 is a schematic structural view of an opened state of a first door body and a second door body of a vacuum coating chamber in a vacuum coating system provided by an embodiment of the present invention;

fig. 10 is a schematic structural diagram of a third view angle of a magnetron sputtering target in a vacuum coating system according to an embodiment of the present invention;

fig. 11 is a schematic structural diagram of an arc striking mechanism in a vacuum coating system according to an embodiment of the present invention.

In the figure: 1-vacuum coating chamber; 101-a film coating chamber main body; 1011-rough drawing port; 1012-dustproof pipe; 102-a first door body; 103-a second door body; 2-a first etching component; 3-a first anode; 4-a second etching component; 401-a positioning member; 402-water-cooling seat; 4021-an electron outlet; 403-air inlet seat; 404-mounting the shaft; 405-a molybdenum tube; 406-a heating wire; 407-heating chamber; 5-a second anode; 6-an arc striking mechanism; 601-a fixed seat; 602-arc striking rod; 7-a heater; 8-a magnetron sputtering device; 801-a first magnetron sputtering assembly; 8011-second target; 802-a second magnetron sputtering assembly; 8021-a third target; 803-a second backing plate; 8031-a first load-bearing tank; 8032-a second load-bearing tank; 8033-a first magnet; 8034-a second magnet; 804-a shield; 805-an adjustment member; 806-a first hold-down assembly; 807-a second hold-down assembly; 9-a first baffle; 10-a second baffle; 11-a heating device; 12-a pump set; 13-connecting the pipeline; 14-a grating valve; 15-a cooling device; 16-a drive mechanism; 17-a transmission mechanism; 1701-connecting blocks; 18-a locking assembly; 19-a housing; 20-rotating the frame; 21-a first support frame; 22-a second support; 23-cabinet body.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. The components of the embodiments of the present application, as generally described and illustrated in the figures herein, could be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present application, presented in the accompanying drawings, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present application without making any creative effort, shall fall within the protection scope of the present application.

In the description of the embodiments of the present application, it should be noted that the terms "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, or orientations or positional relationships that are conventionally placed when the products of the present invention are used, and are only used for convenience of description and simplification of the description, but do not indicate or imply that the devices or elements indicated must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.

Furthermore, the terms "horizontal", "vertical" and the like do not imply that the components are required to be absolutely horizontal or pendant, but rather may be slightly inclined. For example, "horizontal" merely means that the direction is more horizontal than "vertical" and does not mean that the structure must be perfectly horizontal, but may be slightly inclined.

In the description of the embodiments of the present application, it should also be noted that, unless otherwise explicitly stated or limited, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.

As used herein, the term "and/or" includes any one of the associated listed items and any combination of any two or more of the items.

For ease of description, spatial relationship terms such as "above 8230 \8230; above", "upper", "above 8230 \8230; below" and "lower" may be used herein to describe the relationship of one element to another element as shown in the figures. Such spatial relationship terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures.

The terminology used herein is for the purpose of describing various examples only and is not intended to be limiting of the disclosure. The singular forms also are intended to include the plural forms as well, unless the context clearly indicates otherwise. The terms "comprises," "comprising," and "having" specify the presence of stated features, quantities, operations, elements, components, and/or combinations thereof, but do not preclude the presence or addition of one or more other features, quantities, operations, components, elements, and/or combinations thereof.

Variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, may be expected. Thus, examples described herein are not limited to the particular shapes shown in the drawings, but include changes in shape that occur during manufacturing.

The features of the examples described herein may be combined in various ways that will be apparent after understanding the disclosure of the present application. Further, while the examples described herein have a variety of configurations, other configurations are possible, as will be apparent after understanding the disclosure of the present application. In addition, technical solutions between various embodiments may be combined with each other, but must be realized by a person skilled in the art, and when the technical solutions are contradictory or cannot be realized, such a combination should not be considered to exist, and is not within the protection scope of the present application.

As shown in fig. 1-4, the utility model provides a vacuum coating system, which comprises a vacuum coating chamber 1 and an etching device; the etching device comprises a first etching mechanism and a second etching mechanism which are oppositely arranged in the vacuum coating chamber 1, wherein the first etching mechanism comprises a first etching component 2 and a first anode 3, and the second etching mechanism comprises a second etching component 4 and a second anode 5; the first etching component 2 is connected with the side wall of the vacuum coating chamber 1, and the first anode 3 is arranged in the vacuum coating chamber 1 and positioned at the front end of the first etching component 2 to form a horizontal etching area; the second etching component 4 is connected with the top wall of the vacuum coating chamber 1, and the second anode 5 is connected with the bottom wall of the vacuum coating chamber 1 and is arranged opposite to the second etching component 4 to form a vertical etching area.

Compared with the prior art, the utility model provides a vacuum coating room 1 has following advantage:

the utility model provides a vacuum coating chamber 1 through relative first sculpture mechanism and the second sculpture mechanism that sets up in vacuum coating chamber 1, can form stable even sculpture region. Because the first etching mechanism in this application includes first sculpture subassembly 2 and first positive pole 3, and first sculpture subassembly 2 is connected with the lateral wall of vacuum coating room 1 in this application, and first positive pole 3 sets up in the front end of first sculpture subassembly 2, consequently, when carrying out the sculpture operation, the ion that first sculpture subassembly 2 sent moves to first positive pole 3 under the effect of first positive pole 3 to can form horizontal sculpture region. When the workpiece passes through the horizontal etching area, ions bombard the surface of the workpiece to realize the etching of the workpiece. Because the first etching mechanism only forms the horizontal etching area, the etching operation of the middle end area of the large workpiece except two ends can be only covered and finished through the first etching mechanism.

And this application further sets up the second sculpture mechanism in the opposite of first sculpture mechanism, and the second sculpture mechanism includes second sculpture subassembly 4 and second positive pole 5, and second sculpture subassembly 4 is connected with the roof of vacuum coating room 1, and second positive pole 5 is connected with the diapire of vacuum coating room 1, and when carrying out the start-up of second sculpture mechanism and carry out the sculpture operation, the ion of second sculpture subassembly 4 removes to second positive pole 5 under the influence of second positive pole 5 to can form vertical sculpture region, when the work piece passes through vertical sculpture region, can carry out the sculpture to the work piece, especially can realize carrying out the sculpture operation to the region at the both ends of great work piece.

Optionally, the first etching assembly 2 provided herein comprises a fixed magnetic field member, a movable magnetic field member, an adjustment member 805, a first target holder and a first target; the first target holder is connected with the side wall of the vacuum coating chamber 1, the fixed magnetic field component is connected with one side of the first target holder, which is positioned outside the vacuum coating chamber 1, the first target is connected with one side of the first target holder, which is positioned inside the vacuum coating chamber 1, and the movable magnetic field component is arranged inside the first target holder and is movably connected with the fixed magnetic field component; the adjustment member 805 is connected with the movable magnetic field member to adjust the position of the movable magnetic field member.

This application can form stable magnetic field through the fixed magnetic field component and the activity magnetic field component that set up in first target seat, in order to make the ion in the first target move to the direction of first positive pole 3 when the operation, and because the structure of transferring in this application is connected with the activity magnetic field component, therefore, through the regulation of transferring the structure to the activity magnetic field component, can change the position of the relative fixed magnetic field component of activity magnetic field component and the position apart from first target, thereby can change the intensity in magnetic field, and then can adjust the magnetic field size according to the sculpture demand, improve the etching effect, and finally improve the coating film effect.

It should be noted that the first etching module 2 is connected to one of the sidewalls of the chamber body 101, and the second etching module 4 is disposed on the top wall of the chamber body 101 and adjacent to the other sidewall. In addition, an air exhaust port is formed in the side wall, away from the first etching component 2, of the coating chamber main body 101 and used for being connected with a vacuumizing device so as to vacuumize the vacuum coating chamber 1.

It should be further added that the internal structure of the first etching assembly 2 provided by the present application is similar to the internal structure of the magnetron sputtering assembly, and the internal structure is provided with a fixed magnetic field, and the fixed magnetic field may be an electromagnetic coil, and by cooperation with an adjustable magnetic field, the function of precipitating ions of the first target is achieved. In order to ensure that a large horizontal etching area can be formed in the vacuum coating chamber 1, the number of the first etching assemblies 2 is at least two, and the first etching assemblies are arranged in the vertical direction. Correspondingly, the side wall of the film coating chamber main body 101 is provided with a corresponding number of mounting positions for mounting the first etching component 2.

Alternatively, as shown in fig. 5 in combination with fig. 6, the second etching assembly 4 in the present application includes a positioning member 401, a water cooling seat 402, an air inlet seat 403, a mounting shaft 404, a molybdenum tube 405, and a heating wire 406; the positioning component 401 is connected with the top wall of the vacuum coating chamber 1, the positioning component 401 and the water cooling seat 402 form a heating cavity 407, and one side of the water cooling seat 402 away from the positioning component 401 is provided with an electronic outlet 4021; one end of the mounting shaft 404 passes through the positioning member 401 along the vertical direction to enter the heating chamber 407 and is connected with one end of the molybdenum tube 405, and the other end of the molybdenum tube 405 is connected with a heating wire 406; the gas inlet seat 403 is connected to the positioning member 401 and is capable of filling gas into the heating chamber 407.

In the application, the water cooling seat 402 is connected with the top wall of the coating chamber main body 101 through the positioning member 401, and the heating cavity 407 formed between the water cooling seat 402 and the positioning member 401 is used, so that one end of the molybdenum tube 405 extends into the heating cavity 407 and is connected with the heating wire 406, and after the molybdenum tube 405 is electrified, the heating wire 406 can be electrified and heated, and then the gas introduced into the heating cavity 407 can be heated, and electrons can be released. The cooling flow channel formed between the water cooling seats 402 can enable cooling liquid to pass through, so that the whole second etching assembly 4 is cooled, the service life of the device is prolonged, and the running stability is improved.

It should be added here that the diameter of the electron outlet 4021 in this application is 8mm to 12mm, and the voltage of the high-voltage arc striking mechanism 6 is 8KV.

During specific operation, as shown in fig. 3 combined with fig. 4, the vacuum coating system provided by the utility model further comprises an arc striking mechanism 6, wherein the arc striking mechanism 6 is arranged on the top wall of the vacuum coating chamber 1 and extends into the vacuum coating chamber 1, and is opposite to the second etching component 4.

When the second etching mechanism is in operation, gas is firstly filled into the heating cavity 407 through the gas inlet seat 403, then the molybdenum pipe 405 is electrified, so that the heating wire 406 can be electrified, heat is generated after the heating wire 406 is electrified to heat the gas in the heating cavity 407 and release electrons, the content of the electrons in the heating cavity 407 continuously rises along with the continuous temperature rise of the heating wire 406, then the arc striking mechanism 6 is started, and the electrons in the heating cavity 407 are guided by the arc striking mechanism 6 to be discharged from the electron outlet 4021 and move towards the direction of the second anode 5, so that a vertical etching area can be formed.

