CN114609811A - Large-size substrate for TFT liquid crystal panel and manufacturing method thereof - Google Patents
Large-size substrate for TFT liquid crystal panel and manufacturing method thereof Download PDFInfo
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- CN114609811A CN114609811A CN202210322435.2A CN202210322435A CN114609811A CN 114609811 A CN114609811 A CN 114609811A CN 202210322435 A CN202210322435 A CN 202210322435A CN 114609811 A CN114609811 A CN 114609811A
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- 239000000758 substrate Substances 0.000 title claims abstract description 118
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000004140 cleaning Methods 0.000 claims abstract description 75
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 5
- 239000010703 silicon Substances 0.000 claims abstract description 5
- 238000005259 measurement Methods 0.000 claims abstract description 4
- 238000005498 polishing Methods 0.000 claims abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 84
- 238000000034 method Methods 0.000 claims description 49
- 238000005192 partition Methods 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 11
- 238000007664 blowing Methods 0.000 claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 8
- 125000006850 spacer group Chemical group 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 13
- 238000010030 laminating Methods 0.000 abstract description 13
- 238000007599 discharging Methods 0.000 abstract description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 36
- 238000005406 washing Methods 0.000 description 9
- 238000007789 sealing Methods 0.000 description 7
- 230000006978 adaptation Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 206010044565 Tremor Diseases 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
Abstract
The utility model relates to the field of substrate manufacturing, and discloses a large-size substrate for a TFT liquid crystal panel and a manufacturing method thereof, wherein the large-size substrate comprises the following steps: s1, processing the silicon wafer into a large-size substrate, and preliminarily measuring the flatness and parallelism of the large-size substrate; s2, partially removing the convex portion and the thick portion of the substrate by a processing tool based on the measurement data; and S3, polishing the surface of the substrate and cleaning the polished substrate by a cleaning device. According to the utility model, through the matching among the discharging assembly, the cleaning assembly, the control assembly, the laminating assembly and the like, the cleaning assembly can reciprocate relative to the discharging assembly, the substrate box and the large-size substrate, so that the same corresponding position of the cleaning assembly and each substrate box can be ensured, the same cleaning force of the cleaning assembly on each large-size substrate can be ensured, the cleaning effect on the large-size substrate is effectively ensured, and the processing quality and the later-stage yield of the large-size substrate are further ensured.
Description
Technical Field
The utility model relates to the technical field of substrate manufacturing, in particular to a large-size substrate for a TFT (thin film transistor) liquid crystal panel and a manufacturing method thereof.
Background
The manufacturing process of the silicon wafer comprises the following steps: the method comprises a single crystal growing process, a slicing process, an edge grinding process, a fine grinding process, a polishing process and a cleaning process. Among them, the cleaning process is used to remove abrasive or foreign materials attached to the wafer, and a degelling process tank, an IPA process tank, and a cleaning water tank are commonly used.
Chinese patent publication No. CN209016027U discloses an automatic organic cleaning machine and cleaning system, including the frame, be equipped with the sealed cowling in the frame, the frame encloses through the sealed cowling and establishes into a sealed washing chamber, is equipped with degumming agent process tank, IPA process tank and washing basin side by side in the sealed washing chamber, still is equipped with drive arrangement driven hand-basket mechanism in the sealed washing chamber, is equipped with the controller that is used for realizing drive arrangement control outside the frame. The utility model realizes the effective replacement of manual labor, greatly reduces the labor intensity of workers, greatly improves the cleaning efficiency and greatly reduces the cleaning cost.
But the spray header and the shower head of the device are relatively fixedly arranged with the cleaning water tank, so that water flow sprayed by the shower head cannot effectively contact with a large-size substrate on the substrate box, the large-size substrate which is far away from one side of the shower head is further not effectively cleaned, the force of water flow cleaning is weakened step by step, the cleaning effect and the processing quality of the large-size substrate cannot be guaranteed, and certain use limitation exists.
Therefore, it is necessary to provide a large-sized substrate for a TFT liquid crystal panel and a method for manufacturing the same to solve the above-mentioned problems.
Disclosure of Invention
The utility model aims to provide a large-size substrate for a TFT (thin film transistor) liquid crystal panel and a manufacturing method thereof, and aims to solve the problems that in the background art, water flow cannot effectively contact with the large-size substrate on a substrate box, the large-size substrate on one side far away from a spray header cannot be effectively cleaned, the cleaning force of the water flow is gradually weakened, the cleaning effect of the large-size substrate cannot be ensured, and the like.
In order to achieve the above object, the cleaning process in the manufacturing method is improved so that the water flow can effectively contact with the large-sized substrate, and the cleaning force and the cleaning effect are ensured.
Based on the above thought, the utility model provides the following technical scheme: the manufacturing method of the large-size substrate for the TFT liquid crystal panel comprises the following steps:
s1, processing the silicon wafer into a large-size substrate, and preliminarily measuring the flatness and parallelism of the large-size substrate;
s2, partially removing the convex portion and the thick portion of the substrate by a processing tool based on the measurement data;
and S3, polishing the surface of the substrate and cleaning the polished substrate by a cleaning device.
As a further scheme of the utility model: the cleaning device comprises a rack, wherein a water tank, an IPA (isopropyl alcohol) process tank and a degumming agent process tank which are sequentially distributed are arranged in the rack, a material placing assembly for placing a substrate box is arranged in the water tank, openings are formed in two sides of the water tank in a penetrating manner, and a cleaning assembly which is flush with the inner wall of the water tank is arranged in each opening; the inside of frame is provided with the control assembly that is used for driving the subassembly that washs to the opening removal, is the basket mechanism that the position corresponds with blowing subassembly and is used for driving the drive arrangement that basket mechanism moved.
As a further scheme of the utility model: the blowing subassembly includes the frame with basin size adaptation, and the inside fixed mounting of frame has the baffle and is two guide rails of symmetric distribution, and the holding tank that is used for placing the substrate box is all offered to the interior diapire of baffle and frame, and the fixed surface of frame installs the handle that corresponds with hand-basket mechanism position.
As a further scheme of the utility model: the quantity of baffle is N, the quantity of opening is N + 1.
As a further scheme of the utility model: the cleaning assembly comprises a shunt pipe which is positioned in the opening and is flush with the inner wall of the water tank, a plurality of water outlet holes are formed in the bottom of the shunt pipe, a base is fixedly arranged on the surface of the shunt pipe, and a telescopic pipe communicated with the shunt pipe is movably arranged in the base.
As a further scheme of the utility model: the laminating assembly consists of an outer combining part at one side opposite to the two shunt tubes and a middle part at one side opposite to the two shunt tubes, the outer combining part and the middle part respectively comprise a long plate in sliding fit with the opening, and a first spring is fixedly arranged between the surface of the long plate and the opening; the surface of the long plate is elastically connected with a narrow plate which is movably attached to the opening through a second spring.
As a further scheme of the utility model: the narrow plate can move relative to the water tank along the long plate, the binding surfaces of the narrow plate and the opening are both arranged into slopes, and the narrow plate is arranged in an L shape.
As a further scheme of the utility model: the control assembly comprises a telescopic rod fixedly connected with the cleaning assembly, and the telescopic direction of the telescopic rod is vertical to the central connecting line of the two guide rails; the control assembly further comprises a power part for driving the telescopic rod to move.
As a further scheme of the utility model: the power portion comprises an air cylinder fixedly connected with the rack, and a side plate fixedly connected with the telescopic rod is fixedly mounted at the output end of the air cylinder.
As a further scheme of the utility model: the number of the openings is one, the attaching assembly comprises a sliding plate and ribs which are in sliding fit, the ribs are fixedly connected with the openings, two sides of the sliding plate in the middle are respectively attached to the surfaces of the two adjacent shunt tubes, and the sliding plates on the two marginal edges are respectively and correspondingly attached to the surfaces of the two marginal shunt tubes; the sliding plates positioned on the two marginal edges are in sliding fit with the opening, elongated grooves used for accommodating the two marginal sliding plates are formed in two sides of the opening, a third spring is fixedly connected between the sliding plate at the lowest side and the elongated grooves, and the third spring is positioned in the elongated grooves.
The utility model also provides the following technical scheme: the TFT liquid crystal panel uses the large-scale substrate, it adopts any one of the above-mentioned technical schemes to make.
Compared with the prior art, the utility model has the beneficial effects that: through the cooperation between blowing subassembly, washing subassembly, control assembly and the laminating subassembly etc. can realize wasing the reciprocating motion of subassembly for blowing subassembly, substrate box and jumbo size substrate, can guarantee to wash the same washing dynamics of subassembly to every jumbo size substrate, effectively guarantee the cleaning performance, processingquality and the later stage yields of jumbo size substrate. The cleaning assembly can move synchronously when the discharging assembly shakes up and down, the same cleaning force and cleaning effect of the cleaning assembly on each large-size substrate are further guaranteed, and on the basis, the cleaning force and cleaning effect of the cleaning assembly on each large-size substrate can be further improved by controlling the distance between the cleaning assembly and the substrate box. In the removal in-process of clean subassembly, the laminating subassembly can keep the laminating rather than all the time, and then can realize opening department effectively sealed, prevents to wash the subassembly and wash the condition that the clear water spills from the opening part appearing turning on the water, can guarantee the effective utilization of clear water, and the practicality is higher.
