CN216712225U

CN216712225U - Cationic multi-arc ion plating constructional device is assisted to filament

Info

Publication number: CN216712225U
Application number: CN202220160254.XU
Authority: CN
Inventors: 许建平; 陈晶; 李青川; 王威
Original assignee: Heilongjiang Haizhen Technology Co ltd; Heilongjiang Institute of Technology
Current assignee: Heilongjiang Haizhen Technology Co ltd; Heilongjiang Institute of Technology
Priority date: 2022-01-20
Filing date: 2022-01-20
Publication date: 2022-06-10
Anticipated expiration: 2032-01-20

Abstract

A filament cation-assisted multi-arc ion plating structure device. The utility model aims at the problem that the existing multi-arc ion plating has low ionization rate for reactive gas. The utility model comprises a filament, an auxiliary anode flange, an auxiliary anode water inlet pipe, an auxiliary anode water outlet pipe and the like, wherein the auxiliary anode flange is detachably and hermetically arranged on the central top wall of a vacuum chamber through an auxiliary anode insulating sheet, and a cathode and an anode of an auxiliary anode power supply are respectively connected with the wall of the vacuum chamber and the auxiliary anode flange. The filament serves as an auxiliary anode to receive electrons, and simultaneously the filament is heated to high temperature to generate a large amount of thermal electrons, so that the ionization rate of reactive gas is enhanced.

Description

Cationic multi-arc ion plating constructional device is assisted to filament

Technical Field

The utility model relates to a filament-assisted cationic multi-arc ion plating structure device, and belongs to the field of coating preparation.

Background

The multi-arc ion plating is a physical vapor deposition method with high ionization rate, and is widely applied to the fields of aerospace, weaponry, electronic products and the like. The multi-arc ion plating is to evaporate target metal at high temperature by using high-speed moving arc spots in a vacuum environment to be plasma and deposit the target metal on the surface of a workpiece.

Although the ionization rate of multi-arc ion plating can reach 90%, the ionization rate of the target is only the target, and the ionization rate of the reactive gas is lower. When reactive gas element coatings such as O2, N2 and C2H2 are deposited by multi-arc ion plating, the ionization rate of the reactive gas is low, the components and the organization structure of the deposited coatings are influenced, and the complexity of the regulation and control of the deposition process is increased.

SUMMERY OF THE UTILITY MODEL

Aiming at the problem of low reactive gas ionization rate of the existing multi-arc ion plating, the utility model provides a filament auxiliary cation multi-arc ion plating structural device. The utility model discloses a method for preparing a multi-arc ion plating solution, which utilizes a filament as an auxiliary anode in the multi-arc ion plating, the filament receives electrons and is heated to high temperature to emit electrons, and the electrons moving to the filament and the heat emitted electrons of the filament simultaneously enhance the ionization of reactive gas in a deposition space of the multi-arc ion plating solution.

The technical scheme adopted by the utility model for solving the problems is as follows:

the utility model discloses a filament auxiliary cation multi-arc ion plating structural device, which comprises a filament 1, an auxiliary anode flange 2, an auxiliary anode water inlet pipe 3, an auxiliary anode water outlet pipe 4, an auxiliary anode insulating sheet 5, an auxiliary anode power supply 6, a multi-arc ion plating power supply 7, a bias power supply 8, a vacuum chamber 9, a vacuum pump 10, a workpiece 11, a sample rack 12, a sample rack rotating shaft 13, a multi-arc target 14, a target water inlet pipe 15, a target water outlet pipe 16, a left filament column 17, a right filament column 18, a target water cooling cavity 19 and an air inlet pipe 20,

the filament 1 is disassembled, fixedly and arranged on a filament column 17 and a right filament column 18, the left filament column 17 and the right filament column 18 are fixedly and fixedly welded on an auxiliary male flange 2, the auxiliary male flange 2 is of a water-cooling structure, an auxiliary male water inlet pipe 3 and an auxiliary male water outlet pipe 4 are hermetically and fixedly welded on the auxiliary male flange 2, the auxiliary male flange 2 is detachably and hermetically arranged on the central top wall of a vacuum chamber 9 through an auxiliary male insulating sheet 5, a target water-cooling cavity 19 is of a water-cooling structure, a target water inlet pipe 15 and a target water outlet pipe 16 are hermetically and fixedly welded on the target water-cooling cavity 19, a multi-arc target 14 is detachably and closely and fixedly arranged on the target water-cooling cavity 19, the target water-cooling cavity 19 is detachably and hermetically arranged on the left side wall of the vacuum chamber 9, working gas enters the inside of the vacuum chamber 9 through an air inlet pipe 20, a workpiece 11 is detachably arranged on a sample frame 12, the sample frame 12 is detachably arranged on a sample frame rotating shaft 13, the sample frame rotating shaft 13 is detachably and hermetically arranged on the central bottom wall of the vacuum chamber 9,

