CN214496458U - Electron beam evaporation coating system - Google Patents
Electron beam evaporation coating system Download PDFInfo
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- CN214496458U CN214496458U CN202120567150.6U CN202120567150U CN214496458U CN 214496458 U CN214496458 U CN 214496458U CN 202120567150 U CN202120567150 U CN 202120567150U CN 214496458 U CN214496458 U CN 214496458U
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Abstract
The utility model provides an electron beam evaporation coating system, include: a crucible base having a plurality of crucible ports disposed on an upper surface thereof, wherein the crucible ports are configured to carry a target material; a water-cooling cover disposed at the crucible base and configured to water-cool the crucible base; an electron beam emitting device configured to emit an electron beam at a first position; and the rotating system is configured to drive the water cooling cover and the crucible base to rotate so as to enable the target material carried by the crucible interface to move to a first position.
Description
Technical Field
The utility model relates to a precision finishing technical field, in particular to electron beam evaporation coating system.
Background
The electron beam evaporation is to bombard the coating material with accelerated electrons, and the kinetic energy of the electrons is converted into heat energy to heat and evaporate the coating material and form a film. The electron gun is divided into a direct type, a ring type and an E type. The electron beam heating evaporation has the characteristics that the highest energy density can be achieved, the highest energy density can reach 109w/cm2, the heating temperature can reach 3000-6000 ℃, and refractory metals or compounds can be evaporated. However, the high temperature of electron beam heating evaporation tends to cause the material to be evaporated and diffused to the substrate along with the target material, which causes contamination. In addition, the evaporation of electron beams in an ultra-high vacuum environment requires a very precise processing process, and if various targets need to be evaporated, a crucible or equipment needs to be replaced, so that the sealing performance in the vacuum environment is easily reduced, and a certain risk of process failure is caused.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide an electron beam evaporation coating system to solve the problem that current electron beam heating coating by vaporization caused the pollution easily.
In order to solve the above technical problem, the utility model provides an electron beam evaporation coating system, include:
a crucible base having a plurality of crucible ports disposed on an upper surface thereof, wherein the crucible ports are configured to carry a target material;
a water-cooling cover disposed at the crucible base and configured to water-cool the crucible base;
an electron beam emitting device configured to emit an electron beam at a first position; and
and the rotating system is configured to drive the water cooling cover and the crucible base to rotate so as to enable the target material carried by the crucible interface to move to a first position.
Optionally, in the electron beam evaporation coating system, the crucible base is disc-shaped, and the crucible ports are circumferentially distributed on the surface of the crucible base.
Optionally, in the electron beam evaporation coating system, the method further includes:
the ultrahigh vacuum cavity is configured to accommodate the crucible base and the water cooling cover so as to limit the crucible base and the water cooling cover to move along the radial direction of the crucible base;
the rotating system is configured to drive the crucible base and the water cooling cover to rotate along the tangential direction of the crucible base; and
and the fixing system is configured to limit the axial movement of the crucible base and the water cooling cover along the crucible base, and limit the axial and radial movement of the rotating system along the crucible base.
Optionally, in the electron beam evaporation coating system, the method further includes:
a baffle configured to cover a surface of the crucible base and having an opening below a first position to expose a crucible interface moved below the first position;
the baffle supporting column is configured to limit the baffle so as to limit the baffle to move along the radial direction of the crucible base and rotate along the tangential direction of the crucible base; and
and the baffle driving shaft is configured to abut against the center of the bottom surface of the baffle and drive the baffle to move along the axial direction of the crucible base.
Optionally, in the electron beam evaporation coating system,
the baffle and the baffle supporting column are both positioned in the ultrahigh vacuum cavity;
the crucible base is rigidly connected with the water cooling cover;
the fixing system is rigidly connected with the side wall of the ultrahigh vacuum cavity.
