CN212762852U

CN212762852U - Chemical grinding fluid supply system

Info

Publication number: CN212762852U
Application number: CN202020891754.1U
Authority: CN
Inventors: 罗保兴; 杨凯
Original assignee: Shanghai Jixiao Electronic Technology Co ltd
Current assignee: Shanghai Jixiao Electronic Technology Co ltd
Priority date: 2020-05-25
Filing date: 2020-05-25
Publication date: 2021-03-23
Anticipated expiration: 2030-05-25

Abstract

The utility model discloses a chemical grinding liquid's supply system, concretely relates to semiconductor manufacturing field. The system mainly comprises a framework, an operation panel, an automatic grinding fluid proportioning device, a grinding fluid storage box body, a grinding fluid stirring device, a grinding fluid humidifying device and a fluid supply pump. The automatic grinding fluid proportioning device is used for continuously supplying grinding fluid required by the grinding fluid storage box body; the grinding fluid humidifying device is used for continuously injecting nitrogen with moisture into the grinding fluid storage box body, and further prevents the grinding fluid from crystallizing in a dry environment to the maximum extent. The utility model provides a one-to-one multi-mode of supply of lapping liquid in the semiconductor processing process, the system of many chemical mechanical polishing equipment simultaneous workings of confession of one set of lapping liquid promptly, when satisfying the 24 hours supply of lapping liquid, fine overcoming causes the customer that can't enlarge the productivity because of the factory building area limitation, for enterprise's equipment upgrading, iterative preferred solution that provides.

Description

Chemical grinding fluid supply system

Technical Field

The utility model relates to a chemical mechanical polishing field specifically is a chemical polishing liquid's supply system.

Background

With the vigorous development of the integrated circuit industry in China, the supply equipment of the grinding fluid required by chemical mechanical grinding in the chip manufacturing is increased day by day, the traditional one-to-one supply mode cannot meet the development of the semiconductor industry at present, the pain point of the opposite enterprise in the actual production is known in the deep cooperation with the client, the company leaders decide to increase the innovation investment cost on the basis of the existing equipment, and the supply equipment which can meet the one-to-many mode requirement of the enterprise is developed, so that the centralized supply of the grinding fluid and the convenience for equipment maintenance are met.

SUMMERY OF THE UTILITY MODEL

The utility model discloses a technical scheme, a chemical grinding liquid's supply system is provided, mainly include skeleton (101), control panel (102), lapping liquid humidification device (103), automatic proportioning device of lapping liquid (104), lapping liquid storage box 1(105), lapping liquid storage box 2(106), lapping liquid agitating unit (107), feed pump A (109) and feed pump B (110). The system is characterized in that a supply pipeline of external grinding stock solution and chemical solution is respectively conveyed to a grinding solution storage box A (105) and a grinding solution storage box B (106) through a grinding solution automatic proportioning device (104), the grinding solution storage box is provided with a liquid level sensor, and when the grinding solution storage box reaches a set liquid level, the grinding solution automatic proportioning device (104) stops supplying liquid; the liquid supply pump A (109) and the liquid supply pump B (110) can normally start the liquid supply output system when the grinding liquid storage box body reaches a safe liquid level (L); in the operation process of the equipment, the grinding fluid humidifying device selectively conveys the moisturizing nitrogen to the grinding fluid storage box body through a pipeline B (202) and a control valve to ensure that the grinding fluid storage container works in a constant environment, so that the grinding fluid is prevented from crystallizing in a dry environment to the maximum extent; when the liquid supply output system works normally, the grinding liquid proportioning program can automatically and circularly work when the grinding liquid storage box body reaches the lower limit of the safe liquid level.

Preferably, the grinding fluid stirring device (107) is used for regularly stirring the grinding fluid storage box A (105) and the grinding fluid storage box B (106) to prevent suspended substances in the grinding fluid from being layered and condensed up and down.

Further optimally, the liquid supply pump A (109) connects the grinding fluid storage tank A (105) and the grinding fluid storage tank B (106) in series through a pipeline D (204) and a control valve D (304), an overflow pipeline is arranged and is connected with the waste liquid discharge pipeline C (203) and a pipeline F (206), and under the condition that the supply output 2 of the grinding fluid is closed, the grinding fluid storage tank A (105) can also supply liquid for the grinding fluid storage tank B (106), so that the storage capacity of the supply output 1 of the grinding fluid is increased, and a prerequisite is provided for equipment expansion.

Preferably, the liquid supply pump a (109) and the liquid supply pump B (110) are respectively used for internal circulation of the grinding fluid storage tank a (105) and the grinding fluid storage tank B (106), specifically, the internal circulation of the grinding fluid storage tank is realized through a pipeline D (204), a pipeline F (206), a control valve C (303) and a control valve E (305), and the grinding fluid can be supplied to the chemical mechanical grinding equipment through a pipeline G (207) and a pipeline H (208) which are independently controlled, or the connection control valve G (308) between the pipeline G (207) and the pipeline H (208) can be opened to supply liquid to the grinding equipment of the supply output 1 and the supply output 2 of the grinding fluid under the condition that any one liquid supply pump fails and is maintained, and the supply output of any one group of grinding fluid does not need to be stopped under the condition that the control valve F (307) and the control valve I (310) are switched and controlled, thereby not influencing the continuous work of the chemical mechanical polishing equipment.

The beneficial effects of the utility model

The utility model provides a one-to-one multi-mode of supply of lapping liquid in the semiconductor processing process, one set of lapping liquid supplies the system of many chemical mechanical polishing equipment simultaneous workings promptly, and the equipment of lapping liquid need not stop when breaking down and maintenance, when satisfying the 24 hours supply of lapping liquid, also saves the cost that equipment occupy the factory building, provides preferred solution for preparing the enterprise of equipment upgrading, iteration.

Drawings

FIG. 1 is a schematic diagram of a chemical polishing slurry supply system according to the present invention.

Detailed Description

The present invention will be further described with reference to the accompanying drawings, and the chemical polishing liquid supply system provided by the present invention will be described in detail by way of examples.

Example one

Referring to fig. 1, the present embodiment is a chemical polishing slurry supply system, in which external polishing slurry and chemical solution supply pipelines are respectively delivered to a polishing slurry storage tank a (105) and a polishing slurry storage tank B (106) through an automatic polishing slurry proportioning device (104), a pipeline a (201), a control valve a (301), and a control valve B (302), the polishing slurry storage tanks are installed with level sensors (HH, H, L, LL), and when the polishing slurry storage tank reaches a set level, the automatic polishing slurry proportioning device (104) stops supplying slurry; the grinding fluid humidifying device (103) selectively conveys the moisturizing nitrogen to the grinding fluid storage box body through a control valve on the pipeline B (202), so that the grinding fluid is prevented from crystallizing in a dry environment to the maximum extent; the grinding fluid stirring device (107) regularly stirs the grinding fluid storage box A (105) and the grinding fluid storage box B (106) to prevent suspended substances in the grinding fluid from layering and condensing up and down; starting a liquid supply pump A (109) and a liquid supply pump B (110) to be respectively used for internal circulation of a grinding fluid storage tank A (105) and a grinding fluid storage tank B (106), specifically realizing the internal circulation of the grinding fluid storage tank through a pipeline D (204), a pipeline E (205), a control valve C (303) and a control valve E (305), and supplying grinding fluid to the chemical mechanical grinding equipment through a pipeline G (207) and a pipeline H (208) which are independently controlled, and also realizing that when any one liquid supply pump has faults and maintenance, a connection control valve G (308) between the pipeline G (207) and the pipeline H (208) is started to simultaneously supply liquid to the grinding equipment with a grinding fluid supply output 1 and a grinding fluid supply output 2, and switching control is carried out on the control valve F (307) and the control valve I (310), so that the supply output of any one group of grinding fluids does not need to be stopped when the faults and maintenance occur, thereby not influencing the continuous work of the chemical mechanical polishing equipment; when the supply output 1 of the grinding fluid needs to increase the storage capacity, a fluid supply pump A (109) can be started to connect a grinding fluid storage box A (105) and a grinding fluid storage box B (106) in series through a pipeline D (204) and a control valve D (304), and under the condition that a control valve H (309) and a control valve I (310) are closed in the supply output 2 of the grinding fluid, the grinding fluid storage box A (105) can also supply fluid for the grinding fluid storage box B (106), so that a precondition is provided for the expansion of chemical mechanical grinding equipment.

It should be noted that the terms "upper" and "lower" in the description of the present invention are based on the position relationship shown in the drawings, the above embodiments are only used to help understanding the present invention, but do not constitute the limitation of the present invention, and those skilled in the relevant art can make various changes, modifications, substitutions, integrations and variations without departing from the spirit and scope of the present invention, therefore, all equivalent technical solutions should also belong to the scope of the present invention, and should be defined by the claims.

Claims

1. A chemical grinding fluid supply system is characterized by mainly comprising a framework (101), a control panel (102), a grinding fluid humidifying device (103), a grinding fluid automatic proportioning device (104), a grinding fluid storage box A (105), a grinding fluid storage box B (106), a grinding fluid stirring device (107), a fluid feed pump A (109) and a fluid feed pump B (110); the grinding fluid humidifying device (103) is connected to a grinding fluid storage box body B (106) through a pipeline B (202); the automatic grinding fluid proportioning device (104) is connected to a grinding fluid storage box body A (105) through a pipeline A (201); the liquid supply pump a (109) and the liquid supply pump B (110) can supply the grinding fluid to the chemical mechanical grinding equipment through the independent pipeline G (207) and the independent pipeline H (208), or can open the connection control valve G (308) between the pipeline G (207) and the pipeline H (208) to simultaneously supply the grinding fluid to the grinding equipment with the grinding fluid supply output 1 and the grinding fluid supply output 2 under the condition that any one liquid supply pump fails.

2. The chemical polishing slurry supply system according to claim 1, wherein said slurry humidifying means (103) is for injecting nitrogen gas with moisture retention into the slurry storage tank A (105) and the slurry storage tank B (106).

3. The system of claim 1, wherein the slurry auto-proportioning device (104) is used for preparing and mixing the desired chemical slurry.

4. The chemical polishing slurry supply system according to claim 1, wherein the slurry stirring device (107) is used for periodically stirring the slurry storage tank A (105) and the slurry storage tank B (106) to prevent the suspended matter in the slurry from being condensed in layers.

5. The chemical polishing liquid supply system according to claim 1, wherein the liquid supply pumps A (109) and B (110) are used for internal circulation of the polishing liquid storage tank A (105) and B (106) and output of the polishing liquid to the chemical polishing apparatus, respectively.

6. A chemical grinding liquid supply system is characterized in that a grinding liquid storage box A (105) and a grinding liquid storage box B (106) are connected in series by a liquid supply pump A (109) through a pipeline D (204) and a control valve D (304), and when a supply output 2 of grinding liquid is closed, the grinding liquid storage box A (105) can also supply liquid for the grinding liquid storage box B (106), so that the storage capacity of the supply output 1 of the grinding liquid is increased.