CN216514243U - 一种具备氨泄漏检测功能的氮化镓晶体生长装置 - Google Patents
一种具备氨泄漏检测功能的氮化镓晶体生长装置 Download PDFInfo
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- CN216514243U CN216514243U CN202122759525.1U CN202122759525U CN216514243U CN 216514243 U CN216514243 U CN 216514243U CN 202122759525 U CN202122759525 U CN 202122759525U CN 216514243 U CN216514243 U CN 216514243U
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- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 title claims abstract description 113
- 238000001514 detection method Methods 0.000 title claims abstract description 59
- 239000013078 crystal Substances 0.000 title claims abstract description 45
- 229910021529 ammonia Inorganic materials 0.000 title claims abstract description 42
- 229910002601 GaN Inorganic materials 0.000 title claims abstract description 41
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 238000001513 hot isostatic pressing Methods 0.000 claims abstract description 22
- 238000010438 heat treatment Methods 0.000 claims description 13
- 238000001816 cooling Methods 0.000 claims description 6
- 238000005192 partition Methods 0.000 claims description 6
- 239000002994 raw material Substances 0.000 claims description 5
- 229910000831 Steel Inorganic materials 0.000 claims description 4
- 238000009413 insulation Methods 0.000 claims description 4
- 239000010959 steel Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 26
- 238000012423 maintenance Methods 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000007789 sealing Methods 0.000 abstract description 2
- 239000002904 solvent Substances 0.000 abstract description 2
- 230000006837 decompression Effects 0.000 description 17
- 238000011946 reduction process Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 238000002248 hydride vapour-phase epitaxy Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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CN202122759525.1U CN216514243U (zh) | 2021-11-11 | 2021-11-11 | 一种具备氨泄漏检测功能的氮化镓晶体生长装置 |
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CN202122759525.1U CN216514243U (zh) | 2021-11-11 | 2021-11-11 | 一种具备氨泄漏检测功能的氮化镓晶体生长装置 |
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Address after: 247100 Room 201, 2nd Floor, Comprehensive Building, Ningju Industrial Park, Wanjiang Jiangnan Emerging Industry Concentration Zone, Chizhou City, Anhui Province Patentee after: Weiga Core Materials (Chizhou) Semiconductor Technology Co.,Ltd. Country or region after: China Patentee after: SICHUAN AVIATION INDUSTRY CHUANXI MACHINE Co.,Ltd. Address before: 2706, block B, olive PENGYUAN, 3030 CaiTian Road, Xintian community, Huafu street, Futian District, Shenzhen, Guangdong 518000 Patentee before: Shenzhen weiga core semiconductor technology Co.,Ltd. Country or region before: China Patentee before: SICHUAN AVIATION INDUSTRY CHUANXI MACHINE Co.,Ltd. |