CN215826744U

CN215826744U - Monocrystalline silicon piece transfer support

Info

Publication number: CN215826744U
Application number: CN202120949904.4U
Authority: CN
Inventors: 周易芳; 谢军; 贺立超
Original assignee: Yuze Jiangxi Semiconductor Co ltd
Current assignee: Yichun Yuze New Energy Co ltd
Priority date: 2021-05-06
Filing date: 2021-05-06
Publication date: 2022-02-15
Anticipated expiration: 2031-05-06

Abstract

The utility model discloses a monocrystalline silicon wafer transfer support, which comprises a support body, universal wheels, a mounting seat, a push rod and a lifting frame, wherein the lifting frame comprises a rotating frame, a fixing seat and a fixing frame, the fixing frame and the fixing seat are integrally formed, the rotating frame is hinged with the fixing seat, the rotating frame and the fixing frame are similar in structure, the lower parts of the rotating frame and the fixing frame are of inverted isosceles triangle structures, the vertex angle positions of the isosceles triangle structures of the rotating frame and the fixing frame are connected with the fixing seat, slots are arranged on two base angles of the isosceles triangle structure of the rotating frame, inserting rods matched with the slots are arranged on the two base angles of the isosceles triangle structure of the fixing frame, a protection wheel is sleeved on each inserting rod, and the lifting frame is detachably mounted on the mounting seat through the fixing seat at the bottom of the lifting frame; the single crystal silicon wafer transfer device has the advantages of simple structure and convenience in use, and can effectively prevent high-temperature single crystal silicon from scalding operators in the single crystal silicon wafer transfer process, and meanwhile, the single crystal silicon wafer cannot be damaged in the transfer process.

Description

Monocrystalline silicon piece transfer support

Technical Field

The utility model relates to the technical field of monocrystalline silicon production devices, in particular to a monocrystalline silicon piece transfer support.

Background

The monocrystalline silicon slice is mainly used for manufacturing semiconductor elements, is used as a raw material for manufacturing semiconductor silicon devices, is used for manufacturing high-power rectifiers, high-power transistors, diodes, switching devices and the like, is a raw material for producing the monocrystalline silicon slice, and has a rapidly increasing trend along with the rapid increase of the demand of domestic and international markets for the monocrystalline silicon slice.

At present, the monocrystalline silicon wafer needs to be transferred when being produced, the temperature of a common monocrystalline silicon wafer is higher when the monocrystalline silicon wafer is transferred, operating personnel are easily scalded due to overhigh temperature, and the existing transfer device is too simple in structure and has hidden risks.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide a monocrystalline silicon wafer transfer support.

The technical purpose of the utility model is realized by the following technical scheme:

a monocrystalline silicon wafer transfer support comprises a support body, universal wheels, a mounting seat, a push rod and a lifting frame, wherein the universal wheels are mounted at the bottom of the support body, the push rod is mounted at one side of the support body, the mounting seat is mounted on the support body, the lifting frame comprises a rotating frame, a fixing seat and a fixing seat, the fixing seat and the fixing seat are integrally formed, the rotating frame is hinged with the fixing seat, the rotating frame and the fixing frame are similar in structure, the lower portions of the rotating frame and the fixing frame are of inverted isosceles triangle structures, the vertex angle positions of the isosceles triangle structures of the rotating frame and the fixing seat are connected with the fixing seat, jacks are arranged on two base angles of the isosceles triangle structure of the rotating frame, insertion rods matched with the jacks are arranged on the two base angles of the isosceles triangle structure of the fixing frame, protection wheels are sleeved on the insertion rods, the diameters of the protection wheels are larger than the apertures of the jacks, lifting rods are arranged on the upper portions of the rotating frame and the fixing frame, the lifting rod is provided with a handle, and the lifting frame is detachably arranged on the mounting seat through a fixed seat at the bottom of the lifting frame.

Furthermore, the number of the lifting frames is multiple, the lifting frames are detachably mounted on the mounting seat, and the plurality of monocrystalline silicon wafers can be transferred at one time by arranging the plurality of lifting frames.

Furthermore, the mount pad is two level settings and the rod-like structure that is parallel to each other, the bottom of fixing base is equipped with two slots that correspond with the mount pad position, be equipped with bellied fixture block in the slot, through above-mentioned structure, can with carry on quick the installation of frame on the fixing base or quick dismantlement from the fixing base.

Furthermore, cushion blocks are arranged on the fixed seat and between the rotating frame and the fixed frame.

Furthermore, the protection wheel and the cushion block are both made of flexible materials, and both the protection wheel and the cushion block can protect the monocrystalline silicon wafer.

Furthermore, the front end of the inserted bar is provided with a deformable bump, the structure can enable the rotating frame and the fixed frame to be relatively fixed, and the rotating frame cannot rotate relative to the fixed seat in the transferring process without external force.

In conclusion, the utility model has the following beneficial effects: the single crystal silicon wafer transfer device has the advantages of simple structure and convenience in use, and can effectively prevent high-temperature single crystal silicon from scalding operators in the single crystal silicon wafer transfer process, and meanwhile, the single crystal silicon wafer cannot be damaged in the transfer process.

Drawings

FIG. 1 is a schematic view of the overall structure of the present invention;

FIG. 2 is a schematic view of the construction of the carrier of the present invention;

fig. 3 is a partial cross-sectional view of the carrier of the present invention.

In the figure, 1, a frame body; 2. a universal wheel; 3. a mounting seat; 4. a push rod; 5. lifting the frame; 6. A monocrystalline silicon wafer; 7. a rotating frame; 8. a fixed seat; 9. a slot; 10. a clamping block; 11. a handle; 12. a fixed mount; 13. inserting a rod; 14. a protection wheel; 15. a bump; 16. a jack; 17. And a cushion block.

Detailed Description

The present invention will be described in further detail with reference to the accompanying drawings.

As shown in fig. 1-3, a monocrystalline silicon wafer transfer support comprises a support body 1, a universal wheel 2, a mounting seat 3, a push rod 4 and a lifting frame 5, wherein the universal wheel 2 is mounted at the bottom of the support body 1, the push rod 4 is mounted at one side of the support body 1, the mounting seat 3 is mounted on the support body 1, the lifting frame 5 comprises a rotating frame 7, a fixing seat 8 and a fixing seat 12, the fixing seat 12 and the fixing seat 8 are integrally formed, the rotating frame 7 is hinged with the fixing seat 8, the rotating frame 7 and the fixing seat 12 are similar in structure, the lower parts of the rotating frame 7 and the fixing seat 12 are of inverted isosceles triangle structures, the vertex angles of the rotating frame 7 and the fixing seat 12 are connected with the fixing seat 8, two base angles of the isosceles triangle structure of the rotating frame 7 are provided with insertion holes 16, two base angles of the isosceles triangle structure of the fixing seat 12 are provided with insertion rods 13 matched with the insertion holes 16, the protective wheel 14 is sleeved on the inserted bar 13, the diameter of the protective wheel 14 is larger than the aperture of the insertion hole 16, lifting rods are arranged on the upper portions of the rotating frame 7 and the fixing frame 12, handles 11 are arranged on the lifting rods, and the lifting frame 5 is detachably mounted on the mounting base 3 through a fixing base 8 at the bottom of the lifting frame.

Further, the number of the lifting frames 5 is multiple, the lifting frames 5 are all detachably mounted on the mounting base 3, and the plurality of monocrystalline silicon wafers can be transferred at one time by arranging the plurality of lifting frames 5.

Further, mount pad 3 is two level settings and the rod-like structure that is parallel to each other, the bottom of fixing base 8 is equipped with two slots 9 that correspond with 3 positions of mount pad, be equipped with bellied fixture block 10 in the slot 9, through above-mentioned structure, can dismantle on the quick installation fixing base 8 of carrying frame 5 or quick from fixing base 8.

Furthermore, cushion blocks 17 are arranged on the fixed seat 8 and between the rotating frame 7 and the fixed frame 12.

Further, the protection wheel 14 and the cushion block 17 are both made of flexible materials, and both the protection wheel 14 and the cushion block 17 can protect the monocrystalline silicon wafer.

Furthermore, the front end of the insertion rod 13 is provided with a deformable bump 15, which can relatively fix the rotating frame 7 and the fixed frame 12, and the rotating frame 7 will not rotate relative to the fixed base 8 in the transferring process without external force.

The working process is as follows: as shown in fig. 1 and 3, the lifting frame is horizontally placed, the rotating frame is separated from the fixed frame by rotating the handle on the rotating frame, then the high-temperature monocrystalline silicon wafer to be transferred is pushed onto the fixed frame by the tool, then the rotating frame is rotated to be clamped with the fixed frame, the monocrystalline silicon wafer is clamped between the rotating frame and the fixed frame, then the lifting frame is lifted by the handle, the lifting frame is pressed into the mounting seat, clamping of a monocrystalline silicon wafer is completed, the operation is repeated, a plurality of lifting frames are mounted on the mounting seat, and then the frame body is pushed, so that transfer of the monocrystalline silicon wafer is realized.

The present embodiment is only for explaining the present invention, and it is not limited to the present invention, and those skilled in the art can make modifications of the present embodiment without inventive contribution as needed after reading the present specification, but all of them are protected by patent law within the scope of the claims of the present invention.

Claims

1. The utility model provides a monocrystalline silicon piece shifts support, includes support body (1), universal wheel (2), mount pad (3), push rod (4) and carries frame (5), the bottom at support body (1) is installed in universal wheel (2), one side at support body (1) is installed in push rod (4), install on support body (1) mount pad (3), its characterized in that: the lifting frame (5) comprises a rotating frame (7), a fixed seat (8) and a fixed frame (12), the fixed frame (12) and the fixed seat (8) are integrally formed, the rotating frame (7) is hinged to the fixed seat (8), the rotating frame (7) is similar to the fixed frame (12) in structure, the lower portions of the rotating frame (7) and the fixed frame (12) are of inverted isosceles triangle structures, the vertex angle positions of the isosceles triangle structures of the rotating frame (7) and the fixed frame (12) are connected with the fixed seat (8), jacks (16) are arranged on two base angles of the isosceles triangle structure of the rotating frame (7), insertion rods (13) matched with the jacks (16) are arranged on the two base angles of the isosceles triangle structure of the fixed frame (12), protection wheels (14) are sleeved on the insertion rods (13), and the diameters of the protection wheels (14) are larger than the apertures of the jacks (16), the upper portions of the rotating frame (7) and the fixing frame (12) are respectively provided with a lifting rod, a handle (11) is arranged on each lifting rod, and the lifting frame (5) is detachably mounted on the mounting base (3) through a fixing base (8) at the bottom of the lifting frame.

2. The single crystal silicon wafer transfer rack of claim 1, wherein: the number of the lifting frames (5) is multiple, and the lifting frames (5) are all detachably mounted on the mounting base (3).

3. The single crystal silicon wafer transfer rack of claim 2, wherein: the mounting seat (3) is two rod-shaped structures which are horizontally arranged and parallel to each other, two slots (9) corresponding to the mounting seat (3) are formed in the bottom of the fixing seat (8), and convex clamping blocks (10) are arranged in the slots (9).

4. The single crystal silicon wafer transfer rack of claim 3, wherein: cushion blocks (17) are arranged on the fixed seat (8) and between the rotating frame (7) and the fixed frame (12).

5. The single crystal silicon wafer transfer rack of claim 4, wherein: the protection wheel (14) and the cushion block (17) are both made of flexible materials.

6. The single crystal silicon wafer transfer rack of claim 5, wherein: the front end of the inserted bar (13) is provided with a deformable bump (15).