CN217561746U - Anti-sputtering Faraday cylinder - Google Patents
Anti-sputtering Faraday cylinder Download PDFInfo
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- CN217561746U CN217561746U CN202221013121.6U CN202221013121U CN217561746U CN 217561746 U CN217561746 U CN 217561746U CN 202221013121 U CN202221013121 U CN 202221013121U CN 217561746 U CN217561746 U CN 217561746U
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Abstract
The utility model relates to an anti-sputtering Faraday cylinder, including bias voltage electrode, collecting electrode, diaphragm and a shielding section of thick bamboo. The bias electrode is formed in a cylindrical shape with both ends open, and a first flange extending outward is formed at the top of the bias electrode. The collecting electrode is formed into a cylinder shape, the top end of the collecting electrode is opened, the bottom end of the collecting electrode is closed, the diaphragm is in the cylinder shape, the diaphragm is sleeved on the outer side of the bias electrode, and the bias electrode is fixed on the inner wall of the diaphragm through the first flange. The bottom of a shielding section of thick bamboo is sealed, the shielding section of thick bamboo cover is established the outside of collecting electrode, collecting electrode passes through the second flange to be fixed the inner wall of a shielding section of thick bamboo, the bottom of a shielding section of thick bamboo with the bottom of collecting electrode separates. The bias electrode and the collecting electrode and the ground are insulated by vacuum, and only a small part of ceramic is far away from the beam current and the sputtering beam current path, so that the problem of ceramic pollution can be effectively solved.
Description
Technical Field
The utility model relates to a charged particle beam current measurement field especially relates to an anti-sputtering Faraday cylinder and preparation method thereof.
Background
The Faraday cage is a basic device for measuring the beam current intensity of charged particles, and aims to realize the beam current intensity measurement by intercepting charged ion beams and collecting charges of the charged ion beams.
The bias electrode and the collecting electrode of the existing faraday cage are insulated from each other and from the ground by insulating ceramics. The main problems of the technology are that the insulating ceramic is easily polluted by particle beams and sputtering beams generated by the particle beams, so that the insulating property between a bias electrode and a collecting electrode and the insulating property to the ground are reduced, the bias loading is difficult, meanwhile, the beam intensity measurement is inaccurate, and the faraday cup is a main bottleneck influencing the measurement precision.
SUMMERY OF THE UTILITY MODEL
In view of the above, it is an object of the present invention to provide a sputtering-proof faraday cage that does not require large-area insulating ceramics, and is vacuum-insulated between the bias electrode and the collecting electrode and between the bias electrode and the ground, and only a small portion of the ceramics is kept away from the beam itself and the path of the sputtering beam, thereby effectively solving the problem of ceramic contamination.
In order to achieve the purpose, the utility model adopts the following technical proposal:
an aspect of the utility model provides an anti-sputtering faraday cage, include:
the bias electrode is formed into a cylindrical shape with two open ends, and the top of the bias electrode is provided with a first flange extending outwards;
the collecting electrode is formed in a cylindrical shape, the top end of the collecting electrode is opened, the bottom end of the collecting electrode is closed, a second flange extending outwards is formed at the bottom of the collecting electrode, the collecting electrode is located right below the bias electrode, and a vacuum insulation layer is formed between the top end of the collecting electrode and the bottom end of the bias electrode in a spaced mode;
the diaphragm is cylindrical, the diaphragm is sleeved on the outer side of the bias electrode, and the bias electrode is fixed on the inner wall of the diaphragm through the first flange;
the bottom of a shielding section of thick bamboo is sealed, the shielding section of thick bamboo cover is established the outside of collecting the electrode, the collecting electrode passes through the second flange is fixed the inner wall of a shielding section of thick bamboo, the bottom of a shielding section of thick bamboo with the bottom of collecting the electrode separates.
Further, still include the support electrode, the support electrode is the tube-shape, the support electrode cover is established the outside of bias voltage electrode and collecting electrode, first flange with separate and fixed connection through first pottery between the top of support electrode, the second flange with separate and fixed connection through the second pottery between the bottom of support electrode, the top and the bottom of support electrode respectively fixed mounting in the inboard of diaphragm and shielding section of thick bamboo.
Furthermore, the first flange is connected with the top of the support electrode through a first screw, the first screw penetrates through the first flange, the first ceramic and the top of the support electrode to be fixedly connected, and the first ceramic and the vacuum insulation layer are staggered.
