CN213142181U - Preparation system of optics level CVD diamond diaphragm - Google Patents
Preparation system of optics level CVD diamond diaphragm Download PDFInfo
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- CN213142181U CN213142181U CN202021310823.1U CN202021310823U CN213142181U CN 213142181 U CN213142181 U CN 213142181U CN 202021310823 U CN202021310823 U CN 202021310823U CN 213142181 U CN213142181 U CN 213142181U
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Abstract
The utility model provides a preparation system of optical-grade CVD diamond diaphragm, which comprises a reaction chamber, wherein a plasma torch is arranged at the upper part in the reaction chamber, and a deposition area is arranged at the lower part in the reaction chamber; the periphery of the plasma torch is provided with an excitation coil; a gap is arranged between the plasma torch and the magnet exciting coil; a cooling cavity is arranged on the periphery of the reaction chamber; the cooling cavity body is U-shaped; the U-shaped two side areas of the cooling cavity extend to the gap between the ion torch and the magnet exciting coil to form a cooling channel; cooling pipes are spirally distributed in the cooling cavity, and cooling water is filled in the cooling pipes; a lifting platform is arranged in the deposition area in a lifting manner; a base disc is rotatably arranged above the lifting platform; the center of the bottom surface of the basal disc is fixedly provided with a base. Preparation system of optics level CVD diamond diaphragm, convenient operation is applicable to preparation optics level CVD diamond diaphragm.
Description
Technical Field
The utility model belongs to the technical field of the diamond film preparation, especially, relate to a preparation system of optics level CVD diamond diaphragm.
Background
At present, the mechanical, thermal, optical and other properties of Chemical Vapor Deposition (CVD) diamond reach or approach the properties of natural diamond, the application range of diamond film coating tools is wider and wider, the market demand is increasing, and the chemical vapor deposition diamond film coating tool has wide application prospect in the high-tech field at present. The direct current arc plasma jet method for preparing the CVD diamond diaphragm is one of the commonly used methods for preparing the CVD diamond diaphragm at present, and can be suitable for preparing the optical-grade CVD diamond diaphragm, however, the existing CVD diamond diaphragm preparation system is usually not convenient for adjusting the distance between a diamond deposition base table and a direct current arc plasma jet area, and the problem that the diamond deposited on the base table is not uniformly distributed, so that the quality of the diamond deposited on the deposition base table is influenced.
Disclosure of Invention
In view of the above, the present invention is directed to a system for preparing an optical CVD diamond film, so as to overcome the above-mentioned shortcomings in the background art.
In order to achieve the above purpose, the technical scheme of the utility model is realized like this:
a preparation system of optical-grade CVD diamond film comprises a reaction chamber, wherein a plasma torch is arranged at the upper part in the reaction chamber, and a deposition area is arranged at the lower part in the reaction chamber; the plasma torch comprises an arc striking nozzle, a cathode is arranged at the center inside the arc striking nozzle, an anode channel is arranged between the arc striking nozzle and the cathode, an argon nozzle is arranged on the anode channel, and an anode nozzle is arranged at the bottom of the plasma torch; the periphery of the plasma torch is provided with an excitation coil; a gap is arranged between the plasma torch and the magnet exciting coil; a cooling cavity is arranged on the periphery of the reaction chamber; the cooling cavity body is U-shaped; the U-shaped two side areas of the cooling cavity extend to the gap between the ion torch and the magnet exciting coil to form a cooling channel; side cooling pipes are spirally distributed in the U-shaped two side areas of the cooling cavity; lower cooling pipes are spirally distributed in the bottom area of the cooling cavity; the lower ends of the left and right side cooling pipes are respectively communicated with the left and right ends of the lower cooling pipe; cooling water is filled in the side cooling pipe and the lower cooling pipe; a lifting platform is arranged in the deposition area in a lifting manner; a base disc is rotatably arranged above the lifting platform; the center of the bottom surface of the basal disc is fixedly provided with a base.