Optionally, in the electron beam evaporation coating system, the rotating system includes a first rotating platform, and the fixing system includes a first fixing platform;
the first rotating platform drives the water cooling cover to rotate;
the first fixed platform limits the first rotating platform to move along the axial direction and the radial direction of the crucible base;
the first rotating platform comprises a side end part close to the first fixed platform and a platform part close to the water cooling cover;
the platform part is rigidly connected with the water cooling cover through a fixed rod;
the side end part is fixed with the inner ring of the first deep groove ball bearing, and the first fixing platform is fixed with the outer ring of the first deep groove ball bearing;
the first fixed platform is fixed with the baffle support column.
Optionally, in the electron beam evaporation coating system, the rotation system further includes:
a differential rotary introducer rotating flange disposed within the atmospheric environment outside the ultrahigh vacuum chamber and configured to drive the first rotating platform in rotation tangentially to the crucible base;
the differential rotary importer fixing flange is arranged in a vacuum environment in the ultrahigh vacuum cavity and is in sealing connection with the differential rotary importer rotating flange and the ultrahigh vacuum cavity; and
the rotating flange is configured to be rigidly connected with the differential rotation importer rotating flange so as to drive the differential rotation importer rotating flange to rotate along the tangential direction of the crucible base;
the differential rotary importer rotating flange can rotate relative to the differential rotary importer fixing flange and maintain sealing connection.
Optionally, in the electron beam evaporation coating system, the fixing system further includes:
a second stationary platform configured to rigidly connect with the differential rotary introducer stationary flange;
the main flange is arranged between the first fixed platform and the second fixed platform and is rigidly connected with the side wall of the ultrahigh vacuum cavity;
the main flange is rigidly connected with the second fixed platform;
the main flange is rigidly connected with the first fixed platform through a flange support column.
Optionally, in the electron beam evaporation coating system, the method further includes:
the driving guide ring is configured to sequentially penetrate through the center positions of the main flange, the second fixing platform, the differential rotation importer fixing flange, the differential rotation importer rotating flange and the rotating flange;
the driving guide ring is rigidly connected with the first rotating platform through a thread structure and is rigidly connected with the rotating flange;
the water inlet pipe and the water outlet pipe are accommodated in the driving guide ring, penetrate through the driving guide ring and the first rotating platform and then are connected to the water cooling cover;
the baffle driving shaft is accommodated in the driving guide ring and is connected to the baffle after penetrating through the driving guide ring, the first rotating platform and the crucible base.
Optionally, in the electron beam evaporation coating system, the crucible interface is a groove, and the target is directly placed in the groove, or
Placing a tungsten crucible in the groove, and placing the target material in the tungsten crucible;
the inner ring of the second bearing is fixed on the baffle driving shaft through a screw and a gasket;
the outer ring of the second bearing is fixed on the baffle through a bearing seat;
when the baffle driving shaft rotates along the tangential direction of the crucible base, the baffle is static;
the baffle driving shaft is fixed on the driving shaft of the linear moving displacer, and the linear moving displacer drives the baffle driving shaft to move up and down.
The utility model provides an among the electron beam evaporation coating system, drive water-cooling cover and crucible base rotation through rotating system, so that one or more in the crucible interface remove to the first position, electron beam emitter aims at first position transmission electron beam, can carry out the front at whole process, places multiple target respectively in different crucible interfaces, when needs use different targets to carry out the coating by vaporization, only need rotate the crucible interface that required target corresponds to the first position can realize different coating by vaporization technologies, and different target coating by vaporization; the crucible base is water-cooled through the water cooling cover, the crucible base can be water-cooled, the crucible material is prevented from being evaporated and polluted by evaporated target materials and evaporated substrates, the target material at the bottom of the crucible interface is water-cooled, the preparation of a high-purity film is realized, the target material at the bottom in the crucible interface is kept in a solid state through the water cooling of the bottom of the crucible base, and the evaporation material is small in heating area, so that the heat radiation loss is reduced, and the heat efficiency is high.