Preferably, as shown in fig. 11, the arc striking mechanism 6 in the present application includes a fixed base 601 and an arc striking rod 602; the fixed base 601 is connected with the top wall of the vacuum coating chamber 1, and one end of the arc striking rod 602 penetrates through the fixed base 601 to enter the vacuum coating chamber 1 and form an extension part which extends towards the direction close to the electron outlet 4021.

The striking rod 602 in this application is L shape structure, and one end is connected with fixing base 601, and fixing base 601 is connected with vacuum coating room 1's roof, and the other end that is L shape striking rod 602 is located vacuum coating room 1 and extends to the direction that is close electron outlet 4021 to when striking mechanism 6 starts, can draw the electron in heating chamber 407, realize the function of striking. Moreover, the arc striking mechanism 6 in the present application is a high-voltage arc striking mechanism 6, and the purpose of leading out electrons is achieved by introducing high-voltage electricity into the arc striking mechanism 6.

It should be added that the mounting shaft 404 in the present application is a copper electrode, and as shown in fig. 6, the number of the copper electrodes in the present application is four, and each two copper electrodes are grouped into one group, and correspondingly, the number of the molybdenum tubes 405 connected to the copper electrodes is four, and the ends of the two molybdenum tubes 405 are connected to the heating wire 406, so that a loop can be formed, and the function of heating the heating wire 406 after being electrified can be realized. Since the number of the copper electrodes and the number of the molybdenum tubes 405 are four, the two heating wires 406 can be connected to each other, thereby increasing the electron generation speed to some extent.

As shown in fig. 3 and fig. 7, the vacuum coating system provided by the present invention further includes a magnetron sputtering device 8, the magnetron sputtering device 8 includes a first magnetron sputtering mechanism and a second magnetron sputtering mechanism, the first magnetron sputtering mechanism includes two first magnetron sputtering components 801 that are arranged oppositely, and the second magnetron sputtering mechanism includes two second magnetron sputtering components 802 that are arranged oppositely; the two first magnetron sputtering assemblies 801 comprise the same target material, the two second magnetron sputtering assemblies 802 comprise the same target material, and the target material of the first magnetron sputtering assembly 801 is different from that of the second magnetron sputtering assembly 802; the first magnetron sputtering component 801 and the second magnetron sputtering component 802 are both connected with the side wall of the vacuum coating chamber 1, and the first magnetron sputtering component 801 and the second magnetron sputtering component 802 are arranged at intervals.

The vacuum coating system provided by the application is mainly applied to the operation of DLC (diamond-like carbon), and the DLC has a better generation effect on the tungsten carbide film layer and better affinity between chromium and a metal matrix. Therefore, in the present application, it is preferable that the second target 8011 of the two opposing first magnetron sputtering assemblies 801 is a tungsten carbide target, and the third target 8021 of the two opposing second magnetron sputtering assemblies 802 is a chromium target.

The etching operation is to clean and roughen the surface of the metal matrix, and the cleaning and roughening is to strip off impurities in the surface of the metal matrix and roughen the outer surface of the metal matrix, so that the adhesion effect and speed of the film layer can be improved.

After the etching operation is completed, only the second magnetron sputtering component 802 is turned on, so that a chromium layer can be formed on the substrate. After the second magnetron sputtering component 802 works for a certain time, the first magnetron sputtering component 801 is started, and the tungsten carbide target and the chromium target work simultaneously, so that a mixed layer of tungsten carbide and chromium can be further formed on the chromium layer, and the mixed layer can protect the chromium layer formed on the substrate and provide a foundation for the subsequent formed tungsten carbide layer.

After the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802 operate simultaneously for a certain time to form a stable mixed layer, the second magnetron sputtering assembly 802 is closed, and only the first magnetron sputtering assembly 801 is kept operating, so that a tungsten carbide layer can be formed on the mixed layer, and a foundation is provided for forming DLC.

It can be understood that, as shown in fig. 7 and fig. 10, the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802 in the present application each include a second target holder 803 and a shield 804, the second target holder 803 is connected to a side wall of the vacuum coating chamber 1, the second target holder 803 and the shield 804 form a rectangular installation space, an open portion is formed on the shield 804, and the second target 8011 and the third target 8021 are disposed in the corresponding installation spaces.

Can provide stable installation space for second target 8011 and third target 8021 through second target seat 803, and in order to avoid the operation, the irregular diffusion of ion that second target 8011 and third target 8021 formed, consequently, this application can play the barrier effect to the ion to a certain extent through the shield cover 804 of establishing at second target seat 803 dustcoat, makes the ion of target only can remove to the direction of work piece, reduces the influence of coating in-process target ion to other structures.

It should be noted that, the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802 have the same structure except that the target material is different, and therefore, the target shown in fig. 10 in this application may be the second target 8011 or the third target 8021, and the material of the target may be selected according to a specific installation position.

Preferably, the second target 8011 and the third target 8021 in the present application both use rectangular targets, and accordingly, the second target 8011 in the present application also has a rectangular structure, so that a stable installation space can be provided for the second target 8011 and the third target 8021.

On this basis, in the present application, the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802 further include a first pressing assembly 806 and a second pressing assembly 807, the first pressing assembly 806 is circumferentially disposed along an outer side of the second target 8011 or the third target 8021, so that the second target 8011 or the third target 8021 can be stably connected to the second target holder 803, and the second pressing assembly 807 presses the second target 8011 or the third target 8021 at the middle position, so that the connection stability between the target and the second target holder 803 can be further improved.

