CN218886399U - Alignment system and direct-write lithography machine - Google Patents

Abstract

The utility model provides an alignment system and direct-write lithography machine, alignment system wherein is provided with drive assembly including aiming at the crossbeam on aiming at the crossbeam, and at least three slide subassembly moves the setting on drive assembly, aims at the subassembly and is fixed in on the slide subassembly, the alignment direction perpendicular to drive assembly of slide subassembly. The alignment system is provided with at least three groups of alignment assemblies controlled to move on the same alignment beam, and the moving path of each alignment assembly is parallel and can be controlled independently, so that the multi-point simultaneous alignment and positioning of an exposed substrate can be realized by controlling the coordinated motion of a plurality of alignment assemblies in the process of aligning the substrate, the alignment time when the substrate needs to be aligned by areas and multi-points is effectively reduced, and the exposure preparation time of the substrate is shortened.

Description

Alignment system and direct-writing lithography machine

Technical Field

The utility model relates to an aim at positioner technical field, concretely relates to alignment system and direct-write lithography machine.

Background

The photoetching machine is a key device in the field of semiconductor and circuit board production, wherein compared with the traditional photoetching machine, the direct writing photoetching machine saves the working procedure of manufacturing a film negative film or a photomask and realizes the advantages of high productivity, high alignment precision and good exposure quality. The positioning platform system is used as a necessary key component of the direct-write photoetching machine, and the application range and the performance of the direct-write photoetching machine are ensured. . The positioning platform system in the direct-writing photoetching machine consists of a plurality of modules. The alignment positioning platform is a key module necessary for a positioning platform system. In the exposure production of the lithography machine, the alignment positioning platform needs to measure the alignment of the exposed substrate so as to calculate the position relationship of the substrate and perform operation processing on the exposed pattern. The single-axis alignment positioning platform is the most common at present, and in some special application scenarios, the double-axis alignment positioning platform is formed by using a double-sliding seat mode at most.

At present, in direct-write lithography equipment, a single-shaft or double-shaft alignment positioning platform is mostly adopted, so that only two-point alignment of an exposure substrate can be realized at the same time. However, in the prior art, the exposure substrate is basically aligned at multiple points in different areas or has a jointed board, each row of the substrate has multiple alignment holes, and obviously, the dual-axis alignment positioning platform needs to move for multiple times to position the alignment holes, thereby prolonging the alignment time, increasing the time required by the production and exposure of the direct-writing lithography equipment, affecting the production capacity of the lithography machine, reducing the efficiency of the lithography machine, and being not beneficial to reducing the production cost.

SUMMERY OF THE UTILITY MODEL

To the problem of current alignment positioning platform alignment time extension when needing the multiple spot counterpoint, the utility model provides an alignment system and direct-write lithography machine.

The technical scheme of the utility model an align system is provided, it includes and aims at the crossbeam, still include aim at the crossbeam on controlled parallel translation's three at least groups aim at the subassembly, aim at its moving path of the alignment direction perpendicular to of subassembly.

Specifically, the alignment beam is provided with a driving assembly, at least three sliding seat assemblies are movably arranged on the driving assembly, the alignment assembly is fixed on the sliding seat assemblies, and the alignment direction of the sliding seat assemblies is perpendicular to the driving assembly.

Specifically, the driving assembly is a linear motor stator, and each sliding seat assembly is provided with a linear motor rotor so as to realize independent movement of each sliding seat assembly.

Specifically, at least one group of guide assemblies arranged in parallel with the driving assembly are arranged on the aligning cross beam, and the plurality of sliding seat assemblies are movably arranged on the guide assemblies.

Specifically, a right anti-collision device and a left anti-collision device are respectively arranged at two ends of the driving assembly on the aligning cross beam, and a right limiting device and a left limiting device are arranged at two ends of the driving assembly, close to the driving assembly relative to the right anti-collision device and the left anti-collision device.

Specifically, the alignment system is provided with a moving spacing device on at least one side surface among the side surfaces of the plurality of slide assemblies adjacent to each other.

Specifically, a linear grating is further arranged on the alignment beam in parallel to the driving assembly, and the plurality of sliding seat assemblies share the linear grating to realize measurement of movement displacement.

Specifically, a reference zero point is arranged in the middle one third area of the linear grating in the length direction.

Specifically, the reference zero point is arranged at a central position in the length direction of the linear grating.

The technical scheme of the utility model still provide an alignment system, it is provided with the workstation of placing the exposure base plate to directly write the lithography machine to move on the base, directly write the lithography machine and span the base is provided with exposure system and foretell alignment system.

Specifically, the base and the alignment beam of the alignment system are both made of marble materials.

The utility model discloses an alignment system is provided with the alignment subassembly of the controlled removal of at least three groups on same alignment crossbeam, and every is aimed at the removal route of subassembly and parallel and can the independent control, consequently can be at the in-process of aiming at the base plate, and the multiple spot that realizes exposing the base plate through controlling a plurality of alignment subassembly coordinated motions is aimed at the location simultaneously, effectively reduces the alignment time when the base plate needs to divide the regional multiple spot to counterpoint to reduce the exposure preparation time of base plate.

Drawings

FIG. 1 is a schematic view of an alignment system of the present invention;

fig. 2 is a schematic diagram of the zeroing process of the alignment system of the present invention.

In the figure, the position of the upper end of the main shaft,

1 alignment beam 2, alignment assembly 11, driving assembly 12, guide assembly 13, linear grating 14, reference zero 16, left limiting device 17, right limiting device 18, left anti-collision device 19, right anti-collision device 21, sliding seat assembly 22, inter-movement limiting device 21A, first sliding seat 21B, second sliding seat 21C, third sliding seat

Detailed Description

The present invention will be described in detail with reference to the accompanying drawings and specific embodiments, wherein the dimensional ratios in the drawings do not represent actual dimensional ratios, and are only used for representing relative positional relationships and connection relationships between components, and the components with the same names or the same reference numbers represent similar or identical structures and are only used for illustrative purposes.

As shown in fig. 1, the alignment system of the present invention comprises an alignment beam 1 and at least three sets of alignment assemblies 2 controlled for parallel movement on the alignment beam 1. The alignment beam 1 is typically arranged across the platform, the alignment beam 1 preferably being of marble material, and the path of movement of the alignment modules 2 is parallel to the platform, arranged along the width of the platform, so that the alignment direction of the alignment modules 2 is arranged generally perpendicular to its path of movement and directed towards the platform. The control system controls the alignment assemblies 2 to synchronously move and align on the alignment beam 1 in a coordinated manner, so that alignment holes in a plurality of areas on the exposure substrate can be simultaneously searched and positioned. Thereby compressing the alignment time and improving the exposure production efficiency.

The alignment beam 1 is provided with a drive assembly 11, at least three slide assemblies 21 are movably arranged on the drive assembly 11, and the alignment assembly 2 is fixed on the slide assemblies 21. The slide assemblies 21 can be controlled to move on the driving assembly 11 independently, and the control system can control the moving state of the plurality of slide assemblies 21 to realize the coordination of the movement among the plurality of slide assemblies 21 and the task distribution of the alignment points. Therefore, even if a plurality of slide assemblies 21 are arranged on the same driving assembly 11, the slide assemblies can move in coordination under the action of a control system without mutual interference. Specifically, the driving assembly 11 may be a stator of a linear motor, and a mover of the linear motor is disposed on each of the carriage assemblies 21, so that the control system may control the plurality of carriage assemblies 21 independently by controlling the current of the mover of the linear motor on each of the carriage assemblies 21. Under the arrangement, the stator is shared, so that the use of parts can be reduced, the structural arrangement on the aligning beam 1 is simpler, and the scheme assembly and the subsequent maintenance are realized. On the other hand, since the carriage assemblies 21 are all on the same part, if the structure of the drive assembly 11 changes with temperature or other conditions of the external environment, the influence of the drive assembly 11 on the movement of each carriage assembly 21 is the same, thus contributing to the improvement of the alignment accuracy of the alignment assembly 2. At least one set of guide assemblies 12 arranged parallel to the drive assembly 11 can be arranged on the alignment beam 1, and a plurality of carriage assemblies 21 can also be arranged movably on the guide assemblies 12. The multi-guide assembly 12 is arranged to perform auxiliary guide on the sliding seat assembly 21, mainly to eliminate the shake of the alignment direction of the alignment assembly 2 in the moving process of the sliding seat assembly 21, and to improve the stability of the sliding seat assembly 21 in the moving process.

A right anti-collision device 19 and a left anti-collision device 18 are respectively arranged at two ends of the driving assembly 11 on the aligning beam 1, so that the sliding seat assembly 21 is prevented from being separated from the driving assembly 11 during the movement process to cause installation accidents. And a right limiting device 17 and a left limiting device 16 are arranged at two ends of the driving assembly 11, close to the driving assembly 11 relative to the right anti-collision device 19 and the left anti-collision device 18, when the sliding seat assembly 21 moves to a position corresponding to the left limiting device 16 and the right limiting device 17, the left limiting device 16 and the right limiting device 17 are triggered by signals, and the control device controls the sliding seat assembly 21 to stop. The left stop 16 and the right stop 17 therefore determine the maximum range of movement of the carriage assembly 21.

At least one of the side surfaces of the plurality of carriage assemblies 21 adjacent to each other is provided with an inter-movement stopper 22. In the process of coordinated movement of a plurality of slide assemblies 21, if contact occurs between two adjacent slide assemblies 21, the inter-movement limiting device 22 can be automatically triggered, so that the control system can immediately adjust the movement state of the slide assemblies 21 to prevent mutual collision. The utility model discloses well stop device that indicates can be mechanical limit switch or photoelectric trigger switch etc. among the prior art, such limit switch belongs to ripe product, and the model is not enough, consequently this application is not repeated here.

The alignment beam 1 is also provided with a linear grating 13 parallel to the driving assembly 11, a plurality of sliding seat assemblies 21 share the linear grating 13 to realize measurement of movement displacement, and because the linear grating 13 is shared, the influence of the linear grating 13 is the same to the sliding seat assemblies 21, so that relative error between the sliding seat assemblies 21 can be reduced. A reference zero point 14 is provided in the middle third region in the length direction of the linear grating 13. The reference zero 14 is preferably located at a length-centered position of the linear grating 13. In the zero point returning process, the plurality of sliding seat assemblies 21 all search the same reference zero point 14, so that the position accumulated error is favorably reduced, and the position precision is improved.

Fig. 2 is a schematic diagram of an alignment system having three carriage assemblies 21, the three carriage assemblies 21 being oriented from left to right: a first carriage 21A, a second carriage 21B, and a third carriage 21C. The zeroing process of the system is as follows:

s1, a first sliding seat 21A moves to a left limiting device 16 along a driving assembly 11 to keep excitation and static;

s2, the third sliding seat 21C moves to the right limiting device 17 along the driving assembly 11 to keep excitation and static;

s3, the second sliding seat 21B moves to a position where the second sliding seat 21B is contacted with the first sliding seat 21A along the driving assembly 11, at the moment, a moving spacing device 22 between the first sliding seat 21A and the second sliding seat 21B is triggered, and the second sliding seat 21B keeps excited and static;

s4, the third sliding seat 21C moves to the reference zero point 14 to complete zero returning processing, and returns to the right side of the reference zero point 14 to avoid;

s5, the second sliding seat 21B moves to the reference zero point 14 to complete zero returning processing, and returns to the right side of the reference zero point 14 to avoid zero returning;

s6, the first sliding seat 21A moves to the reference zero point 14 to complete zero returning processing.

The utility model also provides an use direct-write lithography machine of above-mentioned alignment system, this direct-write lithography machine removes on its base and is provided with the workstation that is used for placing the base plate, and it is provided with exposure system and to go across on its table surface the utility model provides an alignment system. The working table surface and the alignment beam 1 of the direct-write lithography machine are both preferably made of marble materials, so that the equipment structure is prevented from generating small deformation when the environment changes.

The above description is only for the purpose of describing the preferred embodiments of the present invention, and is not intended to limit the scope of the present invention, and various modifications and improvements made to the technical solution of the present invention by those skilled in the art are intended to fall within the scope of the present invention as defined in the claims.

Claims (9)

1. An alignment system comprising an alignment beam (1), characterized by at least three sets of alignment modules (2) controlled for parallel movement on said alignment beam (1), the alignment direction of the alignment modules (2) being perpendicular to their movement path; the alignment beam (1) is provided with a driving assembly (11), at least three sliding seat assemblies (21) are movably arranged on the driving assembly (11), the alignment assembly (2) is fixed on the sliding seat assemblies (21), and the alignment direction of the sliding seat assemblies (21) is perpendicular to the driving assembly (11).

2. An alignment system as claimed in claim 1, wherein the drive assemblies (11) are linear motor stators, and a linear motor mover is provided on each of the carriage assemblies (21) to effect independent movement of the respective carriage assemblies (21).

3. An alignment system as claimed in claim 1, wherein said alignment beam (1) is provided with at least one set of guide assemblies (12) arranged parallel to said drive assembly (11), a plurality of said carriage assemblies (21) being movably arranged on the guide assemblies (12).

4. The alignment system according to claim 1, wherein a right bump guard (19) and a left bump guard (18) are respectively provided at both ends of the alignment beam (1) located at the driving assembly (11), and a right stopper (17) and a left stopper (16) are provided at both ends of the driving assembly (11) adjacent to the driving assembly (11) with respect to the right bump guard (19) and the left bump guard (18).

5. The alignment system according to claim 1, wherein said alignment system is provided with inter-movement limiting means (22) on at least one of the sides of a plurality of said carriage assemblies (21) adjacent to each other.

6. The alignment system according to claim 1, wherein a linear grating (13) is further arranged on the alignment beam (1) parallel to the drive assembly (11), and a plurality of the carriage assemblies (21) share the linear grating (13) to realize the measurement of the displacement.

7. An alignment system according to claim 6, wherein a reference zero (14) is provided in the middle third of the length of the linear grating (13).

8. An alignment system according to claim 7, wherein the reference zero (14) is arranged at a longitudinally central position of the linear grating (13).

9. A direct write lithography machine having a stage on which an exposure substrate is placed, the stage being movable on a base, characterized in that the direct write lithography machine is provided with an exposure system and an alignment system according to any one of claims 1 to 8 across the base.

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