CN213843753U - Precision positioning stepping system for direct-write lithography machine and direct-write lithography machine - Google Patents
Precision positioning stepping system for direct-write lithography machine and direct-write lithography machine Download PDFInfo
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- CN213843753U CN213843753U CN202022333628.7U CN202022333628U CN213843753U CN 213843753 U CN213843753 U CN 213843753U CN 202022333628 U CN202022333628 U CN 202022333628U CN 213843753 U CN213843753 U CN 213843753U
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Abstract
The utility model discloses a precision positioning step-by-step system and direct-write lithography machine for direct-write lithography machine, precision positioning step-by-step system includes: the base comprises two stand columns and a cross beam, the two stand columns are arranged at intervals along a first direction, the cross beam is connected to the tops of the two stand columns, a first strip-shaped hole extending along the first direction is formed in the cross beam, and the first strip-shaped hole penetrates through the cross beam along the vertical direction; the precise positioning stepping shaft is arranged on the cross beam and comprises a sliding seat, and the sliding seat can move along the first direction; the light path device penetrates through the sliding seat, and the exposure central axis of the light path device in the first direction is vertically aligned with the central axis of the first strip-shaped hole in the first direction. According to the utility model discloses a precision positioning stepping system for directly writing lithography machine, when being applied to directly writing lithography machine, directly write lithography machine's exposure yield and exposure precision obtain improving.
Description
Technical Field
The utility model belongs to the technical field of the platemaking lithography technique and specifically relates to a precision positioning stepping system and directly write lithography machine for directly writing lithography machine is related to.
Background
In the related art, a precision positioning motion platform of a lithography machine is a necessary key component of the lithography machine and comprises a precision positioning scanning shaft, a precision positioning lifting shaft and a precision positioning stepping shaft. The precision positioning motion platform can ensure that the components of the photoetching machine reach accurate positions along correct tracks along with the movement of the precision positioning motion platform in scanning exposure and stepping motion. However, the exposure center of the optical path device of the conventional lithography machine is far away from the movement center of the precise positioning moving platform, which causes a large abbe error in the exposure of the lithography machine, resulting in a low yield of the exposure of the lithography machine, and causes the dynamic characteristic of the precise positioning moving platform to affect the exposure precision of the lithography machine, resulting in a low exposure precision of the lithography machine.
SUMMERY OF THE UTILITY MODEL
The utility model discloses aim at solving one of the technical problem that exists among the prior art at least. Therefore, an object of the present invention is to provide a precision positioning stepping system for a direct-write lithography machine, which improves the exposure yield and the exposure precision of the direct-write lithography machine when the precision positioning stepping system is applied to the direct-write lithography machine.
Another object of the present invention is to provide a direct-write lithography machine with the above mentioned precision positioning stepping system.
According to the utility model discloses a precision positioning step-by-step system for directly writing lithography machine of first aspect embodiment, include: the base comprises two stand columns and a cross beam, the two stand columns are arranged at intervals along a first direction, the cross beam is connected to the tops of the two stand columns, a first strip-shaped hole extending along the first direction is formed in the cross beam, and the first strip-shaped hole penetrates through the cross beam along the vertical direction; the precise positioning stepping shaft is arranged on the cross beam and comprises a sliding seat, and the sliding seat can move along the first direction; the light path device penetrates through the sliding seat, and the exposure central axis of the light path device in the first direction is vertically aligned with the central axis of the first strip-shaped hole in the first direction.
According to the utility model discloses a precision positioning step system for directly writing lithography machine, through be formed with on the crossbeam along the first elongated hole of first direction extension and first elongated hole along upper and lower direction running through the crossbeam, precision positioning step shaft establishes on the crossbeam, and make light path device wear to establish on the slide along the mobilizable precision positioning step shaft of first direction, and make the exposure the central axis on the first direction of light path device and the central axis in the first direction of first elongated hole align from top to bottom, when being applied to directly writing lithography machine, make directly writing lithography machine compact structure, the influence of precision positioning step shaft dynamic characteristic directly writing lithography machine exposure has been reduced, the abbe error is little, exposure yield and exposure precision are high.
According to some embodiments of the utility model, be formed with on the slide along the second rectangular shape hole that first direction extends, the light path device passes the setting of second rectangular shape hole is in on the slide.
According to some embodiments of the present invention, the precision positioning stepping shaft further comprises: the two guide rails are arranged on the cross beam and extend along the first direction, and the sliding seat can be slidably arranged on the two guide rails.
According to some embodiments of the invention, two the guide rail for the first rectangular hole in the first direction the center axis symmetry sets up the edge of crossbeam.
According to some embodiments of the utility model, the edge in first rectangular shape hole the central axis of first direction with the edge of crossbeam the central axis of first direction aligns from top to bottom, the edge in second rectangular shape hole the central axis of first direction with the edge of slide the central axis of first direction aligns from top to bottom.
According to some embodiments of the present invention, the precision positioning stepping shaft further comprises: two linear electric motor of parallel connection, every linear electric motor includes stator and active cell, two the stator is all established just be located respectively on the crossbeam the both sides in first rectangular hole, every the stator all follows the first direction extends, two the active cell is all established the slide with the base is relative on the surface and is located respectively the both sides in first rectangular hole, two linear electric motor is used for the drive the slide is followed the first direction removes.
According to some embodiments of the present invention, the base is a marble base.
According to the utility model discloses directly write lithography machine of second aspect embodiment, include according to the utility model discloses the accurate positioning step-by-step system for directly write lithography machine of above-mentioned first aspect embodiment.
According to some embodiments of the utility model, the direct-write lithography machine further includes at least one precision positioning scanning axle, the precision positioning scanning axle is established the below of crossbeam, the precision positioning scanning axle is in the first direction place horizontal plane, along with first direction vertically second direction extends, just the precision positioning scanning axle is followed the second direction is portable.
According to the utility model discloses a some embodiments, directly write lithography machine further includes at least one precision positioning lift axle, the precision positioning lift axle can be established with reciprocating on the precision positioning scanning is epaxial.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a perspective view of a direct write lithography machine including a precision positioning stepper system according to an embodiment of the present invention;
FIG. 2 is a partial schematic view of a precision positioning stepper system of the direct write lithography machine shown in FIG. 1.
Reference numerals:
a direct write lithography machine 200; a precision positioning stepper system 100; a base 1; a column 12; a cross beam 13; a first elongated hole 131; precisely positioning the stepping shaft 2; a slider 21; a second elongated hole 211; a guide rail 22; a linear motor 23; a stator 231; a mover 232; an optical path device 3; an optical head 31; precisely positioning the scanning shaft 101; a precision positioning lifting shaft 102; vacuum cups 103.
Detailed Description
Embodiments of the present invention are described in detail below, and the embodiments described with reference to the drawings are exemplary.
A precision positioning stepper system 100 for a direct write lithography machine 200 according to an embodiment of the first aspect of the present invention is described below with reference to fig. 1-2. The direct write lithography machine 200 may be a dual-mesa direct write lithography machine. In the following description of the present application, the direct write lithography machine 200 is exemplified as a dual-mesa direct write lithography machine. Of course, it will be understood by those skilled in the art that the direct write lithography machine 200 can also be other types of direct write lithography machines, such as a single-stage direct write lithography machine, a multi-stage direct write lithography machine, and the like, and is not limited to a double-stage direct write lithography machine.
As shown in fig. 1 and fig. 2, a precision positioning stepping system 100 for a direct-write lithography machine 200, such as a dual-stage direct-write lithography machine, according to an embodiment of the present invention includes a base 1, a precision positioning stepping shaft 2, and an optical path device 3.
