CN214336683U - Cleaning device for processing round crystal - Google Patents

Abstract

The utility model discloses a belt cleaning device is used in round crystal processing, including the tank tower, the inside upper end of tank tower be equipped with the guide pillar, the guide pillar inner wall be equipped with the guide slot, the guide slot be connected with the spring and with spring coupling's spliced pole, the guide pillar be equipped with spacing piece, the spliced pole on be equipped with the draw-in groove that uses with spacing piece cooperation, the tip of spliced pole be equipped with the clean bench, tank tower bottom in the middle of be equipped with the pillar, pillar upper end be equipped with the motor and drive moving operation panel through the motor, tank tower bottom be equipped with the waste liquid case, the inside both sides of tank tower be equipped with the warm braw spout respectively, tank tower bottom be equipped with the electric fan heater of being connected with the warm braw spout, the utility model discloses advantage compared with prior art lies in: the cleaning liquid is prevented from being splashed to equipment and the surrounding polluted environment, the cleaning device is not required to be cleaned after the round crystal is cleaned, the cleaning device is convenient, the independent drying process is omitted, and the round crystal cleaning processing efficiency is improved.

Description

Cleaning device for processing round crystal

Technical Field

The utility model relates to a brilliant processing equipment technical field specifically is a belt cleaning device is used in brilliant processing of circle.

Background

A wafer is a silicon chip used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because it has a circular shape. Wafers are carriers used in the production of integrated circuits, and in general, wafers are referred to as single crystal silicon wafers. The monocrystalline silicon wafer is drawn and refined by common silica sand, a monocrystalline silicon rod is prepared by a series of measures of dissolution, purification and distillation, and the monocrystalline silicon rod becomes a wafer after being polished and sliced.

The existing wafer cleaning device is in the process of cleaning wafers, the cleaning liquid can be sputtered all around due to the effect of centrifugal force along with the rotation of the rotating table, so that equipment and the periphery are dirty, the environment is polluted, cleaning is needed after the cleaning is finished, the cleaning is troublesome, and in addition, the wafer cleaning device needs to transfer the wafers into a drying chamber to be dried after the cleaning is finished, so that the time is wasted, and the processing efficiency is reduced.

SUMMERY OF THE UTILITY MODEL

The to-be-solved technical problem of the utility model is overcome above technical problem, provide a belt cleaning device is used in processing of round brilliant, prevent that the washing liquid from sputtering equipment and peripheral polluted environment, need not to wash belt cleaning device after wasing the round brilliant, it is comparatively convenient, the air-dry equipment of addding air-dries the round brilliant after the round brilliant is washd, need not to go to and carry out the drying in the drying chamber, labour saving and time saving improves machining efficiency.

In order to solve the technical problem, the utility model provides a technical scheme does: a cleaning device for processing round crystal comprises a box frame, wherein a guide pillar is arranged at the upper end inside the box frame, a guide groove is arranged in the guide pillar, a connecting post is inserted in the guide groove, a spring is arranged between the connecting post and the guide groove, a limiting sheet is arranged on one side of the guide pillar, a clamping groove matched with the limiting sheet is arranged on the connecting post, a cleaning table is arranged at the lower end of the connecting post, a groove is formed in the cleaning table, a liquid nozzle and a cleaning pad are arranged in the groove, a water pump communicated with the liquid nozzle and a liquid medicine box and a clean water box respectively connected with the water pump are arranged at the upper end outside the box frame, a support column is arranged at the bottom of the box frame, a motor and an operation table driven by the motor and matched with the groove are arranged at the upper end of the operation table, at least one placing groove is arranged at the edge of the operation table, a waste liquid filtering port is arranged at the edge of the operation table, a waste liquid box positioned below the cleaning table is arranged at the bottom of the box frame, and warm air nozzles corresponding to the operation table are respectively arranged on two sides in the box frame, and a warm air blower connected with the warm air nozzles is arranged at the bottom of the box frame.

Compared with the prior art, the utility model the advantage lie in: during cleaning, the round crystal is placed in a placing groove on an operation table, a connecting column is pulled downwards, a cleaning table is in contact with the operation table, a limiting piece is pushed, the limiting piece is clamped in a clamping groove formed in the connecting column, continuous contact between a cleaning pad and the operation table is guaranteed, a liquid medicine box valve is opened, a water pump is operated, liquid medicine enters the cleaning table through the water pump, the cleaning pad below the cleaning table is soaked by liquid medicine sprayed out through a liquid nozzle, a motor is operated to drive the operation table to operate, redundant liquid medicine in the cleaning process flows into a waste liquid box through a waste liquid filtering opening formed in the operation table and a gap between a groove and the operation table, the liquid medicine is prevented from splashing around to pollute the environment, cleaning is not needed, convenience is achieved, after the liquid medicine is cleaned, the liquid medicine box valve is closed, a clear water box valve is opened to flush the liquid medicine on the surface of the round crystal, after cleaning is completed, the clear water valve is closed, the limiting piece is opened, the cleaning table is driven to ascend through a spring to be separated from the operation table, the same cleaning process is carried out to the another side to the round crystal of upset, washs back separation clean bench and operation panel, opens the electric fan heater and carries out the drying to the round crystal, need not to go to drying chamber in and dry, labour saving and time saving improves machining efficiency.

