CN212397465U - Cleaning system - Google Patents

Abstract

The utility model discloses a cleaning system relates to and shows technical field, including the carrier that is used for shifting the mask slice, be used for shifting the year device that moves of carrier, be used for wasing the belt cleaning device and the controlling means of mask slice, controlling means is including the detector that is used for detecting washing liquid information, time controller and the driver that is used for taking notes mask slice scavenging time, and the detector sets up on belt cleaning device, and the driver is used for moving the device and shifts the carrier according to the mask slice scavenging time information of the washing liquid information of detector feedback and time controller feedback, control. The utility model discloses the driver is according to the information of the washing liquid of the mask plate cleaning time information of time controller feedback and detector feedback, and control is moved and is carried the device and shift the carrier according to the process, promotes the cleaning efficiency of mask plate, has improved the cleaning performance.

Description

Cleaning system

Technical Field

The utility model relates to a show technical field, more specifically relates to a cleaning system.

Background

With the development of display technology, Organic Light Emitting Diode (OLED) display devices are widely used. The OLED has self-luminous property, does not need a backlight source of lcd (liquid Crystal display), and thus has high visibility and brightness, and has the characteristics of low power consumption, light weight, thin thickness, low cost, and the like, and is considered as one of the most promising products in the 21 st century.

When an OLED display device is manufactured, a Mask (Mask) is required to form a light emitting structure. The mask is an important evaporation tool and needs to be reused. After the mask is used for a period of time, evaporation materials, such as cathode metal materials, remain on the surface of the mask, and the evaporation materials affect the precision or normal use of the mask, so the mask needs to be cleaned before being used again. Most of the existing mask plate cleaning systems are manually operated or intervened more, and have the problems of poor cleaning effect, low efficiency, high maintenance cost and the like.

SUMMERY OF THE UTILITY MODEL

The utility model provides a cleaning system for solve the current low and not good problem of cleaning performance of mask plate cleaning system cleaning efficiency.

In order to solve the problem, the utility model provides a cleaning system, including the carrier that is used for shifting the mask slice, be used for shifting the year device that moves of carrier, a belt cleaning device and a controlling means for wasing the mask slice, controlling means is including the detector that is used for detecting washing liquid information, a time controller and a driver that are used for recording mask slice scavenging time, the detector sets up on belt cleaning device, the driver is used for the mask slice scavenging time information according to the washing liquid information of detector feedback and time controller feedback, control moves and moves the device and shift the carrier.

Optionally, the detector comprises a conductivity detector, and the cleaning liquid information is conductivity information of the cleaning liquid.

Optionally, the cleaning device comprises a plurality of cleaning tanks and a circulating filter mechanism communicated with the cleaning tanks through pipelines, and the plurality of cleaning tanks comprise a first cleaning tank for containing weak acid cleaning liquid, a second cleaning tank and a third cleaning tank for containing strong acid cleaning liquid, and a fourth cleaning tank for containing neutral cleaning liquid.

Optionally, the circulating and filtering mechanism comprises a circulating pump and a filter, an inlet of the circulating pump is communicated with the tank bottom of the cleaning tank through a first pipeline, an outlet of the circulating pump is communicated with the side wall of the cleaning tank through a second pipeline, and the filter is arranged on the second pipeline.

Optionally, the cleaning device further includes a first fluid infusion pipeline having one end communicated with the first pipeline, a first valve is disposed between a communication position of the first fluid infusion pipeline on the first pipeline and the cleaning tank, a second valve is disposed on the first fluid infusion pipeline, and the driver is connected with the first valve and the second valve and controls opening and closing of the first valve and the second valve.

Optionally, the cleaning device further comprises a liquid discharge pipeline, one end of the liquid discharge pipeline is communicated with the second pipeline, a third valve is arranged between the position, communicated with the liquid discharge pipeline, on the second pipeline and the cleaning tank, a fourth valve is arranged on the liquid discharge pipeline, and the driver is connected with the third valve and the fourth valve and controls the third valve and the fourth valve to be opened and closed.

Optionally, the liquid discharge pipelines of the first cleaning tank and the fourth cleaning tank are communicated with a first common liquid discharge pipeline, and the liquid discharge pipelines of the second cleaning tank and the third cleaning tank are communicated with each other through a second common liquid discharge pipeline.

Optionally, the cleaning device further comprises an overflow pipeline and an overflow connecting pipeline, the plurality of cleaning tanks are communicated with the overflow pipeline through the overflow connecting pipeline, the cleaning tanks are communicated with the overflow connecting pipeline at positions which are located on the side walls of the cleaning tanks and close to the notches of the cleaning tanks, the overflow connecting pipeline is provided with a fifth valve, and the driver is connected with the fifth valve and controls the opening and closing of the fifth valve.

Optionally, the cleaning device further includes a second fluid infusion pipeline, the second fluid infusion pipeline is communicated with the overflow connection pipeline, a communication position of the overflow connection pipeline and the second fluid infusion pipeline is located on one side, close to the cleaning tank, of the fifth valve, and the second fluid infusion pipeline is provided with a sixth valve.

Optionally, the cleaning device further includes an ultrasonic mechanism and/or a polishing mechanism, the ultrasonic mechanism is disposed on at least one of the plurality of cleaning tanks, and the polishing mechanism is disposed on at least one of the plurality of cleaning tanks and is configured to drive the carrier to move up and down in the cleaning tank.

