CN217052400U

CN217052400U - Vertical continuous chemical plating production line

Info

Publication number: CN217052400U
Application number: CN202220768845.5U
Authority: CN
Inventors: 张振; 李建中
Original assignee: Kunshan Dongwei Technology Co Ltd
Current assignee: Kunshan Dongwei Technology Co Ltd
Priority date: 2022-03-31
Filing date: 2022-03-31
Publication date: 2022-07-26
Anticipated expiration: 2032-03-31

Abstract

The utility model provides a perpendicular continuous chemical plating production line belongs to chemical plating technical field, include: the chemical plating bath is provided with a plating bath inlet at one end and a plating bath outlet at the other end, and the plating bath inlet and the plating bath outlet are respectively provided with a liquid blocking assembly; the steel strip is arranged above the chemical plating tank, a plating clamp used for vertically suspending a product to be plated is arranged on the steel strip, and the product to be plated sequentially passes through a plating tank inlet and a plating tank outlet of the chemical plating tank by the driving of the steel strip; the utility model discloses a perpendicular continuous chemical plating production line adopts and carries out the chemical copper plating to waiting to plate the mode that the product carried out perpendicular transport, makes and waits to plate the product in transportation process, needn't go on fluctuation from top to bottom through many drive rollers to less drive roller and the contact quantity of waiting to plate the product, avoided waiting to plate the problem that coiled material product takes place the damage.

Description

Vertical continuous chemical plating production line

Technical Field

The utility model relates to a chemical plating technical field, concretely relates to perpendicular continuous chemical plating production line.

Background

Chemical plating, also known as Electroless plating (electrolytic plating) or Autocatalytic plating (Autocatalytic plating), is a plating process in which metal ions in a plating solution are reduced to metal by means of a suitable reducing agent without an applied current and deposited onto the surface of a part.

In the prior art, a continuous chemical plating scheme for a coiled material generally adopts a horizontal conveying production line, and when the coiled material enters and exits a rinsing bath and a chemical plating bath, a driving roller is adopted to carry out up-and-down rolling type turning on the coiled material.

However, the existing continuous chemical plating scheme needs more driving rollers, and the driving rollers are directly driven in a contact manner with the coiled material, so that the coiled material is easily damaged.

SUMMERY OF THE UTILITY MODEL

Therefore, the to-be-solved technical problem of the utility model lies in overcoming the continuous chemical plating production line among the prior art, the defect that the coiled material is damaged easily to the more drive roller of adoption to a perpendicular continuous chemical plating production line is provided.

In order to solve the technical problem, the utility model provides a perpendicular continuous chemical plating production line, include:

the chemical plating bath is provided with a plating bath inlet at one end and a plating bath outlet at the other end, and the plating bath inlet and the plating bath outlet are respectively provided with a liquid blocking assembly;

the steel strip is arranged above the chemical plating tank, the steel strip is provided with a plating clamp for vertically suspending a product to be plated, and the product to be plated sequentially passes through a plating tank inlet and a plating tank outlet of the chemical plating tank through the driving of the steel strip.

Optionally, the liquid stop assembly comprises: the liquid blocking wheel set comprises at least one liquid blocking wheel set, two liquid blocking wheels are vertically arranged in parallel in each liquid blocking wheel set, and the liquid blocking wheels are suitable for allowing the products to be plated to pass through.

Optionally, the roller body of the liquid blocking wheel has elasticity.

Optionally, the liquid blocking wheel is connected with a driving device, and the liquid blocking wheel is driven by the driving device to rotate actively.

Optionally, the liquid blocking wheels are synchronously connected through gears.

Optionally, a rinsing bath and a blow-drying bath are arranged in front of the chemical plating bath.

Optionally, the wash tank has at least two, including: a hot water washing tank and a normal temperature water washing tank.

Optionally, the ambient water wash tank has several groups.

Optionally, a developing tank is arranged before the rinsing tank.

Optionally, a rinsing bath and a blow-drying bath are arranged behind the chemical plating bath.

The utility model discloses technical scheme has following advantage:

the utility model provides a perpendicular continuous chemical plating production line adopts and carries out the electroless copper plating to the mode that the product carries out perpendicular transport to waiting to plate, makes and waits to plate the product in transportation process, needn't go on the fluctuation from top to bottom through many drive rollers to less drive roller and the contact quantity of waiting to plate the product, avoided waiting to plate the problem that coiled material product takes place the damage.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the technical solutions in the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.

FIG. 1 is a front view of one embodiment of a vertical continuous electroless plating line provided in an embodiment of the invention.

Fig. 2 is a side view of the water stop assembly of fig. 1.

Fig. 3 is a front view of one embodiment of a vertical continuous electroless plating line provided in an embodiment of the invention.

