CN216526728U

CN216526728U - Double-sided exposure machine for producing chip components

Info

Publication number: CN216526728U
Application number: CN202123057350.6U
Authority: CN
Inventors: 宋波; 王明涛
Original assignee: Zibo Chenqi Electronics Co ltd
Current assignee: Zibo Chenqi Electronics Co ltd
Priority date: 2021-12-08
Filing date: 2021-12-08
Publication date: 2022-05-13
Anticipated expiration: 2031-12-08

Abstract

The utility model discloses a double-sided exposure machine for producing chip components, which comprises a slide seat for the exposure machine, wherein the top of the slide seat is provided with a support frame, the left side and the right side of the support frame are respectively provided with a guide rod, the guide rods are sleeved with sliding blocks in a sliding manner, the middle part of the support frame is provided with a guide rail, one side of each of the two sliding blocks is provided with an upper positioning support plate, the slide seat is provided with a lower positioning support plate, the upper positioning support plate and the lower positioning support plate are respectively provided with an exposure hole, the upper positioning support plate is provided with an upper photoetching plate, the lower positioning support plate is provided with a lower photoetching plate, and the upper positioning support plate and the lower positioning support plate are respectively provided with a first positioning assembly and a second positioning assembly which are convenient to adjust; has the beneficial effects that: according to the utility model, through the guiding butt joint between the upper positioning support plate and the lower positioning support plate and the matching of the first positioning assembly and the second positioning assembly, the fixing efficiency of the production of the chip components is improved and the production cost is saved under the condition of ensuring the alignment precision of the double-sided exposure machine.

Description

Double-sided exposure machine for producing chip components

Technical Field

The utility model relates to the technical field of chip component production equipment, in particular to a double-sided exposure machine for chip component production.

Background

At present, the chip components are widely applied to various electronic devices, and the demand of the chip components is increased year by year. The chip components comprise semiconductor devices, the related parts are various in types, and a plurality of standards which are generally used in the industry are formed, namely, chip capacitance and resistance and the like; the exposure machine is needed to be used in the production process of the chip component.

The existing SB-602 type double-side exposure machine mainly comprises a thin double-layer three-dimensional alignment workbench, a frame loading mechanism, a mechanical arm, a pre-alignment platform, a double-optical-path exposure system, an alignment observation system, a mercury lamp power supply, an electrical control system, a leveling table frame and the like, has high alignment precision, but in some occasions with low precision requirements, the use of the SB-602 type double-side exposure machine can cause the rise of the production cost, and meanwhile, the working efficiency is low, and the production and the processing of a surface mounted device are not facilitated.

Disclosure of Invention

The utility model aims to provide a double-sided exposure machine for producing a chip component, which aims to solve the problems in the background technology.

In order to achieve the purpose, the utility model provides the following technical scheme: two-sided exposure machine is used in production of paster components and parts, including the slide that is used for the exposure machine, the top of slide is provided with the support frame, the left and right sides of support frame all is provided with the guide bar, the slider has been cup jointed in the slip on the guide bar, the middle part of support frame is provided with the guide rail, two one side of slider is provided with the location support board, be provided with down the location support board on the slide, go up the location support board and all seted up the exposure hole down in the location support board, upward be provided with the glazing photoetching board in the location support board down, be provided with down the photoetching board down in the location support board down, upward be provided with the first locating component and the second locating component of the adjustment of being convenient for respectively in location support board and the lower location support board.

Preferably, the guide rail is provided with an installation block in a sliding manner, the support frame is provided with an electric cylinder, and the telescopic end of the electric cylinder is welded with the installation block.

Preferably, the first positioning assembly and the second positioning assembly respectively comprise a plurality of wedges, and the wedges are respectively distributed at four corners of the upper positioning support plate and the lower positioning support plate.

Preferably, one side of the wedge block is provided with a telescopic rod, the telescopic rod is sleeved with a spring, one end of the telescopic rod, which is located on the upper positioning support plate, is provided with a first positioning block, and one end of the telescopic rod, which is located on the lower positioning support plate, is provided with a second positioning block.

Preferably, the first positioning block is provided with a jack, the second positioning block is provided with an insertion rod, and the upper positioning support plate is provided with a movable through groove.

Preferably, the movable through groove is obliquely arranged and parallel to the telescopic rod, and the inserting rods penetrate through the movable through groove and correspond to the inserting holes one to one.

