CN213456268U

CN213456268U - Automatic sampling device for negative photoresist

Info

Publication number: CN213456268U
Application number: CN202022579054.1U
Authority: CN
Inventors: 纪昌炜
Original assignee: SUZHOU RUIHONG ELECTRONIC CHEMICAL CO Ltd
Current assignee: SUZHOU RUIHONG ELECTRONIC CHEMICAL CO Ltd
Priority date: 2020-11-10
Filing date: 2020-11-10
Publication date: 2021-06-15
Anticipated expiration: 2030-11-10
Also published as: WO2022100188A1

Abstract

The utility model relates to a photoresist sampling technical field just discloses automatic sampling device of negative photoresist, including a main section of thick bamboo, the bottom mounting intercommunication of a main section of thick bamboo has vice section of thick bamboo, the bottom fixed mounting of vice section of thick bamboo has the sucking disc, the fixed cover that has cup jointed of lateral surface of vice section of thick bamboo, angle fixed mounting such as the bottom of fixed cover has the dead lever. This automatic sampling device of negative photoresist, it has fixed cover and has the dead lever at the bottom mounting of fixed cover to connect through the fixed cover in the lateral surface of vice section of thick bamboo, the accessible contacts the bottom of base and the container inner chamber bottom that contains the photoresist when needs absorb the photoresist, do and fix through fixing sucking disc and container inner chamber bottom, and the buffer spring who is located the movable rod top then can adapt to the deformation drive movable rod relative dead lever of sucking disc and take place the displacement in order to adapt to different operating modes, can realize the absorption of photoresist through the connecting rod this moment, thereby realized need not handheld advantage.

Description

Automatic sampling device for negative photoresist

Technical Field

The utility model relates to a photoresist sampling technical field specifically is automatic sampling device of negative photoresist.

Background

The negative photoresist is a mixed liquid which is sensitive to light and consists of three main components of photosensitive resin, sensitizer (visible spectrum sensitizing dye) and solvent. After the photosensitive resin is irradiated by light, the photocuring reaction can be quickly carried out in an exposure area, so that the physical properties of the material, particularly the solubility, the affinity and the like are obviously changed. The soluble portions are dissolved away by appropriate solvent treatment to give the desired image (see the photolithographic process for photoresist imaging). Photoresists are widely used in processes such as printed circuit and integrated circuit fabrication, and printing plate making. The photoresist has complex technology and more varieties. According to the chemical reaction mechanism and the developing principle, the method can be divided into two types of negative glue and positive glue. The insoluble matter formed after illumination is negative glue; on the contrary, the positive glue is insoluble in some solvents and becomes a soluble substance after being irradiated by light. By utilizing the performance, the photoresist is used as a coating, and a required circuit pattern can be etched on the surface of the silicon wafer. Photoresists can be classified into three types based on the chemical structure of the photosensitive resin. The photo-polymerization type adopts alkene monomers to generate free radicals under the action of light, the free radicals further initiate the polymerization of the monomers to finally generate polymers, and the photo-polymerization type has the characteristic of forming positive images. ② the photodecomposition type, which adopts the material containing azidoquinone compounds, and after illumination, the photodecomposition reaction can be produced, and the oil solubility is changed into water solubility, so that the positive glue can be produced. And thirdly, in a photo-crosslinking type, polyvinyl alcohol laurate and the like are used as photosensitive materials, double bonds in molecules of the photosensitive materials are opened under the action of light, and the chains are crosslinked to form an insoluble network structure, so that the photosensitive materials have a corrosion resistance effect, and are typical negative photoresist. The product KPR glue from Kodak company belongs to this category. When the photosensitive resin is irradiated with near ultraviolet light for image formation, the wavelength of the light may limit the improvement of resolution (see the photosensitive material). To further increase the resolution to meet the requirements of very large scale integrated circuit processes, shorter wavelength radiation must be used as the light source. Thereby generating electron beams, X-rays and deep ultraviolet (<250nm) etching techniques and corresponding electron beam etching glue, X-ray etching glue and deep ultraviolet etching glue. The production process flow of the negative photoresist comprises the following steps: respectively pumping raw materials of cyclized polyisoprene glue solution (concentrated solution RCIS) and dimethylbenzene into a blending kettle by a diaphragm pump from a suction port according to a certain proportion; adding a certain amount of BAC-M, charging nitrogen gas, stirring to make it fully dissolved, mixing uniformly, sampling, and performing central control inspection to meet the Process product control Specification; after the glue solution is qualified, circularly filtering the glue solution to a 100-grade purification platform for filling, carrying out finished product inspection in the filling process, and then carrying out external packaging; and (5) warehousing after the packaging is qualified. In the production process, the photoresist is often required to be sampled to be inspected, and a photoresist sampling device is required.

