CN218146927U - Continuous coating assembly and magnetron sputtering device - Google Patents

Abstract

The utility model discloses a continuous coating subassembly and magnetron sputtering device, continuous coating subassembly includes the casing, the basement, target, first baffle and second baffle, the casing has sealed chamber, the basement is connected in the casing and is placed in sealed intracavity, the basement is used for the installation base, target sets up in sealed intracavity, first baffle rotatable coupling is in the casing, first baffle has shelters from the position and exposes the position, sheltering from the position, at least part of first baffle is located between target and the basement, exposing the position, first baffle is shifted out by between target and the basement, second baffle rotatable coupling is rotatable in the casing and uses the axis of basement to be centre of gyration, at least part of second baffle is located between basement and the first baffle, the second baffle has the breach. The utility model discloses the second baffle shelters from the basement subregion and subregion coating film, only needs evacuation and broken vacuum once to accomplish a plurality of coating film samples, and it is consuming time to reduce the experiment, promotes coating film efficiency.

Description

Continuous coating assembly and magnetron sputtering device

Technical Field

The utility model relates to the technical field of films, especially, relate to a continuous coating film subassembly and magnetron sputtering device.

Background

The working principle of magnetron sputtering is that electrons collide with argon atoms in the process of flying to a substrate under the action of an electric field E, so that the argon atoms are ionized to generate Ar positive ions and new electrons; new electrons fly to the substrate, ar ions are accelerated to fly to the cathode target under the action of an electric field, and bombard the surface of the target at high energy, so that the target is sputtered. In sputtering particles, neutral target atoms or molecules are deposited on a substrate to form a thin film.

In the related technology, the magnetron sputtering device is provided with a plurality of target emission sources and a substrate, the target and the substrate are arranged oppositely, when a coating experiment is carried out, the whole substrate (all parts of the substrate facing the target) is in the same environment, so that films deposited by all samples on the substrate in a single experiment are completely the same, when process parameters (target type, coating power/time/temperature and the like) need to be changed to form different films, vacuum breaking is carried out to unload the coated sample and load the sample to be coated, therefore, multiple vacuum pumping and vacuum breaking processes are needed during continuous coating, so that the coating time is multiplied along with the increase of process condition numbers, the experiment time is long, and the coating efficiency is low.

SUMMERY OF THE UTILITY MODEL

The present invention aims at solving at least one of the technical problems in the related art to a certain extent. Therefore, the embodiment of the utility model provides a continuous coating subassembly and magnetron sputtering device, this continuous coating subassembly carries out the subregion coating film through the second baffle to the basement, only needs once evacuation and broken vacuum can accomplish a plurality of coating film samples, and it is consuming time to reduce the experiment, promotes coating film efficiency.

The continuous coating assembly of the embodiment of the present invention includes a housing, a base, a target, a first baffle, and a second baffle, wherein the housing has a sealed cavity, the base is connected to the housing and placed in the sealed cavity, the base is used for mounting a base, the target is disposed in the sealed cavity, the target is used for sputtering target atoms to the base, the first baffle is rotatably connected to the housing, the first baffle has a shielding position and an exposing position, in the shielding position, at least a part of the first baffle is located between the target and the base, in the exposing position, the first baffle is moved out from between the target and the base, the second baffle is rotatably connected to the housing and rotatable with an axis of the base as a rotation center, at least a part of the second baffle is located between the base and the first baffle, the second baffle has a notch, and the second baffle is used for blocking target atoms sputtered from the target to a set position of the base.

The utility model discloses continuous coating subassembly passes through the setting of second baffle, and the second baffle shelters from the basement subregion and subregion coating film, and to basement current region coating film after, thereby the second baffle rotates for the basement base and shelters from this region and exposes another region, and the target carries out the coating film to the region that exposes, need not broken vacuum once more and evacuation, only need evacuation and broken vacuum once can accomplish a plurality of coating film samples, and it is consuming time to reduce the experiment, promotes coating film efficiency.

In some embodiments, the continuous plating assembly further includes a first driving member and a first rotating shaft, one end of the first rotating shaft is connected to the first baffle, and the other end of the first rotating shaft penetrates through the housing and is connected to the first driving member.

In some embodiments, the continuous plating assembly further includes a first sealing element, the first sealing element is sleeved on the first rotating shaft, an inner circumferential wall of the first sealing element abuts against the first rotating shaft, and an outer circumferential wall of the first sealing element abuts against the housing.