The utility model provides a cleaning system passes through the washing liquid information that the driver was according to the mask plate cleaning time information of time controller feedback and detector feedback, and control is moved and is carried the device and shift the carrier according to the process, promotes the cleaning efficiency of mask plate, has improved the cleaning performance.

Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by the practice of the invention. The objectives and other advantages of the invention may be realized and attained by the structure particularly pointed out in the written description and drawings.

Drawings

The accompanying drawings are included to provide a further understanding of the embodiments of the present invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the embodiments of the invention and not to limit the embodiments of the invention.

FIG. 1 is a front view of a cleaning system according to an embodiment of the present invention;

FIG. 2 is a perspective view of a cleaning system according to an embodiment of the present invention;

fig. 3 is a structural diagram of a carrier of a cleaning system according to an embodiment of the present invention;

fig. 4 is a structural diagram of a transfer device of a cleaning system according to an embodiment of the present invention;

FIG. 5 is a schematic diagram of a cleaning apparatus according to an embodiment of the present invention;

FIG. 6 is a flow chart illustrating the operation of a cleaning system according to an embodiment of the present invention;

FIG. 7 is a block diagram of another cleaning apparatus according to an embodiment of the present invention;

FIG. 8 is a structural diagram of a throwing mechanism of a cleaning device according to an embodiment of the present invention;

fig. 9 is a block diagram of an exemplary cleaning device of a cleaning system according to an embodiment of the present invention.

Description of the figures

10-a cleaning system; 100-a carrier; 110-a base; 120-a carrier; 120 a-a first carrier; 120 b-a second carrier; 121 a-first beam; 121 b-a second beam; 121 c-a third beam; 122 a-a first upright; 122 b-a second upright; 122 c-a third column; 122 d-fourth column; 130-a containing space; 140-a boot block; 150 cushion blocks; 200-a transfer device; 210-a pedestal; 220-a transplanting mechanism; 230-a translation mechanism; 231-a mobile frame; 232-a first guide rail; 233-a first drive structure; 240-a lifting mechanism; 241-a lifting frame; 242 — a second guide rail; 243-a second drive configuration; 250-a clamping mechanism; 250 a-a first clamping mechanism; 250 b-a second clamping mechanism; 251-a first jaw; 252-a second jaw; 253-a third drive configuration; 300-a cleaning device; 310-a cleaning tank; 310 a-a first cleaning tank; 310 b-a second wash tank; 310 c-a third wash tank; 310 d-a fourth wash tank; 321-a circulating pump; 322-a filter; 323-a first conduit; 324-a second conduit; 325-a first fluid infusion pipeline; 326-drain lines; 326 a-first drain conduit; 326 b-a second drain conduit; 326 c-a third drain conduit; 326 d-fourth drain conduit; 326e — first common drain line; 326e 1-drain; 326f — a second common drain conduit; 327-an overflow conduit; 327 a-overflow; 328-overflow connecting pipe; 329-a second fluid infusion line; 330-a first valve; 331-a second valve; 332-a third valve; 333-a fourth valve; 334-a fifth valve; 335-a sixth valve; 340-an ultrasonic mechanism; 350-a throwing mechanism; 350 a-a throwing part; 350 b-a carrier; 351-motor; 352-eccentric wheel; 353-a support bar; 354-a chassis; 355-a stand; 356-a guide block; 357-guide post; 400-a control device; 410-an alarm; 420-human-machine exchange interface; 500-transfer box; 600-pure water device.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be noted that the embodiments and features of the embodiments in the present application may be arbitrarily combined with each other without conflict.

In the related art, each cleaning process of the mask plate needs one cleaning device, manual operation is needed for transferring the mask plate among a plurality of cleaning devices, the cleaning efficiency of the mask plate is very low, no related detection exists in cleaning, and the cleaning effect is poor. And each cleaning device adopts an independent control system, so that the equipment maintenance is difficult.

In order to solve the problem that mask plate cleaning system cleaning efficiency is low and the cleaning performance is not good, the utility model provides a cleaning system, including the carrier that is used for shifting the mask slice, a move the device that carries for shifting the carrier, a belt cleaning device and a controlling means for wasing the mask slice, controlling means is including the detector that is used for detecting washing liquid information, a time controller and a driver for writing down mask plate cleaning time, the detector sets up on belt cleaning device, the driver is used for moving the mask plate cleaning time information of washing liquid information and time controller feedback according to the detector feedback, the control moves the device and shifts the carrier.

The utility model provides a cleaning system, the driver is according to the washing liquid information of the mask plate cleaning time information of time controller feedback and detector feedback, and control is moved and is carried the device and shift the carrier according to the process, promotes the cleaning efficiency of mask plate, has improved the cleaning performance.

The technical scheme of the cleaning system of the embodiment of the invention is specifically described below with reference to the accompanying drawings.

Fig. 1 is a front view of a cleaning system according to an embodiment of the present invention, and fig. 2 is a perspective view of the cleaning system according to the embodiment of the present invention, as shown in fig. 1 and fig. 2, the cleaning system 10 includes a carrier 100, a transfer device 200, a cleaning device 300, and a control device 400. The carrier 100 is used for loading a mask plate to be cleaned, and the control device 400 controls the transfer device 200 to transfer the carrier 100 to the cleaning tank 310 corresponding to the cleaning device 300 according to the cleaning process.