Drawings
The utility model is further illustrated with reference to the following figures and examples:
FIG. 1 is a perspective view of the overall construction of the present invention;
FIG. 2 is a schematic structural view of a discharge assembly of the present invention;
FIG. 3 is an enlarged view of the structure at A in FIG. 2;
FIG. 4 is a schematic structural diagram of a control assembly according to the present invention;
FIG. 5 is an enlarged view of the structure at B in FIG. 4;
FIG. 6 is a schematic view of the construction of the long and narrow plates of the present invention;
FIG. 7 is an enlarged view of the structure of FIG. 6 at C;
FIG. 8 is a schematic view of the slider structure of the present invention;
FIG. 9 is an enlarged view of the structure at D in FIG. 8;
FIG. 10 is a schematic view of the frame and chute configuration of the present invention;
FIG. 11 is a schematic view of a large-sized substrate of the present invention applied to a liquid crystal panel;
FIG. 12 is a schematic view of the application of the large-sized substrate of the present invention to a liquid crystal panel.
In the figure: 1. a water tank; 2. a discharging component; 3. an opening; 4. cleaning the assembly; 5. a control component; 6. fitting the assembly; 7. a frame; 8. a chute; 201. a frame; 202. a guide rail; 203. a partition plate; 204. a handle; 401. a base; 402. a shunt tube; 501. a telescopic rod; 502. a side plate; 503. a cylinder; 601. a long plate; 602. a first spring; 603. a narrow plate; 604. a second spring; 6001. a slide plate; 6002. and (4) ribs.
Detailed Description
The first embodiment is as follows:
referring to fig. 1 to 4, an embodiment of the present invention provides a method for manufacturing a large-sized substrate for a TFT liquid crystal panel, which is mainly related to the clean water cleaning of the substrate in a water tank 1, the method including the steps of: firstly, processing a silicon wafer into a large-size substrate (the processing step is the prior art and is not described in detail), and preliminarily measuring the flatness and parallelism of the large-size substrate; a second step of partially removing the convex portion and the thick portion of the substrate by a processing tool based on the measurement data to improve the flatness and parallelism of the large-sized synthetic quartz glass substrate; and a third step of final polishing the surface of the substrate and cleaning the polished substrate by a cleaning device.
Wherein, the cleaning device comprises a frame 7, a sealing cavity is formed in the frame 7, and a cabinet door is provided to open and close the frame 7 (not shown in the figure). The rack 7 is internally provided with a water tank 1, an IPA process tank (not shown in the figure) and a degumming agent process tank (not shown in the figure) which are sequentially attached, and the water tank 1, the IPA process tank and the degumming agent process tank are arranged from left to right; the inside of the water tank 1 is provided with a material placing component 2 for placing a substrate box (the substrate box is used for placing large-size substrates), the material placing component 2 can be taken and placed from the inside of the water tank 1 manually, the front side and the rear side of the water tank 1 are both provided with openings 3 in a penetrating manner, a cleaning component 4 which is flush with the inner wall (the inner wall provided with the openings 3) of the water tank 1 is arranged inside the openings 3, and the cleaning component 4 is communicated with an external water source to realize water supply to the inside of the water tank 1; the inside of the frame 7 is provided with a control component 5 for driving the cleaning component 4 to move relative to the opening 3, and the inside of the frame 7 is also provided with a basket lifting mechanism corresponding to the upper and lower positions of the discharging component 2 and a driving device for driving the basket lifting mechanism to move in the XY direction.
Wherein, the cleaning process comprises the following steps: the frame 7, the IPA process tank, the degumming agent process tank, the basket mechanism and the driving device in the embodiment are all the existing mature technologies and are not described in detail herein.
