CN216335228U

CN216335228U - Tool for cleaning glass substrate

Info

Publication number: CN216335228U
Application number: CN202122448689.2U
Authority: CN
Inventors: 何洁龙
Original assignee: Xiajiang Rongtiangao New Intelligent Manufacturing Co ltd
Current assignee: Xiajiang Rongtiangao New Intelligent Manufacturing Co ltd
Priority date: 2021-10-12
Filing date: 2021-10-12
Publication date: 2022-04-19
Anticipated expiration: 2031-10-12

Abstract

The utility model provides a tool for cleaning a glass substrate, and relates to the technical field of liquid crystal display production. The glass substrate cleaning tool comprises an outer support, an inner support, a mounting plate and a vacuum chuck. The outer support comprises a bottom plate, a side plate and a top cover which are sequentially connected from bottom to top. The inner support is positioned inside the outer support and comprises a support rod, a support plate and a connecting column. The mounting disc is connected to the upper part of the connecting column through a connecting mechanism. A plurality of vacuum suction cups are mounted on the mounting plate. The connecting mechanism comprises a sleeve, a connecting hole matched with the sleeve is formed in the mounting disc, a notch is formed in the sleeve along the length direction of the sleeve, and a convex block matched with the notch is arranged on the upper portion of the connecting column along the radial direction of the connecting column. The vacuum chuck is arranged on the mounting plate, and the mounting plate is connected with the connecting column through a connecting mechanism. When the condition that the glass substrate drops easily because of suction is not enough appears because of vacuum chuck's size is less, but whole change mounting disc and a plurality of vacuum chuck avoid appearing the condition that the glass substrate dropped.

Description

Tool for cleaning glass substrate

Technical Field

The utility model relates to the technical field of liquid crystal display production, in particular to a tool for cleaning a glass substrate.

Background

The liquid crystal display needs to be subjected to procedures of cleaning, COG, FOG, microscopic examination, FOG electrical measurement, silver paste dispensing, LCM test, high-temperature glue pasting, welding, backlight assembling, easy tearing and pasting, drying, glue sealing and the like in the production process.

The glass substrate is a basic component constituting a liquid crystal display device, and the surface of the glass substrate needs to be cleaned before the COG process is performed. At present, the surface of the glass substrate is generally cleaned by a wet cleaning method, that is, the surface of the glass substrate is cleaned by a cleaning solvent, and then the glass substrate is dried after cleaning. Obviously, the method has the problem that the drying process is needed after cleaning, which is more complicated.

In order to solve the above problems, a plasma cleaning machine is used to clean a glass substrate. The plasma cleaning machine has the working principle that in a vacuum cavity, a radio frequency power supply is used for starting under a certain pressure to generate high-energy disordered plasma, and the plasma bombards the surface of a cleaned product to achieve the cleaning purpose.

The plasma cleaning machine is internally provided with a tool for fixing a glass substrate, however, the existing tool has the problems that the glass substrate is not firmly fixed and is easy to drop and damage, and needs to be improved.

SUMMERY OF THE UTILITY MODEL

In view of the above situation, the utility model provides a tool for cleaning a glass substrate, which solves the technical problems that the existing tool is easy to fix the glass substrate insecurely and the glass substrate is easy to drop and damage.

In order to achieve the purpose, the utility model provides the following technical scheme:

a tool for cleaning a glass substrate mainly comprises: outer support, inner support, mounting disc and vacuum chuck.

The outer bracket comprises a bottom plate, a side plate and a top cover which are sequentially connected from bottom to top, and the top cover is provided with a through hole through which a cleaning spray head of the plasma cleaning machine can pass.

The inner support is positioned inside the outer support and comprises a support rod, a support plate and a connecting column. The supporting plate is arranged on the bottom plate through the supporting rod, and the connecting column is arranged on the supporting plate.

The mounting disc is connected to the upper part of the connecting column through a connecting mechanism.

A plurality of vacuum chuck install on the mounting disc, vacuum chuck and vacuum pump connection.

Coupling mechanism includes the sleeve, offers the connecting hole with sleeve matching on the mounting disc, and the telescopic upper end outside has first spacing portion, and the lower extreme outside has the spacing portion of second, and first spacing portion butt is at the upside of mounting disc, and the spacing portion butt of second is at the downside of mounting disc. The sleeve is provided with a notch along the length direction of the sleeve, and the upper part of the connecting column is provided with a convex block matched with the notch along the radial direction of the connecting column.

In some embodiments of the present invention, the connecting column is inserted into the support plate, and the connecting column can be driven by the lifting mechanism to ascend or descend.

In some embodiments of the utility model, the lifting mechanism comprises a servo motor and a cam in transmission connection, the lower part of the connecting column is radially fixed with a push plate, and the cam is used for jacking the push plate.