As the improvement, liquid medicine case and clear water case are equipped with the valve respectively, the water pump is connected with the valve that liquid medicine case and clear water case were equipped with respectively, improves the operating efficiency of water pump, comparatively convenient and fast.

As an improvement, a cavity is arranged in the cleaning table, the liquid nozzle is communicated with the cavity, and the water pump is connected with the cavity through a water pipe.

As the improvement, the operation panel is located the recess, clearance fit between recess and the operation panel, recess lateral wall cementing has the foam-rubber cushion, the cleaning pad cementing and the recess in, further avoid liquid medicine splatter to pollute equipment and surrounding environment.

As the improvement, one side the warm braw spout is equipped with two at least, and is more high-efficient to the air-drying of brilliant circle, promotes work efficiency.

As an improvement, the waste liquid tank is provided with a drain valve, so that waste liquid in the waste liquid tank can be conveniently cleaned, and the waste liquid tank is convenient and quick.

Drawings

Fig. 1 is a schematic structural view of the cleaning device for processing a wafer of the present invention.

Fig. 2 is a schematic structural view of a cleaning table of the cleaning device for processing the round crystal.

Fig. 3 is a schematic structural view of an operation table of the cleaning device for processing the round crystal of the present invention.

As shown in the figure: 1. the device comprises a box frame, 2, a spring, 3, a cleaning table, 4, a cleaning pad, 5, a motor, 6, an operation table, 7, a liquid medicine box, 8, a water pump, 9, a warm air nozzle, 10, a liquid nozzle, 11, a waste liquid filtering port, 12, a placing groove, 13, a waste liquid box, 14, a warm air blower, 15, a guide pillar, 16, a guide groove, 17, a limiting piece, 18, a connecting column, 19, a clear water box, 20, a support column, 21, a groove, 22 and a blow-down valve.

Detailed Description

The present invention will be described in further detail with reference to the accompanying drawings.

With the attached drawings, the cleaning device for processing the round crystal comprises a box frame 1, wherein the upper end inside the box frame 1 is provided with a guide post 15, a guide groove 16 is arranged in the guide post 15, a connecting post 18 is inserted in the guide groove 16, a spring 2 is arranged between the connecting post 18 and the guide groove 16, one side of the guide post 15 is provided with a limiting sheet 17, the connecting post 18 is provided with a clamping groove matched with the limiting sheet 17 for use, the lower end of the connecting post 18 is provided with a cleaning table 3, the cleaning table 3 is provided with a groove 21, a liquid nozzle 10 and a cleaning pad 4 are arranged in the groove 21, the upper end outside the box frame 1 is provided with a water pump 8 communicated with the liquid nozzle 10, a liquid medicine box 7 and a clean water box 19 which are respectively connected with the water pump 8, the bottom of the box frame 1 is provided with a support column 20, the upper end of the support column 20 is provided with a motor 5 and an operation table 6 which is driven by the motor 5 and is matched with the groove 21, the upper end of the operation table 6 is provided with at least one placing groove 12, the edge of operation panel 6 is equipped with useless filtrate mouth 11, 1 bottom of tank tower is equipped with the waste liquid case 13 that is located the clean bench 3 below, 1 inside both sides of tank tower are equipped with respectively and operate the corresponding warm braw spout 9 of 6, 1 bottom of tank tower is equipped with the electric fan heater 14 of being connected with warm braw spout 9.

The liquid medicine box 7 and the clear water box 19 are respectively provided with a valve, and the water pump 8 is respectively connected with the valves arranged on the liquid medicine box 7 and the clear water box 19.

The inside cavity that is equipped with of clean bench 3, liquid spout 10 and cavity intercommunication, water pump 8 pass through the water pipe and link to each other with the cavity.

Operation panel 6 is located recess 21, clearance fit between recess 21 and the operation panel 6, recess 21 lateral wall is spliced there is the foam-rubber cushion, 4 cycles of cleaning pad splice and recess 21 in, the cleaning pad 4 can select for use the sponge material.

At least two warm air nozzles 9 are arranged on one side.

The waste liquid tank 13 is provided with a blow-off valve 22.

When the device is used, the round crystal is placed in the placing groove, the connecting rod is pulled downwards to enable the cleaning table to be in contact with the operating table, the operating table is located in the groove in the cleaning table to enable the round crystal to be in contact with the cleaning pad, the limiting piece located on one side of the guide pillar is pushed, the limiting piece is clamped in the clamping groove formed in the connecting rod to fix the cleaning table, the valve of the liquid medicine box is opened, the water pump is started, liquid medicine enters the cavity and is sprayed out through the liquid medicine nozzle to soak the cleaning pad, the motor is simultaneously opened, the motor transmission shaft drives the operating table to operate, the cleaning pad grinds and cleans the round crystal, the cleaning pad and the sponge pad are arranged in the grinding and cleaning process, redundant liquid medicine generated in the cleaning process is less, the liquid medicine flows into the waste liquid box through a gap between the groove and the operating table and a waste liquid filter opening formed in the operating table, the valve of the liquid medicine tank is closed after the liquid medicine grinding, the valve of the clean water tank is opened, and the liquid medicine on the surface of the round crystal is washed, after the washing finishes, close valve and close motor and water pump simultaneously, take out spacing piece, spring upward movement in the guide slot drives the spliced pole and separates clean bench and operation panel, overturn the round crystal, carry out the washing flow the same with the front to the back, all wash the back that finishes, separate clean bench and operation panel, close the valve, water pump and motor, open the electric fan heater, dry the round crystal through the warm braw spout, need not to go to drying chamber again and dry, time saving and labor saving, the efficiency of machining is improved, after the work is accomplished, open the waste liquid that waste liquid case blowoff valve discharge produced when wasing.

The present invention and the embodiments thereof have been described above, but the description is not limited thereto, and the embodiment shown in the drawings is only one of the embodiments of the present invention, and the actual structure is not limited thereto. In summary, those skilled in the art should understand that they should not be limited to the embodiments described above, and that they can design the similar structure and embodiments without departing from the spirit of the invention.

Claims (6)

1. The utility model provides a belt cleaning device is used in processing of round crystal, includes tank tower (1), its characterized in that: the cleaning and cleaning device is characterized in that a guide pillar (15) is arranged at the upper end inside the box frame (1), a guide groove (16) is formed in the guide pillar (15), a connecting column (18) is inserted in the guide groove (16), a spring (2) is arranged between the connecting column (18) and the guide groove (16), a limiting sheet (17) is arranged on one side of the guide pillar (15), a clamping groove matched with the limiting sheet (17) for use is formed in the connecting column (18), a cleaning table (3) is arranged at the lower end of the connecting column (18), a groove (21) is formed in the cleaning table (3), a liquid nozzle (10) and a cleaning pad (4) are arranged in the groove (21), a water pump (8) communicated with a liquid nozzle (10) and a liquid tank (7) and a clear water tank (19) respectively connected with the water pump (8) are arranged at the upper end outside the box frame (1), a support pillar (20) is arranged at the bottom of the box frame (1), a motor (5) is arranged at the upper end, and is driven by the motor (5) and is matched with the groove (21) Operation panel (6) that close, operation panel (6) upper end is equipped with standing groove (12) that are no less than one, operation panel (6) edge is equipped with useless filtrating mouth (11), tank tower (1) bottom is equipped with waste liquid case (13) that are located wash station (3) below, tank tower (1) inside both sides are equipped with respectively and operate panel (6) corresponding warm braw spout (9), tank tower (1) bottom is equipped with electric fan heater (14) of being connected with warm braw spout (9).

2. The cleaning apparatus for wafer processing according to claim 1, wherein: the liquid medicine box (7) and the clear water box (19) are respectively provided with a valve, and the water pump (8) is respectively connected with the valves arranged on the liquid medicine box (7) and the clear water box (19).

3. The cleaning apparatus for wafer processing according to claim 1, wherein: the cleaning table (3) is internally provided with a cavity, the liquid nozzle (10) is communicated with the cavity, and the water pump (8) is connected with the cavity through a water pipe.

4. The cleaning apparatus for wafer processing according to claim 1, wherein: operation panel (6) are located recess (21), clearance fit between recess (21) and operation panel (6), recess (21) lateral wall cementing has the foam-rubber cushion, cleaning pad (4) cementing and in recess (21).

5. The cleaning apparatus for wafer processing according to claim 1, wherein: at least two warm air nozzles (9) are arranged on one side.

6. The cleaning apparatus for wafer processing according to claim 1, wherein: and the waste liquid tank (13) is provided with a drain valve (22).

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