CN216738512U - Shielding mechanism of magnetic control target material - Google Patents
Shielding mechanism of magnetic control target material Download PDFInfo
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- CN216738512U CN216738512U CN202123362214.8U CN202123362214U CN216738512U CN 216738512 U CN216738512 U CN 216738512U CN 202123362214 U CN202123362214 U CN 202123362214U CN 216738512 U CN216738512 U CN 216738512U
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Abstract
The utility model relates to the technical field of magnetron sputtering, and provides a shielding mechanism of a magnetron target, which comprises a shell and a shielding mechanism, wherein the shell is provided with a sputtering cavity; the target materials are arranged in the sputtering cavity and are provided with a plurality of target materials, and the target materials are at least made of two materials; the substrate is rotatably arranged in the sputtering cavity, and the plurality of targets are circumferentially arranged on the outer side of the substrate; the protective covers are rotatably arranged on the shell and are provided with a plurality of target materials, the plurality of protective covers are respectively covered on the plurality of target materials, and the protective covers are provided with sputtering ports; through the technical scheme, the problems that targets made of different materials are sequentially replaced to sputter in the prior art, and the operation efficiency is low are solved.
Description
Technical Field
The utility model relates to the technical field of magnetron sputtering, in particular to a shielding mechanism of a magnetron target.
Background
At present, the magnetron sputtering coating technology is widely applied due to the advantages of simple processing, convenient installation, compact coating film layer, high bonding strength, long-time mass production and the like, and the working principle of magnetron sputtering is that electrons collide with argon atoms in the process of flying to a substrate under the action of an electric field E so as to ionize the argon atoms to generate Ar positive ions and new electrons; new electrons fly to the substrate, Ar ions accelerate to fly to the cathode target under the action of an electric field and bombard the surface of the target at high energy to sputter the target, neutral target atoms or molecules in sputtered particles are deposited on the substrate to form a film, and the multi-target magnetron sputtering machine is used for sputtering targets made of various materials. In the existing production process, when targets made of multiple materials are needed to be sputtered, in order to avoid the pollution of the targets made of different materials, the targets are needed to be sputtered first, then the targets are replaced to be sputtered, the targets are replaced in sequence to be sputtered until the sputtering of the required targets made of different materials is finished, the operation process is complicated, and the operation efficiency is low.
SUMMERY OF THE UTILITY MODEL
The utility model provides a shielding mechanism of a magnetic control target material, and solves the problem of low operation efficiency caused by the fact that targets made of different materials are sequentially replaced for sputtering in the related technology.
The technical scheme of the utility model is as follows:
the shielding mechanism of the magnetic control target comprises
A housing having a sputtering chamber;
the target materials are arranged in the sputtering cavity and are provided with a plurality of target materials, and the target materials are at least made of two materials;
the substrate is rotatably arranged in the sputtering cavity, and the plurality of targets are circumferentially arranged on the outer side of the substrate; and
the protective cover is rotatably arranged on the shell and is provided with a plurality of protective covers, the plurality of protective covers are respectively covered on the plurality of targets, and each protective cover is provided with a sputtering opening.
According to a further technical scheme, the target is of a rod-shaped structure, the protective cover is of a cylindrical structure, and the shell comprises
The protective cover is rotatably arranged on the bottom plate;
the target is rotationally arranged on the top plate; and
one end of the side plate is connected with the bottom plate, the other end of the side plate is connected with the top plate, the axis of the protective cover and the axis of the target are parallel to the side plate, and the height of the protective cover and the height of the target are both smaller than the height of the side plate.
The further technical proposal also comprises
The cap cover is of a cylindrical structure, the cap cover is arranged on the top plate and coaxial with the target, the inner diameter of the cap cover is larger than the diameter of the target, the outer diameter of the cap cover is smaller than the inner diameter of the protective cover, and the cap cover extends into the protective cover.
According to a further technical scheme, the device further comprises a driving assembly arranged on the bottom plate and positioned outside the shell, and the driving assembly comprises
The rotary driving piece is arranged on the bottom plate through a bracket;
a driving gear arranged on an output shaft of the rotary driving member;
and one end of the rotating shaft is coaxially connected with the protective cover, and the other end of the rotating shaft is meshed with the driving gear through a driven gear.
As a further technical scheme, the axis of rotation with still be provided with drive plate and insulating pad between the protection casing, the drive plate with the rotation axis connection sets up, insulating pad is located the protection casing with between the drive plate.
The further technical proposal also comprises
The positioning rod is arranged on the driven gear;
and the travel switch is arranged on the bracket, and the driven gear rotates to drive the positioning rod to be close to or far away from the travel switch.
The working principle and the beneficial effects of the utility model are as follows:
according to the utility model, a plurality of targets are circumferentially arranged on the outer side of the matrix in the sputtering cavity, the targets are made of at least two materials, so that cross contamination can be caused during magnetron sputtering, the targets sputter when the matrix rotates, the surface of the matrix is coated to form a film, and the rotation of the matrix enables the film to be more uniform; and in order to avoid cross contamination of the targets, the thin film of the substrate is ensured to be coated layer by layer, a protective cover is rotatably arranged on the outer side of each target, when the target made of one material is sputtered, the protective cover on the peripheral side of the target made of the material rotates, so that the sputtering port faces to the direction of the substrate, namely, when magnetron sputtering is carried out, sputtered target atoms penetrate through the sputtering port and shoot onto the substrate, the sputtering ports of the protective covers on the outer sides of the targets made of other materials face to the shell, so that the target atoms sputtered towards the direction of the substrate are shielded by the protective covers, the phenomenon that the target atoms made of different materials fly to the substrate at the same time is avoided, the coating effect is influenced, meanwhile, the targets made of different materials are prevented from being cross contaminated, the targets made of different materials are not required to be replaced for multiple times, and the sputtering efficiency is improved.
Drawings
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
FIG. 1 is a partial longitudinal cross-sectional view of the present invention;
FIG. 2 is a cross-sectional schematic view of the present invention;
FIG. 3 is a schematic view of the protective cover of the present invention;
in the figure: 10. the sputtering device comprises a shell, 11, a sputtering cavity, 12, a bottom plate, 13, a top plate, 14, side plates, 20, a target, 30, a base body, 40, a protective cover, 41, a sputtering opening, 50, a cap cover, 60, a driving assembly, 61, a rotary driving piece, 62, a support, 63, a driving gear, 64, a rotary shaft, 65, a driven gear, 66, a driving disc, 67, an insulating pad, 68, a positioning rod, 69 and a travel switch.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall be included within the scope of protection of the present invention.
Example 1
As shown in fig. 1 to 3, the present embodiment provides a shielding mechanism for a magnetron target, including
A housing 10 having a sputtering chamber 11;
the targets 20 are arranged in the sputtering cavity 11, and a plurality of targets 20 are arranged, wherein at least two materials of the targets 20 are provided;
the substrate 30 is rotatably arranged in the sputtering cavity 11, and the plurality of targets 20 are circumferentially arranged outside the substrate 30; and
the protective cover 40 is rotatably arranged on the shell 10 and is provided with a plurality of protective covers 40, the plurality of protective covers 40 are respectively covered on the plurality of targets 20, and each protective cover 40 is provided with a sputtering opening 41.
In the embodiment, in order to solve the problem of low operation efficiency caused by the fact that targets of different materials are sequentially replaced for sputtering in the prior art, a shielding mechanism of a magnetron target is designed, a plurality of targets 20 are circumferentially arranged on the outer side of a base body 30 in a sputtering cavity 11, the plurality of targets 20 are made of at least two materials, cross contamination can be caused during magnetron sputtering, when the base body 30 rotates, the targets 20 sputter to wrap the surface of the base body 30 to form a film, and the film is more uniform due to the rotation of the base body 30; and in order to avoid cross contamination of the targets 20, ensure that the film of the substrate 30 is coated layer by layer, the outer side of each target 20 is rotatably provided with a protective cover 40, when the target 20 of one material is sputtered, the protective cover 40 on the peripheral side of the target 20 of the material is rotated to enable the sputtering port 41 to face the direction of the substrate 30, i.e. when magnetron sputtering is carried out, sputtered rake atoms penetrate through the sputtering port 41 to face the substrate 30, the sputtering ports 41 of the protective covers 40 on the outer sides of the targets 20 of the other materials face the shell 10, so that the rake atoms sputtered towards the substrate 30 are shielded by the protective covers 40, thereby avoiding the rake atoms of different materials from flying to the substrate 30 at the same time and affecting the coating effect, and simultaneously avoiding the rake atoms of the sputtered target 20 from flying to the shielded target 20 and being blocked by the protective covers 40, thereby avoiding the targets 20 of different materials from being cross contaminated, and avoiding the need not to change the targets 20 of different materials for many times, so that the efficiency of sputtering is improved.
As shown in fig. 1 to 3, the target 20 has a rod-like structure, the shield 40 has a cylindrical structure, and the housing 10 includes
The protective cover 40 is rotatably arranged on the bottom plate 12;
the top plate 13 is provided with the target material 20 in a rotating mode; and
one end of the side plate 14 is connected with the bottom plate 12, the other end of the side plate is connected with the top plate 13, the axes of the shield 40 and the target material 20 are parallel to the side plate 14, and the height of the shield 40 and the height of the target material 20 are both smaller than the height of the side plate 14.
In this embodiment, the cylindrical shield 40 covers the rod-shaped target 20 to circumferentially shield the target 20, when the corresponding target 20 is sputtered, the shield 40 rotates to drive the sputtering port 41 to face the substrate 30, when the corresponding target 20 is a non-sputtered target 20, the sputtering port of the shield 40 faces the side plate 14 to shield the target 20, and the target 20 rotates to be disposed on the top plate 13, so that the target 20 can rotate uniformly, the sputtering surface of the target 20 is adjusted, the target 20 is used up as much as possible, and the problem that the service life of the target 20 is affected by the fact that the target 20 is always a sputtering surface at the same angle is avoided.
As shown in fig. 1-2, further comprises
The cap 50 is a cylindrical structure, the cap 50 is disposed on the top plate 13, the cap 50 is coaxial with the target 20, the inner diameter of the cap 50 is larger than the diameter of the target 20, the outer diameter of the cap 50 is smaller than the inner diameter of the protective cover 40, and the cap 50 extends into the protective cover 40.
In this embodiment, in order to completely shield the target 20 in height, a cap 50 is further provided, the cap 50 is detachably fixed on the top plate 13, and one end of the cap 50 extends into the protection cover 40, so that the sum of the heights of the cap 50 and the protection cover 40 is greater than the height of the target 20, the target 20 is shielded in all directions, and the lowest end of the cap 50 is higher than the uppermost end of the sputtering opening 41, so that the cap 50 is prevented from affecting the sputtering range and the sputtering effect.
As shown in fig. 1 to 2, the device further includes a driving assembly 60 disposed on the bottom plate 12 and located outside the housing 10, wherein the driving assembly 60 includes
A rotary driving member 61 arranged on the base plate 12 through a bracket 62;
a drive gear 63 provided on an output shaft of the rotary drive member 61;
and a rotating shaft 64 having one end coaxially connected to the shield 40 and the other end engaged with the driving gear 63 through a driven gear 65.
In this embodiment, in order to drive the rotation of protection casing 40, be provided with support 62 on bottom plate 12, install rotation driving piece 61 on support 62, rotation driving piece 61 can be common rotation driving pieces such as driving motor, and rotation driving piece 61 drives driving gear 63 and rotates, and driving gear 63 drives driven gear 65 and rotates, and driven gear only understands the axis of rotation 64 and rotates to drive protection casing 40 and rotate.
As shown in fig. 1 to 2, a transmission disc 66 and an insulating pad 67 are further disposed between the rotation shaft 64 and the protection cover 40, the transmission disc 66 is connected to the rotation shaft 64, and the insulating pad 67 is located between the protection cover 40 and the transmission disc 66.
In this embodiment, in order to ensure that the passive gear 65 and the rotation shaft 64 are uniformly stressed, while the protection cover 40 rotates, the axis is stable, the transmission disc 66 and the insulating pad 67 are arranged between the rotation shaft 64 and the protection cover 40, when the target 20 is sputtered, the insulating pad 67 enables the protection cover 40 to be in an electroless state, the stability of the protection cover 40 is ensured, the rotation disc 66 is connected with the rotation shaft 64 and is fixed with the protection cover 40, the protection cover 40 and the rotation disc 66 are coaxial and stably installed, it is ensured that the protection cover 40 rotates in the process, the protection cover 40 is always coaxial with the target 20, the protection cover 40 is prevented from deviating and is prevented from contacting the target 20, the sputtering effect is influenced, and the cap cover 50 is also provided with the insulating pad between the top plate 13.
As shown in fig. 1-2, further comprises
A positioning rod 68 provided on the driven gear 65;
and the travel switch 69 is arranged on the bracket 62, and the driven gear 65 rotates to drive the positioning rod 68 to approach or separate from the travel switch 69.
In this embodiment, in order to realize the automatic start and stop of the rotation of the protection cover 40, the rotation is not required to be manually rotated, the positioning rod 68 is arranged on the driven gear 65, a certain distance is formed between the positioning rod 68 and the driven gear 65, that is, the positioning rod 68 is eccentrically arranged relative to the driven gear 65, the stroke switch 69 is arranged on the bracket 62, when the target material 20 is sputtered, the driven gear 65 is driven to rotate, the positioning rod 68 is driven to rotate, when the sputtering port 41 faces the substrate 30, the positioning rod 68 contacts with the stroke switch 69, so that the protection cover 40 stops rotating, the sputtering port 41 is guaranteed to stay in the direction facing the substrate 30, and the sputtering of the target atoms is facilitated.
The present invention is not limited to the above preferred embodiments, and any modifications, equivalent substitutions, improvements, etc. within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. The shielding mechanism of the magnetic control target material is characterized by comprising
A housing (10) having a sputtering chamber (11);
the target (20) is arranged in the sputtering cavity (11) and is provided with a plurality of targets, and the targets (20) are made of at least two materials;
the substrate (30) is rotatably arranged in the sputtering cavity (11), and the plurality of targets (20) are circumferentially arranged on the outer side of the substrate (30); and
the protective cover (40) is rotatably arranged on the shell (10) and is provided with a plurality of protective covers (40), the plurality of protective covers (40) are respectively covered on the plurality of targets (20), and the protective cover (40) is provided with a sputtering opening (41).
2. Shielding mechanism according to claim 1, wherein the target (20) is a rod-like structure, the shield (40) is a cylindrical structure, and the housing (10) comprises
The protective cover (40) is rotatably arranged on the bottom plate (12);
the top plate (13), the target (20) is rotationally arranged on the top plate (13); and
one end of the side plate (14) is connected with the bottom plate (12), the other end of the side plate is connected with the top plate (13), the axis of the protective cover (40) and the axis of the target (20) are parallel to the side plate (14), and the height of the protective cover (40) and the height of the target (20) are smaller than the height of the side plate (14).
3. The shielding mechanism of claim 2, further comprising
The cap cover (50) is of a cylindrical structure, the cap cover (50) is arranged on the top plate (13), the cap cover (50) is coaxial with the target (20), the inner diameter of the cap cover (50) is larger than the diameter of the target (20), the outer diameter of the cap cover (50) is smaller than the inner diameter of the protective cover (40), and the cap cover (50) extends into the protective cover (40).
4. The shielding mechanism of a magnetron target according to claim 2, further comprising a driving assembly (60) disposed on the bottom plate (12) outside the casing (10), wherein the driving assembly (60) comprises
A rotary driving member (61) arranged on the bottom plate (12) through a bracket (62);
a drive gear (63) provided on an output shaft of the rotary drive member (61);
and one end of the rotating shaft (64) is coaxially connected with the protective cover (40), and the other end of the rotating shaft is meshed with the driving gear (63) through a driven gear (65).
5. The shielding mechanism of a magnetron target according to claim 4, wherein a transmission disc (66) and an insulating pad (67) are further disposed between the rotation shaft (64) and the shield (40), the transmission disc (66) is connected to the rotation shaft (64), and the insulating pad (67) is disposed between the shield (40) and the transmission disc (66).
6. The shielding mechanism of claim 4, further comprising
A positioning rod (68) provided on the driven gear (65);
and the travel switch (69) is arranged on the bracket (62), and the driven gear (65) drives the positioning rod (68) to approach or separate from the travel switch (69) after rotating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123362214.8U CN216738512U (en) | 2021-12-28 | 2021-12-28 | Shielding mechanism of magnetic control target material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123362214.8U CN216738512U (en) | 2021-12-28 | 2021-12-28 | Shielding mechanism of magnetic control target material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216738512U true CN216738512U (en) | 2022-06-14 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202123362214.8U Active CN216738512U (en) | 2021-12-28 | 2021-12-28 | Shielding mechanism of magnetic control target material |
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| Country | Link |
|---|---|
| CN (1) | CN216738512U (en) |
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2021
- 2021-12-28 CN CN202123362214.8U patent/CN216738512U/en active Active
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