CN215847526U - Polishing machine and full-automatic polishing machine system - Google Patents

Polishing machine and full-automatic polishing machine system Download PDF

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Publication number
CN215847526U
CN215847526U CN202121176190.4U CN202121176190U CN215847526U CN 215847526 U CN215847526 U CN 215847526U CN 202121176190 U CN202121176190 U CN 202121176190U CN 215847526 U CN215847526 U CN 215847526U
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China
Prior art keywords
main shaft
adsorption
vacuum
disc
polishing machine
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李新良
刘亚彪
周继国
杨友贵
杨会义
刘中文
张雪祥
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HUNAN YONGCHUANG ELECTROMECHANICAL EQUIPMENT CO Ltd
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HUNAN YONGCHUANG ELECTROMECHANICAL EQUIPMENT CO Ltd
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Abstract

The utility model provides a polishing machine with a vacuum adsorption disc, which comprises a polishing machine body, wherein the polishing machine body comprises a lower fixed disc and an upper fixed disc, the vacuum adsorption disc is fixedly arranged on the lower fixed disc or the upper fixed disc, an air passage communication hole (an adsorption hole is formed in the surface) is formed in the vacuum adsorption disc, a pressure adjusting assembly is connected through the air passage communication hole, the pressure adjusting assembly comprises a main shaft and an air pump, and the main shaft comprises a first main shaft and a second main shaft which are mutually and hermetically connected. The utility model also provides a full-automatic polishing machine system which comprises the automatic feeding and discharging mechanical arm and the polishing machine. The main shaft is divided into the first main shaft and the second main shaft, and when the fixed disc needs to be ground, the first main shaft is taken down without taking down the whole main shaft. The main shaft is arranged in a segmented mode, and maintenance operation of a follow-up fixed disc is facilitated.

Description

Polishing machine and full-automatic polishing machine system
Technical Field
The utility model belongs to the field of glass processing equipment, and particularly relates to a polishing machine and a polishing machine system.
Background
In order to flatten the glass surface, polishing is usually performed on the glass surface, and the polishing machine is a mechanical device for polishing glass. All adsorb glass to the price fixing through the adsorption pad during traditional burnishing machine polishing glass on, the last unloading of glass of this kind of polishing mode can only be accomplished by the manual work, and manual operation moves slowly, and fragile glass influences the yields, and glass's quality can be influenced to hand touch moreover.
To the mode that glass among the above-mentioned traditional mode carries out the polishing through the absorption pad absorption, mention among the prior art and utilize the vacuum adsorption dish to add the mode absorption glass of absorption pad, thereby realize the absorption and the peeling off of vacuum adsorption dish to glass through the gas circuit switching of control vacuum adsorption dish, this kind of mode can alleviate the operation volume of artifical unloading of going up to a certain extent. However, when the vacuum adsorption disc is arranged on the fixed disc, the fixed disc is required to be provided with a through hole through which the air passage passes due to the existence of the vacuum air passage, and the vacuum air passage is required to be connected with the vacuum adsorption disc, so that the vacuum adsorption disc is inevitably protruded. When the polishing machine is used for a period of time, the fixed disc plane is not uniform and needs to be ground, at the moment, the vacuum air path protrudes out of the fixed disc, and the grinding process of the fixed disc can be influenced by the existence of the vacuum air path. And the vacuum gas circuit is connected with a plurality of parts, and the vacuum gas circuit is cumbersome and inconvenient to take down.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem of overcoming the defects and shortcomings in the background technology, and provides a polishing machine with a vacuum adsorption disc and a full-automatic polishing machine system with automatic feeding and discharging, wherein the polishing machine is convenient for fixed disc grinding and maintenance. In order to solve the technical problems, the technical scheme provided by the utility model is as follows:
the utility model provides a take burnishing machine of vacuum adsorption dish, includes the burnishing machine body, the burnishing machine body includes the price fixing down, the vacuum adsorption dish set firmly in under on the price fixing, the last air flue intercommunicating pore (the surface is seted up and is adsorbed the hole) of having seted up of vacuum adsorption dish, and pass through the air flue intercommunicating pore is connected with pressure adjusting assembly, pressure adjusting assembly includes main shaft and air pump, the main shaft includes mutual sealing connection first main shaft and second main shaft, first main shaft passes the vacuum adsorption dish with the air flue intercommunicating pore intercommunication, the second main shaft passes the price fixing down with first main shaft is connected. Other structures of the polishing machine are the prior art, and other patent documents of the applicant can be referred to.
In the above polishing machine, preferably, a sealing ring for sealing the first spindle and the vacuum adsorption disc is arranged on the outer wall of the first spindle, and a sealing ring for sealing the second spindle and the lower fixed disc is arranged on the outer wall of the second spindle. According to the utility model, the sealing ring is arranged on the first main shaft, so that the sealing between the vacuum adsorption disc and the first main shaft can be ensured, and the sealing ring is arranged on the second main shaft, so that the sealing between the lower fixed disc and the second main shaft can be ensured.
In the above polishing machine, preferably, a vacuum pipe is arranged in the spindle, one end of the vacuum pipe is connected to the air pump, and the other end of the vacuum pipe is communicated with the air passage communication hole in the vacuum adsorption disc. The air pressure in the adsorption vacuum cavity of the vacuum adsorption disc can be adjusted through the vacuum pipeline by opening and closing the air pump so as to achieve the purpose of adsorbing or stripping the polishing piece.