Fig. 3 is a structural diagram of a carrier of a cleaning system according to an embodiment of the present invention.

As shown in fig. 3, a carrier 100 is used for transferring a mask. The carrier 100 includes a base 110 and a carrier 120 disposed on the base 110, and the carrier 120 includes a receiving space 130 for receiving a mask plate and a clamping portion for clamping by a transfer device. The carrier can be a hoisting tooling basket. In one example, the carrier 120 may include a first carrier 120a and a second carrier 120b, the first carrier 120a and the second carrier 120b are disposed on the base 110 at intervals, the first carrier 120a and the second carrier 120b are frame structures, an accommodating space 130 is formed between the first carrier 120a and the second carrier 120b, each of the first carrier 120a and the second carrier 120b includes three beams and four columns, the three beams are a first beam 121a, a second beam 121b and a third beam 121c, the four columns include a first column 122a, a second column 122b, a third column 122c and a fourth column 122d which are sequentially disposed on the base 110 and have equal length, the first beam 121a is fixed to an end of the first column 122a and the second column 122b which are far away from the base 110, the second beam 121b is fixed to an end of the third column 122c and the fourth column 122d which are far away from the base 110, the first beam 121a and the second beam 121b are disposed as clamping portions, third beam 121c is disposed at an intermediate position between first column 122a, second column 122b, third column 122c, and fourth column 122 d. In this embodiment, the first upright column 122a and the fourth upright column 122d of the first carrier 120a and the second carrier 120b are provided with the guide block 140, the guide block 140 is provided with a guide groove, a notch of the guide groove faces the accommodating space 130, the guide block 140 not only can guide the loading of the mask plate, but also can prevent the mask plate from shaking in the accommodating space 130, optionally, after the mask plate is loaded on the carrier, a gap between an edge of the mask plate and a bottom of the guide groove corresponding to the edge is less than 3mm, for example, 1 mm. Further, a cushion block 150 can be further arranged on the base 110, and a clamping groove for accommodating a mask plate is arranged on the cushion block 150. The carrier may simultaneously load a plurality of masks, which is not limited herein. In order to prevent the carrier from being corroded by the cleaning liquid, the carrier and the base can be made of titanium alloy materials, and the guide block and the cushion block are made of polytetrafluoroethylene materials.

Fig. 4 is a structural view of a transfer device of a cleaning system according to an embodiment of the present invention.

As shown in fig. 1 and 4, the transfer device 200 is used to transfer carriers between a plurality of cleaning tanks. The transfer device 200 includes a base frame 210 and a transfer mechanism 220 provided on the base frame 210, and the transfer mechanism 220 is erected above the cleaning device 300 via the base frame 210. The transplanting mechanism 220 includes a translation mechanism 230, a lifting mechanism 240, and a gripping mechanism 250. The clamping mechanism 250 is used for clamping a clamping part of the carrier, the lifting mechanism 240 is used for driving the clamping mechanism 250 to lift so as to place the carrier in the cleaning tank or take the carrier out of the cleaning tank, and the translation mechanism 230 is used for driving the lifting mechanism 240 to translate so as to enable the carrier to be transferred among a plurality of cleaning tanks according to a cleaning process. The transfer device 200 may employ a truss robot. The transfer device 200 may be provided with a mechanical locking device at the movement limit position to prevent collision.

In one example, as shown in fig. 4, the translation mechanism 230 includes a moving frame 231 and a first rail 232 fixed to the base frame, and a first driving structure 233 driving the moving frame 231 to move along the first rail 232. The number of the first guide rails 232 may be two, one end of the moving frame 231 is slidably connected to one of the two first guide rails 232, and the other end of the moving frame 231 is slidably connected to the other of the two first guide rails 231. The first driving structure 233 may be a screw motor, a ball matched with the screw motor is disposed on the moving frame 231, and a screw of the screw motor drives the moving frame 231 to move back and forth in a translational manner by rotation. The movable frame 231 may be made of a stainless steel profile and may be treated to prevent dust.

In one example, as shown in fig. 4, the lifting mechanism 240 is disposed on the moving frame 231, and the lifting mechanism 240 includes a lifting frame 241, a second guide rail 242 slidably connected to the lifting frame 241, and a second driving structure 243 for driving the lifting frame 241 to lift along the second guide rail 242. The second guide rails 242 are two and are vertically fixed to the moving frame 231. The second driving structure 243 is fixed on the movable frame 231, and the output end of the second driving structure 243 is connected with the lifting frame 241. Wherein, the second driving structure 243 can be a screw motor, the lifting frame 241 is provided with a ball matched with the screw motor, a screw of the screw motor penetrates through the ball, and the lifting frame 241 is driven to lift when the screw motor rotates. The crane 241 can be made of stainless steel by welding, and stainless steel is laid for dust prevention.