In some embodiments, the substrate table includes a second driving member, a second rotating shaft and a connecting table, the second rotating shaft is rotatably connected to the housing, one end of the second rotating shaft is connected to the connecting table, the other end of the second rotating shaft penetrates through the housing and is connected to the second driving member, and the second baffle plate and the substrate holder rotate synchronously.

In some embodiments, the connecting table is coaxial with the second rotating shaft, the target is multiple, the multiple targets are distributed at intervals along the circumference of the second rotating shaft, and the multiple targets are all towards the center of the substrate holder.

In some embodiments, the continuous plating assembly further includes a second sealing element, the second sealing element is sleeved on the second rotating shaft, an inner circumferential wall of the second sealing element abuts against the second rotating shaft, and an outer circumferential wall of the second sealing element abuts against the housing.

In some embodiments, the second flap is a rigid flap, or the second flap is a flexible flap.

The magnetron sputtering device of the second aspect of the present invention includes the continuous coating assembly of any one of the above embodiments.

The utility model discloses magnetron sputtering device is through adopting above-mentioned continuous coating film subassembly, only needs evacuation and broken vacuum once to accomplish a plurality of coating film samples, and it is consuming time to reduce the experiment, promotes coating film efficiency.

Drawings

Fig. 1 is a schematic view of the internal structure of the continuous coating module according to the embodiment of the present invention.

Fig. 2 is a top view of a second baffle of an embodiment of the present invention.

Fig. 3 is a bottom view of a substrate according to an embodiment of the present invention.

Reference numerals are as follows:

a housing 1; a sealed cavity 11;

a base stand 2; a second rotating shaft 21; a connecting table 22; a substrate 23; sample 24;

a target material 3;

a first baffle 4, a first rotating shaft 41;

a second baffle 5; a notch 51;

a third driving member 61; a gear 62; a ring gear 63.

Detailed Description

Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings. The embodiments described below by referring to the drawings are exemplary intended for explaining the present invention, and should not be construed as limiting the present invention.

The continuous coating assembly according to the first aspect of the present invention is described below with reference to the drawings.

As shown in fig. 1 and 2, the continuous coating module according to an embodiment of the present invention includes a housing 1, a substrate holder 2, a target 3, a first baffle 4 and a second baffle 5, the housing 1 has a sealed cavity, the substrate holder 2 is connected to the housing 1 and placed in the sealed cavity, the substrate holder 2 is used for mounting a substrate 23, a plurality of samples 24 for experiments are disposed on the substrate 23, the target 3 is disposed in the sealed cavity, the target 3 is used for sputtering target atoms toward the substrate 23, the first baffle 4 is rotatably connected to the housing 1, the first baffle 4 has a shielding position and an exposing position, in the shielding position, at least a part of the first baffle 4 is located between the target 3 and the substrate 23, in the exposing position, the first baffle 4 is moved out from between the target 3 and the substrate 23, the second baffle 5 is rotatably connected to the housing 1 and rotatable about an axis of the substrate holder 2, at least a part of the second baffle 5 is located between the substrate 23 and the first baffle 4, the second baffle 5 has a notch 51, and the second baffle 5 is used for blocking target atoms from sputtering 3 toward a set position of the substrate 23.

Before the experiment, the substrate 23 is divided into a plurality of experiment areas, the substrate 24 is arranged on each experiment area, then the substrate 23 is connected to the substrate base 2, one surface of the substrate 23, which is provided with the substrate 24, faces the target 3, the second baffle 5 with the specification matched with that of the substrate 23 is selected, and the second baffle 5 is connected to the inside of the shell 1;

during the experiment, the shell 1 is vacuumized, then the technological parameters (such as coating power, time, temperature and the like) corresponding to the first experiment area are set, the equipment is opened, after the glow starting is stable, the first baffle 4 is rotated to the exposure position, then the second baffle 5 is rotated to enable the notch 51 to correspond to the first experiment area, the second baffle 5 is exposed out of the first experiment area of the substrate 23 and shields other experiment areas, the target 3 starts to deposit a film in the first experiment area until the coating is finished, the first baffle 4 is rotated to the shielding position and the equipment is closed, and the coating experiment of the first sample 24 is finished; setting process parameters corresponding to the second experimental area, turning on the device, after the glow is stable, rotating the first baffle 4 to an exposed position, then rotating the second baffle 5 to enable the notch 51 to correspond to the second experimental area, enabling the second baffle 5 to expose the second experimental area of the substrate 23 and shield other experimental areas, starting deposition of a film on the target 3 in the second experimental area until the film coating is finished, rotating the first baffle 4 to a shielding position and closing the device, and finishing a film coating experiment on the second sample 24;

and repeating the process steps until all the experimental areas are coated with the films, closing the equipment, breaking the vacuum, and taking out the substrate 23.