In the above polishing machine, preferably, the vacuum adsorption disc is fixedly arranged on the lower fixed disc by one of the following installation methods:
the vacuum adsorption disc is directly arranged on the surface of the lower fixed disc in a protruding mode through a fixing strip; under this kind of circumstances, vacuum adsorption dish direct mount need not to carry out the institutional advancement to lower price fixing on the lower price fixing upper surface, only need the trompil supply the main shaft pass can.
The lower fixed disc is provided with a groove for accommodating the vacuum adsorption disc, and the vacuum adsorption disc is arranged in the groove. Under the condition, the vacuum adsorption disc can be placed in the groove as an independent external part, the surface of the vacuum adsorption disc and the surface of the lower fixed disc are flush, or the vacuum adsorption disc is directly processed in the lower fixed disc, so that the purpose of the external vacuum adsorption disc is achieved, and the structural forms can meet the requirements of the external vacuum adsorption disc.
In the utility model, the vacuum adsorption disc is fixed on the lower fixed disc, the vacuum adsorption disc is vacuumized through a vacuum pipeline in the main shaft, 2 sealing rings (2 can be installed) are installed on the first main shaft in order to ensure the sealing between the vacuum adsorption disc and the first main shaft, and 2 sealing rings (2 can be installed) are installed on the second main shaft in order to ensure the sealing between the lower fixed disc and the second main shaft. In addition, after the polishing machine is used for a period of time, the situation that the plane of the lower fixed plate is not uniform and needs to be ground may occur, at the moment, the main shaft protrudes out of the lower fixed plate, and the grinding process of the lower fixed plate is influenced by the existence of the main shaft. And the main shaft is connected with a plurality of parts, and the main shaft is cumbersome and inconvenient to take down. The main shaft is divided into the first main shaft and the second main shaft, and when the lower fixed plate needs to be ground, the first main shaft is taken down without taking down the whole main shaft. The spindle is arranged in a segmented manner, so that the subsequent maintenance operation is facilitated.
As a general technical concept, the present invention further provides a polishing machine with a vacuum adsorption disc, which includes a polishing machine body, wherein the polishing machine body includes an upper fixed disc, the vacuum adsorption disc is fixedly disposed on the upper fixed disc, the vacuum adsorption disc is provided with an air passage communication hole (the surface of the vacuum adsorption disc is provided with an adsorption hole), and is connected with a pressure adjusting assembly through the air passage communication hole, the pressure adjusting assembly includes a main shaft and an air pump, the main shaft includes a first main shaft and a second main shaft which are hermetically connected with each other, the first main shaft penetrates through the vacuum adsorption disc and is communicated with the air passage communication hole, and the second main shaft penetrates through the upper fixed disc and is connected with the first main shaft. Other structures of the polishing machine are the prior art, and other patent documents of the applicant can be referred to.
In the above polishing machine, preferably, a sealing ring for sealing the first spindle and the vacuum adsorption disc is arranged on the outer wall of the first spindle, and a sealing ring for sealing the second spindle and the upper fixed disc is arranged on the outer wall of the second spindle. According to the utility model, the sealing ring is arranged on the first main shaft, so that the sealing between the vacuum adsorption disc and the first main shaft can be ensured, and the sealing ring is arranged on the second main shaft, so that the sealing between the upper fixed disc and the second main shaft can be ensured.
In the above polishing machine, preferably, a vacuum pipe is arranged in the spindle, one end of the vacuum pipe is connected to the air pump, and the other end of the vacuum pipe is communicated with the air passage communication hole in the vacuum adsorption disc. The air pressure in the adsorption vacuum cavity of the vacuum adsorption disc can be adjusted through the vacuum pipeline by opening and closing the air pump so as to achieve the purpose of adsorbing or stripping the polishing piece.
In the above polishing machine, preferably, the vacuum adsorption disc is fixedly arranged on the upper fixed disc by one of the following installation methods:
the vacuum adsorption disc is directly arranged on the surface of the upper fixed disc in a protruding mode through a fixing strip; under this kind of circumstances, vacuum adsorption dish direct mount need not to go on the structural improvement to last price fixing on the upper surface of price fixing, only need the trompil supply the main shaft pass can.
The upper fixed disc is provided with a groove for accommodating the vacuum adsorption disc, and the vacuum adsorption disc is arranged in the groove. Under the condition, the vacuum adsorption disc can be placed in the groove as an independent external part, the surface of the vacuum adsorption disc and the surface of the upper fixed disc are parallel and level at the moment, or the vacuum adsorption disc is directly machined in the upper fixed disc, so that the purpose of the external vacuum adsorption disc is achieved, and the structural form can meet the requirements of the external vacuum adsorption disc.
In the utility model, a vacuum adsorption disc is fixed on an upper fixed disc, the vacuum adsorption disc is vacuumized through a vacuum pipeline in a main shaft, 2 sealing rings (2 can be installed) are installed on the first main shaft in order to ensure the sealing between the vacuum adsorption disc and the first main shaft, and 2 sealing rings (2 can be installed) are installed on the second main shaft in order to ensure the sealing between the upper fixed disc and the second main shaft. In addition, when the polishing machine is used for a period of time, the plane of the upper fixed plate is not uniform, and the polishing needs to be carried out. And the main shaft is connected with a plurality of parts, and the main shaft is cumbersome and inconvenient to take down. The main shaft is divided into the first main shaft and the second main shaft, and when the upper fixed disc needs to be ground, the first main shaft is taken down without taking down the whole main shaft. The spindle is arranged in a segmented manner, so that the subsequent maintenance operation is facilitated.
