CN213302559U - Device for preparing amplitude grating with any duty ratio by using femtosecond laser direct writing technology - Google Patents
Device for preparing amplitude grating with any duty ratio by using femtosecond laser direct writing technology Download PDFInfo
- Publication number
- CN213302559U CN213302559U CN202022545253.0U CN202022545253U CN213302559U CN 213302559 U CN213302559 U CN 213302559U CN 202022545253 U CN202022545253 U CN 202022545253U CN 213302559 U CN213302559 U CN 213302559U
- Authority
- CN
- China
- Prior art keywords
- femtosecond laser
- computer
- reflector
- metal film
- amplitude grating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Abstract
The device comprises a high-power photonic crystal fiber femtosecond laser system, a first collimating diaphragm, a second collimating diaphragm, a half-wave plate, a polarization beam splitter prism, an electronic optical shutter, a first computer, a first reflector, a first convex lens, a second reflector, a dichroic mirror, a microscope objective, a glass substrate attached with a metal film, a three-dimensional precision moving platform, an illumination light source, a semi-transparent semi-reflecting mirror, a CCD camera, a second computer and a helium neon laser light source. The device utilizes LabvIEW software to realize linkage control of the three-dimensional precision mobile platform and the electronic optical shutter and precise control of the diameter of the light spot of the ablated metal film by adjusting the defocusing distance, thereby realizing the preparation of the plane amplitude grating with any duty ratio. The utility model has the advantages of low cost, easy operation, high degree of automation and the like, and has good application prospect in the aspect of utilizing femtosecond laser to prepare the amplitude grating.
Description
Technical Field
The utility model belongs to the technical field of the preparation of amplitude grating, especially an utilize femto second laser to directly write technique preparation arbitrary duty cycle amplitude grating device.
Background
As a basic diffraction optical element, an amplitude grating is a commonly used diffraction optical element, which is formed by arranging a large number of slits with equal width and equal spacing, can generate spatial modulation on the amplitude of incident light, and has important applications in various fields such as optical measurement, optical information processing, optical sensing, optical communication and the like. The grating duty cycle is one of the basic parameters of the amplitude grating, and can directly influence the diffraction efficiency of the grating and the realization of the grating array illumination. The amplitude grating is generally prepared by a mechanical scribing method, a beam interference exposure method, a mask lithography method, an electron beam or a femtosecond laser direct writing method. The mechanical scribing method has expensive equipment and extremely high requirements on environment such as temperature, vibration isolation and the like; the grating periodic structure of the light beam interference exposure method is limited by the wavelength of light waves; the mask photoetching method needs to manufacture a high-precision master mask in advance, and has the defects of multiple processing links, long period, high cost, difficulty in controlling alignment precision, limitation of the period and duty ratio of the prepared grating by the mask master mask and the like; the electron beam direct writing technology requires complicated equipment, requires a vacuum environment and special treatment on a substrate; the femtosecond laser direct writing technology focuses a laser beam on the surface of a sample, the sample moves at a certain speed according to a preset track, and the sample is directly scribed to generate a microstructure pattern. At present, most of light sources used in the femtosecond laser direct writing technology are generated by a titanium gem femtosecond laser system with an amplifying system. However, the power of the titanium sapphire femtosecond laser system is generally not high, so that the processing speed is limited, and the low processing speed and processing efficiency greatly hinder the application of the femtosecond laser processing technology in the industry. Meanwhile, the titanium gem femtosecond laser system has high price, huge structure, complex operation and need of special maintenance, and the application and popularization of the femtosecond laser direct writing technology are also seriously hindered.
Disclosure of Invention
In order to overcome the defects and deficiencies in the prior art, the utility model provides a device for preparing amplitude grating with any duty ratio on a glass substrate attached with a metal film by utilizing high-power photonic crystal fiber femtosecond laser. The utility model discloses a three-dimensional moving platform and electron optics shutter switch control program are compiled to LabvIEW software, and three-dimensional accurate moving platform moves according to predetermined motion trail to further through adjusting out of focus distance accurate control femto second laser ablation metal film facula diameter size, can realize the processing of directly writing of the amplitude grating of arbitrary duty cycle on the glass substrate with the metal film. And simultaneously, the utility model discloses a femtosecond laser source is photonic crystal optic fibre femto second laser, has advantages such as conversion efficiency height, low cost, compact structure, easy to maintain, beam quality are good. In addition, the appearance of the grating and the diffraction pattern of reflected light can be observed in real time in the process of preparing the grating, so that the processing quality of the grating is ensured.