In some embodiments of the present invention, the support plate is provided with a buffer spring, and the top of the buffer spring is provided with a buffer ring which is sleeved on the connecting column.

In some embodiments of the utility model, two material conveying plates are symmetrically connected to the bottom of the top cover, the mounting disc is located between the two material conveying plates, a supporting plate for supporting the glass substrate is mounted on the inner side of each material conveying plate, and the glass substrate can move to the position above the mounting disc along the material conveying plates under the driving of the material conveying mechanism.

In some embodiments of the present invention, the feeding mechanism includes a plurality of feeding rollers, the feeding plate has a mounting opening, the feeding rollers are rotatably connected to the mounting opening, and the feeding rollers abut against two sides of the glass substrate. The conveying roller can rotate under the action of the driving assembly.

In some embodiments of the utility model, the drive assembly comprises a drive motor drivingly connected to the feed roller.

In some embodiments of the utility model, any two adjacent feed rollers are connected by a drive gear.

The embodiment of the utility model at least has the following advantages or beneficial effects:

1. the vacuum chuck is arranged on the mounting plate, and the mounting plate is connected with the connecting column through a connecting mechanism. When the condition that the glass substrate drops easily because of suction is not enough appears because of vacuum chuck's size is less, but whole change mounting disc and a plurality of vacuum chuck, the size of the vacuum chuck after the change is bigger, and is bigger with the area of contact of glass substrate, can adsorb the glass substrate better, avoids appearing the condition that the glass substrate dropped.

2. The cleaning nozzle of the plasma cleaning machine can penetrate through the top cover and extend into the inner part of the outer top cover so as to clean the surface of the glass substrate. When having placed a plurality of glass substrates in the plasma cleaning machine, the top cap can play certain effect of blockking to the dirty gas that produces when wasing the glass substrate to avoid dirty gas to fly about in the plasma cleaning machine and fall on other glass substrates to a certain extent.

Additional features and advantages of the utility model will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the utility model. The objectives and other advantages of the utility model will be realized and attained by the structure particularly pointed out in the written description and claims hereof as well as the appended drawings.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.

FIG. 1 is a schematic structural view of a tool for cleaning a glass substrate;

FIG. 2 is a schematic view of the structure of FIG. 1 along direction A;

FIG. 3 is a schematic structural view of the inner support, the mounting plate and the vacuum chuck;

FIG. 4 is a schematic view of the structure of FIG. 3 along direction B;

FIG. 5 is a schematic view of the sleeve and connecting post construction;

fig. 6 is a partially enlarged view of the position C in fig. 1.

Icon: 11-outer support, 111-bottom plate, 112-side plate, 113-top cover, 114-through hole, 12-inner support, 121-support rod, 122-support plate, 123-connecting column, 124-lug, 13-mounting plate, 14-vacuum chuck, 151-sleeve, 152-first limiting part, 153-second limiting part, 154-notch, 161-servo motor, 162-cam, 163-push plate, 164-buffer spring, 165-buffer ring, 171-material conveying plate, 172-support plate, 173-material conveying roller, 174-mounting hole, 175-driving motor, 176-transmission gear and 21-cleaning spray head.

Detailed Description

In the following, only certain exemplary embodiments are briefly described. As those skilled in the art will recognize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the embodiments of the utility model. Accordingly, the drawings and description are to be regarded as illustrative in nature, and not as restrictive.

In the embodiments of the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," "fixed," and the like are to be construed broadly, e.g., as being fixedly connected, detachably connected, or integrated; the connection can be mechanical connection, electrical connection or communication; either directly or indirectly through intervening media, either internally or in any other relationship. Specific meanings of the above terms in the embodiments of the present invention can be understood by those of ordinary skill in the art according to specific situations.

Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

Examples

Referring to fig. 1 to 6, the present embodiment provides a tool for cleaning a glass substrate, which mainly includes: outer support 11, inner support 12, mounting plate 13 and vacuum chuck 14.

The external bracket 11 comprises a bottom plate 111, a side plate 112 and a top cover 113 which are connected in sequence from bottom to top, and the top cover 113 is provided with a through hole 114 for a cleaning nozzle 21 of the plasma cleaning machine to pass through. The inner frame 12 is located inside the outer frame 11, and the inner frame 12 includes a strut 121, a support plate 122 and a connecting column 123. A support plate 122 is mounted on the base plate 111 via a strut 121, and a connecting post 123 is mounted on the support plate 122. The mounting plate 13 is connected to the upper portion of the connection post 123 by a connection mechanism. A plurality of vacuum suction cups 14 are installed on the installation plate 13, and the vacuum suction cups 14 are connected to a vacuum pump. Coupling mechanism includes sleeve 151, has seted up the connecting hole that matches with sleeve 151 on the mounting disc 13, and the upper end outside of sleeve 151 has first spacing portion 152, and the lower extreme outside has the spacing portion 153 of second, and first spacing portion 152 butt is at the upside of mounting disc 13, and the spacing portion 153 butt of second is at the downside of mounting disc 13. The sleeve 151 is provided with a notch 154 along the length direction thereof, and the upper portion of the connecting post 123 is provided with a projection 124 along the radial direction thereof, which is matched with the notch 154.