As a general technical concept, the utility model also provides a full-automatic polishing machine system which comprises an automatic feeding and discharging mechanical arm and the polishing machine. Above-mentioned unloading manipulator in automation can adopt conventional manipulator, through the cooperation of vacuum adsorption dish with the automatic unloading manipulator of going up, can realize unloading in the automation, need not manual operation.
Taking the vacuum adsorption disc arranged on the lower fixed disc as an example, the utility model automatically polishes the glass by utilizing a full-automatic polishing machine system and adopts the following steps: the automatic feeding and discharging mechanical arm places the polishing piece on the polishing piece adsorption surface of the vacuum adsorption disc, the air pump is started for vacuumizing, and the polishing piece is firmly adsorbed through the vacuum pipeline and the adsorption vacuum cavity on the main shaft. The polishing machine is started, the upper fixed disc horizontally descends to be in contact with a polishing piece, the motor drives the vacuum adsorption disc and the polishing piece to rotate through the belt, the speed reducer, the main shaft, the bearing and the lower fixed disc, the swinging speed reducer drives the upper fixed disc to move left and right, set polishing pressure is applied to the polishing piece, polishing liquid is supplied to the polishing piece, and the polishing piece is uniformly and quickly polished. Polishing time arrives, and the polishing solution stops, and the last fixed plate shakes and stops, and the lower fixed plate rotation stops, goes up the fixed plate and rises, the slope, and the polishing solution on the clearance polishing piece, the vacuum stops, opens the aeration valve, and high-pressure air passes through the vacuum pipeline and destroys the vacuum between polishing piece and the vacuum adsorption dish, and automatic unloading manipulator takes off glass after automatic and burnishing machine communication parallel transport, accurate location, and the polishing is ended.
According to the utility model, the polishing piece is adsorbed by demonstration and design in a vacuum mode, the feeding and discharging of the polishing piece are realized by the on and off of the vacuum, and the material is grabbed by an automatic feeding and discharging manipulator, so that a foundation is laid for realizing the automation of glass polishing.
The utility model also provides a vacuum adsorption disc with a specific structural form for reference, which comprises the following specific steps: a vacuum adsorption disc for a polishing machine comprises a first adsorption disc and a second adsorption disc, wherein the first adsorption disc and the second adsorption disc are made of hard materials, the first adsorption disc and the second adsorption disc are tightly attached to each other and enclose a semi-closed adsorption vacuum cavity, the adsorption vacuum cavity comprises a first adsorption cavity arranged on the inner side of the first adsorption disc and a second adsorption cavity arranged on the inner side of the second adsorption disc, the outer side of the first adsorption disc is provided with a polishing piece adsorption surface, adsorption holes are uniformly distributed in the polishing piece adsorption surface, the first adsorption cavity is formed by mutually communicating a plurality of first adsorption air passages which are uniformly distributed, and the first adsorption cavity penetrates through the adsorption holes; the second adsorption cavity is formed by mutually communicating a plurality of second adsorption air passages which are uniformly distributed, and the second adsorption cavity and the first adsorption cavity are mutually communicated and form an integral cavity; and an air passage communication hole communicated with an external vacuumizing assembly is formed in the outer side of the second adsorption disc.
According to the polishing device, the polishing piece can be directly adsorbed by the hard material and the adsorption surface of the polishing piece without adopting an adsorption pad. Through the configuration optimization in first absorption chamber and second absorption chamber, through evenly laying the absorption hole on polishing piece adsorption plane, outside evacuation subassembly can adsorb the pressure in the fine control absorption hole in chamber through first absorption chamber and second, can guarantee that the pressure and the flow of the absorption hole when blowing on the whole polishing piece adsorption plane are unanimous basically to realize fine even absorption or peel off the effect of polishing piece, can omit the adoption of adsorption pad. Simultaneously, the air flue of above-mentioned structural style can also guarantee the mechanical properties of vacuum adsorption dish, and the absorption vacuum cavity is not the full empty structure, and all binding surfaces of first absorption chamber and second absorption chamber are the hard contact, and on the pressure that the upper surface bore can directly transmit basic supporting body, do not bear any moment, can not warp, can bear the pressure of polishing process. Overall speaking, through above-mentioned material, structural optimization, can guarantee the absorption hole on the whole polishing piece adsorption plane, pressure and flow when blowing are unanimous basically, guarantee that the air current of all absorption holes is unblocked and the velocity of flow is reasonable, can omit the adsorption pad, can also guarantee the mechanical properties of vacuum adsorption dish.