Further, as shown in fig. 7, both the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802 in the present application include a magnetic field member, a first bearing groove 8031 and a second bearing groove 8032 are formed on the second target holder 803, the first bearing groove 8031 and the second bearing groove 8032 are independently arranged at intervals, and the magnetic field member is arranged in both the first bearing groove 8031 and the second bearing groove 8032; the magnetic field member includes a first magnet 8033, a second magnet 8034 and a carrying seat, the first magnet 8033 and the second magnet 8034 are disposed at two ends of the carrying seat, the second magnet 8034 in the first carrying groove 8031 is close to the second magnet 8034 in the second carrying groove 8032, and the first magnet 8033 in the first carrying groove 8031 is far away from the first magnet 8033 in the second carrying groove 8032.

In the application, a first magnet 8033 and a second magnet 8034 are arranged in both the first bearing groove 8031 and the second bearing groove 8032, and the second magnet 8034 in the first bearing groove 8031 and the second magnet 8034 in the second bearing groove 8032 are arranged close to each other, and the first magnet 8033 in the first bearing groove 8031 and the first magnet 8033 in the second bearing groove 8032 are arranged far from each other, so that a stable closed magnetic field can be formed by matching with a magnetic field mechanism in the magnetron sputtering device 8 at other positions in the coating equipment.

Since the magnetic poles of the first magnet 8033 and the second magnet 8034 are different in the present application, when the first magnet 8033 is an N pole, the second magnet 8034 is an S pole, accordingly, a magnetic field is generated between the first magnet 8033 and the second magnet 8034 in the first bearing groove 8031, a magnetic field is generated between the first magnet 8033 and the second magnet 8034 in the second bearing groove 8032, and a magnetic field is generated between the first magnet 8033 in the first bearing groove 8031 and the first magnet 8033 in the second bearing groove 8032 and the second magnet 8034 in the adjacent second target holder 803, so that a stable closed magnetic field can be formed in the vacuum coating chamber 1 by the magnet distribution manner, thereby increasing the plasma confinement capability of the magnetic field to a certain extent and improving the coating effect.

It can be understood that, as shown in fig. 7, in the present application, the first magnetron sputtering component 801 and the second magnetron sputtering component 802 further include an adjusting component, the adjusting component may include a screw rod, a threaded sleeve, a connecting rod, and a connecting seat, the first magnet 8033 and the second magnet 8034 in the first bearing groove 8031 and the second bearing groove 8032 are installed through the mounting seat, and the mounting seat is connected to one end of the connecting rod, the other end of the connecting rod is connected to the connecting seat, the connecting seat is connected to the screw rod through a structure such as a bearing, and the threaded sleeve is connected to the second target seat 803.

Optionally, as shown in fig. 7, the magnetron sputtering apparatus 8 further includes a baffle assembly disposed in one-to-one correspondence with the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802; the shutter assembly comprises a shutter member and a link member, the shutter being connected to the link member, the link member being rotatably connected to the second backing plate 803 so that the shutter member can open or close the open portion.

The baffle plate in the present application may be an integrated baffle plate, and the shield 804 may form a relatively closed accommodating space, so that when the corresponding second target 8011 or third target 8021 needs to be operated, the opening of the baffle plate is opened, thereby exposing the corresponding second target 8011 or third target 8021.

As is apparent from the above description, in the present application, it is necessary to form a primer layer of a chromium layer on a substrate, form a mixed layer of tungsten carbide and chromium on the primer layer, and finally form a tungsten carbide layer on the mixed layer. Therefore, when the priming layer is formed, the baffle component corresponding to the first magnetron sputtering component 801 is in a closed state, and the baffle component corresponding to the second magnetron sputtering component 802 is in an open state, so that chromium ions mainly exist in the vacuum coating chamber 1 to a certain extent, the quality of a formed chromium layer can be improved, and the mutual influence between the tungsten carbide target and the chromium target can be avoided.

When the mixed layer is formed, the baffle members corresponding to the first magnetron sputtering component 801 and the second magnetron sputtering component 802 are all opened, so that tungsten carbide ions and chromium ions can be released, and the purpose of forming the mixed layer on the priming layer is achieved.

After the mixed layer is formed, the baffle component corresponding to the second magnetron sputtering component 802 is closed, so that tungsten carbide ions mainly exist in the vacuum coating chamber 1 to a certain extent, the formation of a tungsten carbide layer is realized, and a foundation is provided for the formation of DLC.

Preferably, as shown in fig. 7, the baffle plate member in the present application includes a first baffle plate 9 and a second baffle plate 10, the connecting member includes a first connecting shaft and a second connecting shaft, the first connecting shaft is correspondingly connected with the first baffle plate 9, and the first connecting shaft is rotatably connected with one side of the second target holder 803, the second connecting shaft is correspondingly connected with the second baffle plate 10, and the second connecting shaft is rotatably connected with the other side of the second target holder 803; when the first baffle 9 and the second baffle 10 close the opening part, one side of the first baffle 9 far away from the first connecting shaft is abutted against one side of the second baffle 10 far away from the second connecting shaft, one side of the first baffle 9 far away from the first connecting shaft is provided with an extension part extending towards the direction close to the second baffle 10, and the extension part covers a part of the second baffle 10.