Description of reference numerals:

1. a chemical plating bath; 2. a steel belt; 3. a liquid blocking assembly; 4. a liquid blocking wheel; 5. a roll type plate placing machine; 6. a roll type plate collecting machine; 7. a hot water washing tank; 8. a normal temperature rinsing bath; 9. a developing tank; 10. a pre-development reflow tank; 11. a post-development reflow tank; 12. and (4) blackening the tank.

Detailed Description

The technical solutions of the present invention will be described more clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts all belong to the protection scope of the present invention.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.

In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected" and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.

Furthermore, the technical features mentioned in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

The vertical continuous chemical plating production line provided by the embodiment is used for chemical plating of continuous coiled materials, and particularly can be used for continuous chemical copper plating or chemical plating of other materials, such as chemical nickel plating.

As shown in fig. 1, a specific implementation of the vertical continuous electroless plating production line provided for this embodiment includes: an electroless plating bath 1 and a steel strip 2 disposed above the electroless plating bath 1. The chemical plating tank 1 is used for containing a reaction solution, and the reaction solution reacts with a product to be plated entering the chemical plating tank 1. The steel strip 2 is used for vertically suspending a product to be plated, and the product to be plated sequentially passes through a plating bath inlet and a plating bath outlet of the chemical plating bath by the driving of the steel strip 2. One end of the chemical plating tank 1 is a plating tank inlet, the other end of the chemical plating tank 1 is a plating tank outlet, the plating tank inlet and the plating tank outlet are respectively provided with a liquid blocking component 3, and the liquid blocking component 3 is used for preventing reaction liquid from flowing out of the chemical plating tank 1 and allowing a product to be plated to pass through.

As shown in fig. 2, the liquid blocking assembly 3 includes: the liquid blocking wheels 4 are vertically arranged in parallel, and the liquid blocking wheels 4 are suitable for allowing the products to be plated to pass through. In addition, as an alternative embodiment, the liquid blocking wheel 4 group may be provided with a plurality of liquid blocking wheels in sequence.

In a preferred embodiment, the roller bodies of the liquid blocking wheels 4 have elasticity, so that the reaction liquid in the chemical plating bath 1 can be conveniently blocked by the elasticity, and the product to be plated is allowed to be squeezed between the two liquid blocking wheels 4. Specifically, keep off liquid wheel 4 and can adopt the polytetrafluoroethylene material, then overlap on keeping off liquid wheel 4 and establish the silk socks in order to increase and wait to plate the frictional force between the coiled material product to when waiting to plate the coiled material product and passing between two keep off liquid wheels 4, can drive and keep off liquid wheel 4 and in time rotate, avoid waiting to plate the coiled material product and keep off and take place relative movement between liquid wheel 4, and the coiled material product that waits to plate is worn and torn.

In some embodiments, the liquid blocking wheel 4 is connected to a driving device, and the driving device drives the liquid blocking wheel 4 to rotate actively. The driving device keeps the linear speed of the liquid baffle wheel 4 consistent with the moving speed of the product to be plated, thereby avoiding the friction between the product to be plated and the liquid baffle wheel 4. In addition, as an alternative embodiment, the liquid blocking wheels 4 may not be connected with the driving device, and when the product to be plated is squeezed between the two liquid blocking wheels 4, the liquid blocking wheels 4 can be driven to rotate by the product to be plated, so that the product to be plated is squeezed between the two liquid blocking wheels 4, and no reaction liquid flows out of the chemical plating tank 1 between the two liquid blocking wheels 4.

In some embodiments, the liquid blocking wheels 4 are synchronously connected through gears, so that the rotation speeds of two parallel liquid blocking wheels 4 in the same group are consistent, and unbalanced driving of the products to be plated when the products to be plated are in contact with the liquid blocking wheels is avoided. In addition, as an alternative embodiment, the liquid blocking wheels 4 may be connected in a synchronous rotation manner without using a gear, so that the liquid blocking wheels 4 can rotate freely.

As shown in fig. 3, in the vertical continuous electroless plating production line provided in this embodiment, a rinsing bath and a blow-drying bath are provided in front of the electroless plating bath 1. Wherein, the wash bowl includes: a hot water washing tank 7 and a normal temperature water washing tank 8. The surface of the product to be plated before the electroless plating can be cleaned more by the hot water washing tank 7. In addition, the normal temperature wash bowl 8 can set up a plurality of groups, the product of waiting to plate is directly washed to the partial deionized water that adopts of normal temperature wash bowl 8, can reduce the printed circuit board that the product was made, the short circuit risk that ion migration caused when using, and prevent to corrode printed circuit board.

As shown in fig. 3, in the vertical continuous electroless plating line provided in this embodiment, a plurality of developing tanks 9 are sequentially provided in front of the rinsing tank, a pre-developing reflow tank 10 is provided in front of the developing tanks 9, and a post-developing reflow tank 11 is provided behind the developing tanks 9. The chemical plating tank 1 is sequentially provided with: a plurality of rinsing baths, a blackening bath 12 is arranged behind the plurality of rinsing baths, and then a plurality of rinsing baths and a blow-drying bath are arranged. Thereby forming a complete electroless copper plating production line, wherein the front end of the production line is provided with a roll type plate placing machine 5, and the rear end is provided with a roll type plate collecting machine 6 which are respectively used for collecting and placing coiled material products to be plated.

It should be noted that the vertical continuous chemical plating production line provided by the embodiment is suitable for one-time copper electroplating treatment, wherein the product thickness is 24 um-100 um, and the width is 600mm (the acceptance takes 24 um-100 um as the standard, and the product is matched with a customer to treat a 13 μm product). The transmission speed of the production line is 1.0-7.0 m/min and can be adjusted (and 5m/min can be ensured for drying). The processing flow is as follows: the method comprises the steps of roll type plate placing → backflow before developing → backflow after developing → hot water washing (soaking type) → water washing → DI direct water washing → blow drying → backflow before copper melting → back backflow after copper melting → backflow before copper melting → water washing → DI direct water washing → backflow before blackening → backflow → blackening, back backflow after blackening → water washing → DI direct water washing → DI washing → water washing → DI direct water washing → drying → roll type plate collecting.

The vertical continuous chemical plating production line provided by the embodiment has the following capacity: the production speed is 4 meters/minute and the productivity is 22 × 60 × 26 × 4 × 600/1000 × 80000 square meters/month according to 22 hours of work and 26 days of work each month. Site requirements: l53800mm W4200mm H3600 mm.

The specific equipment parameters are as follows:

1. rolling type plate placing machine

2. Return channel before development

3. Developing (soaking) tank

4. Developing (soaking) tank

5. Back flow tank after development

6. Hot water washing trough (soaking)

7. Rinsing bath

8. Direct deionized water washing tank (direct deionized water washing connected to client section pure water main pipe)

9. Blow-drying tank

10. Front and back copper melting reflux tank

11. Copper melting tank

12. Front and back flow tank for blackening

13. Blackening groove

DI direct Water Wash tank

15. Blowing and drying tank

16. Rolling type plate collecting machine

It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious changes and modifications may be made without departing from the scope of the present invention.

Claims

1. A vertical continuous electroless plating production line is characterized by comprising:

the chemical plating bath (1) is provided with a plating bath inlet at one end and a plating bath outlet at the other end, and the plating bath inlet and the plating bath outlet are respectively provided with a liquid blocking component (3);

the steel strip (2) is arranged above the chemical plating tank (1), a plating clamp used for vertically suspending a product to be plated is arranged on the steel strip (2), and the product to be plated sequentially passes through a plating tank inlet and a plating tank outlet of the chemical plating tank through the driving of the steel strip (2).

2. The vertical continuous electroless plating line according to claim 1, characterized in that the liquid baffle assembly (3) comprises: the electroplating device comprises at least one liquid blocking wheel (4) group, wherein two liquid blocking wheels (4) which are vertically arranged in parallel are arranged in each liquid blocking wheel (4) group, and the two liquid blocking wheels (4) are suitable for allowing the products to be plated to pass through.

3. The vertical continuous electroless plating line according to claim 2, characterized in that the barrel of the liquid-retaining wheel (4) is elastic.

4. The vertical continuous electroless plating production line according to claim 2, characterized in that the liquid blocking wheel (4) is connected with a driving device, and the liquid blocking wheel (4) is driven by the driving device to rotate actively.

5. Vertical continuous electroless plating line according to claim 4 characterized in that the liquid retaining wheels (4) are synchronously connected by gears.

6. The vertical continuous electroless plating line according to any one of claims 1 to 5, characterized in that a rinsing bath and a blow-drying bath are arranged before the electroless plating bath (1).

7. The vertical continuous electroless plating line of claim 6, wherein the rinsing bath has at least two comprising: a hot water washing tank (7) and a normal temperature water washing tank (8).

8. The vertical continuous electroless plating line according to claim 7 characterized in that the normal temperature rinsing bath (8) has several groups.

9. The vertical continuous electroless plating line according to claim 8, characterized in that the rinsing bath is preceded by a developing bath (9).

10. The vertical continuous electroless plating line according to any one of claims 7 to 9, characterized in that a rinsing bath and a blow-drying bath are provided after the electroless plating bath (1).