In the vacuum adsorption disc, preferably, the plurality of first adsorption air channels are uniformly distributed on the inner side of the first adsorption disc, and the plurality of second adsorption air channels are uniformly distributed on the inner side of the second adsorption disc; all the first adsorption air passages are communicated with each other; all the second adsorption air passages are communicated with each other; each second adsorption air passage is communicated with one or more corresponding first adsorption air passages so that the vacuum negative pressure of the second adsorption air passages can be uniformly and fully transmitted to the first adsorption disc through the first adsorption air passages; the adsorption holes are uniformly distributed on the outer side of the first adsorption disc, and at least most of the adsorption holes penetrate through the first adsorption air passages on the opposite sides of the adsorption holes. More preferably, the plurality of second adsorption air passages are radially distributed in a multi-ring shape, and specifically include an annular air passage and a radial air passage which are communicated with each other, the annular air passage includes a plurality of concentric air passages which take the center of the second adsorption disc as the center of a circle, and the radial air passage includes a plurality of connecting air passages which take the center of the second adsorption disc to radiate outwards; the first adsorption air passages are distributed in a grid shape and specifically comprise a plurality of transverse air passages and vertical air passages which are communicated in a criss-cross mode, and the adsorption holes are located at the through positions of the intersection points of the transverse air passages and the vertical air passages.
The concentric air passage can be a whole circular air passage or a multi-section circular air passage, and the multi-section circular air passage at the same radius still takes the center of the second adsorption disc as the center of a circle. The connecting air passages can be uniformly 8 (specifically adjusted according to actual conditions). The number and the positions of the transverse air passages and the vertical air passages are not limited, and the number and the positions of the transverse air passages and the vertical air passages can be adjusted according to the hole pitch requirement. Through the structure setting of above-mentioned first absorption air flue and second absorption air flue, can make the vacuum of whole polishing piece adsorption plane reach the unanimity simultaneously, guarantee the adsorption pores on the whole face, pressure and flow when blowing are unanimous basically.
In the vacuum adsorption disc, preferably, the first adsorption disc and the second adsorption disc are hermetically connected with each other; the edge of the first adsorption disc and/or the second adsorption disc is provided with a sealing groove for placing a sealing assembly, and the first adsorption cavity and the second adsorption cavity are enclosed by a closed circumference formed by the sealing groove. The vacuum adsorption disc adopts a split type design, an airflow channel is convenient to process, the first adsorption disc and the second adsorption disc are in plane contact, and the sealing performance is ensured. Will adopt the welding mode to connect first adsorption dish and second adsorption dish during later stage's production, guarantee the wholeness of structure. The sealing assembly is placed in the sealing groove, so that the first adsorption disc and the second adsorption disc can be connected in a sealing mode, and the sealing performance of the adsorption vacuum cavity is guaranteed. The sealing assembly can adopt a sealing ring.
In the vacuum adsorption disc, preferably, the overall dimension of the vacuum adsorption disc is 60-100mm larger than that of the polishing piece, the thickness of the vacuum adsorption disc is 60-120mm, and the depths of the second adsorption cavity and the first adsorption cavity are both 3-10 mm. The depth of the first adsorption cavity and the second adsorption cavity can ensure smooth air flow, and the mechanical property of the vacuum adsorption disc is ensured.
In the vacuum adsorption disk, preferably, the adsorption surface of the polishing member is square, the size of the aperture (diameter) of the adsorption hole is 0.5-3.0mm, the distance between the adjacent adsorption holes on the adsorption surface of the polishing member (the distance between the centers of the two adsorption holes) is 15-60mm, and the distance between the adsorption hole on the outermost edge of the adsorption surface of the polishing member and the outermost edge of the polishing member (the distance between the center of the adsorption hole and the outermost edge of the polishing member) is controlled to be 3-10 mm. The number of the adsorption holes on the adsorption surface of the polishing piece can be obtained by limiting the parameters.
According to the polishing piece adsorption surface adsorption device, the size of the pore diameter A is controlled to be 0.5-3.0mm, and the distance between the adjacent adsorption pores on the polishing piece adsorption surface is controlled to be 15-60mm, so that the adsorption force of the polishing piece adsorption surface can be ensured to be not too large or too small, and the adsorption force is uniformly loaded on the polishing piece, so that the polishing quality cannot be influenced by the fact that the adsorption force is larger in some places or the adsorption force is smaller in some places to cause uneven polishing of the surface of the polishing piece.
Currently, the glass polishing industry mainly has only a few fixed square products, such as G4.5(730 × 920mm), G5 (1100 × 1300mm), G5.5(1300 × 1500mm), and G6(1500 × 1850 mm).
The vacuum adsorption disc provided by the utility model is structurally optimized through the rigid materials of the first adsorption disc and the second adsorption disc, the pressure and flow of the adsorption holes on the adsorption surface of the whole polishing piece can be basically consistent during air blowing through the structural optimization of the first adsorption cavity and the second adsorption cavity and through the arrangement of the adsorption surface of the polishing piece and the adsorption holes which are uniformly distributed, the air flow smoothness and the reasonable flow speed of all the adsorption holes are ensured, an adsorption pad can be omitted, and the mechanical property of the vacuum adsorption disc can also be ensured.
The vacuum adsorption disc is used for adsorbing a polishing piece or stripping the polishing piece by controlling the positive pressure or negative pressure environment at the adsorption hole, does not need manual operation, and lays a foundation for realizing polishing automation of the polishing piece. In addition, the vacuum adsorption disc can uniformly adsorb polishing pieces through the adsorption holes which are uniformly distributed, so that the polishing quality is improved.