the cathode and the anode of the auxiliary anode power supply 6 are respectively connected with the wall of the vacuum chamber 9 and the auxiliary anode flange 2, the cathode and the anode of the multi-arc ion plating power supply 7 are respectively connected with the target water-cooling cavity 19 and the wall of the vacuum chamber 9, the cathode and the anode of the bias power supply 8 are respectively connected with the sample frame rotating shaft 13 and the wall of the vacuum chamber 9, and the vacuum pump 10 vacuumizes the vacuum chamber 9.

Furthermore, the auxiliary anode power supply 6 outputs current 1A-50A and output voltage 1V-100V.

The utility model has the beneficial effects that: the filament is used as an auxiliary anode, the filament not only receives electrons and is heated, but also generates a large amount of thermal electrons at high temperature, the reactive gas ionization rate of a deposition space of the multi-arc ion plating is enhanced, the width of a process window is increased, and scientific research and industrial requirements of depositing reactive coatings by the multi-arc ion plating are met.

Drawings

Fig. 1 is a schematic structural view of the present invention.

The names and reference numbers of the components involved in the figures are as follows:

the device comprises a filament 1, an auxiliary anode flange 2, an auxiliary anode water inlet pipe 3, an auxiliary anode water outlet pipe 4, an auxiliary anode insulating sheet 5, an auxiliary anode power supply 6, a multi-arc ion plating power supply 7, a bias power supply 8, a vacuum chamber 9, a vacuum pump 10, a workpiece 11, a sample frame 12, a sample frame rotating shaft 13, a multi-arc target 14, a target water inlet pipe 15, a target water outlet pipe 16, a left filament column 17, a right filament column 18, a target water cooling cavity 19 and an air inlet pipe 20.

Detailed Description

The first embodiment is as follows: the present embodiment is described with reference to fig. 1, and the filament auxiliary cation multi-arc ion plating structural device according to the present embodiment includes a filament 1, an auxiliary anode flange 2, an auxiliary anode water inlet tube 3, an auxiliary anode water outlet tube 4, an auxiliary anode insulating sheet 5, an auxiliary anode power supply 6, a multi-arc ion plating power supply 7, a bias power supply 8, a vacuum chamber 9, a vacuum pump 10, a workpiece 11, a sample rack 12, a sample rack rotating shaft 13, a multi-arc target 14, a target water inlet tube 15, a target water outlet tube 16, a left filament column 17, a right filament column 18, a target water cooling cavity 19, and an air inlet tube 20,

the filament 1 is disassembled, fixedly and arranged on a filament column 17 and a right filament column 18, the left filament column 17 and the right filament column 18 are fixedly and fixedly welded on an auxiliary male flange 2, the auxiliary male flange 2 is of a water-cooling structure, an auxiliary male water inlet pipe 3 and an auxiliary male water outlet pipe 4 are hermetically and fixedly welded on the auxiliary male flange 2, the auxiliary male flange 2 is detachably and hermetically arranged on the central top wall of a vacuum chamber 9 through an auxiliary male insulating sheet 5, a target water-cooling cavity 19 is of a water-cooling structure, a target water inlet pipe 15 and a target water outlet pipe 16 are hermetically and fixedly welded on the target water-cooling cavity 19, a multi-arc target 14 is detachably and closely and fixedly arranged on the target water-cooling cavity 19, the target water-cooling cavity 19 is detachably and hermetically arranged on the left side wall of the vacuum chamber 9, working gas enters the inside of the vacuum chamber 9 through an air inlet pipe 20, a workpiece 11 is detachably arranged on a sample frame 12, the sample frame 12 is detachably arranged on a sample frame rotating shaft 13, the sample frame rotating shaft 13 is detachably and hermetically arranged on the central bottom wall of the vacuum chamber 9, the cathode and the anode of the auxiliary anode power supply 6 are respectively connected with the wall of the vacuum chamber 9 and the auxiliary anode flange 2, the cathode and the anode of the multi-arc ion plating power supply 7 are respectively connected with the target water-cooling cavity 19 and the wall of the vacuum chamber 9, the cathode and the anode of the bias power supply 8 are respectively connected with the sample frame rotating shaft 13 and the wall of the vacuum chamber 9, and the vacuum pump 10 vacuumizes the vacuum chamber 9.