In one example, as shown in fig. 4, the clamping mechanism 250 includes a first clamping mechanism 250a and a second clamping mechanism 250b, and the first clamping mechanism 250a and the second clamping mechanism 250b are both fixed to the crane 241. The first and second clamping mechanisms 250a and 250b each include first and second clamping jaws 251 and 252 and a third drive arrangement 253 that drives the second clamping jaw 252 toward or away from the first clamping jaw 251. The first clamping jaw 251 and the third driving structure 253 are fixed on the lifting frame 241, and the second clamping jaw 252 is fixed at the output end of the third driving structure 253. The third driving structure 253 may be a cylinder, and a piston rod of the cylinder is fixedly connected to the second clamping jaw. The first clamping jaw and the second clamping jaw can be L-shaped, and a linear cutting process is adopted.

Fig. 5 is a structural diagram of a cleaning device according to an embodiment of the present invention. As shown in fig. 1, 2 and 5, the cleaning apparatus 300 is used for cleaning a mask, and includes a plurality of cleaning tanks 310 for cleaning the mask and a circulation filtering mechanism communicated with the cleaning tanks through pipes. The cleaning device 300 may be fixed to the base frame 210. The number of the cleaning tanks 310 is set according to the cleaning process, and may be 3, 4 or 5, which is not limited herein. In one example, the washing device 300 includes four washing tanks 310 and is arranged along the guide direction of the first guide rail 232. The four washing tanks 310 may be a first washing tank 310a, a second washing tank 310b, a third washing tank 310c, and a fourth washing tank 310 d. Weak acid cleaning solution, such as oxalic acid solution, can be contained in the first cleaning tank 310a to complete the preliminary cleaning of the mask, strong acid cleaning solution, such as sulfuric acid solution, can be contained in the second cleaning tank 310b and the third cleaning tank 310c, the second cleaning tank 310b is used for removing evaporation material on the surface of the mask, the third cleaning tank 310c is used for performing surface treatment on the mask, and the fourth cleaning tank 310d is used for containing neutral cleaning solution, such as clear water, for removing redundant impurities and rinsing the mask.

As shown in fig. 5, the circulation filtering mechanism includes a circulation pump 321 and a filter 322, an inlet of the circulation pump 321 is communicated with the tank bottom of the washing tank 310 through a first pipe 323, an outlet of the circulation pump 321 is communicated with one end of the sidewall of the washing tank 310 near the notch through a second pipe 324, and the filter 322 is disposed on the second pipe 324. The cleaning solution circulates in the cleaning tank through the circulating system, so that the replacement of the cleaning solution on the surface of the mask plate can be accelerated, and the cleaning efficiency is improved. The cleaning liquid is filtered by the filter 322, so that some impurities which are difficult to be dissolved can be filtered, and the stability of the conductivity of the cleaning liquid is ensured. The inlet of the circulation pump 321 is provided with a coarse filter to prevent large particles in the liquid from damaging the circulation pump; the filter 322 is made of stainless steel, and the filtering form is column type filtering; the filter is provided with an electronic pressure gauge which is electrically connected with the control device and can remind whether to replace the filter element according to the pressure value, and the filtering precision is 20 mu m.

As shown in fig. 1 and 2, the control device 400 is electrically connected to the transfer device 200 and the cleaning device 300. The control device 400 includes a detector (not shown in the drawings) for detecting the cleaning liquid information, a time controller (not shown in the drawings) for recording the cleaning time of the mask plate, and a driver (not shown in the drawings), wherein the detector is arranged in the plurality of cleaning tanks, and the driver is used for controlling the transfer device to transfer the carrier according to the cleaning liquid information fed back by the detector and the mask plate cleaning time information fed back by the time controller. Wherein time controller and driver can be integrated on the same controller, and the controller can be the PLC controller, and the PLC controller is according to the result information of time controller and detector feedback, and according to the first drive structure of washing process control, second drive structure and third drive structure execution correlation action. The detector may be a conductivity detector or a resistivity detector. In this embodiment, the detector is a conductivity detector, and the cleaning liquid information is conductivity information of the cleaning liquid.

The embodiment of the utility model provides an in, every washing process of mask plate all detects the conductivity of washing liquid through the detector, the conductivity of washing liquid body is handled through the filter and is guaranteed at a definite value C, after treating abluent mask plate and submerging the washing liquid, evaporation material on mask plate body and the mask plate, especially when evaporation material is the metal, the conductivity of washing liquid can change, along with abluent going on, evaporation material constantly is consumed, by the sanitization when the mask plate, the conductivity of washing liquid tends to a definite value A, regard as the standard value with this definite value A in this embodiment, judge whether the mask plate is by the sanitization. The time controller records the cleaning time of the mask plate, the detector detects the conductivity of the cleaning liquid, and the driver controls the actual cleaning time of the mask plate in the corresponding cleaning process according to the information fed back by the time controller and the detector. And when the cleaning time of the mask plate reaches the preset time length T and the conductivity of the cleaning liquid reaches the standard value A, the mask plate is cleaned, and the driver controls the transfer device to take out the carrier. When the cleaning time of the mask plate reaches the preset duration T and the conductivity does not reach the standard value A, the mask plate is continuously cleaned until the conductivity reaches the standard value A, and the driver controls the transfer device to take out the carrier, so that the cleaning effect is guaranteed. It should be noted that the fixed value C and the standard value a may be a range of values.