Wherein the base 1 can provide support for various components of the precision positioning stepper system 100 and other components of the direct write lithography machine 200, such as a dual-stage direct write lithography machine. The precision positioning stepping shaft 2 can carry the light path device 3 to make stepping motion. The optical path apparatus 3 may include one or more optical heads 31, and the one or more optical heads 31 may face an underlying workpiece such as a Printed Circuit Board (PCB) to perform an exposure operation. In fig. 1, 8 optical heads 31 are shown for illustrative purposes, but it is obvious to those skilled in the art after reading the following technical solutions that the solution can be applied to the technical solutions of fewer or more optical heads 31, which also falls within the protection scope of the present invention.
Specifically, referring to fig. 1 and 2, the base 1 may include two columns 12, and the two columns 12 are spaced apart in the first direction. The base 1 further comprises a cross beam 13, the cross beam 13 is connected to the tops of the two columns 12, a first elongated hole 131 extending along the first direction is formed in the cross beam 13, and the first elongated hole 131 penetrates through the cross beam 13 along the up-down direction. The "up-down direction" refers to a third direction perpendicular to the horizontal plane in fig. 1 in which the first direction is located. So arranged, the two uprights 12 and the cross beam 13 form a hollow gantry structure. Alternatively, as shown in fig. 2, the length of the first elongated hole 131 in the first direction is smaller than the length of the cross member 13 in the first direction. Alternatively, the first elongated hole 131 shown in fig. 1-2 is an oblong hole with both ends being arc-shaped. It is understood that the shape of the first elongated hole 131 may also be other shapes, for example, the shape of the first elongated hole 131 may also be a rectangular elongated hole, etc.
Referring to fig. 1 and 2, the fine positioning stepping shaft 2 is provided on a cross beam 13, and in this case, the cross beam 13 can provide a supporting function for the fine positioning stepping shaft 2, and the cross beam 13 can be referred to as a base of the fine positioning stepping shaft 2. The fine positioning stepping shaft 2 may include a slider 21, the slider 21 being movable in a first direction. The optical path device 3 may be disposed through the slide base 21. The slide base 21 can drive the optical path device 3 to move in the same direction while moving. Alternatively, the heights of the two uprights 12 may be equal, so as to ensure that the carriage 21 can remain horizontal and slide in a horizontal plane along the first direction.
As shown in fig. 2, the exposure central axis in the first direction of the optical path device 3 is aligned up and down with the central axis in the first direction of the first elongated hole 131. With this arrangement, a workpiece to be exposed, such as a PCB board, can be moved to a position right below the first elongated hole 131 of the hollow gantry structure, and light emitted from the optical head 31 of the optical path device 3 passes through the first elongated hole 131 to reach the workpiece, thereby exposing the workpiece. In addition, with this arrangement, the projection of the exposure central axis of the optical path device 3 in the first direction coincides with the central axis of the first elongated hole 131 in the first direction, in other words, the exposure central axis of the optical path device 3 in the first direction can be regarded as coinciding with the central axis of the first elongated hole 131 in the first direction, and further the exposure central axis of the optical path device 3 coincides with the movement central axis of the precision movement stepping shaft 2, so that the abbe error can be reduced.
According to the utility model discloses a precision positioning stepping system 100 for directly writing lithography machine 200, through be formed with on crossbeam 13 along the first direction extension first rectangular hole 131 and first rectangular hole 131 along upper and lower direction run through crossbeam 13, precision positioning stepping shaft 2 establishes on crossbeam 13 and makes light path device 3 wear to establish on the slide 21 of the mobilizable precision positioning stepping shaft 2 of first direction, and make the exposure the central axis of light path device 3 on first direction and the central axis of first rectangular hole 131 align from top to bottom on the first direction, when being applied to directly writing lithography machine 200, make the compact structure of directly writing lithography machine 200, the influence of precision positioning stepping shaft 2 dynamic characteristic to directly writing lithography machine 200 exposure has been reduced, the abbe error is little, exposure yield and exposure precision are high.
Further, referring to fig. 1 to 2, a second elongated hole 211 extending in the first direction may be formed on the slide base 21, and the light path device 3 is disposed on the slide base 21 through the second elongated hole 211. From this, by providing the second elongated hole 211 extending in the first direction and disposing the optical path device 3 on the slide base 21 through the second elongated hole 211, it is possible to further ensure that the exposure central axis of the optical path device 3 is in the first direction, thereby ensuring that the exposure central axis of the optical path device 3 is more accurately aligned with the central axis of the first elongated hole 131 in the first direction up and down, further reducing the abbe error of the direct write lithography machine 200, such as a double-deck direct write lithography machine, improving the exposure yield thereof and improving the exposure accuracy. It will be appreciated that the carriage 21 has a high rigidity and is not easily deformed, so that the position of the optical path device 3 provided on the carriage 21 is not easily changed, which makes the exposure central axis of the optical path device 3 in the first direction not easily changed.
According to some embodiments of the present invention, as shown in fig. 1-2, the precision positioning stepping shaft 2 may further include two guide rails 22, the two guide rails 22 are both disposed on the cross beam 13 and both extend along the first direction, and the sliding base 21 is slidably mounted on the two guide rails 22. The carriage 21 can now slide in a first direction on two guide rails 22. This can make precision positioning step shaft 2, more exactly the step motion of slide 21 more smooth and easy, and guarantee that slide 21 and then guarantee that light path device 3 accurately is step motion along first direction, make slide 21 and then light path device 3's step motion direction can not take place the deviation, this finally can further ensure that the exposure central axis of light path device 3 coincides in the upper and lower direction with the central axis of hollow longmen structure's first rectangular hole 131, and the exposure central axis of light path device 3 is unanimous with the movement central axis of precision motion step shaft 2 promptly. It will be appreciated that the stepping movement of the slide 21 for fine positioning of the stepping axis 2 can also be achieved in other ways, not only by mounting the slide 21 on the two guide rails 22.
Further, as shown in fig. 2, two guide rails 22 may be provided at the edge of the cross member 13 symmetrically with respect to the central axis of the first elongated hole 131 in the first direction. This may make the arrangement of the two guide rails 22 more convenient. Of course, the arrangement positions of the two guide rails 22 are not limited thereto as long as they can achieve the sliding of the slider 21.
According to some embodiments of the present invention, referring to fig. 2, the central axis along the first direction of the first elongated hole 131 is aligned with the central axis along the first direction of the cross beam 13 up and down, and the central axis along the first direction of the second elongated hole 211 is aligned with the central axis along the first direction of the slide 21 up and down. So set up, not only be convenient for slide 21 and hollow gantry structure's manufacturing, more make things convenient for first rectangular hole 131 and second rectangular hole 211 to aim at in the ascending accuracy of vertical side to more make things convenient for the central axis along first direction of first rectangular hole 131 and the central axis along first direction of second rectangular hole 211 and then aim at with the accurate of light path device 3's exposure central axis. Of course, the central axis of the first elongated hole 131 in the first direction may not be vertically aligned with the central axis of the beam 13 in the first direction, and the central axis of the second elongated hole 211 in the first direction may not be vertically aligned with the central axis of the slider 21 in the first direction, as long as it is ensured that the exposure central axis of the optical path device 3 is vertically aligned with the central axis of the first elongated hole 131.
According to the utility model discloses a further embodiment, precision positioning step shaft 2 can further include two linear electric motor 23 of parallel connection, every linear electric motor 23 includes stator 231 and active cell 232, two stators 231 all establish on crossbeam 13 and are located the both sides of first rectangular shape hole 131 respectively, every stator 231 all extends along the first direction, two active cells 232 all establish slide 21 with base 1 relative on the surface and be located the both sides of first rectangular shape hole 131 respectively, two linear electric motor 23 are used for driving slide 21 and remove along the first direction. The two parallel linear motors 23 thus provided can provide a greater power for the sliding of the slider 21 along the guide rails 22, so that the sliding of the slider 21 is smoother, and can synchronize the sliding of the slider 21 on the two guide rails 22, so that the slider 21 can slide smoothly along the first direction. As shown in fig. 2, the movers 232 of the two linear motors 23 may also be respectively disposed at both sides of the second elongated hole 211, and the order of disposition of the stators 231 and the movers 232 of the two linear motors 23 in the second direction is the same. Of course, those skilled in the art will understand that the order of the stators 231 and the movers 232 of the two linear motors 23 in the second direction may be different. In addition, the cables of the movers 232 of the two linear motors 23 are connected to an electric control system (not shown).
Optionally, the base 1 is a marble base. The marble material has high hardness, no deformation and long service life. Of course, the material of the base 1 is not limited to marble, and may be other materials having high hardness.
According to the direct-write lithography machine 200 of the second aspect of the present invention, as shown in fig. 1, the precise positioning stepping system 100 of the first aspect of the present invention may be included.
Therefore, according to the utility model discloses direct-write lithography machine 200, through including precision positioning stepper system 100, the abbe error is little, and exposure yield and exposure precision are high.
According to some embodiments of the present invention, referring to fig. 1, the direct-write lithography machine 200 further includes at least one precision positioning scanning shaft 101, the precision positioning scanning shaft 101 is disposed below the beam 13, the precision positioning scanning shaft 101 extends along a second direction perpendicular to the first direction in a horizontal plane where the first direction is located, and the precision positioning scanning shaft 101 is movable along the second direction. Specifically, as shown in fig. 1, the fine positioning scanning shaft 101 is installed on the base 1, and the fine positioning scanning shaft 101 can move along the second direction, so as to drive the workpiece, such as a PCB board, on the vacuum chuck 103 to move along the second direction, and when the PCB board moves along the second direction and moves to a position right below the optical path device 3 of the fine positioning stepping shaft 2, the optical path device 3 exposes the PCB board located right below the PCB board.
Further, as shown in fig. 1, there are two fine positioning scanning shafts 101, and the two fine positioning scanning shafts 101 are provided at an interval in the first direction. In this case, the direct write lithography machine 200 may be a dual-mesa direct write lithography machine. Fig. 1 shows two parallel arranged fine positioning scanning axes 101. The two fine positioning scanning axes 101 may be respectively moved along the second direction. Specifically, one of the two fine positioning scanning shafts 101 may move along the second direction to be directly below the first elongated hole 131 of the hollow gantry structure, the optical path device 3 of the fine positioning stepping shaft 2 may move to be directly above the one of the fine positioning scanning shafts 101 along with the movement of the slider 21 on the guide rail 22, and expose the PCB placed on the one of the fine positioning scanning shafts 101 and the one of the fine positioning scanning shafts 101 continues to move with the PCB until the optical path device 3 completes exposure of the entire PCB. When the exposure of the PCB is completed, the other fine positioning scanning shaft 101 may already carry another PCB to reach the position right below the first elongated hole 131, the slide carriage 21 carries the optical path device 3 to move on the guide rail 22, so that the optical path device 3 moves to the position right above the other PCB, and the optical path device 3 performs the same exposure operation on the other PCB. Thus, the optical path device 3 can alternatively expose the PCB boards on the two precision positioning scanning axes 101, thereby saving the waiting time in the exposure process and greatly improving the productivity.
Further, as shown in fig. 1, the direct write lithography machine 200 may further include at least one precision positioning elevating shaft 102, and the precision positioning elevating shaft 102 is movably disposed on the precision positioning scanning shaft 101 up and down. For example, when the fine positioning scanning axis 101 is one, the direct write lithography machine 200 may include one fine positioning elevating axis 102; when there are two precision positioning scanning shafts 101, the direct write lithography machine 200 may include two precision positioning lifting shafts 102, and the two precision alignment lifting shafts 102 are respectively located on the two precision positioning scanning shafts 101, as shown in fig. 1. The two precision positioning lift shafts 102 shown in fig. 1 also extend in a second direction and are arranged in parallel. The fine positioning elevating shaft 102 can move up and down in a vertical direction, thereby finding an optimal focal plane of the PCB to be exposed.
The operation of other components of the direct-write lithography machine 200 according to embodiments of the present invention, such as the electronic control system, etc., are known to those of ordinary skill in the art and will not be described in detail herein.
In the description of the present invention, it is to be understood that the terms "center", "length", "upper", "lower", "vertical", "horizontal", "top", "bottom", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are used merely for convenience of description and simplification of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
In the description of the present invention, the first feature may be "on" or "under" the second feature, and may include the first and second features being in direct contact, or the first and second features being in contact with each other not directly but through another feature therebetween.
In the description of the invention, the first feature being "on" or "above" the second feature includes the first feature being directly above and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature.
In the description herein, references to the description of the term "some embodiments" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example.
While embodiments of the present invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.
Claims (10)
1. A precision positioning stepping system for a direct write lithography machine, comprising:
the base comprises two stand columns and a cross beam, the two stand columns are arranged at intervals along a first direction, the cross beam is connected to the tops of the two stand columns, a first strip-shaped hole extending along the first direction is formed in the cross beam, and the first strip-shaped hole penetrates through the cross beam along the vertical direction;
the precise positioning stepping shaft is arranged on the cross beam and comprises a sliding seat, and the sliding seat can move along the first direction;
the light path device penetrates through the sliding seat, and the exposure central axis of the light path device in the first direction is vertically aligned with the central axis of the first strip-shaped hole in the first direction.
2. The precision positioning stepping system for a direct write lithography machine according to claim 1, wherein said carriage is formed with a second elongated hole extending in said first direction, said light path means being provided on said carriage through said second elongated hole.
3. The precision positioning stepping system for a direct write lithography machine according to claim 1, wherein said precision positioning stepping axis further comprises:
the two guide rails are arranged on the cross beam and extend along the first direction, and the sliding seat can be slidably arranged on the two guide rails.
4. The precision positioning stepping system for a direct write lithography machine according to claim 3, wherein two of said guide rails are disposed at an edge of said beam symmetrically with respect to said central axis of said first elongated hole in said first direction.
5. The precision positioning stepping system for a direct write lithography machine according to claim 2, wherein a central axis of said first elongated hole in said first direction is aligned up and down with a central axis of said beam in said first direction, and a central axis of said second elongated hole in said first direction is aligned up and down with a central axis of said carriage in said first direction.
6. The precision positioning stepping system for a direct write lithography machine according to any one of claims 1 to 5, wherein said precision positioning stepping axis further comprises:
two linear electric motor of parallel connection, every linear electric motor includes stator and active cell, two the stator is all established just be located respectively on the crossbeam the both sides in first rectangular hole, every the stator all follows the first direction extends, two the active cell is all established the slide with the base is relative on the surface and is located respectively the both sides in first rectangular hole, two linear electric motor is used for the drive the slide is followed the first direction removes.
7. The precision positioning stepping system for a direct write lithography machine according to any one of claims 1 to 5, wherein said base is a marble base.
8. A direct write lithography machine, comprising a precision positioning stepping system for a direct write lithography machine according to any one of claims 1 to 7.
9. The direct-write lithography machine according to claim 8, further comprising:
the precise positioning scanning shaft is arranged below the cross beam, extends in a second direction perpendicular to the first direction in a horizontal plane where the first direction is located, and is movable in the second direction.
10. The direct-write lithography machine according to claim 9, further comprising:
and the precise positioning lifting shaft is arranged on the precise positioning scanning shaft in a manner of moving up and down.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202022333628.7U CN213843753U (en) | 2020-10-19 | 2020-10-19 | Precision positioning stepping system for direct-write lithography machine and direct-write lithography machine |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202022333628.7U CN213843753U (en) | 2020-10-19 | 2020-10-19 | Precision positioning stepping system for direct-write lithography machine and direct-write lithography machine |
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| CN213843753U true CN213843753U (en) | 2021-07-30 |
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