Furthermore, a fixed plate is arranged below the lifting platform in the deposition area; the center of the upper end surface of the fixed plate is rotatably provided with a main gear; at least two auxiliary gears are meshed on the periphery of the main gear; a rotating shaft is fixedly arranged in the center of the lower end face of the pinion, and the lower end of the rotating shaft is arranged on the fixed plate through a bearing; a sliding block is fixedly arranged on the end surface of the outer side of the lifting platform; a slide rail is fixedly arranged on the inner side wall of the reaction chamber, and the slide block is in sliding fit with the slide rail; a deep screw hole is formed in the lower end face of the sliding block, and a lead screw is connected with the inner thread of the deep screw hole; the lower end of the screw rod is fixedly connected with the center of the upper end surface of the pinion.
Further, a pulley is rotatably arranged at the bottom of the base; the center of the upper end surface of the lifting platform is provided with an annular slide way correspondingly matched with the pulley.
Furthermore, a limit ring is fixedly arranged in the center of the upper end face of the lifting platform; the inner side wall of the limiting ring is in clearance fit with the outer side wall of the base; the upper end surface of the limit ring is positioned below the base plate.
Furthermore, the center of the upper end surface of the fixing plate is fixedly connected with a limiting center block through a supporting leg; the end surface of the outer side of the limiting central block is connected with the end surface of the inner side of the sliding block in a sliding manner.
Further, a second motor is fixedly arranged on the inner bottom wall of the reaction chamber and is positioned below the fixing plate; the output shaft of the second motor upwards passes through the fixed plate and is fixedly connected with the center of the lower end surface of the main gear; a first motor is fixedly arranged in the center of the lower end face of the lifting platform; the output shaft of the first motor upwards passes through the lifting platform and is fixedly connected with the center of the lower end face of the base.
Further, the upper part of the reaction chamber is respectively communicated with a vacuum pump and an air inlet device through pipelines; an infrared thermometer is fixedly arranged on the outer wall of the reaction chamber, and the infrared thermometer measures the temperature indoors through a window formed in the outer wall.
Furthermore, a position sensor is fixedly mounted on the upper end face of the limiting center block.
Further, the outside of the reaction chamber is coated with a shell; and a PLC controller is fixedly arranged on the surface of the shell.
Further, the plasma torch, the anode nozzle, the first motor, the second motor, the vacuum pump, the infrared thermometer, the air inlet device, the position sensor and the PLC are respectively and electrically connected with a power supply through wires; the plasma torch, the anode nozzle, the first motor, the second motor, the vacuum pump, the infrared thermometer, the air inlet device and the position sensor are respectively in signal connection with the PLC through electric wires.
Compared with the prior art, the preparation system of optics level CVD diamond diaphragm has following advantage:
(1) the utility model discloses a system for preparing optics level CVD diamond diaphragm, including reacting chamber, plasma torch, settling zone, excitation coil, have the clearance between plasma torch and the excitation coil, the reacting chamber outer periphery is provided with the cooling chamber, the cooling chamber main part becomes the U-shaped, the U-shaped both sides region in cooling chamber extends to the clearance between ion torch and the excitation coil and forms the passageway of cooling usefulness always, the spiral distribution is provided with the cooling tube in the cooling chamber, there is cooling water in the cooling tube, the liftable is provided with the elevating platform in the settling zone, the rotation is provided with the base plate above the elevating platform, the fixed base that is provided with in base plate bottom surface center; the utility model can not only realize the lifting of the base disc, but also realize the rotation of the base disc, is convenient for adjusting the distance between the base disc for depositing the diamond and the direct current arc plasma spraying area and is beneficial to the uniform deposition of the diamond on the base disc, and can improve the preparation quality of the optical CVD diamond diaphragm;
