CN215430548U

CN215430548U - Cleaning equipment

Info

Publication number: CN215430548U
Application number: CN202122051114.7U
Authority: CN
Inventors: 易熊军; 兰升友; 文成龙; 黄韬
Original assignee: Chongqing Kangjia Photoelectric Technology Research Institute Co Ltd
Current assignee: Chongqing Kangjia Photoelectric Technology Research Institute Co Ltd
Priority date: 2021-08-27
Filing date: 2021-08-27
Publication date: 2022-01-07
Anticipated expiration: 2031-08-27

Abstract

The utility model discloses cleaning equipment, which comprises a liquid storage tank, a mechanical arm, a clamp and an air injection part, wherein the mechanical arm and the liquid storage tank are oppositely arranged, and the mechanical arm can move towards the liquid storage tank; the clamp is arranged on the mechanical arm and used for fixing the object to be washed; the air injection part is arranged on the mechanical arm and used for injecting air to the clamp and the object to be washed. The utility model discloses a cleaning equipment washs and treats that jet-propelled part is to anchor clamps and treating the jet-propelled of thing with jet-propelled after the thing to wash when using, will remain and blow down at anchor clamps and the washing liquid that treats on the thing surface of washing, reduces the washing liquid and carries out the volume of discharging, prolongs the consumption cycle of washing liquid in the reservoir, is favorable to reduce cost.

Description

Cleaning equipment

Technical Field

The utility model relates to the technical field of cleaning devices, in particular to cleaning equipment.

Background

In the production process, the processed surface of the product is always required to be kept clean, and in the actual production, the surface of the product is not clean due to the influence of a front processing step or environmental factors, so that the step of cleaning the product is also indispensable in the production. Particularly in some fields requiring high precision, such as the semiconductor industry, the requirement for the surface finish of the wafer is very high, so the wafer surface is usually cleaned by using a chemical solution after processing.

However, after the cleaning device in the prior art cleans the object to be cleaned, the cleaning liquid is easy to adhere to the surface of the object to be cleaned and is carried out, and the consumption speed of the cleaning liquid is increased and the cost is increased.

Accordingly, the prior art is yet to be improved and developed.

SUMMERY OF THE UTILITY MODEL

In view of the above-mentioned shortcomings of the prior art, an object of the present invention is to provide a cleaning apparatus, which aims to solve the problems of continuous consumption of cleaning liquid and increased cost caused by continuous carrying out of the cleaning liquid during the cleaning process.

The technical scheme of the utility model is as follows:

the cleaning equipment comprises a liquid storage tank, a mechanical arm, a clamp and an air injection part, wherein the mechanical arm is arranged opposite to the liquid storage tank and can move towards the liquid storage tank; the clamp is arranged on the mechanical arm and used for fixing the object to be washed; the air injection part is arranged on the mechanical arm and used for injecting air to the clamp and the object to be washed.

The cleaning equipment comprises a cleaning device, a cleaning device and a cleaning device, wherein the air injection part comprises an air injection pipeline, an air injection head and a control valve, and the air injection pipeline is fixed on the mechanical arm; the gas nozzle is arranged on the mechanical arm and positioned at the end part of the mechanical arm connected with the clamp, and the gas nozzle is connected with the gas injection pipeline; the control valve is arranged on the gas injection pipeline and used for controlling the opening and the closing of the gas injection pipeline.

The cleaning equipment, wherein the air jet head is a nozzle or an air knife.

The cleaning equipment is characterized in that the control valve is an electromagnetic valve.

The cleaning equipment is characterized in that the air injection pipeline is a compressed dry air pipeline.

The washing device, wherein the clamp comprises at least two clamping jaws for fixing the object to be washed between the at least two clamping jaws.

The cleaning equipment is characterized in that the liquid storage tanks are provided with a plurality of liquid storage tanks, and each liquid storage tank stores different cleaning liquids.

