CN213086094U - Magnetron sputtering rotating cathode - Google Patents
Magnetron sputtering rotating cathode Download PDFInfo
- Publication number
- CN213086094U CN213086094U CN202021898898.6U CN202021898898U CN213086094U CN 213086094 U CN213086094 U CN 213086094U CN 202021898898 U CN202021898898 U CN 202021898898U CN 213086094 U CN213086094 U CN 213086094U
- Authority
- CN
- China
- Prior art keywords
- pipe
- target
- magnetron sputtering
- rotating cathode
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a magnetron sputtering rotating cathode, including mount pad, external pipe, inner union coupling and fixing base, external pipe one end and mount pad swivelling joint, the other end is through a target pipe and fixing base swivelling joint, inner union coupling one end is fixed on the mount pad, and the other end is connected with the fixing base through a core pipe, the fixing base be the dome form, its flap edge is provided with the round mounting groove, the mounting groove is inserted to the target pipe plug-in, the bottom of fixing base is provided with a ring channel, be provided with spiral helicine guiding gutter on the inner wall of target pipe. The utility model has the advantages that with the cooling water flow way the department of turning to, core pipe, target pipe and fixing base three junction promptly, design into the bent way of scattering form, make things convenient for the flow of cooling water for the difficult overstock of cooling water, this department can not have too big water pressure, and the helicla flute on the target pipe when rotatory, produces certain negative pressure, siphons away the cooling water of connection structure department, has further reduced the water pressure of junction.
Description
Technical Field
The utility model relates to a vacuum coating field, concretely relates to magnetron sputtering rotating cathode.
Background
Vacuum coating is an important aspect in the field of vacuum application, and provides a new process for preparing a film for scientific research and practical production by using a physical or chemical method based on a vacuum technology and absorbing a series of new technologies such as electron beams, molecular beams, ion beams, plasma beams, radio frequency, magnetic control and the like. Briefly, a method of evaporating or sputtering a metal, an alloy or a compound in a vacuum to solidify and deposit it on an object to be coated (referred to as a substrate, a substrate or a base) is called vacuum coating.
The physical vapor deposition technique is a method of directly depositing a plating material on the surface of a substrate by gasifying the plating material into atoms or molecules or ionizing the atoms or molecules into ions by various physical methods under a vacuum condition. The hard reaction film is prepared by physical vapor deposition method, which utilizes some physical process, such as thermal evaporation of material or sputtering of material surface atoms when being bombarded by ions, to realize the controllable transfer process of material atoms from source material to film. The physical vapor deposition technology has the advantages of good film/substrate binding force, uniform and compact film, good controllability of film thickness, wide application of target materials, wide sputtering range, capability of depositing thick films, capability of preparing alloy films with stable components, good repeatability and the like. Meanwhile, the physical vapor deposition technology can be used as a final treatment process for high-speed steel and hard alloy film cutters because the process treatment temperature can be controlled below 500 ℃. The cutting performance of the cutter can be greatly improved by adopting a physical vapor deposition process, so that the application field of the cutter is expanded while high-performance and high-reliability equipment is competitively developed, and the application of the cutter is more deeply researched especially in high-speed steel, hard alloy and ceramic cutters.
In recent years, the vacuum coating technology of the rotary cathode has been developed greatly, because the utilization rate of the target material is greatly improved compared with that of the planar cathode, but the cooling water in the rotary cathode flows into the target tube through the core tube, and the core tube and the target tube are in a sleeved connection, the direction of the water flow is reversed at one end, and the connection joint at the end is under a large pressure, which may cause damage, fracture and the like.
SUMMERY OF THE UTILITY MODEL
It is an object of the present invention to solve at least the above problems and to provide at least the advantages which will be described later.
An object of the utility model is to provide a magnetron sputtering rotating cathode, for solving the cooling water runner of current rotating cathode, change the department at the direction and bear too big pressure, appear this damaged problem of department easily.