Compared with the prior art, the utility model has the advantages that:
1. the main shaft is divided into the first main shaft and the second main shaft, and when the fixed disc needs to be ground, the first main shaft is taken down without taking down the whole main shaft. The main shaft is arranged in a segmented mode, and maintenance operation of a follow-up fixed disc is facilitated.
2. According to the full-automatic polishing machine system, the vacuum adsorption disc is matched with the automatic feeding and discharging mechanical arm, automatic feeding and discharging of a polished part can be achieved through the automatic feeding and discharging mechanical arm, manual operation can be omitted, and automation is easy to achieve.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic view of the structure of a polishing machine in embodiment 1.
Fig. 2 is an enlarged view of the lower surface plate of fig. 1 (the vacuum suction plate is installed to protrude from the lower surface plate).
Fig. 3 is an enlarged view of the lower surface plate of fig. 1 (vacuum chuck mounted to the lower surface plate).
Fig. 4 is an enlarged view of the lower surface plate of fig. 1 (the lower surface plate is processed into a vacuum adsorption plate).
Fig. 5 is a partial enlarged view of fig. 2 at M.
Fig. 6 is a schematic structural diagram of a first practical application of the full-automatic polishing machine system in embodiment 1.
Fig. 7 is a schematic structural diagram of a second practical application of the full-automatic polishing machine system in embodiment 1.
Fig. 8 is a schematic structural view of the polishing machine in embodiment 2.
Fig. 9 is an enlarged view of the upper surface plate of fig. 8 (the vacuum suction plate is installed to protrude from the lower surface plate).
Fig. 10 is an enlarged view of the upper surface plate of fig. 8 (vacuum chuck mounted to the lower surface plate).
Fig. 11 is an enlarged view of the upper surface plate of fig. 8 (the lower surface plate is processed into a vacuum adsorption plate).
Fig. 12 is a schematic three-dimensional structure of a vacuum adsorption disk of the present invention.
Fig. 13 is a side view of fig. 12.
Fig. 14 is a schematic front view of the second adsorption plate according to the present invention (the front surface of the second adsorption plate contacts the back surface of the first adsorption plate).
Fig. 15 is a schematic view of the back structure of the first adsorption plate of the present invention.
Fig. 16 is a front view schematically illustrating the structure of the first adsorption tray according to the present invention.
Illustration of the drawings:
101. polishing the adsorption surface of the piece; 102. an adsorption hole; 103. a second adsorption chamber; 1031. a circular air passage; 1032. a radial airway; 104. a first adsorption chamber; 1041. a cross air passage; 1042. a vertical air passage; 105. a first adsorption tray; 106. a second adsorption tray; 107. a sealing groove; 108. an air passage communicating hole; 2. a pressure regulating assembly; 201. a main shaft; 2011. a first main shaft; 2012. A second main shaft; 202. an air pump; 203. a vacuum line; 204. a seal ring; 3. a polishing machine body; 301. a lower fixed disc; 302. An upper fixed disc; 4. an automatic loading and unloading manipulator; 5. a double-layer glass conveying line; 6. lifting the conveying line; 7. polishing the piece glass; 8. a sky rail; 9. and (4) fixing the strip.
Detailed Description
In order to facilitate an understanding of the utility model, the utility model will be described more fully and in detail below with reference to the accompanying drawings and preferred embodiments, but the scope of the utility model is not limited to the specific embodiments below.
Unless otherwise defined, all terms of art used hereinafter have the same meaning as commonly understood by one of ordinary skill in the art. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the scope of the present invention.
Unless otherwise specifically stated, various raw materials, reagents, instruments, equipment and the like used in the present invention are commercially available or can be prepared by existing methods.
Example 1:
as shown in fig. 1-5, the polishing machine with the vacuum adsorption disc of the embodiment includes a polishing machine body 3, the polishing machine body 3 includes a lower fixed disc 301, the vacuum adsorption disc is fixedly disposed on the lower fixed disc 301, an air duct communication hole 108 is formed in the vacuum adsorption disc, and is connected to a pressure adjustment assembly 2 through the air duct communication hole 108, the pressure adjustment assembly 2 includes a spindle 201 and an air pump 202, the spindle 201 includes a first spindle 2011 and a second spindle 2012 which are hermetically connected to each other, the first spindle 2011 penetrates through the vacuum adsorption disc and communicates with the air duct communication hole 108, and the second spindle 2012 penetrates through the lower fixed disc 301 and is connected to the first spindle 2011.
As shown in fig. 5, in this embodiment, a sealing ring 204 for sealing the first main shaft 2011 and the vacuum chuck is disposed on an outer wall of the first main shaft 2011, and a sealing ring 204 for sealing the second main shaft 2012 and the lower fixed plate 301 is disposed on an outer wall of the second main shaft 2012.
In this embodiment, a vacuum pipe 203 is disposed in the spindle 201, one end of the vacuum pipe 203 is connected to the air pump 202, and the other end of the vacuum pipe 203 is communicated with the air passage communication hole 108 on the vacuum adsorption disk.
In this embodiment, the vacuum adsorption plate is fixed on the lower fixed plate 301 by one of the following installation methods:
1. as shown in fig. 2, the vacuum adsorption plate is directly protruded from the surface of the lower fixed plate 301 through the fixing strip 9;
2. as shown in fig. 3, a groove for accommodating the vacuum adsorption disc is formed on the lower fixed plate 301, and the vacuum adsorption disc is arranged in the groove;
3. as shown in fig. 4, the vacuum chamber, the polishing material suction surface 101, and the like are directly processed in the lower surface plate 301, that is, the lower surface plate 301 is a vacuum suction plate.
As shown in fig. 12 to 16, the vacuum chuck for a polishing machine of this embodiment includes a first chuck 105 and a second chuck 106, where the first chuck 105 and the second chuck 106 are both made of a hard material, the first chuck 105 and the second chuck 106 are tightly attached to each other and enclose a semi-closed adsorption vacuum chamber, the adsorption vacuum chamber includes a first adsorption chamber 104 disposed inside the first chuck 105 and a second adsorption chamber 103 disposed inside the second chuck 106, an outer side of the first chuck 105 is provided with a polishing article adsorption surface 101, adsorption holes 102 are uniformly distributed on the polishing article adsorption surface 101, the first adsorption chamber 104 is formed by communicating a plurality of uniformly distributed first adsorption air channels, and the first adsorption chamber 104 penetrates through the adsorption holes 102; the second adsorption cavity 103 is formed by mutually communicating a plurality of second adsorption air passages which are uniformly distributed, and the second adsorption cavity 103 and the first adsorption cavity 104 are mutually communicated and form an integral cavity; an air passage communication hole 108 communicated with an external vacuum-pumping assembly is arranged on the outer side of the second adsorption disc 106.
In this embodiment, a plurality of first adsorption air passages are uniformly distributed on the inner side of the first adsorption disc 105, and a plurality of second adsorption air passages are uniformly distributed on the inner side of the second adsorption disc 106; all the first adsorption air passages are communicated with each other; all the second adsorption air passages are communicated with each other; each second adsorption air passage is communicated with one or more corresponding first adsorption air passages so that the vacuum negative pressure of the second adsorption air passages can be uniformly and fully conducted to the first adsorption disc 105 through the first adsorption air passages; the adsorption holes 102 are uniformly distributed over the outer side of the first adsorption disk 105, and at least most of the adsorption holes 102 penetrate through the first adsorption air passages on the opposite sides thereof.
In this embodiment, specifically, as shown in fig. 14 to fig. 16, the plurality of second adsorption air passages are radially distributed in multiple rings, and specifically include an annular air passage 1031 and a radial air passage 1032 which are communicated with each other, the annular air passage 1031 includes a plurality of concentric air passages with the center of the second adsorption tray 106 as the center, and the radial air passage 1032 includes a plurality of connecting air passages which are outwardly divergent with the center of the second adsorption tray 106; the plurality of first adsorption air passages are distributed in a grid shape, and specifically include a plurality of criss-cross horizontal air passages 1041 and vertical air passages 1042 which are mutually communicated, and the adsorption holes 102 are located at the through position of the intersection point of the horizontal air passages 1041 and the vertical air passages 1042.
In this embodiment, the first suction tray 105 and the second suction tray 106 are hermetically connected to each other; the edge of the first suction disc 105 and/or the second suction disc 106 is provided with a sealing groove 107 for placing a sealing assembly, and a closed circumference formed by the sealing groove 107 encloses the first suction cavity 104 and the second suction cavity 103. The seal groove 107 may be selectively opened on the first suction disk 105, and the seal assembly may use a sealing rubber or the like.
In this embodiment, the thickness of the vacuum adsorption disk is 60-120mm (within the above range), and the depths of the second adsorption cavity 103 and the first adsorption cavity 104 are both 3-10mm (within the above range).
In this embodiment, the polishing article adsorption surface 101 is square, the size of the aperture of the adsorption hole 102 is 0.5-3.0mm (any of the above ranges), the distance between adjacent adsorption holes 102 on the polishing article adsorption surface 101 is 15-60mm (any of the above ranges), and the distance between the adsorption hole 102 on the outermost edge of the polishing article adsorption surface 101 and the outermost edge of the polishing article is controlled to be 3-10mm (any of the above ranges). Through the limitation of the process parameters, the number of the adsorption holes 102 on the adsorption surface 101 of the polishing piece can be calculated.
The full-automatic polishing machine system of this embodiment, including automatic last unloading manipulator 4 and foretell burnishing machine, automatic last unloading manipulator 4 will treat that the polishing piece transports to the lower price fixing 301 department of burnishing machine through control software to treat the polishing piece through vacuum adsorption dish absorption, after the polishing finishes, treat that the polishing piece is through automatic 4 automatic discharge of last unloading manipulator.
In order to better understand the technical scheme of the full-automatic polishing machine system in the embodiment, the following description is given by combining the practical application condition:
the practical application condition is as follows:
as shown in fig. 6, the polishing machine system in this case includes an automatic loading and unloading robot 4, a polishing machine, a double glass transfer line 5, a polished piece glass 7, and an elevation transfer line 6. Wherein, the automatic feeding and discharging manipulator 4 is a six-axis manipulator (with a rotating base and a vacuum chuck paw).