The existing photoresist sampling device is generally formed by a needle tube with a needle removed, the bottom end of the device needs to be inserted into a container filled with photoresist to absorb the photoresist in actual use, but the device can only absorb a small part of photoresist, and when the device needs to be held by hands for absorbing the photoresist with a certain volume, the arm pain of an operator is easily caused, and the actual use requirement cannot be met.

The inside negative pressure principle of recycling of the inside air of eduction gear is realized at present used photoetching glue sampling device carrying out the sample in-process and is absorb the device with the photoetching glue, need operating personnel upwards to pull out the connecting rod and drive the inside that the relative barrel of piston board carries out the displacement and absorbs the device with the photoetching glue at the absorption in-process, but this kind of device can't accomplish automatic sampling still need manually to operate, and it is comparatively inconvenient to use.

SUMMERY OF THE UTILITY MODEL

Not enough to prior art, the utility model provides an automatic sampling device of negative photoresist possesses the advantage that need not handheld and automatic sample, has solved the problem of proposing among the above-mentioned background.

The utility model provides a following technical scheme: automatic sampling device of negative photoresist, including a main section of thick bamboo, the bottom mounting intercommunication of a main section of thick bamboo has a vice section of thick bamboo, the bottom fixed mounting of vice section of thick bamboo has the sucking disc, the fixed cover that has cup jointed of lateral surface of vice section of thick bamboo, angle fixed mounting such as the bottom of fixed cover has the dead lever, the movable rod has been cup jointed in the bottom activity of dead lever, the bottom fixed mounting of movable rod has the base, the top fixed mounting of movable rod has the buffer spring who is located the dead lever inside, buffer spring's top and the top fixed connection of dead lever inner chamber.

Preferably, a piston plate is movably sleeved inside the auxiliary cylinder, a connecting rod is fixedly mounted at the top end of the piston plate, a threaded rod is fixedly mounted at the top end of the connecting rod, the top end of the connecting rod penetrates through the top end of the main cylinder, and the diameter of the piston plate is the same as the inner diameter of the auxiliary cylinder.

Preferably, the outer side surface of the connecting rod is movably sleeved with a return spring, the upper end and the lower end of the return spring are fixedly connected with the bottom end of the auxiliary barrel and the top end of the main barrel respectively, and a mounting seat is fixedly mounted on one side of the main barrel.

Preferably, the outer side surface of the threaded rod is sleeved with a threaded sleeve in a threaded manner, and the outer side surface of the threaded sleeve is fixedly sleeved with an auxiliary gear.

Preferably, the top fixed mounting of threaded rod has the gag lever post, the one end fixed mounting of mount pad has the motor, the top fixed mounting of motor output shaft has the transmission shaft.

Preferably, the outer side surface of the transmission shaft is fixedly sleeved with a main gear, the main gear is meshed with an auxiliary gear, and the motor is in transmission connection with the auxiliary gear through the transmission shaft and the main gear.

Compared with the prior art, the utility model discloses possess following beneficial effect:

1. this automatic sampling device of negative photoresist, there is the sucking disc through the bottom fixed mounting at vice section of thick bamboo, and fixed cover and the bottom mounting that holds at fixed cover have been cup jointed to the lateral surface of vice section of thick bamboo, the accessible contacts the bottom of base and the container inner chamber bottom that holds the photoresist when needs absorb the photoresist, do through fixing sucking disc and container inner chamber bottom, and the buffer spring that is located the movable rod top then can adapt to the deformation drive movable rod relative dead lever of sucking disc and take place the displacement in order to adapt to different operating modes, can realize the absorption of photoresist through the connecting rod this moment, thereby realized need not handheld advantage.

2. This automatic sampling device of negative photoresist, through the top at the connecting rod be fixed with the threaded rod, and the lateral surface screw thread at the threaded rod has cup jointed the thread bush, and the fixed pinion that has cup jointed at the lateral surface of thread bush, and connect through pinion and master gear meshing, the accessible opens the rotation that the motor can drive the master gear and further drives the rotation of meshing pinion when needs carry out sampling operation to the photoresist and further drives the rotation of thread bush, the threaded rod can reciprocate relatively the thread bush under the effect of thread bush and then drive the connecting rod and the removal of piston plate absorb and absorb to the inside completion sample of master cylinder to the photoresist, thereby realized the advantage that can take a sample automatically.

Drawings

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is an exploded view of the movable rod structure of the present invention;

fig. 3 is an exploded view of the structure of the main gear and the auxiliary gear of the present invention;

fig. 4 is a cross-sectional view of the internal structure of the present invention.

In the figure: 1. a main barrel; 2. an auxiliary cylinder; 3. a piston plate; 4. a connecting rod; 5. a return spring; 6. fixing a sleeve; 7. a suction cup; 8. fixing the rod; 9. a movable rod; 10. a buffer spring; 11. a base; 12. a threaded rod; 13. a limiting rod; 14. a threaded sleeve; 15. a pinion gear; 16. a main gear; 17. a mounting seat; 18. a motor; 19. a drive shaft.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-4, an automatic sampling device for negative photoresist comprises a main barrel 1, a secondary barrel 2 is fixedly communicated with the bottom end of the main barrel 1, a sucking disc 7 is fixedly mounted at the bottom end of the secondary barrel 2, a fixed sleeve 6 is fixedly sleeved on the outer side surface of the secondary barrel 2, a fixed rod 8 is fixedly mounted at the bottom end of the fixed sleeve 6 at an equal angle, a movable rod 9 is movably sleeved at the bottom end of the fixed rod 8, a base 11 is fixedly mounted at the bottom end of the movable rod 9, a buffer spring 10 located inside the fixed rod 8 is fixedly mounted at the top end of the movable rod 9, and the top end of the buffer spring 10 is fixedly connected with the top.

Wherein, the inside activity of the sub-section of thick bamboo 2 has cup jointed piston plate 3, and the top fixed mounting of piston plate 3 has connecting rod 4, and the top of connecting rod 4 runs through the top of the main section of thick bamboo 1 and fixed mounting has threaded rod 12, and the diameter of piston plate 3 is the same with the internal diameter of the sub-section of thick bamboo 2, can produce certain negative pressure and then absorb the photoresist to the inside of the main section of thick bamboo 1 through the piston plate 3 that the diameter is the same with the internal diameter of the sub-section of thick bamboo 2.

Wherein, reset spring 5 has been cup jointed in the lateral surface activity of connecting rod 4, and reset spring 5's upper and lower both ends respectively with the bottom of vice section of thick bamboo 2 and the top fixed connection of a main section of thick bamboo 1, one side fixed mounting of a main section of thick bamboo 1 has a mount pad 17, and when no longer exerting the effect to connecting rod 4 and threaded rod 12, reset spring 5 can drive the automatic re-setting of piston plate 3 and realize closing of a main section of thick bamboo 1 not under the atress.

Wherein, the outer side of the threaded rod 12 is threaded and sleeved with a threaded sleeve 14, the outer side of the threaded sleeve 14 is fixedly sleeved with a sleeve 6 and is connected with an auxiliary gear 15, and the threaded rod 12 can move up and down relative to the threaded sleeve 14 and drive the bottom end connecting rod 4 to move.

Wherein, the top end of the threaded rod 12 is fixedly provided with a limiting rod 13, one end of the mounting seat 17 is fixedly provided with a motor 18, the top end of the output shaft of the motor 18 is fixedly provided with a transmission shaft 19, and the rotation of the transmission shaft 19 can be driven by starting the motor 18 to further drive the rotation of the main gear 16.

Wherein, the outer side face of the transmission shaft 19 is fixedly sleeved with a main gear 16, the main gear 16 is meshed with a pinion 15, the motor 18 is in transmission connection with the pinion 15 through the transmission shaft 19 and the main gear 16, when the main gear 16 rotates, the pinion 15 meshed with the main gear 16 rotates along with the main gear to further drive the threaded sleeve 14 to rotate, and under the action of the threaded sleeve 14, the threaded rod 12 can move up and down relative to the threaded sleeve 14 so as to drive the connecting rod 4 and the piston plate 3 to move to suck the photoresist into the main cylinder 1 to finish sampling.

The working principle is as follows: when the automatic sampling device for the negative photoresist is used, the bottom end of a base 11 is contacted with the bottom end of a container inner cavity filled with the photoresist through the access, a sucker 7 and the bottom end of the container inner cavity can be fixed, a buffer spring 10 positioned at the top end of a movable rod 9 can adapt to the deformation of the sucker 7 to drive the movable rod 9 to displace relative to a fixed rod 8 so as to adapt to different working conditions, a motor 18 can be started to drive a main gear 16 to rotate and further drive a meshing pinion 15 to rotate and further drive a threaded sleeve 14 to rotate, and a threaded rod 12 can move up and down relative to the threaded sleeve 14 under the action of the threaded sleeve 14 to drive a connecting rod 4 and a piston plate 3 to move to suck the photoresist and suck the photoresist into the main cylinder 1 to finish sampling.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. Automatic sampling device of negative photoresist, including main section of thick bamboo (1), its characterized in that: the bottom mounting intercommunication of a main section of thick bamboo (1) has vice section of thick bamboo (2), the bottom fixed mounting of vice section of thick bamboo (2) has sucking disc (7), the fixed cover (6) of lateral surface of vice section of thick bamboo (2) have connect fixed cover (6), angle fixed mounting such as the bottom of fixed cover (6) has dead lever (8), movable rod (9) have been cup jointed in the bottom activity of dead lever (8), the bottom fixed mounting of movable rod (9) has base (11), the top fixed mounting of movable rod (9) has buffer spring (10) that are located dead lever (8) inside, the top of buffer spring (10) and the top fixed connection of dead lever (8) inner chamber.

2. The automatic sampling device of negative photoresist of claim 1, wherein: piston plate (3) have been cup jointed in the inside activity of vice section of thick bamboo (2), the top fixed mounting of piston plate (3) has connecting rod (4), the top and the fixed mounting that the top of connecting rod (4) runs through main section of thick bamboo (1) have threaded rod (12), the diameter of piston plate (3) is the same with the internal diameter of vice section of thick bamboo (2).

3. The automatic sampling device of negative photoresist of claim 2, wherein: the outer side surface of the connecting rod (4) is movably sleeved with a return spring (5), the upper end and the lower end of the return spring (5) are fixedly connected with the bottom end of the auxiliary barrel (2) and the top end of the main barrel (1) respectively, and a mounting seat (17) is fixedly mounted on one side of the main barrel (1).

4. The automatic sampling device of negative photoresist of claim 2, wherein: the outer side surface of the threaded rod (12) is provided with a threaded sleeve (14), a threaded sleeve (14) is connected to the threaded sleeve (14), and an auxiliary gear (15) is connected to the outer side surface of the threaded sleeve (14) in a fixed sleeve (6).

5. The automatic sampling device of negative photoresist of claim 3, wherein: the top fixed mounting of threaded rod (12) has gag lever post (13), the one end fixed mounting of mount pad (17) has motor (18), the top fixed mounting of motor (18) output shaft has transmission shaft (19).

6. The automatic sampling device of negative photoresist of claim 5, wherein: the outer side surface of the transmission shaft (19) is fixedly sleeved with a main gear (16), the main gear (16) is meshed with the auxiliary gear (15) and connected with the auxiliary gear (15), and the motor (18) is in transmission connection with the auxiliary gear (15) through the transmission shaft (19) and the main gear (16).