CN212515112U - Optical filter for high-speed transmission and optical module - Google Patents
Optical filter for high-speed transmission and optical module Download PDFInfo
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- CN212515112U CN212515112U CN202021481239.2U CN202021481239U CN212515112U CN 212515112 U CN212515112 U CN 212515112U CN 202021481239 U CN202021481239 U CN 202021481239U CN 212515112 U CN212515112 U CN 212515112U
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Abstract
The utility model provides an optical filter for high-speed transmission, which comprises a glass substrate, wherein one side surface of the glass substrate is plated with an anti-reflection film, and the other side surface of the glass substrate is plated with a high-reflection film; the antireflection film and the high-reflection film are made of the same material, and the film layers are arranged in the same structure. The utility model discloses a light filter size is less, can improve single-furnace output rate, reduces the cost, improves rete compactness, and each item parameter stability such as its band-pass is greater than the practical application index, effectively improves light signal's transmission rate. The utility model also provides an optical module for high-speed transmission, this optical module carries on above-mentioned an optical filter for high-speed transmission.
Description
Technical Field
The utility model relates to an optical device field, more specifically relates to an optical filter and optical module for high-speed transmission.
Background
The optical filter is an optical device for selecting a required radiation waveband, and with the development of communication technology and the arrival of the 5G era, the performance requirement of the optical filter is higher and higher.
The currently used optical filter mainly uses ion-assisted coating (Lixiaping, research on design and manufacture of WDM thin film optical filter and beam splitter [ D ]. university of science and technology in China, 2005 ]), and generally has the problems of thick film layer, poor compactness of film layer, and poor stability of various parameters such as Pass Band, Reflection Band, Center Wave length distance, Ripple with Pass Band, Reflection Isolation with Pass Band, etc., as shown in the following table.
SUMMERY OF THE UTILITY MODEL
The utility model discloses an overcome above-mentioned prior art the defect that the light filter rete is thick, rete compactness is poor provides a light filter for high-speed transmission to and an optical module for high-speed transmission.
In order to solve the technical problem, the technical scheme of the utility model as follows:
the optical filter for high-speed transmission comprises a glass substrate, wherein one side surface of the glass substrate is plated with an antireflection film, and the other side surface of the glass substrate is plated with a high-reflection film; the antireflection film and the high-reflection film are made of the same material, and the film layers are arranged in the same structure.
Preferably, the high-reflection film is formed by alternately stacking high-refractive-index dielectric layers and low-refractive-index material dielectric layers; the number of layers of the high-reflection film is greater than or equal to 349, wherein the high-refractive-index dielectric layer serves as the 1 st film layer of the high-reflection film.
Preferably, the high refractive index medium layer is composed of Ta2O5The material is prepared.
Preferably, the low-refractive-index dielectric layer is made of SiO2The material is prepared.
Preferably, the number of the high-reflection film layers is 349, and the thickness of each film layer in the high-reflection film is as follows:
layer 24 SiO2The thickness of the low-refractive-index medium layer is 90.11 nm;
34 th layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
43 th layer Ta2O5The thickness of the high-refractive-index medium layer is 54.06 nm;
44 th SiO layer2The thickness of the low-refractive-index medium layer is 107.8 nm;
45 th layer Ta2O5The thickness of the high-refractive-index medium layer is 54.06 nm;
60 th layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
96 th SiO layer2The thickness of the low-refractive-index medium layer is 20.02 nm;
97 th layer Ta2O5The thickness of the high-refractive-index dielectric layer is 86.15 nm;
188 th layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
240 st layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
342 st SiO layer2The thickness of the low-refractive-index medium layer is 534.46 nm;
the rest of Ta2O5The thickness of the high refractive index medium layer is 187.2nm, SiO2The thickness of the low refractive index medium layer was 267.23 nm.
Preferably, the number of antireflection films is 4.
Preferably, the thicknesses of the film layers of the antireflection film from top to bottom are as follows: ta2O5The high-refractive-index dielectric layer is 36.6 nm; SiO 22The low-refractive-index dielectric layer is 185.5 nm; ta2O5The high-refractive-index dielectric layer is 165 nm; SiO 22The low-refractive-index medium layer is 187 nm.
Preferably, the other side surface of the antireflection film is plated with an energy enhancement film.
Preferably, the size of the filter is 1.9mm × 1.9 mm.
The utility model also provides an optical module for high-speed transmission, this optical module carries the optical filter that above-mentioned arbitrary one or more preferred technical scheme combination obtained.
Compared with the prior art, the utility model discloses technical scheme's beneficial effect is: the utility model discloses a light filter size is less, can improve single-furnace output rate, reduces the cost, improves rete compactness, and each item parameter stability such as its band-pass is greater than the practical application index, effectively improves light signal's transmission rate.
Drawings
Fig. 1 is a schematic structural diagram of an optical filter for high-speed transmission according to an embodiment.
Fig. 2 is a graph of the measured transmission spectrum of the optical filter for high-speed transmission of the example.
Fig. 3 is a measured reflectance spectrum of the filter for high-speed transmission of the example.
Fig. 4 is a diagram of spectral analysis of the optical filter for high-speed transmission of the embodiment.
Detailed Description
The drawings are for illustrative purposes only and are not to be construed as limiting the patent;
for the purpose of better illustrating the embodiments, certain features of the drawings may be omitted, enlarged or reduced, and do not represent the size of an actual product;
it will be understood by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted.
The technical solution of the present invention will be further explained with reference to the accompanying drawings and examples.
The present embodiment provides a filter for high speed transmission, which is a schematic structural diagram of the filter for high speed transmission of the present embodiment, as shown in fig. 1.
The optical filter for high-speed transmission provided by the embodiment comprises a glass substrate 1, wherein one side surface of the glass substrate 1 is plated with an antireflection film 2, and the other side surface of the glass substrate 1 is plated with a high-reflection film 3.
In this embodiment, the high reflective film 3 is formed by alternately stacking high refractive index dielectric layers and low refractive index dielectric layers, wherein the high refractive index dielectric layers are formed by Ta2O5The low refractive index medium layer is made of SiO2The number of layers of the material of the high-reflection film 3 is 349. Specifically, in the highly reflective film 3, Ta2O5The high-refractive-index dielectric layer is used as a 1 st film layer, and the thickness of each film layer is as follows:
layer 24 SiO2The thickness of the low-refractive-index medium layer is 90.11 nm;
34 th layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
43 th layer Ta2O5The thickness of the high-refractive-index medium layer is 54.06 nm;
44 th SiO layer2The thickness of the low-refractive-index medium layer is 107.8 nm;
45 th layer Ta2O5The thickness of the high-refractive-index medium layer is 54.06 nm;
60 th layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
96 th SiO layer2The thickness of the low-refractive-index medium layer is 20.02 nm;
97 th layer Ta2O5The thickness of the high-refractive-index dielectric layer is 86.15 nm;
188 th layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
240 st layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
342 st SiO layer2The thickness of the low-refractive-index medium layer is 534.46 nm;
the rest of Ta2O5The thickness of the high refractive index medium layer is 187.2nm, SiO2The thickness of the low refractive index medium layer was 267.23 nm.
Specifically, the structure of the film layer in the high-reflection film is shown in the following table 1:
TABLE 1 high-reflection film materials and thicknesses
In this embodiment, the antireflection film 2 and the high-reflection film 3 are made of the same material, and Ta is also used2O5High refractive index dielectric layer and SiO2The low refractive index dielectric layers are stacked alternately, and specifically, the thicknesses of the film layers of the antireflection film 2 from top to bottom are as follows: ta2O5The high-refractive-index dielectric layer is 36.6 nm; SiO 22The low-refractive-index dielectric layer is 185.5 nm; ta2O5The high-refractive-index dielectric layer is 165 nm; SiO 22The low-refractive-index medium layer is 187 nm.
In addition, in this embodiment, the energy enhancement film 4 is provided on the other side surface of the antireflection film 2.