In the present embodiment, it is preferable that: when the device is used, the substrate boxes for placing large-size substrates are sequentially placed into the material placing assembly 2, then the driving device and the lifting basket mechanism are started, the material placing assembly 2 and the substrate boxes are lifted by the lifting basket mechanism and moved into the degumming agent process tank, and then the driving device is matched with the lifting basket mechanism to drive the material placing assembly 2 and the substrate boxes to shake up and down in the degumming agent solution, so that photoresist is removed. And then the material placing assembly 2 and the substrate are moved into an IPA process tank through a driving device and a lifting basket mechanism, and the driving device is matched with the lifting basket mechanism to drive the material placing assembly 2 and the substrate box to shake up and down in the IPA removing solution, so that the IPA removing process is completed. Finally, the emptying component 2 and the substrate box are moved into the water tank 1 through a driving device and a basket lifting mechanism, then the control component 5 and the cleaning component 4 are sequentially started, the control component 5 drives the cleaning component 4 to reciprocate back and forth relative to the emptying component 2, the cleaning component 4 extends into the emptying component 2 and corresponds to the substrate box in the process, and water is sprayed to clean a large-size substrate in the substrate box after the cleaning component 4 is started; when the driving device is matched with the basket lifting mechanism to drive the discharging assembly 2 and the substrate box to shake up and down in clear water, the discharging assembly 2 can drive the cleaning assembly 4 to move up and down relative to the opening 3, the attaching assembly 6 can be always kept in an attaching state with the cleaning assembly 4, and the opening 3 is always in a sealing state.
Through the cooperation of blowing subassembly 2, wash subassembly 4, control assembly 5 and laminating subassembly 6 isotructure, can realize washing subassembly 4 for the reciprocating motion of blowing subassembly 2, substrate box and jumbo size substrate, and then can guarantee to wash the same corresponding position of subassembly 4 and every substrate box, can guarantee to wash the same washing dynamics of subassembly 4 to every jumbo size substrate, effectively guaranteed the cleaning performance to the jumbo size substrate, and then guaranteed the processingquality and the later stage yields of jumbo size substrate. When the discharging component 2 shakes up and down, the cleaning component 4 can move synchronously with the discharging component, the same cleaning force of the cleaning component 4 on each large-size substrate is further ensured, the cleaning effect on the large-size substrates is further ensured, on the basis, the distance between the cleaning component 4 and the substrate box is controlled, the cleaning force of the cleaning component 4 on each large-size substrate can be further improved, and the cleaning effect of the large-size substrates is further ensured. Because the cleaning assembly 4 can move synchronously with the emptying assembly 2, the arrangement area of the emptying assembly 2 can be reduced as much as possible, and the space utilization rate is improved; on this basis blowing subassembly 2 can also set to with the size adaptation of basin 1, further improves space utilization. In the removal in-process of clean subassembly, laminating subassembly 6 can keep laminating rather than all the time, and then can realize effectively sealed to opening 3 department, prevents to wash subassembly 4 and in the condition that the clear water spills from opening 3 department in the washing that turns on the water that appears, can guarantee the effective utilization of clear water, and holistic practicality is higher.
Example two:
referring to fig. 1 to 7, in the first embodiment, the emptying assembly 2 includes a frame 201 located in the water tank 1 and adapted to the size of the water tank 1, the frame 201 can pass water through, and the bottom wall of the water tank 1 has certain elasticity, that is, the frame 201 can move downward for a certain distance under the force after being placed in the water tank 1; a partition plate 203 and two guide rails 202 which are symmetrically distributed are fixedly arranged in the frame 201, wherein the frame 201 and the guide rails 202 are both designed in a U shape; the partition plate 203 divides the interior of the frame 201 into an upper layer and a lower layer, the partition plate 203 and the inner bottom wall of the frame 201 are both provided with accommodating grooves for accommodating the substrate box, the distance between the accommodating grooves and the side wall of the frame 201 is more than or equal to the width of the guide rail 202, namely, the substrate box can be vertically taken from the accommodating grooves, and the substrate box is convenient to take and place; a handle 204 corresponding to the position of the basket lifting mechanism is fixedly arranged on the upper surface of the frame 201.