In order to realize the objects and other advantages according to the present invention, there is provided a magnetron sputtering rotating cathode, including a mounting seat, an external tube, an internal tube and a fixing seat, wherein one end of the external tube is rotatably connected to the mounting seat, the other end of the external tube is rotatably connected to the fixing seat through a target tube, one end of the internal tube is fixed to the mounting seat, the other end of the internal tube is connected to the fixing seat through a core tube, the internal tube is located in the external tube, the core tube is located in the target tube, the internal tube is connected to the core tube, a gap is left between the internal tube and the external tube, a gap is left between the core tube and the target tube, the mounting seat is provided with a water inlet tube and a water outlet tube, the water inlet tube is connected to the internal tube, the water outlet tube is connected to the external tube, the core tube is;
the fixing base be the dome form, its gaikou is provided with the round mounting groove along the edge, the mounting groove is inserted into to the target pipe promptly, the bottom of fixing base is provided with an annular groove, the cross section of annular groove is semi-circular, and the inner ring of annular groove is just to the center pin of core pipe, be provided with spiral helicine guiding gutter on the inner wall of target pipe.
In one possible design, a drain pipe is arranged on the fixed seat and communicated to the lowest level position in the target pipe.
In one possible design, the water dividing sleeve is provided with a plurality of water through holes which form a ring shape, and the diameter of the outer ring of the ring shape is consistent with that of the outer ring of the ring-shaped groove.
In one possible design, a side air pipe is arranged on the pipeline of the water inlet pipe, and the side air pipe is communicated with the external air through an air pump.
In one possible design, the side gas pipe is covered with a heater, and the heater is an electric resistance heater.
In a possible design, a motor is fixed on the mounting seat, the motor is connected with a gear, a circle of racks is arranged on the outer connecting pipe corresponding to the gear, the gear is meshed with the racks, and the motor drives the outer connecting pipe to rotate so as to drive the target pipe to rotate.
In one possible design, an electric brush is further arranged on the mounting seat, and the electric brush is attached to the rack.
In one possible design, an insulating layer is arranged between the crankshaft of the motor and the gear.
The utility model discloses at least, include following beneficial effect: (1) the turning part of the cooling water flow channel, namely the joint of the core tube, the target tube and the fixed seat, is designed into a scattered curved channel, so that the cooling water can flow conveniently, the cooling water is not easy to accumulate, excessive water pressure cannot exist at the position, the connecting structure at the position is protected, and the spiral groove on the target tube generates certain negative pressure during rotation to suck the cooling water at the connecting structure, so that the water pressure at the connecting position is further reduced;
(2) a drain pipe is designed at the fixed seat, and the lowest level of the drain pipe is lower than that of the target pipe, so that cooling water in the target pipe can be basically drained;
(3) the inner wall of the target pipe is provided with a spiral water guiding groove, when the target pipe works, the cooling water is pushed to the outer connecting pipe by the forward rotation, when the water needs to be drained, the drain pipe is opened, the target pipe is reversed, the target pipe pushes the cooling water to the drain pipe, and the water guiding groove can ensure that the cooling water is drained completely;
(4) an air inlet pipe is arranged at the position of the water inlet pipe, air is introduced into the water channel through an air pump, hot air is adopted as the air, and the target tube and the core tube are dried.
Additional advantages, objects, and features of the invention will be set forth in part in the description which follows and in part will become apparent to those having ordinary skill in the art upon examination of the following or may be learned from practice of the invention.
Drawings
Fig. 1 is a cross-sectional view of the present invention;
FIG. 2 is an enlarged view of the direction A in FIG. 1;
FIG. 3 is a sectional view taken along line B-B of FIG. 1;
FIG. 4 is a cross-sectional view taken along line C-C of FIG. 1;
FIG. 5 is an enlarged view of the direction D in FIG. 1;
FIG. 6 is a partially sectional structural view of the fixing base;
fig. 7 is a schematic view showing the structure of the water guide groove in the core pipe.
Detailed Description
The invention will be further described with reference to the accompanying drawings and specific embodiments. It should be noted that the description of the embodiments is provided to help understanding of the present invention, but the present invention is not limited to the description. Specific structural and functional details disclosed herein are merely illustrative of example embodiments of the invention. The present invention may, however, be embodied in many alternate forms and should not be construed as limited to the embodiments set forth herein.
It is to be noted that the experimental methods described in the following embodiments are all conventional methods unless otherwise specified, and the reagents and materials, if not otherwise specified, are commercially available; in the description of the present invention, the terms "lateral", "longitudinal", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
Referring to fig. 1-7, a magnetron sputtering rotating cathode is provided, which comprises a mounting seat 100, an external pipe 200, an internal pipe 300 and a fixing seat 400, wherein one end of the external pipe 200 is rotatably connected with the mounting seat 100, the other end of the external pipe is rotatably connected with the fixing seat 400 through a target pipe 500, one end of the internal pipe 300 is fixed on the mounting seat 100, the other end of the internal pipe 300 is connected with the fixing seat 400 through a core pipe 600, the internal pipe 300 is positioned in the external pipe 200, the core pipe 600 is positioned in the target pipe 500, the internal pipe 300 is communicated with the core pipe 600, a gap is left between the internal pipe 300 and the external pipe 200, a gap is left between the core pipe 600 and the target pipe 500, the mounting seat 100 is provided with a water inlet pipe 101 and a water outlet pipe 102, the water inlet pipe 101 is communicated with the internal pipe 300, the water outlet pipe 102 is communicated with the external pipe 200, the core pipe 600 is mounted, a gap is reserved between the pipe orifice of the core pipe 600 and the fixed seat 400;
the fixing seat 400 is in a round cap shape, a circle of mounting groove 402 is arranged on the edge 401 of the cover opening, the target tube 500 is inserted into the mounting groove 402, an annular groove 403 is arranged at the bottom of the fixing seat 400, the cross section of the annular groove 403 is semicircular, the inner ring of the annular groove 403 is right aligned to the central shaft of the core tube 600, and a spiral water guide groove 501 is arranged on the inner wall of the target tube 500.
Referring to fig. 3-7, the rotary cathode is a mature structure, and the improvement of the device mainly lies in the flow channel of the cooling water therein, the cooling water enters the device from the water inlet pipe 101, first enters the inner connecting pipe 300, then enters the core pipe 600, turns at the joint of the core pipe 600, the fixing seat 400 and the target pipe 500, enters the target pipe 500, then enters the outer connecting pipe 200, and finally flows out through the water outlet pipe 102, the temperature of the water flowing out from the water outlet pipe 102 is higher when the water enters the water inlet pipe 101, so the water enters a cooling device, generally a condenser pipe, for reducing the temperature of the cooling water, and then flows into the water inlet pipe 101 to form a circulation.
The direction of water flow at the joint of the core tube 600, the fixing seat 400 and the target tube 500 is changed greatly, the direction is changed from right to left, and the directions are completely opposite, so that the pressure applied to the joint is very large, and the joint often has problems.
Set up a helicla flute 501 on the inner wall of target pipe 500, when target pipe 500 was rotatory, form the negative pressure in the helicla flute 501 rotation, direction of rotation is in good time for to core pipe 600, fixing base 400 and the junction of target pipe 500 three production negative pressure, take away the cooling water of three junction, greatly reduced the water pressure of this department.
As shown in fig. 2, a motor 103 is fixed on the mounting seat 100, the motor 103 is connected with a gear 104, a circle of racks 201 is arranged on the external connection pipe 200 corresponding to the gear 104, the gear 104 is meshed with the racks 201, and the motor 103 drives the external connection pipe 200 to rotate, thereby driving the target pipe 500 to rotate.
The mounting base 100 is further provided with a brush 105, and the brush 105 is attached to the rack 201.
An insulating layer is arranged between the crankshaft of the motor 103 and the gear 104, so that the motor 103 is prevented from being influenced by negative high voltage.
Typically, a magnet 601 is disposed outside the core tube 600 to provide a magnetic field for the device.
The working principle of the rotary cathode is the prior art, namely, the motor 103 drives the external connection tube 200 to rotate to drive the target tube 500 to rotate, the target tube 500 wraps the target material, the target material also rotates, then the electric brush 105 is electrified with high negative voltage to enable the target tube 500 to form a cathode, the external substrate is grounded, vacuum is formed between the substrate and the target material, argon gas is introduced, electrons excited by the cathode accelerate to fly to the substrate under the action of an electric field to impact argon atoms, the argon ions are ionized to generate argon ions, the argon ions bombard the target material at a flying speed under the action of the electric field to sputter a large number of target material atoms, and the target material atoms are deposited on the substrate, namely, a coating film is formed. Because it is the prior art, we do not describe it.
As shown in fig. 5 and 6, a drain pipe 404 is provided on the fixing base 400, and the drain pipe 404 is connected to the lowest level position in the target pipe 500. The lowest level in the pipe of the drain pipe 404 is located at the lowest position in the target pipe 500, the pipe of the drain pipe 404 is annular, the annular is vertical, and the lowest position in the pipe of the drain pipe 404 is the annular lowest position. The target tube 500 is also annular, which is vertical, and the lowest part of the annular is the lowest part in the target tube 500, because the water flows to the lower part, the cooling water in the target tube 500 will be discharged through the drain pipe 404. And the cooling water in the target pipe 500 is completely discharged due to the function of the water guide groove 501.
As shown in FIG. 3, the water dividing sleeve is provided with a plurality of water through holes to form a ring shape, and the diameter of the outer ring of the ring shape is consistent with that of the outer ring of the ring-shaped groove. So that the water directly enters the target tube 500 through the water holes after passing through the curved path.
Referring to fig. 1, a side air pipe 106 is disposed on the pipeline of the water inlet pipe 101, and the side air pipe 106 is connected to the outside air through an air pump 107. The side air pipe 106 is coated with a heater 108, the heater 108 is a resistance heater, the heater 108 is a resistance wire, and the resistance wire is wound on the outer wall of the side air pipe 106 and is coated outside by using a heat insulation sleeve. After the device finishes water drainage, hot air is introduced to quickly take away residual cooling water on the inner connecting pipe 300, the core pipe 600, the target pipe 500 and the outer connecting pipe 200, so that a drying effect is achieved.
While the embodiments of the invention have been described above, it is not intended to be limited to the details shown, or described, but rather to cover all modifications, which would come within the scope of the appended claims, and all changes which come within the meaning and range of equivalency of the art are therefore intended to be embraced therein.
Claims (8)
1. The magnetron sputtering rotating cathode is characterized by comprising a mounting seat, an external connecting pipe, an internal connecting pipe and a fixing seat, wherein one end of the external connecting pipe is rotatably connected with the mounting seat, the other end of the external connecting pipe is rotatably connected with the fixing seat through a target pipe, one end of the internal connecting pipe is fixed on the mounting seat, the other end of the internal connecting pipe is connected with the fixing seat through a core pipe, the internal connecting pipe is positioned in the external connecting pipe, the core pipe is positioned in the target pipe, the internal connecting pipe is communicated with the core pipe, a gap is reserved between the internal connecting pipe and the external connecting pipe, a gap is reserved between the core pipe and the target pipe, a water inlet pipe and a water outlet pipe are arranged on the mounting seat, the water inlet pipe is communicated with the internal connecting pipe, the water outlet pipe is communicated with the;
the fixing base be the dome form, its flap edge is provided with the round mounting groove, the target pipe inserts the mounting groove, the bottom of fixing base is provided with an annular groove, the cross section of annular groove is semi-circular, and the inner ring of annular groove is just to the center pin of core pipe, be provided with spiral helicine guiding gutter on the inner wall of target pipe.
2. The magnetron sputtering rotating cathode as claimed in claim 1, wherein a drain pipe is provided on the holder, the drain pipe communicating to a lowest level in the target tube.
3. The magnetron sputtering rotating cathode as claimed in claim 1, wherein the water dividing sleeve has a plurality of water through holes forming a ring shape, and the diameter of the outer ring of the ring shape is identical to that of the outer ring of the ring shape.
4. The magnetron sputtering rotating cathode according to claim 1, wherein a side air pipe is provided on a pipeline of the water inlet pipe, and the side air pipe is communicated with outside air through an air pump.
5. The magnetron sputtering rotating cathode of claim 4 wherein said side gas tube is coated with a heater, said heater being a resistive heater.
6. The magnetron sputtering rotating cathode as claimed in claim 1, wherein a motor is fixed on the mounting base, the motor is connected with a gear, a circle of racks is arranged on the external connecting tube at positions corresponding to the gear, the gear is meshed with the racks, and the motor drives the external connecting tube to rotate, so as to drive the target tube to rotate.
7. The magnetron sputtering rotating cathode as claimed in claim 6, wherein the mounting base is further provided with a brush, and the brush is attached to the rack.
8. Magnetron sputtering rotating cathode according to claim 7, wherein an insulating layer is provided between the crankshaft of the motor and the gear.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021898898.6U CN213086094U (en) | 2020-09-03 | 2020-09-03 | Magnetron sputtering rotating cathode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021898898.6U CN213086094U (en) | 2020-09-03 | 2020-09-03 | Magnetron sputtering rotating cathode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213086094U true CN213086094U (en) | 2021-04-30 |
Family
ID=75633886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202021898898.6U Active CN213086094U (en) | 2020-09-03 | 2020-09-03 | Magnetron sputtering rotating cathode |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213086094U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115433913A (en) * | 2022-09-30 | 2022-12-06 | 江苏乐萌精密科技有限公司 | Rotary cathode water cooling system |
-
2020
- 2020-09-03 CN CN202021898898.6U patent/CN213086094U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115433913A (en) * | 2022-09-30 | 2022-12-06 | 江苏乐萌精密科技有限公司 | Rotary cathode water cooling system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW507496B (en) | Flexible circuits with static discharge protection and process for manufacture | |
| WO2007115253A2 (en) | Method for magnetron sputter deposition | |
| US5667650A (en) | High flow gas manifold for high rate, off-axis sputter deposition | |
| CN209602626U (en) | Disposable round-trip two-sided evaporating coating equipment reel system structure | |
| CN213086094U (en) | Magnetron sputtering rotating cathode | |
| CN105408514A (en) | Sputtering target with backside cooling grooves | |
| CN101855383B (en) | Sputtering apparatus and sputtering film forming method | |
| US20180127865A1 (en) | Nanoparticle Deposition Systems | |
| JP2014525516A5 (en) | ||
| CN101113516A (en) | Method for preparing nano composite diamond coating | |
| CN110055503B (en) | Magnetron sputtering coating system and method for preparing dysprosium/terbium coating | |
| CN104711527A (en) | Method for magnetron sputtering low-temperature preparation of TiN film | |
| CN109055901A (en) | A kind of device and technique improving hard coat and substrate binding force | |
| CN105714256A (en) | Method for low-temperature preparation of DLC film through magnetron sputtering | |
| EP2742539B1 (en) | Sputtering systems for liquid target materials | |
| CN208791743U (en) | It is a kind of conducive to cooling rotary target target pipe | |
| WO2008028355A1 (en) | Method for making surface antibacterial products utilizing physical vapor deposition technology | |
| TW200416293A (en) | Cooled deposition baffle in high density plasma semiconductor processing | |
| EP0535054A1 (en) | Metallizing apparatus | |
| CN215163066U (en) | Large-capacity crucible structure of vacuum evaporation machine | |
| JP2004244690A (en) | Sputter film-forming method, film-formed product, and electron-flow control device for sputtering apparatus | |
| CN112899627B (en) | Target mounting structure, magnetron sputtering equipment and magnetron sputtering method | |
| JP2019023351A (en) | Low-temperature electric arc ion plating coating | |
| CN209307480U (en) | A kind of hobboing cutter surface recombination coating apparatus that ionization level is high | |
| CN100432286C (en) | Multipair target thin film sputterying instrument |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |