CN212770942U - Supporting device of chemical vapor deposition furnace - Google Patents
Supporting device of chemical vapor deposition furnace Download PDFInfo
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- CN212770942U CN212770942U CN202021013047.9U CN202021013047U CN212770942U CN 212770942 U CN212770942 U CN 212770942U CN 202021013047 U CN202021013047 U CN 202021013047U CN 212770942 U CN212770942 U CN 212770942U
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- vapor deposition
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Abstract
The utility model provides a supporting device of a chemical vapor deposition furnace. The supporting device of the chemical vapor deposition furnace comprises a ring plate; the deposition furnace is rotatably arranged on the ring plate, and the top and the bottom of the deposition furnace extend out of the ring plate; the connecting rods are fixedly arranged at the bottom of the ring plate and distributed in a circular array; the bottom ring is fixedly arranged at the bottom ends of the connecting rods and is positioned below the deposition furnace; the lifting lugs are fixedly mounted on the deposition furnace, distributed in a circular array and located above the annular plate. The utility model provides a supporting arrangement of chemical vapor deposition stove has the advantage that makes things convenient for the concatenation driving medium, and can adjust the landing leg height.
Description
Technical Field
The utility model relates to a chemical vapor deposition equipment technical field especially relates to a supporting arrangement of chemical vapor deposition stove.
Background
Chemical vapor deposition, abbreviated as CVD in english, is the most widely used technique in the semiconductor industry for depositing a variety of materials, including a wide range of insulating materials, most metallic materials and metal alloy materials. Generally, chemical vapor deposition is understood as that two or more gaseous raw materials are introduced into a reaction chamber, and then a vapor phase thermal decomposition reaction occurs between the two raw materials to form a new material which is deposited on the surface of a substrate wafer, so that the substrate obtains better surface quality effect; the gas raw material is generally a gas such as metal vapor, volatile metal halide, hydride, or metal organic compound. In the chemical vapor deposition process, uniform distribution of gas raw materials can accelerate the deposition rate and make the compactness and uniformity of the film layer better, wherein the uniformity of the deposited film is extremely important for the substrate.
However, the existing rotating mechanism is complex in structure during installation, the installation of the conventional rotating mechanism is time-consuming and labor-consuming in a hoisting mode, the production efficiency is delayed, and meanwhile, the supporting legs of the supporting device are mostly fixed, so that the erection height cannot be flexibly adjusted according to the actual situation of a field during use.
Therefore, there is a need to provide a new supporting device for a chemical vapor deposition furnace to solve the above-mentioned problems.
SUMMERY OF THE UTILITY MODEL
The technical problem solved by the utility model is to provide a make things convenient for the concatenation driving medium, and can adjust the supporting arrangement of the chemical vapor deposition stove of landing leg height.
In order to solve the above technical problem, the present invention provides a supporting device for a chemical vapor deposition furnace, comprising: a ring plate; the deposition furnace is rotatably arranged on the ring plate, and the top and the bottom of the deposition furnace extend out of the ring plate; the connecting rods are fixedly arranged at the bottom of the ring plate and distributed in a circular array; the bottom ring is fixedly arranged at the bottom ends of the connecting rods and is positioned below the deposition furnace; the lifting lugs are fixedly arranged on the deposition furnace and distributed in a circular array, and are all positioned above the annular plate; the lantern ring is fixedly sleeved on the deposition furnace, and the top of the lantern ring is fixedly connected with the bottoms of the lifting lugs; the ring groove is formed in the bottom of the lantern ring; the sliding ring is rotatably installed in the annular groove, and the bottom of the sliding ring extends out of the lantern ring and is fixedly connected with the top of the annular plate; the gear ring is fixedly sleeved on the lantern ring; the mounting plate is fixedly mounted on one side of the ring plate; a movable transmission structure disposed on the mounting plate.
Preferably, the movable transmission structure comprises a sliding chute, a first screw rod, a sliding block, a motor, a gear and four supporting legs, the chute is arranged at the top of the mounting plate, the first screw rod is rotatably arranged on the inner walls at two sides of the chute, one end of the first screw rod, which is far away from the annular plate, extends out of the mounting plate, the sliding block is sleeved on the first screw rod in a threaded manner, the slide block is connected with the inner wall of the chute in a sliding way, the top of the slide block extends out of the mounting plate, the motor is fixedly arranged on the top of the sliding block, the bottom of the motor is contacted with the top of the mounting plate, the gear is fixedly mounted on an output shaft of the motor, the gear is meshed with the gear ring, the supporting legs are fixedly mounted on the ring plate, the supporting legs are distributed in a circular array, and the top of one of the supporting legs is in contact with the bottom of the mounting plate.
Preferably, first screw rod is kept away from the one end fixed mounting of crown plate has the hand wheel, the crown plate is close to one side fixed mounting of motor has two second screw rods, two equal sliding sleeve is equipped with the support on the second screw rod, the support is kept away from one side of deposit stove with motor fixed connection, two equal threaded mounting has the nut on the second screw rod, two the nut all is located the support is kept away from one side of deposit stove.
Preferably, a plurality of first balls are movably embedded in the top of the slip ring, and the tops of the first balls are all in contact with the inner wall of the top of the ring groove.
Preferably, the bottom of the lantern ring is movably inlaid with a plurality of second balls, the second balls are distributed in two groups, and the bottoms of the second balls are in contact with the top of the ring plate.
Preferably, a plurality of third balls are movably embedded in the top of the bottom ring, and the tops of the third balls are all in contact with the bottom of the deposition furnace.
Preferably, all be equipped with on four supporting legs and adjust the structure, it includes slide, extension rod, a plurality of cotter way, two connecting plates and two pins to adjust the structure, the slide is seted up on the supporting leg, extension rod slidable mounting is in the slide, the bottom of extension rod extends to outside the supporting leg, it is a plurality of the cotter way is seted up respectively the both sides of extension rod, two the connecting plate sets up respectively the both sides of supporting leg, two the cotter rod slidable mounting respectively on the both sides inner wall of slide, two the one end that the cotter rod is close to each other extends to corresponding two respectively in the cotter way, two the one end that the cotter rod was kept away from each other all extends to outside the supporting leg and respectively with two connecting plate fixed connection.
Preferably, the equal fixed mounting in both sides of supporting leg has the guide arm, two the guide arm slides respectively and runs through two the connecting plate, two the guide arm is kept away from the equal fixed mounting in one end of supporting leg has spacing piece, two equal slip cap on the guide arm is equipped with the spring, two the one end that the spring is close to each other is respectively with two the connecting plate is kept away from one side fixed connection, two of supporting leg the one end that the spring kept away from each other respectively with two spacing piece fixed connection, two the equal fixed mounting in bottom of extension rod has the grounding piece.
Compared with the prior art, the utility model provides a supporting arrangement of chemical vapor deposition stove has following beneficial effect:
the utility model provides a supporting arrangement of chemical vapor deposition stove, this device difference and traditional deposition stove, the concatenation is comparatively simple, has solved the deposition stove simultaneously through mobilizable motor and has caused ring gear and gear easily when the concatenation because the error easily causes the problem of damage, and it is comparatively convenient to use, and the ball of installation has less frictional property on it.
Drawings
FIG. 1 is a schematic structural view of a first embodiment of a supporting device of a chemical vapor deposition furnace according to the present invention;
FIG. 2 is an enlarged schematic view of portion A shown in FIG. 1;
fig. 3 is a schematic structural diagram of a supporting device of a chemical vapor deposition furnace according to a second embodiment of the present invention.
Reference numbers in the figures: 1. a ring plate; 2. a deposition furnace; 3. a connecting rod; 4. a bottom ring; 5. lifting lugs; 6. a collar; 7. a ring groove; 8. a slip ring; 9. a ring gear; 10. mounting a plate; 11. a chute; 12. a first screw; 13. a slider; 14. a motor; 15. a gear; 16. supporting legs; 17. a slideway; 18. an extension rod; 19. a pin slot; 20. a connecting plate; 21. a pin rod.
Detailed Description
The present invention will be further described with reference to the accompanying drawings and embodiments.
The first embodiment:
please refer to fig. 1-2. The supporting device of the chemical vapor deposition furnace comprises: a ring plate 1; the deposition furnace 2 is rotatably mounted on the annular plate 1, and the top and the bottom of the deposition furnace 2 extend out of the annular plate 1; the connecting rods 3 are all fixedly arranged at the bottom of the ring plate 1, and the connecting rods 3 are distributed in a circular array; the bottom ring 4 is fixedly arranged on the bottom ends of the connecting rods 3, and the bottom ring 4 is positioned below the deposition furnace 2; the lifting lugs 5 are all fixedly arranged on the deposition furnace 2, the lifting lugs 5 are distributed in a circular array, and the lifting lugs 5 are all positioned above the annular plate 1; the lantern ring 6 is fixedly sleeved on the deposition furnace 2, and the top of the lantern ring 6 is fixedly connected with the bottoms of the lifting lugs 5; the ring groove 7 is formed in the bottom of the lantern ring 6; the sliding ring 8 is rotatably installed in the annular groove 7, and the bottom of the sliding ring 8 extends out of the collar 6 and is fixedly connected with the top of the annular plate 1; the gear ring 9 is fixedly sleeved on the lantern ring 6; the mounting plate 10 is fixedly mounted on one side of the ring plate 1; a movable transmission structure disposed on the mounting plate 10.
The movable transmission structure comprises a chute 11, a first screw 12, a sliding block 13, a motor 14, a gear 15 and four supporting legs 16, wherein the chute 11 is arranged at the top of the mounting plate 10, the first screw 12 is rotatably arranged on the inner walls of the two sides of the chute 11, one end of the first screw 12, which is far away from the ring plate 1, extends to the outside of the mounting plate 10, the sliding block 13 is sleeved on the first screw 12 in a threaded manner, the sliding block 13 is in sliding connection with the inner wall of the chute 11, the top of the sliding block 13 extends to the outside of the mounting plate 10, the motor 14 is fixedly arranged at the top of the sliding block 13, the bottom of the motor 14 is in contact with the top of the mounting plate 10, the gear 15 is fixedly arranged on the output shaft of the motor 14, the gear 15 is meshed with the gear ring 9, and the four supporting legs 16 are all fixedly arranged on the ring, the four support legs 16 are arranged in a circular array, wherein the top of one support leg 16 is in contact with the bottom of the mounting plate 10.
The top of sliding ring 8 is movably inlayed and is had a plurality of first balls, and is a plurality of the top of first ball all with the top inner wall of annular 7 contacts.
The bottom activity of lantern ring 6 is inlayed and is had a plurality of second ball, and is a plurality of the second ball is two sets of distributions, and is a plurality of the bottom of second ball all with the top of crown plate 1 contacts.
A plurality of third balls are movably embedded in the top of the bottom ring 4, and the tops of the third balls are all contacted with the bottom of the deposition furnace 2.
In this embodiment:
during hoisting, firstly, the ring plate 1 on the supporting leg 16 is placed at a selected position on the ground, then a hand wheel is rotated, the hand wheel drives the first screw rod 12 to rotate, the first screw rod 12 drives the sliding block 13 to slide along the inner wall of the sliding groove 11 when rotating, at the moment, the motor 14 is driven to be far away from the ring plate 1, damage caused by meshing and dislocation of the gear 15 and the gear ring 9 is prevented, after the regulation is finished, the deposition furnace 2 is hoisted through a plurality of lifting lugs 5, the bottom of the deposition furnace 2 is contacted with a plurality of third balls on the bottom ring 4 after penetrating through a ring hole on the ring plate 1, the sliding ring 8 is embedded into the ring groove 7, the first balls are contacted with the inner wall of the top of the ring groove 7, two rows of distributed second balls are contacted with the top of the ring plate 1, then the hand wheel is reversed, the first screw rod 12 is reversed to enable the motor 14 to be close to the ring plate 1, the, it is comparatively convenient, the back support just in time pegs graft on two second screw rods after gear 15 and ring gear 9 mesh, at last fasten through the nut can, only need during the use starter motor 14 can drive the rotation of deposition furnace 2 through gear 15 and ring gear 9, it is comparatively convenient to splice.
Compared with the prior art, the utility model provides a supporting arrangement of chemical vapor deposition stove has following beneficial effect:
the utility model provides a supporting arrangement of chemical vapor deposition stove, this device difference and traditional deposition stove 2, the concatenation is comparatively simple, has solved deposition stove 2 simultaneously through mobilizable motor 14 and has caused ring gear 9 and gear 15 easily when the concatenation because the error easily causes the problem of damage, and it is comparatively convenient to use, and the ball of installation has been less frictional property on it.
Second embodiment:
based on the supporting device of the chemical vapor deposition furnace provided by the first embodiment of the application, the second embodiment of the application provides another supporting device of the chemical vapor deposition furnace. The second embodiment is merely a preferred way of the first embodiment, and the implementation of the second embodiment does not affect the implementation of the first embodiment alone.
The second embodiment of the present invention will be further explained with reference to the drawings and the embodiments.
Referring to fig. 3, the supporting apparatus of the cvd furnace further includes four adjusting structures, four adjusting structures are respectively disposed on the four supporting legs 16, the adjusting structure comprises a slideway 17, an extension rod 18, a plurality of pin grooves 19, two connecting plates 20 and two pin rods 21, the slideway 17 is arranged on the supporting leg 16, the extension rod 18 is arranged in the slideway 17 in a sliding way, extension rod 18's bottom extends to outside supporting leg 16, it is a plurality of cotter 19 sets up respectively extension rod 18's both sides, two connecting plate 20 sets up respectively supporting leg 16's both sides, two cotter 21 slidable mounting respectively is in on slide 17's the both sides inner wall, two the one end that cotter 21 is close to each other extends to corresponding two respectively in the cotter 19, two the one end that cotter 21 kept away from each other all extends to outside supporting leg 16 and respectively with two connecting plate 20 fixed connection.
The equal fixed mounting in both sides of supporting leg 16 has the guide arm, two the guide arm slides respectively and runs through two connecting plate 20, two the guide arm is kept away from the equal fixed mounting in one end of supporting leg 16 has spacing piece, two equal slip cap is equipped with the spring on the guide arm, two the one end that the spring is close to each other is respectively with two connecting plate 20 is kept away from one side fixed connection of supporting leg 16, two the one end that the spring was kept away from each other is respectively with two spacing piece fixed connection, two the equal fixed mounting in bottom of extension rod 18 has the ground connection piece.
In this embodiment:
when the height of erectting of this device is adjusted to needs, according to the on-the-spot condition hoisting support before hoist and mount sedimentation furnace 2, make crown plate 1 and supporting leg 16 break away from ground, later pulling connecting plate 20, make connecting plate 20 slide along the guide arm and stretch the spring, and make pin 21 break away from cotter way 19, this process needs two people's cooperation, pin 21 when two correspondences all break away from can twitch extension rod 18 and increase its supporting leg 16's length behind the cotter way 19 on the extension rod 18, reach the purpose of regulation, it is comparatively convenient to use, can fix extension rod 18 again after the adjustment finishes the back hands-off.
Compared with the prior art, the utility model provides a supporting arrangement of chemical vapor deposition stove has following beneficial effect:
the utility model provides a supporting arrangement of chemical vapor deposition stove, this device adjust supporting leg 16's length through extensible extension rod 18, have strengthened adaptability, and the mode of independent adjustment simultaneously can be adjusted its levelness to a certain extent, comparatively makes things convenient for people to use.
It should be noted that the device structure and the accompanying drawings of the present invention mainly describe the principle of the present invention, and in the technology of this design principle, the settings of the power mechanism, the power supply system, the control system, etc. of the device are not completely described, and the details of the power mechanism, the power supply system, and the control system can be clearly known on the premise that those skilled in the art understand the principle of the present invention.
The above only is the embodiment of the present invention, not limiting the scope of the present invention, all the equivalent structures or equivalent processes of the present invention are used in the specification and the attached drawings, or directly or indirectly applied to other related technical fields, and the same principle is included in the protection scope of the present invention.
Claims (8)
1. A support apparatus for a chemical vapor deposition furnace, comprising:
a ring plate;
the deposition furnace is rotatably arranged on the ring plate, and the top and the bottom of the deposition furnace extend out of the ring plate;
the connecting rods are fixedly arranged at the bottom of the ring plate and distributed in a circular array;
the bottom ring is fixedly arranged at the bottom ends of the connecting rods and is positioned below the deposition furnace;
the lifting lugs are fixedly arranged on the deposition furnace and distributed in a circular array, and are all positioned above the annular plate;
the lantern ring is fixedly sleeved on the deposition furnace, and the top of the lantern ring is fixedly connected with the bottoms of the lifting lugs;
the ring groove is formed in the bottom of the lantern ring;
the sliding ring is rotatably installed in the annular groove, and the bottom of the sliding ring extends out of the lantern ring and is fixedly connected with the top of the annular plate;
the gear ring is fixedly sleeved on the lantern ring;
the mounting plate is fixedly mounted on one side of the ring plate;
a movable transmission structure disposed on the mounting plate.
2. The supporting device of the chemical vapor deposition furnace according to claim 1, wherein the movable transmission structure comprises a sliding groove, a first screw, a sliding block, a motor, a gear and four supporting legs, the sliding groove is formed at the top of the mounting plate, the first screw is rotatably mounted on the inner walls of the two sides of the sliding groove, one end of the first screw, which is far away from the ring plate, extends out of the mounting plate, the sliding block is sleeved on the first screw in a threaded manner, the sliding block is slidably connected with the inner walls of the sliding groove, the top of the sliding block extends out of the mounting plate, the motor is fixedly mounted at the top of the sliding block, the bottom of the motor is in contact with the top of the mounting plate, the gear is fixedly mounted on the output shaft of the motor, the gear is meshed with the gear ring, and the four supporting legs are fixedly mounted on the ring plate, the four supporting legs are distributed in a circular array, and the top of one of the supporting legs is in contact with the bottom of the mounting plate.
3. The supporting device of the chemical vapor deposition furnace as claimed in claim 2, wherein a hand wheel is fixedly mounted at one end of the first screw rod, which is far away from the ring plate, two second screw rods are fixedly mounted at one side of the ring plate, which is close to the motor, two supports are slidably sleeved on the two second screw rods, one side of the supports, which is far away from the deposition furnace, is fixedly connected with the motor, nuts are threadedly mounted on the two second screw rods, and the two nuts are located at one side of the supports, which is far away from the deposition furnace.
4. The supporting device of the chemical vapor deposition furnace as claimed in claim 1, wherein a top portion of the slip ring is movably embedded with a plurality of first balls, and top portions of the plurality of first balls are in contact with an inner wall of a top portion of the ring groove.
5. The supporting device of claim 1, wherein a plurality of second balls are movably embedded in the bottom of the collar, the second balls are distributed in two groups, and the bottoms of the second balls are in contact with the top of the ring plate.
6. The supporting apparatus of claim 1, wherein a plurality of third balls are movably inserted into a top of the bottom ring, and a top of each of the third balls is in contact with a bottom of the deposition furnace.
7. The supporting device of the chemical vapor deposition furnace as claimed in claim 2, the four supporting legs are all provided with an adjusting structure, the adjusting structure comprises a slideway, an extension rod, a plurality of pin grooves, two connecting plates and two pin rods, the slide is seted up on the supporting leg, extension rod slidable mounting be in the slide, the bottom of extension rod extends to outside the supporting leg, it is a plurality of the cotter way is seted up respectively the both sides of extension rod, two the connecting plate sets up respectively the both sides of supporting leg, two the cotter is slidable mounting respectively on the both sides inner wall of slide, two the one end that the cotter is close to each other extends to corresponding two respectively in the cotter way, two the one end that the cotter kept away from each other all extends to outside the supporting leg and respectively with two connecting plate fixed connection.
8. The supporting device of a chemical vapor deposition furnace as claimed in claim 7, wherein guide rods are fixedly mounted on both sides of the supporting leg, the two guide rods respectively penetrate through the two connecting plates in a sliding manner, limiting pieces are fixedly mounted on ends, far away from the supporting leg, of the two guide rods, springs are respectively sleeved on the two guide rods in a sliding manner, one ends, close to each other, of the two springs are respectively fixedly connected with one sides, far away from the supporting leg, of the two connecting plates, two ends, far away from each other, of the two springs are respectively fixedly connected with the two limiting pieces, and grounding blocks are respectively fixedly mounted at the bottom ends of the two extending rods.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021013047.9U CN212770942U (en) | 2020-06-05 | 2020-06-05 | Supporting device of chemical vapor deposition furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021013047.9U CN212770942U (en) | 2020-06-05 | 2020-06-05 | Supporting device of chemical vapor deposition furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212770942U true CN212770942U (en) | 2021-03-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202021013047.9U Active CN212770942U (en) | 2020-06-05 | 2020-06-05 | Supporting device of chemical vapor deposition furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212770942U (en) |
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2020
- 2020-06-05 CN CN202021013047.9U patent/CN212770942U/en active Active
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