In the specific implementation process, a high-precision sputtering coating machine is adopted on the glass substrate 1 to improve the film adhesion and make the film compact. The optical filter is cut into the size of 1.9mm multiplied by 1.9mm, the output rate of a single furnace is improved, and the cost is reduced. In practical application, the parameters of the optical filter are stably larger than the practical application indexes, specifically, as shown in fig. 2 to 4, the parameters are actually measured transmission and reflection spectrograms of the optical filter of the embodiment and energy spectrum analysis charts of the optical filter of the embodiment.
Further, the optical filter of the present embodiment is mounted on an optical module device, and an optical module for high-speed transmission can be formed.
The same or similar reference numerals correspond to the same or similar parts;
the terms describing positional relationships in the drawings are for illustrative purposes only and are not to be construed as limiting the patent;
it is obvious that the above embodiments of the present invention are only examples for clearly illustrating the present invention, and are not limitations to the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. The optical filter for high-speed transmission is characterized by comprising a glass substrate, wherein one side surface of the glass substrate is plated with an antireflection film, and the other side surface of the glass substrate is plated with a high-reflection film; the antireflection film and the high-reflection film are made of the same materials, and the film layers are arranged in the same structure.
2. A filter according to claim 1, wherein: the high-reflection film is formed by alternately stacking high-refractive-index dielectric layers and low-refractive-index dielectric layers in sequence; the number of layers of the high-reflection film is greater than or equal to 349, wherein the high-refractive-index dielectric layer serves as the 1 st film layer of the high-reflection film.
3. A filter according to claim 2, wherein: the high refractive index medium layer is composed of Ta2O5The material is prepared.
4. A filter according to claim 3, wherein: the low-refractive-index dielectric layer is made of SiO2The material is prepared.
5. The filter according to claim 4, wherein: the number of layers of the high-reflection film is 349, wherein the thickness of each film layer is as follows:
layer 10 SiO2The thickness of the low-refractive-index medium layer is 534.46 nm;
layer 23 Ta2O5The thickness of the high-refractive-index medium layer is 60.41 nm;
layer 24 SiO2The thickness of the low-refractive-index medium layer is 90.11 nm;
layer 25 Ta2O5The thickness of the high-refractive-index medium layer is 60.41 nm;
34 th layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
43 th layer Ta2O5The thickness of the high-refractive-index medium layer is 54.06 nm;
44 th SiO layer2The thickness of the low-refractive-index medium layer is 107.8 nm;
45 th layer Ta2O5The thickness of the high-refractive-index medium layer is 54.06 nm;
60 th layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
96 th SiO layer2The thickness of the low-refractive-index medium layer is 20.02 nm;
97 th layer Ta2O5The thickness of the high-refractive-index dielectric layer is 86.15 nm;
188 th layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
240 st layer of SiO2The thickness of the low-refractive-index medium layer is 1068.93 nm;
342 st SiO layer2The thickness of the low-refractive-index medium layer is 534.46 nm;
the rest of Ta2O5The thickness of the high refractive index medium layer is 187.2nm, SiO2The thickness of the low refractive index medium layer was 267.23 nm.
6. A filter according to claim 5, wherein: the number of layers of the antireflection film is 4.
7. The filter according to claim 6, wherein: the thickness of each rete that antireflection coating from top to bottom set up is: ta2O5The high-refractive-index dielectric layer is 36.6 nm; SiO 22The low-refractive-index dielectric layer is 185.5 nm; ta2O5The high-refractive-index dielectric layer is 165 nm; SiO 22The low-refractive-index medium layer is 187 nm.
8. The filter according to claim 6, wherein: and an energy enhancement film is plated on the other side surface of the anti-reflection film.
9. The optical filter according to any one of claims 1 to 8, wherein: the size of the filter is 1.9mm x 1.9 mm.
10. An optical module for high-speed transmission, comprising the optical filter for high-speed transmission according to any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202021481239.2U CN212515112U (en) | 2020-07-24 | 2020-07-24 | Optical filter for high-speed transmission and optical module |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021481239.2U CN212515112U (en) | 2020-07-24 | 2020-07-24 | Optical filter for high-speed transmission and optical module |
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| CN212515112U true CN212515112U (en) | 2021-02-09 |
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