CN217077850U - Protection structure for bottom electrode of single crystal furnace - Google Patents
Protection structure for bottom electrode of single crystal furnace Download PDFInfo
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- CN217077850U CN217077850U CN202220686584.2U CN202220686584U CN217077850U CN 217077850 U CN217077850 U CN 217077850U CN 202220686584 U CN202220686584 U CN 202220686584U CN 217077850 U CN217077850 U CN 217077850U
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Abstract
A protection structure for a furnace bottom electrode of a single crystal furnace comprises a first lining layer and a second lining layer which are arranged between an electrode column and a mounting hole, wherein the first lining layer and the second lining layer are arranged along the height of the electrode column in a stepped mode; the first lining is arranged close to one side of the electrode column, and the second lining is arranged close to one side of the inner wall of the mounting hole; and the electrode column is closely attached to the first lining, the second lining and the mounting hole in pairs. The utility model discloses a lining one and lining two that the ladder set up, tight parcel is full of completely in the space between electrode post and mounting hole at the outer wall of electrode post, makes electrode post surround the setting by bilayer structure's lining one and lining two around, and the steam in the reducible single crystal growing furnace owner room flows from the clearance between electrode post and the mounting hole, reduces thermal scattering and disappearing in the single crystal growing furnace to can reduce the thermal field consumption.
Description
Technical Field
The utility model belongs to the technical field of czochralski crystal preparation keeps warm, especially, relate to a protection architecture for single crystal growing furnace stove bottom electrode.
Background
The Czochralski method for growing monocrystalline silicon is the most widely applied technology for producing monocrystalline silicon at present, and along with the market competition intensification, the production cost of single kilogram of monocrystalline silicon needs to be reduced in monocrystalline silicon production, so that the price advantage of products is improved. In the production of monocrystalline silicon, the combustion cost is large, and the reduction of the power consumption of a monocrystalline furnace is one of the main ways for reducing the production cost of one kilogram. Especially, in the crystal pulling process, the power consumption of the electrode column at the bottom of the furnace is greatly changed, and the stability of the thermal field power in the main chamber of the single crystal furnace is directly influenced.
SUMMERY OF THE UTILITY MODEL
The utility model provides a single crystal growing furnace stove bottom protection architecture for electrode has solved among the prior art single crystal growing furnace stove bottom electrode post heat scatter and disappear seriously and lead to the great technical problem of thermal field consumption.
For solving at least one above-mentioned technical problem, the utility model discloses a technical scheme be:
a protection structure for a furnace bottom electrode of a single crystal furnace comprises a first lining layer and a second lining layer which are arranged between an electrode column and a mounting hole, wherein the first lining layer and the second lining layer are arranged along the height of the electrode column in a stepped mode;
the first lining is arranged close to one side of the electrode column, and the second lining is arranged close to one side of the inner wall of the mounting hole;
and the electrode column is closely attached to the first lining, the second lining and the mounting hole in pairs.
Furthermore, the lining layer I is a plastic part with a cylindrical structure and is sleeved outside the electrode column.
Furthermore, the second lining is an annular elastic piece and is arranged in a space between the first lining and the mounting hole.
Furthermore, the lower end faces of the first lining layer and the second lining layer are both abutted against the electrode plate.
Further, the height of the first lining is larger than that of the second lining.
Further, the height difference between the first lining layer and the second lining layer is not less than 20 mm.
Further, the upper end face of the first lining layer is lower than the upper end face of the mounting hole.
Furthermore, the upper end surface of the first lining layer is lower than the height of the outer wall surface of the electrode column.
Further, the thickness of the first lining layer is smaller than that of the second lining layer.
Further, the thickness of the second lining layer is 2-4 times of the thickness of the first lining layer.
Adopt the utility model discloses a single crystal growing furnace stove bottom protection architecture for electrode, lining one and lining two through the ladder setting, tight parcel is in the outer wall of electrode post and be full of completely in the space between electrode post and mounting hole, make around the electrode post by bilayer structure's lining one and lining two surround the setting, the steam in the reducible single crystal growing furnace owner room flows from the clearance between electrode post and the mounting hole, reduce thermal scattering and disappearing in the single crystal growing furnace, thereby can reduce the thermal field consumption, the life of the insulation material who arranges the stove bottom in has also been prolonged indirectly.
Drawings
Fig. 1 is a schematic structural diagram of a protective structure for a bottom electrode of a single crystal furnace according to an embodiment of the present invention.
In the figure:
10. electrode column 20, mounting hole 30, protection architecture
31. First lining 32, second lining 40 and electrode slice
Detailed Description
The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
In this embodiment, a protection structure 30 for a bottom electrode of a single crystal furnace is provided, as shown in fig. 1, including a first lining 31 and a second lining 32 disposed between an electrode column 10 and a mounting hole 20, where the bottom of the furnace is provided with the electrode columns 10 of 4 main heaters and the electrode columns 10 of 2 bottom heaters, and heat taken away by airflow flowing out through gaps between the electrode columns 10 and the mounting holes 20 matched with the electrode columns is a main path for heat dissipation of a thermal field, so that the protection structure 30 is completely filled in the gaps between all the electrode columns 10 and the mounting holes 20, so that the gaps are completely sealed, thereby reducing heat dissipation and reducing power consumption of the single crystal furnace. The first lining 31 and the second lining 32 are arranged along the height step of the electrode column 10, the first lining 31 is arranged close to the side of the electrode column 10, and the second lining 32 is arranged close to the side of the inner wall of the mounting hole 20; and the electrode column 10 and the first lining 31, the first lining 31 and the second lining 32, and the second lining 32 and the mounting hole 20 are arranged in a mutual close fit manner in pairs. The first lining 31 and the second lining 32 which are tightly wrapped on the outer wall of the electrode column 10 and are completely filled in the space between the electrode column 10 and the mounting hole 20 can enable airflow to be isolated in the furnace cavity and not to flow out along the gap between the electrode column 10 and the mounting hole 20, so that the heat loss in the single crystal furnace can be reduced, the power consumption of a thermal field can be reduced, and the service life of a heat insulation material arranged at the bottom of the furnace can be indirectly prolonged.
Further, the first lining 31 is a plastic part with a cylindrical structure, and the plastic part is made of a material with low thermal conductivity, high temperature resistance, good high-temperature insulation property and good chemical stability at high temperature, is sleeved on the outer side of the electrode column 10 and is tightly attached to the electrode column 10.
Furthermore, the second lining 32 is an annular elastic member, preferably made of a material with a melting point higher than that of quartz sand and a thermal conductivity lower than that of the quartz sand, and the second lining 32 is completely arranged in the space between the first lining 31 and the mounting hole 20, and due to the adoption of the closed and tight protection structure 30 formed by the first lining 31 and the second lining 32, the inner diameter of the mounting hole 20 in the furnace bottom can be reduced, so that the heat loss of a thermal field in the main chamber is reduced; and the whole protection structure 30 has stable physical properties at a high temperature state, thereby achieving the effect of reducing power consumption.
Furthermore, the lower end faces of the first lining 31 and the second lining 32 are both abutted against the quartz electrode plate 40 arranged on the lower end face of the electrode column 10, so that the first lining 31 and the second lining 32 are completely filled in the electrode column 10 and the mounting hole 20.
Further, the height of the first lining 31 is greater than that of the second lining 32; preferably, the height difference between the first lining 31 and the second lining 32 is not less than 20mm, so that the first lining 31 is suspended between the electrode column 10 and the mounting hole 20, and the protection of the first lining 31 on the electrode column 10 is ensured.
Further, the upper end surface of the liner one 31 is lower than the upper end surface of the mounting hole 20 in order that the liner one 31 does not interfere with the mounting of the electrode column 10 to the mounting hole 20.
Furthermore, the upper end surface of the first lining 31 is lower than the height of the outer wall surface of the electrode column 20, so that the ignition phenomenon of the electrode column 10 is prevented.
Further, the thickness of lining one 31 is less than the thickness of lining two 32, and the purpose improves the stability and the closely knit of lining two 32 packing, on the basis of guaranteeing that lining one 31 wraps up electrode column 10 setting completely to guarantee the steadiness that lining one 31 placed.
Preferably, the thickness of liner two 32 is 2-4 times the thickness of liner one 31.
Adopt the utility model discloses a single crystal growing furnace stove bottom protection architecture for electrode, lining one and lining two through the ladder setting, tight parcel is in the outer wall of electrode post and be full of completely in the space between electrode post and mounting hole, make around the electrode post by bilayer structure's lining one and lining two surround the setting, the steam in the reducible single crystal growing furnace owner room flows from the clearance between electrode post and the mounting hole, reduce thermal scattering and disappearing in the single crystal growing furnace, thereby can reduce the thermal field consumption, the life of the insulation material who arranges the stove bottom in has also been prolonged indirectly.
The embodiments of the present invention have been described in detail, and the description is only for the preferred embodiments of the present invention, and should not be construed as limiting the scope of the present invention. All the equivalent changes and improvements made according to the application scope of the present invention should still fall within the patent coverage of the present invention.
Claims (10)
1. The protection structure for the bottom electrode of the single crystal furnace is characterized by comprising a first lining layer and a second lining layer, wherein the first lining layer and the second lining layer are arranged between an electrode column and a mounting hole and are arranged along the height step of the electrode column;
the first lining is arranged close to one side of the electrode column, and the second lining is arranged close to one side of the inner wall of the mounting hole;
and the electrode column is closely attached to the first lining, the second lining and the mounting hole in pairs.
2. The protecting structure for the bottom electrode of the single crystal furnace as claimed in claim 1, wherein the lining layer is a plastic member having a cylindrical structure and is disposed to cover the outside of the electrode column.
3. The protective structure for the bottom electrode of the single crystal furnace as claimed in claim 1 or 2, wherein the second lining is an annular elastic member and is disposed in a space between the first lining and the mounting hole.
4. The protecting structure for the bottom electrode of the single crystal furnace according to claim 3, wherein the lower end surfaces of the first lining layer and the second lining layer are both abutted against electrode sheets.
5. The protective structure for the bottom electrode of the single crystal furnace according to any one of claims 1 to 2 and 4, wherein the height of the first lining layer is greater than the height of the second lining layer.
6. The protective structure for the bottom electrode of the single crystal furnace according to claim 5, wherein the difference in height between the first lining layer and the second lining layer is not less than 20 mm.
7. The protective structure for the bottom electrode of the single crystal furnace according to any one of claims 1 to 2, 4 and 6, wherein the upper end surface of the first lining layer is lower than the upper end surface of the mounting hole.
8. The protective structure for the bottom electrode of the single crystal furnace as claimed in claim 7, wherein the upper end surface of the first lining layer is lower than the height of the outer wall surface of the electrode column.
9. The protective structure for the bottom electrode of the single crystal furnace according to any one of claims 1 to 2, 4, 6 and 8, wherein the thickness of the first lining layer is smaller than that of the second lining layer.
10. The protective structure for the bottom electrode of the single crystal furnace according to claim 9, wherein the thickness of the second lining layer is 2-4 times that of the first lining layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202220686584.2U CN217077850U (en) | 2022-03-28 | 2022-03-28 | Protection structure for bottom electrode of single crystal furnace |
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CN202220686584.2U CN217077850U (en) | 2022-03-28 | 2022-03-28 | Protection structure for bottom electrode of single crystal furnace |
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CN217077850U true CN217077850U (en) | 2022-07-29 |
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CN202220686584.2U Active CN217077850U (en) | 2022-03-28 | 2022-03-28 | Protection structure for bottom electrode of single crystal furnace |
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