Corresponding to the arrangement of the partition plate 203 and the frame 201, the number of the openings 3 on each side is two in the embodiment, and the number of the corresponding cleaning assemblies 4 and the number of the corresponding attaching assemblies 6 are also two, so that the number of the partition plates 203 can be correspondingly increased in practical use, the simultaneous processing of a large number of substrate boxes can be realized to improve efficiency, the number of the openings 3 also needs to be correspondingly increased, and the number of the openings 3 is always one more than that of the partition plates 203 because the substrate boxes can be placed on the inner top wall of the frame 201. The cleaning assembly 4 comprises a shunt pipe 402 which is positioned in the opening 3 and is flush with the inner wall of the water tank 1, a plurality of water outlet holes are formed in the bottom of the shunt pipe 402, and the water outlet holes are formed right below the shunt pipe 402 in the embodiment; the surface of the shunt pipe 402 far away from the water tank 1 is fixedly provided with a base 401, the interior of the base 401 is movably provided with a telescopic pipe (not shown in the figure) communicated with the shunt pipe 402, and the end part of the telescopic pipe far away from the shunt pipe 402 is communicated with an external water source so as to realize water supply to the shunt pipe 402. Shunt tubes 402 sets up in this embodiment and is the rectangle, in practice as long as shunt tubes 402 is close to the surface of basin 1 for the plane and can flush with basin 1 inner wall, simultaneously shunt tubes 402's upper surface and lower surface be the plane can, base 401 and shunt tubes 402's shape adaptation makes things convenient for the design of follow-up laminating subassembly 6 simultaneously.
The attaching component 6 is composed of an outer attaching part on the opposite side of the two shunt tubes 402 and an intermediate part on the opposite side of the two shunt tubes 402, in this embodiment, because there are two openings 3, there are two intermediate parts and two outer attaching parts, and the arrangement of the outer attaching part and the intermediate part is the same, and each of the outer attaching part and the intermediate part includes a long plate 601 which is in up-and-down sliding fit with the opening 3, a first spring 602 is fixedly installed between the surface of the long plate 601 far away from the shunt tubes 402 and the inner wall of the opening 3, the first spring 602 enables the long plate 601 to be attached to the shunt tubes 402, and under the action of the first spring 602, the long plate 601 tends to move towards the shunt tubes 402; a notch is formed in the surface, close to the water tank 1, of the long plate 601, the narrow plate 603 movably attached to the opening 3 is elastically connected to the inside of the notch through a second spring 604, and the narrow plate 603 can be kept flush with the inner wall of the water tank 1 due to the notch, so that the frame 201 can be conveniently and quickly taken and placed; the narrow plate 603 can move back and forth relative to the water tank 1 based on the long plate 601, the binding surfaces (up and down directions) of the narrow plate 603 and the opening 3 are both provided with slopes, and when the long plate 601 is relatively far away from the shunt pipe 402, the narrow plate 603 can be driven to move out of the opening 3 and move synchronously under the guidance of the slopes. In order to prevent the water flow from flowing between the long plate 601 and the narrow plate 603 after the narrow plate 603 moves, the narrow plate 603 may be disposed in an L shape, the long side of which is opposite to the slope of the opening 3, and the short side of which is slidably disposed inside the long plate 601.
The control assembly 5 comprises two telescopic rods 501 fixedly connected with the base 401, the number of the telescopic rods 501 is the same as that of the base 401, and the telescopic rods 501 are vertically arranged so that the base 401 can move in the vertical direction (the telescopic direction of the telescopic rods 501 is perpendicular to the central connecting line of the two guide rails 202); the control assembly 5 further comprises a power portion fixedly connected with the telescopic rod 501 and driving the telescopic rod 501 to move in the front-rear direction, the power portion in this embodiment comprises a cylinder 503 fixedly connected with the frame 7, and a side plate 502 fixedly connected with the telescopic rod 501 is fixedly mounted at an output end of the cylinder 503.
In the present embodiment, it is preferable that: after the substrate box finishes the photoresist removing process and the IPA removing process through a photoresist removing process tank and an IPA process tank in sequence, the frame 201 and the substrate box are moved into the water tank 1 through the driving device and the basket lifting mechanism, then the cylinder 503 and an external water source are started in sequence, the cylinder 503 drives the side plate 502 and the telescopic rod 501 to move towards the opening 3, the telescopic rod 501 drives the base 401 and the shunt pipe 402 to extend into the water tank 1 from the opening 3, the shunt pipe 402 enters the water tank 1 and then is inserted into the guide rail 202 on the frame 201 and is clamped with the guide rail 202, at the moment, the shunt pipe 402 moves towards the frame 201 along the guide rail 202 and corresponds to the substrate box, and then the cylinder 503 drives the shunt pipe 402 to reset along the guide rail 202 through the side plate 502, the telescopic rod 501 and the base 401 and reciprocates along the guide rail 202; the shunt pipe 402 can not be completely retracted into the opening 3 in the resetting process, and the influence on the water outlet of the shunt pipe 402 can not be generated. In the process, an external water source conveys clean water to the shunt pipe 402 through the telescopic pipe and the clean water is sprayed out of the water outlet holes at the bottom of the shunt pipe 402 to clean the large-size substrates in the frame 201 and on the partition plate 203. At this time, when the driving device cooperates with the basket lifting mechanism to drive the frame 201, the partition 203 and the substrate box to shake up and down in clear water, the guide rail 202 can drive the shunt pipe 402 and the base 401 to move up and down relative to the opening 3, and the positions of the cylinder 503 and the side plate 502 are unchanged due to the arrangement of the telescopic rod 501. When the base 401 and the shunt tube 402 move up and down, the long plate 601 can always keep fit with the surface of the base 401 (or the shunt tube 402) and move synchronously under the action of the first spring 602, the long plate 601 can drive the narrow plate 603 to move synchronously when moving, when the narrow plate 603 is relatively close to the top wall or the bottom wall of the opening 3, the narrow plate 603 extruded by the slope can be relatively close to the frame 201, and under the action of the second spring 604, the narrow plate 603 can always keep fit with the inner wall of the water tank 1, and further the opening 3 is always in a sealing state.