Furthermore, the second flange is connected with the bottom of the support electrode through a second screw, the second screw penetrates through the second flange, the second ceramic and the bottom of the support electrode to be fixedly connected, and the second ceramic and the vacuum insulation layer are staggered.
Furthermore, the bottom of the supporting electrode is fixedly connected with the shielding cylinder through a third bolt, the top of the supporting electrode is fixedly connected with the diaphragm through a fourth bolt, and the bottom of the shielding cylinder is separated from the bottom end of the collecting electrode.
Further, the top of the diaphragm is formed with a beam inflow perforation.
Further, the bias electrode and the collecting electrode are both made of oxygen-free copper materials.
Further, the supporting electrode, the diaphragm and the shielding cylinder are all made of stainless steel materials.
Further, the width between the vacuum insulation layers is 5mm, and the bottom end of the collecting electrode is 5mm away from the shielding cylinder.
The utility model discloses owing to take above technical scheme, it has following advantage:
the utility model forms a vacuum insulation layer between the bias electrode and the collecting electrode, and the insulation resistance value between the bias electrode and the collecting electrode is high-voltage 100M omega through vacuum insulation; the collecting electrode and the shielding cylinder are separated to form vacuum insulation, so that the insulation resistance value between the collecting electrode and the shielding cylinder is higher than 100M omega.
The whole device does not need large-area insulating ceramics, only a small part of ceramics is far away from the beam current and a sputtering beam flow path, the measurement precision of the Faraday cylinder can be improved, and the insulating ceramics do not need to be frequently replaced, so that the Faraday cylinder is more real and durable.
The utility model relates to a prevent sputtering Faraday cylinder device can use in the particle beam field of treating cancer for the beam debugging before the treatment begins. The Faraday cage device can be used as a fast and accurate beam modulation device due to easy operation, easy maintenance, good durability and accurate measurement.
Drawings
Various additional advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are only for purposes of illustrating the preferred embodiments and are not to be construed as limiting the invention. Like reference numerals refer to like parts throughout the drawings. In the drawings:
FIG. 1 is a schematic view of a sputtering resistant Faraday cage;
in the drawings, the reference numerals denote the following:
101-bias electrode, 102-collecting electrode, 103-support electrode, 104-diaphragm, 105-shielding cylinder, 201-first ceramic, 202-second ceramic, 301-first screw, 302-second screw, 303-third screw, 304-fourth screw.
Detailed Description
Exemplary embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. While exemplary embodiments of the present invention are shown in the drawings, it should be understood that the present invention may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.
An embodiment of the utility model provides a prevent sputtering Faraday section of thick bamboo, including bias voltage electrode, collection electrode, diaphragm and a shielding section of thick bamboo. The bias electrode is formed in a cylindrical shape with both ends open, and a first flange extending outward is formed at the top of the bias electrode. The collecting electrode is formed in a cylindrical shape, the top end of the collecting electrode is opened, the bottom end of the collecting electrode is closed, a second flange extending outwards is formed at the bottom of the collecting electrode, the collecting electrode is located right below the bias electrode, and a vacuum insulation layer is formed between the top end of the collecting electrode and the bottom end of the bias electrode in a spaced mode. The diaphragm is cylindrical, the diaphragm sleeve is arranged on the outer side of the bias electrode, and the bias electrode is fixed on the inner wall of the diaphragm through the first flange. The bottom of a shielding section of thick bamboo is sealed, the shielding section of thick bamboo cover is established the outside of collecting the electrode, the collecting electrode passes through the second flange is fixed the inner wall of a shielding section of thick bamboo, the bottom of a shielding section of thick bamboo with the bottom of collecting the electrode separates. The bias electrode and the collecting electrode and the ground are insulated by vacuum, and only a small part of ceramic is far away from the beam current and a sputtering beam flow path, so that the problem of ceramic pollution can be effectively solved.
Example 1
As shown in fig. 1, the anti-sputtering faraday cage provided in embodiment 1 of the present invention includes a bias electrode 101, a collecting electrode 102, a diaphragm 104 and a shielding cage 105, wherein the bias electrode 101 further suppresses secondary electrons by applying a bias voltage, so that the measured value of the current intensity is more accurate; the collecting electrode 102 is used for blocking and collecting all incident beam current and guiding charges out to data acquisition equipment; the diaphragm 104 is used for protecting the bias electrode 101 and preventing the beam current from directly bombarding the bias electrode 101; the shielding cylinder 105 is used for isolating the external complex electromagnetic environment and ensuring accurate measurement value and low noise. The bias electrode 101 is formed in a cylindrical shape with both ends open, and a first flange extending outward is formed at the top of the bias electrode 101. The front, the back, the left and the right of the first flange are respectively provided with a first threaded hole. The bias electrode 101 is preferably made of an oxygen-free copper material, and has an inner diameter of 60mm and an outer diameter of 80mm.