The embodiment of the utility model provides a cleaning system, whether the cleaning process is accomplished is judged according to the washing time information of the mask plate of time controller feedback in the washing tank and the washing liquid information of detector feedback to the driver, washs and accomplishes back driver control and move and carry the device and shift the carrier to next cleaning process, has so not only realized online automatic cleaning process in succession, promotes the cleaning efficiency of mask plate, has improved the cleaning performance moreover. In addition, the waste mask plate which is not used any more can be cleaned and reduced through the cleaning system of the embodiment, a new blank mask plate is produced, and the recycling of the mask plate is completed.

The technical solution of the embodiment of the present invention is further explained by the working principle of the cleaning system.

Fig. 6 is a flow chart illustrating the operation principle of the cleaning system according to the embodiment of the present invention. As shown in fig. 1 and 6, a mask to be cleaned is loaded in a carrier 100 and placed in a transfer box 500 of an initial station, a transfer device 200 holds the carrier 100 and places the carrier 100 in a first cleaning tank 310a, a weak acid solution is in the first cleaning tank 310a, a time controller starts cleaning timing, a first detector in the first cleaning tank 310a detects conductivity of a cleaning solution, the cleaning time reaches a first set time period T1 of the first cleaning tank 310a, and a conductivity standard value reaches a set first a1, a driver controls the transfer device 200 to grasp the carrier 100, the carrier 100 is transferred to a second cleaning tank 310b, a strong acid solution is in the second cleaning tank 310b, the time controller starts cleaning timing, a second detector in the second cleaning tank 310b detects conductivity of the cleaning solution, the cleaning time reaches a second set time period T2 of the second cleaning tank 310b, and when the conductivity reaches a set second standard value a2, the driver controls the transferring device 200 to grab the carrier 100, and sequentially transfers the carrier 100 to the third cleaning tank 310c and the fourth cleaning tank 310d, according to the cleaning process of the first cleaning tank 310a and the second cleaning tank 310b, the cleaning of the mask plate in the third cleaning tank 310c and the fourth cleaning tank 310d is completed, the third set time length in the third cleaning tank 310c is T3, the third standard value of the conductivity of the cleaning solution is A3, the fourth set time length in the fourth cleaning tank 310d is T4, and the fourth standard value of the conductivity of the cleaning solution is a4, and finally the transferring device 200 transfers the carrier 100 back to the transfer box 500, and performs the processes of manual blanking, drying and the like. When the conductivity in the cleaning tank does not reach the corresponding standard value, the cleaning solution is completely reacted, and the cleaning solution needs to be replaced.

Through the utility model discloses the theory of operation can be seen out, and cleaning system accomplishes a washing process after, driver control moves and carries the device and shift the carrier, directly carries out next washing process, need not artifically shift the carrier between a plurality of washing tanks, has promoted the cleaning efficiency of mask plate. The driver judges whether the mask plate is cleaned or not according to whether the conductivity of the cleaning liquid reaches a standard value or not and whether the cleaning time reaches preset duration or not, and the cleaning effect of the mask plate is improved.

In an exemplary embodiment, as shown in fig. 6, the cleaning apparatus further includes a first fluid replacement pipe 325 having one end communicating with the first pipe 323, and the other end of the first fluid replacement pipe 325 may communicate with a cleaning solution stock solution supply mechanism (not shown in the drawings). A first valve 330 is arranged between the position of the first pipeline 323 communicated with the first liquid supplementing pipeline 325 and the cleaning tank 310, when liquid supplementing is carried out, the first valve 330 can be closed, and the cleaning liquid stock solution is pumped into the cleaning tank 310 through the first liquid supplementing pipeline 325, the first pipeline 323 and the second pipeline 324 by the circulating pump 321. The second valve 331 is provided in the first fluid replacement pipe 325, and is closed when fluid is not replaced. The first valve 330 and the second valve 331 may be solenoid valves, and the first valve 330 and the second valve 331 are connected to a driver, and the driver may control opening and closing of the first valve and the second valve.

In an exemplary embodiment, as shown in fig. 6, the cleaning apparatus further includes a drain 326 having one end communicating with the second pipe 324, and the other end of the drain 326 may communicate with the waste liquid recovery vessel or may be directly discharged into the drainage system, depending on the kind of the cleaning liquid, for example, the strong acid solution needs to be discharged into a specific recovery vessel, and the water and the weak acid solution may be directly discharged into the drainage system. A third valve 332 is arranged between the position of the second pipeline 324 communicated with the liquid discharge pipeline 326 and the cleaning tank 310, a fourth valve 333 is arranged on the liquid discharge pipeline 326, when the waste liquid needs to be discharged, the third valve 332 is closed, the fourth valve 333 is opened, and the waste liquid is discharged through the liquid discharge pipeline 326 by a circulating pump 321. The third valve and the fourth valve can be electromagnetic valves, the third valve and the fourth valve are both connected with a driver, and the driver can control the opening and closing of the third valve and the fourth valve.

In an exemplary embodiment, as shown in fig. 6, the cleaning apparatus further includes an overflow pipe 327 for overflowing the excessive cleaning solution in the cleaning tank 310 into a cleaning tank or a sub-tank with similar properties of the cleaning solution. The cleaning tank is communicated with the overflow pipeline 327 through an overflow connecting pipeline 328, a fifth valve 334 is arranged on the overflow connecting pipeline 328, the communication position of the cleaning tank 310 and the overflow connecting pipeline 328 is positioned on the side wall of the cleaning tank 310 and close to the notch of the cleaning tank, and the specific position is set according to the actual situation. The fifth valve may be a solenoid valve, and the fifth valve is connected to a driver, and the driver may control opening and closing of the fifth valve.