Use 8 machines to explain for 1 group, every group is by 8 burnishing machines (taking the vacuum adsorption dish), 4 automatic unloading manipulators 4 of going up, 1 double glazing transfer chain 5, 1 lifting conveyor line 6 is constituteed, the rotating base of automatic unloading manipulators 4 of going up is fixed, every vacuum chuck hand claw is responsible for the unloading of controlling 2 burnishing machines, double glazing transfer chain 5 is responsible for before the polishing with polishing back glass's transport, lifting conveyor line 6 is responsible for polishing back glass's decline and send into the cleaning machine and wash.
Glass supplied materials enter a lower layer of the double-layer glass conveying line 5, the vacuum sucker claw grabs to-be-polished glass, the to-be-polished glass is conveyed to a vacuum adsorption disc installed on a polishing machine, after the glass is polished, the polished glass is taken down from the vacuum adsorption disc by the vacuum sucker claw and placed on an upper layer of the double-layer glass conveying line 5, the polished glass enters the lifting conveying line 6 through the double-layer glass conveying line 5, the lifting conveying line 6 descends the polished glass, and the glass is conveyed into the cleaning machine to be cleaned.
The process of polishing the glass is as follows: the vacuum chuck gripper places the glass on the polishing part adsorption surface 101 of the vacuum adsorption disc, starts the air pump 202 to vacuumize, and firmly adsorbs the glass through the vacuum pipeline 203 and the adsorption vacuum cavity on the spindle 201. The polishing machine is started, the upper fixed disc 302 horizontally descends to be in contact with glass, the motor drives the vacuum adsorption disc and the glass to rotate through the belt, the speed reducer, the shaft, the bearing and the lower fixed disc 301, the swinging speed reducer motor drives the upper fixed disc 302 to move left and right, set polishing pressure is applied to the glass, and meanwhile polishing liquid is supplied to the glass, so that the glass is uniformly and quickly polished. Polishing time is up, and the polishing solution stops, and last fixed disk 302 shakes and stops, and lower fixed disk 301 rotation stops, and last fixed disk 302 rises, the slope, and the polishing solution on the clearance glass, the vacuum stops, opens the gas blowing valve, and high-pressure air passes through vacuum pipeline 203 and destroys the vacuum between glass and the vacuum adsorption dish, and automatic unloading manipulator 4 is automatic to be communicated with the burnishing machine and the intermodal, take off glass behind the accurate location, and the polishing is ended.
Practical application condition two:
as shown in fig. 7, the polishing machine system in this case includes an automatic loading and unloading robot 4, a polishing machine, a double glass transfer line 5, a polished piece glass 7, and an elevation transfer line 6. Wherein, the automatic feeding and discharging manipulator 4 comprises a six-axis manipulator (vacuum chuck paw) and a top rail 8. The six-axis manipulator can reciprocate back and forth on the top rail 8.
Use 8 machines to explain for 1 group, every group is by 8 burnishing machines (take the vacuum adsorption dish), 2 automatic unloading manipulator 4 of going up, 1 double glazing transfer chain 5, 1 lifting conveyor line 6 is constituteed, every automatic unloading manipulator 4 of going up of group is equipped with one set of sky rail 8, every vacuum chuck hand claw is responsible for the unloading of 4 burnishing machines of control in sky rail 8 reciprocating motion, double glazing transfer chain 5 is responsible for the glass's before the polishing with the transport after the polishing, lifting conveyor line 6 is responsible for the decline of polishing back glass and sends into the cleaning machine and washs.
Glass supplied materials enter a lower layer of the double-layer glass conveying line 5, the vacuum sucker claw moves to a specified position in the sky rail 8 to grab glass to be polished, the glass to be polished is conveyed to a vacuum adsorption disc installed on a polishing machine, after the glass is polished, the polished glass is taken down from the vacuum adsorption disc by the vacuum sucker claw and put into an upper layer of the double-layer glass conveying line 5, the polished glass enters the lifting conveying line 6 through the double-layer glass conveying line 5, the polished glass descends by the lifting conveying line 6, and the glass is conveyed into the cleaning machine to be cleaned.
The above practical application conditions are similar to the practical application conditions, and the detailed processes of polishing two pairs of glass are not described herein again.
Example 2:
as shown in fig. 8-11, the polishing machine with the vacuum adsorption disc of the embodiment includes a polishing machine body 3, the polishing machine body 3 includes an upper fixed disc 302, the vacuum adsorption disc is fixedly disposed on the upper fixed disc 302, an air passage communication hole 108 is formed in the vacuum adsorption disc, and is connected to a pressure adjustment assembly 2 through the air passage communication hole 108, the pressure adjustment assembly 2 includes a spindle 201 and an air pump 202, the spindle 201 includes a first spindle 2011 and a second spindle 2012 which are hermetically connected to each other, the first spindle 2011 penetrates through the vacuum adsorption disc and communicates with the air passage communication hole 108, and the second spindle 2012 penetrates through the upper fixed disc 302 and is connected to the first spindle 2011.
In this embodiment, a sealing ring 204 for sealing the first main shaft 2011 and the vacuum adsorption disc is arranged on the outer wall of the first main shaft 2011, and a sealing ring 204 for sealing the second main shaft 2012 and the upper fixed disc 302 is arranged on the outer wall of the second main shaft 2012.
In this embodiment, a vacuum pipe 203 is disposed in the spindle 201, one end of the vacuum pipe 203 is connected to the air pump 202, and the other end of the vacuum pipe 203 is communicated with the air passage communication hole 108 on the vacuum adsorption disk.