Through the matching of the structures such as the guide rail 202, the shunt pipe 402, the telescopic rod 501 and the long plate 601, the reciprocating movement of the shunt pipe 402 relative to the frame 201, the substrate box and the large-size substrate can be realized, the same corresponding position of the water outlet hole and each substrate box can be ensured, the same cleaning force of the water outlet hole to each large-size substrate can be ensured, the cleaning effect on the large-size substrate is effectively ensured, and the processing quality and the later-stage yield of the large-size substrate are further ensured. When the frame 201 and the partition plate 203 shake up and down, the flow dividing pipe 402 can move synchronously with the frame, so that the same cleaning force of the water outlet hole on each large-size substrate is further ensured, and further the cleaning effect on the large-size substrates is further ensured. Because the shunt pipe 402 can move synchronously with the frame 201 and the partition plate 203, the arrangement area of the frame 201 can be reduced as much as possible, namely, the distances between the bottom wall of the frame 201 and the partition plate 203 and between the partition plate 203 and the upper surface of the frame 201 are reduced, and further, the space utilization rate can be improved; on this basis, the frame 201 can also be arranged to be matched with the size of the water tank 1, so that the overall space utilization rate is further improved. At shunt tubes 402 and base 401's removal in-process, long board 601 can synchronous movement rather than keeping the laminating, and narrow board 603 can relative movement and keep the laminating with the inner wall of basin 1, and then can realize the effective sealing to opening 3 department, prevents that the apopore from rinsing the circumstances that the clear water spills from opening 3 department in the drainage, can guarantee the effective utilization of clear water and practice thrift the water resource, has satisfied more demands in the in-service use.
Example three:
referring to fig. 1 to 12, on the basis of the second embodiment, only one opening 3 is provided on each side, and the length of the opening 3 in the vertical direction is greater than or equal to the distance between two openings 3 in the second embodiment (plus the length of the opening 3). In this embodiment, the attaching assembly 6 includes a sliding plate 6001 and ribs 6002 which are in up-down sliding fit, the ribs 6002 are fixedly connected with the inner wall of the opening 3, the length (up-down) of the ribs 6002 is much smaller than that of the sliding plate 6001, the upper and lower sides of the middle sliding plate 6001 are movably attached to the surfaces of the two shunt tubes 402, the sliding plates 6001 which are located at the upper and lower margins are in up-down sliding fit with the opening 3, the uppermost sliding plate 6001 is attached to the upper surface of the uppermost shunt tube 402, and the lowermost sliding plate 6001 is attached to the bottom of the lowermost shunt tube 402; the elongated slot that is used for holding top slide 6001 and below slide 6001 is all seted up to opening 3's upper and lower both sides, and fixedly connected with third spring between the bottom of below slide 6001 and the elongated slot, under the effect of third spring, below slide 6001 can remain the laminating with below shunt tubes 402 all the time, and the third spring hides in the inside of elongated slot.
