CN212284969U - Cleaning and collecting device for quartz wafer processing - Google Patents
Cleaning and collecting device for quartz wafer processing Download PDFInfo
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- CN212284969U CN212284969U CN202022021373.0U CN202022021373U CN212284969U CN 212284969 U CN212284969 U CN 212284969U CN 202022021373 U CN202022021373 U CN 202022021373U CN 212284969 U CN212284969 U CN 212284969U
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Abstract
The utility model relates to a quartz wafer processing technology field just discloses a wash collection device for quartz wafer processing, which comprises a housin, the inside of casing is provided with the washing frame, the equal fixed mounting in both ends of washing frame has synchronous post, the other end of synchronous post runs through the side wall and the synchronous board of fixedly connected with of casing, the bottom overlap joint of synchronous board has the cam, cam drive is connected with driving motor's output, driving motor fixed mounting is in the side of casing. This a wash collection device for quartz wafer processing washs frame, synchronizing plate, cam, spring post, ultrasonic cleaner and driving motor isotructure through setting up for under the abluent prerequisite of ultrasonic cleaner, can shake the washing to quartz wafer, thereby increase abluent effect, possess advantages such as cleaning performance is good, solved the general problem of current cleaning performance.
Description
Technical Field
The utility model relates to a quartz wafer processing technology field specifically is a wash collection device for quartz wafer processing.
Background
At present, in the process of processing a quartz wafer, a crystal block is cut into quartz wafers, and then the quartz wafers are packaged into a semiconductor wafer, and a cleaning and collecting device is required when the quartz wafers are processed.
Most of the existing cleaning and collecting devices for processing quartz wafers can only be cleaned singly or manually during cleaning, are not high in efficiency, time-consuming and labor-consuming and have certain limitations, and therefore the cleaning and collecting device for processing quartz wafers is provided and used for solving the technical problems.
SUMMERY OF THE UTILITY MODEL
Technical problem to be solved
The utility model provides a not enough to prior art, the utility model provides a wash collection device for quartz wafer processing possesses advantages such as cleaning performance is good, has solved the general problem of current cleaning performance.
(II) technical scheme
In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a wash collection device for quartz wafer processing, includes the casing, the inside of casing is provided with washs the frame, the equal fixed mounting in both ends of wasing the frame has synchronous post, the other end of synchronous post runs through the side wall and the synchronous board of fixedly connected with of casing, the bottom overlap joint of synchronous board has the cam, cam drive is connected with driving motor's output, driving motor fixed mounting is in the side of casing, both sides bottom all articulates around the cam has the spring post, the other end fixedly connected with limiting plate of spring post, the front of wasing the frame is provided with ultrasonic cleaner.
The inside of wasing the frame has seted up the washing tank, the fixed plate is all installed to both sides around the washing tank, the equal fixed mounting in one side that the fixed plate is adjacent has the cleaning brush, the equal fixed mounting in one side that the fixed plate was kept away from mutually has the removal post, the other end that removes the post runs through the lateral wall and the threaded connection of washing tank has the threaded rod, the other end external surface fixed connection of threaded rod has the link gear, the side meshing of link gear is connected with the gangbar, the top transmission of gangbar is connected with link gear, link gear's opposite side transmission is connected with the regulating button.
Preferably, the limiting plates are fixedly connected with the shell, and the limiting plates are symmetrically distributed on two sides of the shell.
The limiting plate is used for supporting the spring columns, so that the spring columns can drive the synchronous plate to reset, and reciprocating movement of the synchronous plate is achieved.
Preferably, the adjusting button penetrates through the inner side wall of the cleaning frame and is fixedly connected with an adjusting rotating handle, and anti-skidding grains are arranged on the outer surface of the adjusting rotating handle.
The adjusting knob can be driven to rotate by twisting the adjusting rotating handle, and meanwhile, the adjusting rotating handle is convenient to rotate due to the arrangement of the anti-skidding lines.
Preferably, the number of the cleaning tanks is a plurality, and the cleaning tanks are uniformly distributed in the cleaning frame.
The arrangement of the plurality of cleaning tanks enables a plurality of quartz wafers to be cleaned simultaneously, so that the cleaning efficiency and effect are improved.
Preferably, the synchronizing column is an L-shaped rod, and the height of the contact end of the synchronizing column and the synchronizing plate is higher than the height of the cleaning frame.
The synchronizing column sets up to L type pole and has changed the position that the synchronizing column runs through to avoid running through of synchronizing column to lead to revealing of washing liquid, and then guarantee the leakproofness of casing when wasing.
Preferably, a sealing structure is arranged at the contact position of the cleaning frame and the movable column, and the sealing structure is matched with the position of the movable column.
The sealing structure is used for ensuring the sealing performance of the cleaning frame, so that cleaning liquid is prevented from permeating into the cleaning frame.
Compared with the prior art, the utility model provides a wash collection device for quartz wafer processing possesses following beneficial effect:
1. this a wash collection device for quartz wafer processing washs frame, synchronizing plate, cam, spring post, ultrasonic cleaner and driving motor isotructure through setting up for under the abluent prerequisite of ultrasonic cleaner, can shake the washing to quartz wafer, thereby increase abluent effect, possess advantages such as cleaning performance is good, solved the general problem of current cleaning performance.