In this embodiment, the vacuum chuck is fixed on the upper fixed plate 302 by one of the following installation methods:
1. as shown in fig. 9, the vacuum adsorption plate is directly protruded from the surface of the upper fixed plate 302 by the fixing strip 9;
2. as shown in fig. 10, the upper fixed plate 302 is provided with a groove for accommodating the vacuum adsorption plate, and the vacuum adsorption plate is arranged in the groove;
3. as shown in fig. 11, the vacuum chamber, the polishing material suction surface 101, and the like are directly processed in the upper platen 302, that is, the upper platen 302 is made into a vacuum suction platen.
The vacuum adsorption disk for a polishing machine of this embodiment is the same as that of embodiment 1.
The full-automatic polishing machine system of the embodiment comprises the automatic feeding and discharging mechanical arm 4 and the polishing machine. The specific composition is the same as in example 1, and reference is made specifically to example 1.

Claims (9)

1. The utility model provides a take polishing machine of vacuum adsorption dish, includes polishing machine body (3), polishing machine body (3) are including price fixing (301) down, the vacuum adsorption dish set firmly in on price fixing (301) down, its characterized in that, air flue intercommunicating pore (108) have been seted up on the vacuum adsorption dish, and pass through air flue intercommunicating pore (108) are connected with pressure regulating assembly (2), pressure regulating assembly (2) are including main shaft (201) and air pump (202), main shaft (201) are including mutual sealing connection first main shaft (2011) and second main shaft (2012), first main shaft (2011) passes the vacuum adsorption dish with air flue intercommunicating pore (108) intercommunication, second main shaft (2012) pass price fixing (301) down with first main shaft (2011) is connected.
2. The polishing machine according to claim 1, wherein a sealing ring (204) for sealing the first spindle (2011) and the vacuum adsorption disc is arranged on an outer wall of the first spindle (2011), and a sealing ring (204) for sealing the second spindle (2012) and the lower fixed disc (301) is arranged on an outer wall of the second spindle (2012).
3. The polishing machine according to claim 1, wherein a vacuum pipeline (203) is arranged in the main shaft (201), one end of the vacuum pipeline (203) is connected with the air pump (202), and the other end of the vacuum pipeline (203) is communicated with an air channel communication hole (108) on the vacuum adsorption disc.
4. A polishing machine according to any one of claims 1 to 3, characterized in that the vacuum chuck is fixed to the lower surface plate (301) in one of the following arrangements:
the vacuum adsorption disc is directly arranged on the surface of the lower fixed disc (301) in a protruding mode through a fixing strip (9);
the lower fixed disc (301) is provided with a groove for accommodating the vacuum adsorption disc, and the vacuum adsorption disc is arranged in the groove.
5. The utility model provides a take polishing machine of vacuum adsorption dish, includes polishing machine body (3), polishing machine body (3) are including price fixing (302), the vacuum adsorption dish set firmly in go up price fixing (302) on, its characterized in that, air flue intercommunicating pore (108) have been seted up on the vacuum adsorption dish, and pass through air flue intercommunicating pore (108) are connected with pressure adjusting part (2), pressure adjusting part (2) are including main shaft (201) and air pump (202), main shaft (201) are including mutual sealing connection first main shaft (2011) and second main shaft (2012), first main shaft (2011) passes the vacuum adsorption dish with air flue intercommunicating pore (108) intercommunication, second main shaft (2012) pass go up price fixing (302) with first main shaft (2011) is connected.
6. The polishing machine according to claim 5, wherein a sealing ring (204) for sealing the first spindle (2011) and the vacuum adsorption disc is arranged on an outer wall of the first spindle (2011), and a sealing ring (204) for sealing the second spindle (2012) and the upper fixed disc (302) is arranged on an outer wall of the second spindle (2012).
7. The polishing machine according to claim 5, wherein a vacuum pipeline (203) is arranged in the main shaft (201), one end of the vacuum pipeline (203) is connected with the air pump (202), and the other end of the vacuum pipeline (203) is communicated with an air channel communication hole (108) on the vacuum adsorption disc.
8. A polishing machine according to any of claims 5-7, characterized in that the vacuum chuck is fixed to the upper surface plate (302) by one of the following means:
the vacuum adsorption disc is directly arranged on the surface of the upper fixed disc (302) in a protruding mode through a fixing strip (9);
the upper fixed disc (302) is provided with a groove for accommodating the vacuum adsorption disc, and the vacuum adsorption disc is arranged in the groove.
9. A fully automatic polishing machine system, characterized by comprising an automatic loading and unloading robot (4) and a polishing machine according to any one of claims 1 to 8.
CN202121176190.4U 2021-05-28 2021-05-28 Polishing machine and full-automatic polishing machine system Active CN215847526U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202121176190.4U CN215847526U (en) 2021-05-28 2021-05-28 Polishing machine and full-automatic polishing machine system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202121176190.4U CN215847526U (en) 2021-05-28 2021-05-28 Polishing machine and full-automatic polishing machine system

Publications (1)

Publication Number Publication Date
CN215847526U true CN215847526U (en) 2022-02-18

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202121176190.4U Active CN215847526U (en) 2021-05-28 2021-05-28 Polishing machine and full-automatic polishing machine system

Country Status (1)

Country Link
CN (1) CN215847526U (en)

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