CN204912170U - Silicon chip washs shaking device - Google Patents
Silicon chip washs shaking device Download PDFInfo
- Publication number
- CN204912170U CN204912170U CN201520529968.3U CN201520529968U CN204912170U CN 204912170 U CN204912170 U CN 204912170U CN 201520529968 U CN201520529968 U CN 201520529968U CN 204912170 U CN204912170 U CN 204912170U
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- CN
- China
- Prior art keywords
- silicon chip
- crane
- base plate
- cleaning
- connecting axle
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- Expired - Fee Related
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model provides a silicon chip washs shaking device, a supplementary belt cleaning device that use in the silicon chip cleaning process is related to, including a cylinder, crane and silicon chip bear the frame, connecting axle that the crane was set up by the level and vertical setting are constituteed in the pole setting at connecting axle both ends, the connecting axle is connected with piston rod of the cylinder's flexible end, be equipped with a guide post respectively with two corresponding positions of pole setting, the setting is slided in the guide slot of guide post through the slider that its lateral part set up to the pole setting, the silicon chip bears the frame including a bottom plate, be equipped with the draw -in groove that permeates water the hole and be used for fixed silicon chip washing basket on the bottom plate, the both sides of bottom plate respectively are equipped with two connecting rods, top with two connecting rods of one side is connected by an otic placode, two otic placodes are connected with the top of two pole settings of crane respectively, so that the silicon chip bear the frame can be in the washing tank of silicon chip cleaning machine under the crane drives the up -and -down motion. The utility model discloses silicon chip up -and -down motion in the cleaning process be can make, the cleaning efficiency and the cleaning capacity of silicon chip have been improved.
Description
Technical field
The utility model relates to the auxiliary cleaner used in cleaning monocrystalline silicon process, is specially a kind of Wafer Cleaning agitating device.
Background technology
Monocrystalline silicon piece before polishing after all need to clean silicon chip, the cleaning before polishing can make silicon chip surface more clean, the attachment of wax layer evenly, the silicon chip of dishing out has better surface quality; Cleaning after polishing, sticks to organic matter and the inorganic matter of silicon chip surface after can removing polishing, make polished silicon slice better meet the requirement of technique.
Existing Wafer Cleaning process is normally carried out on silicon wafer cleaner, during cleaning, the film magazine that silicon chip is housed is placed in the chemical liquids rinse bath of cleaning machine, by circulating pump, the cleaning fluid in rinse bath is circulated, and be aided with million sound/ultrasonication silicon chip is cleaned.This kind of cleaning way, silicon chip is transfixion in cleaning process, only rely on circulating pump to produce chemical liquids flowing to clean, cleaning efficiency is too low, in addition because the gap between silicon chip is very little, the limited use of million sound/ultrasonic, can only loosen the foreign matter of silicon chip surface, it can not be flaked off in chemical liquids better.Silicon chip surface or silicon chip be the also easy foreign matter such as chemical residue liquid and other particle near the edge of film magazine, causes scavenging period long, returns the rate of washing high, affect production efficiency and product quality.
Utility model content
The purpose of this utility model is to provide a kind of Wafer Cleaning agitating device, to make silicon chip can move up and down in cleaning process, and produces the cleaning current of flowing at silicon chip surface, thus improves cleaning efficiency and the cleansing power of silicon chip.
For achieving the above object, the technical solution of the utility model is: a kind of Wafer Cleaning agitating device, comprise a cylinder, crane and silicon chip carrier, crane is made up of horizontally disposed connecting axle and the vertical rod that is vertically arranged on connecting axle two ends, connecting axle is connected with the telescopic end of cylinder piston rod, under air cylinder driven, reciprocal elevating movement is done to make crane, the position corresponding with two vertical rods is respectively equipped with a lead, vertical rod is arranged in the guide groove of lead by the skid that its sidepiece is arranged, silicon chip carrier comprises a base plate, base plate is provided with multiple protruding block, the draw-in groove for placing Wafer Cleaning basket is formed between multiple protruding block and base plate, base plate is distributed with multiple permeable hole, the both sides of base plate are respectively provided with two connecting rods, the top of two connecting rods of the same side is connected by an otic placode, two otic placodes are connected with the top of two vertical rods of crane respectively, can move up and down in the rinse bath of silicon wafer cleaner under crane drives to make silicon chip carrier.
Beneficial effect: the utility model is moved by air cylinder driven crane, and then drive the cleaning basket being mounted with silicon chip in rinse bath, do reciprocal elevating movement by silicon chip carrier, thus by the flowing cleaning current that silicon chip surface produces, silicon chip is cleaned, effectively improve cleansing power and the cleaning efficiency of silicon chip, return that the rate of washing is low, good product quality.Motion of the present utility model is controlled by air cylinder driven, easily regulates motion amplitude and the frequency of silicon chip carrier, is convenient to combinationally use with existing silicon wafer cleaner.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
Fig. 2 is the front view of silicon chip carrier.
Fig. 3 is the top view of silicon chip carrier.
Mark in figure: 1, magnetic valve, 2, pressure vacant duct, 3, cylinder, 4, connecting axle, 5, lead, 6, vertical rod, 7, silicon chip carrier, 71, base plate, 72, connecting rod, 73, otic placode, 74, permeable hole, 75, protruding block, 8, Wafer Cleaning basket.