2. This a wash collection device for quartz wafer processing through setting up link gear, adjusting button, removal post, threaded rod and linkage gear isotructure for can adjust the position of cleaning brush according to quartz wafer's thickness, thereby satisfy the washing demand under the different situation.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a front view of the structure of the present invention;
FIG. 3 is a schematic top view of the structure of the present invention;
fig. 4 is an enlarged view of a structure a in fig. 3 according to the present invention.
Wherein: 1. a housing; 2. cleaning the frame; 3. a synchronizing column; 4. a synchronization board; 5. a cam; 6. a drive motor; 7. a spring post; 8. a limiting plate; 9. an ultrasonic cleaner; 21. a cleaning tank; 22. a fixing plate; 23. moving the column; 24. a threaded rod; 25. a linkage gear; 26. a linkage rod; 27. a linkage mechanism; 28. an adjusting knob; 29. and (4) cleaning brushes.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-4, a cleaning and collecting device for processing quartz wafers comprises a housing 1, a cleaning frame 2 is arranged inside the housing 1, synchronization columns 3 are fixedly mounted at both ends of the cleaning frame 2, the other ends of the synchronization columns 3 penetrate through the side wall of the housing 1 and are fixedly connected with a synchronization plate 4, a cam 5 is lapped at the bottom end of the synchronization plate 4, the cam 5 is in transmission connection with the output end of a driving motor 6, the driving motor 6 is fixedly mounted at the side surface of the housing 1, spring columns 7 are hinged at the bottom ends of the front side and the rear side of the cam 5, a limiting plate 8 is fixedly connected at the other end of the spring column 7, an ultrasonic cleaner 9 is arranged on the front side of the cleaning frame 2, the ultrasonic cleaner 9 is fixedly connected with the inner wall of the front side of the housing 1, and a corresponding cover plate is arranged at the top end of the housing.
Through the technical scheme, the ultrasonic cleaner 9 is used for cleaning the quartz wafer in the shell 1, further cleaning the quartz wafer on the basis of the cleaning frame 2, so that the cleaning effect is increased, the orientations of the cams 5 on the two sides of the shell 1 are inconsistent, the cleaning frame 2 can be guaranteed to shake and clean, and the cleaning effect is increased.
Through the above technical solution, the position of the cleaning brush 29 can be adjusted by adjusting the position of the fixing plate 22, so that corresponding adjustment can be performed according to quartz wafers with different thicknesses, when adjustment is performed, the adjusting button 28 is screwed to drive the linkage mechanism 27 to perform linkage, the linkage rod 26 rotates to drive the linkage gear 25 to rotate, the threaded rod 24 rotates to drive the moving column 23 to move, the fixing plate 22 moves to drive the cleaning brush 29 to move towards the position of the quartz wafer until the cleaning brush contacts the quartz wafer, the linkage rod 26 is provided with a corresponding gear, so as to achieve a transmission effect with the linkage gear 25, and meanwhile, the linkage mechanism 27 is an existing mechanism for linking the knob and the rotating rod, and is not described herein for the prior art.
Specifically, the limiting plates 8 are fixedly connected with the housing 1, and the limiting plates 8 are symmetrically distributed on two sides of the housing 1.
Through above-mentioned technical scheme, limiting plate 8 is used for supporting spring post 7 for spring post 7 can drive synchronous board 4 and reset, thereby realizes synchronous board 4's reciprocating motion.
Specifically, the adjusting button 28 penetrates through the inner side wall of the cleaning frame 2 and is fixedly connected with an adjusting rotating handle, and anti-skid grains are arranged on the outer surface of the adjusting rotating handle.
Through above-mentioned technical scheme, twist and adjust the commentaries on classics handle and can drive adjusting knob 28 and rotate, the setting up of while antiskid line has made things convenient for the rotation to adjusting the commentaries on classics handle.
Specifically, the number of the cleaning tanks 21 is several, and the cleaning tanks 21 are uniformly distributed inside the cleaning frame 2.
Through the technical scheme, the plurality of quartz wafers can be cleaned simultaneously by the plurality of cleaning tanks 21, so that the cleaning efficiency and effect are improved.
Specifically, the synchronizing column 3 is an L-shaped rod, and the height of the contact end of the synchronizing column 3 and the synchronizing plate 4 is higher than that of the cleaning frame 2.
Through above-mentioned technical scheme, synchronizing column 3 sets up to L type pole and has changed the position that synchronizing column 3 runs through to avoid passing through of synchronizing column 3 to lead to revealing of washing liquid, and then guarantee casing 1's leakproofness when wasing.
Specifically, a sealing structure is arranged at the contact position of the cleaning frame 2 and the movable column 23, and the sealing structure is matched with the position of the movable column 23.
Through the technical scheme, the sealing structure is used for ensuring the sealing property of the cleaning frame 2, so that the cleaning liquid is prevented from permeating into the cleaning frame 2.
When the cleaning device is used, a worker puts a quartz wafer into the cleaning tank 21, screws the adjusting button 28 to drive the linkage mechanism 27 to carry out linkage, the linkage rod 26 rotates to drive the linkage gear 25 to rotate, the threaded rod 24 rotates to drive the moving column 23 to move, the fixing plate 22 moves to drive the cleaning brush 29 to move towards the position of the quartz wafer until the cleaning brush is contacted with the quartz wafer, cleaning liquid is poured in, the ultrasonic cleaner 9 and the driving motor 6 are started, the cam 5 drives the cleaning frame 2 to shake left and right, the cleaning brush 29 cleans the quartz wafer, and the ultrasonic cleaner 9 also cleans the quartz wafer synchronously.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (6)
1. A cleaning and collecting device for quartz wafer processing comprises a shell (1), and is characterized in that: a cleaning frame (2) is arranged in the shell (1), two ends of the cleaning frame (2) are fixedly provided with synchronous columns (3), the other ends of the synchronous columns (3) penetrate through the side wall of the shell (1) and are fixedly connected with synchronous plates (4), the bottom end of each synchronous plate (4) is connected with a cam (5) in a lap joint mode, the cam (5) is connected with the output end of a driving motor (6) in a transmission mode, the driving motor (6) is fixedly arranged on the side face of the shell (1), the bottom ends of the front side and the rear side of each cam (5) are hinged with spring columns (7), the other ends of the spring columns (7) are fixedly connected with limiting plates (8), and the front side of the cleaning frame (2) is provided with an ultrasonic cleaner (9);
rinse inside of frame (2) seted up washing tank (21), fixed plate (22) are all installed to both sides around washing tank (21), the equal fixed mounting in one side that fixed plate (22) are adjacent has cleaning brush (29), the equal fixed mounting in one side that fixed plate (22) kept away from mutually has removal post (23), the other end that removes post (23) runs through the lateral wall and the threaded connection of washing tank (21) has threaded rod (24), the other end external surface fixed connection of threaded rod (24) has linkage gear (25), the side meshing of linkage gear (25) is connected with gangbar (26), the top transmission of gangbar (26) is connected with link gear (27), the opposite side transmission of link gear (27) is connected with adjusting button (28).
2. A cleaning and collecting device for quartz wafer processing according to claim 1, characterized in that: the limiting plates (8) are fixedly connected with the shell (1), and the limiting plates (8) are symmetrically distributed on two sides of the shell (1).
3. A cleaning and collecting device for quartz wafer processing according to claim 1, characterized in that: the adjusting button (28) penetrates through the inner side wall of the cleaning frame (2) and is fixedly connected with an adjusting rotating handle, and anti-skid grains are arranged on the outer surface of the adjusting rotating handle.
4. A cleaning and collecting device for quartz wafer processing according to claim 1, characterized in that: the number of the cleaning tanks (21) is a plurality, and the cleaning tanks (21) are uniformly distributed in the cleaning frame (2).
5. A cleaning and collecting device for quartz wafer processing according to claim 1, characterized in that: the synchronous column (3) is an L-shaped rod, and the height of the contact end of the synchronous column (3) and the synchronous plate (4) is higher than that of the cleaning frame (2).
6. A cleaning and collecting device for quartz wafer processing according to claim 1, characterized in that: the cleaning frame (2) is provided with a sealing structure at the contact part with the movable column (23), and the sealing structure is matched with the movable column (23) in position.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022021373.0U CN212284969U (en) | 2020-09-16 | 2020-09-16 | Cleaning and collecting device for quartz wafer processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022021373.0U CN212284969U (en) | 2020-09-16 | 2020-09-16 | Cleaning and collecting device for quartz wafer processing |
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| Publication Number | Publication Date |
|---|---|
| CN212284969U true CN212284969U (en) | 2021-01-05 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202022021373.0U Active CN212284969U (en) | 2020-09-16 | 2020-09-16 | Cleaning and collecting device for quartz wafer processing |
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| CN (1) | CN212284969U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114101210A (en) * | 2022-01-27 | 2022-03-01 | 常州德匠数控科技有限公司 | Cleaning device and cleaning process for cleaning indium phosphide crystals with low pollution |
| CN114609811A (en) * | 2022-03-30 | 2022-06-10 | 中电创达(深圳)实业有限公司 | Large-size substrate for TFT liquid crystal panel and manufacturing method thereof |
-
2020
- 2020-09-16 CN CN202022021373.0U patent/CN212284969U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114101210A (en) * | 2022-01-27 | 2022-03-01 | 常州德匠数控科技有限公司 | Cleaning device and cleaning process for cleaning indium phosphide crystals with low pollution |
| CN114609811A (en) * | 2022-03-30 | 2022-06-10 | 中电创达(深圳)实业有限公司 | Large-size substrate for TFT liquid crystal panel and manufacturing method thereof |
| CN114609811B (en) * | 2022-03-30 | 2024-04-09 | 广东灿达股份有限公司 | Large-size substrate for TFT liquid crystal panel and manufacturing method thereof |
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