In the present embodiment, it is preferable that: after the frame 201 and the substrate cassette are moved into the water tank 1, the cylinder 503 is started to drive the shunt tube 402 to move along the guide rail 202 and to reciprocate corresponding to the substrate cassette by the cooperation of the side plate 502, the telescopic rod 501, the base 401 and other structures. And then, an external water source is started to spray clear water through the water outlet holes by matching the structures of the extension pipe, the base 401, the shunt pipe 402 and the like so as to clean the large-size substrates in the frame 201 and on the partition plate 203. In this in-process, drive arrangement cooperation hand-basket mechanism drives frame 201 again, when baffle 203 and substrate box tremble from top to bottom in the clear water, guide rail 202 can drive shunt tubes 402 and base 401 and reciprocate for opening 3, shunt tubes 402 of below can lifting slide 6001 at the rising this moment, make slide 6001 along the vertical rising of rib 6002, the shunt tubes 402 of top can push down slide 6001 when descending, make it along the vertical decline of rib 6002 again, in this in-process, the top slide 6001 can descend by oneself under the action of gravity, the bottom slide 6001 can go up and down with bottom base 401 under the effect of third spring is synchronous, even make slide 6001 can remain the laminating with the surface of base 401, make opening 3 be in encapsulated situation all the time.
In the second embodiment, the long plate 601 and the narrow plate 603 which are symmetrical relative to the shunt pipe 402 and the plurality of the first springs 602 and the second springs 604 are arranged to realize the sealing of the opening 3, so that the clean water is prevented from leaking out of the opening 3; however, the relative sealing of the shunt tubes 402 is complex, and the number of the openings 3 is increased along with the number of the partition plates 203, so that more long plates 601, narrow plates 603, first springs 602 and second springs 604 are required, which is troublesome for installation and formation, and has certain use limitation. Compared with the second embodiment, the plurality of openings 3 on each side are adjusted to be one large opening 3 through the matching of the openings 3, the base 401, the sliding plate 6001, the ribs 6002 and other structures, so that the processing technology can be simplified, and the long-acting and stable sealing effect on the openings 3 can be realized; meanwhile, the structure is simpler, a large number of long plates 601, narrow plates 603, first springs 602 and second springs 604 do not need to be additionally arranged, and the working cost is also saved; even if the quantity of the partition plates 203 is increased to clean the substrates at the later stage, the quantity of the ribs 6002 and the sliding plates 6001 can be correspondingly adjusted at the opening 3, the whole operation is simpler and more labor-saving, and the applicability is stronger.
As a further improvement of the present embodiment: on the basis of one opening 3, the control assembly 5 can be composed of only the power part, i.e. without the need to add the telescopic rod 501. The power part is still composed of the cylinder 503 and the side plate 502, and the side plate 502 is still fixedly connected with the output end of the cylinder 503, but the connection mode of the cylinder 503 and the frame 7 is changed from fixed connection to sliding connection, and the surface of the frame 7 is provided with a sliding groove 8 for the cylinder 503 to slide up and down.
In the second embodiment, because the telescopic rod 501 is arranged, when the guide rail 202 drives the shunt pipe 402 and the base 401 to move up and down, the positions of the cylinder 503 and the side plate 502 are not changed, and at this time, the cylinder 503 is fixedly connected with the rack 7. The cylinder 503 is instead slidably connected to the frame 7, so that when the guide rail 202 drives the shunt tube 402 and the base 401 to move up and down, the base 401 can drive the side plate 502 and the cylinder 503 to move synchronously, so that the cylinder 503 moves along the chute 8 relative to the frame 7; on the basis that does not influence shunt tubes 402 and base 401 and go up and down, need not to install the quantity of telescopic link 501 additional according to base 401's quantity again, save working cost more, also need not readjustment cylinder 503 and curb plate 502 after the increase of later stage baffle 203 quantity simultaneously, alleviate staff's work burden, the practicality is higher.
Example four:
referring to fig. 1 to 12, an embodiment of the present invention provides a large-sized substrate for a TFT liquid crystal panel, which is manufactured according to any one of embodiments one to three, and can be effectively cleaned during processing, so as to ensure the processing quality and the post-stage yield of the substrate.
Claims (10)
- A method for manufacturing a large-size substrate for a TFT liquid crystal panel, comprising the steps of:s1, processing the silicon wafer into a large-size substrate, and preliminarily measuring the flatness and parallelism of the large-size substrate;s2, partially removing the convex portion and the thick portion of the substrate by a processing tool based on the measurement data;and S3, polishing the surface of the substrate and cleaning the polished substrate through a cleaning device.
- 2. The method for manufacturing a large-sized substrate for a TFT liquid crystal panel according to claim 1, wherein the cleaning apparatus comprises a frame, a water tank, an IPA process tank and a degumming agent process tank are arranged in the frame in sequence, a material placing assembly for placing the substrate box is arranged in the water tank, openings are formed through both sides of the water tank, and a cleaning assembly flush with the inner wall of the water tank is arranged in the openings; the inside of frame is provided with the control assembly that is used for driving the subassembly that washs to the opening removal, is the basket mechanism that the position corresponds with blowing subassembly and is used for driving the drive arrangement that basket mechanism moved.