In order to achieve the above object, the technical solution of the present invention is as follows:
a device for preparing amplitude grating with any duty ratio by using femtosecond laser direct writing technology comprises a high-power photonic crystal fiber femtosecond laser system, a first collimating diaphragm, a second collimating diaphragm, a half-wave plate, a polarization beam splitter prism, an electronic optical shutter, a first computer, a first reflector, a first convex lens, a second reflector, a dichroic mirror, a microscope objective, a glass substrate attached with a metal film, a three-dimensional precision moving platform, an illumination light source, a semi-transparent semi-reflecting mirror, a CCD camera, a second computer and a helium neon laser light source; the high-power photonic crystal fiber femtosecond laser system is positioned in front of a first collimating diaphragm, a second collimating diaphragm, a half-wave plate, a polarization beam splitter prism, an electronic optical shutter, a first reflector, a first convex lens, a second reflector and a dichroic mirror are sequentially arranged behind the first collimating diaphragm, the electronic optical shutter is connected with a first computer, the first reflector, the second reflector and the dichroic mirror are arranged at an angle of 45 degrees with an optical path, and a rear focus of the first convex lens is superposed with a front focus of the second convex lens to form a beam expanding system; the femtosecond laser is reflected by the bicolor mirror and then focused on the surface of the glass substrate attached with the metal film through the microscope objective, the glass substrate attached with the metal film is fixed on a three-dimensional precise moving platform, the three-dimensional precise moving platform is connected with a first computer, and an illumination light source irradiates the glass substrate attached with the metal film to provide a bright view field for observation; a semi-transparent semi-reflecting mirror and a CCD camera are sequentially arranged on the transmission side of the dichroic mirror, the semi-transparent semi-reflecting mirror and the light path are arranged at an angle of 45 degrees, and a helium-neon laser light source is arranged on the reflection side of the semi-transparent semi-reflecting mirror; the CCD camera is connected with a second computer, and the substrate morphology and the reflected light diffraction pattern can be displayed on a screen of the second computer in real time by using image acquisition software.
The high-power photonic crystal fiber femtosecond laser system is a high-power high-repetition-frequency ytterbium-doped large-mode-area photonic crystal fiber femtosecond laser system with the central wavelength of 1040nm and composed of an oscillation level and an amplification level.
The first collimating diaphragm and the second collimating diaphragm are circular diaphragms with adjustable apertures and diameters.
The half-wave plate and the polarization beam splitter prism form a femtosecond laser power continuous adjusting system.
The electronic optical shutter can be connected with the first computer through the controller to control the irradiation time of the femtosecond laser.
The first reflector and the second reflector are dielectric film reflectors with reflection wavelength covering the wavelength of a femtosecond laser light source.
The dichroic mirror is a dielectric film lens capable of realizing total reflection in a femtosecond laser wavelength range and total transmission in a visible light wavelength range.
The microscope objective is a near-infrared flat field achromatic long working distance objective.
The glass substrate with the metal film is a substrate plated with a single-layer metal film on an optical glass substrate.
The three-dimensional precision mobile platform is connected with the first computer, and the LabvIEW software is utilized to perform three-dimensional direction precision movement adjustment on the three-dimensional precision mobile platform.
The first computer is a computer provided with LabvIEW software and electronic optical shutter control software.
The illumination light source is a white light LED parallel light source.
The half-transmitting half-reflecting mirror is a dielectric film lens which can realize 50 percent of transmittance and 50 percent of reflectivity of wavelength in a visible light range.
The CCD camera has an optical zooming function, and can be connected with a second computer to observe the processing process on a screen of the second computer in real time by using image acquisition software.
The second computer is a computer provided with a CCD camera image acquisition card and acquisition software.
The helium neon laser light source is a common helium neon laser, the emission wavelength is 632.8nm, and the power is more than 1.5 mW.
The utility model discloses utilize femto second laser to directly write the technique preparation arbitrary duty cycle amplitude grating principle as follows:
when the femtosecond laser is focused on the surface of the metal, free electrons in the metal generate high-frequency oscillation, the electrons in a conduction band absorb laser energy through a bremsstrahlung process within extremely short pulse duration, the electron relaxation time is short, and the electron temperature is rapidly increased. Within the range of a few picoseconds to a few hundred picoseconds, the lattice obtains energy in an electron-phonon collision mode, the temperature of electrons and the lattice approximately reaches a thermal equilibrium state, the temperature of a metal material action area rises sharply within overtime, the temperature required by melting (vaporization) of the metal material can be exceeded instantly, the metal material is highly ionized, high-temperature, high-pressure and high-density plasma is generated, and the plasma is sprayed outwards in a plasma form, so that the ablation effect of removing the metal material is achieved. In the process, the plasma eruption takes away almost all heat generated by the femtosecond laser ablation material, and then the temperature in the processing area is reduced to the state before processing, so that the femtosecond laser cold processing is realized in a relative sense. A two-temperature model is often used to describe the process of transferring electron energy to a lattice in metals (see Chichkov B N, Momma C, Nolte S, et al, Femtosened, picosecond and nanosecond laser association of solids [ J ]. Applied Physics A, 1996, 63(2): 109-.
The whole preparation process of the amplitude grating adopts a three-dimensional precise mobile platform written by LabvIEW software and an electronic optical shutter switch linkage control program, a glass substrate to be processed and attached with a metal film moves at a certain speed according to a preset track, and the diameter of a light spot of the femtosecond laser ablated metal film is further precisely controlled by adjusting the defocusing distance, so that the direct writing processing of the amplitude grating with any duty ratio is realized.
Compared with the prior art, the utility model has the advantages as follows:
(1) the utility model discloses a three-dimensional accurate moving platform and shutter switch coordinated control procedure are compiled to LabvIEW software, through computer program control motion trail, speed and through adjusting out of focus distance accurate control femtosecond laser ablation metal film facula diameter size, can realize the preparation of arbitrary duty cycle amplitude grating, have easily operation, advantage that the flexibility is high.
(2) The utility model discloses the femto second laser source who adopts is photonic crystal optic fibre femto second laser, has advantages such as conversion efficiency height, low cost, compact structure, easy to maintain, light beam are of high quality.
(3) The utility model discloses utilize the CCD camera can realize the real-time supervision in the time of grating course of working appearance and reverberation diffraction pattern, guarantee the processingquality of grating.
Drawings
Fig. 1 is the structure diagram of the utility model relates to an utilize femto second laser direct writing technique to prepare arbitrary duty cycle amplitude grating device.
Wherein: 1-high-power photonic crystal fiber femtosecond laser system, 2-first collimating diaphragm, 3-second collimating diaphragm, 4-half wave plate, 5-polarizing beam splitter prism, 6-electronic optical shutter, 7-first computer, 8-first reflector, 9-first convex lens, 10-second convex lens, 11-second reflector, 12-dichroic mirror, 13-microobjective, 14-glass substrate attached with metal film, 15-three-dimensional precision moving platform, 16-illumination light source, 17-semi-transparent semi-reflective mirror, 18-CCD camera, 19-second computer and 20-helium neon laser source.
Detailed Description
The present invention will be further described with reference to the following drawings and examples, but is not limited thereto.
Example 1:
embodiment 1 of the utility model is as shown in fig. 1, an utilize femto second laser to directly write technique preparation arbitrary duty cycle amplitude grating device, the device includes high power photonic crystal optic fibre femto second laser system 1, first collimation diaphragm 2, second collimation diaphragm 3, half wave plate 4, polarization beam splitter prism 5, electron optical shutter 6, first computer 7, first speculum 8, first convex lens 9, second convex lens 10, second speculum 11, dichroscope 12, microscope objective 13, glass substrate 14 with metal film, three-dimensional precision moving platform 15, lighting source 16, half mirror 17, CCD camera 18, second computer 19, helium neon laser light source 20; the high-power photonic crystal fiber femtosecond laser system is characterized in that a high-power photonic crystal fiber femtosecond laser system 1 is positioned in front of a first collimation diaphragm 2, a second collimation diaphragm 3, a half-wave plate 4, a polarization beam splitter prism 5, an electronic optical shutter 6, a first reflector 8, a first convex lens 9, a second convex lens 10, a second reflector 11 and a dichroic mirror 12 are sequentially arranged behind the first collimation diaphragm 2, the electronic optical shutter 6 is connected with a first computer 7, the first reflector 8, the second reflector 11 and the dichroic mirror 12 are arranged at an angle of 45 degrees with an optical path, and a back focus of the first convex lens 9 is superposed with a front focus of the second convex lens 10 to form a beam expanding system; the femtosecond laser is reflected by the dichroic mirror 12 and then focused on the surface of the glass substrate 14 attached with the metal film through the microscope objective 13, the glass substrate 14 attached with the metal film is fixed on a three-dimensional precise moving platform 15, the three-dimensional precise moving platform 15 is connected with the first computer 7, and the illumination light source 16 irradiates the glass substrate 14 attached with the metal film to provide a bright view field for observation; a semi-transparent semi-reflecting mirror 17 and a CCD camera 18 with a zooming function are sequentially arranged on the transmission side of the dichroic mirror 12, the semi-transparent semi-reflecting mirror 17 is arranged at an angle of 45 degrees with the light path, and a helium-neon laser light source 20 is arranged on the reflection side of the semi-transparent semi-reflecting mirror 17; the CCD camera 18 is connected to the second computer 19, and the substrate topography and the reflected light diffraction pattern can be displayed in real time on the screen of the second computer 19 using image acquisition software.
The high-power photonic crystal fiber femtosecond laser system 1 is a photonic crystal fiber nonlinear femtosecond laser system consisting of an oscillation stage and an amplification stage, and has the repetition frequency of 56.9MHz, the central wavelength of 1040nm, the maximum average power of 18W and the pulse width of 66.5 fs.
The first collimating diaphragm 2 and the second collimating diaphragm 3 are circular diaphragms with adjustable apertures and diameters.
The first reflector 8 and the second reflector 11 are broadband dielectric film high reflectors with the reflection wavelength range covering the wavelength of the femtosecond laser light source.
The dichroic mirror 12 is a dielectric film lens capable of realizing total reflection in a femtosecond laser wavelength range and total transmission in a visible wavelength range.
The microscope objective 13 is a flat field apochromatic long-focus microscope objective.
The glass substrate 14 with the metal film is a substrate plated with a single metal film on a glass substrate.
The three-dimensional precision moving platform 15 is connected with the first computer 7, and three-dimensional precision moving adjustment can be realized through LabvIEW software in the first computer 7, wherein the adjustment precision is less than 1 μm.
The first computer 7 is a computer installed with LabvIEW software and electro-optical shutter control software.
The half mirror 17 is a dielectric film lens which can realize 50% transmission and 50% reflection of visible light wave band when placed at 45 degrees.
The CCD camera 18 has an optical zooming function, and is connected with the second computer 19 to observe the processing process on the screen of the second computer 19 in real time by using image acquisition software.
The second computer 19 is a computer equipped with a CCD camera image acquisition card and acquisition software.
The helium neon laser light source 20 is a common helium neon laser, the emission wavelength is 632.8nm, and the power is more than 1.5 mW.
The femtosecond laser source used in this embodiment is a photonic crystal fiber nonlinear femtosecond laser system composed of an oscillator stage and an amplifier stage. Gain media of the system oscillation stage and the amplification stage are ytterbium-doped large-mode-field-area photonic crystal fibers, so that high compatibility and coupling efficiency between the oscillation stage and the amplification stage are ensured. The oscillating stage and the amplifying stage are both pumped by multimode commercial semiconductor lasers with the wavelength of 976 nm. After the seed pulse emitted from the oscillation stage is subjected to nonlinear amplification and grating pair compression by the gain fiber, the finally output femtosecond laser with the pulse time width of 66.5fs, the repetition frequency of 56.9MHz, the central wavelength of 1040nm and the highest power of 18W can be obtained. The first collimating diaphragm and the second collimating diaphragm are diaphragms with the maximum aperture of 20mm, which are produced by Thorlabs company; the half-wave plate and the polarization beam splitter prism form a transmission light power continuous adjusting system; the electronic optical shutter is an electric control shutter produced by Vincent Associates, the clear aperture of the electronic optical shutter is 25mm, and the electronic optical shutter is communicated with a computer to control the femtosecond laser irradiation time in a process sequence; the first convex lens and the second convex lens form a beam expanding system for expanding the diameter of the light beam, and the beam expanding ratio is 5 times; the three-dimensional precision moving platform is an Esp300 electric control three-dimensional precision moving platform manufactured by Newport company, and the three-dimensional minimum resolution is controlled to be 1 mu m by a computer, the positioning precision is 0.1 mu m, and the stroke is 100 mm. The microscope objective is a near-infrared flat field apochromatic long working distance objective produced by Mitutoyo company.
Claims (9)
1. A device for preparing amplitude grating with any duty ratio by using femtosecond laser direct writing technology comprises a high-power photonic crystal fiber femtosecond laser system, a first collimating diaphragm, a second collimating diaphragm, a half-wave plate, a polarization beam splitter prism, an electronic optical shutter, a first computer, a first reflector, a first convex lens, a second reflector, a dichroic mirror, a microscope objective, a glass substrate attached with a metal film, a three-dimensional precision moving platform, an illumination light source, a semi-transparent semi-reflecting mirror, a CCD camera, a second computer and a helium neon laser light source; the high-power photonic crystal fiber femtosecond laser system is positioned in front of a first collimating diaphragm, a second collimating diaphragm, a half-wave plate, a polarization beam splitter prism, an electronic optical shutter, a first reflector, a first convex lens, a second reflector and a dichroic mirror are sequentially arranged behind the first collimating diaphragm, the electronic optical shutter is connected with a first computer, the first reflector, the second reflector and the dichroic mirror are arranged at an angle of 45 degrees with an optical path, and a rear focus of the first convex lens is superposed with a front focus of the second convex lens to form a beam expanding system; the femtosecond laser is focused on the surface of the glass substrate attached with the metal film through the microscope objective after being reflected by the bicolor mirror, the glass substrate attached with the metal film is fixed on a three-dimensional precise moving platform, the three-dimensional precise moving platform is connected with a first computer, and the glass substrate attached with the metal film is irradiated by an illumination light source; a semi-transparent semi-reflecting mirror and a CCD camera are sequentially arranged on the transmission side of the dichroic mirror, the semi-transparent semi-reflecting mirror and the light path are arranged at an angle of 45 degrees, and a helium-neon laser light source is arranged on the reflection side of the semi-transparent semi-reflecting mirror; the CCD camera is connected with the second computer.
2. The device according to claim 1, wherein the high-power photonic crystal fiber femtosecond laser system is a high-power high-repetition-frequency ytterbium-doped large-mode-area photonic crystal fiber femtosecond laser system with a center wavelength of 1040nm and composed of an oscillator stage and an amplifier stage.
3. The device for preparing amplitude grating with arbitrary duty ratio by using femtosecond laser direct writing technology according to claim 1, wherein the dichroic mirror is a dielectric film lens capable of realizing total reflection in the femtosecond laser wavelength range and total transmission in the visible wavelength range.
4. The device for manufacturing an amplitude grating with any duty ratio by using the femtosecond laser direct writing technology as claimed in claim 1, wherein the microscope objective is a near-infrared flat field achromatic long working distance objective.
5. The method for manufacturing an amplitude grating device with any duty ratio by using the femtosecond laser direct writing technology as claimed in claim 1, wherein the glass substrate attached with the metal film is a substrate coated with a single metal film on an optical glass substrate.
6. The apparatus according to claim 1, wherein the three-dimensional precision moving platform is connected to a first computer, and the LabvIEW software is used to perform three-dimensional precision movement adjustment on the three-dimensional precision moving platform.
7. The apparatus according to claim 1, wherein the first computer is a computer installed with LabvIEW software and electro-optical shutter control software.
8. The device for preparing the amplitude grating with any duty ratio by using the femtosecond laser direct writing technology as claimed in claim 1, wherein the CCD camera has an optical zooming function and is connected with a second computer, and the processing process can be observed on the screen of the second computer in real time by using image acquisition software.
9. The device for preparing the amplitude grating device with any duty ratio by using the femtosecond laser direct writing technology as claimed in claim 1, wherein the second computer is a computer provided with a CCD camera image acquisition card and acquisition software.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022545253.0U CN213302559U (en) | 2020-11-06 | 2020-11-06 | Device for preparing amplitude grating with any duty ratio by using femtosecond laser direct writing technology |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022545253.0U CN213302559U (en) | 2020-11-06 | 2020-11-06 | Device for preparing amplitude grating with any duty ratio by using femtosecond laser direct writing technology |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213302559U true CN213302559U (en) | 2021-05-28 |
Family
ID=76014119
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022545253.0U Expired - Fee Related CN213302559U (en) | 2020-11-06 | 2020-11-06 | Device for preparing amplitude grating with any duty ratio by using femtosecond laser direct writing technology |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213302559U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113985703A (en) * | 2021-09-28 | 2022-01-28 | 深圳市麓邦技术有限公司 | Optical system |
| CN114088810A (en) * | 2021-11-16 | 2022-02-25 | 宝宇(武汉)激光技术有限公司 | Interference laser ultrasonic nondestructive testing method and system |
| CN114966968A (en) * | 2022-05-25 | 2022-08-30 | 上海理工大学 | Device and method for preparing silicon dioxide planar waveguide Bragg grating by laser |
| CN115182045A (en) * | 2022-07-27 | 2022-10-14 | 山东铂锐激光科技有限公司 | Preparation method of sesquioxide single crystal optical fiber cladding |
| CN115236798A (en) * | 2022-09-20 | 2022-10-25 | 中国航空工业集团公司北京长城计量测试技术研究所 | Fiber grating and preparation device and preparation method thereof |
-
2020
- 2020-11-06 CN CN202022545253.0U patent/CN213302559U/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113985703A (en) * | 2021-09-28 | 2022-01-28 | 深圳市麓邦技术有限公司 | Optical system |
| CN113985703B (en) * | 2021-09-28 | 2023-11-03 | 深圳市麓邦技术有限公司 | Optical system |
| CN114088810A (en) * | 2021-11-16 | 2022-02-25 | 宝宇(武汉)激光技术有限公司 | Interference laser ultrasonic nondestructive testing method and system |
| CN114966968A (en) * | 2022-05-25 | 2022-08-30 | 上海理工大学 | Device and method for preparing silicon dioxide planar waveguide Bragg grating by laser |
| CN114966968B (en) * | 2022-05-25 | 2023-09-05 | 上海理工大学 | Device and method for preparing silicon dioxide planar waveguide Bragg grating by laser |
| CN115182045A (en) * | 2022-07-27 | 2022-10-14 | 山东铂锐激光科技有限公司 | Preparation method of sesquioxide single crystal optical fiber cladding |
| CN115236798A (en) * | 2022-09-20 | 2022-10-25 | 中国航空工业集团公司北京长城计量测试技术研究所 | Fiber grating and preparation device and preparation method thereof |
| CN115236798B (en) * | 2022-09-20 | 2022-11-22 | 中国航空工业集团公司北京长城计量测试技术研究所 | Fiber grating and preparation device and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN213302559U (en) | Device for preparing amplitude grating with any duty ratio by using femtosecond laser direct writing technology | |
| US20220016729A1 (en) | Femtosecond laser system for processing micro-hole array | |
| CN112230318A (en) | Device and method for preparing plane grating by femtosecond laser direct writing technology | |
| US9774160B2 (en) | Femtosecond laser processing system with process parameters controls and feedback | |
| CN108568594B (en) | Method based on class plasmonic lenses effect regulation crystal silicon external waviness structure | |
| CN213934277U (en) | Device for preparing diffraction grating by femtosecond laser multipath parallel technology | |
| CN103551732A (en) | Laser cutting device and cutting method | |
| CN103862171A (en) | Method for preparing two-dimensional periodic metal particle array structure through dual-wavelength femtosecond lasers | |
| CN104698531B (en) | The device and method for preparing long-period fiber grating using femtosecond laser Tabo effect | |
| CN101890575A (en) | Dammann grating-based femtosecond laser parallel micromachining device with real-time monitoring function | |
| CN106735925B (en) | A kind of femtosecond laser direct write preparation method of two dimension sub-micron butterfly metal micro structure | |
| TWI331945B (en) | Method and system pf controlled optical beam for mold fabrication by ultra-fast laser technique | |
| CN203541848U (en) | Laser cutting device | |
| Nasrollahi et al. | Laser drilling with a top-hat beam of micro-scale high aspect ratio holes in silicon nitride | |
| CN110193662A (en) | By the system of the femtosecond laser processing surface of graphene oxide pattern of space light shaping | |
| CN106868471B (en) | A kind of dual-beam quickly prepares the method and device of graphene figure | |
| CN108788451A (en) | A kind of processing method and device of ultrafast laser transparent material | |
| CN111474616A (en) | Method for preparing sub-wavelength metal grating by wide-beam femtosecond laser double pulses | |
| CN112828449A (en) | Component prepared by processing diamond material by laser and preparation method thereof | |
| CN110421265B (en) | Method and device for processing sub-wavelength periodic structures with different shapes by femtosecond laser | |
| CN112570897B (en) | Femtosecond pulse cluster generation method and quartz micro-fluidic chip manufacturing device | |
| CN214024057U (en) | Processing device for transparent material | |
| CN114235344A (en) | Debugging device and debugging method for laser resonator cavity mirror | |
| CN108747059B (en) | Device for preparing high-quality high-depth-diameter-ratio micropores by femtosecond laser/air shaping optical fibers | |
| CN114280800B (en) | Space-time shaping device, space-time shaping system and method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20210528 Termination date: 20211106 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |