CN217015067U

CN217015067U - High density nano chip

Info

Publication number: CN217015067U
Application number: CN202123397218.XU
Authority: CN
Inventors: 不公告发明人
Original assignee: Suzhou Nanomed Biomed Co ltd
Current assignee: Suzhou Nanomed Biomed Co ltd
Priority date: 2021-12-31
Filing date: 2021-12-31
Publication date: 2022-07-22
Anticipated expiration: 2031-12-31

Abstract

The utility model discloses a high-density nano wafer, which comprises a substrate and a micro-needle array arranged on the surface of the substrate, wherein in the micro-needle array, the height of micro-needles is not more than 100 micrometers, and the density of the micro-needles is 10 needles/cm²100000 roots/cm²The microneedles have an aspect ratio of 1:1 to 30: 1. By improving the microneedle density of the nano-chip and limiting the height of the microneedles to be not more than 100 micrometers, the number of the microneedles on the nano-chip in a unit area is greatly increased, and after the number of the microneedles is increased, more micro-channels can be formed on the skin cuticle, so that the transdermal efficiency of the nano-chip can be improved.

Description

High density nano-chip

Technical Field

The utility model belongs to the technical field of percutaneous conveying instruments, and particularly relates to a nano wafer.

Background

A nano-chip comprises a substrate and a micro-needle array positioned on the surface of the substrate. The microneedle array can act on a skin barrier layer, and can play a role in reducing the skin barrier and increasing the absorption effect of a drug. The substrate is used to carry the microneedle array and is connected to other devices or mechanisms.

The density of the micro-needle array on the surface of the nano-chip and the height of the needle body are key factors influencing the transdermal effect of the nano-chip. Conventional lithography can achieve resolution of 5 microns at present, but is not sufficient to support high aspect ratio microneedle fabrication. The density of the microneedle array on the surface of the existing nano chip is generally lower, for example, patent CN110769891A discloses that the density of the microneedle is 50/cm²2000 roots/cm²The ratio of the micro-needle to the nano-chip is stillLimited, and less effective transdermal delivery.

Disclosure of Invention

The utility model aims to provide a high-density nano wafer to improve the transdermal efficiency of a microneedle array.

In order to solve the technical problems, the utility model adopts the technical scheme that: a high-density nano wafer comprises a substrate and a micro needle array arranged on the surface of the substrate, wherein in the micro needle array, the height of micro needles is not more than 100 micrometers, and the density of the micro needles is 10/cm²100000 roots/cm²The microneedles have an aspect ratio of 1:1 to 30: 1.

The aspect ratio of the microneedle refers to the ratio of the height of the microneedle to the width of the base of the microneedle. The width of the bottom of the microneedle has different calculation modes according to microneedles with different shapes. For microneedles with circular bottoms, such as conical or truncated cone shapes, the width of the microneedle bottom refers to the diameter of the microneedle bottom. For the rectangular pyramid or truncated pyramid shaped microneedles, the diameter of the inscribed circle of the rectangle at the base of the microneedle is referred to. For triangular pyramid or triangular frustum shaped microneedles, the microneedle bottom width refers to the diameter of the triangular circumscribed circle at the microneedle bottom. For a microneedle that is in the shape of a polygonal pyramid or a truncated pyramid, the microneedle base width refers to the diameter of the circumscribed circle of the microneedle base polygon.

Preferably, the substrate has a thickness of 10 to 300 micrometers.

Preferably, the density of the microneedles in the microneedle array is 10/cm²20 roots/cm²50, 50 pieces/cm²Or 100 roots/cm²。

Preferably, the density of the microneedles in the microneedle array is 3000 roots/cm²100000 roots/cm²。

Preferably, the microneedles in the microneedle array have an aspect ratio of 2:1 to 5: 1.

Preferably, the microneedle array has microneedles of 30 microns, 50 microns or 80 microns in height.

Preferably, the area of the substrate is not more than 4cm²。

The utility model has the beneficial effects that: by improving the density of the microneedles of the nano wafer and limiting the height of the microneedles to be not more than 100 micrometers, the number of the microneedles in a unit area on the nano wafer is greatly increased, and after the number of the microneedles is increased, more micro channels can be formed on a skin stratum corneum, so that the transdermal efficiency of the nano wafer can be improved.

Drawings

FIG. 1 is a side schematic view of the present invention;

FIG. 2 is a schematic front view of the present invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments.

Example one

As shown in figures 1 and 2, the high-density nano wafer comprises a substrate and a microneedle array arranged on the surface of the substrate, wherein the thickness H2 of the substrate 1 is 200 micrometers, the height H1 of the microneedles in the microneedle array is 80 micrometers, and the density of the microneedles is 156 pieces/cm²The height-width ratio of the microneedle is 2:1, the width W of the microneedle bottom is 40 micrometers, and the area of the substrate is 1cm². The proportion or amount in the figures does not represent a true proportion or amount.

The width W of the bottom of the microneedle has different calculation modes according to microneedles of different shapes. For microneedles having a circular base, such as a conical or truncated cone, W indicates the diameter of the base of the microneedle. For a rectangular pyramid or truncated pyramid shaped microneedle, W refers to the inscribed circle diameter of the microneedle base rectangle. For triangular pyramid or triangular frustum shaped microneedles, W refers to the diameter of the triangular circumscribed circle at the base of the microneedle. For a polygonal pyramid or frustum-shaped microneedle, W refers to the diameter of the circumscribed circle of the polygon at the base of the microneedle.

The thickness of the substrate of the nano wafer is controlled within 10-300 microns, so that the nano wafer is suitable for sliding use, the side edge of the nano wafer is not easy to influence the skin in the sliding use process, the use experience of a user is guaranteed, and the occurrence of adverse reaction is avoided.

Example two

A high-density nano-crystal plate is composed of a substrate and a nano-crystal plate on said substrateThe thickness H2 of the substrate 1 is 10 microns, the height H1 of the microneedles in the microneedle array is 20 microns, and the density of the microneedles is 1000 roots/cm²The height-width ratio of the microneedle is 1:1, the width W of the microneedle bottom is 20 micrometers, and the area of the substrate is 1.6cm²。

EXAMPLE III

A high-density nano wafer comprises a substrate and a micro needle array arranged on the surface of the substrate, wherein the thickness H2 of the substrate 1 is 300 micrometers, the height H2 of the micro needles in the micro needle array is 90 micrometers, and the density of the micro needles is 100000 roots/cm²The height-width ratio of the microneedle is 30:1, the width W of the microneedle bottom is 3 microns, and the area of the substrate is 2.5cm²。

Example four

A high-density nano chip comprises a substrate and a micro needle array arranged on the surface of the substrate, wherein the thickness H2 of the substrate 1 is 100 micrometers, the height H2 of the micro needles in the micro needle array is 60 micrometers, and the density of the micro needles is 10000 needles/cm²The height-width ratio of the microneedle is 5:1, the width W of the bottom of the microneedle is 12 micrometers, and the area of the substrate is 4cm²。

EXAMPLE five

A high-density nano chip comprises a substrate and a micro needle array arranged on the surface of the substrate, wherein the thickness H2 of the substrate 1 is 50 microns, the height H2 of the micro needles in the micro needle array is 20 microns, and the density of the micro needles is 6400 roots/cm²The height-width ratio of the microneedle is 1:1, the width W of the bottom of the microneedle is 20 micrometers, and the area of the substrate is 0.64cm²。

Example six

A high-density nano-chip comprises a substrate and a micro-needle array arranged on the surface of the substrate, wherein the thickness H2 of the substrate 1 is 250 micrometers, the height H2 of micro-needles in the micro-needle array is 70 micrometers, and the density of the micro-needles is 3600 micro-needles/cm²The height-width ratio of the microneedle is 7:1, the width W of the bottom of the microneedle is 10 micrometers, and the area of the substrate is 0.81cm²。

Claims

1. A high-density nano wafer comprises a substrate and a micro needle array arranged on the surface of the substrate, and is characterized in that in the micro needle array, the height of micro needles is not more than 100 micrometers, and the density of the micro needles is 10 needles/cm²100000 roots/cm²The microneedles have an aspect ratio of 1:1 to 30: 1.

2. The high-density nanocrystal sheet of claim 1 wherein the substrate has a thickness of 10 to 300 microns.

3. The high-density nano-wafer according to claim 1, wherein the density of the micro-needles in the micro-needle array is 100/cm²1000 roots/cm²10000 roots/cm²Or 100000 roots/cm²。

4. The high-density nanocrystal sheet of claim 1, wherein the microneedle array has a microneedle density of 3000 microneedles/cm²100000 roots/cm²。

5. The high-density nanocrystal sheet of claim 1, wherein the microneedles of the microneedle array have an aspect ratio of 2:1 to 5: 1.

6. The high-density nanocrystal sheet of claim 1, wherein the microneedle array has a microneedle height of 30, 50, or 80 microns.

7. The high-density nanocrystal sheet of claim 1 wherein the substrate has an area of no more than 4cm²。