(2) the utility model discloses be provided with the master gear and with the pinion of master gear periphery meshing, rotate through the motor drive master gear, and then drive the pinion and rotate, because fixed mounting has the lead screw on the pinion, the deep screw threaded connection that the terminal surface was seted up under lead screw and the slider, the pinion rotation can drive the lead screw and rotate, under the spacing guide effect of guide rail, the slider can reciprocate, because the slider is fixed to be set up on the elevating platform, the motion of slider can drive the elevating platform and go up and down, meshing relation between the gear and the relation of connection between lead screw and the slider realize the stable lift of elevating platform in coordination, convenient operation;
(3) the utility model drives the base to rotate by the motor, the bottom of the base is rotatably provided with the pulley, and the center of the upper end surface of the lifting platform is provided with the annular slide way which corresponds to the pulley; the matching between the pulleys and the annular slide way improves the stability of the rotation of the base plate; in addition, a limiting ring is fixedly arranged in the center of the upper end face of the lifting platform, the limiting ring can limit the moving range of the base, and the rotating stability of the base and the base plate is further improved;
(4) the utility model discloses pass through landing leg fixedly connected with spacing center block in fixed plate up end center, spacing center block outside terminal surface and slider inboard terminal surface sliding connection, spacing center block can carry out spacing direction with the slide rail in coordination to the slider, has improved the gliding stability of slider;
(5) the utility model discloses being provided with the PLC controller, the PLC controller can receive the signal that plasma torch, positive pole nozzle, first motor, second motor, vacuum pump, infrared radiation thermometer, air inlet unit, position sensor sent, and then sends out the instruction to these parts, realizes the work of intelligent control part, and degree of automation is high, has improved the convenience of operation.
Drawings
The accompanying drawings, which form a part hereof, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the invention without undue limitation. In the drawings:
fig. 1 is a schematic diagram of a system for preparing an optical-grade CVD diamond film according to the present invention;
fig. 2 is a schematic view of a portion of a system for manufacturing optical-grade CVD diamond films according to the present invention;
fig. 3 is a schematic view of a plasma torch according to the present invention.
Description of reference numerals:
100-a reaction chamber; 101-a slide rail; 200-a cooling chamber; 201-side cooling tubes; 202-lower cooling tube; 300-a field coil; 400-plasma torch; 401-a cathode; 402-arc striking nozzle; 403-anode channel; 404-argon gas nozzle; 500-anode nozzle; 600-a deposition zone; 601-a base plate; 6011-a base; 6012-a pulley; 602-a lifting platform; 6021-a stop collar; 6022-annular slide; 603-a slide block; 6031-deep screw hole; 604-a limiting center block; 6041-legs; 605-a fixed plate; 606-main gear; 607-pinion; 608-lead screw; 609 — a first electric machine; 610-a second motor; 700-a housing; 800-vacuum pump; 900-power supply; 1000-infrared thermometer; 1100-air intake device; 1200-position sensor.
Detailed Description
It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are used merely for convenience of description and for simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
As shown in fig. 1 to 3, a system for preparing an optical-grade CVD diamond film comprises a reaction chamber 100, wherein a plasma torch 400 is installed at the upper part in the reaction chamber 100, and a deposition area 600 is arranged at the lower part in the reaction chamber 100;
the plasma torch 400 comprises an arc striking nozzle 402, a cathode 401 is arranged at the center inside the arc striking nozzle 402, an anode channel 403 is arranged between the arc striking nozzle 402 and the cathode 401, an argon nozzle 404 is arranged on the anode channel 403, and an anode nozzle 500 is arranged at the bottom of the plasma torch 400; the plasma torch 400 is provided with an excitation coil 300 at the periphery thereof;
a gap is formed between the plasma torch 400 and the exciting coil 300; a cooling cavity 200 is arranged at the periphery of the reaction chamber 100; the cooling chamber 200 is U-shaped in body; the U-shaped both side regions of the cooling chamber 200 are extended to form a cooling passage in the gap between the ion torch 400 and the exciting coil 300; side cooling pipes 201 are spirally distributed in the two U-shaped side areas of the cooling cavity 200; lower cooling pipes 202 are spirally distributed in the bottom area of the cooling cavity 200; the lower ends of the left and right side cooling pipes 201 are respectively communicated with the left and right ends of the lower cooling pipe 202; cooling water is filled in the side cooling pipe 201 and the lower cooling pipe 202;
a lifting platform 602 is arranged in the deposition area 600 in a lifting manner; a base plate 601 is rotatably arranged above the lifting platform 602; a base 6011 is fixedly arranged in the center of the bottom surface of the base plate 601;
a fixing plate 605 is arranged below the lifting table 602 in the deposition area 600; a main gear 606 is rotatably arranged in the center of the upper end surface of the fixing plate 605; at least two auxiliary gears 607 are meshed with the periphery of the main gear 606; a rotating shaft is fixedly arranged in the center of the lower end face of the pinion 607, and the lower end of the rotating shaft is arranged on the fixing plate 605 through a bearing;
a slide block 603 is fixedly arranged on the end surface of the outer side of the lifting platform 602; a slide rail 101 is fixedly arranged on the inner side wall of the reaction chamber 100, and the slide block 603 is in sliding fit with the slide rail 101; a deep screw hole 6031 is formed in the lower end face of the sliding block 603, and a lead screw 608 is connected to the inner thread of the deep screw hole 6031; the lower end of the screw rod 608 is fixedly connected with the center of the upper end surface of the pinion 607;
a pulley 6012 is rotatably mounted at the bottom of the base 6011; an annular slide rail 6022 correspondingly matched with the pulley 6012 is arranged in the center of the upper end face of the lifting platform 602; the cooperation between the pulley 6012 and the annular slide 6022 improves the stability of the rotation of the base plate 601;
a second motor 610 is fixedly arranged on the inner bottom wall of the reaction chamber 100, and the second motor 610 is positioned below the fixing plate 605; the output shaft of the second motor 610 upwards passes through the fixing plate 605 and is fixedly connected with the center of the lower end surface of the main gear 606; the main gear 606 is driven to rotate by a second motor 610;
a first motor 609 is fixedly arranged in the center of the lower end face of the lifting platform 602; an output shaft of the first motor 609 upwards passes through the lifting platform 602 and is fixedly connected with the center of the lower end face of the base 6011; the base plate 601 is driven to rotate by a first motor 609;
a limit ring 6021 is fixedly arranged in the center of the upper end surface of the lifting platform 602; the inner side wall of the limit ring 6021 is in clearance fit with the outer side wall of the base 6011; the upper end face of the limit ring 6021 is positioned below the base plate 601; the limit ring 6021 can limit the moving range of the base 6011, and improve the stability of the base 6011 and the rotation of the base plate 601;
the center of the upper end surface of the fixing plate 605 is fixedly connected with a limit center block 604 through a supporting leg 6041; the end surface of the outer side of the limit central block 604 is connected with the end surface of the inner side of the sliding block 603 in a sliding way; the limiting center block 604 can cooperate with the slide rail 101 to limit and guide the slide block 603, so that the sliding stability of the slide block 603 is improved; a sealing gasket is arranged in the slide rail 101, and can form sliding sealing with the slide block 603, so that the part above the lifting platform 602 is in a vacuum environment, and the part below the lifting platform 602 is in a weak vacuum environment, thereby realizing the environmental separation of the two parts.
The upper part of the reaction chamber 100 is respectively communicated with a vacuum pump 800 and an air inlet device 1100 through pipelines; an infrared thermometer 1000 is fixedly installed on the outer wall of the reaction chamber 100, and the infrared thermometer 1000 measures the temperature of the chamber through a window formed in the outer wall;
the upper end face of the limiting center block 604 is fixedly provided with a position sensor 1200 which can sense the height position of the lifting platform 602;
the reaction chamber 100 is externally covered with a housing 700; a PLC controller is fixedly installed on the surface of the shell 700;
the plasma torch 400, the anode nozzle 500, the first motor 609, the second motor 610, the vacuum pump 800, the infrared thermometer 1000, the air inlet device 1100, the position sensor 1200 and the PLC controller are respectively electrically connected with the power supply 900 through wires; the plasma torch 400, the anode nozzle 500, the first motor 609, the second motor 610, the vacuum pump 800, the infrared thermometer 1000, the air inlet device 1100 and the position sensor 1200 are respectively in signal connection with the PLC through electric wires, the PLC can receive signals sent by the plasma torch 400, the anode nozzle 500, the first motor 609, the second motor 610, the vacuum pump 800, the infrared thermometer 1000, the air inlet device 1100 and the position sensor 1200, and then instructions are sent to the components, so that the intelligent control of the component work is realized, the automation degree is high, and the convenience in operation is improved.