Compared with the prior art, the utility model has the beneficial effects that:

according to the utility model, the upper positioning support plate and the lower positioning support plate are respectively provided with the first positioning assembly and the second positioning assembly, the upper positioning support plate and the lower positioning support plate are in guiding butt joint, and the first positioning assembly and the second positioning assembly are matched, so that the fixing efficiency of the production of the chip components is improved and the production cost is saved under the condition of ensuring the alignment precision of the double-sided exposure machine.

Drawings

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is a schematic structural view of a movable through slot and an exposure hole according to the present invention;

FIG. 3 is an enlarged schematic view of the structure of FIG. 1 at A.

In the figure: a slide base 1; a support frame 2; an electric cylinder 21; a guide rod 3; a slider 4; a guide rail 5; a mounting block 51; an upper positioning support plate 6; an upper photolithography plate 61; a lower positioning support plate 7; an exposure hole 71; a lower photolithography plate 72; a wedge 8; an expansion link 81; a spring 82; a first positioning block 83; a second positioning block 84; an insertion hole 85; an insert rod 86; the through slots 87 are moved.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1 to 3, the present invention provides a technical solution: a double-sided exposure machine for producing chip components comprises a slide seat 1 for the exposure machine, wherein the slide seat 1 is slidably arranged on a thin double-layer three-dimensional alignment workbench of an SB-602 type double-sided exposure machine, so that the chip components can be conveniently guided or taken, a support frame 2 is fixedly arranged at the top of the slide seat 1, the support frame 2 is fixed on the slide seat 1 through bolts, guide rods 3 are welded at the left side and the right side of the support frame 2, sliding blocks 4 are sleeved on the guide rods 3 in a sliding manner, a guide rail 5 is arranged in the middle of the support frame 2, a mounting block 51 is slidably connected on the guide rail 5, an electric cylinder 21 is fixedly arranged on the support frame 2, a telescopic end of the electric cylinder 21 is welded with the mounting block 51, an upper positioning support plate 6 is welded at one side of the two sliding blocks 4, a lower positioning support plate 7 is fixedly arranged on the slide seat 1, and the telescopic end of the electric cylinder 21 can perform telescopic motion by starting the electric cylinder 21, so that the mounting block 51 and the upper positioning support plate 6 slide up and down along the guide rail 5, and at the moment, the slide block 4 moves up and down along the axial direction of the guide rod 3, thereby ensuring the accuracy of butt joint between the upper positioning support plate 6 and the lower positioning support plate 7.

The upper positioning support plate 6 and the lower positioning support plate 7 are both provided with exposure holes 71, the exposure holes 71 are arranged to facilitate the exposure of upper and lower mercury lamps to chip component substrates through the exposure holes 71, the upper and lower mercury lamps are not shown in the attached drawings, the conventional instrument arrangement of the double-sided exposure machine is not repeated here, the upper positioning support plate 6 is provided with an upper photoetching plate 61, the lower positioning support plate 7 is provided with a lower photoetching plate 72, the upper photoetching plate 61 and the lower photoetching plate 72 are of the same size, the upper positioning support plate 6 and the lower positioning support plate 7 are respectively provided with a first positioning component and a second positioning component which are convenient to adjust, the first positioning component and the second positioning component respectively comprise a wedge block 8, the wedge blocks 8 are provided with a plurality of wedge blocks and are respectively distributed at four corners of the upper positioning support plate 6 and the lower positioning support plate 7, one side of the wedge block 8 is welded with a telescopic rod 81, the telescopic rod 81 is sleeved with a spring 82, the telescopic rod 81 has a telescopic function, the elastic force of the spring 82 can overcome the telescopic force of the telescopic rod 81 to provide an acting force, one end of the telescopic rod 81 positioned on the upper positioning support plate 6 is welded with a first positioning block 83, one end of the telescopic rod 81 positioned on the lower positioning support plate 7 is welded with a second positioning block 84, the first positioning block 83 is provided with an insertion hole 85, the second positioning block 84 is welded with an insertion rod 86, the upper positioning support plate 6 is provided with a moving through groove 87, the moving through groove 87 is obliquely arranged and parallel to the telescopic rod 81, the insertion rods 86 penetrate through the moving through groove 87 and correspond to the insertion holes 85 one by one, the alignment accuracy between the upper photoetching plate 61 and the lower photoetching plate 72 is ensured, when the upper photoetching plate 61 and the lower photoetching plate 72 are respectively placed on the upper positioning support plate 6 and the lower positioning support plate 7, under the elastic force of the spring 82, at this moment, the telescopic rod 81 extends, the upper photoetching plate 61 is clamped and pre-positioned by the first positioning block 83, the lower photoetching plate 72 is clamped and pre-positioned by the second positioning block 84, quick positioning is realized, and in addition, the upper positioning support plate 6 and the lower positioning support plate 7 are butted, so that the chip component substrate is positioned between the upper photoetching plate 61 and the lower photoetching plate 72 and then positioned, and subsequent quick and accurate exposure treatment is facilitated.