The utility model discloses continuous coating subassembly passes through the setting of second baffle 5, and second baffle 5 shelters from 23 partitions of basement and subregion coating film, to behind the regional coating film of basement 23 current, thereby second baffle 5 rotates for basement base 2 and shelters from this region and exposes another region, and target 3 carries out the coating film to the region that exposes, need not broken vacuum once more and evacuation, only need evacuation and broken vacuum once can accomplish a plurality of coating film basement 24, and it is consuming time to reduce the experiment, promotes coating film efficiency.

As shown in fig. 1 to 3, specifically, the target 3, the first baffle 4, the second baffle 5, the substrate 23 and the base seat 2 are sequentially arranged from bottom to top, the substrate 23 is divided into 4 experimental zones, the second baffle 5 is shaped like a sector of 270 °, the notch 51 is shaped like a sector of 90 °, the second baffle 5 is coaxial with the base seat 2, the base seat 2 is provided with a third driving member 61, the third driving member 61 is provided with a protective shell, an output shaft of the third driving member 61 is sleeved with a gear 62, the base seat 2 is rotatably connected with a gear ring 63 meshed with the gear 62, the gear ring 63 is coaxial with the base seat 2, and the gear ring 63 is connected with the second baffle 5 through a connecting rod.

When an experimental area of the substrate 23 needs to be coated, the third driving element 61 drives the second baffle 5 to rotate relative to the substrate base 2 through the gear 62 and the gear ring 63, so that the notch 51 is opposite to the experimental area, the corresponding process parameters are set, and after the ignition is stable, the first baffle 4 is rotated to enable the first baffle 4 to be located at the exposure position, and the target 3 is used for coating the experimental area of the substrate base.

As shown in fig. 1 and fig. 2, in some embodiments, the continuous coating module further includes a first driving member (not shown) and a first rotating shaft 41, the first rotating shaft 41 is located on one side of the substrate holder 2, one end of the first rotating shaft 41 is connected to a side wall of the first shutter 4, the other end of the first rotating shaft 41 penetrates through the casing 1 and is connected to the first driving member, at least a portion of the first shutter 4 is located between the target 3 and the second shutter 5, the first driving member drives the first rotating shaft 41 to rotate, and the first rotating shaft 41 drives the first shutter 4 to rotate along a circumferential direction of the first rotating shaft 41 to expose or shield the second shutter 5. After the glow is stable, the first driving piece is started to drive the first baffle 4 to move out of the space between the second baffle 5 and the target 3, so that the influence of unstable glow on the coating quality is prevented.

In some embodiments, the continuous plating assembly further includes a first sealing member, the first sealing member is sleeved on the first rotating shaft 41, an inner circumferential wall of the first sealing member abuts against the first rotating shaft 41, and an outer circumferential wall of the first sealing member abuts against the housing 1. Therefore, in the embodiments, the continuous coating assembly of the embodiment of the present invention improves the sealing performance of the housing 1 by the arrangement of the first sealing ring.

As shown in fig. 1 and 2, in some embodiments, the base 23 includes a second driving member (not shown), a second rotating shaft 21 and a connecting table 22, the second rotating shaft 21 is rotatably connected to the housing 1, one end of the second rotating shaft 21 is connected to the connecting table 22, the other end of the second rotating shaft 21 penetrates through the housing 1 and is connected to the second driving member, the second baffle 5 rotates synchronously with the base 2, and the connecting table 22 drives the base to rotate when the second rotating shaft 21 is driven to rotate by the second driving member.