The utility model discloses a working process: firstly, a power supply 900 is turned on, a motor 610 drives a main gear 606 to rotate, a pinion 607 meshed with the main gear 606 rotates, a lead screw 608 fixedly connected with the pinion 607 rotates, under the cooperative guiding action of a slide rail 101 and a limiting central block 604, a slide block 603 moves up and down, a lifting platform 602 lifts, a position sensor 1200 transmits the height position of the lifting platform 602 sensed by the position sensor to a PLC (programmable logic controller), the PLC sends an instruction to a second motor 610, and the PLC controls the second motor 610 to stop when the lifting platform 602 reaches a proper position, so that the distance between a base plate 601 and a plasma jet area is adjusted; the first motor 609 drives the base 6011 and the base plate 601 above the base 6011 to rotate, and the pulley 6012 moves along the annular slide 6022; then the vacuum pump 800 vacuumizes the reaction chamber 100, then the gas inlet 1100 leads the mixed gas formed by inert gas, hydrogen and reactant source gas according to a certain proportion to the plasma torch 400, the exciting coil 300 is electrified with a proper current, an electric arc is formed between the cathode 401 and the anode channel 403 to heat and dissociate the reactant source gas, and the anode nozzle 500 sprays out to quench the deposit formed on the substrate 601 of the deposition area 600.
The above description is only a preferred embodiment of the present invention, and should not be taken as limiting the invention, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A preparation system of optics level CVD diamond diaphragm characterized in that: comprises a reaction chamber (100), a plasma torch (400) is arranged at the upper part in the reaction chamber (100), and a deposition area (600) is arranged at the lower part in the reaction chamber (100); the plasma torch (400) comprises an arc striking nozzle (402), a cathode (401) is arranged in the center of the interior of the arc striking nozzle (402), an anode channel (403) is arranged between the arc striking nozzle (402) and the cathode (401), an argon nozzle (404) is installed on the anode channel (403), and an anode nozzle (500) is arranged at the bottom of the plasma torch (400); the periphery of the plasma torch (400) is provided with an excitation coil (300); a gap is arranged between the plasma torch (400) and the magnet exciting coil (300); a cooling cavity (200) is arranged on the periphery of the reaction chamber (100); the cooling cavity (200) is U-shaped in main body; the two U-shaped side areas of the cooling cavity (200) extend to the gap between the plasma torch (400) and the magnet exciting coil (300) to form a cooling channel; side cooling pipes (201) are spirally distributed in the two U-shaped side areas of the cooling cavity (200); lower cooling pipes (202) are spirally distributed in the bottom area of the cooling cavity (200); the lower ends of the left and right side cooling pipes (201) are respectively communicated with the left and right ends of the lower cooling pipe (202); cooling water is filled in the side cooling pipe (201) and the lower cooling pipe (202); a lifting platform (602) is arranged in the deposition area (600) in a lifting way; a base disc (601) is rotatably arranged above the lifting platform (602); a base (6011) is fixedly arranged at the center of the bottom surface of the base plate (601).
2. The system for preparing an optical-grade CVD diamond film sheet according to claim 1, wherein: a fixed plate (605) is arranged below the lifting platform (602) in the deposition area (600); a main gear (606) is rotatably arranged in the center of the upper end surface of the fixing plate (605); at least two auxiliary gears (607) are meshed with the periphery of the main gear (606); a rotating shaft is fixedly arranged in the center of the lower end face of the pinion (607), and the lower end of the rotating shaft is arranged on the fixing plate (605) through a bearing; a slide block (603) is fixedly arranged on the end surface of the outer side of the lifting platform (602); a slide rail (101) is fixedly arranged on the inner side wall of the reaction chamber (100), and the slide block (603) is in sliding fit with the slide rail (101); a deep screw hole (6031) is formed in the lower end face of the sliding block (603), and a lead screw (608) is connected with the deep screw hole (6031) in a threaded manner; the lower end of the screw rod (608) is fixedly connected with the center of the upper end surface of the pinion (607).
3. The system for preparing an optical-grade CVD diamond film sheet according to claim 1, wherein: a pulley (6012) is rotatably arranged at the bottom of the base (6011); the center of the upper end surface of the lifting platform (602) is provided with an annular slide way (6022) correspondingly matched with the pulley (6012).
4. The system for preparing an optical-grade CVD diamond film sheet according to claim 1, wherein: a limit ring (6021) is fixedly arranged in the center of the upper end surface of the lifting platform (602); the inner side wall of the limit ring (6021) is in clearance fit with the outer side wall of the base (6011); the upper end face of the limit ring (6021) is positioned below the base plate (601).
5. The system for preparing an optical-grade CVD diamond film sheet according to claim 2, wherein: the center of the upper end surface of the fixing plate (605) is fixedly connected with a limiting center block (604) through a supporting leg (6041); the end surface of the outer side of the limit central block (604) is connected with the end surface of the inner side of the sliding block (603) in a sliding way.
6. The system for preparing an optical-grade CVD diamond film sheet according to claim 5, wherein: a second motor (610) is fixedly arranged on the inner bottom wall of the reaction chamber (100), and the second motor (610) is positioned below the fixing plate (605); an output shaft of the second motor (610) upwards passes through the fixing plate (605) and is fixedly connected with the center of the lower end surface of the main gear (606); a first motor (609) is fixedly arranged in the center of the lower end face of the lifting platform (602); an output shaft of the first motor (609) upwards passes through the lifting platform (602) and is fixedly connected with the center of the lower end face of the base (6011).
7. The system for preparing an optical-grade CVD diamond film sheet according to claim 6, wherein: the upper part of the reaction chamber (100) is communicated with a vacuum pump (800) and an air inlet device (1100) through pipelines respectively; an infrared thermometer (1000) is fixedly arranged on the inner wall of the reaction chamber (100).
8. The system for preparing an optical-grade CVD diamond film sheet according to claim 7, wherein: and a position sensor (1200) is fixedly arranged on the upper end surface of the limiting center block (604).
9. The system for preparing an optical-grade CVD diamond film sheet according to claim 8, wherein: the reaction chamber (100) is covered with a shell (700); the surface of the shell (700) is fixedly provided with a PLC controller.
10. The system for preparing an optical-grade CVD diamond film sheet according to claim 9, wherein: the plasma torch (400), the anode nozzle (500), the first motor (609), the second motor (610), the vacuum pump (800), the infrared thermometer (1000), the air inlet device (1100), the position sensor (1200) and the PLC are respectively and electrically connected with the power supply (900) through electric wires; the plasma torch (400), the vacuum pump (800), the infrared thermometer (1000), the air inlet device (1100) and the position sensor (1200) are respectively in signal connection with the PLC through electric wires.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021310823.1U CN213142181U (en) | 2020-07-07 | 2020-07-07 | Preparation system of optics level CVD diamond diaphragm |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021310823.1U CN213142181U (en) | 2020-07-07 | 2020-07-07 | Preparation system of optics level CVD diamond diaphragm |
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| CN213142181U true CN213142181U (en) | 2021-05-07 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115058703A (en) * | 2022-06-24 | 2022-09-16 | 江苏实为半导体科技有限公司 | Lifting base of CVD reaction chamber |
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2020
- 2020-07-07 CN CN202021310823.1U patent/CN213142181U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115058703A (en) * | 2022-06-24 | 2022-09-16 | 江苏实为半导体科技有限公司 | Lifting base of CVD reaction chamber |
| CN115058703B (en) * | 2022-06-24 | 2024-02-09 | 江苏实为半导体科技有限公司 | Liftable base of CVD reaction chamber |
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