The working principle is as follows: in practical use, the upper photoetching plate 61 and the lower photoetching plate 72 are respectively placed on the upper positioning support plate 6 and the lower positioning support plate 7, under the elastic force action of the spring 82, the expansion rod 81 extends at the moment, the first positioning block 83 clamps and pre-positions the upper photoetching plate 61, the second positioning block 84 clamps and pre-positions the lower photoetching plate 72, so that quick and accurate positioning is realized, the device is suitable for photoetching plates with different sizes, in addition, by starting the electric cylinder 21, the telescopic end of the electric cylinder 21 performs telescopic motion, so that the mounting block 51 and the upper positioning support plate 6 slide up and down along the guide rail 5, the slide block 4 moves up and down along the axial direction of the guide rod 3 at the moment, the accuracy of butt joint between the upper positioning support plate 6 and the lower positioning support plate 7 is ensured, when the upper positioning support plate 6 and the lower positioning support plate 7 are butt joint, the insertion rod 86 penetrates through the moving through groove 87 and is inserted in the corresponding insertion hole 85, the chip component substrate is positioned between the upper photoetching plate 61 and the lower photoetching plate 72 and then positioned, so that subsequent rapid and accurate exposure treatment is facilitated, the process improves the fixing efficiency of chip component production and saves the production cost under the condition of ensuring the alignment precision of the double-sided exposure machine.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.

Claims

1. Two-sided exposure machine is used in production of paster components and parts, including slide (1) that is used for the exposure machine, its characterized in that: the top of slide (1) is provided with support frame (2), the left and right sides of support frame (2) all is provided with guide bar (3), slider (4) have been cup jointed in the slip on guide bar (3), the middle part of support frame (2) is provided with guide rail (5), two one side of slider (4) is provided with location support board (6), be provided with down location support board (7) on slide (1), all seted up exposure hole (71) on going up location support board (6) and lower location support board (7), upward be provided with on location support board (6) and polish board (61), be provided with down on location support board (7) down and polish board (72), upward be provided with the first locating component and the second locating component of the adjustment of being convenient for on location support board (6) and lower location support board (7) respectively.

2. The double-sided exposure machine for producing the patch element as claimed in claim 1, wherein: the sliding device is characterized in that a mounting block (51) is arranged on the guide rail (5), an electric cylinder (21) is arranged on the support frame (2), and the telescopic end of the electric cylinder (21) is welded with the mounting block (51).

3. The double-sided exposure machine for producing the patch element as claimed in claim 1, wherein: the first positioning assembly and the second positioning assembly respectively comprise a wedge block (8), the wedge blocks (8) are arranged in a plurality of positions and are respectively distributed at four corners of the upper positioning support plate (6) and the lower positioning support plate (7).

4. The double-sided exposure machine for producing the patch element as claimed in claim 3, wherein: one side of voussoir (8) is provided with telescopic link (81), spring (82) have been cup jointed on telescopic link (81), be located last location backup pad (6) the one end of telescopic link (81) is provided with first locating piece (83), be located down location backup pad (7) the one end of telescopic link (81) is provided with second locating piece (84).

5. The double-sided exposure machine for producing the patch element as claimed in claim 4, wherein: the first positioning block (83) is provided with an insertion hole (85), the second positioning block (84) is provided with an insertion rod (86), and the upper positioning support plate (6) is provided with a moving through groove (87).

6. The double-sided exposure machine for producing the patch element as claimed in claim 5, wherein: the movable through grooves (87) are obliquely arranged and parallel to the telescopic rods (81), and the inserting rods (86) penetrate through the movable through grooves (87) and the inserting holes (85) to correspond to one another.