The vacuum chuck 14 is mounted on the mounting plate 13, and the mounting plate 13 is connected with the connecting column 123 through a connecting mechanism. When the condition that the glass substrate drops easily because of suction is not enough appears because of vacuum chuck 14's size is less, but whole change mounting disc 13 and a plurality of vacuum chuck 14, vacuum chuck 14's after the change size is bigger, and the area of contact with the glass substrate is bigger, can adsorb the glass substrate better, avoids appearing the condition that the glass substrate dropped. The cleaning nozzle 21 of the plasma cleaning machine can penetrate the top cover 113 to protrude into the interior of the outer top cover 113 so as to clean the surface of the glass substrate. When placing a plurality of glass substrates in the plasma cleaning machine, top cap 113 can play certain effect of blockking to the dirty gas that produces when wasing the glass substrate to avoid dirty gas to fly around and fall on other glass substrates in the plasma cleaning machine to a certain extent.

The connecting column 123 is inserted into the support plate 122, and the connecting column 123 can be driven by the lifting mechanism to ascend or descend so as to adjust the distance between the glass substrate and the cleaning nozzle 21. Specifically, in the present embodiment, the lifting mechanism includes a servo motor 161 and a cam 162 that are connected in a transmission manner, a push plate 163 is radially fixed to a lower portion of the connection post 123, and the cam 162 is used for lifting up the push plate 163. The servo motor 161 drives the cam 162, and the cam 162 can drive the connecting column 123 to move upwards. The support plate 122 is provided with a buffer spring 164, the top of the buffer spring 164 is provided with a buffer ring 165, and the buffer ring 165 is sleeved on the connecting column 123. When the connecting column 123 moves downwards, the mounting plate 13 moves downwards, and the buffer spring 164 and the buffer ring 165 can play a certain buffer role to reduce the impact on the glass substrate in the downward movement process.

A plurality of glass substrates can be placed in the plasma cleaning machine at the same time. Two material-feeding plates 171 are symmetrically connected to the bottom of the top cover 113, and the two material-feeding plates 171 may be welded to the top cover 113, for example. The mounting plate 13 is located between the two material feeding plates 171, a supporting plate 172 for supporting the glass substrate is mounted on the inner side of the material feeding plate 171 (the side where the two material feeding plates 171 face each other), and the glass substrate can be moved to the upper side of the mounting plate 13 along the material feeding plate 171 by the driving of the material feeding mechanism. A plurality of glass substrates are sequentially placed on the supporting plate 172, when the glass substrates are driven by the material conveying mechanism to move to a position between the top cover 113 and the mounting plate 13, the servo motor 161 drives the cam 162 to rotate, the connecting column 123 drives the mounting plate 13 to move upwards, the vacuum chuck 14 can suck the glass substrates and continuously drive the glass substrates to move upwards to the position near the cleaning nozzle 21 in the process of moving upwards of the mounting plate 13 so as to clean the glass substrates, after the glass substrates are cleaned, the connecting column 123 drives the glass substrates to move downwards, when the glass substrates abut against the supporting plate 172, the vacuum chuck 14 stops working, and at the moment, the glass substrates continuously move to the outer part of the outer support 11 along the material conveying plate 171 so as to clean the next glass substrate.

In this embodiment, the feeding mechanism includes a plurality of feeding rollers 173, the feeding plate 171 is opened with a mounting opening 174, the feeding rollers 173 are rotatably connected to the mounting opening 174, and the feeding rollers 173 abut against both sides of the glass substrate. The feed roller 173 is rotatable by a drive assembly. When the material delivery roller 173 rotates, the glass substrate can be driven to move. To facilitate rotation of the feed roller 173, the drive assembly includes a drive motor 175, and the drive motor 175 is drivingly connected to the feed roller 173. To better move the glass substrate, any two adjacent delivery rollers 173 are connected by a transmission gear 176. The delivery roller 173 may be covered with a rubber cover (not shown) to prevent damage to the glass substrate.

With the above structure, the working principle of the tool for cleaning a glass substrate will be described in detail below.