- 3. The method for manufacturing a large-sized substrate for a TFT liquid crystal panel according to claim 2, wherein the material feeding assembly comprises a frame adapted to the size of the water tank, a partition plate and two symmetrically distributed guide rails are fixedly installed inside the frame, a receiving groove for placing the substrate box is formed in each of the partition plate and the inner bottom wall of the frame, and a handle corresponding to the position of the basket lifting mechanism is fixedly installed on the surface of the frame.
- 4. The method of claim 3, wherein the number of the spacers is N, and the number of the openings is N + 1.
- 5. The method according to claim 4, wherein the cleaning assembly comprises a plurality of water outlets formed in the bottom of the water dividing pipe, a base is fixedly mounted on the surface of the water dividing pipe, and a telescopic pipe connected with the water dividing pipe is movably disposed inside the base.
- 6. The method of manufacturing a large-sized substrate for a TFT liquid crystal panel as set forth in claim 4, wherein the attaching member is composed of an outer fitting portion on a side opposite to the two shunt tubes and an intermediate portion on a side opposite to the two shunt tubes, each of the outer fitting portion and the intermediate portion includes a long plate slidably fitted to the opening, and the first spring is fixedly installed between a surface of the long plate and the opening; the surface of the long plate is elastically connected with a narrow plate which is movably attached to the opening through a second spring.
- 7. The method of claim 6, wherein the narrow plate is movable along the long plate with respect to the water bath, and the adhesion surfaces of the narrow plate and the opening are both formed in a slope and the narrow plate is formed in an L-shape.
- 8. The method according to claim 4, wherein the control unit comprises a telescopic rod fixedly connected to the cleaning unit, and the telescopic direction of the telescopic rod is perpendicular to the central connecting line of the two guide rails; the control assembly further comprises a power part for driving the telescopic rod to move.
- 9. The method of claim 8, wherein the power unit comprises a cylinder fixedly connected to the frame, and a side plate fixedly connected to the extension rod is fixedly mounted to an output end of the cylinder.
- A large-sized substrate for a TFT liquid crystal panel, characterized by being produced by the method for producing a large-sized substrate for a TFT liquid crystal panel according to any one of claims 1 to 9.
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| CN1437045A (en) * | 2002-01-31 | 2003-08-20 | 信越化学工业株式会社 | Large size substrate and its producing method |
| KR20060117114A (en) * | 2005-05-12 | 2006-11-16 | 엘지.필립스 엘시디 주식회사 | Cleaning system capable of improving processing efficiency liquid crystal display device and cleaning method using the same |
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| CN109494179A (en) * | 2018-11-26 | 2019-03-19 | 山东元旭光电股份有限公司 | A kind of automatic organic washing machine, cleaning system and cleaning method |
| CN212284969U (en) * | 2020-09-16 | 2021-01-05 | 马鞍山荣泰科技有限公司 | Cleaning and collecting device for quartz wafer processing |
| CN113399360A (en) * | 2021-07-21 | 2021-09-17 | 陈道林 | Liquid crystal display panel cleaning device |
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2022
- 2022-03-30 CN CN202210322435.2A patent/CN114609811B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1437045A (en) * | 2002-01-31 | 2003-08-20 | 信越化学工业株式会社 | Large size substrate and its producing method |
| KR20060117114A (en) * | 2005-05-12 | 2006-11-16 | 엘지.필립스 엘시디 주식회사 | Cleaning system capable of improving processing efficiency liquid crystal display device and cleaning method using the same |
| CN206794265U (en) * | 2017-05-08 | 2017-12-26 | 济源石晶光电频率技术有限公司 | A kind of cleaning device for cleaning large scale quartz wafer |
| CN109494179A (en) * | 2018-11-26 | 2019-03-19 | 山东元旭光电股份有限公司 | A kind of automatic organic washing machine, cleaning system and cleaning method |
| CN212284969U (en) * | 2020-09-16 | 2021-01-05 | 马鞍山荣泰科技有限公司 | Cleaning and collecting device for quartz wafer processing |
| CN113399360A (en) * | 2021-07-21 | 2021-09-17 | 陈道林 | Liquid crystal display panel cleaning device |
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| CN114609811B (en) | 2024-04-09 |
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