In an exemplary embodiment, as shown in fig. 6, the cleaning apparatus further includes a second fluid supplement pipe 329, the second fluid supplement pipe 329 is communicated with the overflow connection pipe 328, a communication position of the overflow connection pipe 328 with the second fluid supplement pipe 329 is located between the fifth valve 334 and the cleaning tank 310, the second fluid supplement pipe 329 is provided with a sixth valve 335, and the second fluid supplement pipe 329 can be used for manually supplementing the cleaning fluid.

In an exemplary embodiment, as shown in fig. 6, the cleaning apparatus further comprises an ultrasonic mechanism 340 disposed on the cleaning tank 310. The ultrasonic mechanism 340 may be a drop-in vibration plate, the vibration plate is disposed on the side wall of the cleaning tank 310, and an ultrasonic vibrator is disposed on the vibration plate. In this embodiment, the ultrasonic oscillator can be 90, and power is 50W/only, and ultrasonic mechanism adopts the scanning circuit of IGBT control mode, can select suitable ultrasonic power according to mask plate quantity, the dirty degree of mask plate to have the frequency sweep function, especially when to intractable extremely strong filth on the work piece, the concentrated impetus characteristics of frequency sweep function can clear away intractable extremely strong filth. The control device can control the ultrasonic mechanism to start and stop and adjust the ultrasonic power.

Fig. 7 is a structural diagram of another cleaning device according to an embodiment of the present invention, and fig. 8 is a structural diagram of a throwing mechanism of a cleaning device according to an embodiment of the present invention.

In an exemplary embodiment, as shown in fig. 7 and 8, the cleaning apparatus may further include a throwing mechanism 350 for driving the carrier to ascend and descend in the cleaning tank 310, so as to improve the cleaning efficiency of the mask. The throwing mechanism 350 includes a throwing portion 350a and a carrying portion 350b, the carrying portion 350b is used for placing a carrier, and the throwing portion 350a is used for driving the carrying portion to move up and down. The throwing part 350a includes a motor 351 having a rotating shaft, an eccentric wheel 352 arranged on the rotating shaft, and a support rod 353 with one end rotatably connected with the eccentric wheel 352, the eccentric wheel 352 and the support rod 353 are arranged in the cleaning tank 310, the bearing part 350b includes a base frame 354 bearing a carrier and a stand 355 arranged on the base frame 354, a guide block 356 is arranged on one side of the stand 355 close to the motor 351, a guide column 357 arranged in the guide block 356 in a penetrating manner is arranged on the side wall of the cleaning tank 310, and the guide direction of the guide column is parallel to the lifting direction of the lifting frame. The other end of the support rod 353 is rotatably connected to the base frame 354, and when the rotating shaft of the motor 351 rotates, the base frame 354 moves up and down along the guiding direction of the guiding post 357. The control device can control the start and stop of the throwing mechanism and adjust the throwing frequency of the throwing mechanism.

In an exemplary embodiment, as shown in fig. 7, in order to reduce the evaporation of the cleaning solution and prevent the cleaning solution from contaminating the workshop after evaporation and the other cleaning solutions from being contaminated by the cleaning solution attached to the carrier during the carrier transfer process, the cleaning apparatus further includes a cover 361 for covering the notch of the cleaning tank 310 and an opening and closing mechanism for controlling the opening and closing of the cover 361. The opening and closing mechanism includes an opening and closing cover structure 362 for opening and closing the cover 361, and a pressing structure 363 for pressing the cover 361 against the washing tub 310 after closing the cover 361. The switch cover structure 362 may include a rodless cylinder, a piston of the rodless cylinder is connected with the cover plate 361 and is configured to drive the cover plate to move horizontally, the compressing structure 363 is a compressing driving part 363a and a pressing block 363b fixed to an output end of the compressing driving part, the compressing driving part 363a may be a compressing cylinder, and the compressing cylinder has a self-locking function. When the cover plate 361 needs to be opened, the pressing driving part 363a drives the pressing block 363b to move upwards, the cover plate 361 is loosened, the cover opening and closing structure 362 drives the cover plate 361 to move horizontally, and the cover plate 361 is opened. When the cover plate 361 needs to be closed, the cover opening and closing structure 362 drives the cover plate 361 to reset, and the pressing block 363b moves downwards under the driving of the pressing driving part 363a to press the cover plate 361. The control device can control the switch mechanism to open and close the cover plate.

In an exemplary embodiment, the cleaning apparatus further includes a temperature control mechanism for controlling a temperature of the cleaning liquid of the cleaning bath. The control device controls the temperature control mechanism to keep the cleaning liquid in the cleaning tank at the corresponding cleaning temperature.

It should be noted that, in the plurality of cleaning tanks of the cleaning apparatus, the ultrasonic mechanism, the throwing mechanism, the overflow pipe, the first fluid infusion pipe, the second fluid infusion pipe, the cover plate, the temperature control mechanism and other related mechanisms may be provided, or some of the cleaning tanks may be provided with the above mechanisms. One or more of the above mechanisms may also be provided on the cleaning tank. Those skilled in the art can selectively set the relevant mechanism on the cleaning tank according to actual requirements, and the embodiment of the present invention is not limited specifically.