Because vacuum coating room 1 inner space is limited, need place revolving rack 20 when the operation, and revolving rack 20 main part constantly produces the rotation in vacuum coating room 1, the relative revolving rack 20 main part of peg that sets up on revolving rack 20 constantly produces the revolution, consequently, for avoiding the switching of baffle component to exert an influence to revolving rack 20, the baffle component in this application includes first baffle 9 and second baffle 10, and adopt the mode of opening, thereby can reduce the space that first baffle 9 and second baffle 10 occupy when opening to a certain extent, and then avoid the baffle component to produce the problem of influence to the rotation of revolving rack 20 to a certain extent.

It should be noted that, since impurities in the workpiece are washed out and exist in the vacuum coating chamber 1 during the etching stage, if a large amount of impurities adhere to the surfaces of the tungsten carbide target and the chromium target, the target material may be poisoned and failed.

Therefore, according to the present application, the first baffle 9 and the second baffle 10 correspondingly disposed on the opening portions of the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802 seal the opening portions through the first baffle 9 and the second baffle 10 in the etching stage, so that the problem of target failure caused by the attachment of impurities to the surface of the target can be avoided to a certain extent.

In addition, because the tungsten carbide target and the chromium target are still in a state of being opened simultaneously in the film coating stage, the mutual influence between the tungsten carbide target and the chromium target can be reduced through the selective opening and closing of the first baffle 9 and the second baffle 10, the service life of the target material is prolonged, and the film coating effect is improved.

It should be noted here that since the low bias voltage enables deposition of ions and the high bias voltage enables stripping of ions, when the amount of impurities adhering to the target is too large, the high bias voltage needs to be applied to deposit and strip the impurities on the target. In the stripping process, in order to prevent the stripped impurities from affecting other targets again, the stripped impurities can be retained in the closed accommodating space through the closing of the first baffle plate 9 and the second baffle plate 10, so that the influence on other targets is reduced.

Further preferably, as shown in fig. 7, the baffle plate assembly in the present application further includes a control element and a driving element, the control element is in communication connection with the driving element, the driving element is disposed in one-to-one correspondence with the first connecting shaft and the second connecting shaft, and the control element can control the driving element to drive the first connecting shaft and the second connecting shaft to rotate, so that the first baffle plate 9 and the second baffle plate 10 open or close the opening portion.

Because first baffle 9 and second baffle 10 all are located vacuum coating room 1, and can't open at coating film in-process vacuum coating room 1, consequently, can realize closing that the automation of first baffle 9 and second baffle 10 was opened through control and driving piece, improve the degree of automation of entire system.

Optionally, as shown in fig. 4, the vacuum coating system provided by the present invention further includes a heating device 11, the heating device 11 includes a first heating mechanism and a second heating mechanism, the first heating mechanism and the second heating mechanism are disposed oppositely, and are both connected to the sidewall of the vacuum coating chamber 1.

Through the first heating mechanism and the second heating mechanism which are arranged in the vacuum coating chamber 1 relatively, uniform heating space can be provided for the vacuum coating chamber 1, and therefore the stability of a coating process can be guaranteed.

Optionally, as shown in fig. 2 with fig. 3, the utility model provides a vacuum coating system still includes evacuating device, and evacuating device includes pump set 12, connecting line 13 and aperture control assembly, is formed with the extraction opening on the lateral wall of vacuum coating chamber 1, and pump set 12 is connected with the extraction opening through connecting line 13, and the aperture control assembly sets up in vacuum coating chamber 1 along vertical direction, and is located the front end of extraction opening for adjust the aperture of extraction opening.

It can be understood that, air pump group 12 in this application includes smart pumpingh subassembly and rough pumpingh subassembly, smart pumpingh subassembly and rough pumpingh all are connected with vacuum coating room 1 through the pipeline, and the extraction opening that forms on vacuum coating room 1's the lateral wall is smart pump opening, and smart pumpingh subassembly and smart pump opening lug connection in this application, it connects through connecting tube 13 to have saved the centre, thereby can improve the conductance to a certain extent, avoid because of connecting tube 13 turns too much and the less problem of the evacuation ability loss that leads to of connecting tube 13's diameter, and then improve evacuation efficiency.

It should be noted that, in the present application, the opening degree control component is the grating valve 14, and the grating valve 14 can control the opening degree of the fine pumping port, so that the waste of resources can be reduced to a certain extent.

It should be further added that, as shown in fig. 3, a heater 7 is further provided in the vacuum coating chamber 1 on the side of the raster valve 14 away from the fine exhaust port, and the heater 7 can preheat and maintain the temperature of the vacuum coating chamber 1, thereby ensuring the coating effect to a certain extent.

As shown in fig. 3, a rough pumping port 1011 is formed in the bottom wall of the vacuum coating chamber 1, the rough pumping port 1011 is connected to a dust-proof pipe 1012 extending toward the top wall of the vacuum coating chamber 1, and the connection pipeline 13 is connected to the pumping port and the rough pumping port 1011, respectively.

The rough pump in this application is connected with rough pump port 1011 through connecting tube 13, and because rough pump port 1011 in this application is located vacuum coating room 1's diapire, consequently, very easily make vacuum coating room 1 diapire deposit the dust get into rough pump port 1011 in the evacuation process to in getting into rough pump assembly via connecting tube 13, lead to the damage of pump package. This application sets up dustproof pipe 1012 through taking out mouthful 1011 roughly, and dustproof pipe 1012 extends along vertical direction to can increase and roughly take out mouthful 1011, and then can reduce the dust to a certain extent and get into the problem of roughly taking out mouthful 1011.

As shown in fig. 9, the vacuum coating chamber 1 provided by the present application is an octagonal structure, and includes a coating chamber main body 101, a first door body 102, and a second door body 103; the first door body 102 and the second door body 103 are rotatably connected with the film coating chamber main body 101.

Through setting up first door body 102 and second door body 103 to make first door body 102 and second door body 103 all rotate with coating film chamber main part 101 and be connected, thereby can form two open-door structures, and then can provide sufficient open space for the maintenance of equipment and maintenance, improve maintenance efficiency. Moreover, due to the double-door structure, when the first door 102 or the second door 103 on one side is limited by space and cannot be opened or closed freely, the first door 102 or the second door 103 on the other side can still provide conditions and a foundation for taking and delivering the rotating frame 20 and overhauling and maintaining equipment.

Preferably, as shown in fig. 1 to 4, the vacuum coating system provided by the present application includes a vacuum coating chamber 1 and a cabinet 23, a main controller, an electric control device and a water cooling device are mainly installed in the cabinet 23, and a vacuum-pumping device is installed in a space surrounded by the plurality of cabinets 23, so that the space utilization of the formed vacuum coating system is more reasonable, and the appearance structure of the whole apparatus is more regular. The outer shell 19 is arranged outside the vacuum coating chamber 1, and the cross section of the outer shell 19 corresponding to each side wall is of a semicircular structure, so that a stable installation space can be provided for the magnetron sputtering device 8 on the side wall, and the attractiveness of the whole system can be improved.

As shown in fig. 4 and fig. 9, the present application provides a compact and reasonable arrangement of the structures inside the vacuum coating chamber 1, wherein the coating chamber main body 101 includes two first side walls arranged oppositely, the first door body 102 includes three second side walls connected in sequence, and the second door body 103 includes three third side walls connected in sequence; one first magnetron sputtering assembly 801 and one second magnetron sputtering assembly 802 are connected with two second side walls of the first door body 102, and the other first magnetron sputtering assembly 801 and the other second magnetron sputtering assembly 802 are connected with two third side walls of the second door body 103, wherein the second side walls are arranged at intervals; the first heating mechanism is connected with a second side wall of the first door body 102, which is positioned between the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802, and the second heating mechanism is connected with a third side wall of the second door body 103, which is positioned between the first magnetron sputtering assembly 801 and the second magnetron sputtering assembly 802; the first etching component 2 is connected with one of the first side walls of the coating chamber main body 101, the air exhaust opening is formed in the other first side wall of the coating chamber main body 101, and the second etching component 4 is located at the front end of the air exhaust opening.

Optionally, as shown in fig. 4, the vacuum coating system provided by the present invention further includes a cooling device 15, wherein the cooling device 15 includes a water supply mechanism, a water return mechanism and a plurality of cooling pipelines; the water inlet ends of the cooling pipelines are connected with the water supply mechanism, and the water outlet ends of the cooling pipelines are connected with the water return mechanism; the plurality of cooling pipelines are distributed in the coating chamber main body 101, the first door body 102, the second door body 103, the etching device, the magnetron sputtering device 8 and the heating device 11.

Water supply mechanism in this application provides the cooling water for many cooling lines, and preferably, the cooling water that this application adopted is frozen water, because frozen water needs to carry out the refrigeration cooling before getting into the cooling line, and corresponding refrigerating plant has filter equipment to need not to filter once more when getting into the cooling line, and then can guarantee cooling device 15 and cooling line endless stability and life to a certain extent, avoid the problem of cooling line jam.

It can be understood that, water supply mechanism is responsible for including supplying water at least in this application, and supply water and be equipped with a plurality of delivery ports on being responsible for, and the cooling pipeline is connected with the delivery port one-to-one, the one end of cooling pipeline is connected with the delivery port, thereby can realize the inflow of cooling water, and the other end of cooling pipeline is connected with return water mechanism, therefore, return water mechanism that this application provided includes the return water at least and is responsible for, and the return water is responsible for and is equipped with a plurality of return water mouths, return water mouth and cooling pipeline one-to-one set up, thereby can form stable circulative cooling system, realize being whole equipment refrigerated function.

Specifically, as shown in fig. 8, the vacuum coating system provided by the present application further includes a rotating frame driving device, which includes a driving mechanism 16 and a transmission mechanism 17; the driving mechanism 16 is arranged outside the vacuum coating chamber 1, the output end of the driving mechanism 16 is connected with the transmission mechanism 17, and the output end of the transmission mechanism 17 penetrates through the bottom wall of the vacuum coating chamber 1 to enter the vacuum coating chamber 1.

In operation, the driving mechanism 16 drives the transmission mechanism 17 to rotate, and the rotating frame 20 is connected with the transmission mechanism 17, so that the rotating frame 20 can rotate. Preferably, the turret drive apparatus in the present application further includes a bias introducing mechanism by which a bias can be delivered to the turret 20, so that the work can be coated.

Preferably, the transmission mechanism 17 in the present application includes a connecting block 1701, and the connecting block 1701 has a docking slot formed thereon, the docking slot having a sword-like shape, and an end of the docking slot remote from the tip end penetrates through an edge of the connecting block 1701.

The docking slot is formed in a sword-like shape, and the side of the docking slot away from the tip end penetrates the edge of the connecting block 1701, thereby facilitating the entry of the driving shaft into the turret 20. It will be appreciated that the shape of the drive shaft on the turret 20 in the present application is adapted to the docking slot to enable more stable rotation of the turret 20.

In the process that the rotating frame 20 moves into the vacuum coating chamber 1, the driving shaft of the rotating frame 20 gradually enters the butt-joint groove and continues to move along the extension direction of the butt-joint groove until the front end of the driving shaft abuts against the tip end of the butt-joint groove. Since the docking grooves in the present application are formed in a sword-like shape, when the connecting block 1701 rotates the driving shaft of the rotating frame 20, two force-bearing surfaces can exist, so that the stability of the movement and the strength of the connecting block 1701 can be improved to some extent.

Further preferably, the both ends of drive mechanism 17 that this application provided still are equipped with locking assembly 18, and two locking assemblies 18 all include the location axle that can follow vertical direction reciprocating motion, and when needs were locked revolving rack 20, the location axle extended to can insert in the corresponding locating hole of revolving rack 20 bottom, and then realize the locking to revolving rack 20. Accordingly, when the rotating frame 20 needs to be unlocked, the positioning shaft is contracted, so that the rotating frame 20 is unlocked.

In the above scheme, as shown in fig. 2 and fig. 3, in the present application, the first support frame 21 is disposed at the bottom of the vacuum coating chamber 1, and the vacuum coating chamber 1 can be erected by the first support frame 21, so that a stable and sufficient installation space can be provided for the driving mechanism 16. And the position correspondence of air pump group 12 is equipped with second support frame 22 in this application, can provide stable bearing space for air pump group 12 through second support frame 22 to can prop up air pump group 12 off ground, thereby can shorten connecting line 13's size to a certain extent, and then can improve evacuation efficiency.

The above description is only for the preferred embodiment of the present invention, and should not be taken as limiting the invention, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A vacuum coating system is characterized by comprising a vacuum coating chamber and an etching device;

the etching device comprises a first etching mechanism and a second etching mechanism which are oppositely arranged in the vacuum coating chamber, the first etching mechanism comprises a first etching component and a first anode, and the second etching mechanism comprises a second etching component and a second anode;

the first etching component is connected with the side wall of the vacuum coating chamber, and the first anode is arranged in the vacuum coating chamber and positioned at the front end of the first etching component to form a horizontal etching area;

the second etching component is connected with the top wall of the vacuum coating chamber, and the second anode is connected with the bottom wall of the vacuum coating chamber and arranged opposite to the second etching component to form a vertical etching area.

2. The vacuum coating system of claim 1, wherein the first etching assembly comprises a fixed magnetic field member, a movable magnetic field member, an adjustment member, a first target holder, and a first target;

the first target holder is connected with the side wall of the vacuum coating chamber, the fixed magnetic field component is connected with one side of the first target holder, which is positioned outside the vacuum coating chamber, the first target is connected with one side of the first target holder, which is positioned inside the vacuum coating chamber, and the movable magnetic field component is arranged in the first target holder and is movably connected with the fixed magnetic field component;

the adjustment member is connected with the movable magnetic field member to adjust a position of the movable magnetic field member.

3. The vacuum coating system according to claim 1, wherein the second etching assembly comprises a positioning member, a water cooling seat, an air inlet seat, a mounting shaft, a molybdenum pipe and a heating wire;

the positioning component is connected with the top wall of the vacuum coating chamber, the positioning component and the water-cooling seat form a heating cavity, and an electron outlet is formed in one side of the water-cooling seat, which is far away from the positioning component;

one end of the mounting shaft penetrates through the positioning component along the vertical direction to enter the heating cavity and is connected with one end of the molybdenum pipe, and the other end of the molybdenum pipe is connected with a heating wire;

the air inlet seat is connected with the positioning component and can be used for filling air into the heating cavity.

4. The vacuum coating system of claim 3, further comprising an arc ignition mechanism disposed in a top wall of the vacuum coating chamber and extending into the vacuum coating chamber opposite the second etching assembly.

5. The vacuum coating system according to claim 4, wherein the arc striking mechanism comprises a fixed base and an arc striking rod;

the fixed seat is connected with the top wall of the vacuum coating chamber, one end of the arc striking rod penetrates through the fixed seat to enter the vacuum coating chamber, an extending part is formed, and the extending part extends towards the direction close to the electron outlet.

6. The vacuum coating system according to claim 1, further comprising a magnetron sputtering apparatus comprising a first magnetron sputtering mechanism and a second magnetron sputtering mechanism, wherein the first magnetron sputtering mechanism comprises two oppositely disposed first magnetron sputtering components, and the second magnetron sputtering mechanism comprises two oppositely disposed second magnetron sputtering components;

the target materials of the two first magnetron sputtering assemblies are the same, the target materials of the two second magnetron sputtering assemblies are the same, and the target materials of the first magnetron sputtering assemblies are different from the target materials of the second magnetron sputtering assemblies;

the first magnetron sputtering component and the second magnetron sputtering component are connected with the side wall of the vacuum coating chamber, and the first magnetron sputtering component and the second magnetron sputtering component are arranged at intervals.

7. The vacuum coating system of claim 6, wherein the first magnetron sputtering assembly and the second magnetron sputtering assembly each comprise a second target holder and a shield, and the first magnetron sputtering assembly further comprises a second target, and the second magnetron sputtering assembly further comprises a third target;

the second target holder is connected with the side wall of the vacuum coating chamber, a rectangular mounting space is formed by the second target holder and the shielding cover, an open part is formed on the shielding cover, and the second target and the third target are arranged in the corresponding mounting space;

the second target is made of tungsten carbide, and the third target is made of chromium.

8. The vacuum coating system according to claim 7, wherein the first magnetron sputtering assembly and the second magnetron sputtering assembly each comprise a magnetic field member, the second target holder is formed with a first bearing groove and a second bearing groove, the first bearing groove and the second bearing groove are independently spaced apart, and the magnetic field member is disposed in each of the first bearing groove and the second bearing groove;

the magnetic field component comprises a first magnet, a second magnet and a bearing seat, wherein the first magnet, the second magnet and the bearing seat are different in magnetic pole, the first magnet and the second magnet are arranged at two ends of the bearing seat, the second magnet in the first bearing groove is close to the second magnet in the second bearing groove, and the first magnet in the first bearing groove is far away from the first magnet in the second bearing groove.

9. The vacuum coating system according to claim 7, wherein the magnetron sputtering apparatus further comprises baffle plate assemblies disposed in one-to-one correspondence with the first magnetron sputtering assembly and the second magnetron sputtering assembly;

the baffle plate assembly comprises a baffle plate component and a connecting component, wherein the baffle plate is connected with the connecting component, and the connecting component is rotatably connected with the second target holder, so that the baffle plate component can open or close the opening part.

10. The vacuum plating system according to claim 9, wherein the baffle plate member comprises a first baffle plate and a second baffle plate, the connecting member comprises a first connecting shaft and a second connecting shaft, the first connecting shaft is correspondingly connected with the first baffle plate, the first connecting shaft is rotatably connected with one side of the second target holder, the second connecting shaft is correspondingly connected with the second baffle plate, and the second connecting shaft is rotatably connected with the other side of the second target holder;

when the first baffle and the second baffle close the opening part, one side of the first baffle, which is far away from the first connecting shaft, is abutted against one side of the second baffle, which is far away from the second connecting shaft, and one side of the first baffle, which is far away from the first connecting shaft, is provided with an extension part extending towards the direction close to the second baffle, and the extension part covers part of the second baffle.

11. The vacuum coating system according to claim 10, wherein the baffle assembly further comprises a control member and a driving member, the control member is in communication connection with the driving member, the driving member is disposed in one-to-one correspondence with the first connecting shaft and the second connecting shaft, and the control member can control the driving member to drive the first connecting shaft and the second connecting shaft to rotate, so that the first baffle and the second baffle open or close the open portion.

12. The vacuum coating system according to claim 6, further comprising a heating device, wherein the heating device comprises a first heating mechanism and a second heating mechanism, and the first heating mechanism and the second heating mechanism are arranged oppositely and are connected with the side wall of the vacuum coating chamber.

13. The vacuum coating system according to claim 12, further comprising a vacuum pumping device, wherein the vacuum pumping device comprises a pumping pump set, a connecting pipeline and an opening control assembly, a pumping hole is formed in a side wall of the vacuum coating chamber, the pumping pump set is connected with the pumping hole through the connecting pipeline, and the opening control assembly is vertically arranged in the vacuum coating chamber and located at the front end of the pumping hole for adjusting the opening of the pumping hole.

14. The vacuum coating system according to claim 13, wherein a rough pumping port is formed in a bottom wall of the vacuum coating chamber, the rough pumping port is connected to a dustproof pipe extending toward a top wall of the vacuum coating chamber, and the connection pipeline is connected to the pumping port and the rough pumping port, respectively.

15. The vacuum coating system according to claim 14, wherein the vacuum coating chamber is an octagonal structure and comprises a coating chamber main body, a first door body and a second door body;

the first door body and the second door body are rotatably connected with the coating chamber main body.

16. The vacuum coating system according to claim 15, wherein the coating chamber body comprises two oppositely disposed first side walls, the first door body comprises three second side walls connected in series, and the second door body comprises three third side walls connected in series;

one of the first magnetron sputtering assemblies and one of the second magnetron sputtering assemblies are connected with two second side walls of the first door body which are arranged at intervals, and the other one of the first magnetron sputtering assemblies and the other one of the second magnetron sputtering assemblies are connected with two third side walls of the second door body which are arranged at intervals;

the first heating mechanism is connected with a second side wall of the first door body, which is positioned between the first magnetron sputtering component and the second magnetron sputtering component, and the second heating mechanism is connected with a third side wall of the second door body, which is positioned between the first magnetron sputtering component and the second magnetron sputtering component;

the first etching component is connected with one first side wall of the coating chamber main body, the air exhaust opening is formed in the other first side wall of the coating chamber main body, and the second etching component is located at the front end of the air exhaust opening.

17. The vacuum coating system according to claim 16, further comprising a cooling device, wherein the cooling device comprises a water supply mechanism, a water return mechanism and a plurality of cooling pipelines;

the water inlet ends of the cooling pipelines are connected with the water supply mechanism, and the water outlet ends of the cooling pipelines are connected with the water return mechanism;

the plurality of cooling pipelines are distributed in the coating chamber main body, the first door body, the second door body, the etching device, the magnetron sputtering device and the heating device.

18. The vacuum coating system according to claim 1, wherein the turret drive device comprises a drive mechanism and a transmission mechanism;

the driving mechanism is arranged outside the vacuum coating chamber, the output end of the driving mechanism is connected with the transmission mechanism, and the output end of the transmission mechanism penetrates through the bottom wall of the vacuum coating chamber to enter the vacuum coating chamber.

19. The vacuum coating system according to claim 18, wherein the transmission mechanism comprises a connecting block, the connecting block is provided with a butt-joint groove, the butt-joint groove is sword-shaped, and one end of the butt-joint groove far away from the tip end penetrates through the edge of the connecting block.