The cleaning equipment comprises a plurality of liquid storage tanks, wherein the mechanical arm comprises a traversing component and a lifting component, and the traversing component is used for driving the lifting component to move among the liquid storage tanks; one end of the lifting component is connected with the transverse moving component, the other end of the lifting component extends to the opening of the liquid storage tank, and the end part, facing the liquid storage tank, of the lifting component is connected with the clamp.

The cleaning equipment further comprises an induction component arranged on the mechanical arm, wherein the induction component comprises a sensor and a processor, and the sensor is arranged at the end part, facing the liquid storage tank, of the lifting assembly and is in electric signal connection with the processor; the processor is electrically connected with the air injection component.

The cleaning equipment is characterized in that the lifting assemblies are provided with a plurality of groups, and the plurality of groups of lifting assemblies are arranged on the transverse moving assembly in parallel.

Compared with the prior art, the embodiment of the utility model has the following advantages:

when the cleaning equipment disclosed by the application is used, firstly, the object to be cleaned is clamped by the clamp, then, the object to be cleaned extends into the liquid storage tank through the mechanical arm for cleaning, the object to be cleaned is taken out after the cleaning is finished, the air injection part is used for injecting air to the clamp and the object to be cleaned, the cleaning liquid remained on the surfaces of the clamp and the object to be cleaned is blown down and falls back into the liquid storage tank for continuous use, so that the carrying amount of the cleaning liquid is reduced, the consumption period of the cleaning liquid in the liquid storage tank is prolonged, and the cost is reduced; meanwhile, the cleanness of the surface of the object to be washed is improved, the object to be washed can conveniently and rapidly enter the subsequent processing step, and the production rate is improved.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments described in the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.

FIG. 1 is a schematic view of a cleaning apparatus according to the present invention;

FIG. 2 is a schematic view of another angle of the cleaning apparatus of the present invention.

10, a liquid storage tank; 20. a mechanical arm; 21. a traversing assembly; 22. a lifting assembly; 30. a clamp; 31. a clamping jaw; 40. a gas injection part; 41. an air jet line; 42. a gas showerhead; 43. a control valve; 50. and (5) washing the object.

Detailed Description

In order to make the technical solutions of the present invention better understood, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In traditional industrial manufacturing, mechanical, physical, chemical or electrochemical methods are generally used for cleaning dirt on the surface of a workpiece. The most common method is water washing, and the greatest cost is the cost of the washing liquid in the washing process, so that the impurities are increased after the liquid medicine in a washing tank is used for a period of time, the pollution degree is increased, and the liquid medicine needs to be replaced.

In the manufacturing process of a semiconductor, a large amount of liquid medicine is needed in the process of cleaning the wafer, each time the wafer is inserted into the liquid medicine tank and then taken out, a large amount of liquid medicine is attached to the clamp and carried out on the surface of the wafer, and therefore consumption of the cleaning liquid medicine is further increased; in the process of cleaning for multiple times, the liquid medicine on the surface of the wafer is brought into a liquid medicine pool for next cleaning, the liquid medicine pool for the post-process is polluted, and the effective use period of the liquid medicine pool is shortened; therefore, the consumption speed of the cleaning liquid in the manufacturing process is high, the service cycle of the cleaning liquid in the liquid medicine pool is short, frequent replacement is needed, and the cost is increased.

Referring to fig. 1, in an embodiment of the present application, a cleaning apparatus is disclosed, wherein the cleaning apparatus includes a liquid storage tank 10, a robot arm 20, a clamp 30, and an air injection part 40, the robot arm 20 is disposed opposite to the liquid storage tank 10, and the robot arm 20 is movable toward the liquid storage tank 10; the clamp 30 is arranged on the mechanical arm 20 and used for fixing the object to be washed 50; the air injection part 40 is installed on the robot arm 20 to inject air to the jig 30 and the laundry 50.

When the cleaning equipment disclosed by the application is used, firstly, the object to be cleaned 50 is clamped by the clamp 30, then, the object to be cleaned extends into the liquid storage tank 10 through the mechanical arm 20 for cleaning, the object to be cleaned is taken out after the cleaning is finished, the air injection part 40 is used for injecting air to the clamp 30 and the object to be cleaned 50, the cleaning liquid remained on the surfaces of the clamp 30 and the object to be cleaned 50 is blown down and falls back into the liquid storage tank 10 for continuous use, so that the carrying amount of the cleaning liquid is reduced, the consumption period of the cleaning liquid in the liquid storage tank 10 is prolonged, and the cost is reduced; meanwhile, the surface cleanliness of the object to be washed 50 is improved, the object to be washed 50 can conveniently enter the subsequent processing steps, and the production rate is improved. For example, in the semiconductor industry, the cleaning apparatus disclosed in this embodiment may be used to clean a wafer, the clamp 30 is used to clamp the wafer, and then the wafer is conveyed into the liquid storage tank 10 by the robot arm 20 to be cleaned, and then the wafer is taken out after cleaning, and then the surface of the wafer is sprayed with air, so as to reduce the residue of the cleaning solution on the surface of the wafer.

It should be noted that the laundry 50 disclosed in the embodiment of the present invention includes, but is not limited to, a wafer. The cleaning device disclosed in the embodiment of the utility model includes but is not limited to a wafer cleaning device in the semiconductor industry, and can also be applied to the production and manufacturing process of other similar workpieces.

As shown in fig. 1, as an implementation manner of the embodiment, it is disclosed that the gas injection part 40 includes a gas injection pipeline 41, a gas injection head 42 and a control valve 43, and the gas injection pipeline 41 is fixed on the robot arm 20; the gas nozzle 42 is arranged on the mechanical arm 20 and is positioned at the end part where the mechanical arm 20 is connected with the clamp 30, and the gas nozzle 42 is connected with the gas spraying pipeline 41; the control valve 43 is mounted on the gas injection line 41 and is used for controlling the opening and closing of the gas injection line 41. In the working process, the air injection part 40 needs to stop injecting air when the mechanical arm 20 drives the clamp 30 to descend into the liquid storage tank 10, and inject air when the mechanical arm 20 drives the clamp 30 to ascend above the liquid level, so that the object to be washed 50 and the cleaning liquid on the clamp 30 are blown off, and the cleaning liquid can be continuously used after falling back into the liquid storage tank 10. Although, receive the influence of gravity, if arm 20 does not move, the washing liquid still can be towards reservoir 10 landing, but receives the surface tension influence of anchor clamps 30 and thing 50 that awaits washing, and the falling speed is very slow, can greatly influence holistic industrial production efficiency, so is not practical, and this application not only accelerates the washing liquid landing through the jet-propelled operation, but also can make anchor clamps 30 and the liquid residual quantity on thing 50 surface that awaits washing further reduce, is favorable to entering next manufacturing procedure rapidly.

In this embodiment, in order to maintain a good air injection effect, the air nozzle 42 is fixedly disposed on the robot arm 20, and the robot arm 20 needs to be lifted to drive the clamp 30 to insert or remove the cleaning solution during the operation, so the air nozzle 42 on the robot arm 20 also needs to move synchronously, the air nozzle 41 connected to the air nozzle 42 naturally also needs to move synchronously, the air nozzle 41 is disposed on the robot arm 20, and preferably disposed along the axial direction of the robot arm 20, so that the air nozzle 41 moves synchronously along the same path when the robot arm 20 moves, and does not collide with the robot arm 20, or falls into the cleaning solution, thereby avoiding the problems of twisting, knotting, and the like of the air nozzle 41 during the continuous movement, and preventing the cleaning process from being hindered from normal operation.

Specifically, as another implementation manner of the present embodiment, it is disclosed that the Air injection pipeline 41 is a Compressed Dry Air (CDA) pipeline. The air in the nature contains water vapor, and if the water vapor remains on the surface of the object to be washed 50 in the air injection process, secondary pollution is caused, so that the air is dried and then compressed, and the air is blown to the object to be washed 50, so that the surface of the object to be washed 50 can be cleaned, and the secondary pollution is reduced. In addition, the compressed air is convenient to convey, has no special harmful performance, has no fire hazard, is not afraid of overload, can work in a plurality of adverse environments, has inexhaustible air everywhere on the ground, and can control the cost while finishing the air injection requirement when being used in cleaning equipment.

Specifically, as another implementation manner of the present embodiment, the gas nozzle 42 is disclosed as a nozzle or a gas knife. The gas nozzle 42 is arranged at the end part of the mechanical arm 20 connected with the clamp 30, and can be close to the clamp 30 as much as possible, so that the gas thrust on the surfaces of the clamp 30 and the object 50 to be washed is as large as possible, and the gas spraying effect is improved; the nozzle or the air knife can further concentrate the air flow and spray the air to the target area, so that the air sprayed by the air spraying part 40 can blow away the cleaning liquid at the designated position, and the residue on the surface of the object 50 to be cleaned or the surface of the clamp 30 is reduced. For example, in the semiconductor industry, because the wafer product has a high requirement on surface performance, the nozzle can be aligned with the wafer when cleaning the wafer, the air injection strength to the wafer surface is increased, the residual amount on the wafer surface is reduced as much as possible, and the air injection strength to the surface of the clamp 30 is not controlled so as to balance the cost.

Specifically, as another implementation manner of the present embodiment, it is disclosed that the control valve 43 is an electromagnetic valve. The control valve 43 is arranged to better control the air injection rhythm, prevent the air injection head 42 from injecting air when in the kitchen sink, and avoid the cleaning liquid from being sprayed out, so that the working environment of the electromagnetic valve is safer, the electromagnetic valve can be arranged on the mechanical arm 20 at a position far away from the liquid storage tank 10 when the mechanical arm 20 moves to avoid the structures such as the air injection pipeline 41, the clamp 30 and the like; and the electromagnetic control industrial equipment for the electromagnetic valve is an automatic basic element for controlling fluid, has the characteristics of high adjustment precision and good flexibility, and can improve the flexibility of the air injection process.

As another implementation of the present embodiment, as shown in fig. 2, it is disclosed that the clamp 30 includes at least two clamping jaws 31 for fixing the object to be washed 50 between at least two clamping jaws 31. The laundry 50 can be stably fixed by applying pressure from both sides of the laundry 50 through the two jaws 31, and the relative displacement between the clamp 30 and the laundry 50 is prevented during the movement of the robot arm 20. In the wafer processing process, because the shape of the wafer is special and easy to damage, the shape of the clamp 30 can be set to be similar to the shape of a wafer box, so that the clamp is matched with the wafer, the wafer is more stable when being fixed, and the wafer cannot fall off from the clamp 30 when moving in the liquid storage tank 10.

Specifically, as another implementation manner of this embodiment, it is disclosed that a plurality of reservoirs 10 are provided, and each reservoir 10 stores different types of cleaning liquids. The plurality of liquid storage tanks 10 are arranged to perform a process of cleaning for a plurality of times, and after the object 50 to be cleaned is moved out of one liquid storage tank 10, air is sprayed to remove the cleaning liquid on the surface, so that the next cleaning can be directly performed through the mechanical arm 20 without replacing the clamp 30, and the production progress is accelerated. For example, in the semiconductor processing process, there are two post processes after the wafer is cleaned, one is to move to the quick-discharge rinsing tank to remove the surface particulate impurities and the residual chemical liquid, in this case, the cleaning liquid and other impurities on the wafer surface can be removed in advance by performing air injection in advance, so that the cleaning speed of the wafer surface is increased, and the post process is easier; the other method is to move the wafer into another liquid storage tank 10 for cleaning another cleaning liquid, the clamp 30 does not need to be replaced in the two cleaning processes, after the air injection part 40 blows off the cleaning liquid in the last liquid storage tank 10 left on the surfaces of the clamp 30 and the wafer, the carrying amount of the cleaning liquid on the surfaces of the clamp 30 and the wafer is reduced, the probability that the cleaning liquid in the last liquid storage tank 10 enters the next liquid storage tank 10 is reduced, the cleaning liquid is prevented from being polluted, the effectiveness of the cleaning liquid in the post-positioned liquid storage tank 10 is maintained, and the replacement frequency of the cleaning liquid in the cleaning equipment is reduced.

As shown in fig. 1, as another implementation manner of the embodiment, it is disclosed that the robot arm 20 includes a traverse assembly 21 and a lifting assembly 22, where the traverse assembly 21 is configured to drive the lifting assembly 22 to move between the plurality of liquid storage tanks 10; one end of the lifting component 22 is connected with the traversing component 21, the other end extends to the opening of the liquid storage tank 10, and the end of the lifting component 22 facing the liquid storage tank 10 is connected with the clamp 30. When a plurality of liquid storage tanks 10 are arranged, the objects to be washed 50 can be transferred into another cleaning solution from one cleaning solution by moving the liquid storage tanks 10 or moving the mechanical arm 20, but a large amount of cleaning solution is in the liquid storage tanks 10, so that the movement is inconvenient, and the liquid is easy to spill out in the moving process, so that the mechanical arm 20 is provided with the transverse moving assembly 21, the movement of the objects to be washed 50 is more conveniently realized, and the cleaning process is conveniently and smoothly carried out.

Specifically, as another implementation manner of this embodiment, it is disclosed that the cleaning device further includes a sensing component (not shown in the drawings) mounted on the mechanical arm 20, where the sensing component includes a sensor and a processor, the sensor is disposed at an end of the lifting assembly 22 facing the liquid storage tank 10, and is connected with the processor through an electrical signal; the processor is electrically connected to the air injection unit 40. In the traditional cleaning process, the mechanical arm 20 is controlled by a terminal to ascend, descend and transversely move, a series of actions can be semi-automatically completed through the terminal, the cleaning action is rapidly completed, the air injection part 40 is arranged, the air injection is stopped when the mechanical arm 20 descends, the mechanical arm 20 ascends until the clamp 30 floats out of the water surface, and then the air injection is started, so that a sensor is required to be arranged at the end part of the lifting assembly 22 close to the liquid storage tank 10, a signal is sent to a processor through the sensor, the air injection part 40 is controlled through the processor, for example, an electromagnetic valve is arranged, the electromagnetic valve can be controlled through the processor, automatic air injection can be realized, the automatic lifting of the mechanical arm 20 is matched, the whole cleaning process is more intelligent, the cleaning process is smoother, and the time is saved.

Specifically, as another implementation manner of the embodiment, it is disclosed that the lifting assemblies 22 are provided with a plurality of sets, and the plurality of sets of lifting assemblies 22 are arranged on the traverse assembly 21 in parallel. The number of the fixtures 30 can be synchronously increased by adding the lifting assemblies 22, so that a plurality of objects to be washed 50 can be simultaneously washed, the washing efficiency is increased, and the production speed is increased.

Specifically, in the process of cleaning the wafer for multiple times, the operation flow of the cleaning apparatus of this embodiment is as follows:

cleaning the wafer in the liquid storage tank 10, and after the cleaning is finished, descending the mechanical arm 20 to grab the wafer in the liquid storage tank 10; the mechanical arm 20 rises until the wafer leaves the liquid level of the cleaning liquid, the sensor sends a signal after sensing the wafer leaves the liquid level, the processor controls the air injection part 40 to inject air, residual cleaning liquid on the surface of the wafer and the surface of the clamp 30 is blown off, and then air injection is stopped; the robot arm 20 moves across into the next reservoir 10, lowers and releases the wafer for the next cleaning.

In summary, a cleaning apparatus is disclosed, wherein the cleaning apparatus comprises a liquid storage tank 10, a mechanical arm 20, a clamp 30 and an air injection part 40, the mechanical arm 20 is arranged opposite to the liquid storage tank 10, and the mechanical arm 20 can move towards the liquid storage tank 10; the clamp 30 is arranged on the mechanical arm 20 and used for fixing the object to be washed 50; the air injection part 40 is installed on the robot arm 20 to inject air to the jig 30 and the laundry 50. When the cleaning equipment disclosed by the application is used, firstly, the object to be cleaned 50 is clamped by the clamp 30, then, the object to be cleaned extends into the liquid storage tank 10 through the mechanical arm 20 for cleaning, the object to be cleaned is taken out after the cleaning is finished, the air injection part 40 is used for injecting air to the clamp 30 and the object to be cleaned 50, the cleaning liquid remained on the surfaces of the clamp 30 and the object to be cleaned 50 is blown down and falls back into the liquid storage tank 10 for continuous use, so that the carrying amount of the cleaning liquid is reduced, the consumption period of the cleaning liquid in the liquid storage tank 10 is prolonged, and the cost is reduced; meanwhile, the surface cleanliness of the object to be washed 50 is improved, the object to be washed 50 can conveniently enter the subsequent processing steps, and the production rate is improved.

It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict.

It will be understood that the utility model is not limited to the precise arrangements described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the utility model is limited only by the appended claims.

The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the utility model, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.

Claims

1. A cleaning apparatus, comprising:

a liquid storage tank;

the mechanical arm is arranged opposite to the liquid storage tank and can move towards the liquid storage tank;

the clamp is arranged on the mechanical arm and used for fixing the object to be washed; and

and the air injection part is arranged on the mechanical arm and used for injecting air to the clamp and the object to be washed.

2. The cleaning apparatus according to claim 1, wherein the gas spraying part comprises:

the gas injection pipeline is fixed on the mechanical arm;

the gas nozzle is arranged on the mechanical arm and positioned at the end part of the mechanical arm connected with the clamp, and the gas nozzle is connected with the gas injection pipeline; and

and the control valve is arranged on the gas injection pipeline and used for controlling the opening and the closing of the gas injection pipeline.

3. The cleaning apparatus according to claim 2, wherein the gas jet head is a nozzle or an air knife.

4. The cleaning apparatus defined in claim 2, wherein the control valve is a solenoid valve.

5. The cleaning apparatus defined in claim 2, wherein the air injection line is a compressed dry air line.

6. The cleaning apparatus defined in claim 1, wherein the clamp comprises at least two clamping jaws for securing the object to be cleaned between at least two of the clamping jaws.

7. The cleaning apparatus defined in claim 1, wherein the reservoir is provided in a plurality, each reservoir containing a different type of cleaning fluid.

8. The cleaning apparatus as defined in claim 7, wherein the robotic arm includes a traverse assembly and a lift assembly, the traverse assembly for moving the lift assembly between the plurality of reservoirs; one end of the lifting component is connected with the transverse moving component, the other end of the lifting component extends to the opening of the liquid storage tank, and the end part, facing the liquid storage tank, of the lifting component is connected with the clamp.

9. The cleaning device of claim 8, further comprising a sensing component mounted on the robotic arm, the sensing component comprising a sensor and a processor, the sensor being disposed at an end of the lifting assembly facing the reservoir and in electrical signal communication with the processor; the processor is electrically connected with the air injection component.

10. The cleaning apparatus defined in claim 8, wherein the lift assemblies are provided in a plurality of groups, the plurality of groups being juxtaposed on the traverse assembly.