Detailed description of the invention
As shown in the figure, a kind of Wafer Cleaning agitating device, comprise a cylinder 3, crane and silicon chip carrier 7, crane is made up of horizontally disposed connecting axle 4 and the vertical rod 6 that is vertically arranged on connecting axle 4 two ends, connecting axle 4 is connected with the telescopic end of cylinder piston rod, under cylinder 3 drives, reciprocal elevating movement is done to make crane, the position corresponding with two vertical rods 6 is respectively equipped with a lead 5, vertical rod 6 is arranged in the guide groove of lead 5 by the skid that its sidepiece is arranged, the setting of lead 5 makes the elevating movement of crane more steady, silicon chip carrier 7 comprises a base plate 71, base plate 71 is provided with multiple protruding block 75, the draw-in groove for placing Wafer Cleaning basket 8 is formed between multiple protruding block 75 and base plate 71, base plate 71 is distributed with multiple permeable hole 74, the both sides of base plate 71 are respectively provided with two connecting rods 72, the top of two connecting rods 72 of the same side is connected by an otic placode 73, two otic placodes 73 are connected with the top of two vertical rods 6 of crane respectively, can move up and down in the rinse bath of silicon wafer cleaner under crane drives to make silicon chip carrier 7, silicon chip to be cleaned is placed in Wafer Cleaning basket 8, pump in rinse bath with silicon chip carrier 7, thus by the mutual fricting movement between silicon chip and cleaning fluid current, the foreign matters such as particle loose for silicon chip surface are rinsed out, cleaning performance is obvious to be improved.The base plate 71 of silicon chip carrier 7 is corrosion-resistant and does not produce the quartz material of particle, and connecting rod 72 is the materials such as ptfe plastic, and otic placode 73 scribbles corrosion-resistant four fluorine coating for surface.Air cylinder driven gas-compressed air is delivered in cylinder 3 through two position four-way solenoid valves 1, pressure vacant duct 2, drives cylinder piston rod to move reciprocatingly.
Further, be provided with Multi-layer silicon support plate above the base plate 71 of described silicon chip carrier 7, the connecting rod 72 that silicon chip support plate is arranged with base plate 71 both sides is connected, and the structure of silicon chip support plate can be designed to identical with base plate 71 structure.The setting of silicon chip support plate can increase the flushing dose of device.The base plate 71 of silicon chip carrier 7 can also being arranged tumbler to rotate in horizontal plane in lifting process for making Wafer Cleaning basket 8 simultaneously, making Wafer Cleaning without dead angle.
The utility model can also come directly synchronously to drive silicon chip carrier 7 to do reciprocal elevating movement by arranging two cylinders, namely two otic placodes 73 of silicon chip carrier 7 both sides are connected with the piston rod of two cylinders respectively, and two cylinders are synchronized with the movement and jointly drive silicon chip carrier 7 to move up and down.
Claims (1)
1. a Wafer Cleaning agitating device, it is characterized in that: comprise a cylinder (3), crane and silicon chip carrier (7), crane is made up of horizontally disposed connecting axle (4) and the vertical rod (6) that is vertically arranged on connecting axle (4) two ends, connecting axle (4) is connected with the telescopic end of cylinder piston rod, under cylinder (3) drives, reciprocal elevating movement is done to make crane, the position corresponding with two vertical rods (6) is respectively equipped with a lead (5), vertical rod (6) is arranged on by the skid that its sidepiece is arranged in the guide groove of lead (5), silicon chip carrier (7) comprises a base plate (71), base plate (71) is provided with multiple protruding block (75), the draw-in groove for placing Wafer Cleaning basket (8) is formed between multiple protruding block (75) and base plate (71), base plate (71) is distributed with multiple permeable hole (74), the both sides of base plate (71) are respectively provided with two connecting rods (72), the top of two connecting rods (72) of the same side is connected by an otic placode (73), two otic placodes (73) are connected with the top of two vertical rods (6) of crane respectively, can move up and down in the rinse bath of silicon wafer cleaner under crane drives to make silicon chip carrier (7).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201520529968.3U CN204912170U (en) | 2015-07-21 | 2015-07-21 | Silicon chip washs shaking device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201520529968.3U CN204912170U (en) | 2015-07-21 | 2015-07-21 | Silicon chip washs shaking device |
Publications (1)
Publication Number | Publication Date |
---|---|
CN204912170U true CN204912170U (en) | 2015-12-30 |
Family
ID=54961354
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201520529968.3U Expired - Fee Related CN204912170U (en) | 2015-07-21 | 2015-07-21 | Silicon chip washs shaking device |
Country Status (1)
Country | Link |
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CN (1) | CN204912170U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108807172A (en) * | 2018-06-05 | 2018-11-13 | 陈涛 | A kind of semiconductor diode production technology |
CN111468467A (en) * | 2020-04-22 | 2020-07-31 | 浙江商业职业技术学院(杭州商业技工学校) | Clean convenient computer hardware belt cleaning device |
-
2015
- 2015-07-21 CN CN201520529968.3U patent/CN204912170U/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108807172A (en) * | 2018-06-05 | 2018-11-13 | 陈涛 | A kind of semiconductor diode production technology |
CN108807172B (en) * | 2018-06-05 | 2021-04-27 | 济南固锝电子器件有限公司 | Semiconductor diode production process |
CN111468467A (en) * | 2020-04-22 | 2020-07-31 | 浙江商业职业技术学院(杭州商业技工学校) | Clean convenient computer hardware belt cleaning device |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151230 Termination date: 20170721 |