Drawings
FIG. 1 is a schematic view of an electron beam evaporation coating system according to an embodiment of the present invention;
FIG. 2 is a schematic view of an electron beam evaporation coating system according to an embodiment of the present invention;
FIG. 3 is a schematic view of an electron beam evaporation coating system according to an embodiment of the present invention;
FIG. 4 is a schematic view of an electron beam evaporation coating system according to an embodiment of the present invention;
FIG. 5 is a schematic view of an electron beam evaporation coating system according to an embodiment of the present invention;
shown in the figure: 1-a crucible base; 2-crucible interface; 3-water cooling cover; 4-a target material; 5-electron beam emitting means; 6-ultra-high vacuum cavity; 7-a baffle plate; 8-baffle support columns; 9-a damper drive shaft; 10-a first rotating platform; 11-a first fixed platform; 12-side end; 13-a platform part; 14-a first deep groove ball bearing; 15-differential rotation importer rotating flange; 16-differential rotary importer fixing flange; 17-rotating the flange; 18-a second fixed platform; 19-a main flange; 20-flange support columns; 21-a drive guide ring; 22-a thread structure; 23-water inlet pipe/water outlet pipe; 24-a second bearing; 25-a screw; 26-a gasket; 27-a bearing seat; 28-a linearly moving displacer; 29-an electrode assembly; 30-electron gun mounting flange; 31-water cooled joint; 32-an electron gun; 33-an ion pump; 34-a tungsten crucible; 35-the electron path; 36-substrate.
Detailed Description
The electron beam evaporation coating system provided by the present invention will be further described in detail with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become more fully apparent from the following description and appended claims. It should be noted that the drawings are in simplified form and are not to precise scale, and are provided for convenience and clarity in order to facilitate the description of the embodiments of the present invention.
Furthermore, features from different embodiments of the invention may be combined with each other, unless otherwise indicated. For example, a feature of the second embodiment may be substituted for a corresponding or functionally equivalent or similar feature of the first embodiment, and the resulting embodiments are likewise within the scope of the disclosure or recitation of the present application.
The core idea of the utility model is to provide an electron beam evaporation coating system to solve the problem that the current electron beam heating evaporation plating easily causes pollution.
In order to realize the idea, the utility model provides an electron beam evaporation coating system, include: a crucible base having a plurality of crucible ports disposed on an upper surface thereof, wherein the crucible ports are configured to carry a target material; the water cooling cover is arranged at the bottom of the crucible base and is used for cooling the crucible base by water; an electron beam emitting device configured to emit an electron beam in alignment with a first position above the crucible base; and a rotation system configured to rotate the water-cooled shield and the crucible base to move one or more of the crucible interfaces below the first position.
The utility model provides an electron beam evaporation coating system, as shown in figure 1, include: a crucible base 1 having a plurality of crucible ports 2 disposed on an upper surface thereof, wherein the crucible ports 2 are configured to carry a target 4; a water cooling cover 3 arranged at the bottom of the crucible base 1 for water cooling the crucible base 1; an electron beam emitting device 5 configured to emit an electron beam directed at a first position above the crucible base 1; and a rotating system configured to rotate the water cooling cover 3 and the crucible base 1 so as to move one or more of the crucible ports 2 below the first position.
The electron beam evaporation coating system is provided with an electron gun assembly (an electron beam emitting device 5) and a power supply, a set of water-cooled crucible base 1, a plurality of crucible interfaces 2 (for example, 6) are distributed in a circumferential mode, the crucible base 1 can rotate, and the crucible interfaces 2 corresponding to the positions need to be rotated to electron bombardment corresponding positions for growth, so that the growth is carried out. The crucible base 1 is directly connected to a water-cooled mantle 3. Fig. 2 is a schematic diagram of a system structure, which includes an ultra-high vacuum chamber 6, an ion pump 33 (for evacuating the ultra-high vacuum chamber 6), an electron gun assembly (electron beam emitting device 5), and a water-cooled crucible assembly.
As shown in fig. 3, the electron gun assembly comprises an electron gun 32 (containing a filament and a magnet to generate a high-energy electron beam), an electrode assembly 29 (for energizing and boosting the filament), an electron gun mounting flange 30 (for mounting the electron gun assembly on the ultra-high vacuum chamber 6), and a water cooling joint 31 (for cooling the electron gun assembly by water cooling); electrons generated by the filament are accelerated by a high-voltage electric field, deflected by about 270 degrees under the action of a magnetic field, bombarded into the growing crucible interface 2, and heat the target 4 placed in the crucible interface 2 to form an electron path.