The tool for cleaning the glass substrate is fixed inside the plasma cleaning machine through the bottom plate 111, then a plurality of glass substrates are sequentially placed on the supporting plate 172 along the length direction of the material conveying plate 171, the driving motor 175 enables the material conveying roller 173 to rotate, the material conveying roller 173 drives the glass substrates to move, when the glass substrates move between the top cover 113 and the mounting plate 13, the servo motor 161 drives the cam 162 to rotate, the connecting column 123 drives the mounting plate 13 to move upwards, in the process that the mounting plate 13 moves upwards, the vacuum chuck 14 can suck the glass substrates and continuously drive the glass substrates to move upwards to the vicinity of the cleaning nozzle 21, and the cleaning nozzle 21 sprays plasma gas to clean the glass substrates. After the glass substrate is cleaned, the connection post 123 drives the glass substrate to move downward, and when the glass substrate abuts against the supporting plate 172, the vacuum chuck 14 stops working, and at this time, the glass substrate continues to move along the material conveying plate 171 to the outside of the external frame 11, so as to clean the next glass substrate.

In the process of using the glass substrate cleaning tool, if the situation that the glass substrate is easy to drop due to insufficient suction force occurs because the size of the vacuum chuck 14 is small, the plasma cleaning machine can be stopped firstly, then the sleeve 151 is rotated, the connecting hole is aligned with the lug 124, at the moment, the mounting plate 13 can be lifted upwards, and the mounting plate 13 and the plurality of vacuum chucks 14 located on the mounting plate 13 can be directly and integrally replaced. The size of the vacuum chuck 14 after replacement is larger, the contact area with the glass substrate is larger, the glass substrate can be better adsorbed, and the phenomenon that the glass substrate falls off is avoided.

Finally, it should be noted that: the present invention is not limited to the above-described preferred embodiments, but various modifications and changes can be made by those skilled in the art, and the embodiments and features of the embodiments of the present invention can be combined with each other arbitrarily without conflict. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. The utility model provides a glass substrate washs and uses frock which characterized in that includes: the device comprises an outer support, an inner support, a mounting plate and a vacuum chuck;

the outer bracket comprises a bottom plate, a side plate and a top cover which are sequentially connected from bottom to top, and the top cover is provided with a through hole through which a cleaning spray head of the plasma cleaning machine can pass;

the inner support is positioned inside the outer support and comprises a support rod, a support plate and a connecting column; the support plate is arranged on the bottom plate through the support rod, and the connecting column is arranged on the support plate;

the mounting disc is connected to the upper part of the connecting column through a connecting mechanism;

the vacuum suction cups are mounted on the mounting plate and connected with a vacuum pump;

the connecting mechanism comprises a sleeve, a connecting hole matched with the sleeve is formed in the mounting disc, a first limiting part is arranged on the outer side of the upper end of the sleeve, a second limiting part is arranged on the outer side of the lower end of the sleeve, the first limiting part abuts against the upper side of the mounting disc, and the second limiting part abuts against the lower side of the mounting disc; the sleeve is provided with a notch along the length direction of the sleeve, and the upper part of the connecting column is provided with a convex block matched with the notch along the radial direction of the connecting column.

2. The glass substrate cleaning tool according to claim 1, wherein the connecting column is inserted into the support plate and can be driven by the lifting mechanism to ascend or descend.

3. The glass substrate washs and uses frock of claim 2, characterized in that elevating system includes servo motor and the cam of transmission connection, the lower part of spliced pole is fixed with the push pedal radially, the cam is used for the jacking the push pedal.

4. The glass substrate cleaning tool according to claim 3, wherein a buffer spring is mounted on the support plate, a buffer ring is mounted on the top of the buffer spring, and the buffer ring is sleeved on the connecting column.

5. The glass substrate cleaning tool according to claim 2, wherein two material conveying plates are symmetrically connected to the bottom of the top cover, the mounting plate is located between the two material conveying plates, a supporting plate for supporting the glass substrate is mounted on the inner side of the material conveying plates, and the glass substrate can be driven by the material conveying mechanism to move along the material conveying plates to the position above the mounting plate.

6. The glass substrate cleaning tool according to claim 5, wherein the feeding mechanism comprises a plurality of feeding rollers, the feeding plate is provided with a mounting opening, the feeding rollers are rotatably connected to the mounting opening, and the feeding rollers abut against two sides of the glass substrate; the conveying roller can rotate under the action of the driving assembly.

7. The glass substrate cleaning tool according to claim 6, wherein the driving assembly comprises a driving motor, and the driving motor is in transmission connection with the delivery roller.

8. The glass substrate cleaning tool according to claim 7, wherein any two adjacent delivery rollers are connected through a transmission gear.