The collecting electrode 102 is formed in a cylindrical shape, the top end of the collecting electrode 102 is open, the bottom end of the collecting electrode 102 is closed, the bottom of the collecting electrode 102 is formed with a second flange extending outwards, the collecting electrode 102 is located right below the bias electrode 101, and when the collecting electrode 102 is installed, the top end of the collecting electrode 102 is spaced from the bottom end of the bias electrode 101 to form a vacuum insulation layer. The width of the vacuum insulation layer is preferably 5mm, the collecting electrode 102 is preferably made of an oxygen-free copper material, the inner diameter of the collecting electrode 102 is 60mm, and the outer diameter of the second flange is 80mm. And the front, the rear, the left and the right of the second flange are respectively provided with a second threaded hole.
The utility model discloses in pass through collecting electrode 101 the top with separate between biasing electrode 102's the bottom and form vacuum insulation layer, adopt vacuum insulation's mode, can reduce porcelainous use, avoid the pottery to be polluted by the sputtering, improve the measurement accuracy to the line.
The support electrode 103 is cylindrical, the support electrode 103 is sleeved outside the bias electrode 101 and the collecting electrode 102, the first flange is separated from the top of the support electrode 103 by a first ceramic 201 and is fixedly connected to the top, and the second flange is separated from the support electrode 103 by a second ceramic 202 and is fixedly connected to the top. The top and bottom of the support electrode 103 are respectively formed with a third flange and a fourth flange extending outwards, the support electrode 103 is preferably made of stainless steel material, the inner diameter of the support electrode 103 is 72mm, and the outer diameter of the third flange and the fourth flange is 80mm. The bias electrode 101 is fixedly connected with the third flange by a first screw 301 which sequentially passes through the first threaded hole and the first ceramic 201. The collecting electrode 102 sequentially penetrates through the second threaded hole through a second screw 302 to be fixedly connected with the second ceramic 202 and the fourth flange, meanwhile, the interval between the bottom of the bias electrode 101 and the top of the collecting electrode 102 is 5mm, a vacuum insulation layer is formed, the use of ceramic can be reduced by adopting a vacuum insulation mode, the pollution of the ceramic by sputtering is avoided, and the beam current measuring precision is improved.
The first flange, the third flange and the first ceramic 201 are not limited to being fixedly connected by screws, and may be bonded or connected by other methods known in the art.
The diaphragm 104 is cylindrical, the diaphragm 104 is sleeved on the outer side of the bias electrode 101, the top of the diaphragm 104 is provided with an entrance hole, the diaphragm 104 is preferably made of stainless steel materials, the inner diameter of the beam entrance hole is 50mm, and the inner diameter of the cylinder is 85mm. And a threaded hole is formed in the front, the rear, the left and the right of the side wall of the diaphragm 104.
The bottom end of the shielding cylinder 105 is closed, the shielding cylinder 105 is sleeved on the outer side of the collecting electrode 102, the collecting electrode 102 is fixed on the inner wall of the shielding cylinder 105 through the second flange, the bottom of the shielding cylinder 105 is separated from the bottom end of the collecting electrode 102, and the separation distance is 5mm. The shielding cylinder 102 is preferably made of stainless steel material, and the inner diameter of the cylinder is 85mm. The bottom of the supporting electrode 103 is fixedly connected with the shielding cylinder 102 through a third screw 303, the top of the supporting electrode 103 is fixedly connected with the diaphragm 104 through a fourth screw 304, and the bottom of the shielding cylinder 105 is spaced from the bottom end of the collecting electrode 102.
The bias electrode 101 and the collecting electrode 102 in the utility model are separated to form a vacuum insulation layer, and the insulation resistance value between the bias electrode 101 and the collecting electrode 102 is high voltage 100M omega through vacuum insulation; the collecting electrode 102 is separated from the shielding cylinder 105 to form vacuum insulation, so that the insulation resistance value between the collecting electrode and the shielding cylinder is higher than 100M omega.
The whole device does not need large-area insulating ceramics, only a small part of ceramics, and the ceramics are far away from the beam current and the sputtering beam current path, so that the measurement precision of the Faraday cylinder can be improved, the insulating ceramics do not need to be frequently replaced, and the Faraday cylinder is more real and durable.