As shown in fig. 1, the water-cooled crucible assembly includes a crucible base, a water-cooled cover, a baffle support column, a baffle drive shaft, a first rotating platform, a first fixing platform, a first deep groove ball bearing, a differential rotation importer rotating flange, a differential rotation importer fixing flange, a rotating flange, a second fixing platform, a main flange, a flange support column, a drive guide ring, a water inlet pipe/outlet pipe, a linear movement displacer, and the like. The main flange mounts the entire water-cooled crucible assembly onto the ultra-high vacuum chamber.
In an embodiment of the present invention, in the electron beam evaporation coating system, the crucible base 1 is a disc shape, the material is copper, and the crucible ports 2 are circumferentially distributed on the surface of the crucible base 1. The crucible base 1 is directly connected with the water cooling cover 3, and good heat conduction is ensured. In the electron beam evaporation coating system, the method further comprises: an ultrahigh vacuum chamber 6 configured to accommodate the crucible base 1 and the water-cooled cover 3 to restrict the crucible base 1 and the water-cooled cover 3 from moving in a radial direction of the crucible base 1; a rotating system configured to drive the crucible base 1 and the water cooling cover 3 to rotate along the tangential direction of the crucible base 1; and a fixing system configured to restrict the crucible base 1, the water-cooled cover 3 from moving up and down in the axial direction of the crucible base 1, and to restrict the rotation system from moving in the axial and radial directions of the crucible base 1.
In an embodiment of the present invention, in the electron beam evaporation coating system, the method further includes: a shutter 7 configured to cover the surface of the crucible base 1 and having an opening at a lower side of the first position to expose the crucible port 2 moved to the lower side of the first position; four baffle supporting columns 8 configured to limit the baffle 7 from moving in the radial direction of the crucible base 1 and from rotating in the tangential direction of the crucible base 1; and a baffle drive shaft 9 configured to abut against the center of the bottom surface of the baffle 7, and drive the baffle 7 to move in the axial direction of the crucible base 1. There are 4 trompils on the baffle 7, with the cooperation of baffle support column 8, ensure that baffle 7 can the up-and-down motion to only can the up-and-down motion. A spacer ring is arranged between the crucible base 1 and the baffle 7, and when the crucible base 1, the spacer ring and the baffle 7 are in close contact with each other during growth, the materials in growth can not pollute other crucible interfaces. When the crucible interface needs to be replaced, the baffle 7 needs to be lifted first, then the rotating flange 17 is rotated to drive the crucible base 1 to rotate, and after the crucible interface 2 is switched, the baffle 7 is lowered. The baffle is connected with the baffle drive shaft 9 through a second bearing 24, a bearing seat 27, a screw 25 and a gasket 26. The shutter drive shaft 9 drives the shutter 7 to move up and down. The second bearing 24 is used for ensuring that the baffle driving shaft 9 can rotate along with the rotating flange 17, the baffle driving shaft 9 is fixed on the driving shaft of the linear moving displacer 28, and the baffle driving shaft 9 is driven by the linear moving displacer 28 to move up and down.
In an embodiment of the present invention, in the electron beam evaporation coating system, the baffle 7 and the baffle supporting column 8 are both located in the ultra-high vacuum chamber 6; the crucible base 1 is rigidly connected with the water cooling cover 3; the fixing system is rigidly connected with the side wall of the ultra-high vacuum cavity 6.
In an embodiment of the present invention, in the electron beam evaporation coating system, the rotating system includes a first rotating platform 10, and the fixing system includes a first fixing platform 11; the first rotating platform 10 drives the water cooling cover 3 to rotate; the first fixed platform 11 limits the first rotating platform 10 to move along the axial direction and the radial direction of the crucible base 1; the first rotary platform 10 comprises a side end portion 12 close to the first fixed platform 11 and a platform portion 13 close to the water-cooling jacket 3; the platform part 13 is rigidly connected with the water cooling cover 3 through a fixing rod; the side end 12 is fixed with the inner ring of the first deep groove ball bearing 14, and the first fixed platform 11 is fixed with the outer ring of the first deep groove ball bearing 14; the first fixed platform 11 is fixed with the baffle support column 8. Preferably, the first rotating platform 10 and the first fixed platform 11 are fixed together and do not rotate relatively. The first deep groove ball bearing 14 is installed between the side end 12 and the first rotary platform 10, the side end 12 is connected with the driving guide ring 21 through a screw structure 22, and the side end 12 is driven to rotate by the driving guide ring 21 through the screw structure 22.
In an embodiment of the present invention, in the electron beam evaporation coating system, the rotation system further includes: a differential rotary introducer rotating flange 15, arranged in the atmosphere outside the ultra-high vacuum chamber 6, configured to drive the first rotating platform 10 in rotation in the tangential direction of the crucible base 1; the differential rotary importer fixing flange 16 is arranged in the vacuum environment in the ultrahigh vacuum cavity 6 and is hermetically connected with the differential rotary importer rotating flange 15 and the ultrahigh vacuum cavity 6; and a rotating flange 17 configured to be rigidly connected with the differential rotary importer rotating flange 15 so as to drive the differential rotary importer rotating flange 15 to rotate along the tangential direction of the crucible base 1; the differential rotary introducer rotating flange 15 is able to rotate relative to the differential rotary introducer fixed flange 16 and maintain a sealed connection.
In an embodiment of the present invention, in the electron beam evaporation coating system, the fixing system further includes: a second fixed platform 18 configured to rigidly couple with the differential rotary introducer fixed flange 16; a main flange 19, arranged between the first fixed platform 11 and the second fixed platform 18, rigidly connected to the side wall of the ultra-high vacuum chamber 6; the main flange 19 is rigidly connected to the second fixed platform 18; the main flange 19 is rigidly connected to the first fixed platform 11 by a flange support column 20.
In an embodiment of the present invention, in the electron beam evaporation coating system, the method further includes: a driving guide ring 21 configured to pass through the center positions of the main flange 19, the second fixing platform 18, the differential rotary introducer fixing flange 16, the differential rotary introducer rotating flange 15 and the rotating flange 17 in this order; the driving guide ring 21 is rigidly connected with the first rotating platform 10 through a thread structure 22, and the driving guide ring 21 is rigidly connected with the rotating flange 17; the water inlet pipe 23 and the water outlet pipe 23 are accommodated in the driving guide ring 21, and are connected to the water cooling cover 3 after passing through the driving guide ring 21 and the first rotating platform 10; the baffle drive shaft 9 is accommodated in the drive guide ring 21, and is connected to the baffle 7 after passing through the drive guide ring 21, the first rotary table 10 and the crucible base 1. 2 water pipes are led out of the water cooling cover and respectively used as a water inlet pipe and a water outlet pipe, and the two water pipes welded with the water cooling cover are connected with the two water pipes welded with the rotating flange through corrugated pipes (flexible and bendable), so that cooling water is led into the water cooling cover.
In an embodiment of the present invention, as shown in fig. 4, in the electron beam evaporation coating system, the crucible interface 2 is a groove, the target 4 is directly placed in the groove, or a tungsten crucible 34 is placed in the groove, the target 4 is placed in the tungsten crucible 34, and the tungsten material is insoluble at high temperature and suitable for evaporation at higher temperature; the inner ring of the second bearing 24 is fixed on the baffle driving shaft 9 through a screw 25 and a gasket 26; the outer ring of the second bearing 24 is fixed on the baffle 7 through a bearing seat 27; when the baffle driving shaft 9 rotates along the tangential direction of the crucible base 1, the baffle 7 is static; the shutter drive shaft 9 is fixed to a drive shaft of a linear movement displacer 28, and the linear movement displacer 28 moves the shutter drive shaft 9 up and down.
The utility model provides an among the electron beam evaporation coating system, drive water-cooling cover 3 and crucible base 1 through the rotation system and rotate, so that one or more in the crucible interface 2 remove to the below of first position, electron beam emitter 5 aims at the first position transmission electron beam above crucible base 1, can carry out before whole technological process goes on, place multiple target 4 respectively in different crucible interfaces 2, when needing to use different target 4 to carry out the coating by vaporization, only need to rotate the crucible interface 2 that required target 4 corresponds to the first position and can realize different coating by vaporization technologies, and different target 4 coating by vaporization; as shown in fig. 5, the crucible base 1 is water-cooled at the bottom of the crucible base 1 by the water-cooling cover 3, the crucible base 1 can be water-cooled, the crucible material is prevented from being evaporated and polluting the evaporated target material 4 and the evaporated substrate 36, the target material 4 at the bottom of the crucible interface 2 is water-cooled, the preparation of the high-purity thin film is realized, the target material 4 at the bottom in the crucible interface 2 is kept solid by water-cooling the bottom of the crucible base 1, the heating area of the evaporant is small, the heat radiation loss is reduced, and the heat efficiency is high.
The utility model discloses relative other system's advantage: the ultrahigh vacuum is compatible, all the seals are ultrahigh vacuum seals, and an ultrahigh vacuum system can be compatible; the number of crucible interfaces can be freely increased; the crucible base is directly connected with the water cooling cover, so that the cooling efficiency is high; the mechanical rotation is rotated through the differential rotation importer, so that the integral stability is good and the reliability is high.
In summary, the above embodiments have described the different configurations of the electron beam evaporation coating system in detail, and of course, the present invention includes but is not limited to the configurations listed in the above embodiments, and any modifications based on the configurations provided by the above embodiments are all within the scope of the present invention. One skilled in the art can take the contents of the above embodiments to take a counter-measure.
The embodiments in the present description are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other. For the system disclosed by the embodiment, the description is relatively simple because the system corresponds to the method disclosed by the embodiment, and the relevant points can be referred to the method part for description.
The above description is only for the preferred embodiment of the present invention and is not intended to limit the scope of the present invention, and any modification and modification made by those skilled in the art according to the above disclosure are all within the scope of the claims.
Claims (10)
1. An electron beam evaporation coating system, comprising:
a crucible base having a plurality of crucible ports disposed on an upper surface thereof, wherein the crucible ports are configured to carry a target material;
a water-cooling cover disposed at the crucible base and configured to water-cool the crucible base;
an electron beam emitting device configured to emit an electron beam at a first position; and
and the rotating system is configured to drive the water cooling cover and the crucible base to rotate so as to enable the target material carried by the crucible interface to move to a first position.
2. The electron beam evaporation coating system of claim 1, wherein the crucible base is disk-shaped and the crucible ports are circumferentially distributed on the surface of the crucible base.
3. The electron beam evaporation coating system of claim 2, further comprising:
the ultrahigh vacuum cavity is configured to accommodate the crucible base and the water cooling cover so as to limit the crucible base and the water cooling cover to move along the radial direction of the crucible base;
the rotating system is configured to drive the crucible base and the water cooling cover to rotate along the tangential direction of the crucible base; and
and the fixing system is configured to limit the axial movement of the crucible base and the water cooling cover along the crucible base, and limit the axial and radial movement of the rotating system along the crucible base.
4. The electron beam evaporation coating system of claim 3, further comprising:
a baffle configured to cover a surface of the crucible base and having an opening below a first position to expose a crucible interface moved below the first position;
the baffle supporting column is configured to limit the baffle so as to limit the baffle to move along the radial direction of the crucible base and rotate along the tangential direction of the crucible base; and
and the baffle driving shaft is configured to abut against the center of the bottom surface of the baffle and drive the baffle to move along the axial direction of the crucible base.
5. The electron beam evaporation coating system of claim 4,
the baffle and the baffle supporting column are both positioned in the ultrahigh vacuum cavity;
the crucible base is rigidly connected with the water cooling cover;
the fixing system is rigidly connected with the side wall of the ultrahigh vacuum cavity.
6. The electron beam evaporation coating system of claim 5, wherein the rotation system comprises a first rotation stage, and the fixture system comprises a first fixture stage;
the first rotating platform drives the water cooling cover to rotate;
the first fixed platform limits the first rotating platform to move along the axial direction and the radial direction of the crucible base;
the first rotating platform comprises a side end part close to the first fixed platform and a platform part close to the water cooling cover;
the platform part is rigidly connected with the water cooling cover through a fixed rod;
the side end part is fixed with the inner ring of the first deep groove ball bearing, and the first fixing platform is fixed with the outer ring of the first deep groove ball bearing;
the first fixed platform is fixed with the baffle support column.
7. The electron beam evaporation coating system of claim 6, wherein the rotation system further comprises:
a differential rotary introducer rotating flange disposed within the atmospheric environment outside the ultrahigh vacuum chamber and configured to drive the first rotating platform in rotation tangentially to the crucible base;
the differential rotary importer fixing flange is arranged in a vacuum environment in the ultrahigh vacuum cavity and is in sealing connection with the differential rotary importer rotating flange and the ultrahigh vacuum cavity; and
the rotating flange is configured to be rigidly connected with the differential rotation importer rotating flange so as to drive the differential rotation importer rotating flange to rotate along the tangential direction of the crucible base;
the differential rotary importer rotating flange can rotate relative to the differential rotary importer fixing flange and maintain sealing connection.
8. The electron beam evaporation coating system of claim 7, wherein the fixture system further comprises:
a second stationary platform configured to rigidly connect with the differential rotary introducer stationary flange;
the main flange is arranged between the first fixed platform and the second fixed platform and is rigidly connected with the side wall of the ultrahigh vacuum cavity;
the main flange is rigidly connected with the second fixed platform;
the main flange is rigidly connected with the first fixed platform through a flange support column.
9. The electron beam evaporation coating system of claim 8, further comprising:
the driving guide ring is configured to sequentially penetrate through the center positions of the main flange, the second fixing platform, the differential rotation importer fixing flange, the differential rotation importer rotating flange and the rotating flange;
the driving guide ring is rigidly connected with the first rotating platform through a thread structure and is rigidly connected with the rotating flange;
the water inlet pipe and the water outlet pipe are accommodated in the driving guide ring, penetrate through the driving guide ring and the first rotating platform and then are connected to the water cooling cover;
the baffle driving shaft is accommodated in the driving guide ring and is connected to the baffle after penetrating through the driving guide ring, the first rotating platform and the crucible base.
10. The electron beam evaporation coating system of claim 9, wherein the crucible interface is a groove, and the target is directly placed in the groove, or
Placing a tungsten crucible in the groove, and placing the target material in the tungsten crucible;
the inner ring of the second bearing is fixed on the baffle driving shaft through a screw and a gasket;
the outer ring of the second bearing is fixed on the baffle through a bearing seat;
when the baffle driving shaft rotates along the tangential direction of the crucible base, the baffle is static;
the baffle driving shaft is fixed on the driving shaft of the linear moving displacer, and the linear moving displacer drives the baffle driving shaft to move up and down.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120567150.6U CN214496458U (en) | 2021-03-19 | 2021-03-19 | Electron beam evaporation coating system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120567150.6U CN214496458U (en) | 2021-03-19 | 2021-03-19 | Electron beam evaporation coating system |
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| CN214496458U true CN214496458U (en) | 2021-10-26 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116904957A (en) * | 2023-09-13 | 2023-10-20 | 纳狮新材料有限公司杭州分公司 | Magnetron sputtering and electron beam composite coating device |
| CN116904957B (en) * | 2023-09-13 | 2024-05-10 | 纳狮新材料有限公司杭州分公司 | Magnetron sputtering and electron beam composite coating device |
-
2021
- 2021-03-19 CN CN202120567150.6U patent/CN214496458U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116904957A (en) * | 2023-09-13 | 2023-10-20 | 纳狮新材料有限公司杭州分公司 | Magnetron sputtering and electron beam composite coating device |
| CN116904957B (en) * | 2023-09-13 | 2024-05-10 | 纳狮新材料有限公司杭州分公司 | Magnetron sputtering and electron beam composite coating device |
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