As shown in fig. 1 and 2, in some embodiments, the connecting table 22 is coaxial with the second rotating shaft 21, so that when the second rotating shaft 21 rotates, the connecting table 22 rotates around the axis of the second rotating shaft 21 as a rotation center, the target 3 is multiple, the multiple targets 3 are distributed at intervals along the circumferential direction of the second rotating shaft 21, and the multiple targets 3 all face the center of the substrate holder 2. Therefore, in the embodiments, in the continuous coating assembly of the embodiments of the present invention, the connection table 22 is always kept rotating during the coating process, and the plurality of targets 3 coat the substrate 24 on the substrate 23, so that the coating is more uniform.

In some embodiments, the continuous plating assembly further includes a second sealing member, the second sealing member is disposed around the second shaft 21, an inner circumferential wall of the second sealing member abuts against the second shaft 21, and an outer circumferential wall of the second sealing member abuts against the housing 1. Therefore, in the embodiments, the continuous coating assembly provided by the embodiment of the present invention improves the sealing performance of the housing 1 through the arrangement of the second sealing ring.

Optionally, the second baffle 5 is a hard baffle.

Optionally, the second baffle 5 is a flexible baffle.

The magnetron sputtering device of the second aspect of the present invention includes the continuous plating assembly of any one of the above embodiments.

The utility model discloses magnetron sputtering device is through adopting above-mentioned continuous coating film subassembly, only needs evacuation and broken vacuum once to accomplish a plurality of coating film samples, and it is consuming time to reduce the experiment, promotes coating film efficiency.

In the description of the present invention, it is to be understood that the terms "center", "length", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the present invention.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.

In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," and "fixed" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally formed; may be mechanically coupled, may be electrically coupled or may be in communication with each other; they may be directly connected or indirectly connected through intervening media, or they may be interconnected within two elements or in a relationship where two elements interact with each other unless otherwise specifically limited. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.

In the present application, unless expressly stated or limited otherwise, the first feature may be directly on or directly under the second feature or indirectly via intermediate members. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.

In the present disclosure, the terms "one embodiment," "some embodiments," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present disclosure. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.

Although the above embodiments have been shown and described, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations to the above embodiments by those of ordinary skill in the art are intended to be within the scope of the present invention.

Claims (8)

1. A continuous coating assembly, comprising:

a housing having a sealed cavity;

a substrate holder connected to the housing and disposed within the sealed cavity, the substrate holder for mounting a substrate;

the target material is arranged in the sealed cavity and is used for sputtering atoms to the substrate;

a first shutter plate rotatably coupled to the housing, the first shutter plate having a blocking position in which at least a portion of the first shutter plate is positioned between the target and the substrate and an exposed position in which the first shutter plate is moved out from between the target and the substrate;

the second baffle plate is rotatably connected to the shell and can rotate by taking the axis of the substrate base as a rotation center, at least part of the second baffle plate is positioned between the substrate and the first baffle plate, the second baffle plate is provided with a notch, and the second baffle plate is used for blocking target atoms sputtered from the target material to a set position of the substrate.

2. The continuous plating assembly according to claim 1, further comprising a first driving member and a first rotating shaft, wherein one end of the first rotating shaft is connected to the first baffle, and the other end of the first rotating shaft penetrates through the housing and is connected to the first driving member.

3. The continuous plating assembly according to claim 2, further comprising a first sealing element, wherein the first sealing element is sleeved on the first rotating shaft, an inner circumferential wall of the first sealing element abuts against the first rotating shaft, and an outer circumferential wall of the first sealing element abuts against the housing.

4. The continuous plating assembly according to claim 1, wherein the substrate table comprises a second driving member, a second rotating shaft and a connecting table, the second rotating shaft is rotatably connected to the housing, one end of the second rotating shaft is connected to the connecting table, the other end of the second rotating shaft penetrates through the housing and is connected to the second driving member, and the second baffle plate and the connecting table rotate synchronously.

5. The continuous coating assembly of claim 4, wherein the connecting table is coaxial with the second axis, and the targets are spaced apart along the second axis, and are oriented toward the center of the substrate holder.

6. The continuous plating assembly according to claim 4, further comprising a second sealing member, wherein the second sealing member is disposed around the second shaft, an inner circumferential wall of the second sealing member abuts against the second shaft, and an outer circumferential wall of the second sealing member abuts against the housing.

7. The continuous coating assembly of claim 1, wherein the second baffle is a rigid baffle or the second baffle is a flexible baffle.

8. A magnetron sputtering apparatus comprising the continuous coating assembly according to any one of claims 1 to 7.

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