The preparation method of the anti-sputtering Faraday cylinder comprises the following steps:
fixedly mounting the bias electrode 101 on the top of the support electrode 103 through the first ceramic 201 and a first screw;
fixedly mounting the collecting electrode 102 at the bottom of the supporting electrode 103 through the second ceramic 202 and a second screw, so that the biasing electrode 101 and the collecting electrode 102 are separated;
sleeving the shielding cylinder 105 outside the collecting electrode 102, and fixedly installing the shielding cylinder 105 at the bottom of the supporting electrode 103 through the third screw, so that the bottom end of the shielding cylinder 105 is separated from the bottom end of the collecting electrode 102;
the diaphragm 104 is sleeved outside the bias electrode 101 and is fixedly mounted on the top of the support electrode 103 through the fourth screw.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present invention in its corresponding aspects.
Claims (9)
1. An anti-sputtering faraday cup, comprising:
the bias electrode is formed into a cylindrical shape with two open ends, and the top of the bias electrode is provided with a first flange extending outwards;
the collecting electrode is formed in a cylindrical shape, the top end of the collecting electrode is opened, the bottom end of the collecting electrode is closed, a second flange extending outwards is formed at the bottom of the collecting electrode, the collecting electrode is located right below the bias electrode, and a vacuum insulation layer is formed between the top end of the collecting electrode and the bottom end of the bias electrode in a spaced mode;
the diaphragm is cylindrical, the outer side of the bias electrode is sleeved with the diaphragm, and the bias electrode is fixed on the inner wall of the diaphragm through the first flange;
the bottom of a shielding section of thick bamboo is sealed, the shielding section of thick bamboo cover is established the outside of collecting the electrode, the collecting electrode passes through the second flange is fixed the inner wall of a shielding section of thick bamboo, the bottom of a shielding section of thick bamboo with the bottom of collecting the electrode separates.
2. The anti-sputtering faraday cage as recited in claim 1, further comprising a cylindrical support electrode, wherein said support electrode is disposed outside said bias electrode and said collecting electrode, said first flange is separated from and fixedly connected to a top of said support electrode by a first ceramic, said second flange is separated from and fixedly connected to a bottom of said support electrode by a second ceramic, and said top and bottom of said support electrode are fixedly mounted inside said diaphragm and said shielding cage, respectively.
3. The anti-sputtering faraday cup as recited in claim 2, wherein said first flange is connected to a top portion of said support electrode by a first screw, said first screw passes through said first flange, said first ceramic is fixedly connected to a top portion of said support electrode, and said first ceramic is offset from said vacuum insulation layer.
4. The anti-sputtering faraday cage as claimed in claim 2, wherein said second flange is connected to a bottom of said supporting electrode by a second screw, said second screw passes through said second flange, said second ceramic is fixedly connected to a bottom of said supporting electrode, and said second ceramic is staggered from said vacuum insulation layer.
5. The anti-sputtering faraday cup as recited in claim 2, wherein a bottom portion of said supporting electrode is fixedly connected to said shielding can via a third bolt, and a top portion of said supporting electrode is fixedly connected to said aperture via a fourth bolt.
6. The anti-sputtering faraday cup as defined in claim 1, wherein a top portion of said aperture is formed with beam inflow perforations.
7. The anti-sputtering faraday cage of claim 1, wherein said biasing electrode and collecting electrode are both made of an oxygen free copper material.
8. The anti-sputtering faraday cage of claim 2, wherein the support electrode, the aperture and the shielding cage are all made of stainless steel material.
9. The anti-sputtering faraday cage of claim 1, wherein a width between said vacuum insulation layers is 5mm, and a bottom end of said collecting electrode is spaced 5mm from said shielding cage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221013121.6U CN217561746U (en) | 2022-04-28 | 2022-04-28 | Anti-sputtering Faraday cylinder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221013121.6U CN217561746U (en) | 2022-04-28 | 2022-04-28 | Anti-sputtering Faraday cylinder |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217561746U true CN217561746U (en) | 2022-10-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221013121.6U Active CN217561746U (en) | 2022-04-28 | 2022-04-28 | Anti-sputtering Faraday cylinder |
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| Country | Link |
|---|---|
| CN (1) | CN217561746U (en) |
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- 2022-04-28 CN CN202221013121.6U patent/CN217561746U/en active Active
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