The technical solution of the cleaning device according to the embodiment of the present invention is described in detail by an exemplary embodiment.

Fig. 9 is a block diagram of an exemplary cleaning device of a cleaning system according to an embodiment of the present invention. As shown in fig. 9, the cleaning apparatus 300 includes four cleaning tanks, i.e., a first cleaning tank 310a, a second cleaning tank 310b, a third cleaning tank 310c and a fourth cleaning tank 310d, wherein the first cleaning tank 310a is configured to hold a weak acid cleaning solution, e.g., an oxalic acid cleaning solution, the second cleaning tank 310b and the third cleaning tank 310c are configured to hold a strong acid cleaning solution, e.g., a sulfuric acid cleaning solution, and the fourth cleaning tank 310d is configured to hold a neutral cleaning solution, e.g., water. The first cleaning tank 310a, the second cleaning tank 310b, the third cleaning tank 310c and the fourth cleaning tank 310d are all provided with a circulating filter mechanism, an ultrasonic mechanism 340, a throwing mechanism and a liquid discharge pipeline. The liquid discharge pipeline of the first cleaning tank 310a is set as a first liquid discharge pipeline 326a, the liquid discharge pipeline of the second cleaning tank 310b is set as a second liquid discharge pipeline 326b, the liquid discharge pipeline of the third cleaning tank 310c is set as a third liquid discharge pipeline 326c, the liquid discharge pipeline of the fourth cleaning tank 310d is set as a fourth liquid discharge pipeline 326d, the first liquid discharge pipeline 326a and the fourth liquid discharge pipeline 326d are both communicated with a first common liquid discharge pipeline 326e, the waste liquid of the first cleaning tank 310a and the fourth cleaning tank 310d is discharged through the first common liquid discharge pipeline 326e, in order to achieve the simultaneous liquid discharge of the first cleaning tank 310a and the fourth cleaning tank 310d, the first common liquid discharge pipeline 326e may include two liquid discharge ports 326e1, the second liquid discharge pipeline 326b and the third liquid discharge pipeline 326c are communicated with a second common liquid discharge pipeline 326f, and the waste liquid waste of the second cleaning tank 310b and the third cleaning tank 310c is sequentially discharged into a specific container through the second common liquid discharge pipeline 326f, for recycling. The second cleaning tank 310b, the third cleaning tank 310c and the fourth cleaning tank 310d are provided with first fluid infusion ports and realize automatic fluid infusion under the control of the control device, wherein the first fluid infusion ports of the fourth cleaning tank 310d can be directly communicated with the pure water device 600 shown in fig. 1. The washing apparatus 300 includes an overflow pipe 327, and the first washing tank 310a, the second washing tank 310b, the third washing tank 310c and the fourth washing tank 310d are all communicated with the overflow pipe 327 through an overflow connection pipe. In the mask cleaning process, the first cleaning tank 310a and the fourth cleaning tank 310d are in a communicating state through the overflow pipe 327, the third cleaning tank 310b and the fourth cleaning tank 310c are in a non-communicating state with the overflow pipe 327, and the cleaning solution in the fourth cleaning tank 310d can overflow into the first cleaning tank 310a to supplement the cleaning solution in the first cleaning tank 310 a. When cleaning tanks are required, water can be simultaneously injected into the plurality of tanks through the overflow port 327a of the free end of the overflow pipe 327, and a seventh valve can be disposed at the free end of the overflow pipe. The second cleaning tank 310b and the third cleaning tank 310c are strong acid solutions, and are generally added manually, so that the second cleaning tank 310b and the third cleaning tank 310c are provided with second liquid supplementing pipelines. Since the first, second, and third cleaning tanks 310a, 310b, and 310c are all acidic cleaning solutions, the first, second, and third cleaning tanks 310a, 310b, and 310c are provided with a cover plate 361 and an opening and closing mechanism for driving the cover plate in order to prevent volatilization of the acidic cleaning solutions. In order to realize the related functions and operations of the cleaning device of this embodiment, a first valve, a second valve, a third valve, a fourth valve, a fifth valve and a sixth valve need to be disposed on the corresponding pipelines, which is not described herein again.

In an exemplary embodiment, among the four cleaning tanks, the second cleaning tank and the third cleaning tank may not be provided with an ultrasonic mechanism, the mask plate is subjected to ultrasonic cleaning in the first cleaning tank and the fourth cleaning tank, and the mask plate is subjected to soaking cleaning in the second cleaning tank and the third cleaning tank.

In an exemplary embodiment, the cleaning device further comprises a liquid level meter arranged in the cleaning tank, and the control device closes the circulating filter mechanism, the ultrasonic mechanism and the throwing mechanism when the cleaning liquid in the cleaning tank is lower than a low limit liquid level. As shown in fig. 1, the control device 400 includes an alarm 410 that, when the above-mentioned situation occurs, issues an alarm to alert the operator. The alarm 410 may be a sound and light alarm system.

In an exemplary embodiment, as shown in fig. 1, the control device 400 further includes a human-computer interface 420, from which the cleaning process can be comprehensively monitored in real time, and the cleaning state and the cleaning amount of the mask, the operation state of the cleaning device and the transfer device, and the like can be observed. The cleaning state comprises the cleaning duration, the conductivity of the cleaning liquid, the liquid level height of the cleaning liquid and the like, the human-computer interaction interface can set the operation level, and parameters are set according to the authority of each department. The control device is controlled by a PLC (programmable logic controller), so that full-automatic operation and manual operation can be realized. And can carry out automatic fluid infusion according to the feedback signals of each sensor, emergency stop, alarm and the like under abnormal conditions.

The embodiment of the utility model provides a cleaning system can be used to online automatic mask plate surface cleaning in succession, entire system simple structure, and convenient operation has improved the cleaning efficiency greatly. And also can adopt on going on to go the rete, removing the technology of gluing the utility model discloses cleaning system can further reduce artifical input and cost input.

In the description of the present invention, it should be noted that the terms "upper", "lower", "one side", "the other side", "one end", "the other end", "side", "opposite", "four corners", "periphery", "mouth" word structure "and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplification of the description, but do not indicate or imply that the structure referred to has a specific orientation, is constructed and operated in a specific orientation, and thus, is not to be construed as limiting the present invention.

In the description of the embodiments of the present invention, unless otherwise explicitly specified or limited, the terms "connected," "directly connected," "indirectly connected," "fixedly connected," "mounted," and "assembled" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally connected; the terms "mounted," "connected," and "fixedly connected" may be directly connected or indirectly connected through intervening media, or may be connected through two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.

Although the embodiments of the present invention have been described above, the description is only for the convenience of understanding the present invention, and the present invention is not limited thereto. It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

Claims (10)

1. A cleaning system is characterized by comprising a carrier for transferring a mask plate, a transfer device for transferring the carrier, a cleaning device for cleaning the mask plate and a control device, wherein the control device comprises a detector for detecting cleaning liquid information, a time controller for recording the cleaning time of the mask plate and a driver, the detector is arranged on the cleaning device, and the driver is used for controlling the transfer device to transfer the carrier according to the cleaning liquid information fed back by the detector and the cleaning time information of the mask plate fed back by the time controller.

2. The cleaning system of claim 1, wherein: the detector comprises a conductivity detector, and the cleaning liquid information is conductivity information of the cleaning liquid.

3. The cleaning system of claim 1, wherein: the cleaning device comprises a plurality of cleaning tanks and a circulating filtering mechanism communicated with the cleaning tanks through pipelines, wherein the cleaning tanks comprise a first cleaning tank for containing weak acid cleaning liquid, a second cleaning tank and a third cleaning tank for containing strong acid cleaning liquid and a fourth cleaning tank for containing neutral cleaning liquid.

4. The cleaning system of claim 3, wherein: circulating filtration mechanism includes circulating pump and filter, the tank bottom intercommunication of first pipeline and washing tank is passed through to the entry of circulating pump, the export of circulating pump passes through the lateral wall intercommunication of second pipeline and washing tank, the filter set up in on the second pipeline.

5. The cleaning system of claim 4, wherein: the cleaning device further comprises a first liquid supplementing pipeline, one end of the first liquid supplementing pipeline is communicated with the first pipeline, a first valve is arranged between the first pipeline and the cleaning tank and between the communicating position of the first liquid supplementing pipeline and the cleaning tank, a second valve is arranged on the first liquid supplementing pipeline, and the driver is connected with the first valve and the second valve and controls the opening and closing of the first valve and the second valve.

6. The cleaning system of claim 4, wherein: the cleaning device further comprises a liquid discharge pipeline, one end of the liquid discharge pipeline is communicated with the second pipeline, a third valve is arranged between the second pipeline and the cleaning tank and between the position where the second pipeline is communicated with the liquid discharge pipeline and the cleaning tank, a fourth valve is arranged on the liquid discharge pipeline, and the driver is connected with the third valve and the fourth valve and controls the third valve and the fourth valve to be opened and closed.

7. The cleaning system of claim 6, wherein: the liquid discharge pipelines of the first cleaning tank and the fourth cleaning tank are communicated with a first common liquid discharge pipeline, and the liquid discharge pipelines of the second cleaning tank and the third cleaning tank are communicated with each other through a second common liquid discharge pipeline.

8. The cleaning system of any one of claims 4-7, wherein: the cleaning device further comprises an overflow pipeline and an overflow connecting pipeline, the plurality of cleaning tanks are communicated with the overflow pipeline through the overflow connecting pipeline, the communication positions of the cleaning tanks and the overflow connecting pipeline are located on the side walls of the cleaning tanks and close to the notches of the cleaning tanks, fifth valves are arranged on the overflow connecting pipeline, and the drivers are connected with the fifth valves and control the opening and closing of the fifth valves.

9. The cleaning system of claim 8, wherein: the cleaning device further comprises a second liquid supplementing pipeline, the second liquid supplementing pipeline is communicated with the overflow connecting pipeline, the communication position of the overflow connecting pipeline and the second liquid supplementing pipeline is located between the fifth valve and the cleaning tank, and the second liquid supplementing pipeline is provided with a sixth valve.

10. The cleaning system of any one of claims 4-7, wherein: the cleaning device further comprises an ultrasonic mechanism and/or a throwing mechanism, the ultrasonic mechanism is arranged on at least one of the plurality of cleaning tanks, and the throwing mechanism is arranged on at least one of the plurality of cleaning tanks and is used for driving the carrier to lift in the cleaning tank.

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