The second embodiment is as follows: the present embodiment will be described with reference to fig. 1, and the auxiliary anode power supply 6 of the filament auxiliary cation multi-arc ion plating structural device according to the present embodiment outputs a current of 1A to 50A and an output voltage of 1V to 100V. Other components and connections are the same as those in the first embodiment.

The working process of the utility model is as follows:

step one, installing a filament 1 on an auxiliary anode flange 2, and respectively connecting a cathode and an anode of an auxiliary anode power supply 6 with the wall of a vacuum chamber 9 and the auxiliary anode flange 2;

step two, mounting the target water-cooling cavity 19 on the left side wall of the vacuum chamber 9, and respectively connecting the cathode and the anode of the multi-arc ion plating power supply 7 with the target water-cooling cavity 19 and the wall of the vacuum chamber 9;

and step three, vacuumizing the vacuum chamber 9 by using a vacuum pump 10, injecting reactive gas through an air inlet pipe 20, and depositing a coating according to the process.

Although the present invention has been described with reference to a preferred embodiment, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the utility model as defined by the appended claims.

Claims

1. The utility model provides a cationic multi-arc ion plating constructional device is assisted to filament which characterized in that: the filament-assisted cationic multi-arc ion plating structure device comprises a filament (1), an auxiliary male flange (2), an auxiliary male water inlet pipe (3), an auxiliary male water outlet pipe (4), an auxiliary male insulating sheet (5), an auxiliary male power supply (6), a multi-arc ion plating power supply (7), a bias power supply (8), a vacuum chamber (9), a vacuum pump (10), a workpiece (11), a sample rack (12), a sample rack rotating shaft (13), a multi-arc target (14), a target water inlet pipe (15), a target water outlet pipe (16), a left filament column (17), a right filament column (18), a target water cooling cavity (19) and an air inlet pipe (20);

the filament (1) is disassembled, fixedly and fixedly arranged on a filament column 17 and a right filament column (18), the left filament column (17) and the right filament column (18) are fixedly and fixedly welded on an auxiliary male flange (2), the auxiliary male flange (2) is of a water-cooling structure, an auxiliary male water inlet pipe (3) and an auxiliary male water outlet pipe (4) are hermetically welded on the auxiliary male flange (2), the auxiliary male flange (2) is detachably and hermetically arranged on the central top wall of a vacuum chamber (9) through an auxiliary male insulating sheet (5), a target water-cooling chamber (19) is of a water-cooling structure, a target water inlet pipe (15) and a target water outlet pipe (16) are hermetically welded on the target water-cooling chamber (19), a multi-arc target (14) is detachably and closely and fixedly arranged on the target water-cooling chamber (19), the target water-cooling chamber (19) is detachably and hermetically arranged on the left side wall of the vacuum chamber (9) in an insulating manner, working gas enters the inside of the vacuum chamber (9) through a gas inlet pipe (20), and a workpiece (11) is detachably arranged on a sample frame (12), the sample frame (12) is detachably mounted on a sample frame rotating shaft (13), the sample frame rotating shaft (13) is detachably, insulatively and hermetically mounted on the central bottom wall of the vacuum chamber (9), the cathode and the anode of the auxiliary anode power supply (6) are respectively connected with the wall of the vacuum chamber (9) and the auxiliary anode flange (2), the cathode and the anode of the multi-arc ion plating power supply (7) are respectively connected with the target water cooling cavity (19) and the wall of the vacuum chamber (9), the cathode and the anode of the bias power supply (8) are respectively connected with the sample frame rotating shaft (13) and the wall of the vacuum chamber (9), and the vacuum pump (10) vacuumizes the vacuum chamber (9).

2. The filament cation multi-arc ion plating structural device as claimed in claim 1, wherein the auxiliary anode power supply (6) outputs current of 1A-50A and output voltage of 1V-100V.